TW546172B - Systems and methods for processing workpieces - Google Patents

Abstract

Workpieces requiring low levels of contamination, such as semiconductor wafers, are loaded into a rotor or a fixed support within a process chamber. The process chamber has a horizontal drain opening in its cylindrical wall. The chamber is closed via a door. A process or rinsing liquid is introduced into the chamber. The liquid rises to a level so that the workpieces are immersed in the liquid. The chamber slowly pivots or rotates to move the drain opening down to the level of the liquid. The liquid drains out through the drain opening. The drain opening is kept near the surface of the liquid to drain off liquid at a uniform rate. An organic solvent vapor is introduced above the liquid to help prevent droplets of liquid from remaining on the workpieces as the liquid drains off. The rotor spins the workpieces to help to remove any remaining droplets by centrifugal force. Multiple process steps are performed within the single process chamber.

Description

V. Description of the invention (Scope of the invention The present invention relates to semiconductors, an optical medium, and a thin-film head-end I panel display panel, a hard disk, or a storage element or a cladding. The other 4 are microelectronic circuits, data advance borrowing, processing, and Cleaning. The surface parts of the guards of this material ". Two and similar articles are collectively referred to herein as" work surface preparation, such as cleaning, for power, etc. ^^ ,, ^ 4-i-^^ ', etching and peeling It is the main and important element of the semiconductor wafer and workpiece manufacturing process. The surface preparation step usually uses erosive, corrosive, or dissolved chemical-dry mouths, or uses vapor properties to stop the surface. The surface of the workpiece Preparatory implementation for box saw $ π M for subsequent process steps. Yiqu cleaning is a standard procedure in the manufacture of semiconductors and the same products. Cleaning involves the use of chemical formulas to remove _, such as oxides, molecules, metals or Organic materials' while maintaining the cleanliness and integrity of the workpiece surface ... Chemicals of liquid, gas or vapor nature, when applied to a workpiece, will result in surface characteristics that are more susceptible to contamination than others. Example # Applying air-gas radon (HF) to the surface of the workpiece removes the oxide from the cut surface, which results in an active surface. The workpiece is generally 'and particularly a workpiece with an active surface, and is often susceptible to contamination by airborne molecules. When the liquid process medium is removed from the surface of the workpiece, pollution can also occur in the cleaning program. Thus, in order to reduce the pollution of the workpiece, it is better to occupy a relatively small manufacturing facility space and reduce its exposure in a controlled environment. For pollution sources, it is advantageous to carry out a sequential surface preparation step. Therefore, the purpose of the present invention is to apply the Chinese National Standard (CNS) A4 specification (210X297 mm) -4- 546172 A7

Provides an improved surface processing method and device. Cleaning workpieces to avoid or reduce contamination has long been an engineering challenge. Workpieces are usually cleaned by spraying or deionizing pools. The water is then removed, usually using an organic solvent vapor, such as isopropanol, which reduces the surface tension of the water. This helps to prevent water droplets from staying and contaminating the workpiece. Various cleaning methods and systems and various washing and drying methods and devices have been proposed and used. In a typical system, a wafer is immersed in a container. A mechanism is provided to hold the wafer. Another mechanism is to push the wafer upwards from below to lift it away from the liquid. Although this technique has been used, it will cause the liquid volume to be stored in the space of the holding mechanism where the wafer is in contact, which will increase the chance of contamination. The need to raise institutions is also complex. In a conversion system, the wafer is held in a fixed position and the liquid is discharged from below. This technique is less prone to fluid storage. However, as the liquid level drops, solvent vapors above the liquid are absorbed by the liquid. Therefore, the liquid exposed at the upper part of the wafer is different from the liquid at the lower part of the wafer. This potential will cause non-uniform processing. Thus, although these and other technologies have been used to varying degrees of success, they still require improved systems and methods for cleaning workpieces. The object of the invention is therefore also to provide an improved system and method for cleaning workpieces. Brief description of the invention In a first aspect, the surface preparation process on the workpiece is performed in a single chamber. The workpiece is contacted by the process fluid by spraying or dipping. The workpiece can be processed and / or washed and dried in the single chamber. This reduces workpiece exposure to contaminants' and provides process fluids or media for improved application to the workpiece. -5- This paper size applies to China National Standard (CNS) A4 (210X 297 mm)

Order

Line 546172 A7 V. Description of the invention (3 In 'One Brother-Neigu, Gongdu Zuo 4P 丨 and pieces 仏 are held in a fixed bracket or rotor in the process room: The process room of the rotor can be turned by thumb' Move the discharge official outlet in the process chamber down to the level of the TW-receiving liquid in the chamber. The liquid is discharged from the chamber and passed through the outlet. 4 m If used, the workpiece in the process chamber is rotated through the rotor, which allows the process fluid More evenly distributed on the workpiece, and at the same time allow the fluid to be removed using centrifugal force. In a third aspect, the opening or nozzle supply in the process chamber or on the fixed support: fluid to 1 piece. This allows for diverse processing In the fourth internal order, the sound energy, such as supersonic or huge sound energy, is preferably applied to the workpiece through the liquid immersed in the king piece. In the fifth content, the door frame should be engaged When reaching the process chamber, the door assembly is pushed open to allow the door frame to pivot or rotate with the process chamber. In the first and second orders, the process chamber has a continuous cylindrical side wall surface, and the wall surface includes-discharge Tube opening or out When the chamber is rotated, the discharge pipe is discharged to the level of the liquid to the bottom, and the liquid in the process chamber is discharged through the discharge S opening. The process is closed to each side of the workpiece to better control the process environment. In a seventh content, Provides special methods for cleaning workpieces. These methods solve the problems of conventional methods used in the semiconductor manufacturing industry now. The workpieces are held in a rotor or a fixed bracket in a process chamber with a discharge tube outlet. The workpiece: a liquid washed in the process chamber, The liquid is preferably provided through one or more inlets at the bottom of the chamber. The liquid is preferably continuously supplied into the chamber, so that the plutonium is continuously filled and flows out of the outlet of the discharge pipe. The frame-turning process chamber moves it down in a controlled motion. The drain pipe exits Π to lower the level of liquid in the chamber. Binding 6-546172

As the chamber rotates and the liquid level drops, the liquid supplied to the chamber and the surface of the overflowing liquid preferably continues to flow. This process continues until the liquid level is below the workpiece ' and the chamber rotates to discharge virtually all liquid to the outside. Passage: The overflow on the surface of the liquid is held, and the fixed flow is maintained toward and out of the discharge pipe. The impurities on the surface of the liquid flow away from the workpiece, thus reducing potential pollution. When the surface of the liquid into which the solvent vapor is dissolved is fixedly replaced by fresh liquid, the liquid in the room remains unchanged at all depths. After the liquid is removed from the chamber, the workpiece is facilitated for rotation. In the embodiment of the rotor, the droplets left on the workpiece or components immediately adjacent to the device are removed by centrifugal force. As a result, cleaning has a homogeneous liquid reservoir and reduces potential accumulation or remaining liquid on the workpiece. The shortcomings of the related machinery and methods used today, as described above, were overcome. In an eighth aspect, an inner chamber has a drain opening for allowing process fluid to be removed from the inner process chamber. A drive motor rotates the internal process chamber at a controlled rate, maintaining the opening at or below the level of the fluid in the internal chamber. The fluid is then discharged through the discharge pipe opening. The drive motor can use magnetic force to move the internal process chamber without actually penetrating or connecting to the process environment through a drive shaft. Alternatively, the inner process chamber may be connected to the drive motor by a drive shaft and a shaft seal is used to seal the shaft opening into the inner process chamber. In a ninth aspect, the internal process chamber forms a sealed chamber without any discharge pipe openings. During at least one process step, the workpiece remains fixed, and a drive motor rotates the inner process chamber along the fixed workpiece. Openings or nozzles in the internal process chamber supply fluid to the workpiece. To remove liquid from the chamber, the chamber is turned or interrupted to a stop position during which one or more discharge ports are in the bottom position. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) binding

Line 546172

The drain port is then opened and the liquid is discharged through it using gravity. During venting, gas can be supplied to the internal process chamber to avoid creating a slow vacuum or stopping the flow of liquid. The liquid can be removed by opening the drain port, and then slowly rotating the internal process chamber to position and maintain the drain port at or below the liquid surface, as described in the third aspect above. This allows for controlled removal of the liquid and causes less potential contamination of the workpiece. In the tenth inner valley, the inner chamber is closed or sealed and remains fixed, and the ρ loading workpiece rotates in the inner chamber. This improves the application of reducing workpiece exposure to contaminants and providing process fluids to the workpiece. In an eleventh aspect, the external accommodating chamber is washed with a gas and / or base gas strip 'to maintain the environment required for the workpiece. The gas or vapor can be nitrogen, or argon, or hydrofluoric acid (HF). The above summary provides important processing and cleaning devices and methods. These contents help to provide more reliable and efficient processing. Order

Lines Further embodiments of the present invention and modifications, changes and improvements will become apparent. The invention resides in a combination of the illustrated and described characteristics. The characteristics shown in Example ^ can also be used in other examples at the same time. Brief description of the drawings In the drawings, the same reference numbers indicate the same components, and magic functions are shown in several types of drawings: ′-, Figure 1 is a perspective view of a system for processing a workpiece. FIG. 2 is a front view of the system shown in FIG. 1. FIG. FIG. 3 is a side view of the system shown in FIG. 1. FIG. 4 is a side view of the process machine shown in FIG. 2. • 8-546172 A7 B7 V. Description of the invention (e Figure 5 is a front view of the process machine shown in Figure 2. Figure 6 is a wearing view of a processor unit with a rotor rotating in the process chamber Figure 7 is a divided perspective view of the process chamber shown in Figure 6-Figure 8 is a partial cross-sectional view taken along line 8 of Figure 1/0 Figure 6. Figure 9 is a view of the process chamber shown in Figures 6 and 7 Perspective frame view. Figure 10 is an enlarged wearing view of a drain groove in the cylindrical side wall of the process chamber shown in S1 7 and 9. Figure 11 is an enlarged partial cross-sectional view of the rear end of the processor unit shown in Figure 6. Figure 12 FIG. 13 is a front view of the door assembly shown in FIG. 6. FIG. 13 is a partial cross-sectional view of the characteristics of the door assembly shown in FIG. 12. FIG. 14 is a top sectional view showing the door assembly of FIGS. 12 and 13 joining the process chamber. Fig. 15 is a wearing view taken along line 15-15 of Fig. 12. Fig. 16 is a perspective view of a rotor directly holding a workpiece. Fig. 17 is a changing rotor for holding a tray, carrier or cassette. A perspective view of the workpiece held in Figure 18. Figure 18 is a perspective view of a changing rotor and carrier. Figure 19 is a perspective view of a workpiece directly holding the workpiece. The side wall is loaded and unloaded, and the carrier is held in a rotor such as the rotor shown in Figure M. Figure 20 is a perspective view of a surface processing device for the system shown in Figure i, which has an internal process chamber moved to a Position to contain the fluid as a complete or part of the immersion process. This fluid is omitted from this figure for a clearer indication of the device-9 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) binding 546172 V. Description of the components of the invention. Figure 21 is a perspective cross-sectional view of the surface processing device shown in Figure 20+. Figure 22 is a perspective view of the figure of the device shown in Figure 20, and the inner chamber is now moved. To the position where the fluid is discharged, and the same cover is used to remove the cover for the device of Figure 丨 -3. Figure 23 is a perspective view of Figure 20-22 Mengfan recognition, a ri, ^, and set It installs and closes the inner process door and the outer accommodation door. _ A side view of a conversion processor, which is the same as the position of the fixed wafer holder on the rotor in Fig. 4. Fig. 25 is a processor shown in Fig. 24 Or process machine front view. Figure 26 is a part of the processor shown in Figures 24 and 25 A perspective view. Figure 27 is a partial cross-sectional view of the processor unit shown in Figure 26. Figure 28 is a cross-sectional view of the workpiece holder shown in Figures 26 and 27. Figure 29 is a- Sectional view. Figure 30 is a sectional view of the chamber or piece shown in Figures 26 and 27. Figure 31 is a rear view of the chamber. Figure 32 is an enlarged sectional view of the door assembly shown in Figures 32 and 27. Figure Series 33-A front view of the door assembly shown in Figure 32. Figure 34 is a side view thereof. Figure 35 is a cross-sectional view of a modified embodiment for processing a supporting workpiece in a carrier, jam or pallet. Figure 36- A partial perspective view of the processor unit shown in FIG. 26 or 35, which is located in an upright or zero position relative to the internal process or auxiliary room. Position, and for illustration purposes except various components. Fig. 37 is a perspective view of the processor unit shown in Fig. 36, in which the process chamber but the moved chamber is shown -10-8 V. Description of the invention (now rotated about 30 ° to remove the liquid. Fig. 38 is a Its perspective view, in which the process chamber rotates approximately. Figure 39 series-its perspective view 'where the process chamber allows all the fluid to flow out. It is used to valley the front view of the processor unit shown in Figure 40 to Figure 36. 41 = A cross-sectional view, in which the process chamber is represented by a solid line at 0 ° and. The Hai gas process chamber is represented by a dashed line in the fully rotated position of FIG. 39. The process chamber can be turned straight or can be held. The carrier containing the workpiece to hold the work "to ... provided by the rotor and then supplied to the process chamber when closed, so that the workpiece is at least partially immersed: 柘 turn or% turn 'to move the drain pipe opening down to the liquid The liquid is removed from the process chamber. The process chamber continues to rotate until most of the liquid is removed from the chamber. The other steps and characteristics described below are beneficial, but are not essential to the present invention. 2 and 3 'workpiece processing system 10 preferably has-housing 12. Use 乂 to standardize and control the clean airflow and reduce the contamination of the workpiece. System 10: square: input: wheel exit machine 14 allows workpiece 60 to be loaded and unloaded by the system 10, knife degree 16 or other temporary workpiece The storage device is provided next to the input / output machine 14 .: The first 10 # 乂 佳 is divided into an interface section 24 and a process section%. These sections are separated by the opening section. The interface section 24 includes input / output Output machine ° Knife 16 or other temporary workpiece storage. Process machine 26 includes yuan- or multi-process machine 30 '(each process machine includes a processor single U0X297 mm) • 11-546172

) 〇. This process machine is shown in Figure 3B & 3C. The interface section 24 also includes a process robot 22 for moving the workpiece to and from οσ a knife position 16 and a processor early panel 28 can be provided to the outside, heartbeat instructions or planning input to the computer controller 32 for Control system 丨 〇. The workpiece 60 may be provided in an open carrier, a card container or a pallet. The ground-changing ' workpiece 60 may be provided in a sealed box or container, which is on a disassembly machine. '

The processor unit 50 is shown in Figs. The processor unit 50 may be used in the automation system 1G shown in Fig. ，, or other automation systems, or as a separate unit. Hold

Referring to FIG. 6 ', in the -shift processor unit 3', a rotor or a rotatable workpiece holder ㈣ is placed in the process chamber 3_. —Pivot motor or actuator · Link to the process room. The pure rotation motor 3G6 pivots the process chamber from the first position where the chamber can hold the liquid, and pivots to the second position where most or all of the indoor liquid flows out by gravity. The first position may be zero. Or upright position. The second position consists of 60. Reached about 180. And is typically at a position of about 100 ′, 10 ° or 120 »from the first position. A rotary motor is connected to the rotor 304 to rotate the rotor 304 in the rotor 302.组件 The component 3 10 is separated by the process chamber 30 2 for loading and unloading the workpiece. The door assembly 31 has a door that can be engaged with the process chamber to close or seal the open front end of the process chamber 2 during processing. The overflow tanks 3 and 2 are randomly located below the open front end of the process chamber 302 to collect any liquid released outside the process chamber. Because some process fluids are corrosive, the rotor 304 and the process chamber 302 may be made of a corrosion-resistant material such as Teflon (fluorinated resin). When using Teflon -12.

546172 A7 ____ B7 5. In the description of the invention (10), the rotor and the process chamber may have a relatively thick wall surface and sections to provide proper strength. In addition, as shown in FIG. 6, a metal chamber holder 3 60 may be provided along the outside of the process chamber 302 and provided at a position where it will not be exposed to the process fluid. The bracket 360 reinforces the process chamber 302. Returning to Fig. 7, the process chamber 302 has a side wall 320, preferably a continuous cylinder, which is bonded to the back wall 324. Therefore, when the open front end 332 of the process chamber 302 is closed by a door frame, as described below, the process chamber 302 surrounds and closes each side of the workpiece during processing. 7-10, a discharge pipe opening or slot 326 is provided on the cylindrical side wall surface 320 of the process chamber 302. The drain pipe opening 326 is preferably horizontal and connected to a drain port 3 3 0 at the rear end of the process chamber 30 2. The cutouts 3 28 facilitate the formation along the inside edge of the discharge groove 326. A flexible discharge line 338 travels from the discharge port 33 to a system or facility discharge pipe or collection point, as shown in FIG. Referring to Figures 8 and 9, one or more lower manifolds 34o are provided close to the bottom of the chamber 302. The bottom is a fan-shaped area, which is substantially opposite (e.g., +45) to the discharge opening 326. The array of upper manifolds 342 is provided close to the top of the chamber 302, and on the side of the chamber of the opposite drain slot 326. The manifolds 34 and 342 are extended from the manifold to a supply source through flexible supply lines 346 and 348, and are supplied with gas, steamed milk, or liquid. The manifold has openings or nozzles 354 for supplying or spraying gas, vapor, or liquid inwardly toward the workpiece in chamber 302. Depending on the process to be completed, additional supply lines are available. In addition, some manifolds 342 may provide a first fluid, such as water and process chemicals, while other manifolds 342 may provide a different fluid, such as nitrogen or IpA vapor. The supply line has a very slack or rising loop for maintaining fluid connection to the paper. • This paper size is in accordance with China National Standard (CNS) A4 (21〇 X 297). 546172

The manifold allows the chamber 302 to pivot. Returning to FIG. 11, a rotor shaft 35 extends from the rotary motor 308 to the rotor 304. The rotor shaft 35 passes through the shaft opening of the rear wall surface 324 of the chamber 302. Seals 362 and 364 are provided along the shaft opening 322 to avoid fluid leakage through the shaft opening 322. The rotor 304 is supported on a rotor shaft 350. A to collar 352 on the pivot motor 306 is connected to a rear wall surface 324 of the process chamber 302. The process chamber 302 is supported on 'and pivoted on a chamber collar 352 driven by the pivot motor 306. Reinstalling it to Fig. 12, the door assembly 310 is vertically on the doorway 37o and moved from the upper position 'shown by the solid line to the lower position shown by the dotted line. A door bridge 372 extending between the rails 371 supports the door assembly 31. Returning to Fig. 13, the door assembly 3 10 includes a circular plate-like closed frame 374 including an annular door mat 375 connected to an annular door ring 382. A window 376 is fixed between the gasket 375 and the ring 382. When the door assembly 310 is in the closed position, as shown in FIG. 27, the lintel 375 is clamped against the front flange plate 334 of the process chamber 302. The seal 3 3 6 in the flange plate 334 is sealed along the door mat 3 75.

Referring to Figures 12-15, the swing actuators 378 are spaced radially along the circumference of the flange plate 334. The cam lever 380 on the swing actuator 378 is turned inward by the actuator 378 'to hold the door ring 382 and the gasket 375 so as to abut the & edge plate 334 of the process chamber 302. The swing actuator 378 is mounted on a chamber support 36o, and the support moves with the chamber 302. Referring to FIG. 13 ', a manual cutting actuator 384 supported on a door bridge 372 has a pickup 386. During loading and unloading of the workpiece into the process chamber 300, the actuator 384 moves the picker 386 to engage and hold the closed frame 374. During processing, the picker 386 is released and separated by the closed frame 374. Therefore, Yuga -14 ·

546172 A7 B7 V. Description of the Invention (i2) The closed frame 374 can move freely with the process chamber 302 during construction. As shown in Figs. 14 and 15, the 'door bridge 372 is connected to a lifting actuator 371, which vertically moves the door frame between the upper and lower positions, as shown in Fig. 12. The rotor 304 may have various forms. The rotor 300 can be any device for holding a workpiece 'and rotates in the process chamber 302. Figure 16-19 shows examples of rotors that can be used. Referring to Fig. 16, the rotor 400 has a comb member 402 for directly holding the workpiece 60. The stopper 404 is moved and joined to the edge of the workpiece, and is held in the position of the rotor by the process robot. As shown in Fig. 17, a conversion rotor 41 is suitable for holding a workpiece contained in a pallet, a cassette, or a carrier. The tray 416 or cassette or carrier 418 slides into a recess 412 and is held in position in the rotor, for example, via an end edge 414. As shown in FIG. 18, a conversion rotor 42 has stages 422 formed on the ribs 424. The size of the stage 422 is selected to accommodate or match the corresponding lugs 432 on the carrier 426. Fig. 19 shows another carrier 44o, which can be used with the rotor 42o, with or without lugs 432. The carrier 440 has a recess 442 for receiving and holding the workpiece 60. The workpiece 60 is loaded into the carrier 440 through an opening 444 in the side of the carrier. The above process to 302 can also be used for a fixed carrier bracket to replace the rotor 304 ^ In this design, the rotary motor 308 and the drive shaft 35 can be omitted, where the workpiece support is supported on a center arm, the arm It extends through the shaft opening 322 in the process chamber 302 and is coupled or supported by a chassis 134. In use, the processing unit 300 operates as follows. The workpiece is loaded into the rotor 304. This can be achieved manually or by the process robot 22. The workpiece can be loaded directly into a comb or groove in the rotor 304. Alternatively, the workpiece can be held on a pallet, a cassette or a carrier, which is sequentially loaded into the rotor 304. • 15- ^ Paper size applies Chinese National Standard (CNS) A4 specification (210X 297 public love) -------

1 ”number of scale :: == carrier, card or tray will be loaded, so that the minute can have shuttle-like back and forth position :: the storage position is occupied. The scale 16 is fixed or moved as shown in the figure. As shown in 1 and 3. It can be used by changing to a sealed container. The workpiece 60 can be provided inside the body, such as ㈣. If the workpiece 60 is provided in a sealed box and sealed in and out. The scope of the patent describes that the box can be operated 、 Remove 26 = number system ::: ,, the second section seems to be controlled by the computer / controller 32, or by other remote control or equipment computer / controller on the control surface 3. During loading 'gate bridge 372 It is tied to the lower position as shown by the dotted line in FIG. 12 so that the front end of the process chamber 302 is open. The process chamber 302 is preferably in an upright or 0 position, as shown in FIG. 7, the discharge end is at or near the top end. The rotor The rotation of 304 is preferably horizontal. The locomotive axis ρ of the process chamber is also preferably horizontal and can be centered with the axis as shown in the figure. The guard is preferably located in a vertical or near vertical direction. The door bridge 372 is raised by the door lifter 371 to the upper position shown by the solid line in Fig. 12. When the closed frame 374 is aligned With the open front end 332 of the process chamber 302, the manual closing actuator 384 extends to close the frame 374 against the flange plate 334, as shown in Fig. 13. The swing actuator 378 then moves the cam lever 38o inward. The cam lever 3 80 engages the door ring 382 of the closing frame 374, thereby holding the closing frame 374 along the flange plate 334. The manual closing actuator then releases the picker and retracts by the door ring 382. The closing frame 3 74 is now closed or sealed. The open front end 332 of the room 3202. In addition, the closed frame 374 is released or not affected by the remaining door components 3 1-10 -16- This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 546172 A7

Impact 'When the process room is pivoted, it can move with the process room 3G2. Referring to FIG. 9, the process liquid, gas, or vapor (collectively referred to as a fluid) is sprayed or otherwise introduced into the process chamber through supply lines 346 and 348. For the moment, M9, rotor 304 advantageously has an open frame structure. This allows the fluid from the two manifolds 340 and 342 to be sprayed or otherwise supplied through the rotor to the workpiece 60. Depending on the specific process performed on the workpiece, the fluid used may include corrosive or corrosive agents, solvents, vapors State chemicals, acids such as hydrofluoric acid, ozone, thallium, ozone water, and mixtures thereof. Since multiple fluids can be supplied to different manifolds through multiple supply lines, various subsequent processing steps can be performed in the process chamber 302 without the need to remove workpieces from the chamber. When the chamber 302 closes the workpiece, the potential of externally contaminated workpieces will be rampant. For subsequent processing steps the same fluid can be applied to the workpiece by dipping, spraying or other applications. Cleaning can be performed between processing steps. For the secondary washing or rinsing step, the liquid is introduced into the process chamber 300 until the liquid level rises enough to allow the workpiece to be immersed. The workpiece can remain in the liquid bath for a predetermined amount of time. To remove the washing or dipping liquid, the pivot motor 306 is selectively actuated via the controller / switch 32. When the chamber 302 is pivoted, the drain tube slot or opening 326 moves down to the liquid level. The liquid flows into the drain tank 326 'by gravity and flows out through the drain port 330 and the drain line 338. The pivot motor 306 continues to rotate the process chamber 302 until the discharge slot 326 moves from position A to position B in FIG. 8. This allows all the liquid in the process chamber 302 to be discharged through the discharge tank and the discharge port 330 using gravity. When the process chamber 302 is pivoted, the supply lines 346 and 348 (and others, if provided) move with the process chamber 302 via an ascending loop provided for this purpose. In addition, the front end 332 of the closed or sealed chamber 302 is closed. -17 · This paper size applies to China National Standard (CNS) A4 (210X 297 mm)

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Line 546172 A7 --------- B7 V. Description of the invention (~) '' One ----- Frame 3 74 moves with the room. In order to move the sand chanting body faster or remove the liquid without changing the positions of the manifolds 340 and 342, a bottom Qiu Rugu "l & σ 卩 switching discharge pipe 325 can also be provided on the cylindrical side wall 320 of the process chamber 302 Preferably, the chamber is rotated or pivoted, and the liquid is at about 0,1-30 or 0.1-10 or CM-5 or (M-2mm / sec, 0.5_1-10 or 〇 & or 〇 "or fine / coffee rate discharge. The discharge or decline rate is selected as fast as the actual rate without having a liquid concave surface separated from the surface of the workpiece. For the cleaning program, water flows from the lower manifold 34o and / or the upper manifold M ? Introduce process chamber 302. The water can be sprayed onto the workpiece. Alternatively, the water can flow through the outlet and = spray. When the water level in the process chamber 302 rises, the guard will dip and wash. When the liquid level rises Many manifolds 342 can be submerged in liquid. Depending on the process, the flow or spray from these manifolds can be turned off, or they can continue to transfer liquid limbs, gases, or vapors into the liquid solution in chamber 30. The workpiece is immersed in cleaning Liquid. Preferably, a continuous renewal liquid solution is provided to the chamber 302. The liquid permeates Manifold 34 or other inlets are sprayed or drawn in. The liquid is preferably continuously discharged through the discharge tube opening 326 through the entire liquid removal program until the workpiece is no longer in contact with the liquid solution. Sonic energy can be transmitted to or on the rotor A device 333 is applied to the workpiece 60. A conveyor 333, such as a megasonic or supersonic transmitter, is positioned to transmit sonic energy through the liquid in the chamber 302 to the workpiece being immersed in the liquid. To allow the washing liquid to drain through the drain tank 326, as described above, before the washing liquid or water level begins to fall, organic solvent vapors such as IpA vapor pass through one or more manifolds 342, located above the liquid level, and are introduced into the process chamber 302. Table-18 of the organic solvent vapor water on the surface / water interface of the workpiece-This paper size applies to China National Standard (CNS) A4 specification (21 × 297 mm) 546172

Description of the invention Face tension. This reduces or avoids water droplets remaining on the surface of the workpiece when the water drops, resulting in less contamination. This vapor helps to remove liquid from the workpiece. A gas, such as nitrogen or air, may also be introduced into the process chamber 302 through the one or more manifolds 342 with the vapor. The gas can be heated. When the process chamber 302 continues to pivot and the liquid level continues to drop, provide additional steam and gas (if used). This vapor can be mixed into the gas. After the liquid is completely lowered below the workpiece level, the steam supply is turned off. The gas supply preferably continues to remove any remaining vapor from chamber 302. After most or all of the liquid has been discharged by pivoting the chamber, the rotary motor Che Jia is turned on under the control of the control / computer 32 to rotate the rotor 300. The rotation of the workpiece in the rotor helps to remove any remaining droplets of the workpiece using centrifugal force. The gas can be sprayed onto the workpiece as it rotates, which helps remove any remaining liquid from the workpiece. Before or after rotating the workpiece, the process chamber is rotated back to its original upright position. After the workpiece in the process chamber 302 is completed, the actuator 3 is manually closed to re-engage the closed frame 374 and the picker 386. The swing actuator 378 moves the cam lever outward from the door knocker 382. The actuator 384 then pulls the closed frame away from the front end 332 of the process chamber 302. The gate bridge 372 moves back to the lower position. The workpiece is then removed from the process chamber 302. Although the description is for a batch of workpieces, the invention is also applicable to a single workpiece operation. In a modified embodiment, the rotor 350 can be extended and retracted axially by the motor 308 or another actuator, and the rotor 300 is extended along the shaft ruler beyond the process to 302, which is easier to load. And uninstall. Generally speaking, during the dipping process, when the process chamber 302 is filled with a large amount of liquid • 19- I paper size suitable for the family standard (CNS) A4 specifications (210X297 public love) one one 546172

Body, the rotor 304 will remain in place and will not rotate. However, for some granulating rotors 304, it is possible to rotate at a low speed, and the rotor 304 and the workpiece 60 are immersed in a liquid 'to stir the liquid or improve the flow of the liquid on the surface of the workpiece. Workpiece I: Change to hold at an inclination angle of 5-15 degrees perpendicular to the rotor, to help avoid contact between the workpieces during processing. Returning now to the first conversion system, as shown in FIG. 20, a surface processing system 511 is provided for processing a flat workpiece such as a semiconductor wafer 60. The device or system 511 includes a process chamber 517 that is selectively located within an external receiving chamber 519. The outer chamber 5 19 contains and configures the process fluid, and isolates the process environment from the surrounding environment, operators, and immediate components and equipment. The process medium may include a cleaning liquid such as hydrofluoric acid (HF), a washing liquid such as water, a gas such as nitrogen or a mixture of gases and organic vapors, or any combination thereof. Workpiece machining is carried out in process room 5-17. Referring now to FIG. 21, the chamber 517 has a shaft section 525 that extends rearwardly through a rear section 527 of 519. This shaft segment 525 is connected to the inner chamber motor or actuator 529 via a direct mechanical link or via a magnetic coupling cup '. The motor 529 can pivot the inner chamber 5 丨 7 in a relatively slow continuous and controlled motion. The motor 529 can also rotate the inner chamber 5-17. The motor 529 can also pivot the inner chamber 517 to the required angular orientation or position and hold the chamber 517 in its position. The inner chamber 517 has a cylindrical side wall surface as shown in Fig. 22, which side wall has a discharge pipe opening, a groove, or a window 5 5 5 for removing liquid from the chamber. A discharge pipe edge 557 defines the lower end of the opening 555. The discharge pipe edge 557 is preferably horizontal and runs substantially the entire length through the inner chamber 517. A protrusion 559 may extend below the edge of the discharge pipe. Pivot here means less than 360. exercise. Conversely, • 20- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

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546172 A7 _________B7 V. Description of the invention (18 ^^-~ —— Rotation or rotation here means a continuous movement of more than 36 °. The inner chamber 517 preferably includes at least one outlet 531 such as a nozzle for spraying by spraying. Or other technology transfers the process fluid 521 to the workpiece 515. The nozzle or outlet 53 1 may be above or below or to one side of the workpiece 60, so that the process fluid M} 旎 travels vertically up or down or horizontally. At least one channel or line 533 transfers Process fluid 521 to nozzles or outlets 531. One or more manifolds 53 5, each with an outlet or nozzle array can be used. In an embodiment where an inner chamber 5 17 rotates, the line or base 533 is connected to as shown in Figure 21 One of the rotating fluid couplings 537 or the same is shown inside or outside the equipment. Referring now to Figures 20 and 21, a rotor or workpiece holder 539 for holding the workpiece 60 is positioned with the chamber 517. Preferably, the rotor 539 With grooves, typically equally spaced, for holding the workpiece 60. A rotor drive motor 541 is connected to the shaft section 543 of the rotor 539, which extends through the shaft section 525 of the inner chamber 517. Alternatively, the rotor 539 may be magnetically coupled Device It is connected to the motor 54i. The rotor 539 alternately has the characteristic of holding the workpiece 60 in the carrier or the cassette. In either case, the rotor 539 has a stopper workpiece for positioning. If used, the magnetic coupling is provided by The magnetic force is connected to the rotor 539 and the rotor driver 541, and the chamber actuator 529 and the chamber 517, respectively, without physically connecting or penetrating the chamber 517 by a drive shaft. Therefore, the space in the chamber 54 It can be optimally closed or sealed to prevent contamination. Referring again to Figures 21 and 23, the chamber 517 has a door 547 for receiving the process fluid 550 in the chamber 517. The outer chamber 519 also has an outer door 549. When the door 549 is closed At this time, the outer chamber 519 isolates the workpiece 60 from contaminants in the environment outside the outer chamber 519. The outer chamber 519 has one or more outlets 551 for removing fluids. • 21-This paper size applies to Chinese National Standards (CNS) A4 specifications (210 X 297 mm) 546172 A7 ________ B7 V. Description of the invention (— ~) " In use, the 5 helical rotor 5 3 9 extends to the inner room through the open door by hand or robot 5) 17. The workpiece 515 may then be loaded into the rotor 539. When the rotor is carrying one or more workpieces, the door 547 is then closed 549, preferably but not necessarily, providing a fluid-tight and / or gas-tight seal. When the door is closed, it is preferred to provide a complete closed space or environment in the closed or sealed chamber 517 in the outer chamber. Various process steps can then be completed. For the dipping process, the process fluid is drawn into the chamber 517 through one or more openings or nozzles 531 through a supply line 533. The inner chamber 517 can be pivoted by a motor 29 along a longitudinal (front to back) axis. This allows the opening 555 to be moved from a position above the liquid level of the chamber: > 17 to a lower position during which liquid can be discharged through the port 555. In an embodiment, the compartment 517 pivots, but does not rotate or rotate. The supply line 533 can have sufficient slack to allow it to follow the pivoting action of the compartment 517, and does not require a rotating coupling 537 or other fluid transfer technology. . During the dipping process, fluid is provided into the chamber 517 until the workpiece is preferably fully dipping. Position the chamber 517 so that the opening 555 is close to the top of the chamber as shown in Fig. 20 to prevent liquid from being discharged from the chamber 517. The rotor driving motor 541 can then rotate the motor 5 3 9 and the workpiece 60 in the process " it. This technique provides mixing and fluid motion on the workpiece 60 via relative motion between the fluid and the workpiece. This rotation speed can be low to avoid common splashes and disturbances. For some applications, both the rotor 539 and the chamber 517 can remain stationary, and the workpiece is immersed in the stationary process fluid contained in the chamber 517 for a required time interval. To remove the liquid at the appropriate time during processing, the chamber 5 1 7 is pivoted 'by the chamber driver 529 such that the opening 555 is at or below the level of the liquid 521. This allows the fluid to fill through the opening 555 in the cylindrical side wall surface of the inner process chamber 517. 22- This paper size applies to China National Standard (CNS) A4 (210X297 mm) 546172 A7.

The atmosphere is discharged as shown in FIG. 22. The opening 5 is gradually moved downward in a controlled manner, preferably using a continuous pivoting chamber 5 17 to remove the fluid at a fast controlled rate. The liquid removed from the inside to the 517 flows into the outer chamber 519, and the soybean field is flushed through the port 551 or flows out of the outer chamber 53. — 、 Selection When the body is removed (or if there is no real bar reading, only 仃 / 冼 steps), the workpiece 60 is tied to a clean gas or air ring within 5 to 17 by a Kongyi Tuxiong. Further process steps can then be implemented. For example, workpieces 5 and 15 can be removed by spraying with a liquid (such as water) from moon beads. Regardless of whether the chamber 5n is rotated or pivoted (nozzle 5 in the chamber 517), and whether or not the rotor that holds the workpiece is rotated or not, the selectively heated gas can then pass through the nozzle 53 1啧 选 力 τ 此 ϊ * This month μ T 逦 is on the workpiece. To remove the centrifugal liquid, the rotor 531 can rotate at high speed. For subsequent processing steps, different liquids, gases, or vapors (collectively referred to herein as "fluids" ) The medium can be applied to the workpiece from a fluid supply source 581 by means of liquid gas or vapor by spraying or other applications. Washing and / or cleaning can be performed between processing steps. However, the workpiece can be left in the chamber 5 丨 7 at any time, This reduces the potential for contamination. Removal of the process fluid 5 2 1 from the internal process to 5 17 is accomplished reversibly by allowing the fluid 521 to escape through the switching chamber 561 in the internal process chamber 517, which is located approximately relative to The location of the discharge edge 557. Same as the fluid line 533 'The discharge pipe 561 can be changed via external magnetism or switched by pneumatic or hydraulic or electrical control lines in chambers 5-17. For immersed processed workpieces, continuously updated The liquid solution can be provided in the inner process chamber 517, and when the chamber 517 is pivoted counterclockwise in FIGS. 20 and 22, it is simultaneously and continuously discharged through the discharge edge 5 5 7 of the side wall surface. Paper size applies to Chinese National Standard (CNS) A4 specification (210 X 297 mm) 546172 A7 _____B7 V. Description of the invention (~~) 'Use, the process level in chamber 5 17 can only cover part of the workpiece. The workpiece can It is then rotated on the rotor 539, so that all workpiece surfaces are at least temporarily immersed. In any of the above embodiments or methods, the workpiece can be rotated in the rotor to provide a uniform distribution of the process fluid. In the process of removing liquid from the workpiece, A surface tension gradient that reduces the process can be used. A cleaning fluid such as deionized water is introduced into the internal process chamber 517 to remove any remaining process chemicals. Gases such as nitrogen and organic vapors such as isopropanol are then passed through the manifold. 535, or introduced through the second same manifold, makes it easy to remove the washing liquid from the surface of the workpiece with a gradient of surface tension. Referring back to FIG. 20, the washing liquid 521 is removed using organic vapor, which is Reduce the surface tension of the liquid-gas interface 565. Using the surface tension effect, the washing liquid 521 can move down from the interface area 565 to most of the washing liquid 521. Therefore, the washing fluid is slowly rotated through the internal process chamber 517, The level can be lowered to remove the cleaning liquid 521 and contaminants remaining on the surface of the cleaning liquid. This method removes the liquid from the workpiece 60 and allows the surface tension gradient caused by the organic vapor to be maintained at the time when the cleaning liquid shrinks. The surface of the workpiece. The suction manifold 567 may provide a surface immediately adjacent to the edge 557 of the discharge pipe for discharging the liquid in the chamber 517. During the process chamber in which the washing liquid is removed from the inner process chamber 517, a new washing fluid can be introduced into the inner process chamber 540, and the process chamber will pivot to drain fluid. When the surface of the liquid flows toward the drain tank, new liquid flows in constantly and overflows. This will allow the removal of molecules and accumulated contaminants that are caused by the cleaning and washing processes and that are liable to remain on the surface of the fluid. -24- This paper size applies Chinese National Standard (CNS) A4 (210X 297mm) B7 V. Description of the invention (22) The external storage chamber 519 can be connected to the flushing gas source 583 of the flushing port 587 with a gas or vapor Rinse while maintaining the required environment. This gas may be nitrogen, argon, or a vapor such as hydrofluoric acid (HF) or a combination thereof. Similarly, gas or vapor can be introduced into the internal process chamber 517 to provide a controlled environment. Sonic energy can be applied to the workpiece via a transmitter 575 (huge sonic or supersonic transmitter) in the inner chamber, as shown in FIG. 20. The conveyor 575 is positioned to transfer sonic energy through the liquid in the inner chamber to the workpiece being immersed in the liquid. The sonic transmitter can also be provided on the rotor or in contact with the workpiece held by the rotor. Different types of openings can be used alone or in combination with each other. The sonic transmitter 575 is selectively powered to or from the slip ring at the rear end of the system or device 511 via a wire disposed in or through the inner chamber 517 or via a wire on the rotor 539. In another embodiment, the device is the same as described above in relation to Figures 20-22, except that the chamber 517 does not have an opening 555. However, the inner chamber has a continuous cylindrical side wall surface ' enabling it to be closed and sealed by 547. In addition, the fluid supply line 533 is connected to an outlet or a nozzle in the inner chamber via a rotary fluid coupling 5 3 7. When the inner chamber is supplied by liquid, the rotating fluid coupling allows the inner chamber to rotate (not only for example 100 °, but continuously 36 (Γ is mostly used to discharge liquid). An identical rotary wiring (preferably electrical or pneumatic) connects the inner chamber In 517, the discharge pipe opening 561 is switched to the controller. Thus, even from the outer chamber 5 19, the inner chamber 5 17 is closed (and preferably sealed). Therefore, pollution is further avoided. The outer chamber 519 can It will be omitted. The embodiment with the discharge opening 555 can be converted into a closed embodiment by installing the side wall plate 579 shown in FIG. 22 to cover the opening 555. For some process steps, the workpiece in the holder or the rotor 539 60 can remain fixed, while the chamber 517 rotates with it. In the alternative, both the chamber 517 and the rotor 539 • 25- This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 546172 A7 B7 V. Invention description (23) The workpiece 515 can be rotated or rotated. Furthermore, in the design where the workpiece ⑼ is fixed at any time, the rotor 539 can be structured as a clamp that is simply connected to a fixed (non-rotating) rear structure. Room 517 with Rotate (for example, when discharging liquid or spraying or otherwise applying process media to the workpiece). This closed embodiment enables dip processing. However, when there is no opening 555, the liquid is removed by opening the discharge tube 561 Production 'Using the positioning of the chamber, the discharge pipe 561 is located at a low point. In the design of the change-over processor, the workpiece is held directly or by holding the carrier containing the workpiece, and the workpiece holder holds the workpiece. An auxiliary room or process room The support is provided along the chamber and is suitable for holding liquid when closed. The liquid is supplied into the process chamber so that the workpiece is at least partially immersed. The process chamber pivots or rotates, resulting in a groove, drain opening or overflow The edge moves down to the liquid level. This allows liquid to flow out of the process chamber. The process chamber continues to rotate until most or all of the liquid is removed from the chamber. Other steps and the characteristics described below may have advantages. The invention is not the most important.-The conversion processor unit 65 used in the system 10 is shown in the figure ". The processor single S65G can be used in the automatic system 1 (), as shown in Figs. Other automatic systems, or it can be used alone, so that the workpiece is loaded and unloaded manually by the processor unit 650 or by a dedicated robot. As shown in the figure, the processor unit has a workpiece holder 656. The workpiece holder is fixed in position and does not Move. A process room or auxiliary room 654 surrounds or closes the workpiece holder 656 on the three sides. Opens the top of the chamber 654. The workpiece holder 656 is shown as a separate component or sub-assembly as shown in Figure 28. A front-26-i paper Scale suitable wealth @ s 家 标准 _) Zhige (21GX297 public love 1 ---------- 546172 A7 B7 V. Description of the invention (24) The ring 672 and the rear ring or plate 674 are connected to the bracket arm 670. A comb 676 or other workpiece edge bracket (such as a pole or post) extends between the front ring 672 and the rear ring 674. A connecting hub 678 at the rear end of the bracket arm 670 is connected to the rear wall of the outer chamber 652 or other fixing structure. Therefore, the wafer rack 656 is fixed in position relative to the chamber 654 and the process robot 22. The front opening 684 in the front ring 672 allows the workpiece to be loaded or unloaded by the workpiece holder 656. 27 and 28, an upper manifold 682 is provided close to the top of the workpiece holder 656. The upper manifold 682 is connected to a process liquid or vapor supply, preferably isopropanol vapor (although other liquids and vapors may be used). A lower or second manifold 680 provides access to the bottom of the workpiece holder 656. The lower manifold 680 is connected to a process or washing liquid, preferably a supply of dissociated water. FIG. 29 shows the chambers 654, respectively. As shown in FIG. 29, the chamber 654 has a cylindrical wall surface 692 connected to a rear wall or plate 690 of the rear end of the chamber 654. As shown in FIG. 26, the cylindrical wall surface 692 is opened at the top. One of the upper edges of the cylindrical wall surface 692 (on the left side of Fig. 26) forms a discharge edge 696. In use, the outflow of liquid contained in the chamber or bowl 654 covers the discharge edge 696. The notch 700 may be provided at the discharge edge 696 to improve liquid outflow characteristics. The chamber 654 is connected to and supported by a shaft 698, which is rotatably supported by the outer chamber 652 (if used) or other fixed structures of the process machine 30. 27 and 29, a drive shaft 702 of a motor or rotary actuator 704 extends through the shaft 698 and is coupled to a rear plate 690 of the chamber 654. The motor or actuator 704 may be electrical, hydraulic, pneumatic, and so on. Actuation of the motor 704 causes pivoting of the chamber 654. Where the outer chamber 652 is used, this drive shaft 702 can be replaced by a magnetic coupling to avoid

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Line 546172 A7 B7 V. Description of the invention (25) Avoid penetrating into the process environment along the workpiece. Figures 30 and 31 show the selective outer chamber 652 as a separate component, with various components removed for illustration purposes. Referring to FIG. 30, the outer chamber 652 includes a cylindrical wall surface 720 joined to a rear plate 722. A drain tank 726 at the bottom of an outer chamber 652 is provided to collect liquid and direct it to a drain outlet 728. The discharge outlet 728 is connected to a facility wastewater discharge pipe or other drainage system. The bottom plate 730 supporting the outer chamber 652 is sequentially connected to the chassis 734 shown in FIG. 27 or other structures of the process machine 30. The cylindrical wall surface 720 of the outer chamber 652 extends continuously (360 °). The front end 732 of the outer chamber 652 is opened. Referring to FIG. 27, during processing, a door assembly 738 provides an open front end or front opening 684 to close the chamber 654. This allows the chamber 654 to be filled with liquid during processing. As shown in FIG. 27, where an outer chamber 652 is used, the door assembly 738 closes the open front end of the outer chamber 652 at the same time. Referring to Figures 27 and 32, the door assembly 738 includes a room door panel 740 connected to a pivot bearing 742. The pivot bearing 742 is fixed in the stopper 744 by a pivot ball 754. The door panel 740 and the pivot bearing 742 can pivot the O-ring 752 relative to the stopper 744. This allows the door panel 740 to pivot with the chamber 654 while the remainder of the door assembly 738 remains in place. The pivot ball 754 is fixed in an inner cylinder 760. The inner cylinder 760 is housed in an outer cylinder 762. A sliding pressure seal 764 seals the inner cylinder 760 along the outer cylinder 762, while allowing the inner cylinder to slide (in the left-right direction of FIG. 32) within the outer cylinder 762. Compressed air or fluid ports 772 and 774 are provided outside and inside the outer cylinder 762, which is located at the sliding pressure -28-This paper size applies to China National Standard (CNS) A4 (210X 297 mm)

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Line 546172 A7 —------- B7 V. Invention ^ ~~) " * 1 On the opposite side of Chafeng 764. Upon introduction of air or liquid under pressure into ports 772 and 774, the inner cylinder 760 is moved in or out to engage or separate the plate 740 into the chamber 654. A cap connected to the inner end of the outer cylinder 762 catches the inner cylinder 760 and restricts its movement to a specified range. A seal stop 748 holds an outer chamber door seal 746 to the door panel 766. Referring again to FIGS. 27 and 32, a door mounting plate 768 supports the outer cylinder 762. The cover 770 selectively provides a front surface covering the outer cylinder 762. Referring temporarily to FIGS. 33 and 34, the entire door assembly 738 is supported on a door rail 78o that is coupled to a support structure or housing of the processor 650. A sleeve 782 connected to the door mounting plate 768 slides on the door rail 78. An actuator or motor 776 moves the entire door assembly 738 vertically along the doorway. The workpiece 60 is loaded into the processor unit "ο by the processing robot 22, and is moved to the processing section 26 by the surface section 24. The process parameters and workpiece movements can be controlled by the computer / controller 32 'or the control panel 28' or by other remote control or facility computers / Controller to control. During loading and unloading, the door assembly 738 is located in the lower position, as shown by the double dashed line in Figure 33. The process robot 22 moves the workpiece through the open front end 732 of the outer chamber 652 (if used), the passage chamber The front end 708 of 654 and the open front end through the workpiece holder 656. The processing robot 22 configures the workpiece 60 to enter the comb 676 or other supporting surface in the workpiece holder 660. The processing robot 22 then shoots. The workpiece 60 is held on the workpiece holder 656 prevents them from touching each other. Generally, the workpieces are in an upright or near upright position (for example, within +/- 5, 10, 15, 20, or 30. of a vertical line). The comb 676 can be, for example, 5- 15. -29- This paper size is applicable to Chinese National Standard (CNS) A4 specification (210X297 Gongchu) 546172 A7 B7 V. Description of the invention (27) The workpiece is held at a slight angle to reduce the movement of the workpiece. Door group The piece 73.8 is moved from the downward position, as shown by the double dotted line in Fig. 33, to the upward position, as shown by the solid line of Fig. 33 and 34. The door assembly 738 is located in the withdrawn or separated position, and the inner cylinder 760 , Pivot ball 754, door panel 766 and chamber door panel 740 move forward and 652 and process chamber 654 leave, as shown by the dashed line in Figure 32. A compressed liquid or gas is supplied into outer cylinder 762 through outer port 774. This drives the inner The cylinder 760 and the door panels 766 and 740 are rearwardly engaged with the outer chamber 652 and the process chamber 654. In particular, when the inner cylinder 760 moves inward toward the outer chamber 652 and the process chamber 654, along the cylindrical wall surface 692, The door panel seal 706 is joined via the chamber door panel 740. At the same time, the outer chamber door panel 766 moves to engage with the seal 746 on the door panel 766, and the door panel engages the leading edge of the cylindrical wall surface 720 of the outer chamber. When the door assembly 73.8 is in the engaged position, As shown in FIG. 27, the chamber 654 can contain liquid and is filled up to the edge of the discharge pipe 696 so that the workpiece 60 is immersed. The front end of the cylindrical wall surface 692 of the chamber 654 and the door panel 740 are sealed. Contact provides liquid tightness However, a small amount of leakage is generally acceptable. Similarly, a small amount of leakage is generally acceptable through the seal 746. When the door assembly 73.8 is engaged, the liquid is introduced into the process chamber 654. The liquid may be from the nozzle or simply from the lower manifold. The opening in 680 is sprayed. The liquid is preferably dissociated water. The lower manifold 680 is supplied via a liquid supply line 686 extending through the bracket arm 670 and the connection hub 678. This avoids the pivoting action of the chamber 654 and the upper and lower manifolds connected to the workpiece holder 656 Interference between liquid supply lines 686 of tube 680. Comb -30- This paper size applies to China National Standard (CNS) A4 (210X297 mm)

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Line 546172 A7 B7 V. Description of the invention (28) 676 It is preferable to provide multiple workpieces for a batch, for example, a batch of 5-50 workpiece processing locations. The lower manifold 680 is preferably located at or near the bottom of the workpiece holder. Water or other liquid is supplied through the manifold 680, and the chamber 654 is located upright or at 0 °, as shown in Figs. 26 and 36. Water is supplied into the chamber 654, preferably until the workpiece 60 is completely immersed, as shown in FIG. The water supply then stopped. The edge 696 of the discharge pipe is positioned vertically above the top edge of the workpiece. The computer / controller 32 determines when the workpiece is immersed by measuring the volumetric flow meter flowing through the supply line 686, or alternatively by the liquid level detector 688 on the workpiece holder 656.

When the predetermined level is reached, or after a predetermined delay interval, the controller 32 excites the motor or actuator 704 to begin pivoting or rotating the chamber 654. The chamber 654 then pivots along the axis 698, causing the edge 696 of the discharge tube to move downward. When this occurs, water 790 flows through the edge 696 of the discharge pipe and out of the chamber 654. If an outer chamber 652 is provided, water is collected at the bottom of the outer chamber 654, flows into the drain through hole 726, and flows out of the processor unit 650 through the drain pipe outlet 728. The controller 32 and the motor or actuator 704 preferably rotate the chamber 654 at an angular rate that causes the water or liquid 790 position to descend at a substantially constant linear vertical rate. Preferably, the chamber is rotated or pivoted such that liquid is discharged at a rate of about 0.1-3.0 or 0.1-10 or 0.1 -5 or 0.1 -2 mm / sec, 0.5-10 or 0.5-5 or 0.5-1 or 2 mm / sec . This rate of discharge or descent is selected as fast as it actually is, without having a concave surface that separates from the surface of the workpiece. When the chamber 654 pivots, the edge 696 of the discharge pipe moves in a circle along the axis 698. The sinusoidal pivot velocity configuration of the chamber 654 provides a fixed or linear decrease in the liquid level 790 in the chamber 654. Figure 36-39 shows that the chamber 54 is pivoted into four different positions, and Figure 36 shows from • 31-This paper size applies Chinese National Standard (CNS) A4 specifications (210X 297 mm) A7 B7 546172 V. Description of the invention (29 ) Start position, and Figure 3 9 shows the end position, and all liquids have been removed. The position of the chamber 654 from the position shown in FIG. 36 to the position shown in FIG. 39 is preferably smooth and continuous. After all the liquid has been removed by allowing the liquid to flow out through the edge of the discharge tube, the guard 60 can be removed by the processor unit 65G. This is achieved by reversing the order of the gate assembly 738. Alternatively, the workpiece 6G can be maintained within the processor unit 65 ° 'and the chamber 654 can be rotated to its original position. The position, as shown in Fig.%, Is used to repeat the washing, spraying or dipping process one or more times. In the conversion process of cleaning the workpiece, the above sequence is followed. In addition, an organic solution such as isopropanol is introduced into the chamber 654 through a nozzle or opening in the upper manifold 682. Organic solvent vapors such as heated nitrogen and mixed gases can also be provided and introduced above the water level 790 in the chamber 654. The chamber 654 pivots or rotates as described above. Water drains through the edge of the discharge pipe 696. When this occurs, additional organic solvent vapors and gases are supplied into the chamber. Organic solvent vapor reduces the surface tension of water at the surface / water and interface of the workpiece. This reduces and prevents water droplets from remaining on the surface of the workpiece, which causes less pollution when the water level drops. The gas may be provided by a dry gas manifold 71o, which is juxtaposed with steam manifold 682, or it may be supplied by a steam manifold with or without steam. After the vapor supply is stopped, the dry gas preferably continues to remove any remaining vapor from the chamber 654. The outer chamber 652 contains and discharges liquid through the edge 696 of the discharge pipe, or leaks through the seal 706. The outer chamber also helps to isolate the workpiece from the surrounding environment, operators, immediate components and equipment. Where the outer chamber 654 is used, it can be flushed with gas or steam to maintain the required environment. The gas can be, for example, nitrogen, argon, or ozone. -32- This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm).

546172 A7 B7 V. Description of the Invention (30) Vapor such as HF, or a combination thereof. However, the present invention can be carried out as described above without using any external chamber. Although dissociated water is preferred as a washing liquid, other liquids or mixtures including hydrofluoric acid (HF) may be used. For subsequent processing steps, different liquid, gas or vapor (collectively referred to herein as "fluid") media can be applied to the workpiece by dipping, spraying, or other applications. Cleaning, as described above, can be performed between processing steps. These manifolds can also be used to introduce other process fluids. Alternatively, additional manifolds can be provided for this purpose. Particularly when used in an outer chamber 652, this subsequent processing allows the workpiece to remain closed in the outer chamber 652 at any time, thereby reducing the possibility of contamination. At the workpiece dip, a continuous new liquid solution may be provided into the chamber 654. In this application, liquid can be drawn in through the lower manifold 680 and continuously discharged through the discharge edge 696, while the chamber 654 is maintained at 0 ° or the upright position shown in FIG. The sonic energy is preferably applied to the workpiece 60 through a conveyor 712 located on the workpiece support 656. A conveyor 712, such as a supersonic or supersonic transmitter, is positioned to transfer sonic energy through the liquid in the chamber 654 to the workpiece being immersed in the liquid. As shown in Figs. 36-41, the workpiece holder 656 is supported on the arm 670, and the arm is offset from the workpiece 60 and the axis 698 of the rotation axis or chamber 654. As shown in Figures 40 and 41, this allows the chamber 654 to pivot at about 100 ° to drain all liquid from the chamber 654. All liquid, gas or vapor supply lines, and any electrical connections to the sensor, such as the level sensor 688, can be routed through the support arm 670 and the connection hub 678. This allows the chamber 654 to pivot freely along the workpiece holder 656 without interference, and does not require special accessories or cables for adjustment. -33- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

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Line 546172 A7 B7 V. Description of the invention (31 actions. Figure 35 is the same as the above-mentioned processor unit 650, which represents a conversion processor unit 800. However, the processor unit 800 shown in FIG. 35 can be adapted to accommodate vehicles and cassettes Or the workpiece 60 held in the tray 804. Therefore, the processor unit 800 has a changing workpiece holder 802, which has a shelf 806 for holding the carrier 804 instead of the comb shown in FIG. 676. The design and operation of the processor unit 800 shown in Figure 35 are otherwise the same as the design and operation of the above-mentioned processor unit. -34- This paper size applies to the Chinese National Standard (CNS) A4 specification (210X 297 male) (Centimeter)

Claims (1)

546172 A system for processing a workpiece includes: an interface section; a process section; a clothing robot is movable to carry a workpiece from the interface section to the process section; 6 a processor unit in the process section, the processor unit There is a process j, a discharge pipe opening is located in the process chamber, and a process chamber driver hunts down the discharge pipe opening to the liquid level in the process chamber for pivoting the process chamber to discharge liquid out of the process chamber. 2. The system according to item 丨 of the patent application scope, wherein the process chamber has a curved side wall and the discharge pipe opening is located in the curved side wall. 3. The system according to item 2 of the patent application, wherein the discharge pipe opening includes a groove in a curved side wall connected to the discharge port. 4. If the system of claim 2 is applied, the process chamber is generally cylindrical and has a central axis, and the process chamber driver pivots the process along an axis parallel to the central axis of the generally cylindrical process chamber. room. 5. If the oldest system in the scope of patent application, the process room along the -horizontal axis The system of item further comprises at least one manifold in a process chamber for guiding a fluid into the process chamber. 7. If the system is the oldest in the scope of patent application, the process chamber driver drives the process chamber from the opening of the discharge pipe next to one of the top positions of the process chamber M to the second position of the discharge pipe close to the bottom of the process chamber. 8. The system according to item 1 of the patent application scope further comprises a rotatable support at -35- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) Ｍ 衣 枉 to 内科丁 ... n j six, next to the position of Fu Gong. _: The system of item 2 of the second patent scope further includes a door assembly, and the part includes a closed frame that can be attached to the process room. 1〇 · —A system for processing workpieces, including: an interface section; a process section;-a process robot that can be moved to carry the workpiece by the process section; called only 芏-the processor unit in the process section 'this processing The processor unit has a process chamber including: ^ a discharge pipe opening located in the process chamber;-a process chamber driver for pivoting the process chamber to discharge a liquid process chamber; and a rotor rotatably supported in the process chamber. u. If the system of claim 10 is applied, it must further include at least one process that is in the 4th process, and a flexible supply line is connected to the manifold, and when the process chamber is pivoted, the flexible supply The pipeline moves with the process chamber. 12 · As described in item 10 of the scope of patent application, furthermore, a switchable discharge pipe is included in the process room at a position spaced from the mouth of the discharge pipe. 々 Apply. The scope of monthly patent scope No. 10, System, wherein the process chamber includes a rear wall that is closed to a cylindrical side wall, the process chamber has an open front end, and further includes a door device for closing the open front end of the process room.如 · If the oldest system in the scope of patent application, further includes a first manifold in the process chamber connected to the organic solvent vapor source, and a second manifold in the soil -36-546172 A8 B8 C8 Connected to the process room of the water source. 15. If applying for the system of item i of the patent scope, the process room in # is only supported by the process room driver. 16. The system of claim 10, further comprising a rotary motor connected to the rotor. 17 · — A method for processing workpieces can be done in a number of ways, including the following steps: supporting the workpiece on a support in a process chamber; closing the process chamber; filling the process chamber with washing-saving liquid for at least part Immersing the workpiece in the liquid; and removing the liquid in the chamber by moving the chamber so that a discharge pipe opening in the chamber moves into a position during which the liquid moves through the discharge pipe opening using gravity, and Discharge outside the process. 18 ·: The method of applying for item 17 of the patent scope, wherein the discharge pipe opening is located on the side wall of the: and the liquid is removed by pivoting the chamber, and the discharge pipe opening is guided to the liquid level in the chamber. 19. The method described in item 17 of the patent application scope further includes the step of turning the support and the workpiece in the process chamber after removing the liquid. 20. If the application of item 17 of the scope of the patent application: ^ ^ ^ 忐 further includes spraying fluid into the process chamber before filling the process chamber with the washing liquid 21. If the application of the scope of the patent application area 20 of the plant water. Method wherein the washing liquid contains 22 · —a method for processing a workpiece, the next step is to support the workpiece in a rotor in a process chamber; -37- 546172 'The scope of the patent application closed the process chamber; filled the process chamber with a washing liquid and immersed in the liquid; used Λ to remove the workpiece by moving the chamber at least partially by moving the chamber pipe opening into a position = -The discharge in the chamber passes through the opening of the discharge pipe, and the discharge process chamber = ... gravity movement rotates the rotor and the workpiece. 23. The procedure for applying for a workpiece in the scope of patent application No. 22. The method further includes gas spraying 24.-A method for cleaning the workpiece, including the following: Supporting the workpiece in the rotor of a process chamber; Filling the process with a washing and filling liquid. To the first level, to fully immerse the workpiece in the liquid; remove the liquid in the chamber by moving the chamber, so that a discharge pipe opening in the chamber is moved into a person_position 'during which the liquid is utilized Gravity moves through the opening of the discharge tube and is discharged outside the process chamber; and an organic solvent vapor is guided into the chamber. It further includes rotating the workpiece, further including introducing gas. 25. The method and step of claim 24 in the scope of patent application. 26. The method of claim 24, the steps of the chamber. It further includes that when the workpiece is immersed in the method according to item 24 of the patent application, the sonic energy enters the process chamber 28. A processor unit for processing the workpiece, including -38- The scope of the patent application is a process room. The workpiece is located in the process room. A discharge pipe opening is located in the process room. The drive of the process room is used to open the Hanban mbanqi to the 5hai process room to move the discharge. The tube is moved from the first position to the center of the process chamber to discharge liquid from the process chamber. The second position of the liquid, 29. If the treatment sense of the 28th scope of the patent application-can be rotated to be positioned in the chamber of the process ... The bracket contains 30. A system for processing workpieces, including a production chamber; A = to 'is located in the accommodating chamber and has a discharge pipe opening; rate Tong shovel% system ^ + 芏 to, for controlling a speed sheep _ the process chamber to discharge liquid from the process chamber; and a workpiece holder Located in the process room. 3 1. If applying for the patent scope No. 3 ^, it is in the process room, ... further-including the speed of sound 32. If the system for patent scope No. 30 is applied to the process room. 33. The system of claim 30, a magnetic coupling is connected to the process chamber. 34. The system according to item 30 of the patent application scope further includes a removable door in which the process chamber driver has a cylindrical side wall in which the process chamber has a cylindrical side wall, and the discharge pipe opening is located in a circular circle in the cylindrical side wall. The system of scope item 30, wherein the process chamber can have a first position, during which the process chamber can be at least partially immersed in the workpiece holder-39 · This paper standard coffee house standard (CNS) A4 specification ( 210X297 public director)- The level of the workpiece to be held is pivoted to load the liquid, to a second position, = the liquid in the process chamber can be discharged through the opening to a level completely lower than the workpiece. 4 2 Please refer to the 35th m of the patent scope. The step includes a fluid supply 轺 L 'and the supply system includes a fluid supply line extending into the right to. The 37 ' two system of patent application No. 36, further comprising at least one spray nozzle connected to the fluid supply line. 38 · = Please call the system under the scope of the patent, which further includes at least one of a process fluid :, a process gas source, and a process vapor source, and is connected to the fluid supply system. 39. The system according to item 30 of the patent application, further comprising a workpiece holder, which is used to move the workpiece holder out of the process chamber for loading and loading the workpiece and moving the workpiece holder. The holder enters the process chamber and is used to process the workpiece. A system such as the one applying for the patent scope item 30, wherein the process chamber has a cylindrical side wall and can be pivoted along an axis parallel to the cylindrical side wall. 41. The system as claimed in item 30 of the March patent scope, further comprising a workpiece holder driver for rotating the workpiece holder. The system of claim 41, wherein the workpiece holder driver is connected to the workpiece holder by a magnetic coupling. Shishin calls the patented yoke system item 36, wherein the fluid supply line pivots with the process chamber. If the system of the scope of patent application No. 30, further includes the workpiece -40- Comb on displacer. 5. A system for processing a workpiece, comprising: an outer chamber; an inner to a rotatable branch house in the outer chamber; an inner chamber driver for rotating the inner chamber; a motor located in the inner chamber; and Rotor driver for rotating the rotor. 46. The system of claim 1 further comprising a fluid transfer system having a fluid transfer line extending into the inner chamber. 47. The system of claim 46, further comprising at least one opening, which is located in an inner chamber joined to the fluid transfer line. 48. The system of claim 47, wherein the at least one opening includes at least one spray nozzle. 49. The system of claim 45, further comprising an inner door on the inner room and an outer door on the outer room. 50. The system according to item 45 of the scope of patent application, further comprising a discharge pipe opening in the inner chamber, from which the outer chamber is derived. 51. The system of claim 45, further comprising a removable side wall panel in the inner chamber. 52. If the system according to item 45 of the patent application, the inner and outer chambers are cylindrical. 53. If the system of claim 52 is applied, the rotor is cylindrical and is concentric with the inner and outer chambers. 54. If the system and system of item 45 of the scope of patent application, further includes a flushing gas -41-546172 λβ Β8 C8 D8 6. The scope of patent application system, which is connected to at least one of the inner room and the outer room. 5 5. A method for processing a workpiece, including the following steps: configuring the workpiece into a workpiece holder; closing the workpiece holder holding the workpiece in a process chamber; providing process fluid into the process chamber; pivoting the process chamber To allow the process liquid to be discharged; and to rotate the workpiece holder. 56. The method of claim 55, wherein the workpiece is at least partially immersed in the process liquid. 57. The method of claim 55, further comprising the step of rotating the workpiece holder when the workpiece holder is at least partially immersed in a process liquid. 5 8. The method of claim 55, further comprising the step of directing a process gas or vapor into the process chamber. 5 9. The method of claim 55, further comprising the step of closing the process room in an external containment room. 60. The method of claim 55, wherein the process chamber is pivoted at a controlled rate to remove liquid from the process chamber. 61. The method of claim 55, further comprising the step of extracting the liquid surface layer in the inner chamber through a vacuum. 62. The method of claim 58 in which the gas contains nitrogen, air, argon, or HF. 63. The method of claim 55, further comprising the step of supplying sonic energy to the workpiece. -42- This paper size is in accordance with Chinese National Standard (CNS) A4 specification (210 X 297 mm). If the scope of the patent application is No. 59, the steps of the door sealing the process chamber. , And further includes a process chamber. For example, the scope of the patent application &, 濯 liquid enters the process chamber, the method =, further includes the steps of introducing a washing solvent vapor into the process ^, and then guiding a dry gas and organic . In order to facilitate the removal of the workpiece washing liquid 66. 2 method for processing the workpiece, including disposing the workpiece into a workpiece rod, step, closing, and holding the workpiece, the workpiece is rotated along the workpiece holder. To the inside, a process flow is provided. 67. At least one body on the first chamber enters the first chamber.开口 ^ Opening—a system for processing a workpiece, including: a housing; a processing chamber having a discharge pipe opening; a workpiece holder 'is located in a position within the housing of the processing chamber; and is fixed to the outer processing chamber The driver is connected to the process chamber 'and discharges the liquid at a controlled rate. The process transfers the process to the process 68. If the system of the scope of patent application No. ，, enter-. Is clamped on the workpiece holder. Step-by-step transmission of a sound speed-further includes a door that can be connected to the system 69. Such as the scope of the patent application, the door of the process chamber. Among them, the process chamber driver, 70. The system of the 67th scope of the patent application, 546172 A8 B8 A magnetic coupling is connected to the process chamber. 71. The system of claim 67, wherein the process chamber has a cylindrical side wall, and the discharge pipe opening is located in the cylindrical side wall. The system claiming the scope of patent 67, wherein the process chamber can be turned from the first position, during which the process chamber can be loaded with liquid at a level of at least partially immersed in the workpiece held by the workpiece holder, to a The second position, during which the liquid in the process chamber can be discharged through the opening to a level completely lower than the workpiece. The system of claim 72, further including a fluid supply system, the supply system including a fluid supply line extending into the process chamber. < 74. The system of claim 73, further comprising at least one spray nozzle connected to the fluid supply line. 75. The system according to item 74 of the patent application scope, further comprising at least one of a process liquid source, a process gas source, and a process vapor source, connected to the fluid supply system. & 76. The system of claim 67, wherein the workpiece holder includes a comb having a groove for holding a workpiece. 77. The system of claim 76, wherein the workpiece holder is supported on a support arm that is offset from the center of the process chamber. 78. The system of claim 67, wherein the process chamber has a cylindrical side wall and is pivotable along an axis parallel to the cylindrical side wall. 79. The system of claim 67, further comprising an outer chamber surrounding the process chamber, and the workpiece holder is fixed at a position opposite to the outer chamber. Bolt of cloth This paper size applies to China National Standard (CNS) Α4 specification (21〇X 297 public attack :) 546172 80. A system for processing a workpiece, comprising: an outer chamber; a process chamber that is switched to the outer chamber;-a discharge pipe opening located in the process chamber; a second system: a chamber driver for pivoting the Process chamber; and chamber solid-in the sub-t & in the process chamber, and the workpiece holder and the outer to fixed in a position opposite to each other. 81. According to the patent application No. 80 ^ < system, wherein the discharge pipe opening includes a groove passing through a cylindrical side wall of the process chamber. 82 .: The system for applying for the scope of patent application No. 80, which further includes a door assembly, ... the assembly has a first door that can be connected to the process chamber, and a second door that can be connected to the outer chamber. & The system of claim 80, wherein the process chamber and the outer chamber are cylindrical. 84. A method for processing a workpiece, comprising the following steps: configuring the workpiece into a workpiece holder; maintaining the workpiece in a fixed position; closing the workpiece holder holding the workpiece in a process chamber; providing a process liquid into the A process chamber; and pivoting the process chamber to allow process liquid to drain. 85. The method of claim 84, wherein the workpiece is immersed in the process liquid. 86. The method of claim 84, further comprising the step of directing a process gas or vapor into the process chamber. M6172 • If the method of applying for the private palace in item 84 of the patent, the method further includes the step of closing the process as for an outdoor room. 8. The item μ of the patented scope of the patent application pivots the process chamber, and the method further includes removing the adult body from the process chamber at a controlled speed M-controlled rate. Content 9 · The method of item 8 and θ of the scope of patent application, further including the step of providing sound velocity to the workpiece. 90. If the patent application scope is 84, it further includes the step of closing the open front end of the process chamber with a process chamber door. 91. If the method according to item 84 of the patent application, the method further includes a method of directing a washing body into the process chamber, and then introducing an organic vapor into the process to facilitate removal of the washing liquid from the workpiece. 92. A method for processing a workpiece, comprising the following steps: configuring the workpiece into a workpiece holder; closing the workpiece holder holding the workpiece into a chamber; maintaining the workpiece holder in a fixed position; along the workpiece The support pivots the chamber; and provides process fluid into the chamber through at least one fluid supply opening on the first chamber. -46- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)