CN202433543U - Wire grating polaroid - Google Patents
Wire grating polaroid Download PDFInfo
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- CN202433543U CN202433543U CN2011203822847U CN201120382284U CN202433543U CN 202433543 U CN202433543 U CN 202433543U CN 2011203822847 U CN2011203822847 U CN 2011203822847U CN 201120382284 U CN201120382284 U CN 201120382284U CN 202433543 U CN202433543 U CN 202433543U
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- clathrate
- protuberance
- base material
- wire grid
- grid polarizer
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Abstract
The utility model provides a wire grating polariod having excellent polarization separating property and high optical symmetry to incident light of 435 nm to 500 nm. The wire grating polaroid includes a substrate having a clathrate concave-convex shape extending in a specific direction; and a metal wire connecting with a side face in a direction side of concave parts of the substrate having the clathrate concave-convex shape and extending above the top of concave parts of the substrate. Space among the concave parts of the substrate is less than 120 nm. In a plane perpendicular to the extending direction of the clathrate concave-convex shape, the shapes of cross sections of the concave parts of the substrate are generally rectangular.
Description
Technical field
It is good and show the symmetric wire grid polarizer of left and right sides optics that the utility model relates to a kind of optical characteristics in the visible blue wavelength region may.
Background technology
Wire grid polarizer is a polarizer of on the base material of glass or diaphragm etc., arranging the tinsel (filament) of linearity with certain orientation regularly.Through control thickness wiry, interval wiry with nanoscale, can obtain high polarizability and light transmission rate.For example, have under the situation of wire grid polarization element of enough polarization properties being produced on visible wavelength region, the known metal silk adds that the width (spacing) in space need be the atomic thin structure below the 150nm.
Wire grid polarizer is used under the situation of display of liquid crystal indicator etc.; In order to have the high optical property that does not exist with ... the visual angle; That is to say for to about incident light have high optics symmetry; Also in order to realize having the demonstration of good contrast, the expectation wire grid polarizer shows high polarization separation properties.
For example have in the prior art and arrange tinsel symmetrically to obtain the symmetric method of polarization transmission with respect to the vertical direction of substrate surface.Specifically; Known have at substrate surface making aluminium film; On the aluminium film, form polymeric layer then, use mould on polymeric layer, to form pattern afterwards, use the pattern of polymeric layer the Al layer to be made into method wiry (patent documentation 1) through dry etching with pattern through interfering making such as exposure method or beamwriter lithography method; Or for the concaveconvex shape base material, through the inclination vapour deposition method from the method (patent documentation 2) of both direction to the side evaporating Al of base material protuberance.Here, substrate surface is meant the average surface of base material, have under the trickle concavo-convex situation at substrate surface, substrate surface be meant the medicine for treating uneven homogenizing that these are trickle level and smooth face.
The prior art document
Patent documentation
Patent documentation 1 spy opens the 2006-084776 communique
Patent documentation 2 spies open the 2001-330728 communique
The utility model content
The technical matters that utility model will solve
But the method existence of interference exposure, beamwriter lithography method, dry etching etc. needs the device of high price, makes problems such as the area existence limits, throughput rate is low.On the other hand; Compare with the method for carrying out vapor deposition from both direction; The method of evaporating Al is simpler and easy in operation selectively from the side of a direction side of base material protuberance; And throughput rate is higher, but the problem of the optical characteristics of the optics symmetry of the incident light about this method existence can not fully obtain etc.Especially need purple～blue region wavelength, be the raising of the characteristic of 360nm～500nm.
In addition, when using wire grid polarizer, there is the situation of using buried patterns faces such as sticker in the tinsel for the aluminium wire of protecting plane of polarization etc.But, because the electric field shielding of the free electron of induction light exists with ... wavelength, in the wiregrating of 150nm spacing, can not form enough electric field shieldings in the past, therefore cause the polarization characteristic of visible purple～blue region wavelength significantly to descend, so this method is inapplicable.
The utility model is put in view of the above problems just and is proposed, its purpose be to provide a kind of for from about incident light embody the high symmetric wire grid polarizer of optics.In addition, a kind of even its purpose also is to provide by buried patterns faces such as stickers, be the wire grid polarizer that 360nm～500nm shows good polarization transmission performance also at visible purple～blue region wavelength.
The technological means of dealing with problems
The inventor of the utility model finds, even cross sectional shape wiry is asymmetrical wire grid polarizer, and in certain specific structure, the incident angle about can not existing with ... and show certain high polarization transmission characteristic.Specifically, the spacing of clathrate concaveconvex shape is below the 120nm, and tinsel is made as higher than protuberance top, and the clathrate protuberance of base material is rectangular-shaped.
Through such structure; Improve shape symmetry wiry; And relax the asymmetry of optics further through the effect of spacing; Therefore, even only be provided with wire grid polarizer wiry, also can access the certain high polarization transmission characteristic of the incident angle of disobeying about being stored at a side's of the protuberance of the clathrate concaveconvex shape of base material side.
That is, the utility model is as follows.
The wire grid polarizer of the utility model comprises: have the base material at the upwardly extending clathrate concaveconvex shape of certain party; Be set to and the flanked of a direction side of the protuberance of base material and the tinsel that extends to the top at the protuberance top of base material with clathrate concaveconvex shape; The spacing of the protuberance of the base material of this wire grid polarizer is below 120nm; In the face vertical with the bearing of trend of clathrate concaveconvex shape, the cross sectional shape of the protuberance of base material is the essentially rectangular shape.
In the wire grid polarizer of the utility model, the value that it is desirable to the protuberance height/protuberance half breadth of clathrate protuberance is 1.0～10.
In the wire grid polarizer of the utility model, the half breadth that it is desirable to the clathrate protuberance is 0.2 times of spacing～0.7 times.
In the wire grid polarizer of the utility model, it is desirable in the face vertical with the specific direction of base material, the side of the protuberance of base material and above have tinsel, height wiry is 1.1 times～10 times of protuberance height of base material.
In the wire grid polarizer of the utility model, it is desirable to be formed at mean breadth wiry on the clathrate jog of base material and be 0.2 times～0.5 times of the concavo-convex spacing width of clathrate.
In the wire grid polarizer of the utility model, clathrate jog and the tinsel that it is desirable to base material be being filled with under the situation that refractive index is 1.0 to 1.5 resin, in the wavelength region may of 435nm to 500nm, and 4 times of the decline deficiencies of polarization characteristic.
The wire grid polarizer of the utility model comprises: have the base material at the upwardly extending clathrate concaveconvex shape of certain party; Be set to and the flanked of a direction side of the protuberance of base material and the tinsel that extends to the top at the protuberance top of base material with clathrate concaveconvex shape; In the face vertical with bearing of trend; Vertical direction with respect to substrate surface; Respectively from about symmetry direction incident the time, the difference of light penetration is below 4% in the wavelength region may of 435nm to 500nm.
In the wire grid polarizer of the utility model, the degree of polarization in the wavelength region may of 435nm～500nm when it is desirable to it and being the vertical direction incident from substrate surface is the wire grid polarizer more than 98%.
In the wire grid polarizer of the utility model, it is desirable to vertical direction, when incident angle is at least 45 ° left and right directions incident, be more than 35% at the light penetration of the wavelength region may of 435nm to 500nm with respect to substrate surface.
The effect of utility model
Embodiment according to the utility model; The utility model can provide a kind of incident light for 360nm～500nm to show high optics symmetry, even and use the wire grid polarizer that also can show good polarization separation properties under the situation wiry of protection aluminium such as sticker etc.
Description of drawings
Fig. 1 is the synoptic diagram of wire grid polarizer that the embodiment of the utility model is shown, and wherein Fig. 1 (A) illustrates the synoptic diagram of the upper surface of wire grid polarizer, and Fig. 1 (B) illustrates the synoptic diagram in the cross section between the a-b of Fig. 1 (A).
Fig. 2 illustrates the wire grid polarizer A of embodiment of the utility model at the figure of the interdependent light penetration of angle of 435nm～500nm.
Fig. 3 illustrates the wire grid polarizer H of comparative example of the utility model at the figure of the interdependent light penetration of angle of 435nm～500nm.
Fig. 4 illustrates the wire grid polarizer I of comparative example of the utility model at the figure of the interdependent light penetration of angle of 435nm～500nm.
Fig. 5 illustrates the polarization transmitance (Ts) of particular wavelength region of wire grid polarizer A of the embodiment of the utility model, and the polarization transmitance (Ts) under the situation of posting adhesive coating is shown simultaneously.
Fig. 6 illustrates the polarization transmitance (Ts) of particular wavelength region of wire grid polarizer H of the embodiment of the utility model, and the polarization transmitance (Ts) under the situation of posting adhesive coating is shown simultaneously.
Symbol description
101 base materials, 102 tinsels
Embodiment
The inventor of the utility model finds; For wire grid polarizer, even only being provided with under the situation wiry, through improving shape symmetry wiry at a side's of the protuberance of the clathrate concaveconvex shape of base material side; The spacing that makes the clathrate concaveconvex shape is below the 120nm; It is higher than protuberance top that tinsel is set, and to make the clathrate protuberance of base material be rectangular-shaped, also can to about incident light embody high optics symmetry.
The wire grid polarizer of the utility model comprises: the base material with the clathrate concaveconvex shape that extends at specific direction; With the flanked of a direction side of base material protuberance and the tinsel that more extends than the top of said base material protuberance to the top with clathrate concaveconvex shape; The spacing of base material protuberance is below the 120nm; In the face vertical with the bearing of trend of clathrate concaveconvex shape, base material protuberance cross sectional shape is the essentially rectangular shape.Below, based on Fig. 1 of the concrete formation of illustration, each composition that constitutes wire grid polarizer is described.Again, Fig. 1 (A) illustrates the synoptic diagram of the upper surface of wire grid polarizer, and Fig. 1 (B) illustrates the synoptic diagram in the cross section between the a-b of Fig. 1 (A).
(1) base material
In the utility model importantly the spacing of the protuberance of base material 101 be below the 120nm.Through below 120nm, make especially the wavelength region may of 360nm to 500nm demonstrate high optical characteristics (degree of polarization, transmitance, bury characteristic, optics symmetry).Especially, under the situation about using as display material, (this is proper on the one hand for the optical characteristics of 435nm～500nm) embodying blue region.Again because metal is 10nm～60nm as the crystallite dimension of crystallization-stable ground existence, therefore, after the spacing dimension wiry stated be preferably 20nm to 120nm, 50nm to 120nm more preferably.
(2) clathrate jog shape
As stated; In the face vertical with respect to the bearing of trend of the clathrate concaveconvex shape of base material 101; The protuberance cross sectional shape is not the curve that the curvature as para-curve steadily changes, the essentially rectangular shape (with reference to Fig. 1 (B)) that preferably is made up of the bight of more smooth recess lower curtate and small curve.Through cross sectional shape is the essentially rectangular shape; Make the side of clathrate protuberance with respect to substrate surface vertical and shape in the form of a substantially rectangular; Through the cross section is the essentially rectangular shape, and the coating of stating after making wiry is with respect to the protuberance cross section in the face vertical with the bearing of trend of clathrate concaveconvex shape; Form near symmetrical shape, show high optics symmetry.Spacing through the base material protuberance below 120nm and the protuberance cross sectional shape be the essentially rectangular shape, can obtain the left-right symmetric property of high degree of polarization and light penetration simultaneously.
Again, the angle of the tangent line of the side of clathrate protuberance and recess base plan from angle smaller side (acute side), is preferably 70 °～90 °, more preferably 80 °～90 °.Through the protuberance cross sectional shape is the essentially rectangular shape, make in the face vertical with the bearing of trend of clathrate concaveconvex shape, with respect to the vertical direction of substrate surface, respectively from about the peaked difference of light penetration of light of symmetry direction incident be below 4%.Again, the value of the half breadth of the protuberance height/protuberance of clathrate protuberance preferably about 1.0～10, is considered resulting optical property, the easy degree of making the protuberance shape, the easy degree of transfer printing, is preferably 2～5.
Again, the half breadth of clathrate protuberance is preferably 0.2 times～0.7 times of spacing, more preferably 0.2 times～0.5 times.
(3) dielectric
In the utility model,, can suitably use the dielectric material all high between the two with both adaptations in order to improve the material that constitutes base material 101 and the adaptation of tinsel 102.For example can use; Perhaps their potpourri of the oxide of the monomer of the oxide of silicon (Si), nitride, halogenide, carbonide or their potpourri (in the dielectric monomer, sneaking into the dielectric of other element, monomer or compound) or aluminium (A1), chromium (Cr), yttrium (Y), zirconium (Zr), tantalum (Ta), titanium (Ti), barium (Ba), indium (In), tin (Sn), zinc (Zn), magnesium (Mg), calcium (Ca), cerium (Ce), copper metals such as (Cu), nitride, halogenide, carbonide.Dielectric material comes down to transparent getting final product in the wavelength region may of the transmission-polarizing performance of wanting to obtain.
The laminating method of dielectric material does not limit especially, can suitably use the for example physical vapor deposition method of vacuum vapour deposition, sputtering method, ion plating method etc.Again, in the range upon range of operation, the feed rate of film is the scope that 0.1m/ branch～100m/ divides.
(4) tinsel
Except aluminium or silver,, also can use copper, platinum, gold as metal perhaps with the alloy of these metals as principal ingredient according to light wavelength zone as object.
(5) cross sectional shape wiry
Tinsel 102 is present in the top of clathrate protuberance side and the direction higher than protuberance top; The height of tinsel 102 is preferably at more than 1.1 times below 10 times of clathrate protuberance height; If more than 1.3 times below 2.5 times, then this is preferable on the one hand in the absorption loss that suppresses to see through light.
Again, the mean value of the width of tinsel 102 preferably at 0.2 times～0.5 times of spacing, if at 0.3 times～0.4 times, then can satisfy polarization characteristic and transmitance simultaneously.
The manufacturing approach of tinsel 102 does not have special qualification, from the viewpoint of manufacturing cost, throughput rate, preferably adopts the inclination vapour deposition method.The inclination vapour deposition method be meant with the bearing of trend plane orthogonal of clathrate concaveconvex shape in, vapor deposition source is when the normal with respect to base material has incident angle α, evaporation metal also carries out range upon range of method.Confirm the preferable range of incident angle α according to the cross sectional shape of the tinsel 102 of making the clathrate protuberance, usually, desirable incident angle α is 5 °～40 °, and better is 10 °～30 °.Further, when the cross sectional shape of the height etc. of control tinsel 102, preferably consider the drop shadow effect of metal range upon range of in the vapor deposition, reduce or increase incident angle α gradually.Through such method for making, make the clathrate concaveconvex shape identical with the bearing of trend of tinsel 102.
The metal evaporation amount that reaches the shape of tinsel 102 confirms that according to the shape of clathrate protuberance usually, average vapor deposition thickness is about 50nm～150nm.Again, in the vapor deposition operation, the feed rate of film is the scope that 0.1m/ branch～100m/ divides.
Said here average thickness is meant, supposes that this average thickness uses as the metal evaporation amount at the thickness of the vapor deposition thing during from the direction evaporation material vertical with glass on the smooth glass substrate.
(6) etching work procedure
From the angle of optical characteristics, as required, the metal of the concave bottom that is layered in concavo-convex grid is removed through etching method.Etching method only otherwise base material or dielectric layer are caused bad influence, and the metal that can remove requirement get final product, do not have special qualification, considers the preferred method of being flooded by sour or the alkaline WS that adopts from the angle of throughput rate, installation cost.
(7) optical characteristics
In the face vertical with the bearing of trend of clathrate concaveconvex shape; For with respect to the vertical direction (vertical direction of protuberance) of 101 of base materials respectively from the light of left-right symmetric direction incident; The allowable value of the difference of its light penetration is different by the goods that use, and is being used under the situation of image display device, for the same wavelength as object; The difference of light penetration is as long as just being difficult to identification below 4%, can be described as enough.In the face vertical with the bearing of trend of clathrate concaveconvex shape, poor from the light penetration of the light of left-right symmetric direction incident respectively with respect to the vertical direction of 101 of base materials, for the same wavelength of visible region preferably below 4%, more preferably 2%.Again, it also is important only having tinsel 102 in the side of a direction side of the protuberance of the clathrate concaveconvex shape of base material 101.
From the difference of the light penetration of the light of left-right symmetric direction incident according to this incident angle of light θ (in the face vertical with the bearing of trend of tinsel 2; The vertical direction angulation that incident light and base material are 101) changes; θ is at least under the situation below 45 °; The peaked difference of light penetration needs only below 4% for same wavelength in visible blue wavelength region may (zone of wavelength 435nm～wavelength 500nm), promptly can be used in image display device widely.
Again; Consider from the angle of the loss that reduces light; With respect to the vertical direction of 101 of base materials respectively from the light penetration of the light of left-right symmetric direction incident preferably respectively more than 35%, with respect to the vertical direction of 101 of base materials with the angle below 45 °, respectively from the light penetration of the light of left and right directions incident all 35% when above; Can be used in purposes widely, therefore comparatively desirable.Through tinsel 102 being made as top extension to the top of protuberance with clathrate concaveconvex shape, can improve polarization characteristic, reduce the loss of light.
Degree of polarization is according to the goods that use and by different requirement, preferably more than 98%.Under the situation of the goods that are applied to contrast that need be high, degree of polarization preferably more than 99%, is preferably in more than 99.9%.
(8) surface protection of clathrate jog
Wire grid polarizer is used under the situation of display material,, sometimes each member is used through joints such as stickers in order to make the slab integral attenuation.Again, be not hit, will be embedded in adhering agent layer yet and use in order to protect the filament face.Clathrate jog and tinsel 102 with base material 101 of the following spacing of 120nm is filled with the words that refractive index is 1.0 to 1.5 resin (resin roughly the same with the refractive index of base material); Can keep the optical characteristics of visible purple～blue region wavelength 360nm～500nm, and improve resistance to impact.The size of the electric field shielding of the free electron of induction light exists with ... wavelength, and in order fully to shield short wavelength's polarized light, pattern-pitch is preferably in below 1/3 of wavelength, and is further preferred in below 1/4 of wavelength.
(9) spacing of clathrate relief pattern dwindles method
Method as making the employed clathrate relief pattern of wire grid polarizer has more than vitrification point, with the thermoplastic resin of specific distance to the method for pattern parallel direction with an extension.For example, be that the clathrate relief pattern of 250nm is made into the pattern below the 120nm with original pattern-pitch, need 4.34 times extension ratio.But in general, when extension ratio surpassed 2.5 times condition, the distortion that resin receives can increase, so pattern form similar dwindles extremely difficult.Therefore, in order under the low condition of extension ratio, to obtain the spacing below the 120nm, need the thermoplastic resin of the clathrate relief pattern below the 200nm, and the technology that such thermoplastic resin is extended is absolutely necessary also.
The pattern formation method of the utility model is through adopting the legal effect that obtains of monomer casting hot polymerization.The characteristic of this method is, makes monomer polymerization through the heat polymerization that controls environment, and as the generation of the flake (heavy polymer gel) of the defective origin cause of formation, makes the pattern below the 120nm that does not have defective when suppressing to extend.Again; Except general known monomer; Through add ormal weight with monomer can copolymerization the monomer that contains fluorine (acrylic ester that for example contains fluorine), can manifest the release property with mould, can duplicate the clathrate relief pattern below the 200nm accurately.Again, consider transfer printing property, be limited to 10,000 mPas on the viscosity of the mixed solution of the monomer class before the polymerization, be preferably 1～100mPas.
Next, the effect for clear and definite the utility model describes embodiment.
(embodiment 1)
(modulation of MMA oligomer syrup)
In spiral pipe according to following mixed as 2 of initiating agent; 2 '-azoisobutyronitrile (AIBN): 0.5wt%, as the big Japanese ink system " メ ガ Off ア Star Network F444 " of release agent: 1wt%, as the methyl methacrylate of monomer: trifluoromethyl acrylate methyl esters 83.5%: 15.0%, at N
2Atmosphere under, with 50 ℃ the reaction 65 minutes.Then, import atmosphere immediately, cool off and stop polymerization, produce the MMA oligomer syrup that transfer printing is used.This moment, the viscosity of syrup was 20mPas.
(transfer printing)
Preparation surface has the nickel of trickle concavo-convex grid and neutralizes mould, and the spacing of trickle concavo-convex grid (p0) is 145nm, and highly (h0) is 180nm.The striated grid that this trickle concavo-convex grid is a rectangle.Neutralize on the mould at this nickel; Evenly be coated with above-mentioned MMA oligomer syrup; Further place the acrylic plate that thickness is 1mm (day eastern resin industrial group's system " Network ラ レ Star Network ス ") above that, further, placing as the thickness of pressing thing stone above that is the glass plate of 5mm.Its integral body (glass plate/PMMA plate/MMA oligomer syrup/Ni pressing mold) is put into 60 ℃ baking box 5 hours, aggregate into the MMA oligomer.After 5 hours, take out sample, the PMMA plate after the Ni pressing mold is peeled off, is moved on to PMMA plate side by the PMMA film of MMA oligomer syrup polymerization.
Again, observe with the field emission type scanning electron microscope after the cross sectional shape of PMMA, can confirm to be formed at nickel neutralize mould rectangle striped grid former state be transferred.
(extension)
Next, this PMMA plate that has been transferred rectangle striated lattice shape is cut into the rectangle of 150mm * 150mm, further,,, uses sample as extension with this at its surface coated silicone oil in order to prevent to merge between the striated grid protuberance with cutting tool.
Next, the two ends 5mm that extends with the length direction of sample is fixed by the zip of elongator, and under this state, put into 114 ℃ baking box, the speed of dividing with 37.5cm/ (initial deformation speed 25%/minute) extension 267 seconds.Here, placing sample makes the length direction of its bearing of trend and striated grid roughly parallel.
Thus, extend with sample in the Width freedom, 2.1025 times of direction of principal axis extensions.Extend back extension sample and be cooled to PMMA hardening of resin temperature rapidly.Sample is used in the extension that finishes to extend, and it is just thin more to arrive middle body more, and the thinnest part of width is 103.5mm.Width is that the zone of 103.5mm is about 40% of an integral body.After the extension, remove the silicone oil that prevents to merge usefulness of coating striated grid surface through the WS of surfactant.
When observing this extension that finishes to extend with sample surperficial with the field emission type scanning electron microscope, spacing (p1) is 100nm, and the height of striated grid (h1) is 120nm, has kept the lattice shape of rectangle.Width is dwindled ratio r (=(h1/h0)/(p1/p0)) and is (120/180)/(100/145)=0.966, and the concaveconvex shape of the striated grid on visible PMMA plate surface is actually by the shape before extending is similar and dwindles.That is, can realize the trickle concavo-convex grid of other spacing of 100nm level.
(making of Ni pressing mold)
The gold that covers 30nm through sputter on the trickle concavo-convex grid surface that obtains is thus distinguished electronickelling afterwards in order to as the conductionization processing, makes the nickel pressing mold that the surface has the trickle concavo-convex grid of thickness 0.3mm, long 300mm, wide 180mm.
(making of cylinder pressing mold)
Make 2 pieces of nickel pressing molds in the same way, through 2 pieces of pressing molds being engaged into circular, as the cylinder pressing mold.Here, joint carries out with the length direction of trickle concavo-convex grid and the circumferencial direction quadrature of cylinder pressing mold.
(making of clathrate protuberance transfer film volume)
To thickness is that the reel (the long 250m of film) of the tri acetyl cellulose membrane (below be called the TAC film) of 0.08mm is coated with the about 0.01mm of uv-hardening resin continuously; And make the coated face surface in contact have the cylinder pressing mold of the trickle concavo-convex grid of above-mentioned 100nm spacing; Use the UV-lamp of centre wavelength 365nm, from film side irradiation 1000mJ/cm
2Ultraviolet ray, after the trickle concavo-convex grid of transfer platen pressing mold continuously, this TAC film is rolled into drum.Below, this reel is called reel film reel.Through the observable clathrate protuberance of FE-SEM transfer film, its cross sectional shape is a rectangle, upper surface be shaped as the striated grid.Again, the value of the half breadth of the protuberance height/protuberance of clathrate protuberance is 3.0, and the half breadth of clathrate protuberance is 0.4 times of spacing.
(drying of reel film reel)
Moisture drying in order will be as above to be comprised in the resulting reel film reel moves to the vacuum tank of the infrared heater that is provided with 3 200W with reel film reel, on one side this film is placed in a vacuum, it is advanced with the 2m/ branch, after the heating, is rolled into drum.The vacuum tightness that film is advanced when stopping is 0.03Pa, and the vacuum tightness of (in the drying) was 0.15Pa during film was advanced.In order to know the surface temperature of the TAC film after well heater passes through, on TAC, post thermal label in advance again.Well heater through after the surface temperature of TAC film be between 60 ℃ to 70 ℃.
(using sputtering method to form dielectric layer)
After dried reel film reel placed 12 hours in the vacuum tank of dryer, the temperature of film dropped to 23 ℃.Then, with the clathrate protuberance transfer surface of reel film move to dielectric form with and tinsel form with in the vacuum chamber.Reactive AC magnetron sputtering system is adopted in the formation of dielectric.Arrange 2 pieces of silicon targets that target size is 127mm * 750mm * 10mmt; The distance of substrate to target is 80mm, argon flow amount 200sccm, nitrogen flow 300sccm, output 11kW, frequency 37.5kHz, gait of march 5m/ branch; Under as above condition; Be delivered to reel (master rotor) by the film conveying and batch the reel side while launching reel film volume, silicon nitride layer is set, be rolled into drum then.Tension force during sputter is 30N, and the master rotor temperature is 30 ℃, and the environment vacuum tightness before sputter begins is 0.005Pa, and the vacuum tightness in the sputter is 0.38Pa.On the Si chip, form silicon nitride film with the same terms, the thickness of measuring silicon nitride layer through ellipsometer is 3nm.
(AM aluminum metallization)
Transfer surface at the clathrate protuberance of reel film reel forms dielectric layer through sputtered silicon nitride, by master rotor the reverse direction of film when the sputter is carried, and forms tinsel through the resistance heated vapour deposition method at clathrate protuberance transfer surface, is rolled into drum again.In the present embodiment, use aluminium (A1) to describe as metal.Here, the vacuum tightness before the heating of vapor deposition ship is 0.005Pa.Again, the vapor deposition of aluminium uses the inclination vapour deposition method, with the vertical direction plane orthogonal of grid in, it is that 32 ° (θ s) are to 15 ° (θ d) that the configuration face shield makes the normal vapor deposition source angulation of itself and substrate surface.
The A/F of the face shield on the film throughput direction of this moment is 60mm, and the distance of face shield peristome center and vapor deposition ship is 400mm.Through as above configuration, divide with the feed rate 3.5m/ of film clathrate protuberance transfer film is advanced, and with feed rate 200mm/ divide to heating ship feeding purity be more than 99.9%, diameter is the aluminium wire of 1.7mm, carries out vapor deposition.Stagnation pressure in the vapor deposition is 0.007Pa, behind the vapor deposition, reel film reel is taken out from vacuum tank, and the thickness of aluminium converts through the luminous intensity of fluorescent X line, is 130nm.Therefore, (thickness that v) is aluminium is 126.4nm/s divided by vapor deposition time (130/1.03) to the average film forming speed of the aluminium of present embodiment.
(etching of aluminium)
The method made that to put down in writing according to embodiment and comparative example, film forming the clathrate protuberance transfer film reel of silicon nitride and aluminium; Unreel film on one side; Advanced 50 seconds in the NaOHaq groove of 23 ℃ 0.5 weight % in one side, then, that its washing is air-dry; Its purpose is to obtain the reel (below, as polaroid A) of wiregrating film.
(optical detecting)
The angle interdependence that adopts angle spectroscopy apparatus (the Ha イ テ of Hitachi Network corporate system, U-4100) to carry out light penetration is measured.For incident angle (45 degree～45 degree), the mean value of the light penetration of the 435nm～500nm of polaroid A, the result of its drafting is as shown in Figure 2.Light penetration is more than 37%, and the rate variance that sees through of position, the left and right sides is 1.29% to the maximum.
(rate of change of the cross Nicols transmitance under the situation of landfill adhering agent layer is measured)
On the spectrophotometric cross Nicols position, calculate the average light penetration (below, be defined as Ts) of 435nm～500nm.
Next, paste Sekisui Chemical Co., Ltd's sticker (name of an article WT#5402A, refractive index 1.472), the same Ts that measures under the state of protection pattern on the surface.Calculating the mean value of the Magnification (before the protection back/protection) of the Ts of sticker protection front and back, is 141% (with reference to Fig. 5).
(embodiment 2)
(making of polaroid)
According to the order identical, implement the making of clathrate protuberance transfer film reel and the vapor deposition of aluminium with embodiment 1.With respect to embodiment 1, only changed the etching work procedure of aluminium, Yi Bian decontrol film, Yi Bian in the NaOHaq groove of 23 ℃ 0.5 weight %, advanced 65 seconds, next that its washing is air-dry, its purpose is to obtain the reel (below, as polaroid B) of wiregrating film.
(optical detecting)
In the scope of the incident angle that begins from the base material vertical direction-45 degree～45 degree, the light penetration of 435nm～500nm of polaroid B is measured, be more than 37%, the rate variance that sees through of position, the left and right sides is 1.89% to the maximum.
(rate of change of the cross Nicols transmitance under the situation of landfill adhering agent layer is measured)
Adopting the method same with embodiment 1, calculate the mean value of the Magnification (protection back/protection is preceding) of the Ts before and after the sticker protection, is 211%.
(embodiment 3)
(reverse sputtering of the Ni pressing mold of embodiment 1)
The order same with embodiment 1 made the pattern of 100nm spacing through extension method, uses this design producing Ni pressing mold.
(carrying out the trickle processing of Ni pressing mold through reverse sputtering)
Through being implemented the reverse sputtering of short time, the Ni pressing mold of clathrate concaveconvex shape with rectangular shape handles the concaveconvex shape of processing pressing mold.Reverse sputtering condition with the best is handled, and makes that the clathrate concaveconvex shape of resin of transfer printing is parabola shaped for roughly.
(making of clathrate protuberance transfer film reel)
The Ni pressing mold of the 100nm spacing that reverse sputtering is handled is rolled into cylindric, next makes clathrate protuberance transfer film reel.Through the observable clathrate protuberance of FE-SEM transfer film, its cross sectional shape is parabola shaped for roughly, upper surface be shaped as the striated grid.Again, the value of the half breadth of the protuberance height/protuberance of clathrate protuberance is 4.8, and the half breadth of clathrate protuberance is 0.25 times of spacing.
(making of polaroid)
Below, through the order identical, AM aluminum metallization, implement etching method with embodiment 1, its purpose is to obtain the reel (below, as polaroid C) of wiregrating film.
(optical detecting)
In the scope of incident angle-45 degree～45 degree, the light penetration of 435nm～500nm of polaroid C is measured, be more than 37%, the rate variance that sees through of position, the left and right sides is 3.25% to the maximum.
(rate of change of the cross Nicols transmitance under the situation of landfill adhering agent layer is measured)
Adopting the method same with embodiment 1, calculate the mean value of the Magnification (protection back/protection is preceding) of the Ts before and after the sticker protection, is 272%.
(embodiment 4)
(making of 115nm pitch pattern)
With the method same, pattern transferring on PMMA with embodiment 1.Next, this PMMA plate that has been transferred rectangle striated lattice shape is cut into the rectangle of 150mm * 150mm, further,,, uses sample as extension with this at its surface coated silicone oil in order to prevent to merge between the striated grid protuberance with cutting tool.
Next, the two ends 5mm that extends with the length direction of sample is fixed by the zip of elongator, and under this state, put into 114 ℃ baking box, the speed of dividing with 37.5cm/ (initial deformation speed 25%/minute) extension 142 seconds.At this moment, placing sample makes the length direction of its bearing of trend and striated grid roughly parallel.
Thus, extend with sample in the Width freedom, 1.59 times of direction of principal axis extensions.Extend back extension sample and be cooled to PMMA hardening of resin temperature rapidly.Sample is used in the extension that finishes to extend, and it is just thin more to arrive middle body more, and the thinnest part of width is 119.0mm.Width is that the zone of 119.0mm is about 40% of an integral body.After the extension, remove the silicone oil that prevents to merge usefulness of coating striated grid surface through the WS of surfactant.
When observing this extension that finishes to extend with sample surperficial with the field emission type scanning electron microscope, spacing (p1) is 115nm, and the height of striated grid (h1) is 140nm, has kept the lattice shape of rectangle.Width is dwindled ratio r (=(h1/h0)/(p1/p0)) and is (140/180)/(115/145)=0.981, and the concaveconvex shape of the striated grid on visible PMMA plate surface is actually by the shape before extending is similar and dwindles.
(making of clathrate protuberance transfer film reel)
The same with embodiment 1, with the Ni pressing mold reelization of 115nm spacing, next, make clathrate protuberance transfer film reel.Through the observable clathrate protuberance of FE-SEM transfer film, its cross sectional shape is the essentially rectangular shape, upper surface be shaped as the striated clathrate.Again, the value of the half breadth of the protuberance height/protuberance of clathrate protuberance is 3.0, and the half breadth of clathrate protuberance is 0.40 times of spacing.
(making of polaroid)
Below, through the order identical, AM aluminum metallization, implement etching method (65 seconds) with embodiment 2, its purpose is to obtain the reel (below, as polaroid D) of wiregrating film.
(optical detecting)
In the scope of incident angle-45 degree～45 degree, the light penetration of 435nm～500nm of polaroid D is measured, be more than 37%, the rate variance that sees through of position, the left and right sides is 1.42% to the maximum.
(rate of change of the cross Nicols transmitance under the situation of landfill adhering agent layer is measured)
Adopting the method same with embodiment 1, calculate the mean value of the Magnification (protection back/protection is preceding) of the Ts before and after the sticker protection, is 268%.
(embodiment 5)
The order same with embodiment 4 made the pattern of spacing 115nm through extension method, uses this design producing Ni pressing mold.
(carrying out the trickle processing of Ni pressing mold through reverse sputtering)
Through being implemented the reverse sputtering of short time, the Ni pressing mold of clathrate concaveconvex shape with rectangular shape handles the concaveconvex shape of processing pressing mold.Reverse sputtering condition with the best is handled, and makes that the clathrate concaveconvex shape of resin of transfer printing is parabola shaped for roughly.
(making of clathrate protuberance transfer film reel)
The Ni pressing mold of the 115nm spacing that reverse sputtering is handled is rolled into cylindric, next makes clathrate protuberance transfer film reel.Through the observable clathrate protuberance of FE-SEM transfer film, its cross sectional shape is parabola shaped for roughly, upper surface be shaped as the striped clathrate.Again, the value of the half breadth of the protuberance height/protuberance of clathrate protuberance is 4.1, and the half breadth of clathrate protuberance is 0.3 times of spacing.
(making of polaroid)
Below, through the order identical, AM aluminum metallization, implement etching method with embodiment 1, its purpose is to obtain the reel (below, as polaroid E) of wiregrating film.
(optical detecting)
In the scope of incident angle-45 degree～45 degree, the light penetration of 435nm～500nm of polaroid E is measured, be more than 35%, the rate variance that sees through of position, the left and right sides is 3.28% to the maximum.
(rate of change of the cross Nicols transmitance under the situation of landfill adhering agent layer is measured)
Adopting the method same with embodiment 1, calculate the mean value of the Magnification (protection back/protection is preceding) of the Ts before and after the sticker protection, is 327%.
(comparative example 1)
(making of Ni pressing mold)
Preparation surface has the nickel of trickle concavo-convex grid and neutralizes mould, and the spacing of trickle concavo-convex grid (p0) is 130nm, and highly (h0) is 170nm.
(making of clathrate protuberance transfer film reel)
With the Ni pressing mold reelization of 130nm spacing, next, make clathrate protuberance transfer film reel.Through the observable clathrate protuberance of FE-SEM transfer film, its cross sectional shape is the essentially rectangular shape, upper surface be shaped as the striated clathrate.Again, the value of the half breadth of the protuberance height/protuberance of clathrate protuberance is 3.3, and the half breadth of clathrate protuberance is 0.4 times of spacing.
(making of polaroid)
Below, through the order identical, AM aluminum metallization, implement etching method with embodiment 1, its purpose is to obtain the reel (below, as polaroid F) of wiregrating film.
(optical detecting)
In the scope of incident angle-45 degree～45 degree, the light penetration of 435nm～500nm of polaroid F is measured, be more than 35%, the rate variance that sees through of position, the left and right sides is 1.67% to the maximum.
(rate of change of the cross Nicols transmitance under the situation of landfill adhering agent layer is measured)
Adopting the method same with embodiment 1, calculate the mean value of the Magnification (protection back/protection is preceding) of the Ts before and after the sticker protection, is 395%.
(comparative example 2)
(carrying out the trickle processing of Ni pressing mold through reverse sputtering)
Through being implemented the reverse sputtering of short time, the Ni pressing mold of the clathrate concaveconvex shape of rectangular shape with comparative example 1 handles the concaveconvex shape of processing pressing mold.Reverse sputtering condition with the best is handled, and makes that the clathrate concaveconvex shape of resin of transfer printing is parabola shaped for roughly.
(making of clathrate protuberance transfer film reel)
The Ni pressing mold of the 130nm spacing that reverse sputtering is handled is rolled into cylindric, next makes clathrate protuberance transfer film reel.Through the observable clathrate protuberance of FE-SEM transfer film, its cross sectional shape is parabola shaped for roughly, upper surface be shaped as the striped clathrate.Again, the value of the half breadth of the protuberance height/protuberance of clathrate protuberance is 4.4, and the half breadth of clathrate protuberance is 0.3 times of spacing.
(making of polaroid)
Below, through the order identical, AM aluminum metallization, implement etching method with embodiment 1, its purpose is to obtain the reel (below, as polaroid G) of wiregrating film.
(optical detecting)
In the scope of incident angle-45 degree～45 degree, the light penetration of 435nm～500nm of polaroid G is measured, be more than 35%, the rate variance that sees through of position, the left and right sides is 6.35% to the maximum.
(rate of change of the cross Nicols transmitance under the situation of landfill adhering agent layer is measured)
Adopting the method same with embodiment 1, calculate the mean value of the Magnification (protection back/protection is preceding) of the Ts before and after the sticker protection, is 507%.
(comparative example 3)
(making of Ni pressing mold)
Preparation surface has the nickel of trickle concavo-convex grid and neutralizes mould, and the spacing of trickle concavo-convex grid (p0) is 145nm, and highly (h0) is 150nm.
(making of clathrate protuberance transfer film reel)
With the Ni pressing mold reelization of 145nm spacing, next, make clathrate protuberance transfer film reel.Through the observable clathrate protuberance of FE-SEM transfer film, its cross sectional shape is the essentially rectangular shape, upper surface be shaped as the striated clathrate.Again, the value of the half breadth of the protuberance height/protuberance of clathrate protuberance is 2.6, and the half breadth of clathrate protuberance is 0.4 times of spacing.
(making of polaroid)
Below, through the order identical, AM aluminum metallization, implement etching method with embodiment 1, its purpose is to obtain the reel (below, as polaroid H) of wiregrating film.
(optical detecting)
In the scope of incident angle-45 degree～45 degree, the light penetration of 435nm～500nm of polaroid H is measured, be more than 35%, the rate variance that sees through of position, the left and right sides is 1.60% (with reference to Fig. 3) to the maximum.
(rate of change of the cross Nicols transmitance under the situation of landfill adhering agent layer is measured)
Adopting the method same with embodiment 1, calculate the mean value of the Magnification (protection back/protection is preceding) of the Ts before and after the sticker protection, is 420% (with reference to Fig. 6).
(comparative example 4)
(carrying out the trickle processing of Ni pressing mold through reverse sputtering)
Through being implemented the reverse sputtering of short time, the Ni pressing mold of the clathrate concaveconvex shape of rectangular shape with comparative example 3 handles the concaveconvex shape of processing pressing mold.Reverse sputtering condition with the best is handled, and makes that the clathrate concaveconvex shape of resin of transfer printing is parabola shaped for roughly.
(making of clathrate protuberance transfer film reel)
The Ni pressing mold of the 145nm spacing that reverse sputtering is handled is rolled into cylindric, next makes clathrate protuberance transfer film reel.Through the observable clathrate protuberance of FE-SEM transfer film, its cross sectional shape is parabola shaped for roughly, upper surface be shaped as the striped clathrate.Again, the value of the half breadth of the protuberance height/protuberance of clathrate protuberance is 3.0, and the half breadth of clathrate protuberance is 0.35 times of spacing.
(making of polaroid)
Below, through the order identical, AM aluminum metallization, implement etching method with embodiment 1, its purpose is to obtain the reel (below, as polaroid I) of wiregrating film.
(optical detecting)
In the scope of incident angle-45 degree～45 degree, the light penetration of 435nm～500nm of polaroid I is measured, be more than 33%, the rate variance that sees through of position, the left and right sides is 8.14% (with reference to Fig. 4) to the maximum.
(rate of change of the cross Nicols transmitance under the situation of landfill adhering agent layer is measured)
Adopting the method same with embodiment 1, calculate the mean value of the Magnification (protection back/protection is preceding) of the Ts before and after the sticker protection, is 570%.
Below in table 1 the mensuration result of expression the foregoing description 1～embodiment 5, comparative example 1～comparative example 4.Again, table 2 illustrates the Ts Magnification of the sticker protection front and back of above-mentioned polaroid A～polaroid I, and table 3 illustrates the maximum difference of the left and right sides incident direction of light penetration.
Table 1
Table 2
Table 3
Can know that through above-mentioned table 1～table 3 pattern-pitch is big more, perhaps cross sectional shape is a para-curve, and the Ts Magnification before and after the sticker protection is big more.This be because, because sticker protection makes refractive index change, be formed at electric field shielding wiry, do not form enough width with respect to the width of spacing.In addition, be that the polaroid of rectangle is compared with cross sectional shape, cross sectional shape is that the maximum difference of left and right sides incident direction of light penetration of parabolical polaroid is bigger.And cross sectional shape is under the situation of rectangle, even the variation of the maximum difference of changes in spacing is also less, is under the parabolical situation at cross sectional shape still, and along with the change of spacing is big, it is big that maximum difference also becomes.This be because, be rectangular shape through making cross sectional shape, can improve shape symmetry wiry.
Utilizability on the industry
The wire grid polarizer of the utility model can suitably be applied in extensive fields such as various optical devices, display device light source.
Claims (6)
1. a wire grid polarizer comprises: have the base material at the upwardly extending clathrate concaveconvex shape of certain party; Be set to and the flanked of a direction side of the protuberance of base material and the tinsel that extends to the top at the protuberance top of said base material with said clathrate concaveconvex shape, it is characterized in that,
The spacing of the protuberance of base material is below 120nm, and in the face vertical with the bearing of trend of said clathrate concaveconvex shape, the cross sectional shape of the protuberance of base material is the essentially rectangular shape.
2. wire grid polarizer as claimed in claim 1 is characterized in that, the value of the protuberance height/protuberance half breadth of said clathrate protuberance is 1.0～10.
3. according to claim 1 or claim 2 wire grid polarizer is characterized in that the half breadth of said clathrate protuberance is 0.2 times～0.7 times of spacing.
4. according to claim 1 or claim 2 wire grid polarizer is characterized in that,
In the face vertical with the specific direction of said base material, the side of the protuberance of said base material and above have tinsel, height wiry is 1.1 times～10 times of protuberance height of base material.
5. according to claim 1 or claim 2 wire grid polarizer is characterized in that,
Be formed at mean breadth wiry on the clathrate jog of said base material and be 0.2 times～0.5 times of the concavo-convex spacing width of clathrate.
6. according to claim 1 or claim 2 wire grid polarizer is characterized in that,
The clathrate jog of said base material and tinsel be being filled with under the situation that refractive index is 1.0 to 1.5 resin, in the wavelength region may of 435nm to 500nm, and 4 times of the decline deficiencies of polarization characteristic.
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| CN2011203822847U CN202433543U (en) | 2011-10-10 | 2011-10-10 | Wire grating polaroid |
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| CN104076428A (en) * | 2013-03-29 | 2014-10-01 | 优志旺电机株式会社 | Grid polarization device and light orientation apparatus |
| CN104459865A (en) * | 2014-12-30 | 2015-03-25 | 京东方科技集团股份有限公司 | Wire grid polarizer, manufacturing method of wire grid polarizer and display device |
| WO2017133103A1 (en) * | 2016-02-02 | 2017-08-10 | 京东方科技集团股份有限公司 | Wire grid polarizer, method of manufacturing same and display device |
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| US9897735B2 (en) | 2014-10-17 | 2018-02-20 | Boe Technology Group Co., Ltd. | Wire grid polarizer and fabrication method thereof, and display device |
| CN104459865A (en) * | 2014-12-30 | 2015-03-25 | 京东方科技集团股份有限公司 | Wire grid polarizer, manufacturing method of wire grid polarizer and display device |
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| US10042099B2 (en) | 2014-12-30 | 2018-08-07 | Boe Technology Group Co., Ltd. | Wire grid polarizer and manufacturing method thereof, and display device |
| WO2017133103A1 (en) * | 2016-02-02 | 2017-08-10 | 京东方科技集团股份有限公司 | Wire grid polarizer, method of manufacturing same and display device |
| US10502881B2 (en) | 2016-02-02 | 2019-12-10 | Boe Technology Group Co., Ltd. | Wire grid polarizer, method of manufacturing the same, and display device |
| CN108369311A (en) * | 2016-03-18 | 2018-08-03 | Jxtg能源株式会社 | The manufacturing method of optical phase difference component, the composite optical member for having optical phase difference component and optical phase difference component |
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Effective date of registration: 20160511 Address after: Japan's Tokyo Chiyoda jimbocho Kanda a chome 105 times Patentee after: Asahi Kasei Kogyo K. K. Address before: Japan's Tokyo Chiyoda jimbocho Kanda a chome 105 times Patentee before: Asahi Chemical Corp. |
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