KR20140118915A - Grid polarization device and light orientation apparatus - Google Patents

Abstract

Provided is a polarization device capable of irradiating polarized light of an ultraviolet region from a visible short wavelength range to a certain wide region and having excellent characteristics in the basic performance such as an extinction ratio or transmissivity. A stripe grid (2) installed on a transparent substrate (1) is made of a titanium oxide on an amorphous. If w is referred to as an average value of the width of a linear portion (21) constituting the grid (2), t is referred to as a distance from a side of one direction side of the linear portion (21), and T is referred to as a distance from a side of the other direction side thereof, the relation is t/T>0.0149w+0.0644.

Description

TECHNICAL FIELD [0001] The present invention relates to a grid polarizing element and a photo-

The present invention relates to a grid polarizing element.

Polarizing elements for obtaining polarized light are known as various kinds of optical elements such as polarizing filters and polarizing films as well as intimate products such as polarizing sunglasses and are also widely used in display devices such as liquid crystal displays. Polarizing elements are classified into several types in a manner of taking out polarized light, but one of them is a grid polarizer.

The grid polarizing element has a structure in which a fine stripe-shaped lattice made of a metal (conductor) is provided on a transparent substrate. And functions as a polarizer by making the interval of the grating narrower than the wavelength of the polarizing light. In the case of linearly polarized light, it is equivalent to a polarized light having an electric field component in the longitudinal direction of the lattice, since it is equivalent to a flat metal and thus reflected, while in a polarized light having an electric field component in a direction perpendicular to the longitudinal direction, , And the transparent substrate is transmitted and emitted. Therefore, linearly polarized light in a direction perpendicular to the longitudinal direction of the grating is exclusively emitted from the polarizer. By controlling the attitude of the polarizing element and orienting the longitudinal direction of the grating toward a desired direction, it becomes possible to obtain polarized light whose axis of the polarized light (direction of the electric field component) is directed in a desired direction.

Hereinafter, polarized light having an electric field component in the longitudinal direction of the lattice is referred to as s-polarized light, and polarized light having an electric field component in a direction perpendicular to the longitudinal direction is referred to as p-polarized light. Normally, a plane parallel to the incident plane (a plane perpendicular to the reflection plane and including an incident ray and a reflected ray) having an electric field perpendicular to the plane is referred to as a p-wave, but parallel to the plane of incidence This distinction is made on the premise.

The basic index indicating the performance of such a polarizing element is the extinction ratio ER and the transmittance TR. The extinction ratio ER is the ratio of the intensity Ip of the p-polarized light to the intensity Is of the s-polarized light among the intensities of the polarized light transmitted through the polarizing element (Ip / Is). The transmittance TR is usually the energy of the emitted p-polarized light with respect to the total energy of incident s-polarized light and p-polarized light (TR = Ip / (Ip + Is)). The ideal polarizing element has an extinction ratio ER = ∞ and a transmittance TR = 50%.

Japanese Patent Application Laid-Open No. 11-8172

Regarding the use of light, light in the visible range is often used as typified by display technology, but light in the infrared range is used in fields such as optical communication. On the other hand, in many cases, light is used as energy, and in this case, ultraviolet light is often used. For example, exposure (photolysis) of a resist in photolithography or curing treatment of an ultraviolet curable resin is performed. Therefore, in the field of using polarized light, when polarized light is used as energy, polarized light having a wavelength in the ultraviolet region is required.

More specifically, in a manufacturing process of a liquid crystal display, a technique called optical alignment has recently been adopted. This technique is a technique for obtaining an alignment film necessary for a liquid crystal display by light irradiation. When a film made of resin such as polyimide is irradiated with polarized light in an ultraviolet region, molecules in the film are aligned in the direction of the polarized light, and an alignment film is obtained. A high-performance alignment film can be obtained as compared with a mechanical alignment process called rubbing, and thus it has been widely employed as a process for manufacturing a high-quality liquid crystal display.

Thus, in some kinds of applications, it has become necessary to obtain a polarized light with a shorter wavelength band, and a polarizing element for this has been required. However, the polarizing element for polarizing the light in the short wavelength range has not been studied so much, and practically nothing has been put on the market as a product. The short wavelength range is the wavelength range of the ultraviolet to short wavelength side (for example, 450 nm or less) of visible light.

For visible light, a polarizing film aligned with the absorption axis of the resin layer is often used. However, for ultraviolet rays, the resin is deteriorated by ultraviolet rays in a short period of time, and therefore, it can not be used.

In the case of polarizing light in the ultraviolet region, a prism polarizer using calcite can be used. However, the prism polarizer is suitable for the application of polarized light to a narrow area such as a laser, but is not suitable for use for irradiating a polarized light to a somewhat wide area such as a light alignment.

The above-described wire grid polarizing element is capable of irradiating polarized light to a somewhat wide area. It is also possible to arrange a plurality of wire grid polarizing elements to irradiate polarized light to a wider area.

In the wire grid polarizing element, tungsten, copper, aluminum, or the like is used as a material of the stripe lattice. In the case of the wire grid polarizing element for ultraviolet rays, aluminum having a high reflectance is often used even in the ultraviolet region. However, although the wire grid polarizing element exhibits a high extinction ratio and transmittance to some extent for light in the visible range longer than about 500 nm, as the wavelength becomes shorter, the extinction ratio and transmittance decline sharply from around 400 nm. This reason is presumed to be due to the optical properties of aluminum although it is not completely understood.

As described above, in the use of an optical process such as optical alignment, a practical polarizing element capable of irradiating polarized light in the negative ultraviolet region from a visible short wavelength region to a somewhat wide area is desired. However, a practical polarizing element capable of excelling in basic performance such as extinction ratio and transmittance Polarizing elements are not yet developed. That is, in order to improve the quality of the alignment treatment, it is necessary to irradiate only the polarized light directed in a desired direction (enhancement of the extinction ratio), and to increase the productivity (processing efficiency), a polarizing element with higher transmittance is required.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and it is an object of the present invention to provide a polarizing element capable of irradiating a polarized light in a negative ultraviolet region from a visible short wavelength region to a somewhat wide region and having excellent properties in basic performance such as extinction ratio and transmittance .

According to a first aspect of the present invention, there is provided a grid polarizing element comprising a transparent substrate and a striped grating disposed on the transparent substrate,

The lattice is formed of amorphous titanium oxide,

When the average value of the widths of the line-shaped portions constituting the grating is w, the distance between the line-shaped portions on one side of the line-shaped portion is t and the distance between the adjacent linearly-shaped portions on the other side is T, Has a structure in which a portion of t < T is periodically held substantially at a portion of t < T and 0.0149w + 0.0644 at a portion of t < T.

In order to solve the above-described problems, according to a second aspect of the present invention, in the structure of the first aspect, the grating is formed so as to be in a direction along the surface of the transparent substrate, It does not have a portion where the two linear portions lined up at a large distance T are continuous.

According to a third aspect of the present invention, there is provided a liquid crystal display device comprising a light source and the grid polarizing element according to claim 1 or 2, wherein the grid polarizing element comprises an irradiation area And the light source, and is capable of irradiating light from the light source onto a film of light orientation through the grid polarizing element.

As described below, according to the invention described in claim 1 of the present application, the lattice is formed of titanium oxide in an amorphous phase, and the relation of the tangential t / T of the lattice to the lattice width w is 0.0149w + 0.0644 The extinction ratio can be improved without significantly lowering the transmittance. Therefore, it is possible to irradiate polarized light with better quality.

According to the invention as set forth in claim 2, in addition to the above-mentioned effects, the extinction ratio is not lowered because there is no continuous portion where the linear portions are arranged at a wide spacing distance T.

According to the invention described in claim 3, in addition to the above effects, photo alignment can be performed while irradiating high-quality polarized light with high energy, so that a high quality photo alignment film can be obtained with high productivity.

BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view schematically showing a grid polarizing element according to an embodiment of the present invention, wherein (1) is a schematic front sectional view and (2) is a perspective view.
2 is a schematic diagram showing the optical constants of the titanium oxide film formed in the experiments performed by the inventors.
3 is a diagram showing the optical constants of aluminum.
Fig. 4 is a graph showing the result of simulating changes in transmittance and extinction ratio accompanying the ubiquitination ratio (t / T) in the grid element of the embodiment using the titanium oxide film showing the optical constant of Fig. 2;
Fig. 5 is a graph showing the result of simulating how the transmittance and the extinction ratio become when the alumina ratio t / T is varied when aluminum, which exhibits optical constants, is employed as the material of the lattice 2 in Fig.
Fig. 6 is a perspective view schematically showing a reason why the extinction ratio is improved in the grid polarizing element of the embodiment. Fig.
Fig. 7 is a diagram showing the result of a simulation in which a wave of the x-direction magnetic field component is confirmed.
Fig. 8 is a front cross-sectional schematic view schematically showing a state in which an electric field Ey is newly generated by the wave (rotation) of the magnetic field component Hx.
9 is a graph showing the optical constants of the titanium oxide thin film at 300 캜 film formation.
FIG. 10 is a graph showing the results of simulation for the transmittance and the extinction ratio when the ellipticity ratio t / T is changed in the same manner for the titanium oxide thin film showing the optical constant in FIG.
Fig. 11 is a diagram for explaining the optimum structure of the grid polarizing element using the lattice 2 made of titanium oxide.
12 is a diagram showing the optical constants of the titanium oxide of the rutile crystal.
13 is a graph showing the result of simulating how the transmittance and the extinction ratio affect the ellipticity ratio t / T when titanium oxide of the rutile crystal is employed as the material of the lattice 2. Fig.
14 is a schematic view showing a method of manufacturing a grid polarizing element according to the embodiment.
Fig. 15 shows an example of use of the grid polarizing element of the embodiment, and is a schematic cross-sectional view of the photo aligning apparatus equipped with the grid polarizing element.

Next, a mode (embodiment) for carrying out the present invention will be described.

Fig. 1 is a schematic view schematically showing a grid polarizing element according to an embodiment of the present invention. Fig. 1 (a) is a front sectional schematic view, and Fig. 2 (a) is a perspective view. The grid polarizing element shown in FIG. 1 is mainly composed of a transparent substrate 1 formed of a transparent material and a grating 2 provided on the transparent substrate 1. The polarizing element of the embodiment has a structure similar to that of the wire grid polarizing element, but since the lattice 2 is not a conductor (wire) as described later, it is simply called a grid polarizing element.

The transparent substrate 1 is referred to as " transparent " in the sense that it has sufficient transmittance with respect to the wavelength of use (wavelength of light polarized by using the polarizing element). In this embodiment, quartz glass (for example, synthetic quartz) is employed as the material of the transparent substrate 1 since light in the ultraviolet region is assumed to be used wavelength.

As shown in Fig. 1, the lattice 2 is of a stripe shape composed of a plurality of linear portions 21 extending in parallel. Each line-shaped portion 21 is formed of amorphous titanium oxide. The average value of the widths of the line-shaped portions 21 is w, the distance between the line-shaped portions 21 on one side of the line-shaped portions 21 is t and the distance between the side line-shaped portions 21 on the other side is T T < T > 0.0149w + 0.0644 in a portion where t < T is satisfied. Hereinafter, for convenience of explanation, t / T is called a ellipticity ratio, and a width w is abbreviated as a lattice width.

In the above description, "substantially t <T" means that the spacing distance t on one side is substantially different from the spacing distance T on the other side. The term &quot; substantially &quot; means that the difference in the distance caused by manufacturing variations does not include, and intentionally, t &lt; &gt;

Also, "periodic" means not to be random. When t ≠ T is caused by a manufacturing variation, it is random, but is intentionally set to t ≠ T so that the action described later is performed, and therefore, becomes periodic. The periodicity in this case means that a portion of t? T periodically exists in a direction perpendicular to the longitudinal direction of the grating 2 along the surface of the transparent substrate 1.

The structure of the grid polarizing element of this embodiment is such that the structure of the grid polarizing element capable of obtaining a higher extinction ratio and transmittance in a region extending from the visible short wavelength region to the ultraviolet region (hereinafter collectively referred to as a short wavelength region) This is the achievement of exemplary research.

The inventors have conducted intensive research on the structure and material of the grid polarizing element, particularly the grating 2, in which the extinction ratio and transmittance can be obtained in the short wavelength region, and as a result, 2) is effective in selecting the material or structure of the substrate.

The conventional wire grid polarizing element can also be referred to as a reflection type grid polarizing element. By reflecting a linearly polarized light having an electric field component in the longitudinal direction of the grating 2 by using a metal having a high reflectivity in the grating 2 So that the transparent substrate 1 is not transmitted. In the gridded polarizing element of this type, as described above, there is a limitation in improvement of basic performance such as extinction ratio and transmittance in a shorter wavelength region.

The inventors of the present invention have contrived a method which should be called an absorption type grid polarizing element, unlike the conventional method of the grid polarizing element. Even if it is of the absorption type, the absorption of light by the polymer visible in a polarizing film for visible light or the like is not used but attenuation of light by electromagnetic induction is used.

As is known, in the propagation of light in a conductive medium such as a metal, the refractive index is treated as a complex refractive index. In order to distinguish the complex refractive index from the ordinary refractive index, when n 'is satisfied, the complex refractive index n' is represented by the following equation (1).

In Equation (1), n is a real part of the complex refractive index, and k is a so-called attenuation coefficient. The inventors of the present invention have found that a grid polarizing element using attenuation of light due to electromagnetic induction phenomenon that has come to be overcome by the inventors has a refractive index real part n larger than the attenuation coefficient k and employs an uneven grid structure.

Algorithm for the determination of intrinsic optical constants of metal films: application to aluminum, Appl. Opt. 34, 4755-4767(1995)에 나타낸 데이터에 의거하여 작성한 것이다. First, the complex refractive index of titanium oxide used as a lattice material in the grid polarizing element of the embodiment and the complex refractive index of aluminum as a comparative example will be described. Fig. 2 is a schematic diagram showing the optical constants (refractive index real part n, extinction coefficient k) of the titanium oxide film produced in the experiments performed by the inventors. 3 is a diagram showing optical constants of aluminum,

Algorithm for the determination of intrinsic optical constants of metal films: application to aluminum, Appl. Opt. 34, 4755-4767 (1995).

The titanium oxide film having the optical constant shown in Fig. 2 is formed on the quartz transparent substrate 1 by the ALD method described later, and the temperature at the time of film formation is about 100 캜. Therefore, it is assumed that the state of the film is amorphous. The film thickness is about 20 nm. As shown in Fig. 2, the refractive index real part n is smaller than the extinction coefficient k in the wavelength of the ultraviolet region of about 240 nm to 400 nm. On the other hand, as shown in Fig. 3, in the case of aluminum, the refractive index real part n is always small with respect to the extinction coefficient k in the same short wavelength region.

Fig. 4 is a diagram showing a simulation result of electromagnetic wave propagation conditions in a grid element according to the embodiment. Fig. Fig. 4 is a graphical representation of the case where the grid polarizing element shown in Fig. 1 is constituted by the titanium oxide thin film shown in Fig. 2. Simulation of how the transmittance TR and the extinction ratio ER change in the case of variously changing the ellipticity ratio t / . In Fig. 4, (1) represents the transmittance and (2) represents the extinction ratio. In the simulation of FIG. 2, Rigorous Coupled-Wave Analysis (RCWA) is used, and software (http://physics.nist.gov/Divisions/Div844/facilities/) distributed by the National Institute of Standards and Technology scatmech / html / grating.htm) was used, and the transmittance TR and the extinction ratio ER at each t / T were calculated.

As shown in Fig. 2, the refractive index real part n and the attenuation coefficient k have different values depending on the wavelength. For example, ultraviolet rays of 254 nm are used, and n and k at this wavelength are assumed. Specifically, n = 2.35 and k = 1.33. With respect to the permittivity, these calculations were previously calculated from n and k and substituted. The width W of the lattice 2 was varied between 10 and 30 nm at intervals of 5 nm, but the height was made constant at 170 nm. For each lattice width W of 10 to 30 nm, the ellipticity ratio t / T was varied. Further, t / T was changed by decreasing t and increasing T so that t + T = 180 nm was always satisfied at t = T = 90 nm when the localization ratio t / T = 1.

In Fig. 4 (1), the transmittance is shown when the transmittance at t / T = 1 (when it is not ubiquitous) is 1 and the relative value to t / T is less than 1. The extinction ratio in FIG. 4 (2) is also the same, and is represented by a relative value when the value at t / T = 1 is set to 1.

As shown in Fig. 4 (1), when the ratio is less than 1 as compared with the case where t / T = 1, the transmittance is slightly lowered, but the grating width W of 10 to 20 nm does not show much deterioration. Also, even in the case of a lattice width of 20 to 30 nm, there is no significant decrease in transmittance when t / T is in the range of about 1 to 0.7.

On the other hand, as shown in Fig. 4 (2), it is confirmed that the extinction ratio is improved as compared with the case of t / T = 1 by making t / T less than 1. In particular, a remarkable improvement is confirmed when the grating width W is 15 to 25 nm.

Next, as a comparative example, simulation results are shown for the case where the aluminum shown in Fig. 3 is made of the material of the lattice 2. Fig. 5 is a graph showing the results of simulating how the transmittance and the extinction ratio become when the ellipticity ratio t / T is varied when aluminum, which exhibits an optical constant, is employed as the material of the lattice 2 in Fig. Similarly, the transmittance TR is shown in Fig. 5 (1) and the extinction ratio ER is shown in (2). Likewise, the wavelength of use is assumed to be 254 nm, and it is obtained at this wavelength, and the refractive index real part n = 0.183 and the extinction coefficient k = 2.93. Like the width of the lattice 2, was changed from 10 to 30 nm at intervals of 5 nm, and the height was made constant at 170 nm.

As shown in Fig. 5 (1), in the case of the lattice 2 made of aluminum, it is confirmed that the transmittance TR is slightly improved in the lattice width W of 10 to 20 nm. The transmittance TR is higher when the ellipticity ratio t / T is smaller, and is about 40% at the maximum. However, as shown in Fig. 5 (2), with respect to the extinction ratio, even when the lattice width is W, when t / T is made smaller than 1, the extinction ratio is reduced. The deterioration of the extinction ratio is remarkable in the region where the improvement of the transmittance is small and the partial dispersion ratio t / T is small. That is, in the case of the lattice 2 made of aluminum, it was confirmed that even when the lattice 2 is unevenly distributed, the extinction ratio, which is important, is lowered and the improvement of the transmittance and the improvement of the extinction ratio are not compatible. Although not shown in the drawing, it has been confirmed that the extinction ratio is not improved and decreased even when the ellipticity ratio t / T is less than 1 in the case of aluminum at a wavelength of 365 nm.

As described above, in the case of the grid polarizing element of the general aluminum lattice 2, unlike the conventional grating 2, the extinction ratio is not improved but rather deteriorated. On the other hand, the lattice 2 made of titanium oxide In the grid polarizing element of the shape, the extinction ratio can be largely improved by making the grating 2 localized under any condition, and the transmittance is not significantly reduced even in this case.

In the grid polarizing element of the embodiment having the lattice 2 made of titanium oxide, the reason why improvement of the extinction ratio can be seen will be explained below. Fig. 6 is a perspective view schematically showing a reason why the extinction ratio is improved in the grid polarizing element of the embodiment. Fig.

As described above, since the extinction ratio is the ratio of the intensity (Ip) of the p-polarized light to the intensity Is of the s-polarized light, in order to increase the extinction ratio, the s- We consider the behavior of s-polarized light mainly.

In Fig. 6, for the sake of convenience, light is propagated from above to below on the paper surface, and this direction is defined as the z direction. In addition, the direction in which the grating 2 extends extends in the y direction, and s-polarized light (denoted by Ls in Fig. 6) has an electric field component Ey. The magnetic field component (not shown) of the s-polarized light becomes the x direction (Hx).

When the s-polarized light reaches the lattice 2 of the grid polarizing element, the electric field Ey of the s-polarized light is weakened by the dielectric constant of the lattice 2. On the other hand, the medium between the grids 2 is often air, but since the dielectric constant is generally smaller than that of the grids 2, the electric field Ey is not weakened in the grating 2 in the space between the grids 2.

As a result, a rotational component of the electric field Ey is generated in the x-y plane. Then, according to the following Maxwell's equation (Equation 2) corresponding to the Faraday's electromagnetic induction, the magnetic field Hz is caused in two directions opposite to each other in accordance with the intensity of the rotation Re in the xy plane.

That is, the boundary between the grids 2 has the highest point of the electric field Ey at the center, Hz is directed to the forward direction of the light in one side, and Hz is directed to the rear in the other side. Although not shown in Fig. 6, the magnetic field Hx in the x direction exists in the same phase as Ey and toward the negative x side. This x-direction magnetic field component Hx is attracted to the generated z-direction component Hz and deformed to wave.

Fig. 7 is a diagram showing the result of a simulation in which the wave of the x-direction magnetic field component Hx is confirmed. In Fig. 7, simulation is shown as an example using silicon as a lattice material. Silicon is also a material having an index of refraction n = 4.03, an extinction coefficient of 3.04, and n &gt; k with an ultraviolet ray having a wavelength of 365 nm, for example. 7, the width of the line-shaped portion was 15 nm, the interval between the line-shaped portions was constant at 90 nm, and the height of each line-shaped portion was 170 nm. The simulation is based on the Finite-Difference Time-Domain (FDTD) method, and the software used is MATLAB (registered trademark of the same company) of Mathworks (Massachusetts, USA).

In Fig. 7, the dark black portion on the upper side represents a negative component of the electric field Ez, and the middle light gray portion represents a positive component of the electric field Ez. The magnetic field is represented by a vector (arrow).

As shown in Fig. 7, only the Hx component is present because there is no Hz component in the s-polarized light before reaching the lattice 2. However, due to the above-mentioned generation of the Hz component reaching the lattice 2, It can be confirmed that a wavy shape is formed at the surface of the substrate. As shown in Fig. 7, the wave of the magnetic field can be referred to as the rotation of the magnetic field in the clockwise direction. 7, the y direction is the light propagation direction, and the z direction is the longitudinal direction of the lattice 2, which is different from Fig.

When a wave (rotation) of the magnetic field component Hz occurs, an electric field is further generated in the y direction by the Maxwell's equation (Equation 3) corresponding to the Amper-Maxwell's law.

This figure is schematically shown in Fig. Fig. 8 is a schematic front cross-sectional view schematically showing a state in which an electric field Ey is newly generated by the wave (rotation) of the magnetic field component Hx.

8, an electric field Ey directed toward the front side of the paper surface of Fig. 8 is generated in the lattice 2 by the wave (rotation) of the magnetic field component Hx in the xz plane, and the lattice 2 and the lattice 2), an electric field Ey directed toward the inside of the paper surface is generated. In this case, since the original electric field Ey of the incident s-polarized light is directed to the front side of the paper surface, the electric field between the gratings 2 is lost by the rotation of the magnetic field, and the wave acts to be divided. As a result, the electric field Ey is localized in the grating 2, and the energy of s-polarized light propagates in the grating 2 due to the absorption depending on the material of the grating 2, and disappears.

On the other hand, with respect to the p-polarized light, the electric field component is directed to the x direction (Ex). However, since the distribution of the permittivity is constant when viewed in the y direction, the rotational component of the electric field described above does not substantially occur. Therefore, the localization of the electric field such as the s-polarized light in the grating 2 and the attenuation in the grating 2 do not occur in the p-polarized light. That is, it is preferable that the electric field Ey is caused to fall in the grating 2 by generating a wave (rotation) of the magnetic field component Hx to selectively attenuate the s-polarized light by the absorption in the grating 2, The operating principle of the polarizing element. The localization of such an electric field Ey can be efficiently achieved by partially shrinking the grating 2 and partially narrowing the interval between the gratings 2, and consequently, it can be assumed that the extinction ratio can be increased. The improvement in the extinction ratio shown in Fig. 4 can be considered to be caused by such a mechanism.

The localization of the electric field Ey as described above does not substantially occur when the refractive index seal portion n is smaller than the extinction coefficient k, such as aluminum. The refractive index real part n and the extinction coefficient k can be expressed by the following equation (4) by using physical constants? And?.

From equation (4), n &lt; k has a negative dielectric constant. This means that the wave can not enter the inside, and in this case, the electric field is not formed in the lattice 2. Therefore, the localization of the electric field as described above does not substantially occur. On the other hand, if the grating 2 is unevenly formed, a place having a large lattice spacing is generated, so that the s-polarized light is likely to propagate through the place and be easily propagated. As a result, the extinction ratio is greatly reduced. The extinction in extinction ratio shown in Fig. 5 is presumed to indicate such a situation.

Next, a more preferable structure of the grid polarizing element of the embodiment will be described.

First, the simulation result shown in Fig. 4 was based on the data of the titanium oxide thin film prepared at 100 캜 shown in Fig. The inventors made simulation by preparing the same titanium oxide thin film at a temperature of 300 캜. Fig. 9 is a graph showing the optical constants of the titanium oxide thin film at 300 deg. C, and Fig. 10 is a graph showing the relationship between the transmittance and the transmittance of the titanium oxide thin film exhibiting optical constant, Fig. 8 is a graph showing the results of simulation for the extinction ratio.

As shown in Fig. 9, the refractive index real part n is larger than the extinction coefficient k in the wavelength range of about 240 to 400 nm, even in the case of film formation at 300 deg. 10 (1), the transmittance is not so reduced at a lattice width W of 10 to 20 nm, and the transmittance is high at a grating width W of 20 to 30 nm in a range of 1 to 0.7 It does not show deterioration. As shown in Fig. 10 (2), a large improvement in the lattice width except for 10 nm is confirmed with respect to the extinction ratio.

Fig. 11 is a drawing for explaining an optimum structure of a grid polarizing element using such a lattice 2 made of titanium oxide. As shown in Fig. 4 (2) and Fig. 10 (2), if the umbilical portion ratio t / T is made smaller than 1 (if it is ubiquitous), the extinction ratio is immediately improved in most cases. The extinction ratio becomes a peak at a certain t / T, and then falls. Then, the extinction ratio at a certain t / T boundary becomes smaller than the relative value 1. That is, the extinction ratio is smaller than that in the case of not being ubiquitous. Therefore, it is preferable that the dislocation ratio is equal to or larger than the value of t / T when the extinction ratio is less than the relative value 1 (hereinafter referred to as critical critical value).

Fig. 11 is a view plotting the critical misalignment ratio. (2), and the marker is the film formation at 300 ° C shown in FIG. 10 (2). The straight line shown in Fig. 11 is a straight line drawn by applying the least squares method to each marker. As shown in the figure, in the case of film formation at 100 ° C, improvement in extinction ratio can be expected if t / T> 0.0147w-0.1134. Further, in the case of film formation at 300 ° C, improvement in the extinction ratio can be expected if t / T> 0.0149w + 0.0644 is satisfied.

The titanium oxide thin film is often formed by CVD (Chemical Vapor Deposition) such as ALD described later, and the film forming temperature is generally about 100 to 300 占 폚. At temperatures below 100 캜, it is difficult to obtain a film that can withstand practical use. Further, when the film is formed at a temperature exceeding 300 캜, the degree of crystallization progresses, which often results in an amorphous state. (T / T> 0.0149w + 0.0644), the increase in the extinction ratio remains unchanged even when the film is formed at a temperature of 300 ° C. As a result, if t / T> 0.0149w + 0.0644, 2, the effect of improving the extinction ratio can be anticipated for the entire grid polarizing element.

In the case of Fig. 4 (1), a condition in which the transmittance is lowered by, for example, 10% or more is a case where the lattice width is 25 nm or more and t / T is smaller than 0.4 or less. In Fig. 10 (1), the condition in which the transmittance is lowered by 10% or more is also a case where the lattice width is 25 nm or more and t / T is smaller than 0.4 or so. When this condition is applied to the graph of Fig. 11, it is confirmed that it is lower than the straight line of t / T = 0.0149w + 0.0644. That is, when t / T &gt; 0.0149w + 0.0644, the extinction ratio can be expected to be improved without significantly decreasing the transmittance even when a lattice width is adopted.

Next, as a comparative example, a case where crystallized titanium oxide is employed as a material of the lattice 2 will be described. Fig. 12 is a diagram showing optical constants of titanium oxide of rutile crystal as an example. This titanium oxide thin film is formed by CVD and then crystallized by heat treatment at about 600 ° C. As shown in Fig. 12, in the case of titanium oxide of a rutile crystal, n and k are reversed around 280 nm, and n &gt; k is obtained at a wavelength longer than 280 nm.

Fig. 13 is a diagram showing the result of simulating how the transmittance and the extinction ratio affect the ellipticity ratio t / T when the titanium oxide of the rutile crystal is employed as the material of the lattice 2. Fig. In this simulation, the simulation was performed by the RCWA method, assuming that the wavelength used is 254 nm and n = 1.55 and k = 3.09 obtained at this wavelength.

As shown in Fig. 13, in the case of titanium oxide of rutile type crystal, the transmittance is partially improved, but the extinction ratio is drastically reduced at any localization ratio t / T, and the localization ratio t / The effect of improving the extinction ratio can not be obtained at all. That is, in order to improve the extinction ratio, it is important that the state of the titanium oxide is an amorphous phase.

Whether or not the reason why the effect of increasing the extinction ratio can not be obtained in the case of the rutile crystal is not necessarily due to the relation of n &gt; k or not because it is not necessarily an amorphous. It is presumed that both sides are the cause. Either way, the effect of improving the extinction ratio by the optimization of the ellipticity ratio t / T becomes possible when n> k and a grating that is an amorphous phase is adopted.

In addition, although the meaning of each term such as "amorphous" and "crystal" is physically clear, in an actual grid polarizing element, there is a case where the amorphous structure and the crystal structure part are mixed in the structure of the lattice. In this case, if an amorphous structure is formed in at least half of the lattice, it can be said to be an &quot; amorphous phase &quot;. For the evaluation of crystallinity, an X-ray diffraction method or a Ruder Ford backscattering analysis method (RBS) is used. However, in this analysis, a peak of half or less of a peak indicating a complete crystal state can be regarded as an amorphous phase. The crystalline state includes so-called microcrystals.

Next, a method of manufacturing the grid polarizing element of the above embodiment will be described.

14 is a schematic view showing a method of manufacturing a grid polarizing element according to the embodiment. In the manufacturing method of the embodiment, first, the intermediate thin film 3 is formed on the transparent substrate 1 as shown in Fig. 14 (1). The intermediate thin film (3) is a thin film serving as a base for forming a lattice thin film. Since the intermediate thin film 3 is finally removed, there is no particular restriction on the material. The shape stability is good and it can be removed quickly at the time of etching. For example, an organic material such as photoresist, silicon, carbon, or the like is selected as the material of the intermediate thin film 3.

Next, as shown in Fig. 14 (2), the intermediate thin film 3 is patterned by photolithography. That is, the entire surface of the photoresist is coated, and the intermediate thin film is patterned by exposure, development, and etching. The patterning is such that the intermediate thin film 3 is in the shape of a strip extending in the direction perpendicular to the paper surface. At this time, the width L1 and the interval L2 of the stripes of the intermediate thin film 3 determine the interval tT of the grid 2 to be finally formed.

Next, as shown in Fig. 14 (3), the lattice film 4 is formed so as to cover the entire surface of the patterned intermediate thin film 3. The lattice film 4 is a lattice material, that is, a thin film made of titanium oxide. The lattice film 4 is formed by ALD (Atomic Layer Deposition), which is a kind of thermal CVD. ALD is a technology for gradually supplying gaseous molecules of precursors onto a substrate placed in a reaction vessel, and adsorbing and forming a film for each one atom layer. After the reaction of the precursor is saturated, the gaseous molecules are purged and the precursor gaseous molecules are supplied again. This is repeated to prepare a thin film having a predetermined thickness. A plasma pulse may be applied in order to reduce the film forming temperature or to improve the deposition rate.

After the lattice film 4 is formed in this way, anisotropic etching of the lattice film 4 is performed. The anisotropic etching is etching in the thickness direction of the transparent substrate 1. By this etching, the lattice film 4 remains in both side walls of the pattern of the intermediate thin film 3 as shown in Fig. 14 (4). Thereafter, etching is performed using an etchant capable of etching only the material of the intermediate thin film 3, thereby removing all the patterns of the intermediate thin film 3. [ As a result, the grid 2 composed of the linear portions 21 made of titanium oxide is formed on the transparent substrate 1, and the grid polarizing element of the embodiment can be obtained. The obtained grid polarizing element has a predetermined localization ratio t / T, and the pattern dimensions L1 and L2 of the intermediate thin film 3 are determined along the lattice width W so as to become this value.

Next, examples of use of such a grid polarizing element will be described. Fig. 15 shows an example of use of the grid polarizing element of the embodiment, and is a schematic cross-sectional view of the light aligning apparatus equipped with the grid polarizing element.

The apparatus shown in Fig. 15 is a photo alignment apparatus for obtaining the above-described photo alignment film for a liquid crystal display, and irradiates the object (work) 10 with a polarized light so that the molecular structure of the work 10 is aligned State. Therefore, the workpiece 10 is a film (film material) for a photo alignment film, for example, a sheet made of polyimide. When the work 10 has a sheet shape, a roll-to-roll conveying system is employed, and polarized light is irradiated in the middle of conveyance. A liquid crystal substrate coated with a film for photo-alignment may be a work. In this case, a structure in which a liquid crystal substrate is carried on a stage and transported or transported to a conveyor is employed.

15 includes a light source 5, a mirror 6 covering the back of the light source 5, and a grid polarizing element 7 disposed between the light source 5 and the work 6. The grid polarizing element 7 is in the above-described embodiment.

In most cases, an ultraviolet lamp such as a high-pressure mercury lamp is used for the light source 5 because irradiation of ultraviolet rays is required for the light alignment. The light source 5 is long in a direction perpendicular to the conveying direction of the work 10 (in this case, the paper surface vertical direction).

The grid polarizing element 7 selectively transmits p-polarized light with reference to the length of the grating 2 as described above. Therefore, the posture of the grid polarizing element 7 with respect to the work 10 is precisely arranged so that the polarization axis of the p-polarized light is directed in the direction of performing the light alignment.

In addition, since it is difficult to manufacture a large-sized grid polarizing element, when a large area needs to be irradiated with polarized light, a configuration in which a plurality of grid polarizing elements are arranged on the same plane is employed. In this case, the surface on which the plurality of grid polarizing elements are arranged is parallel to the surface of the work 10, and each grid polarizing element is arranged such that the longitudinal direction of the grating in each grid polarizing element is in a predetermined direction with respect to the work .

According to the grid polarizing element of the embodiment described above, the grating 2 is formed of amorphous titanium oxide, and the grating 2 has a localization ratio t / T of 0.0149w + 0.0644 , The extinction ratio can be improved without significantly lowering the transmittance. Therefore, it is possible to irradiate polarized light with better quality. Further, when the grid width w is different depending on the linear portions 21 due to manufacturing variations or other reasons, an average value of the widths of the linear portions 21 is applied when applying to the above expression.

Since a grid polarizing element having such a high extinction ratio is used in the photo-alignment apparatus equipped with such a grid polarizing element, it is possible to perform high-quality optical alignment processing, and a high quality optical alignment film can be obtained. Therefore, it can contribute greatly to the production of a high-quality display.

In the structure of the grid polarizing element of the embodiment, a portion in which t &lt; &gt; T is present periodically exists. However, a structure in which the portion of distance t and the portion of distance T alternate ) Is an example. The ubiquitous structure of the periodic lattice can be considered in various ways. However, it is not preferable that the portions where the linear portions 21 lie at a wide spacing T are continuous. the p-polarized light is easily transmitted through the portion, and the extinction ratio is lowered. If the pattern of the lattice spacing is represented by t (narrow) and T (wide), as another preferable example, ttTttTttT ... Me, ttTtTttTtT ... And the like. Including this example, the present invention does not exclude the inclusion of a portion where t = T. That is, it is not a prerequisite to set t ≠ T at all points. However, from the viewpoint of obtaining the effect of improving the extinction ratio, it is preferable that t ≠ T in at least half of the entire region of the lattice.

The wavelength range in which the grid polarizing element of the present invention can be suitably used is the shorter wavelength side and the ultraviolet region in the visible region, but may be used only in the ultraviolet region.

1 transparent substrate 2 grid
21 LINEAR 3 Medium thin film
4 light source
6 Mirror 7 Grid polarization element
10 Work

Claims (3)

1. A grid polarizing element comprising a transparent substrate and a stripe-shaped grating provided on the transparent substrate,
The lattice is formed of an amorphous titanium oxide,
The average value of the width of each line portion constituting the grating is w, the distance between the line side portion on one side in the line side portion is t and the distance between the line side portion on the other side is T Wherein the grating periodically has a portion substantially t &lt; T, and has a relationship of t / T &gt; 0.0149w + 0.0644 in a portion where t &lt; T. The method according to claim 1,
The grid does not have a portion along which a portion where two linear portions are arranged is continuous with a wide distance T when viewed in a direction along the surface of the transparent substrate and in a direction perpendicular to the longitudinal direction of the linear portion. A grid polarizing element.  And a grid polarizing element according to claim 1 or 2, wherein the grid polarizing element is provided at a position between an irradiation area in which a film material for photo-alignment is arranged and the light source, and the light from the light source Is capable of irradiating a light-converging film material through the grid polarizing element.

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