KR20150136035A - Treatment system for harmful waste gases - Google Patents

Treatment system for harmful waste gases Download PDF

Info

Publication number
KR20150136035A
KR20150136035A KR1020150134670A KR20150134670A KR20150136035A KR 20150136035 A KR20150136035 A KR 20150136035A KR 1020150134670 A KR1020150134670 A KR 1020150134670A KR 20150134670 A KR20150134670 A KR 20150134670A KR 20150136035 A KR20150136035 A KR 20150136035A
Authority
KR
South Korea
Prior art keywords
gas
contact
unit
disposed
oxidation
Prior art date
Application number
KR1020150134670A
Other languages
Korean (ko)
Other versions
KR101597944B1 (en
Inventor
장희현
Original Assignee
장희현
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 장희현 filed Critical 장희현
Priority to KR1020150134670A priority Critical patent/KR101597944B1/en
Publication of KR20150136035A publication Critical patent/KR20150136035A/en
Application granted granted Critical
Publication of KR101597944B1 publication Critical patent/KR101597944B1/en

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/46Removing components of defined structure
    • B01D53/54Nitrogen compounds
    • B01D53/56Nitrogen oxides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D47/00Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06Spray cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77Liquid phase processes
    • B01D53/78Liquid phase processes with gas-liquid contact
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/96Regeneration, reactivation or recycling of reactants
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/40Nitrogen compounds
    • B01D2257/404Nitrogen oxides other than dinitrogen oxide

Abstract

The present invention relates to a harmful gas processing system of which the structure is straightforward and which makes it possible to effectively process harmful gas containing a nitrogen oxide or the like. According to the present invention, the harmful gas processing system comprises: a processing tank (1) where a first gas supply part (5) is formed at the bottom part and a gas discharge part (2) is formed at the top end thereof; a collecting part (10) comprising a liquid oxidizing agent collecting part (14) formed on a lower inner part of the processing tank (1), and a liquid reducing agent collecting part (15) which is separated from the liquid oxidizing agent collecting part (14); a contact-oxidation part (11) comprising a gas-liquid-contact packing material layer (16) which is disposed on an upper part of the first gas supply part (5) and is opened to the liquid oxidizing agent collecting part (14), and further comprising an oxidant spray nozzle (23) which is linked to the liquid oxidizing agent collecting part (14) so as to spray an oxidant onto the gas-liquid-contact packing material layer (16); a contact-reduction part (13) comprising a gas-liquid-contact packing material layer (34) which is disposed on an upper part of the contact-oxidation part (11) and is disposed to allow the processed gas which has gone through the contact-oxidation part (11) to pass through, and further comprising a reducing agent spray nozzle (36) which is linked to the liquid reducing agent collecting part (15) so as to spray a reducing agent onto the gas-liquid-contact packing material layer (34); and a diffusion isolation part (37) disposed between the contact-oxidation part (11) and the contact-reduction part (13), and allowing the diffusion of the processed gas which passes therethrough and guiding the liquid reducing agent, which has fallen from the contact-reduction part (13), to the liquid reducing agent collecting part (15) through a bypass tube (35).

Description

유해가스 처리시스템 {Treatment system for harmful waste gases}[0001] The present invention relates to a treatment system for harmful waste gases,
본 발명은 유해가스 처리시스템에 관한 것으로서, 좀 더 상세히는 구조가 간단하면서도 질소산화물을 포함하는 유해가스를 효과적으로 처리할 수 있는 새로운 구조의 유해가스 처리시스템에 관한 것이다.The present invention relates to a noxious gas processing system, and more particularly, to a noxious gas processing system having a novel structure capable of effectively treating noxious gas containing nitrogen oxides while having a simple structure.
각종 산업설비에서 배출되는 유해가스에는 다양한 종류의 유해성분이 포함되어 있는데 그중에서도 질소산화물인 NOx는 여러 가지 형태의 오염을 유발하며, 특히 일산화질소가 자외선과 광화학적 반응을 일으켜서 스모그를 일으키고, NOx가 대기 중에서 산화되어 생성되는 이산화질소는 산화질소와 산소라디칼로 분해되어 대기중의 산소와 반응하여 오존의 형성을 유발한다. 이러한 NOx는 독성이 강한 물질로 인체에 치명적 영향을 줄 수 있다.Noxious gases emitted from various industrial facilities include various kinds of harmful substances. Among them, NOx, which is a nitrogen oxide, causes various types of pollution. In particular, nitrogen monoxide causes photochemical reaction with ultraviolet rays, causing smog, The nitrogen dioxide that is produced by oxidation is decomposed into nitrogen oxides and oxygen radicals and reacts with oxygen in the atmosphere to cause the formation of ozone. These NOx are toxic substances and can have a fatal effect on the human body.
이러한 NOx를 포함하는 유해가스를 처리하는 방법으로는 NOx를 중화 또는 환원처리하는 방법이 널리 사용되고 있으나, 일산화질소(NO)는 이에 앞서 산화처리를 요한다. 종래에 이러한 NOx를 함유하는 유해가스의 처리를 위한 산화 또는 환원처리 시스템은 그 장치가 복잡하고 장대하여 제작코스트가 많이 드는 반면 만족할 만한 처리효율을 얻지 못하는 실정이다.As a method of treating such noxious gas containing NOx, a method of neutralizing or reducing NOx is widely used, but nitrogen monoxide (NO) requires an oxidation treatment in advance. Conventionally, such an oxidation or reduction treatment system for treating noxious gas containing NOx is complicated and requires a large production cost, but satisfactory treatment efficiency can not be obtained.
이를 부연설명하면, 처리조를 수직으로 배치하는 수직타입의 처리장치는 산화처리과정과 환원처리과정을 분리하기 위해 별도의 처리조로 구성하므로 처리장치의 구조가 복잡하고 코스트가 상승하는 문제점이 있다, 한편 산화처리와 환원처리를 단일의 처리조에서 수행하는 수평타입 처리장치도 공개특허 제10-2008-0016320호로 소개된 바 있으나, 이러한 수평타입 처리장치는 피처리가스는 수평방향으로 흐름에 비해, 처리조 내에 직립하도록 횡방향으로 다단 배치된 기액반응장치를 흐르는 산화제나 환원제는 중력에 의해 수직방향으로 흐르므로, 이를 산화제나 환원제가 처리조 내의 기류에 의해 기액반응장치의 하단으로 갈수록 후방으로 쏠리게 되어, 기액반응장치의 충전재 전체에 걸쳐서 산화제나 환원제가 균등하게 분포되지 못하므로, 피처리가스와 충분히 접촉되지 못하여 처리효율이 저하되며, 아울러 처리조 내를 수평방향으로 흐르는 피처리가스도 비중에 따라 기액반응장치의 상부 또는 하부로 치우쳐 흐르게 되어, 기액반응장치 내의 산화제 또는 환원제와 균일하고 충분한 접촉을 확보하기 어려웠다.In addition, since the vertical type processing apparatus for vertically disposing the treatment tanks is constituted by a separate treatment tank for separating the oxidation treatment process and the reduction treatment process, there is a problem that the structure of the treatment device is complicated and the cost is increased. On the other hand, a horizontal type processing apparatus for performing the oxidation treatment and the reduction treatment in a single treatment tank is also disclosed in Japanese Patent Laid-Open No. 10-2008-0016320. However, in the horizontal type treatment apparatus, Since the oxidizing agent and the reducing agent flowing in the gas-liquid reaction device arranged in the transverse direction so as to stand upright in the treatment tank flow in the vertical direction by gravity, the oxidizing agent and the reducing agent are pushed backward toward the lower end of the gas- And the oxidizing agent and the reducing agent are not evenly distributed over the entire filler of the gas-liquid reaction apparatus, And the gas to be treated flowing horizontally in the treatment tank is biased toward the upper or lower portion of the gas-liquid reaction device depending on the specific gravity, so that the gas and the oxidizing agent or the reducing agent in the gas- It was difficult to secure contact.
특허등록 제10-1173208호Patent Registration No. 10-1173208 특허공개 제10-2008-0016320호Patent Publication No. 10-2008-0016320
본 발명은 전술한 바와 같은 종래의 질소산화물을 포함하는 유해가스의 처리상의 문제점에 착안하여 제안된 것으로서, 본 발명은 질소산화물을 포함하는 유해가스를 단일의 처리조로 이루어진 간단한 구조의 장치를 사용하여 효율적으로 처리할 수 있는 유해가스 처리시스템을 제공하고자 하는 것이다.SUMMARY OF THE INVENTION The present invention has been made in view of the above-described problems of conventional noxious gas-containing noxious gas treatment, and the present invention has been accomplished by using noxious gas containing nitrogen oxide in a simple structure composed of a single treatment tank And to provide a harmful gas treatment system capable of efficiently treating the harmful gas.
또한 본 발명은 단일의 처리조에서 질소산화물을 포함하는 유해가스는 물론 기타의 유해 배출가스도 효율적으로 처리할 수 있는 유해가스 처리 시스템을 제공하고자 하는 것이다.Another object of the present invention is to provide a harmful gas treatment system capable of effectively treating not only noxious gases containing nitrogen oxides but also other harmful exhaust gases in a single treatment tank.
본 발명의 한 특징에 따르면, 하부에 제1가스공급부(5)가 형성되고 상단에 가스배출구(2)가 형성된 처리조(1)와; 상기 처리조(1)의 내부 하부에 형성되는 산화제액회수부(14)와 이와 구획되는 환원제액회수부(15)를 포함하는 회수부(10)와; 상기 제1가스공급부(5) 상부에 배치되며 산화제액회수부(14)에 개방되는 기액접촉충전재층(16)과 상기 산화제액회수부(14)에 연결되며 이 기액접촉충전재층(16)에 산화제를 분사하는 산화제분사노즐(23)을 포함하는 접촉산화부(11)와; 상기 접촉산화부(11)의 상부에 배치되며 접촉산화부(11)를 거친 피처리가스가 통과되도록 배치된 기액접촉충전재층(34)과 상기 환원제액회수부(15)와 연결되며 상기 기액접촉충전재층(34)에 환원제를 분사하는 환원제분사노즐(36)을 포함하는 접촉환원부(13)와; 상기 접촉산화부(11)와 상기 접촉환원부(13)의 사이에 배치되며 상승하여 통과하는 피처리가스를 확산시키고 접촉환원부(13)에서 낙하된 환원제액을 바이패스관로(35)를 통해 상기 환원제액회수부(15)로 유도하는 확산분리부(37)를 포함하는 것을 특징으로 하는 유해가스 처리시스템이 제공된다.According to an aspect of the present invention, there is provided a process apparatus comprising: a processing tank (1) having a first gas supply unit (5) formed at a lower portion thereof and a gas discharge port (2) formed at an upper portion thereof; A recovery unit 10 including an oxidant solution recovery unit 14 formed in the lower portion of the treatment tank 1 and a reducing solution recovery unit 15 partitioned by the oxidant solution recovery unit 14; Liquid contact filler layer 16 disposed above the first gas supply part 5 and opened to the oxidant solution recovery part 14 and a gas-liquid contact filler layer 16 connected to the oxidant solution recovery part 14, A contact oxidation part (11) including an oxidizing agent spraying nozzle (23) for spraying an oxidizing agent; A gas-liquid contact filler layer 34 disposed above the contact oxidation part 11 and arranged to pass a gas to be treated through the contact oxidation part 11 and a gas-liquid contact filler layer 34 connected to the reducing agent solution collecting part 15, A contact reducing part (13) including a reducing agent spraying nozzle (36) for spraying a reducing agent onto the filler layer (34); The reducing agent solution dropped in the contact reducing unit 13 is diffused through the bypass line 35, which is disposed between the contact oxidizing unit 11 and the contact reducing unit 13, And a diffusion separator (37) for leading to the reducing agent remover (15).
본 발명의 다른 특징에 따르면, 상기 접촉산화부(11)와 접촉환원부(13) 사이에는 흡착산화부(12)가 더 구비되고, 상기 흡착산화부(12)는 상기 접촉산화부(11)를 거친 피처리가스가 통과되도록 흡착재가 충전된 흡착재충전층(20)과, 상기 흡착재충전층(20)에 배치되어 재생모드에서 세척수와 산화제액을 분사하는 수세재생노즐(24)과, 상기 흡착재충전층(20)의 하부에 연결되는 건조공기공급부(25)를 포함하고, 상기 흡착재충전층(20)의 하부는 피처리가스를 확산시키고 세척수 및 산화제액을 수집 배출하는 확산수집부(27)를 포함하는 것을 특징으로 하는 유해가스 처리시스템이 제공된다.According to another aspect of the present invention, an adsorption oxidation unit 12 is further provided between the catalytic oxidation unit 11 and the catalytic reduction unit 13. The adsorption oxidation unit 12 includes the catalytic oxidation unit 11, An adsorption rechargeable layer 20 filled with an adsorbent so as to allow a gas to be passed through the adsorption layer 20 to pass therethrough; a water / regeneration nozzle 24 disposed in the adsorption / rechargeable layer 20 for spraying wash water and oxidant liquid in a regeneration mode; And a dry air supply unit 25 connected to a lower portion of the rechargeable layer 20. The lower portion of the adsorption rechargeable layer 20 includes a diffusion collection unit 27 for diffusing a gas to be treated and collecting and discharging wash water and oxidant solution, Wherein the noxious gas treatment system comprises:
본 발명의 다른 특징에 따르면, 상기 확산분리부(37)는 상기 처리조(1)의 내벽과 이격되도록 배치되며 중앙배출구(39)가 상기 바이패스관로(35)와 연통되는 호퍼부(38)와, 상기 호퍼부(38)의 상부에 이격 배치되며 처리조(1)의 내벽과 호퍼부(38) 사이에 형성된 통로(40)를 덮는 링형상판(42)과, 상기 링형상판(42)의 상부에 배치되는 확산타공판(43)과, 상기 호퍼부(38)의 하부에 배치되는 확산타공판(44)을 포함하는 것을 특징으로 하는 유해가스 처리시스템이 제공된다.According to another aspect of the present invention, the diffusion separator 37 is disposed to be spaced apart from the inner wall of the treatment tank 1 and has a central outlet 39 connected to the hopper 38 communicating with the bypass conduit 35, A ring-shaped top plate 42 which is disposed on the upper portion of the hopper portion 38 and covers the passage 40 formed between the inner wall of the treatment tank 1 and the hopper portion 38, A diffusion perforated plate 43 disposed at an upper portion of the hopper portion 38 and a diffusion perforated plate 44 disposed at a lower portion of the hopper portion 38.
본 발명의 다른 특징에 따르면, 상기 접촉산화부(11)의 상부에 배치되며 유해가스를 공급하는 제2가스공급부(6)가 더 구비된 것을 특징으로 하는 유해가스 처리시스템이 제공된다.According to another aspect of the present invention, there is provided a noxious gas processing system, comprising a second gas supply unit (6) disposed above the contact oxidation unit (11) and supplying noxious gas.
본 발명에 따르면, 단일의 처리조(1) 내에 하단으로부터 상부로 접촉산화부(11)와 접촉환원부(13)를 순차적으로 적층배치하고, 처리조(1)의 내부 하부에는 산화제액회수부(14)와 환원제수집부(15)를 구획배치하고, 접촉산화부(11)와 접촉환원부(13) 사이에는 피처리가스를 확산시키고 낙하되는 환원제액을 바이패스관로(35)로 유도하는 확산분리부(37)를 구비함으로써, 접촉환원부(13)에서 흘러내린 환원제액을 산화제액과 분리하여 수집하고 재순환시켜서 단일의 처리조(1)를 통해서 산화 및 환원처리가 가능하므로, 간단한 구조의 장치로써, 일산화질소를 비롯한 질소산화물을 포함하는 유해가스를 효율적으로 처리할 수 있다. 구체적으로는 처리조(1) 하부의 제1가스공급부(5)로부터 유입된 피처리가스가 기류에 의해 상승하면서 접촉산화부(11)의 기액접촉충전재층(16)을 통해 중력에 의해 하향하는 산화제와 기액접촉충전재층(16)의 전면적에 걸쳐서 대향류로서 충돌하면서 충분히 접촉될 수 있고, 또한 피처리가스가 접촉환원부(13)의 기액접촉충전재층(34)을 통해 중력에 의해 햐향하는 환원제와 기액접촉충전재층(34)의 전면적에 걸쳐서 대향류로서 충돌하면서 충분히 접촉될 수 있어서, 산화 및 환원처리효율이 우수하여 피처리가스의 처리효율을 높게 유지할 수 있다.According to the present invention, a contact oxidation unit 11 and a contact reduction unit 13 are sequentially stacked in a single processing tank 1 from the lower end to the upper side. Inside the treatment tank 1, The reduction agent collecting section 14 and the reducing agent collecting section 15 are partitioned and the reducing agent solution which is diffused and diffused into the space between the contact oxidizing section 11 and the contact reducing section 13 is led to the bypass pipe 35 Since the reduction separator 37 is provided, the reducing agent flowing down from the catalytic reduction unit 13 can be separated from the oxidant solution, collected and recirculated, and oxidized and reduced through a single treatment tank 1, It is possible to efficiently treat noxious gas including nitrogen monoxide and nitrogen oxide. Specifically, the gas to be introduced from the first gas supply part 5 in the lower part of the treatment tank 1 is raised by the air flow and is lowered by the gravity through the gas-liquid contact filler layer 16 of the contact oxidation part 11 Liquid contact filler layer 34 and the gas-liquid contact filler layer 34 of the contact reducing part 13 can be sufficiently brought into contact with the oxidizing agent and the gas-liquid contact filler layer 16 as a counterflow, Liquid contact filler layer 34 can be sufficiently brought into contact with the whole surface of the reducing agent and the gas-liquid contact filler layer 34 as a counter flow, so that the oxidation and reduction treatment efficiency is excellent and the treatment efficiency of the gas to be treated can be kept high.
또한 본 발명에 따르면, 접촉산화부(11)의 상부에 흡착재충전층(20)과 수세재생노즐(24) 및 건조공기공급부(25)를 구비한 흡착산화부(12)를 더 구비하고, 이 접촉산화부의 흡착재충전층(20)에는 산화제액을 함침시켜서 피처리가스를 통과시켜서 더욱 산화효율을 증대하고, 세척수의 분사와 건조를 통해 흡착재를 재생하여 반복사용함으로써, 산화반응 속도가 늦은 NO 등의 유해가스의 처리효율을 더욱 높일 수 있다.According to the present invention, there is further provided an adsorption oxidation section (12) having an adsorption rechargeable layer (20), a water regeneration nozzle (24) and a dry air supply section (25) The adsorption / rechargeable layer 20 of the contact oxidation section is impregnated with an oxidizing agent solution to pass the gas to be treated to further increase the oxidation efficiency, and the adsorbent material is regenerated through spraying and drying of the washing water to repeatedly use NO, It is possible to further enhance the treatment efficiency of the noxious gas.
또한, 상기 확산분리부(37)를 처리조(1)의 내벽과 이격되며 중앙배출구(39)가 바이패스관로(35)와 연통되는 호퍼부(38)와, 이 호퍼부(38)의 상부에 이격배치되는 링형상판(42) 및 확산타공판(43)을 배치함으로써, 통과하는 처리가스가 호퍼부(38)의 저면을 따라 둘레부로 확산된 후 내향하여 흐르게 되고, 상부의 접촉환원부(13)의 기액접촉충전재층(34)에서 낙하되는 환원제액은 확산타공판(43)에 충돌하여 외측으로 유도되어 링형상판(42)을 타고 낙하되면서 피처리가스의 흐름과 교차되므로, 피처리가스와 환원제액의 충돌과 접촉이 효과적으로 증대되어 환원처리효율이 증대되고, 아울러 낙하된 환원제액은 바이패스관로(35)를 통해 회수될 수 있다. 그리고 호퍼부(38)의 하부에 배치되는 확산타공판(44)에 의해 그 하부에서 유입되는 피처리가스가 이 확산타공판(44)에 충돌하면서 저지되어 그 전단에서 처리조(1)의 전체 단면적으로 넓게 확산되어 흐르게 되어 기액접촉충전재층(34)이나 흡착재충전재층(20)과의 접촉이 증대된다.The diffusion separator 37 is disposed at a position spaced apart from the inner wall of the treatment tank 1 and having a central outlet 39 communicating with the bypass line 35, The process gas passing therethrough is diffused to the peripheral portion along the bottom surface of the hopper portion 38 and then flows inward so that the upper contact reducing portion 13 ) Contacted with the diffusion perforated plate 43 and is guided outward to fall on the ring-shaped upper plate 42 and intersect with the flow of the gas to be treated. Therefore, the reducing agent solution dropped on the gas- The collision and contact of the solution is effectively increased to increase the reduction treatment efficiency, and the dropped reducing agent can be recovered through the bypass pipe 35. The diffused perforated plate 44 disposed at the lower portion of the hopper portion 38 is blocked by the diffused perforated plate 44 from colliding against the target gas flowing in the lower portion thereof, The contact with the gas-liquid contact filler layer 34 and the adsorbent filler layer 20 is increased.
또한 본 발명에 따르면, 상기 확산분리부(37)의 하부에 폐가스를 공급하는 제2가스공급부(6)가 더 구비되므로, 산화반응을 필요하지 않고 환원반응만으로 처리가능한 유해가스를 처리하고자 하는 경우에는 직접 제2가스공급부(6)를 통해 접촉환원부(13)를 통과시켜 처리할 수 있어서, 필요에 따라 산화와 환원을 순차적으로 처리하거나, 또는 환원처리만을 수행할 수 있어서, 다양한 종류의 유해한 폐가스를 단일의 처리장치로 효과적으로 처리할 수 있다. Further, according to the present invention, since the second gas supply unit 6 for supplying the waste gas to the lower part of the diffusion separation unit 37 is further provided, when it is desired to treat the noxious gas which can be treated only by the reduction reaction without the oxidation reaction Can be directly passed through the second reducing gas supply unit 6 through the catalytic reduction unit 13 so that the oxidation and reduction can be sequentially performed or the reduction process can be carried out as required, The waste gas can be effectively treated with a single treatment apparatus.
도 1은 본 발명의 바람직한 일 실시예의 구성도1 is a block diagram of a preferred embodiment of the present invention;
이하에서 도면을 참조하여 본 발명의 바람직한 실시예를 설명하면 다음과 같다. 도 1은 본 발명의 일 실시예에 따른 장치의 개략구성도이다. 도시된 바와 같이 본 발명에 따르면, 하부에 유해가스나 배출가스 등의 피처리가스가 공급되는 제1가스공급부(5)가 형성되고 상단에는 유해물질이 제거된 처리가스가 배출되는 가스배출구(2)가 형성된 처리조(1)가 구비된다. 이 처리조(1)의 내부 하단은 상부에서 흘러내린 산화제액이 수집되는 산화제액회수부(14)와, 상부에서 흘러내린 환원제액이 수집되는 환원제액회수부(15)가 서로 구획되도록 형성된 회수부(10)가 배치된다. 그리고 상기 회수부(10)의 상부에는 아래로부터 위쪽으로 순차적으로 접촉산화부(11)와 흡착산화부(12) 및 접촉환원부(13)가 배치된다. Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. 1 is a schematic block diagram of an apparatus according to an embodiment of the present invention. As shown in the figure, according to the present invention, a first gas supply unit 5 for supplying a gas to be treated such as a harmful gas or an exhaust gas is formed in a lower part, and a gas discharge port 2 ) Is formed in the processing tank 1. An inner lower end of the treatment tank 1 is provided with an oxidant solution collecting part 14 for collecting the oxidant solution flowing down from the upper part and a reducing solution collecting part 15 for collecting the reducing solution flowing down from the upper part, (10) is disposed. The contact oxidation unit 11, the adsorption oxidation unit 12, and the contact reduction unit 13 are sequentially disposed on the upper portion of the recovery unit 10 from below to above.
산화제액회수부(14)에는 산화제와 산화보조약제가 공급되는 라인(17)이 연결되고, 환원제액회수부(15)에는 환원제와 환원보조약제가 공급되는 라인(18)이 연결된다. 그리고 산화제액회수부(14)와 환원제액회수부(15)에는 각각 Ph측정기(9)와 산화환원전위측정기(19)가 설치되어 투입되는 산화제와 산화보조제 또는 환원제와 환원보조제의 양을 조절하게 된다. A line 17 to which the oxidizing agent and the oxidizing auxiliary agent are supplied is connected to the oxidizing agent solution collecting unit 14 and a line 18 to which the reducing agent and the reducing auxiliary agent are supplied is connected to the reducing agent collecting unit 15. The pH measuring device 9 and the redox potential measuring device 19 are provided in the oxidizing agent solution collecting part 14 and the reducing agent solution collecting part 15 to adjust the amount of the oxidizing agent and the oxidizing auxiliary agent or the reducing agent and the reducing agent do.
상기 접촉산화부(11)에는 기액접촉용 충전재, 예를 들면 Tellerette 등이 충전된 기액접촉충전재층(16)이 처리조(1)에 수평으로 배치된다. 그리고 이 기액접촉충전재층(16)의 하부에는 전술한 바와 같이 제1가스공급부(5)가 연결된다. 이 제1가스공급부(5)의 선단에는 유입된 처리가스를 확산시켜 균일하게 공급하기 위한 확산판이나 가이드판 등이 구비될 수 있다. 기액접촉충전재층(16)의 상부에는 상기 산화제액회수부(14)에서 배관(58)을 통해 공급된 산화제액이 분사되는 산화제분사노즐(23)이 배치된다. 그리고 이 산화제분사노즐(23)의 상부에는 데미스터(22)가 배치된다. 이 데미스터(22)는 산화제가 포함된 액적이 비산하여 그 상부의 흡착재충전부(20)로 유입되는 것을 방지한다. 이에 따라 제1가스공급부(5)에서 유입된 피처리가스가 도시안된 송풍기 등에 의해 발생되는 기류에 의해 상승하면서 기액접촉충전재층(16)의 전면적에 걸쳐서 상승하면서 중력에 의해 하강하는 산화제액과 대향류로서 충둘하여, 피처리가스와 산화제액의 접촉효율이 우수하다. Liquid contact filler layer 16 filled with a gas-liquid contact filler, for example, Tellerette, is horizontally disposed in the treatment tank 1. The contact- The first gas supply part 5 is connected to the lower part of the gas-liquid contact filler layer 16 as described above. A distal end of the first gas supply part 5 may be provided with a diffusion plate or a guide plate for uniformly supplying the supplied process gas by diffusing the process gas. The oxidant spray nozzle 23 for spraying the oxidant liquid supplied through the piping 58 from the oxidant solution recovery part 14 is disposed on the upper part of the gas-liquid contact filler layer 16. A demister (22) is disposed above the oxidant spray nozzle (23). This demister 22 prevents the droplet containing the oxidizing agent from scattering and flowing into the adsorbent charging section 20 thereabove. As a result, the gas to be introduced from the first gas supply part 5 rises by the airflow generated by the blower or the like (not shown) and rises over the entire area of the gas-liquid contact filler layer 16, So that the contact efficiency between the target gas and the oxidant liquid is excellent.
그리고 접촉산화부(11)의 상부에는 확산수집부(27)가 구비된다. 이 확산수집부(27)는 처리조(1)의 내벽과 이격되도록 배치되며 중앙배출구(29)는 수집관(33)에 연결되는 호퍼부(28)와, 이 호퍼부(28)의 상부에 이격배치되며 처리조(11)의 내벽과 호퍼부(28) 사이에 형성된 통로를 덮는 링형상판(30)과, 이 링형상판(30)의 상부에 배치되는 원판형상의 확산타공판(31)을 포함한다. 그리고 호퍼부(28)의 하부에도 확산타공판(32)이 배치된다. 이 확산수집부(27)는 유해가스를 처리하는 작동모드에서는 상승하여 흐르는 피처리가스가 확산타공판(32)과 확산타공판(31)에 충돌하여 국부적으로 흐르지 않고 넓게 확산되어, 그 상하부에 배치되는 기액접촉충전재층(16)이나 흡착재충전층(20)과 국부적으로 접촉되지 않고 골고루 접촉되도록 한다. 또한 흡착재를 재생하는 흡착재 재생모드에서는 살포된 세척수나 산화제액을 호퍼부(28)에서 수집관(33)을 통해 수집하여 순환시키거나 배출하게 된다.The diffusion collecting part 27 is provided on the contact oxidation part 11. The diffusion collector 27 is disposed so as to be spaced from the inner wall of the treatment tank 1 and the central outlet 29 is connected to the collecting pipe 33 and a hopper 28 Shaped top plate 30 covering the passage formed between the inner wall of the treatment tank 11 and the hopper portion 28 and a diffusive perforated plate 31 of circular plate shape disposed on the top of the ring- do. A diffusion perforated plate 32 is also disposed under the hopper portion 28. In the operation mode for treating the noxious gas, the gas to be treated, which flows upwardly, is diffused by the diffusion perforation plate 32 and the diffusion perforated plate 31 so as not to flow locally but to be spread widely, Liquid contact filler layer 16 and the adsorption / refill layer 20 without contacting them locally. Also, in the regenerant mode for regenerating the adsorbent, the sprayed washing water or oxidant liquid is collected through the collecting pipe 33 in the hopper 28, circulated or discharged.
이러한 구조에 따라 제1가스공급부(5)를 통해 공급된 일산화질소와 같이 환원처리에 앞서 먼저 산화처리를 요하는 피처리가스가 접촉산화부(11)의 기액접촉충전재층(16)을 상향하여 통과하면서 산화제분사노즐(23)에서 살포되어 중력에 의해 하강하는 산화제액과 대향류로서 충돌하면서 활발하게 접촉되어 산화처리된다. 그리고 기액접촉충전재층(16)을 통과한 피처리가스는 확산수집부(27)의 확산타공판(32)과 호퍼부(28) 및 링형상판(30) 및 확산타공판(31)을 거치면서 더욱 골고루 확산되어 데미스터(22)를 거쳐 상부의 흡착산화부(12)로 도입된다.According to this structure, the gas to be treated which needs to be oxidized first, such as the nitrogen monoxide supplied through the first gas supply part 5, is raised upwardly by the gas-liquid contact filler layer 16 of the contact oxidation part 11 Is passed through the oxidizing agent spray nozzle 23 while being passed through it, is actively contacted with the oxidizing agent liquid which is lowered by gravity and collides with the oxidizing agent liquid as counterflow, and is oxidized. The gas to be treated which has passed through the gas-liquid contact filler layer 16 passes through the diffusion perforated plate 32 of the diffusion collecting portion 27, the hopper portion 28, the ring-shaped upper plate 30 and the diffusion perforated plate 31, Is diffused and introduced into the adsorption oxidation section (12) of the upper part via the demister (22).
흡착산화부(12)에는 흡착재충전층(20)이 구비되고, 흡착재충전층(20)의 상부의 수세재생노즐(24)이 구비되고 하부에는 건조공기공급부(25)가 연결된다. 이 수세재생노즐(24)은 배관(56)을 거쳐 시수탱크(54)에 연결된다. 이 시수탱크(54) 이외에도 산화제탱크(51), 환원제탱크(52) 및 보조제탱크(53)가 더 구비되고 이들 탱크들은 배관(55)에 의해 상호 연결되고, 또 다른 배관(57)을 통해 처리조(1)의 회수부(10)로 연결된다. 흡착산화부(12)의 흡착재충전층(20)에는 산화제탱크(51)로부터 공급되는 산화제액을 미리 함침시켜서, 피처리가스를 통과시키면서 흡착시켜 산화처리를 행한다. 그리고 장시간의 사용에 의해 흡착재에 유해가스 성분이 충분히 흡착되면, 수세재생노즐(24)을 이용하여 시수탱크(54)로부터 공급되는 세척수를 적어도 2회 분사하여 흡착재를 세척하고, 이어서 건조공기공급부(25)로부터 더운 건조공기를 공급하여 흡착재를 건조시킨 후에, 산화제탱크(51)나 보조제탱크(53)로부터 산화제와 보조제를 시수와 적당비율로 혼합한 산화제액을 수세재생노즐(24)로 분사함으로써 흡착재를 재생한다. 이에 따라 흡착산화부(12)에 의한 산화처리를 반복적으로 행할 수 있다. 이 흡착산화부(12)는 산화반응속도가 상대적으로 늦어서 전술한 접촉산화부(11)를 거치지면서 완전히 산화되지 않은 유해가스를 완전히 산화시킨다. The adsorption oxidation section 12 is provided with an adsorption rechargeable layer 20 and is provided with a water recovery regeneration nozzle 24 at the upper part of the adsorption rechargeable layer 20 and a dry air supply section 25 at the lower part thereof. The water reclaiming nozzle 24 is connected to the seawater tank 54 via a pipe 56. In addition to the water tank 54, there are further provided an oxidizer tank 51, a reducing agent tank 52 and an auxiliary tank 53. These tanks are interconnected by a pipe 55, And is connected to the recovery unit 10 of the bath 1. The oxidant solution supplied from the oxidant tank 51 is previously impregnated into the adsorption / rechargeable layer 20 of the adsorption oxidation section 12 and adsorbed while passing the gas to be treated to carry out oxidation treatment. When the harmful gas component is sufficiently adsorbed by the use of the adsorbent for a long time, the washing water supplied from the seawater tank 54 is sprayed at least twice using the washing / regeneration nozzle 24 to clean the adsorbent, 25, the hot air is supplied to dry the adsorbent, and then the oxidant liquid obtained by mixing the oxidant and the auxiliary agent with the water from the oxidant tank 51 and the auxiliary tank 53 at a suitable ratio is sprayed to the water retention nozzle 24 Regenerate the adsorbent. Thus, the oxidation treatment by the adsorption oxidation section 12 can be repeatedly performed. The adsorption oxidation unit 12 is relatively slow in the oxidation reaction rate and completely oxidizes the noxious gas which has not completely oxidized by passing through the contact oxidation unit 11 described above.
상기 흡착산화부(12)의 상부에는 제2가스공급부(6)가 배치된다. 이 제2가스공급부(6)는 처리를 위해 산화반응을 요하지 않고 환원반응만 요하는 피처리가스를 처리하는 경우에 접촉산화부(11)와 흡착산화부(12)를 거치지 않고 곧바로 접촉환원부(13)를 통과시켜서 유해가스를 처리하기 위해 사용된다.A second gas supply part (6) is disposed above the adsorption oxidation part (12). The second gas supply unit 6 is a gas supply unit that does not require an oxidation reaction for treatment but treats a gas to be treated which requires only a reduction reaction without directly contacting the contact oxidation unit 11 and the adsorption oxidation unit 12, (13) so as to treat the noxious gas.
흡착산화부(12) 또는 제2 가스공급부(6)의 상부에는 확산분리부(37)가 배치된다. 이 확산분리부(37)는 처리조(1)의 내벽과 이격되도록 배치되는 호퍼부(38)를 포함한다. 이 호퍼부(38)의 중앙배출구(39)는 처리조(1)의 일측으로 연장되는 바이패스관로(35)를 통해 처리조(1) 하단 일측의 환원제액회수부(15)로 연결된다. 그리고 이 호퍼부(38)의 상부에는 처리조(1)의 내벽과 호퍼부(38) 둘레부 사이의 통로를 덮는 링형상판(42)이 배치되고, 그 위에는 확산타공판(43)이 배치된다. 그리고 호퍼부(38)의 아래에는 또 다른 확산타공판(44)이 구비된다. 이러한 구조에 따라 상승되는 피처리가스는 확산타공판(44)과 확산타공판(43)에 충돌하면서 그 흐름이 국부적으로 흐르지 않고 넓게 확산되어 기액접촉충전재층(34)이나 흡착재충전재층(20)의 넓은 면적을 상승통과하면서 하강하는 환원제나 산화제와 원활하게 충돌, 접촉되므로 환원이나 산화반응의 효율이 증대된다. 아울러 호퍼부(38)의 둘레부로 흐른 피처리가스가 링형상판(42)에 의해 차단되어 내향하여 흐르게 되고, 상부의 기액접촉충전재층(34)을 거친 환원제액이 확산타공판(43)과 링형상판(42)을 거쳐서 낙하되면서 내향하는 피처리가스와 서로 교차하는 방향으로 흘러서 충돌하므로, 피처리가스와 훤원제액과의 접촉이 빈틈없이 이루어져서 환원효율이 더욱 높아진다.A diffusion separator 37 is disposed above the adsorption oxidation unit 12 or the second gas supply unit 6. The diffusion separation section 37 includes a hopper section 38 disposed so as to be spaced from the inner wall of the treatment tank 1. The central outlet 39 of the hopper portion 38 is connected to the reducing solution collecting portion 15 on the lower side of the lower portion of the treatment tank 1 through the bypass pipe 35 extending to one side of the treatment tank 1. A ring-shaped upper plate 42 for covering the passage between the inner wall of the treatment tank 1 and the periphery of the hopper portion 38 is disposed above the hopper portion 38 and a diffusion perforated plate 43 is disposed thereon. Under the hopper portion 38, another diffusion perforated plate 44 is provided. According to this structure, the object gas to be raised according to this structure collides with the diffusive perforated plate 44 and the diffusive perforated plate 43, and the flow thereof does not locally flow but diffuses widely to spread the gas-liquid contact filler layer 34 and the adsorbent filler layer 20 The efficiency of the reduction or oxidation reaction is increased because it smoothly collides with the oxidizing agent and the reducing agent that descends while passing through the area. The target gas flowing into the periphery of the hopper portion 38 is blocked by the ring-shaped top plate 42 and flows toward the inside so that the reducing agent solution passing through the upper gas-liquid contact filler layer 34 passes through the diffusion perforated plate 43 and the ring- The gas flows in the direction intersecting with the target gas to be inwardly dropped while passing through the gas flow channel 42, so that the contact between the gas to be treated and the coolant solution is not made clear, and the reduction efficiency is further increased.
한편, 확산분리부(37)의 상부의 접촉환원부(13)에는 기액접촉충전재가 충전된 기액접촉충전재층(34)이 수평배치되고, 그 상부에는 처리조(1) 저면의 환원제액회수부(15)와 배관(59)에 의해 연결되는 환원제분사노즐(36)이 배치된다. 이러한 환원제분사노즐(36)을 통해 환원제 및 환원보조약제가 혼합된 환원성 흡수액이 살포되어 피처리가스를 환원반응으로 중화 또는 무해화시키게 된다. 그리고 환원제분사노즐(36)의 상부에는 데미스터(7)가 배치되어 최종적으로 피처리가스에 함유된 수분을 제거한 후에 배출구(2)를 통해 배출된다.On the other hand, the gas-liquid contact filler layer 34 filled with the gas-liquid contact filler is horizontally disposed in the contact reducing part 13 on the upper part of the diffusion separating part 37, A reducing agent spraying nozzle 36 connected by the pipe 15 and the pipe 59 is disposed. The reducing absorbing liquid mixed with the reducing agent and the reducing auxiliary agent is sprayed through the reducing agent spraying nozzle 36 to neutralize or harmless the target gas by the reduction reaction. A demister (7) is disposed on the upper part of the reducing agent injection nozzle (36), and finally the moisture contained in the target gas is removed and then discharged through the discharge port (2).
이상에서 설명한 본 발명은 전술한 실시예 및 첨부된 도면에 의해 한정되는 것이 아니고, 본 발명의 기술적 사상을 벗어나지 않는 범위 내에서 여러 가지 치환, 변형 및 변경이 가능함은 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자에게 명백할 것이다.It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the inventions. It will be apparent to those of ordinary skill in the art.

Claims (1)

  1. 하부에 제1가스공급부(5)가 형성되고 상단에 가스배출구(2)가 형성된 처리조(1)와; 상기 처리조(1)의 내부 하부에 형성되는 산화제액회수부(14)와 이와 구획되는 환원제액회수부(15)를 포함하는 회수부(10)와; 상기 제1가스공급부(5) 상부에 배치되며 산화제액회수부(14)에 개방되는 기액접촉충전재층(16)과 상기 산화제액회수부(14)에 연결되며 이 기액접촉충전재층(16)에 산화제를 분사하는 산화제분사노즐(23)을 포함하는 접촉산화부(11)와; 상기 접촉산화부(11)의 상부에 배치되며 접촉산화부(11)를 거친 피처리가스가 통과되도록 배치된 기액접촉충전재층(34)과 상기 환원제액회수부(15)와 연결되며 상기 기액접촉충전재층(34)에 환원제를 분사하는 환원제분사노즐(36)을 포함하는 접촉환원부(13)와; 상기 접촉산화부(11)와 상기 접촉환원부(13)의 사이에 배치되며 상승하여 통과하는 피처리가스를 확산시키고 접촉환원부(13)에서 낙하된 환원제액을 바이패스관로(35)를 통해 상기 환원제액회수부(15)로 유도하는 확산분리부(37)를 포함하며,
    상기 접촉산화부(11)와 접촉환원부(13) 사이에는 흡착산화부(12)가 더 구비되고, 상기 흡착산화부(12)는 상기 접촉산화부(11)를 거친 피처리가스가 통과되도록 흡착재가 충전된 흡착재충전층(20)과, 상기 흡착재충전층(20)에 배치되어 재생모드에서 세척수와 산화제액을 분사하는 수세재생노즐(24)과, 상기 흡착재충전층(20)의 하부에 연결되는 건조공기공급부(25)를 포함하고, 상기 흡착재충전층(20)의 하부는 피처리가스를 확산시키고 세척수 및 산화제액을 수집 배출하는 확산수집부(27)를 포함하고,
    상기 확산분리부(37)는 상기 처리조(1)의 내벽과 이격되도록 배치되며 중앙배출구(39)가 상기 바이패스관로(35)와 연통되는 호퍼부(38)와, 상기 호퍼부(38)의 상부에 이격 배치되며 처리조(1)의 내벽과 호퍼부(38) 사이에 형성된 통로(40)를 덮는 링형상판(42)과, 상기 링형상판(42)의 상부에 배치되는 확산타공판(43)과, 상기 호퍼부(38)의 하부에 배치되는 확산타공판(44)을 포함하는 것을 특징으로 하는 유해가스 처리시스템.
    A treatment tank 1 in which a first gas supply unit 5 is formed at a lower portion and a gas discharge port 2 is formed at an upper portion; A recovery unit 10 including an oxidant solution recovery unit 14 formed in the lower portion of the treatment tank 1 and a reducing solution recovery unit 15 partitioned by the oxidant solution recovery unit 14; Liquid contact filler layer 16 disposed above the first gas supply part 5 and opened to the oxidant solution recovery part 14 and a gas-liquid contact filler layer 16 connected to the oxidant solution recovery part 14, A contact oxidation part (11) including an oxidizing agent spraying nozzle (23) for spraying an oxidizing agent; A gas-liquid contact filler layer 34 disposed above the contact oxidation part 11 and arranged to pass a gas to be treated through the contact oxidation part 11 and a gas-liquid contact filler layer 34 connected to the reducing agent solution collecting part 15, A contact reducing part (13) including a reducing agent spraying nozzle (36) for spraying a reducing agent onto the filler layer (34); The reducing agent solution dropped in the contact reducing unit 13 is diffused through the bypass line 35, which is disposed between the contact oxidizing unit 11 and the contact reducing unit 13, And a diffusion separator (37) for leading to the reducing agent remover (15)
    The adsorption oxidation unit 12 is further provided between the catalytic oxidation unit 11 and the catalytic reduction unit 13 so that the gas to be treated passing through the catalytic oxidation unit 11 is allowed to pass therethrough. A water recovery regeneration nozzle (24) disposed in the adsorption rechargeable layer (20) and spraying wash water and an oxidant solution in a regeneration mode; and an adsorbent layer Wherein the lower part of the adsorption rechargeable layer (20) includes a diffusion collector (27) for diffusing the gas to be treated and collecting and discharging the wash water and the oxidant solution,
    The diffusion separator 37 includes a hopper portion 38 spaced from an inner wall of the treatment tank 1 and having a central discharge port 39 communicating with the bypass pipe 35, Shaped top plate 42 which is disposed on the top of the ring-shaped top plate 42 and covers the passage 40 formed between the inner wall of the treatment tank 1 and the hopper 38, and a diffusion perforated plate 43 And a diffusion perforated plate (44) disposed at a lower portion of the hopper portion (38).
KR1020150134670A 2015-09-23 2015-09-23 Treatment system for harmful waste gases KR101597944B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020150134670A KR101597944B1 (en) 2015-09-23 2015-09-23 Treatment system for harmful waste gases

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020150134670A KR101597944B1 (en) 2015-09-23 2015-09-23 Treatment system for harmful waste gases

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020140062795A Division KR101569998B1 (en) 2013-06-20 2014-05-26 Treatment system for harmful waste gases

Publications (2)

Publication Number Publication Date
KR20150136035A true KR20150136035A (en) 2015-12-04
KR101597944B1 KR101597944B1 (en) 2016-02-25

Family

ID=54867615

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150134670A KR101597944B1 (en) 2015-09-23 2015-09-23 Treatment system for harmful waste gases

Country Status (1)

Country Link
KR (1) KR101597944B1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101886577B1 (en) * 2017-08-17 2018-09-06 장희현 Treatment system for harmful waste gases including NOx
WO2020122356A1 (en) * 2018-12-10 2020-06-18 케이씨코트렐 주식회사 Highly efficient wet scrubber

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0938467A (en) * 1995-07-31 1997-02-10 N E Chemcat Corp Purifying device for exhaust gas and purifying method of exhaust gas
KR100605021B1 (en) * 2006-02-06 2006-07-28 (주) 바이오에너지개발 Phase separation scrubber according to odor characteristic
KR20080016320A (en) 2006-08-18 2008-02-21 신도건공 주식회사 Method and apparatus for demisting nox from exhaust gas using reactors installed in lateral sequence
KR101001155B1 (en) * 2010-06-28 2010-12-15 지테크 주식회사 Multi-stage chemical cleaning apparatus for remove high concentration of complex odor
KR101173208B1 (en) 2011-12-01 2012-08-13 지이큐솔루션 주식회사 Reactor for treament nitrogen oxide of flue gas treatment system for glass melting furnace

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0938467A (en) * 1995-07-31 1997-02-10 N E Chemcat Corp Purifying device for exhaust gas and purifying method of exhaust gas
KR100605021B1 (en) * 2006-02-06 2006-07-28 (주) 바이오에너지개발 Phase separation scrubber according to odor characteristic
KR20080016320A (en) 2006-08-18 2008-02-21 신도건공 주식회사 Method and apparatus for demisting nox from exhaust gas using reactors installed in lateral sequence
KR101001155B1 (en) * 2010-06-28 2010-12-15 지테크 주식회사 Multi-stage chemical cleaning apparatus for remove high concentration of complex odor
KR101173208B1 (en) 2011-12-01 2012-08-13 지이큐솔루션 주식회사 Reactor for treament nitrogen oxide of flue gas treatment system for glass melting furnace

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101886577B1 (en) * 2017-08-17 2018-09-06 장희현 Treatment system for harmful waste gases including NOx
WO2020122356A1 (en) * 2018-12-10 2020-06-18 케이씨코트렐 주식회사 Highly efficient wet scrubber

Also Published As

Publication number Publication date
KR101597944B1 (en) 2016-02-25

Similar Documents

Publication Publication Date Title
KR101780698B1 (en) Treatment system for harmful waste gases including NOx
US6893484B2 (en) Low operating pressure gas scrubber
KR101653368B1 (en) Deodorizing device
KR101655356B1 (en) Apparatus for disposing Nitrogen oxides and oder removal equipment using the same
KR20160083681A (en) a deodorization apparatus of nstallation rotary-type medicinal fluid spray unit
KR101608720B1 (en) Exhaust gas purification system
KR101555672B1 (en) 2 simultaneous washing liquid deodorizer tower has an efficient separation
KR101569998B1 (en) Treatment system for harmful waste gases
KR101597944B1 (en) Treatment system for harmful waste gases
JP5177859B2 (en) Desulfurization decarburization equipment
CN108993107A (en) A kind of waste gas processing method and exhaust treatment system
KR102001359B1 (en) Treatment apparatus for offensive gas
CN104906931A (en) Nitrogen oxide waste gas treatment method and treatment system thereof
CN104226107A (en) Composite bed treatment method and equipment of waste gas
KR101883659B1 (en) Simultaneous cleaning and deodorizing tower with two-component simultaneous distribution function of malodorous gas
KR20140114119A (en) Purifier of harmful gases for a laboratory equipment
JP2007319832A (en) Exhaust gas treatment method and exhaust gas treatment apparatus
KR101997185B1 (en) Liquid Cleaning Deodorant Device Using Catalyst Oxidation Water
US20060185517A1 (en) Multi-stage odor scrubber
CN201613106U (en) Stuffing spray-washing sewage deodorizing device
KR101915440B1 (en) Treatment system for harmful waste gases including NOx
KR101494845B1 (en) Deodorizing System
KR101886577B1 (en) Treatment system for harmful waste gases including NOx
KR101768007B1 (en) Treatment apparatus and method for offensive gas
KR101591849B1 (en) Washer type deodorizing apparatus

Legal Events

Date Code Title Description
A201 Request for examination
A107 Divisional application of patent
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20190111

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20191226

Year of fee payment: 5