KR20140144031A - Apparatus for pumping and cleaning - Google Patents

Abstract

The present invention relates to a washing apparatus for washing an object to be washed, and to an exhausting apparatus. To be more specifically, the present invention relates to the washing device for removing foreign materials such as powder attached to the object to be washed, and to an exhausting apparatus applying the same. The washing apparatus comprises: a washing solution storage tank which stores a washing solution; a washing solution supply pipe whose one end is connected with the washing solution storage tank, and whose the other end is connected with an object to be washed; a washing solution discharge pipe whose one end is connected with the object to be washed, and whose the other end discharges washing wastewater including powder inside the object and the washing solution; and a circulation pump including an inlet which is connected with the other end of the washing solution discharge pipe in order to suck the washing wastewater, and an outlet which discharges the sucked washing wastewater.

Description

[0001] Apparatus for pumping and cleaning [0002]

The present invention relates to an apparatus and an apparatus for cleaning a cleaning object, and more particularly, to a cleaning apparatus for removing foreign substances such as powder adhering to a cleaning object and an exhaust apparatus using the same.

1 is a cross-sectional view showing a substrate processing apparatus in the form of a vertical furnace.

A substrate processing apparatus in the form of a vertical furnace includes a tubular tube 500 having an inner space and an open bottom, a cylinder-shaped manifold 100 connected to a lower side of the tube 500, a tube 500 A boat 300 having a plurality of seating members disposed in the vertical direction and spaced apart from each other in a vertical direction and having a plurality of seating members on which the respective substrates are seated, a process gas injection unit 310 extending in a direction corresponding to the extending direction of the boat 300, (400), and a process gas exhaust pipe (700) for exhausting the process gas to the outside.

The process gas injection unit includes a process gas injection unit (not shown) in the form of a nozzle having a plurality of injection holes 411 extending upward and downward to correspond to the boat 300 in the tube 500 and injecting gas toward the boat 300 A process gas supply port 810 extending in the width direction of the tube 500 and having one end connected to the lower portion of the process gas injection unit 400 and the other end protruding outside the manifold 100, And a process gas supply pipe 800 installed outside the process gas supply port 100 and having one end connected to the process gas supply port 810 and the other end connected to a process gas storage unit (not shown). The process gas exhaust section also includes a process gas exhaust port 710 that is opened in the wall of the manifold 100 and a process gas exhaust pipe 700 that exhausts the process gas that flows into the process gas exhaust port 710.

On the other hand, during the process in the bell-type furnace, the unreacted material is moved to the process gas exhaust pipe 700 through the process gas exhaust port 710 of the manifold 100 and exhausted. At this time, the heat (temperature) of the piping port drops sharply as compared with the inside of the manifold 100. That is, in the case of the substrate processing apparatus of the vertical furnace type, unreacted materials are stacked in the form of powder when passing through the process gas exhaust pipe 700 at a low temperature so that the inside of the pipe is blocked, A problem arises.

These powders contain various harmful gases (fumes). These harmful components are exposed to the operator and the work environment during regular desorption of the process gas exhaust pipe, which deteriorates the operator's health and causes environmental pollution. Currently, gas masks are worn and removed from process gas exhaust pipes. However, it is necessary to remove harmful components before desorbing process gas exhaust pipes due to air pollution in the environment.

Korean Patent Publication No. 10-2010-0073568

A technical problem of the present invention is to remove harmful powder and gas in a cleaning object contaminated by a powder. A technical object of the present invention is to prevent environmental pollution through cleaning of a cleaning object.

An embodiment of the present invention relates to a cleaning solvent storage tank storing a cleaning solvent; A cleaning solvent supply pipe having one end connected to the cleaning solvent storage tank and the other end connected to the cleaning object; A cleaning solvent discharge pipe connected at one end to the object to be cleaned and discharging the object including the powder and the cleaning solvent in the object to be cleaned through the other end; And a circulation pump connected to the other end of the cleaning solvent discharge pipe and having an inlet for sucking the cleaned material and an outlet for discharging the cleaned material.

The cleaning device is connected to the discharge port of the circulation pump, and collects the cleaning water discharged from the discharge port. And a drain opening / closing valve that performs opening and closing for discharging the cleaned water collected in the cleaned water collecting device to the outside.

The cleaning tank is connected to a cleaning object which is required to be cleaned, and the cleaning tank is connected to the storage tank, the cleaning solvent supply pipe, the cleaning solvent discharge pipe, the circulation pump, the cleaning water collector and the drain opening / closing valve. And when the cleaning is completed, the cleaning kit is separated from the cleaning object.

And a supply opening / closing valve provided on the supply flow path of the cleaning solvent supply pipe to open / close the supply flow path. And a discharge opening / closing valve provided on the discharge flow path of the cleaning solvent discharge pipe to open / close the discharge flow path.

And a cleaning state detection sensor for detecting an amount of cleaning water flowing through the cleaning solvent discharge pipe, wherein the supply opening / closing valve is adjusted according to an amount of the cleaning water to be sensed, so that the supply amount of the cleaning solvent is inversely proportional.

Further, an embodiment of the present invention is an apparatus for exhausting a process gas in a process chamber for processing a substrate therein, the process gas exhaust pipe having one end connected to the process chamber and the other end connected to the exhaust pump; And a cleaning unit for cleaning the inside of the process gas exhaust pipe, wherein the cleaning unit comprises: a cleaning solvent storage tank storing a cleaning solvent; A cleaning solvent supply pipe having one end connected to the cleaning solvent storage tank and the other end connected to the process gas exhaust pipe; A cleaning solvent discharge pipe connected at one end to the process gas exhaust pipe and discharging the cleaning product including the powder and the cleaning solvent in the process gas exhaust pipe through the other end; A circulation pump connected to the other end of the cleaning solvent discharge pipe and having an inlet for sucking the cleaned product and an outlet for discharging the cleaned product; A cleaning water collector connected to the discharge port of the circulation pump and collecting the cleaning water discharged from the discharge port; And a drain opening / closing valve that performs opening and closing for discharging the cleaned water collected in the cleaned water collecting device to the outside.

A cleaning solvent inflow port formed through the first point of the process gas exhaust pipe; A cleaning solvent discharge port formed through a second point of the process gas exhaust pipe; A cleaning solvent inflow port opening / closing valve for opening / closing the cleaning solvent inflow port; And a cleaning solvent discharge port opening / closing valve for opening and closing the cleaning solvent discharge port.

A plurality of cleaning solvent inlet ports and a plurality of the cleaning solvent outlet ports are provided. A cleaning solvent supply pipe is connected to a cleaning solvent inlet port located in an interval to be cleaned among the process gas exhaust pipes to be cleaned. And the cleaning solvent discharge pipe is connected to the discharge port.

According to the embodiment of the present invention, it is possible to remove the powder and gas in the object to be cleaned contaminated by the powder. For example, the exhaust pipe of various substrate processing apparatuses can be easily cleaned. In addition, the cleaning object can be firstly cleaned by the cleaning device 900 in advance before cleaning by the operator, whereby the operator can be prevented from being exposed to the foreign substance and contaminated. Furthermore, by implementing the cleaning device for cleaning the object to be cleaned in the form of a movable cleaning kit, the cleaning kit can be easily transferred to and removed from the object requiring cleaning.

1 is a cross-sectional view showing a substrate processing apparatus in the form of a vertical furnace.
2 is a cross-sectional view illustrating a substrate processing apparatus according to an embodiment of the present invention.
3 is a view showing an apparatus for evacuating a process gas according to an embodiment of the present invention.
FIG. 4 is a view illustrating a cleaning kit connected to a process gas exhaust pipe according to an embodiment of the present invention. FIG.
FIG. 5 is a view illustrating a plurality of cleaning solvent inlet ports and a cleaning solvent outlet port, respectively, in a process gas supply pipe according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. It will be apparent to those skilled in the art that the present invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, It is provided to let you know. Wherein like reference numerals refer to like elements throughout.

FIG. 2 is a cross-sectional view illustrating a substrate processing apparatus according to an embodiment of the present invention, and FIG. 3 is a view illustrating an apparatus for evacuating a process gas according to an embodiment of the present invention.

A substrate processing apparatus according to the present invention includes a vertical processing chamber having an inner space, a boat 300 for vertically mounting a plurality of substrates in a vertical posture, a process gas injection unit for injecting a process gas toward the boat 300, (400), a process gas exhaust pipe (700) for discharging external debris from the unreacted process gas remaining in the process chamber, and a manifold heating body (900) for heating the inner wall of the manifold (100) . In addition, the substrate processing apparatus is provided with a heating body 701 for heating a process gas exhaust pipe 700 for heating the inner wall of the process gas exhaust pipe 700. The substrate processing apparatus may further include a tube heating body (not shown) provided outside the tube 500.

The process chamber includes a cylindrical cap manifold 100, a lower cover 600 opened and closed at a lower end surface of the manifold 100, and a tube 500 coupled to a top surface of the manifold 100 And the inner space of the bell shape. Accordingly, the boat 300 in which a plurality of substrates are vertically placed along the vertically formed inner space can move up and down.

The manifold 100 is a tubular cylinder tube having a space communicating with the tube 500 therein, and serves as a frame on which the tube 500 is mounted. A process gas supply port 810 is formed on one side wall and a process gas exhaust port 710 is formed on the other side wall. One end of the process gas supply port 810 is connected to an external process gas supply pipe 800 and the other end of the process gas supply port 810 is connected to a nozzle of the process gas injection unit 400. The process gas supplied through the process gas supply pipe 800 can be supplied to the nozzle of the process gas injection unit 400 through the process gas supply port 810. [ Also, the process gas exhaust port 710 is connected to an external process gas exhaust pipe 700 to exhaust unreacted gas in the process chamber to the process gas exhaust pipe 700. Accordingly, the process gas is introduced through the process gas supply port 810 formed on one side wall of the manifold 100 and the unprocessed process gas is introduced through the process gas discharge port formed on the other side wall of the manifold 100, Can be exhausted to the outside.

The lower cover 600 is a cover which is opened and closed on the lower end surface of the manifold 100. The lower cover 600 is disposed below the tube 500 and the manifold 100 to support the tube 500 and the manifold 100 and to close each lower opening. The lower cover 600 is manufactured to have a larger width than the tube 500 and the manifold 100 and the tube 500, the manifold 100 and the rotary member 200 are disposed thereon. At this time, the tube 500 and the manifold 100 are detachably installed to the lower cover 600, and the rotating member 200 passes through the lower cover 600 and is operated by an elevator (not shown) The boat 200 and the boat 300 can be rotated and elevated together.

The rotary member 200 is connected to the lower portion of the boat 300 to support the boat 300 and rotates by the operation of a rotary power unit (not shown) to rotate the boat 300. The rotary member 200 according to the embodiment may be a plate-shaped turn table or any other means capable of supporting and rotating the boat 300.

The tube 500 has a cylindrical shape whose lower side is opened, and is coupled to the upper surface of the manifold 100. The tube 500 is disposed at an upper portion of the manifold 100 and is detachably attached to the manifold 100. However, the present invention is not limited to this, and a boat 300 and a process gas injection unit 400 may be installed inside the tube 500. It can be manufactured in various shapes having an internal space. In addition, although the tube 500 according to the embodiment is manufactured using quartz, it is needless to say that the tube 500 may be made of various materials other than the quartz. The joint portion of the tube 500 and the manifold 100 is sealed by a sealing member.

A tube heating body (not shown) is a heating body that generates a heat source at the outer periphery of the tube 500, and provides a heat source for maintaining the temperature inside the tube 500 at the substrate processing temperature when the substrate processing process is performed . Such a tube heating body (not shown) can be realized by various types of heating means such as a heater. Further, the tube heating body (not shown) may be provided on the outer wall of the tube 500 or may be provided in contact with the side wall of the tube 500.

The boat 300 is loaded with a plurality of substrates and is movable up and down into an inner space in the tube 500. To this end, the boat 300 is mounted on the rotary member 200 and extends a certain length in the upward direction (i.e., in the vertical direction). The substrate is seated on each layer of the boat 300 and process processing can be performed on the substrate that is seated in each layer by the process gas injected laterally in the process gas injection unit 400. In addition, a plurality of partitions may be formed in the boat 300 so that a plurality of substrates can be seated and a substrate processing process can be performed.

The process gas injection unit is a process gas injection unit for injecting a process gas in the form of a nozzle 410 having a plurality of injection holes 411 extending upward and downward to correspond to the boat 300 in the tube 500, A process gas supply port 810 extending in the width direction of the tube 500 and having one end connected to the lower portion of the process gas injection unit 400 and the other end protruding outside the manifold 100, And a process gas supply pipe 800 installed outside the manifold 100 and having one end connected to the process gas supply port 810 and the other end connected to a process gas storage unit (not shown).

The process gas injection unit 400 is vertically disposed inside the tube 500 and injects the process gas introduced through the process gas supply port 810 toward the inner boat 300. The process gas injection unit 400 is spaced a predetermined distance from the boat 300, and a plurality of injection holes are formed toward the boat 300. To this end, the process gas injection unit 400 has nozzles 410 extending in the longitudinal direction corresponding to the extending direction of the boat 300, that is, in the longitudinal direction or the vertical direction. The nozzle 410 has a space (hereinafter, referred to as 'nozzle space') through which the process gas flows, and a plurality of injection holes 411 are formed in the side wall. A process gas supply port 810 is connected to a lower portion of the nozzle so that the process gas flowing through the process gas supply pipe 800 moves along the nozzle space and is injected toward the boat 300 through the plurality of injection holes .

The process gas exhaust unit includes a process gas exhaust port 710 provided in a wall of the manifold 100, an exhaust pump 750 providing a pumping pressure, a process gas having one end connected to the exhaust port and the other end connected to the exhaust pump And an exhaust pipe 700. The process unreacted material moves along the process gas exhaust pipe 700 through the process gas exhaust port 710 of the manifold located at the lower end of the process chamber.

Meanwhile, when the unreacted material moves along the process gas exhaust pipe 700, the unreacted material is adsorbed and accumulated in the form of powder on the exhaust wall due to the low temperature of the process gas exhaust pipe 700. These powders contain various harmful gases (fumes). These harmful components are exposed to the operator and the working environment when the equipment is regularly removed from the exhaust pipe, causing deterioration of the operator's health and environmental pollution. Currently, gas masks are worn and desorbed from process gas exhaust pipes. However, contamination of air in the environment is inevitable and it is necessary to remove harmful components before desorption.

The embodiment of the present invention is a cleaning device 900 for removing harmful powder and gas before detaching the process gas exhaust pipe 700 contaminated by the powder. To this end, the cleaning device 900 includes a cleaning solvent storage tank 910, a cleaning solvent supply pipe 950, a cleaning solvent discharge pipe 960, and a circulation pump 920. In addition, the cleaning apparatus 900 may include a cleaned water collector 930, a drain opening / closing valve 931, a supply opening / closing valve 951, a discharge opening / closing valve 961, and a cleaning state detection sensor 940.

The cleaning solvent storage tank 910 is a tank storing cleaning solvent. Moisture is used as a cleaning solvent. The storage and supply of such a cleaning solvent can be supplied in the form of at least one of water vapor, deionized water, and cooling water. Moisture such as water vapor, deionized water and cooling water can be removed by pushing out the powder and residual gas in the process gas exhaust pipe 700 by the cleaning solvent supply pipe 950, the cleaning solvent discharge pipe 960 and the circulation pump 920.

The cleaning solvent supply pipe 950 has one end connected to the cleaning solvent storage tank 910 and the other end connected to the process gas supply pipe 700 to be cleaned. Thus, the cleaning solvent stored in the cleaning solvent storage tank 910 may flow into the process gas exhaust pipe 700 along the cleaning solvent supply pipe 950.

The supply opening / closing valve 951 is provided on the supply flow path of the cleaning solvent supply pipe 950 so as to adjust opening and closing of the supply flow path. When the supply opening / closing valve 951 is opened, the cleaning solvent stored in the cleaning solvent storage tank 910 flows to the process gas exhaust pipe 950, while the supply opening / closing valve 951 is closed The cleaning solvent stored in the cleaning solvent storage tank 910 does not flow to the process gas exhaust pipe 700. Further, the supply opening / closing valve 951 can be adjusted to open only a part of the supply flow path in addition to the opening and closing operation. For example, an adjustment may be made to open only 1/4, 2/4, 3/4 of the diameter of the supply passage of the cleaning solvent supply pipe 950. Therefore, the cleaning solvent can be flowed in inverse proportion to the amount of the cleaning water in the process gas exhaust pipe 700. For example, when there are many items to be cleaned in the process gas exhaust pipe 700, the whole is opened to flow a large amount of washing solvent. When the amount of the washing water is small, only a part of the washing solvent can be opened and less washing solvent can be flowed. Therefore, when cleaning is gradually completed, a large amount of cleaning solvent is not required to be wasted. The term "cleaned product" as used herein refers to a product including the powder used in the process gas exhaust pipe 700 to be cleaned and the solvent used for cleaning, which is a cleaning result established through the process gas exhaust pipe 700.

One end of the cleaning solvent discharge pipe 960 is connected to the process gas exhaust pipe 700 to be cleaned, and the other end thereof is connected to the circulation pump 920. Therefore, the powder in the process gas exhaust pipe 700 and the cleaning solvent are discharged to the circulation pump through the other end.

The discharge opening / closing valve 961 is provided on the discharge flow path of the cleaning solvent discharge pipe 960 to open / close the discharge flow path. In order to maximize the cleaning efficiency, when the cleaning solvent is filled or filled in the process gas exhaust pipe 700, the discharge opening / closing valve 961 may be closed to close the discharge flow passage.

The cleaning solvent supply pipe 950 is connected to the manifold 100 and the exhaust pump 750 to be closer to the exhaust pump 750 side and the cleaning solvent discharge pipe 960 is closer to the manifold 100 side As shown in FIG. Since the temperature of the exhaust pump 750 side is lower than that of the side of the manifold 100, the powder sticking to the process gas exhaust pipe 700 sticks to the side of the exhaust pump 750 more than the side of the manifold 100 . Thus, the cleaning solvent flows into the more powder side.

The cleaning state detection sensor 940 senses the amount of cleaning water flowing in the discharge flow path of the cleaning solvent discharge pipe 960. It is possible to adjust the supply amount of the cleaning solvent in inverse proportion by adjusting the supply opening / closing valve 951 according to the amount of the cleaning water to be sensed. For example, when a large amount of cleaning water is detected in the process gas exhaust pipe 700, the entire supply flow path of the cleaning solvent supply pipe 950 is opened to allow the cleaning solvent to flow into the process gas exhaust pipe 700, In the case of a small amount, only a part of the cleaning solvent can be flowed with a small amount of cleaning solvent. Therefore, when cleaning is gradually completed, a large amount of cleaning solvent is not required to be wasted. For reference, the cleaning state detection sensor 940 may be implemented by various foreign matter detection sensors such as a contamination concentration detection sensor and a solid water detection sensor.

The circulation pump 920 is connected to the other end of the cleaning solvent discharge pipe 960 and includes an inlet 921 for sucking the cleaned material and an outlet 922 for discharging the sucked cleaned material. The circulation pump 920 generates a pumping pressure using the supplied driving power to suck and suck the material in the process gas exhaust pipe 700. The cleaned material sucked through the suction port 921 is discharged to the cleaned water collector 930 through the discharge port 922.

The cleaning water collector 930 is connected to the discharge port 922 of the circulation pump 920 and collects the cleaning water discharged from the discharge port 922. The collected cleaning water is discharged to an external disposal site. To this end, the drain opening / closing valve 931 performs opening and closing for discharging the cleaned water collected in the cleaned water collector 930 to the outside.

Meanwhile, the cleaning apparatus 900 described above can be driven when the cleaning gas is required to be continuously connected to the process gas exhaust pipe 700 to be cleaned, but is implemented as one independent cleaning kit and is normally separated May then be connected to a process gas exhaust pipe that needs to be cleaned and then cleaned. Will be described in detail with reference to Fig.

FIG. 4 is a view illustrating a cleaning kit connected to a process gas exhaust pipe according to an embodiment of the present invention. FIG.

The cleaning solvent storage tank 910, the cleaning solvent supply pipe 950, the cleaning solvent discharge pipe 960, the circulation pump 920, the cleaning water collector 930 and the drain opening / closing valve 931 are grouped into an independent cleaning kit (cleaning kit). The cleaning kit is connected to the process gas exhaust pipe 700 requiring cleaning and cleaning is performed. When the cleaning process is completed, the cleaning kit can be separated from the process gas exhaust pipe 700. The separated cleaning kit is moved to the waste waste discharge site, and the drain opening / closing valve 931 is opened to discharge the cleaned water collected in the cleaning water collector 930 to the outside.

The apparatus for exhausting the process gas includes a cleaning solvent inlet port 720 formed through a first point of the process gas exhaust pipe 700 and a cleaning solvent inlet port 720 formed through a second point of the process gas exhaust pipe 700, And a solvent discharge port 730. The cleaning solvent stored in the cleaning solvent storage tank flows through the cleaning solvent inlet port 720 and the cleaned cleaning product in the process gas exhaust pipe 700 is discharged through the cleaning solvent discharge port 730 to the outside of the process gas exhaust pipe 700 .

2 to 4, the cleaning solvent inlet port 720 is located closer to the exhaust pump side than the manifold and the exhaust pump, and the cleaning solvent discharge port 730 is further provided on the manifold side Can be located close to each other. Since the temperature of the exhaust pump side is lower than that of the manifold side, the powder adhering to the process gas exhaust pipe 700 is stuck to the exhaust pump side more than the manifold side. Therefore, the cleaning solvent flows into the side of the exhaust pump with a larger amount of powder.

2 to 4, the cleaning solvent inlet port 720 is located closer to the manifold side than the manifold and the exhaust pump, and the cleaning solvent discharge port 730 is located closer to the exhaust pump side . Since the exhaust pressure flows from the manifold side to the exhaust pump side, the cleaning solvent inlet port is located on the manifold side, and the cleaning solvent flows in the same direction as the exhaust pressure, and can be discharged from the exhaust pump side.

Meanwhile, in order to connect or disconnect the cleaning kit to the process gas exhaust pipe 700, the cleaning solvent inlet port 720 and the cleaning solvent discharge port 730 must be opened or closed. For example, when the cleaning kit is not connected to the process gas exhaust pipe 700, the cleaning solvent inlet port 720 and the cleaning solvent discharge port 730 must be closed, and a cleaning kit may be connected to the process gas exhaust pipe 700 for cleaning. The cleaning solvent inlet port 720 and the cleaning solvent outlet port 730 should be opened. A cleaning solvent inlet port opening / closing valve 721 for opening and closing the cleaning solvent inlet port 720; and a cleaning solvent outlet port opening and closing valve 731 for opening and closing the cleaning solvent outlet port 730. Therefore, when the cleaning kit is connected to the process gas supply pipe 700, the cleaning solvent supply pipe 950 is connected to the cleaning solvent inlet port opening / closing valve 721, and the cleaning solvent discharge pipe 960 is connected to the cleaning solvent discharge port opening / .

As shown in FIG. 5, the cleaning solvent inlet port 720 and the cleaning solvent discharge port 730 may be provided in the process gas supply pipe 700, respectively. Therefore, the cleaning kit can be connected only in a section requiring cleaning. That is, the cleaning solvent inlet port 720 and the cleaning solvent discharge port 730 are provided in a plurality of positions 720a, 720b, 720c, 730a, 730b, and 730c, respectively, And the cleaning solvent supply pipe 950 is connected to the cleaning solvent discharge port 730 located in the section to be cleaned.

In the above description, the apparatus for cleaning the process gas exhaust tube is described as an example of the object to be cleaned. However, it will be obvious that various objects requiring cleaning in addition to the process gas exhaust pipe 700 may be included in the object to be cleaned.

Further, the cleaning apparatus of the present invention may be applied to various apparatuses other than the vertical furnace. For example, a horizontal furnace, a thin film production apparatus, an etching apparatus, and the like.

Although the present invention has been described with reference to the accompanying drawings and the preferred embodiments described above, the present invention is not limited thereto but is limited by the following claims. Accordingly, those skilled in the art will appreciate that various modifications and changes may be made thereto without departing from the spirit of the following claims.

100: manifold 700: process gas exhaust pipe
720: Cleaning solvent inlet port 730: Cleaning solvent outlet port
750: exhaust pump 900: cleaning device
910: Cleaning solvent storage tank 920: Circulation pump
930: Cleaning water collector 940: Cleaning state detection sensor

Claims (13)

A cleaning solvent storage tank storing a cleaning solvent;
A cleaning solvent supply pipe having one end connected to the cleaning solvent storage tank and the other end connected to the cleaning object;
A cleaning solvent discharge pipe connected at one end to the object to be cleaned and discharging the object including the powder and the cleaning solvent in the object to be cleaned through the other end;
A circulation pump connected to the other end of the cleaning solvent discharge pipe and having an inlet for sucking the cleaned product and an outlet for discharging the cleaned product;
.
The method according to claim 1,
A cleaning water collector connected to the discharge port of the circulation pump and collecting the cleaning water discharged from the discharge port;
A drain opening / closing valve that performs opening and closing for discharging the cleaned water collected in the cleaned water collecting device to the outside;
.
The method of claim 2,
The cleaning tank is connected to a cleaning object which is required to be cleaned, and the cleaning tank is connected to the storage tank, the cleaning solvent supply pipe, the cleaning solvent discharge pipe, the circulation pump, the cleaning water collector and the drain opening / closing valve. And when the cleaning is completed, the cleaning kit is detached from the cleaning subject.
The method according to claim 1,
And a supply opening / closing valve provided on the supply flow path of the cleaning solvent supply pipe to open / close the supply flow path.
The method according to claim 1,
And a discharge opening / closing valve provided on the discharge flow passage of the cleaning solvent discharge pipe to open / close the discharge flow passage.
The cleaning apparatus according to claim 1, further comprising: a cleaning state detection sensor for detecting an amount of cleaning water flowing through the cleaning solvent discharge pipe, wherein the cleaning device includes a cleaning device for adjusting the supply opening / .
The cleaning apparatus according to claim 1, wherein the cleaning solvent is at least one solvent selected from the group consisting of water vapor, deionized water, and cooling water.
An apparatus for evacuating a process gas in a process chamber for processing a substrate therein,
A process gas exhaust pipe connected to the process chamber at one end and connected to the exhaust pump at the other end;
A cleaning unit for cleaning the inside of the process gas exhaust pipe;
Wherein the cleaning unit comprises:
A cleaning solvent storage tank storing a cleaning solvent;
A cleaning solvent supply pipe having one end connected to the cleaning solvent storage tank and the other end connected to the process gas exhaust pipe;
A cleaning solvent discharge pipe connected at one end to the process gas exhaust pipe and discharging the cleaning product including the powder and the cleaning solvent in the process gas exhaust pipe through the other end;
A circulation pump connected to the other end of the cleaning solvent discharge pipe and having an inlet for sucking the cleaned product and an outlet for discharging the cleaned product;
A cleaning water collector connected to the discharge port of the circulation pump and collecting the cleaning water discharged from the discharge port;
A drain opening / closing valve that performs opening and closing for discharging the cleaned water collected in the cleaned water collecting device to the outside;
And exhausting the process gas.
The method of claim 8,
A cleaning solvent inlet port formed through a first point of the process gas exhaust pipe;
A cleaning solvent discharge port formed through a second point of the process gas exhaust pipe;
A cleaning solvent inflow port opening / closing valve for opening / closing the cleaning solvent inflow port;
A cleaning solvent discharge port opening / closing valve for opening / closing the cleaning solvent discharge port;
And exhausting the process gas.
The process gas according to claim 9, wherein the cleaning solvent inlet port is located closer to the exhaust pump side than the manifold and the exhaust pump, and the cleaning solvent outlet port is located closer to the manifold side. .
The process gas according to claim 9, wherein the cleaning solvent inlet port is positioned closer to the manifold side than the manifold and the exhaust pump, and the cleaning solvent discharge port is positioned closer to the exhaust pump side. .
The method of claim 9,
Wherein the cleaning solvent supply pipe is connected to the cleaning solvent inlet port opening / closing valve, and the cleaning solvent discharge pipe is connected to the cleaning solvent discharge port.
The method of claim 12,
A plurality of cleaning solvent inlet ports and a plurality of the cleaning solvent outlet ports are provided. A cleaning solvent supply pipe is connected to a cleaning solvent inlet port located in an interval to be cleaned among the process gas exhaust pipes to be cleaned. And the cleaning solvent discharge pipe is connected to the discharge port.

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