KR20150134010A - Touch window - Google Patents

Abstract

According to one embodiment of the present invention, a touch window comprises: a substrate; an electrode layer disposed in the shape of a mesh on the substrate; a first protection layer formed to be adjacent to at least one side of the electrode layer; and a second protection layer disposed on the electrode layer and the first protection layer.

Description

Touch window {TOUCH WINDOW}

An embodiment relates to a touch window.

2. Description of the Related Art In recent years, a touch panel has been applied to an image displayed on a display device in various electronic products by a method of touching an input device such as a finger or a stylus.

The touch panel is typically divided into a resistive touch panel and a capacitive touch panel. The resistance film type touch panel senses that the resistance changes according to the connection between the electrodes when the pressure is applied to the input device, and the position is detected. A capacitance type touch panel senses a change in electrostatic capacitance between electrodes when a finger touches them, thereby detecting the position. Considering the convenience of the manufacturing method and the sensing power, recently, in a small model, the electrostatic capacity method has attracted attention.

As the transparent electrode of such a touch panel, generally known indium tin oxide (ITO) may be used. However, in the case of the ITO electrode, there are many problems. The ITO electrode is relatively expensive due to the scarcity of the indium material constituting ITO and the vacuum process such as sputtering or chemical vapor deposition for ITO coating. In addition, the ITO electrode is physically easily struck by the bending and warping of the substrate, which deteriorates the characteristics of the electrode, and thus the ITO electrode is not suitable for a flexible device. In addition, the ITO electrode exhibits a high resistance characteristic and has a limit to the large-sized surface. In order to solve such problems, active researches on alternative electrodes are under way. In particular, a metal material is formed in a mesh shape to replace ITO.

However, when an electrode is formed of a metal material and a transparent adhesive layer such as OCA or OCR is formed on the electrode, the transparent adhesive layer may be discolored over a long period of time to cause problems in optical characteristics, There is a problem in driving characteristics. Particularly, in the case of a touch window used for a vehicle, it is exposed to high temperature, cryogenic temperature or high humidity for a long time, and there is a problem in reliability.

The embodiment attempts to provide a touch window with improved reliability.

A touch window according to an embodiment includes: a substrate; An electrode layer disposed on the substrate in a mesh form; A first protective layer formed to contact at least one surface of the electrode layer; And a second protective film disposed on the electrode layer and the first protective film.

The touch window according to the embodiment is formed such that the first protective film contacts at least one surface of the electrode with the electrode. Thus, it is possible to prevent oxidation of the electrode, improve the adhesion of the electrode, prevent reflection, and improve the problems caused by the total reflection characteristic of the metal.

Further, the second protective film is further formed on the first protective film to prevent oxidation of the electrodes even at high temperature and high humidity, and to prevent deterioration of driving characteristics and optical characteristics even at a very low temperature and improve reliability. In addition, the second protective film is disposed between the electrode and the transparent adhesive layer, and it is possible to solve the problem of discoloration of the transparent adhesive layer which is generated by the electrode and the transparent adhesive layer being in contact with each other. In addition, the second protective layer may be formed to have a much thicker thickness than the electrodes, thereby reducing a step due to the electrodes. As a result, the step is reduced and the occurrence of bubbles is reduced when the transparent adhesive layer is formed.

Further, when the second protective film is formed of a photocurable resin, the transparent bonding layer may be omitted. As a result, a touch window and a touch device having a thin thickness can be formed.

1 is a plan view of a touch window according to an embodiment.
FIG. 2 is a cross-sectional view showing a section cut along AA 'in FIG. 1; FIG.
3 to 11 are cross-sectional views of a touch window according to other embodiments.
12 is a cross-sectional view of a display device including a touch window according to an embodiment.
13 to 16 are views showing an example of a touch device to which a touch window according to the embodiment is applied.

In the description of the embodiments, it is to be understood that each layer (film), area, pattern or structure may be referred to as being "on" or "under / under" Quot; includes all that is formed directly or through another layer. The criteria for top / bottom or bottom / bottom of each layer are described with reference to the drawings.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a plan view of a touch window according to an embodiment, and FIG. 2 is a cross-sectional view taken along line A-A 'in FIG. 3 to 11 are cross-sectional views of a touch window according to other embodiments. FIG. 12 is a cross-sectional view of a display device including a touch window according to an embodiment, and FIGS. 13 to 17 are views showing an example of a touch device to which a touch window according to an embodiment is applied.

First, a touch window according to an embodiment will be described with reference to FIGS. 1 and 2. FIG. 1 and 2, the touch window 10 according to the embodiment includes a valid area AA for sensing the position of an input device (e.g., a finger or the like) And a non-effective area UA is defined.

Here, the electrode unit 200 may be formed in the effective area AA to sense the input device. In the non-effective area UA, a wiring 110 for electrically connecting the electrode unit 200 may be formed. Although not shown in the drawing, an external circuit or the like connected to the wiring 110 may be located in the ineffective area UA.

When an input device such as a finger is brought into contact with such a touch window, a capacitance difference occurs at a portion where the input device is contacted, and a portion where such a difference occurs can be detected as the contact position. The touch window will be described in more detail as follows.

The substrate 100 may be formed of various materials capable of supporting the electrode unit 200, the wiring 110, and the circuit board formed thereon. The substrate 100 may comprise glass or plastic. For example, the substrate 100 may comprise tempered glass, semi-tempered glass, soda lime glass, reinforced plastic or soft plastic. In addition, the substrate 100 may include an optically isotropic film. For example, the substrate 100 may include a cyclic olefin copolymer (COC), a cyclic olefin polymer (COP), a polycarbonate (PC), a light polymethyl methacrylate (PMMA), or the like.

Wirings 110 are formed on the non-effective area UA of the substrate 100. The wiring 110 may apply an electrical signal to the electrode unit 200. The wiring 110 may be formed in the ineffective area UA so as to be invisible.

Meanwhile, although not shown in the figure, a circuit board connected to the wiring 110 may further be positioned. As the circuit board, various types of printed circuit boards can be applied. For example, a flexible printed circuit board (FPCB) or the like can be applied.

In addition, an outer dummy layer (not shown) may be formed on the ineffective area UA of the substrate 100. The outer dummy layer may be formed by applying a material having a predetermined color so that the wiring 110 and a printed circuit board connecting the wiring 110 to an external circuit can not be seen from the outside. The outer dummy layer may have a color suitable for a desired appearance, for example, a black color including black pigment and the like. A desired logo can be formed on the outer dummy layer by various methods. Such an outer dummy layer can be formed by vapor deposition, printing, wet coating or the like.

The electrode unit 200 may be formed on the effective area AA of the substrate 110. The electrode unit 200 may be disposed on the effective area AA to sense a touch. That is, the electrode unit 200 can sense whether or not an input device such as a finger is in contact. The electrode unit 200 includes a first electrode unit 210 and a second electrode unit 220.

The first electrode unit 210 includes a first sensor unit 230 and a first sensor connection unit 250 that connects the first sensor unit 230. The first sensor unit 230 may extend in one direction. The first sensor connection part 250 may connect the first sensor part 230 in one direction.

The second electrode unit 220 includes a second sensor unit 240 and a second sensor connection unit 260 connecting the second sensor unit 240. The second sensor unit 240 may extend in the other direction intersecting the one direction. Also, the second sensor connection unit 260 may connect the second sensor unit 240 in the other direction.

The first sensor unit 230, the second sensor unit 240, and the second sensor connection unit 260 are disposed on the substrate 100. The first sensor unit 230, the second sensor unit 240, and the second sensor connection unit 260 may be disposed in direct contact with the substrate 100. The first sensor unit 230, the second sensor unit 240, and the second sensor connection unit 260 are disposed on the same plane.

Meanwhile, the first sensor connection unit 250 electrically connects the first sensor unit 230. At this time, the insulation part 420 is disposed between the first sensor connection part 250 and the second sensor connection part 260. The first sensor connection part 250 and the second sensor connection part 260 may be electrically short-circuited through the insulation part 420. The insulating portion 420 may be formed of a transparent insulating material that can insulate the first sensor connecting portion 250 and the second sensor connecting portion 260. For example, the insulating portion 420 may be formed of a metal oxide such as silicon oxide, or an acrylic resin or the like.

In FIG. 1, the electrode unit 200 includes two kinds of electrode units 200 extending in one direction and extending in another direction, but the present invention is not limited thereto. Therefore, the electrode unit 200 may include only a shape extending in one direction.

1, the electrode unit 200 is arranged in a rhombic shape. The electrode unit 200 may be arranged in various shapes such as a bar, a triangle, a polygon such as a rectangle, a circle, a linear H-shape, or an ellipse.

Meanwhile, the electrode unit 200 is arranged in a mesh shape. At this time, the mesh shape can be formed at random to prevent moire phenomenon. Moire phenomenon is a pattern caused by superimposing periodic stripes. It is a phenomenon in which neighboring stripes are overlapped and the thickness of the stripes becomes thicker than other stripes. Therefore, in order to prevent such a moire phenomenon, the conductive pattern shape may be variously arranged.

Specifically, the electrode unit 200 includes a mesh opening OA and a mesh line LA. At this time, the line width of the mesh line portion LA may be 0.1 μm to 10 μm. The mesh line portion LA having a line width of 0.1 mu m or less may not be possible in the manufacturing process. When the line width is 10 탆 or less, the pattern of the electrode unit 200 can be made invisible. Preferably, the line width of the conductive pattern line portion LA may be between 1 μm and 7 μm. More preferably, the line width of the conductive pattern line portion LA may be 2 [mu] m to 5 [mu] m.

Meanwhile, as shown in FIG. 1, the mesh opening OA may have a rectangular shape. However, the embodiment is not limited thereto, and the mesh opening OA may have various shapes such as a diamond shape, a pentagon, a hexagonal polygonal shape, or a circular shape.

Since the electrode unit 200 has a mesh shape, the pattern of the electrode unit 200 on the effective area AA can be made invisible. That is, even if the electrode unit 200 is formed of metal, the pattern can be made invisible. Also, the resistance of the touch window can be lowered even if the electrode unit 200 is applied to a touch window of a large size. In addition, when the electrode unit 200 is formed by a printing process, a high quality touch window can be secured by improving the printing quality.

Referring to FIG. 2, the electrode unit 200 may include a pattern layer 280 and an electrode layer 270. At this time, the pattern layer 280 may include a first sub pattern 281 and a second sub pattern 282. A first protective layer 140 is formed to be in contact with at least one surface of the electrode layer 270 and a second protective layer 150 disposed on the electrode layer 270 and the first protective layer 140 is formed.

The first sub pattern 281 is formed on the substrate 100 and is disposed on the mesh line portion LA. Accordingly, the first sub patterns 281 are arranged in a mesh shape. The first sub-pattern 281 may be embossed.

The second subpattern 282 is formed on the substrate 100 and is disposed in the mesh opening OA. Thus, the second subpattern 282 may be disposed between the first subpatterns 281. The second subpattern 282 may be embossed.

The first sub-pattern 281 and the second sub-pattern 282 may include a resin or a polymer. At this time, the first sub pattern 281 and the second sub pattern 282 may be formed by an imprinting process. For example, the substrate 100 is coated with a resin composition or a polymer. Thereafter, a mold having a pattern to be formed on the resin composition or the polymer is placed and imprinted thereon. Although the first sub pattern 281 and the second sub pattern 282 are shown as angled protrusions on the drawing, the shapes of the protrusions may be variously formed as needed.

The electrode layer 270 is disposed on the first sub pattern 281. The electrode layer 270 may be disposed entirely on the first sub pattern 281. Although the widths of the first sub pattern 281 and the electrode layer 270 are shown on the drawing, the width of the electrode layer 270 may be smaller than the width of the first sub pattern 281. In addition, the electrode layer 270 may be disposed so as to surround the first sub pattern 281.

The electrode layer 270 is disposed on the mesh line LA and the electrode layer 270 is disposed on the mesh. The electrode layer 270 may include various metals having excellent electrical conductivity. For example, the electrode layer 270 may include Cu, Au, Ag, Al, Ti, Ni, or an alloy thereof.

The first passivation layer 140 is formed to contact at least one surface of the electrode layer 270. For example, the first passivation layer 140 may be formed only on the upper surface of the electrode layer 270 or only on the lower surface of the electrode layer 270. The first passivation layer 140 may be formed on the upper and lower surfaces of the electrode layer 270.

The first passivation layer 140 is formed on at least one surface of the electrode layer 270 to prevent oxidation of the electrode layer 270 formed of a metal and to prevent reflection due to the total reflection characteristic of the metal. When the first protective layer 140 is formed on the lower surface of the electrode layer 270, the first protective layer 140 is formed between the first subpattern 281 and the electrode layer 270, The adhesion between the first sub pattern 270 and the first sub pattern 281 can be improved.

The first passivation layer 140 may be formed of a blackening material layer. The blackening material layer may be a black metal oxide. For example, any one selected from CuO, CrO, FeO, and Ni 2 O 3 may be applied, but the present invention is not limited thereto, and a black-based material capable of suppressing the reflectivity of the electrode layer 270 can be applied.

The first passivation layer 140 and the electrode layer 270 may be formed simultaneously or separately. For example, a plurality of material layers are formed on the entire surface of the substrate 100 including the first sub-pattern 281 and the second sub-pattern 282. The plurality of material layers may be formed by sequentially laminating a blackening material layer, an electrode material layer, and a blackening material layer. In addition, the plurality of material layers may be formed by sequentially laminating a blackening material layer and an electrode material layer. In addition, the plurality of material layers may be formed by sequentially laminating an electrode material layer and a blackening material layer.

At this time, the plurality of material layers are formed on the upper surface of the first sub pattern 281 and the upper surface of the second sub pattern 282. Thereafter, the plurality of material layers are etched. At this time, depending on the structure of the first sub pattern 281 and the second sub pattern 282, there is a difference in the bonding area and the etching area of the plurality of material layers.

The bonding area between the first subpattern 281 and the plurality of material layers is formed to be larger than the bonding area between the second subpattern 282 and the plurality of material layers. As the etch proceeds at the same etch rate, a number of material layers formed on the first subpattern 281 remain and a plurality of material layers formed on the second subpattern 282 are etched away. That is, a plurality of material layers formed on the second sub pattern 282 can be lifted off and removed.

Therefore, the electrode layer 270 and the first passivation layer 140 may be formed only on the first subpattern 281. In addition, the electrode layer 270 may be arranged in a mesh shape. The first passivation layer 140 may be formed to contact at least one surface of the electrode layer 270 according to the structure of the plurality of material layers. However, the method of forming the electrode layer 270 and the first passivation layer 140 is not limited thereto, and a method of forming the first passivation layer 140 on at least one surface of the electrode layer 270 is sufficient.

A second passivation layer 150 is formed on the electrode layer 270 and the first passivation layer 140. When the first protective layer 140 is formed only on the upper and lower surfaces of the electrode layer 270, the second protective layer 150 may be in contact with the side surface of the electrode layer 270. Therefore, the second passivation layer 150 can prevent the electrode layer 270 from being oxidized. When the first protective layer 140 is formed only on the lower surface of the electrode layer 270, the second protective layer 150 may be in contact with the upper surface and side surfaces of the electrode layer 270.

The second passivation layer 150 may surround the electrode layer 270. At this time, the second protective layer 150 may be formed only on the electrode part 200 surrounding the electrode layer 270. Also, the second protective layer 150 may be formed only on the effective area AA of the substrate 100. The second protective layer 150 may be formed on the entire surface of the substrate 100.

The thickness of the second protective layer 150 may be in the range of 1 탆 to 100 탆. When the second protective layer 150 is formed to a thickness of less than 1 탆, the electrode layer 270 may be oxidized at a temperature of about 80 캜 or more or 90% or more. The thickness of the second protective layer 150 may be greater than the thickness of the substrate 100 so that the substrate 100 is electrically connected to the electrode unit 200 And the second protective film 150 are difficult to support. Therefore, the thickness of the second protective layer 150 may be in the range of 1 탆 to 100 탆. Preferably, the thickness of the second passivation layer 150 may be between 5 and 50 탆. More preferably, the thickness of the second protective layer 150 may be 8 to 25 占 퐉.

The thickness of the first sub pattern 281 is about 1 μm to 2 μm and the thickness of the first protective layer 140 and the electrode layer 270 is about 300 nm to 500 nm. A step is formed in each region due to the thickness of each of the first sub pattern 281, the second sub pattern 282, the electrode layer 270, and the first protective film 140. This step may cause bubbles when the transparent adhesive layer is formed on the substrate 100 in the future.

Therefore, the thickness of the second protective layer 150 may be greater than the thickness of the second protective layer 150, thereby reducing the level difference. Further, as the thickness is increased, the step difference is substantially eliminated. In addition, the step is reduced, and bubble formation can be removed when a transparent adhesive layer or the like is formed later.

The conventional touch window is oxidized by natural oxidation of the electrode layer 270 or by inflow of external moisture or air when a long time elapses in a high temperature or high humidity environment and driving characteristics such as resistance and color and optical characteristics are deteriorated There was a problem. Particularly, in the case of a touch window to be applied to a vehicle, such a problem is further highlighted. In the case of a touch device for a vehicle, the device is exposed to a higher temperature or a higher humidity than a portable touch device in a manufacturing process, and a long process is required. In addition, there is a problem in that even when used, it is easily exposed to a cryogenic temperature, high temperature or high humidity environment.

Further, when the electrode layer 270 is in contact with a transparent adhesive layer such as OCA or OCR, such as forming a cover substrate or bonding the touch window to the touch panel, the transparent adhesive layer may be discolored. In addition, there is a problem that the component of the transparent adhesive layer penetrates into the electrode layer 270 and causes oxidation of the electrode layer 270.

Accordingly, the touch window according to the embodiment includes the first passivation layer 140 and the second passivation layer 150 to protect the electrode layer 270 to prevent oxidization. The second protective layer 150 may be formed of a material that is excellent in chemical resistance and is not affected by a high temperature or high humidity environment. Also, the second passivation layer 150 may be formed of a material having a light transmittance of 90% or more. For example, the second protective layer 150 may be formed of any one selected from the group consisting of parylene, UV resin, and polydimethylsiloxane (PDMS). At this time, even if the second protective layer 150 is formed to have a thickness of 1 to 100 탆, a light transmittance of 90% or more can be secured.

The second passivation layer 150 may be formed in a vacuum state. For example, when the second protective layer 150 is formed of paralin, it may be formed by CVD adsorption or a low-temperature deposition method. However, the forming method is not limited thereto. When the second protective layer 150 is formed in a vacuum state, bubbles are not generated in the lower portion of the second protective layer 150. In addition, a transparent adhesive layer is formed on the second passivation layer 150, and the second passivation layer 150 can prevent the transparent adhesion layer from contacting the electrode layer 270.

When the second protective layer 150 is formed of UV resin, the second protective layer 150 may be formed by applying UV resin on the substrate 100 on which the electrode unit 200 is formed and curing the UV resin. At this time, the UV resin may serve as an adhesive layer. For example, a cover substrate or a display panel may be disposed before curing the UV resin, and the UV resin may be cured to bond the touch window and the cover substrate or the display panel according to the embodiment. As a result, the transparent adhesive layer can be omitted, and the thickness of the touch window can be reduced.

Hereinafter, a touch window according to another embodiment will be described with reference to FIG. The description overlapping with the embodiment described above may be omitted. The same reference numerals are assigned to the same components.

Referring to FIG. 3, a substrate 100 is defined in which a valid region and an ineffective region disposed around the valid region are defined. The electrode unit 200 is formed in the effective region of the substrate 100. The electrode unit 200 may include a pattern layer 280 and an electrode layer 270. At this time, the pattern layer 280 may include a first sub pattern 281 and a second sub pattern 282. A first protective layer 141 is formed to surround the electrode layer 270. A second passivation layer 150 is formed on the electrode layer 270 and the first passivation layer 141.

The first passivation layer 141 may surround the electrode layer 270. For example, the first protective layer 141 may surround the upper surface and the side surfaces of the electrode layer 270. That is, the first protective layer 141 may surround the exposed front surface of the electrode layer 270. The first passivation layer 141 may surround the upper surface, the lower surface, and the side surfaces of the electrode layer 270. That is, the first passivation layer 141 may surround the entire surface of the electrode layer 270 formed of a metal. As a result, oxidation can be prevented and reflection due to the total reflection characteristic of the metal can be prevented.

The first passivation layer 141 may be formed of a blackening material layer. The blackening material layer may be a black metal oxide. For example, any one selected from CuO, CrO, FeO, and Ni 2 O 3 may be applied, but the present invention is not limited thereto, and a black-based material capable of suppressing the reflectivity of the electrode layer 270 can be applied.

The first passivation layer 141 and the electrode layer 270 may be formed simultaneously or separately. For example, a first layer of blackening material is formed on the entire surface of the substrate 100 including the first sub-pattern 281 and the second sub-pattern 282. At this time, the first blackening material layer is formed on the upper surface of the first subpattern 281 and the upper surface of the second subpattern 282.

Thereafter, the first blackening material layer is etched. A difference in the bonding area and the etching area of the first blackening material layer occurs depending on the structure of the first sub pattern 281 and the second sub pattern 282. As a result, the first blackening material layer formed on the second subpattern 282 is lifted off and the first blackening material layer formed on the first subpattern 281 remains. That is, a first blackening material pattern formed only on the first sub pattern 280 is formed.

Thereafter, an electrode material layer is formed on the entire surface of the substrate 100 on which the first blackening material pattern is formed. The electrode material layer is formed on the upper surface of the first subpattern 281 and the upper surface of the second subpattern 282 and the electrode material layer formed on the second subpattern 282 is etched. Thus, the electrode material layer formed on the first sub pattern 281 and the first black material pattern becomes the electrode layer 270. That is, the first blackening material pattern is formed to be in contact with the bottom surface of the electrode layer 270.

At this time, the width of the electrode layer 270 is smaller than the width of the first sub pattern 281. That is, the end of the first sub pattern 281 is formed outwardly of the end of the electrode layer 270.

Thereafter, a second blackening material layer is formed on the entire surface of the substrate 100 on which the electrode layer 270 is formed. Since the width of the electrode layer 270 is smaller than the width of the first subpattern 281, a second blackening material layer formed on the first subpattern 281 is formed to surround the electrode layer 270 . That is, the second blackening material layer formed on the first sub pattern 281 is formed to be in contact with the upper surface and the side surface of the electrode layer 270.

Thereafter, the second blackening material layer formed on the second subpattern 282 is removed by etching the second blackening material layer, leaving only the second blackening material layer formed on the upper surface of the first subpattern 281. Accordingly, a second blackening material pattern formed to surround the top and side surfaces of the electrode layer 270 is formed. The first blackening material pattern formed on the lower surface of the electrode layer 270 and the second blackening material pattern formed on the upper surface and the side surfaces of the electrode layer 270 are integrally connected to form the first protective layer 141 . That is, the first protective layer 141 may be formed to surround the entire surface of the electrode layer 270.

In addition, when the first blackening material layer is omitted and the electrode layer 270 is formed first as an electrode material layer, the first protective layer 141 is not disposed on the lower surface of the electrode, . That is, the first passivation layer 141 may be formed to surround the exposed three sides of the electrode layer 270.

However, the method of forming the electrode layer 270 and the first passivation layer 141 is not limited thereto, and a method of forming the first passivation layer 140 around the electrode layer 270 is sufficient.

A second passivation layer 150 is formed on the electrode layer 270 and the first passivation layer 141. The second passivation layer 150 is formed to surround the upper surface and side surfaces of the first passivation layer 141. The first passivation layer 141 and the second passivation layer 150 may be formed to surround the electrode layer 270 to prevent the electrode layer 270 from being oxidized.

The second protective layer 150 may be formed only on the electrode unit 200. Also, the second protective layer 150 may be formed only on the effective region of the substrate 100. The second protective layer 150 may be formed on the entire surface of the substrate 100.

The thickness of the second protective layer 150 may be in the range of 1 탆 to 100 탆. Preferably, the thickness of the second passivation layer 150 may be between 5 and 50 탆. More preferably, the thickness of the second protective layer 150 may be 8 to 25 占 퐉.

The second protective layer 150 may be formed of a material that is excellent in chemical resistance and is not affected by a high temperature or high humidity environment. Also, the second passivation layer 150 may be formed of a material having a light transmittance of 90% or more. For example, the second protective layer 150 may be formed of parylene, UV resin, or polydimethylsiloxane (PDMS).

Accordingly, even if the touch window according to the embodiment is exposed to a high temperature or high humidity environment for a long time, the oxidation of the electrode layer 270 is prevented, and driving characteristics and optical characteristics can be prevented from deteriorating.

Hereinafter, a touch window according to another embodiment will be described with reference to FIG. The description overlapping with the embodiment described above may be omitted. The same reference numerals are assigned to the same components.

Referring to FIG. 4, a substrate 100 is defined in which a valid region and an ineffective region disposed around the valid region are defined. The electrode unit 200 is formed in the effective region of the substrate 100. The electrode unit 200 may include a pattern layer 280 and an electrode layer 270. At this time, the pattern layer 280 may include a first sub pattern 281 and a second sub pattern 282. The first passivation layer 140 is formed to contact at least one surface of the electrode layer 270. A second passivation layer 150 is formed on the electrode layer 270 and the first passivation layer 140.

The first protective layer 140 may be formed to be in contact with at least one surface of the electrode layer 270. The first protective layer 140 may be in contact with at least one surface of the electrode layer 270. [ The first passivation layer 140 may surround the exposed top surfaces and side surfaces of the electrode layer 270. The first passivation layer 140 may surround the top surface, the side surface, and the bottom surface of the electrode layer 270.

A third protective layer 160 may be formed between the pattern layer 280 and the substrate 100. The third protective layer 160 may be formed only between the pattern layer 280 and the substrate 100 under the electrode unit 200. Also, the third protective layer 160 may be formed only on the effective region of the substrate 100. The third protective layer 160 may be formed on the entire surface of the substrate 100.

The third protective layer 160 may be formed between the substrate 100 and the electrode unit 200 to protect the electrode unit 200 from oxygen and moisture introduced from the back surface or the side surface of the substrate 100 . The third protective layer 160 may protect the electrode portion 200 and the electrode layer 270 together with the first protective layer 140 and the second protective layer 150 in a high temperature and high humidity environment .

The thickness of the third passivation layer 160 may range from 1 to 100 탆. When the third protective layer 160 is formed to a thickness of 1 탆 or more, the electrode portion 200 can be sufficiently protected in a high temperature and high humidity environment. When the third protective layer 160 is formed to have a thickness of more than 100 탆, the thickness of the third protective layer 160 may be thicker than that of the substrate 100. It is difficult for the substrate 100 to support the electrode unit 200, the second protective film 150, and the third protective film 160.

Accordingly, the third protective layer 160 may have a thickness of 1 to 100 mu m. Preferably, the thickness of the second passivation layer 150 may be between 5 and 50 탆. More preferably, the thickness of the second protective layer 150 may be 8 to 25 占 퐉.

The third protective layer 160 may be formed of a material which is excellent in chemical resistance and is not affected by a high temperature or high humidity environment. In addition, the third protective layer 160 may be formed of a material having a light transmittance of 90% or more. For example, the third protective layer 160 may be formed of one selected from the group consisting of parylene, UV resin, and polydimethylsiloxane (PDMS). At this time, even if the third protective layer 160 is formed to have a thickness of 1 to 100 탆, a light transmittance of 90% or more can be secured.

The third passivation layer 160 may be formed in a vacuum state. For example, when the third protective film 160 is formed of paralin, it may be formed by CVD adsorption or a low-temperature deposition method. However, the forming method is not limited thereto. When the second protective layer 160 is formed in a vacuum state, no air bubbles are generated under the third protective layer 160. Accordingly, the flat third protective layer 160 can be formed, and the electrode portion 200 formed on the third protective layer 160 can be stably formed.

When the third protective layer 160 is formed of UV resin, the third protective layer 160 may be formed by applying UV resin on the substrate 100 and curing the UV resin. At this time, the UV resin may serve as an adhesive layer. The third passivation layer 160 may be formed between the substrate 100 and the pattern layer 280 to prevent the pattern layer 280 from being separated or removed from the substrate 100.

Hereinafter, a touch window according to another embodiment will be described with reference to FIG. The description overlapping with the embodiment described above may be omitted. The same reference numerals are assigned to the same components.

Referring to FIG. 5, a substrate 100 is defined in which a valid region and an ineffective region disposed around the valid region are defined. The electrode unit 200 is formed in the effective region of the substrate 100. The electrode unit 200 may include a pattern layer 280 and an electrode layer 270. At this time, the pattern layer 280 may include a first sub pattern 281 and a second sub pattern 282. The first passivation layer 140 is formed to contact at least one surface of the electrode layer 270. A second passivation layer 150 is formed on the electrode layer 270 and the first passivation layer 140.

The first protective layer 140 may be formed to be in contact with at least one surface of the electrode layer 270. The first protective layer 140 may be in contact with at least one surface of the electrode layer 270. [ The first passivation layer 140 may surround the exposed top surfaces and side surfaces of the electrode layer 270. The first passivation layer 140 may surround the top surface, the side surface, and the bottom surface of the electrode layer 270.

A transparent adhesive layer 170 is formed on the second protective layer 150. The transparent adhesive layer 170 may be an optical clear adhesive (OCA) or an optical clear resin (OCR). The transparent adhesive layer 170 serves to attach the second protective layer 150 and the cover substrate 50 to each other. The cover substrate 50 may protect the substrate 100 on which the electrode unit 200 and the electrode unit 200 are formed.

The cover substrate 50 may comprise glass or plastic. For example, the cover substrate 50 may comprise tempered glass, semi-tempered glass, soda lime glass, reinforced plastic or soft plastic. In addition, the cover substrate 50 may include an optically isotropic film. For example, the substrate 100 may include a cyclic olefin copolymer (COC), a cyclic olefin polymer (COP), a polycarbonate (PC), a light polymethyl methacrylate (PMMA), or the like.

The second protective layer 150 may be disposed between the transparent adhesive layer 170 and the electrode unit 200. Accordingly, the transparent adhesive layer 170 and the electrode unit 200 may be spaced apart from each other. In addition, the electrode unit 200 may be disposed so that the electrode layer 270 and the transparent adhesion layer 170 are spaced apart from each other.

When the electrode layer 270 is in contact with the transparent adhesive layer 170, there is a problem that the transparent adhesive layer 170 is discolored when a long time elapses. Further, there is a problem that the component of the transparent adhesive layer 170 penetrates into the electrode layer 270 to cause oxidation of the electrode layer 270. In particular, when exposed for a long time in a high temperature or high humidity environment, the transparent adhesive layer 170 is discolored and driving characteristics and optical characteristics of the electrode layer 270 are deteriorated.

Accordingly, the touch window according to the embodiment includes the first passivation layer 140 and the second passivation layer 150, so that the transparent adhesion layer 170 and the electrode layer 270 can be formed apart from each other. In addition, the electrode layer 270 can be protected to prevent oxidization.

The second protective layer 150 may be formed of a material that is excellent in chemical resistance and is not affected by a high temperature or high humidity environment. Also, the second passivation layer 150 may be formed of a material having a light transmittance of 90% or more. For example, the second protective layer 150 may be formed of any one selected from the group consisting of parylene, UV resin, and polydimethylsiloxane (PDMS). At this time, even if the second protective layer 150 is formed to have a thickness of 1 to 100 탆, a light transmittance of 90% or more can be secured.

When the second protective layer 150 is formed of UV resin, the second protective layer 150 may be formed by applying UV resin on the substrate 100 on which the electrode unit 200 is formed and curing . At this time, the transparent adhesive layer 170 may be omitted. That is, the cover substrate 50 may be formed on the second protective layer 150 so as to be in contact with the second protective layer 150.

For example, the cover substrate 50 can be adhered by placing the cover substrate 50 before the UV resin curing and curing the UV resin. That is, the second protective layer 150 formed of the UV resin may serve as an adhesive layer. Therefore, the thickness of the touch window according to the embodiment can be reduced.

Hereinafter, a touch window according to another embodiment will be described with reference to FIG. The description overlapping with the embodiment described above may be omitted. The same reference numerals are assigned to the same components.

Referring to FIG. 6, a substrate 100 is defined in which a valid region and an ineffective region disposed around the valid region are defined. The electrode portion 300 is formed in the effective region of the substrate 100. The electrode unit 300 may include a pattern layer 380 and an electrode layer 370. At this time, the pattern layer 380 may be formed with a groove. That is, the pattern layer 380 may include a depressed portion 381 and an embossed portion 382.

The engraved portion 381 is disposed on the mesh line portion LA on the substrate 100. Accordingly, the engraved portions 381 are arranged in a mesh shape. The embossment 382 is disposed in the mesh opening OA on the substrate 100. That is, the embossed portion 382 may be disposed between the engraved portion 381 and another engraved portion 381 adjacent thereto. The embossed portion 382 may be formed at the same time when the engraved portion 381 is formed. Although the embossed portion 382 is shown as an angled protrusion on the drawing, the shape of the protruded portion may be variously formed as necessary.

The pattern layer 380 may include a resin or a polymer. The engraved portion 381 may be formed by an imprinting process. That is, the engraved portion 381 may be formed by coating a resin or a polymer on the substrate 100, placing the mold on the upper portion and imprinting the mold.

The electrode layer 370 may be disposed in the depressed portion 381. That is, the electrode layer 370 may be formed by filling an electrode material in the depressed portion 381. Therefore, the number of processes, the process time, and the process cost can be reduced as compared with the conventional deposition and photolithography processes.

The electrode material forming the electrode layer 370 may be filled while the doctor knife moves in contact with the pattern layer 380. The electrode layer 370 may include a binder and conductive particles dispersed in the binder. The conductive particles are dispersed in the binder. The conductive particles are uniformly dispersed in the binder, so that the uniformity of the electrode layer 370 can be improved. The conductive particles may include Cu, Au, Ag, Al, Ti, Ni, or an alloy thereof.

The electrode layer 370 is disposed in the recessed portion 381 and is disposed in the mesh line portion LA. Therefore, the electrode layer 370 is arranged in a mesh shape. The mesh shape can be randomly formed to prevent moire phenomenon.

A first protective layer 140 is formed to contact at least one surface of the electrode layer 370. For example, the first protective layer 140 may be formed only on the upper surface of the electrode layer 370 or only on the lower surface of the electrode layer 370. The first passivation layer 140 may be formed on the upper and lower surfaces of the electrode layer 270. The first passivation layer 140 is formed on at least one surface of the electrode layer 370 to prevent oxidation of the electrode layer 370 formed of metal and to prevent reflection due to the total reflection characteristic of the metal.

When the first protective layer 140 is formed on the lower surface of the electrode layer 370, the first protective layer 140 may be disposed in the depressed portion 381 of the pattern layer 380. When the first protective layer 140 is formed on the upper surface of the electrode layer 370, the first protective layer 140 may be disposed in the depressed portion 381. That is, the height of the engraved portion 381 may be equal to the sum of the thickness of the first protective layer 140 and the thickness of the electrode layer 370.

The first passivation layer 140 may be formed of a blackening material layer. The blackening material layer may be a black metal oxide. For example, any one selected from CuO, CrO, FeO, and Ni 2 O 3 may be applied, but the present invention is not limited thereto, and a black-based material capable of suppressing the reflectivity of the electrode layer 270 can be applied.

The first protective layer 140 and the electrode layer 370 may be formed simultaneously or separately. For example, a first blackening material layer may be formed to a thickness smaller than the height of the engraved portion 381, and an electrode material layer may be formed on the first blackening material layer to a thickness smaller than the height of the engraved portion 381 And a second blackening material layer is formed on the electrode material layer. The first protective film 140 and the electrode layer 370 are disposed only on the engraved portion 381 of the pattern layer 380 while moving the doctor knife in contact with the boss portion 382 of the pattern layer 380. [ . At this time, the first protective layer 140 may be formed to be in contact with the upper and lower surfaces of the electrode layer 370.

Therefore, the electrode layer 370 and the first protective film 140 may be formed only in the engraved portion 381. In addition, the electrode layer 370 may be arranged in a mesh shape. The step of forming the first blackening material layer may be omitted or the step of forming the second blackening material layer may be omitted so that the first protective film 140 may be formed only on the upper surface or the lower surface of the electrode layer 370 have. However, the method of forming the electrode layer 370 and the first passivation layer 140 is not limited thereto, and a method of forming the first passivation layer 140 on at least one surface of the electrode layer 370 is sufficient.

A second passivation layer 150 is formed on the electrode layer 370 and the first passivation layer 140. When the first passivation layer 140 is formed on the upper surface of the electrode layer 370, the second passivation layer 150 may be in contact with the upper surface of the first passivation layer 140. Accordingly, the first passivation layer 140 and the second passivation layer 150 may be sequentially stacked on the electrode layer 370. If the first protective layer 140 is not formed on the upper surface of the electrode layer 370, the second protective layer 150 may be formed on the upper surface of the electrode layer 370.

The second protective layer 150 may be formed only on the electrode portion 300. Also, the second protective layer 150 may be formed only on the effective region of the substrate 100. The second protective layer 150 may be formed on the entire surface of the substrate 100.

The thickness of the second protective layer 150 may be in the range of 1 탆 to 100 탆. When the second protective layer 150 is formed to a thickness of less than 1 탆, the electrode layer 370 is oxidized at a temperature of about 80 캜 or more or 90% or more. The thickness of the second protective layer 150 may be greater than the thickness of the substrate 100 to prevent the substrate 100 from contacting the electrode 300 And the second protective film 150 are difficult to support. Therefore, the thickness of the second protective layer 150 may be in the range of 1 탆 to 100 탆. Preferably, the thickness of the second passivation layer 150 may be between 5 and 50 탆. More preferably, the thickness of the second protective layer 150 may be 8 to 25 占 퐉.

The touch window according to the embodiment includes the first passivation layer 140 and the second passivation layer 150 to protect the electrode layer 370 and prevent oxidation. The second protective layer 150 may be formed of a material that is excellent in chemical resistance and is not affected by a high temperature or high humidity environment. Also, the second passivation layer 150 may be formed of a material having a light transmittance of 90% or more. For example, the second protective layer 150 may be formed of any one selected from the group consisting of parylene, UV resin, and polydimethylsiloxane (PDMS). At this time, even if the second protective layer 150 is formed to have a thickness of 1 to 100 탆, a light transmittance of 90% or more can be secured.

Accordingly, even if the touch window according to the embodiment is exposed for a long time in a high-temperature or high-humidity environment, the electrode layer 370 can be prevented from oxidation, and driving characteristics and optical characteristics can be prevented from deteriorating.

Hereinafter, a touch window according to another embodiment will be described with reference to FIG. The description overlapping with the embodiment described above may be omitted. The same reference numerals are assigned to the same components.

Referring to FIG. 7, a substrate 100 is defined in which a valid region and an ineffective region disposed around the valid region are defined. The electrode portion 300 is formed in the effective region of the substrate 100. The electrode unit 300 may include a pattern layer 380 and an electrode layer 370. At this time, the pattern layer 380 may include a depressed portion 381 and an embossed portion 382. At this time, a first protective layer 142 is formed to surround the electrode layer 370. A second passivation layer 150 is formed on the electrode layer 370 and the first passivation layer 142.

The first passivation layer 142 may surround the entire surface of the electrode layer 370. For example, the first protective layer 142 may surround the upper surface, the lower surface, and the side surfaces of the electrode layer 370. That is, the first protective layer 142 may surround the entire surface of the electrode layer 370 formed of a metal. As a result, oxidation can be prevented and reflection due to the total reflection characteristic of the metal can be prevented.

The first passivation layer 142 may be formed of a blackening material layer. The blackening material layer may be a black metal oxide. For example, any one selected from the group consisting of CuO, CrO, FeO, and Ni 2 O 3 can be applied. However, the present invention is not limited thereto, and a black-based material capable of suppressing the reflectivity of the electrode layer 370 can be applied.

The first protective layer 142 and the electrode layer 370 may be formed simultaneously or separately. For example, a pattern layer 380 including a curved engraved portion 381 is formed on the substrate 100. The curved engraved portion 381 may be formed in a semicircular shape. Forming a first blackening material layer on the first blackening material layer so that the thickness of the first blackening material layer is smaller than the height of the engraved portion 381 in the engraved portion 381, 381 and a second blackening material layer is formed on the electrode material layer.

The first protective layer 140 and the electrode layer 370 are disposed only on the engraved portion 381 of the pattern layer 380 while moving the doctor knife in contact with the raised portion 382 of the pattern layer 380. [ . That is, since the engraved portion 381 is formed in a curved shape, the first blackening material layer may be formed in contact with the front surface of the engraved portion 381. The first passivation layer 142 may be formed to be in contact with the lower surface and the side surface of the electrode layer 370 and the first passivation layer 142 may be formed by the second blackening material layer, And may be formed to be in contact with the upper surface.

Therefore, the first protective layer 142 may be formed to surround the entire surface of the electrode layer 370. However, the method of forming the electrode layer 370 and the first passivation layer 142 is not limited thereto, and a method of forming the first passivation layer 142 around the electrode layer 370 is sufficient.

A second passivation layer 150 is formed on the electrode layer 370 and the first passivation layer 140. The second passivation layer 150 may be in contact with the upper surface of the first passivation layer 140. Accordingly, the first passivation layer 140 and the second passivation layer 150 may be sequentially stacked on the electrode layer 370.

Hereinafter, a touch window according to another embodiment will be described with reference to FIG. The description overlapping with the embodiment described above may be omitted. The same reference numerals are assigned to the same components.

Referring to FIG. 8, a substrate 100 is defined in which a valid region and an ineffective region disposed around the valid region are defined. The electrode portion 300 is formed in the effective region of the substrate 100. The electrode unit 300 may include a pattern layer 380 and an electrode layer 370. At this time, the pattern layer 380 may include a depressed portion 381 and an embossed portion 382. The first passivation layer 140 is formed to contact at least one surface of the electrode layer 370. A second passivation layer 150 is formed on the electrode layer 370 and the first passivation layer 140.

Although the first protective layer 140 is illustrated as being in contact with the top and bottom surfaces of the electrode layer 370 in the drawing, the first protective layer 140 may be formed to contact at least one surface of the electrode layer 370. The first passivation layer 140 may surround the top surface, the side surface, and the bottom surface of the electrode layer 370.

A third protective layer 160 may be formed between the pattern layer 380 and the substrate 100. The third protective layer 160 may be formed only between the pattern layer 380 and the substrate 100 under the electrode unit 300. Also, the third protective layer 160 may be formed only on the effective region of the substrate 100. The third protective layer 160 may be formed on the entire surface of the substrate 100.

The third protection layer 160 may be formed between the substrate 100 and the electrode unit 300 to protect the electrode unit 300 from oxygen and moisture flowing from the backside or the side surface of the substrate 100 . The third protection layer 160 may protect the electrode portion 300 and the electrode layer 370 together with the first protection layer 140 and the second protection layer 150 in a high temperature and high humidity environment .

The thickness of the third passivation layer 160 may range from 1 to 100 탆. Preferably, the thickness of the second passivation layer 150 may be between 5 and 50 탆. More preferably, the thickness of the second protective layer 150 may be 8 to 25 占 퐉.

The third protective layer 160 may be formed of a material which is excellent in chemical resistance and is not affected by a high temperature or high humidity environment. In addition, the third protective layer 160 may be formed of a material having a light transmittance of 90% or more. For example, the third protective layer 160 may be formed of one selected from the group consisting of parylene, UV resin, and polydimethylsiloxane (PDMS). At this time, even if the third protective layer 160 is formed to have a thickness of 1 to 100 탆, a light transmittance of 90% or more can be secured.

Hereinafter, a touch window according to another embodiment will be described with reference to FIG. The description overlapping with the embodiment described above may be omitted. The same reference numerals are assigned to the same components.

Referring to FIG. 9, a substrate 100 is defined in which a valid region and a non-valid region disposed around the valid region are defined. The electrode portion 300 is formed in the effective region of the substrate 100. The electrode unit 300 may include a pattern layer 380 and an electrode layer 370. At this time, the pattern layer 380 may include a depressed portion 381 and an embossed portion 382. The first passivation layer 140 is formed to contact at least one surface of the electrode layer 370. A second passivation layer 150 is formed on the electrode layer 370 and the first passivation layer 140.

Although the first protective layer 140 is illustrated as being in contact with the top and bottom surfaces of the electrode layer 370 in the drawing, the first protective layer 140 may be formed to contact at least one surface of the electrode layer 370. The first passivation layer 140 may surround the top surface, the side surface, and the bottom surface of the electrode layer 370.

A transparent adhesive layer 170 is formed on the second protective layer 150. As the transparent adhesive layer 170, a transparent adhesive for optical (OCA) or a transparent resin for optical (OCR) may be used. The transparent adhesive layer 170 serves to attach the second protective layer 150 and the cover substrate 50 to each other. The cover substrate 50 may protect the substrate 100 on which the electrode unit 300 and the electrode unit 300 are formed.

The second passivation layer 150 may be disposed between the transparent adhesion layer 170 and the electrode unit 300. Accordingly, the transparent adhesive layer 170 and the electrode unit 300 may be spaced apart from each other. In addition, the electrode unit 300 may be disposed so that the electrode layer 370 and the transparent adhesive layer 170 are spaced apart from each other.

When the second protective layer 150 is formed of UV resin, the second protective layer 150 may be formed by applying UV resin on the substrate 100 on which the electrode unit 300 is formed and curing . At this time, the transparent adhesive layer 170 may be omitted. That is, the cover substrate 50 may be formed on the second protective layer 150 so as to be in contact with the second protective layer 150.

For example, the cover substrate 50 can be adhered by placing the cover substrate 50 before the UV resin curing and curing the UV resin. That is, the second protective layer 150 formed of the UV resin may serve as an adhesive layer. Therefore, the thickness of the touch window according to the embodiment can be reduced.

Hereinafter, a touch window according to another embodiment will be described with reference to FIG. The description overlapping with the embodiment described above may be omitted. The same reference numerals are assigned to the same components.

Referring to FIG. 10, a substrate 100 is defined in which a valid region and an ineffective region disposed around the valid region are defined. An electrode layer 400 is formed on the effective region of the substrate 100. The electrode layer 400 may be in contact with the substrate 100.

In addition, although not shown in the figure, a third protective layer may be further formed between the electrode layer 400 and the substrate 100. At this time, the electrode layer 400 may be formed on the third protective layer formed on the substrate 100. That is, the electrode layer 400 may be in contact with the substrate 100 or the third protective layer.

The electrode layer 400 is disposed on the mesh line LA and the electrode layer 400 is disposed on the mesh. The mesh shape can be randomly formed to prevent moire phenomenon. In the mesh opening (OA), the substrate 100 or the third protective film may be formed in contact with the second protective film 150.

The electrode layer 400 may include various metals having excellent electrical conductivity. For example, the electrode layer 400 may include Cu, Au, Ag, Al, Ti, Ni, or an alloy thereof.

The first passivation layer 140 is formed to contact at least one surface of the electrode layer 400. For example, the first passivation layer 140 may be formed only on the upper surface of the electrode layer 400 or only on the lower surface of the electrode layer 400. The first passivation layer 140 may be formed on the upper and lower surfaces of the electrode layer 400.

The first passivation layer 140 may be formed of a blackening material layer. The blackening material layer may be a black metal oxide. For example, any one selected from CuO, CrO, FeO, and Ni 2 O 3 may be applied, but the present invention is not limited thereto, and a black-based material capable of suppressing the reflectivity of the electrode layer 270 can be applied.

The first passivation layer 140 and the electrode layer 400 may be formed simultaneously or separately. For example, the first blackening material layer, the electrode material layer, and the second blackening material layer are sequentially formed on the substrate 100 or the third protective layer. Thereafter, the first protective layer 140 and the electrode layer 400 may be formed by patterning the first blackening material layer, the electrode material layer, and the second blackening material layer together. The first passivation layer 140 may be in contact with the top and bottom surfaces of the electrode layer 400.

The step of forming the first blackening material layer may be omitted or the step of forming the second blackening material layer may be omitted so that the first protective film 140 may be formed only on the upper or lower surface of the electrode layer 400 have. However, the method of forming the electrode layer 400 and the first passivation layer 140 is not limited thereto, and a method of forming the first passivation layer 140 on at least one surface of the electrode layer 400 is sufficient.

A second passivation layer 150 is formed on the electrode layer 400 and the first passivation layer 140. When the first protective layer 140 is formed only on the upper and lower surfaces of the electrode layer 400, the second protective layer 150 may contact the side surface of the electrode layer 400. When the first passivation layer 140 is formed only on the lower surface of the electrode layer 400, the second passivation layer 150 may contact the upper surface and side surfaces of the electrode layer 400.

Further, although not shown in the figure, a transparent adhesive layer formed of an optical transparent adhesive (OCA) or an optical transparent resin (OCR) may be further formed on the second protective film 150. Further, a cover substrate may be further formed on the transparent adhesive layer.

In addition, when the second protective layer 150 is formed of UV resin, the transparent adhesive layer may be omitted. That is, the second protective layer 150 may further include a cover substrate formed to be in contact with the second protective layer 150.

Hereinafter, a touch window according to another embodiment will be described with reference to FIG. The description overlapping with the embodiment described above may be omitted. The same reference numerals are assigned to the same components.

Referring to FIG. 11, a substrate 100 is defined in which a valid region and an ineffective region disposed around the valid region are defined. An electrode layer 400 is formed on the effective region of the substrate 100. The electrode layer 400 may be in contact with the substrate 100.

In addition, although not shown in the figure, a third protective layer may be further formed between the electrode layer 400 and the substrate 100. At this time, the electrode layer 400 may be formed on the third protective layer formed on the substrate 100. That is, the electrode layer 400 may be in contact with the substrate 100 or the third protective layer.

A first protective layer 143 may be formed to surround the entire surface of the electrode layer 400. For example, the first protective layer 143 may surround the upper surface and the side surfaces of the electrode layer 400. That is, the first protective layer 143 may be formed to surround the exposed front surface of the electrode layer 400. The first protective layer 143 may surround the upper surface, the lower surface, and the side surfaces of the electrode layer 400. That is, the first protective layer 143 may surround the entire surface of the electrode layer 400 formed of metal. As a result, oxidation can be prevented and reflection due to the total reflection characteristic of the metal can be prevented.

The first passivation layer 143 may be formed of a blackening material layer. The blackening material layer may be a black metal oxide. For example, any one selected from CuO, CrO, FeO, and Ni 2 O 3 may be applied, but the present invention is not limited thereto, and a black-based material capable of suppressing the reflectivity of the electrode layer 270 can be applied.

The first passivation layer 143 and the electrode layer 400 may be formed simultaneously or separately. For example, a first blackening material layer and an electrode material layer are sequentially formed on the substrate 100 or the third protective layer. Thereafter, the first blackening material layer and the electrode material layer may be patterned together or the electrode material layer may be patterned to form the electrode layer 400 disposed on the first blackening material layer.

Thereafter, a second blackening material layer is formed on the electrode layer 400 and the first blackening material layer and the second blackening material layer formed in the mesh opening OA are etched. The first protective layer 143 may be formed on the upper surface, the side surface, and the lower surface of the electrode layer 400.

In addition, when the step of forming the first blackening material layer is omitted, the first protective layer 143 may be formed to be in contact with the exposed upper and side surfaces of the electrode layer 400. However, the method of forming the electrode layer 400 and the first passivation layer 143 is not limited thereto, and the first passivation layer 140 may be formed on at least one surface of the electrode layer 400.

A second passivation layer 150 is formed on the electrode layer 400 and the first passivation layer 143. The second passivation layer 150 may be formed to be in contact with the upper surface and side surfaces of the first passivation layer 143.

Further, although not shown in the figure, a transparent adhesive layer formed of an optical transparent adhesive (OCA) or an optical transparent resin (OCR) may be further formed on the second protective film 150. Further, a cover substrate may be further formed on the transparent adhesive layer.

In addition, when the second protective layer 150 is formed of UV resin, the transparent adhesive layer may be omitted. That is, the second protective layer 150 may further include a cover substrate formed to be in contact with the second protective layer 150.

Hereinafter, a display device including a touch window according to embodiments will be described with reference to FIG. The description overlapping with the above-described embodiments may be omitted. The same reference numerals are assigned to the same components.

12 is a cross-sectional view of a display device including a touch window according to an embodiment. Referring to FIG. 12, a display device including a touch window according to the embodiment includes a display panel 90 and a touch window. The touch window is the same as the touch window according to the above-described embodiments. That is, although FIG. 12 shows the touch window according to FIG. 2, the touch window may be the same as the touch window according to the embodiments described above with reference to FIGS.

The display device may include a valid region through which light is transmitted and a non-effective region through which light is not transmitted. A transparent adhesive layer 170 is disposed between the display panel 90 and the touch window. The adhesive layer 170 may be formed in a portion of the effective region and the non-effective region. The adhesive layer 170 may be an optical transparent adhesive (OCA) or a transparent transparent resin (OCR) for attaching the display panel 90 to the touch panel. In addition, the region where the adhesive layer 170 is formed can prevent scattering of the substrate 100 even if the substrate 100 is broken due to the adhesive layer 170.

The display panel 190 may include a liquid crystal display panel and a backlight unit that provides a surface light source to the liquid crystal display panel. The liquid crystal display panel and the backlight unit may be integrally coupled to the set cover. For example, the set cover may be formed including the lower cover, the support main and the upper cover. At this time, the upper cover, the support main and the lower cover are integrally formed by assembling together, and the cover-attaching film adheres to the upper cover and the touch panel, so that the touch panel can be formed integrally with the upper cover.

The liquid crystal display panel may have a structure in which an upper substrate including red (R, G) color filter layers and a lower substrate including a thin film transistor (TFT) and a pixel electrode are bonded together with a liquid crystal layer interposed therebetween have.

In addition, the liquid crystal display panel may have a color filter on transistor (COT) structure in which a color filter and a black matrix are formed on a lower substrate. A thin film transistor is formed on the lower substrate, a protective film is formed on the thin film transistor, and a color filter layer is formed on the protective film. In addition, a pixel electrode is formed on the lower substrate in contact with the thin film transistor. At this time, in order to improve the aperture ratio and simplify the mask process, the black matrix may be omitted, and the common electrode may be formed to serve also as the black matrix.

The backlight unit includes a light emitting diode package (hereinafter referred to as a light emitting package) composed of red (R), green (G) and blue (B) light emitting diodes (LEDs) or white light emitting diodes (LEDs) A light guide plate for converting a light source supplied from the light emitting package into a surface light source; a reflector disposed on the back surface of the light guide plate to improve light efficiency; And an optical sheet disposed in front of the light guide plate (on the upper side) and functioning to condense and diffuse light.

The display panel 90 may be an organic light emitting display panel. The organic electroluminescence display panel includes a self-luminous element which does not require a separate light source. In the organic light emitting display panel, a thin film transistor is formed on a substrate, and an organic light emitting device which is in contact with the thin film transistor is formed. The organic light emitting device may include an anode, a cathode, and an organic light emitting layer formed between the anode and the cathode. Further, the organic light emitting device may further include an encapsulation substrate for encapsulation.

In addition, the display panel 90 is not limited thereto, and may be an electrophoretic display (EPD), a plasma display panel (PDP), a field emission display (FED), an electroluminescence display device (ELD), and an electro-wetting display (EWD).

Hereinafter, an example of a touch device to which the touch window described above is applied will be described with reference to FIGS. 13 to 16. FIG.

Referring to Fig. 13, a mobile terminal is shown as an example of a touch device. The mobile terminal 1000 may include a valid area AA and a non-valid area UA. The effective area AA senses a touch signal by touching a finger or the like, and a command icon pattern part and a logo are formed on the non-valid area.

Referring to FIG. 14, the touch window may include a flexible flexible touch window. Accordingly, the touch device device including the same may be a flexible touch device device. Therefore, the user can bend or bend by hand.

Referring to FIG. 15, such a touch window can be applied not only to a touch device such as a mobile terminal, but also to a car navigation system.

16, such a touch window can also be applied to a vehicle. That is, the touch panel can be applied to various parts to which a touch window can be applied in the vehicle. Therefore, not only PND (Personal Navigation Display) but also dashboard can be applied to implement CID (Center Information Display). However, the embodiment is not limited to this, and it goes without saying that such a touch device device can be used in various electronic products such as notebook computers and home appliances.

The features, structures, effects and the like described in the foregoing embodiments are included in at least one embodiment of the present invention and are not necessarily limited to one embodiment. Further, the features, structures, effects, and the like illustrated in the embodiments may be combined or modified in other embodiments by those skilled in the art to which the embodiments belong. Therefore, it should be understood that the present invention is not limited to these combinations and modifications.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be construed as limiting the scope of the present invention. It can be seen that various modifications and applications are possible. For example, each component specifically shown in the embodiments may be modified and implemented. It is to be understood that the present invention may be embodied in many other specific forms without departing from the spirit or essential characteristics thereof.

Claims (16)

Board;
An electrode layer disposed on the substrate in a mesh form;
A first protective layer formed to contact at least one surface of the electrode layer; And
And a second protective film disposed on the electrode layer and the first protective film. The method according to claim 1,
Wherein the first protective film is formed of a blackening material layer. The method according to claim 1,
Wherein the second protective layer is formed of one selected from the group consisting of paraline, UV resin, and PDMS. The method according to claim 1,
Wherein the thickness of the second protective film is 1 占 퐉 to 100 占 퐉. The method according to claim 1,
And a transparent adhesive layer formed on the second protective film. 6. The method of claim 5,
And a cover substrate formed on the transparent adhesive layer. The method according to claim 1,
The second protective film is formed of a UV resin,
And a cover substrate formed to contact the second protective film. The method according to claim 1,
Wherein the first protective film is formed to be in contact with upper and lower surfaces of the electrode layer. 9. The method of claim 8,
And the second protective film is formed to be in contact with a side surface of the electrode layer. The method according to claim 1,
Wherein the first protective film is formed to contact the upper surface, the side surface, and the lower surface of the electrode layer. The method according to claim 1,
And a third protective layer disposed between the electrode layer and the substrate. 12. The method of claim 11,
Wherein the third protective layer is formed of any one selected from the group consisting of paraline, UV resin, and PDMS. The method according to claim 1,
Further comprising a pattern layer formed on the substrate,
Wherein the pattern layer includes a first subpattern and a second subpattern disposed adjacent to the first subpattern,
Wherein the electrode layer is disposed on the first subpattern of the pattern layer. 14. The method of claim 13,
Wherein the width of the electrode layer is smaller than the width of the first sub-pattern. The method according to claim 1,
Further comprising a pattern layer formed on the substrate,
Wherein the pattern layer includes an engraved portion and an embossed portion,
Wherein the electrode layer is disposed on the engraved portion of the pattern layer. 16. The method of claim 15,
Wherein the engraved portion of the pattern layer is formed in a curved shape.

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