CN202472025U - Wire grid polaroid and projection type image displaying device using wire grid polaroid - Google Patents
Wire grid polaroid and projection type image displaying device using wire grid polaroid Download PDFInfo
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- CN202472025U CN202472025U CN2011204086925U CN201120408692U CN202472025U CN 202472025 U CN202472025 U CN 202472025U CN 2011204086925 U CN2011204086925 U CN 2011204086925U CN 201120408692 U CN201120408692 U CN 201120408692U CN 202472025 U CN202472025 U CN 202472025U
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- wire grid
- protuberance
- height
- concaveconvex structure
- grid polarizer
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Abstract
The utility model provides a wire grid Polaroid, which is small in rate of change of parallel transmissivity and high in parallel transmissivity, of light incident with a wide angle using an angle direction of a 45 DEG angle relative to the surface of the base material in a profile view as a center, and also provides a projection type image displaying device using the wire grid Polaroid. The wire grid Polaroid (1) comprises a base material (11) with a concave-convex structure extending in a special direction on the surface of the base material (11), and a conductive body (12) arranged in a state of being arranged at the side surface (11b) of a convex portion (11a) of the concave-convex structure in a manner of offset center, the average value of the absolute values of the gradient of a first imaginary line L1 of specific points C1 and C2 and the gradient of a second imaginary line L2 of specific points C3 and C4 is greater than 1 and smaller than 6, the width Wh of the convex portion (11a) of a first height position is smaller than 0.45 times of the width W1 of the convex portion (11a) of a second height position, and the height H of the convex portion is greater than 1/2 of the space P1 of the convex portion (11a).
Description
Technical field
The projection type image display device that the utility model relates to a kind of wire grid polarizer and uses this wire grid polarizer.
Background technology
The development highly significant of photoetching technique in recent years, the formation of the microtexture of light wavelength degree has become possibility.Member, goods with such microtexture can be fit to be applied to semiconductor applications, optical field etc.For example; Fine rule through making the electric conductor that is made up of metal etc. is arranged on substrate surface with the interval below 1/2nd (spacing) of incident light wavelength; Can access following such polaroid (wire grid polarizer); Said polaroid can reflect the light of the electric field intensity composition that the bearing of trend with respect to electric conductor vibrates abreast, and the light of can transmission vertical electric field intensity composition.Because wire grid polarizer has the polarization separation characteristic of above-mentioned that kind, the polarizing beam splitter that therefore can be suitable as reflective liquid crystal projection apparatus, optic pick-up device etc. uses.
When being conceived to use the reflective liquid crystal projection apparatus of polarizing beam splitter, the miniaturization of plant bulk advances rapidly.For the miniaturization of plant bulk, must shorten the optical path length of the optical system in the reflective liquid crystal projection apparatus, become sufficient directional light thereby be difficult to make light source to send light source light.Therefore, the light that incides polarizing beam splitter is the light of extensive angle.Since wire grid polarizer can the incident of polarization separation extensive angle light, therefore have desirable polarization separation characteristic as polarizing beam splitter.
In recent years, along with the carrying out of the exploitation of reflective liquid crystal projection apparatus, constantly require to improve the quality of projection image.Only rely on the polarisation of light stalling characteristic that the light polarization of extensive angle incident is separated into high-polarization, the raising that can't reach image quality.Therefore, need be with respect to the polarizing beam splitter of the rate of change little (the angle interdependence of parallel transmitance is little) of the parallel transmitance of the angle of the light of incident.
In order to improve the polarization characteristic of the wire grid polarizer that uses as polarizing beam splitter, proposed to dwindle the manufacturing approach (for example, with reference to patent documentation 1) of wire grid polarizer of spacing of protuberance of the concaveconvex structure of base material.When using the manufacturing approach of the wire grid polarizer that patent documentation 1 put down in writing; Can form along with base material on the electric conductor of the such shape of protuberance of concaveconvex structure of the vertical face of the bearing of trend of concaveconvex structure (below be called " cross section view "), thereby can improve the polarization characteristic of wire grid polarizer.In addition, in order to improve the optical characteristics of wire grid polarizer, proposed to be provided with the wire grid polarizer (for example, with reference to patent documentation 2) of conductive layer with the state of a side's of the protuberance of being located at the concaveconvex structure in the cross section view partially side.In the wire grid polarizer that patent documentation 2 is put down in writing, be asymmetrical shape with respect to the section shape of the protuberance of the base material in the vertical face of the bearing of trend of base material and the section shape of electric conductor.Therefore, along with the parallel transmitance of the variation of incident angle changes, thereby can reduce the wavelength interdependence of degree of polarization, transmitance.
Patent documentation
Patent documentation 1: TOHKEMY 2008-83656 communique
Patent documentation 2: TOHKEMY 2010-85990 communique
The utility model content
The problem that utility model will solve
Yet most polarizing beam splitter is made and is configured to, and light is from being the angle direction incident of 45 degree with respect to the polarization separation layer, and polarization separation becomes reflected light and transmitted light.Therefore, under the situation that wire grid polarizer is used as polarizing beam splitter, light is from the direction incident with respect to the base-material surface inclined of wire grid polarizer.Therefore, so that the angle direction of 45 degree is more satisfactory as the polarizing beam splitter of the reflective liquid crystal projection apparatus of miniaturization as the little wire grid polarizer of the rate of change of the parallel transmitance of the light of the extensive angle incident at center.
On the other hand, the optical property of wire grid polarizer mainly exists with ... the structure and the spacing of electric conductor.In general, the electric conductor of wire grid polarizer is made in the direction elongation vertical with respect to substrate surface.Therefore; In the wire grid polarizer; Higher from the transmitance of the light of the direction incident vertical with respect to substrate surface; Under the situation with respect to the direction incident of base-material surface inclined is low transmission, thereby exists so that the angle direction of 45 degree is become big tendency as the rate of change of the parallel transmitance of the light of the extensive angle incident at center.
The utility model is put in view of the above problems and is researched and developed, and it is a kind of will being the rate of change little and parallel transmitance high wire grid polarizer of the angle direction of 45 degree as the parallel transmitance of the light of the extensive angle incident at center with respect to the substrate surface in the cross section view that its purpose is to provide.
Solve the means of problem
The wire grid polarizer that the utility model is related; It comprises; Base material with concaveconvex structure of specific direction extension from the teeth outwards; And the electric conductor that is provided with the state of a side's of the protuberance of being located at said concaveconvex structure partially side; Wherein, In the cross section view of the direction vertical with respect to the bearing of trend of said concaveconvex structure; To be set at the protuberance height H from the highest difference of said protuberance to the height of the lowest part of recess; Will from the height and position of said lowest part on short transverse roughly the set positions of 9/10H be first height and position; Will be when roughly the set positions of 1/10H be second height and position on short transverse from the height and position of said lowest part, under the situation of the specified point C4 of the said electric conductor of the specified point C2 of the said concaveconvex structure of the specified point C3 of the said electric conductor of the specified point C1 of the said concaveconvex structure of having set said first height and position, said first height and position, said second height and position and said second height and position, the average absolute of the slope of the slope of first imaginary line through said specified point C1 and said specified point C2 and second imaginary line through said specified point C3 and said specified point C4 is more than 1 below 6; The width of the said protuberance of said first height and position is below 0.45 times of width of the said protuberance of said second height and position, more than 1/2 of spacing P1 that said protuberance height H is said protuberance.
The preferable case of the wire grid polarizer that the utility model is related is that at least a portion of said electric conductor is arranged at the treble top of the protuberance of said concaveconvex structure.
The preferable case of the wire grid polarizer that the utility model is related is that the spacing of the protuberance of said concaveconvex structure is below the 130nm.
The preferable case of the wire grid polarizer that the utility model is related does, is below the 40nm from the lowest part of the protuberance of said concaveconvex structure at the width of the electric conductor of the 3rd height and position of rising 1/3H on the short transverse.
The projection type image display device that the utility model is related; It comprises above-mentioned wire grid polarizer, light source and reflection type liquid crystal display element; The light that wherein penetrates from said light source perhaps reflects in said wire grid polarizer transmission; Incide said reflection type liquid crystal display element afterwards, the light of modulating through said reflection type liquid crystal display element reflects perhaps transmission and projection image at said wire grid polarizer.
The preferable case of the projection type image display device that the utility model is related is that the conductor construction face of said wire grid polarizer is adapted to towards reflection type liquid crystal display element.
The utility model effect
Can realize providing a kind of according to the utility model will be the wire grid polarizer that rate of change is little and parallel transmitance is high of the angle direction of 45 degree with respect to the substrate surface of cross section view as the parallel transmitance of the light of the extensive angle incident at center.Thus, the wire grid polarizer that has preferred characteristics as polarizing beam splitter can be provided.
Description of drawings
Fig. 1 is the diagrammatic cross-section of the related wire grid polarizer of the example of the utility model.
Fig. 2 is the synoptic diagram of the related projection type image display device of the example of the utility model.
Fig. 3 is the sectional view of the related wire grid polarizer of the embodiment of the utility model.
Fig. 4 is the sectional view of the related wire grid polarizer of the comparative example of the utility model.
Symbol description
1 wire grid polarizer
2 reflective liquid crystal projection apparatus
11 base materials
The 11a protuberance
The 11b side
11c, the highest portion of 12a
The 11d recess
The 11e lowest part
12 electric conductors
21 light sources
22 reflection type liquid crystal display elements
23 projecting lens
L1, L2 imaginary line
C1～C4 specified point
H protuberance height
Embodiment
Below, be elaborated with reference to the example of accompanying drawing to the utility model.
＜wire grid polarizer＞
Fig. 1 is the diagrammatic cross-section of the related wire grid polarizer of the example of the utility model 1.In addition, in Fig. 1, expression be the synoptic diagram of the section vertical with respect to the bearing of trend (the direction of Fig. 1) of the concaveconvex structure of the base material 11 of wire grid polarizer 1 perpendicular to paper.
As shown in Figure 1, the related wire grid polarizer 1 of this example comprises, has the base material 11 of the concaveconvex structure that specific direction from the teeth outwards extends and is located at a side the electric conductor 12 of side 11b of the protuberance 11a on base material 11 surfaces partially.The concaveconvex structure of base material 11 is repeated alternately to constitute by a plurality of protuberance 11a and a plurality of recess 11d.In the related wire grid polarizer 1 of this example; The protuberance 11a of base material 11 is constituted as and supports electric conductor 12; Section shape with respect to the electric conductor 12 in the vertical section of the bearing of trend of concaveconvex structure is constituted as, and has the shape with respect to the vertical direction relative tilt on base material 11 surfaces.
Then, the formation to the related wire grid polarizer 1 of example is elaborated.In addition; In following explanation; In the section vertical with respect to the bearing of trend of the concaveconvex structure on base material 11 surface; Difference from the highest the 11c of protuberance 11a to the height of the lowest part 11e of recess 11d is set at the protuberance height H; To be " first height and position (with reference to the dotted line L3 of Fig. 1) " in the set positions that short transverse (direction vertical with respect to substrate surface) goes up about 9/10H from the lowest part 11e of recess 11d, will be " second height and position (with reference to the dotted line L4 of Fig. 1) from the set positions of lowest part 11e about 1/10H on short transverse of recess 11d.In addition, will be set at " specified point C1 ", will be set at " specified point C3 " at noncontact point electric conductor 12 and protuberance 11a of first height and position at the contact point of the protuberance 11a of first height and position with electric conductor 12.Further, will be set at " specified point C2 ", will be set at " specified point C4 " at noncontact point electric conductor 12 and protuberance 11a of second height and position at the contact point of the protuberance 11a of second height and position with electric conductor 12.
Base material 11 is formed, and the width W h of the protuberance 11a of first height and position is below 0.45 times with respect to the width W l of second height and position.In addition, base material 11 is formed, and the protuberance height H is more than 1/2 of spacing P1 between the highest the 11c of adjacent protuberance 11a.
Promptly; The related wire grid polarizer 1 of this example is constituted as; Corresponding to (for example to the incident angle of the light of electric conductor 12 incidents of being located at base material 11 surface; The direction that is 45 degree with respect to base material 11 surfaces); Height (height till the highest the 12a from base material 11 surfaces to electric conductor 12 of incident angle direction) on electric conductor 12 apparent uprises, and the parallel transmitance and the polarization characteristic that are constituted as under the situation of direction-guidance electricity body 12 incidents that light uprises from the height on electric conductor 12 apparent uprise relatively.Through such formation, can make will reducing as the rate of change of the parallel transmitance of the light of the extensive angle incident at center, and parallel transmitance is improved with respect to the incident angle direction that base material 11 surfaces are 45 degree.
In the related wire grid polarizer 1 of this example, from the viewpoint of optical characteristics, the state of side 11b of being located at the side of protuberance 11a with roughly the highest the 11c from protuberance 11a partially is provided with electric conductor 12.In addition, be more than 1/2 of spacing P1 of protuberance 11a through making the protuberance height H, become easy thereby form electric conductor 12.Thus, the average absolute of slope of absolute value and imaginary line L2 that can make the slope of imaginary line L1 is the wire grid polarizer below 61 more than 1.
In addition, in the related wire grid polarizer 1 of this example, base material 11 be below 0.45 times at the width W h of the protuberance 11a of first height and position with respect to the width W l of the protuberance of second height and position.Thus, the shape relative tilt of the electric conductor 12 in the cross section view is become easily, and can make the electric conductor 12 of the shape of relative tilt through the good oblique evaporation method of throughput rate.In addition, from the viewpoint of intensity, preferable case is more than 0.1 times of width W l for width W h.In addition; Width W h, Wl for protuberance 11a; Observe the shape of concaveconvex structure on base material 11 surfaces of cross section view with scanning electron microscope (SEM) or infiltration type electron microscope (TEM); Measure the width of the direction parallel of optional 3 protuberance 11a, use its mean value with respect to base material 11 surfaces of protuberance 11a.
Further, in the related wire grid polarizer 1 of this example, preferable case does, be located at least a portion of electric conductor on the short transverse 12 protuberance 11a the highest 11c above.At this moment, preferred situation does, the highest 12a of electric conductor 12 on the short transverse from the lowest part 11e of recess 11d to above extend with respect to more than 1.1 times of protuberance height H.Through being arranged to the top of the highest 11c that electric conductor 12 extends to the protuberance 11a of base material 11, can increase the volume of electric conductor 12.Consequently, the polarization separation characteristic of wire grid polarizer 1 can be improved, and the loss of light can be reduced.In addition, the shape of electric conductor 12 is so long as get final product to the outstanding shape in top from the highest the 11c of the protuberance 11a of base material 11 at least, can be at the volume that can increase electric conductor 12, improve change in time in the scope of polarization separation characteristic.
In the related wire grid polarizer 1 of this example, electric conductor 12 has small interval (spacing P2) and arranges.So, electric conductor 12 with small spaced wire grid polarizer in, the spacing P2 of electric conductor 12 is more little then can to present good polarization characteristic in the wavelength region may more widely.In addition, in the related wire grid polarizer 1 of this example,, be arranged to 1/4～1/3 of lambda1-wavelength, can demonstrate the polarization characteristic of abundant practicality through spacing P2 with electric conductor 12 because electric conductor 12 contacts with air (refractive index is 1.0).On the other hand, in the related wire grid polarizer 1 of this example, electric conductor 12 is provided in a side's who is located at protuberance 11a in the cross section view partially side 11b.Therefore, through on a side's of the non-opposite face of adjacent protuberance 11a side 11b, electric conductor 12 being set, the spacing P2 of the spacing P1 of protuberance 11 and electric conductor 12 is with roughly the same being spaced, and is therefore comparatively preferred from the viewpoint of optical characteristics.Therefore, consider to utilize under the situation of light of visible region, spacing P1 is preferably below the 150nm, further is preferably below the 130nm.
At this; The inventor of the utility model finds; Present the wire grid polarizer 1 of good polarization characteristic in order to be produced on wavelength band territory widely; The spacing P1 of protuberance 11a in the cross section view of the wire grid polarizer 1 that this example is related is set to 130nm when following, and compares from the reflection of light rate of face with electric conductor 12 (below be called " conductor construction face ") side incident, and the reflectivity of the face of the opposition side of conductor construction face is lower.This be because; On the characteristic of the manufacturing approach when vapor deposition electric conductor 12; Because the screening effect of the protuberance 11a of base material 11, the lowest part 11e of the protuberance 11a of the concaveconvex structure on base material 11 surfaces from cross section view is in width W m (being meant the width of the electric conductor 12 of the direction parallel with base material 11 surfaces at the width W m of this said electric conductor 12) attenuation of the electric conductor 12 of the height and position of rising 1/3H on the short transverse (below be called " the 3rd height and position (with reference to the dotted line L5 of Fig. 1) ").Especially when width W m be 40nm when following, compare the reflectivity step-down of the face of the opposition side of conductor construction face with the reflectivity of conductor construction face.When the wire grid polarizer 1 with such characteristic is used for the polarizing beam splitter of reflective liquid crystal projection apparatus, can reduces unwanted reflection of light light intensity, thereby can improve the image quality of image light, therefore comparatively preferred.
The difference of the reflectivity of the face of the opposition side of the reflectivity of said conductor construction face and conductor construction face is determined by the width W m of the electric conductor in the cross section view 12.In addition, in the related wire grid polarizer 1 of this example, the width W m of electric conductor 12 compares with the thickness of the electric conductor 12 of the highest the 11c of protuberance 11a, makes thinner easily.When considering the effective refractive index of wire grid polarizer 1, the width W m of electric conductor 12 is factors that effective refractive index is changed, along with the variation reflection characteristic of effective refractive index also changes.Under the thin situation of the width W m of the electric conductor 12 of the lowest part 11e of recess 11d, reduce from the reflection of light rate of the conductor construction face side incident of base material 11.Especially, the width W m of the electric conductor 12 of the 3rd height and position in the cross section view is 40nm when following, and is lower from the reflection of light rate of the conductor construction face side incident of base material 11.
When utilizing the good oblique evaporation method of throughput rate; Method as the thickness attenuation of the electric conductor 12 of the lowest part 11e that makes the recess 11d in the cross section view; Can enumerate, reduce the spacing P1 of the protuberance 11a of concaveconvex structure, the width W h that improves protuberance height H, increasing protuberance 11a, Wl etc.But, under the extremely high situation of the protuberance height H in cross section view, with the top of the protuberance 11a of concaveconvex structure relatively, the quantitative change of the electric conductor 12 of vapor deposition is few in the bottom.Therefore; Under the situation of the structure that the width of the protuberance 11a as sinusoidal wave shape concaveconvex structure for example the lowest part 11e from the highest the 11c of protuberance 11a to recess 11d changes continuously; Quantitative change with respect to the electric conductor 12 of top vapor deposition in the bottom of protuberance 11a is few; Thus, the profile of the side of electric conductor 12 and noncontact face side protuberance 11a approaches vertical direction (it is big that the slope of imaginary line L2 becomes), therefore is difficult to make the shape relative tilt of electric conductor 12.Therefore, the height H of protuberance 11a is preferably below 1.5 times of spacing P1 of protuberance 11a.
In addition, strengthen under the situation of width W h, Wl of protuberance 11a, along with the ratio of occupying of the protuberance 11a of concaveconvex structure changes, effective refractive index also changes thereupon, and optical characteristics will descend thus.Therefore, be to reduce the spacing P1 of protuberance 11a as the top condition of making from the low wire grid polarizer 1 of the reflection of light rate of 11 side incidents of base material.In addition, the spacing P1 of the protuberance 11a in the cross section view is set to 130nm when following, and the width W m that can easily make the electric conductor 12 of the 3rd height and position in the cross section view is below the 40nm.But from the viewpoint of optical characteristics, preferred situation does, the shortcoming of part can not take place a side the electric conductor 12 of side 11b that is positioned at the protuberance 11a of concaveconvex structure, is continued presence.Therefore, preferable case has electric conductor 12 for the 3rd height and position in cross section view, and preferred situation is above electric conductor 12 continued presences of 5nm for this width W m.At this, if excessively reduce the spacing P1 of protuberance 11a, because the screening effect of the protuberance 11a of base material 11, it is thin that the width W m of electric conductor 12 will become, and occurs the shortcoming of part sometimes.Therefore, the spacing P1 of protuberance 11a is preferably below the above 130nm of 80nm, further is preferably below the above 130nm of 100nm.
In addition, the deposition angles of the cross section view when changing vapor deposition reduces the vapor deposition amount to the lowest part 11e of recess 11d, can make the width W m attenuation of electric conductor 12 of the lowest part 11e of recess 11d.But the change of deposition angles can make the shape of the electric conductor 12 in the cross section view change.Therefore; In order to make the shape relative tilt of electric conductor 12; And reduce vapor deposition amount, must strictness carry out the control and the management of vapor deposition condition, problem such as the deviation change of the optical characteristics of will produce that throughput rate descends, each being made batch is big to the lowest part 11e of recess 11d.Therefore, preferable case is that the width W m of electric conductor 12 adjusts through the spacing P1 of protuberance 11a.
The wire grid polarizer 1 that this example is related can engage the face of conductor construction face side or its opposition side optically through binding material etc. and use with other optical component.Have no particular limits for said optical component at this, can be prism, comprise blooming, diffusion barrier, polarizing coating of birefringence film etc.In addition; With binding material etc. the conductor construction face of wire grid polarizer 1 and optical component etc. are engaged; Even under situation about engaging with above-mentioned optical component etc., compare with the conductor construction face side of wire grid polarizer 1, the reflectivity of 11 sides of base material is still lower.This be because; In the cross section view of the good wire grid polarizer 1 of optical characteristics; Compare with the thickness of the electric conductor 12 of the highest 11c top of the protuberance 11a that is present in concaveconvex structure, the width W m of electric conductor 12 of lowest part 11e that is present in recess 11d is thinner.
(base material)
Can use the for example inorganic material or the resin material of glass etc. as base material 11.When especially adopting resin material to form base material 11, it can utilize roll process (English: roll process; Japanese: ロ ー Le プ ロ セ ス), can make wire grid polarizer 1 have pliability (bendability), owing to have advantages such as above-mentioned, therefore comparatively desirable.As can be, ultraviolet ray (UV) gel-type resin or the thermohardening type resin of crystalline thermoplastic resin or acrylic acid series, epoxy system, the polyurethane series etc. of amorphism thermoplastic resin or polyethylene terephthalate (PET) resin, PEN resin, polyvinyl resin, acrylic resin, polybutylene terephthalate resin, aromatic polyester resins, polyformaldehyde resin, the polyamide etc. of plexiglass, polycarbonate resin, polystyrene resin, cyclic olefin resins (COP), cross-linked polyethylene resin, Corvic, polyacrylate resin, polyphenylene oxide resin, modified polyphenylene ether resin, polyetherimide resin, polyethersulfone resin, polysulfone resin, polyether ketone resin etc. be for example arranged as the resin of base material 11.Can be that the inorganic substrate of UV gel-type resin or thermohardening type resin and glass etc., above-mentioned thermoplastic resin, triacetate resin etc. constitute base material 11, or use formation base material 11 separately again.The film that also can have the tack that is used for improving base material 11 and electric conductor 12 on the surface of base material 11.
The concaveconvex structure on base material 11 surfaces in cross section view, is preferably sine wave shape.Sine wave shape be meant by recess 11d and protuberance 11a repeat alternately to form, the curve part of curvature smooth variation as para-curve, it is the sine wave shape of trapezoidal shape, rectangular shape, square shape, semicircle etc. also.The curve part of these section shapes is that crooked curve gets final product, and for example, the shape that attenuates in the middle of the protuberance 11d also is contained in the sine wave shape.Through the shape of concaveconvex structure, on the bottom of the side 11b of the protuberance 11a of the lip-deep concaveconvex shape of base material 11 and recess 11d, utilize the oblique evaporation method can easily form continuous electric conductor 12.
In addition, base material 11 is as long as transparent in fact in the target wavelength zone.In addition, on the direction of regulation, extends and be meant,, do not need the recess 11d of sag and swell and protuberance 11a strictly to extend in parallel separately as long as sag and swell extends in fact in the direction of stipulating.In addition, the interval of sag and swell (spacing P1) is preferably below the 150nm, and equally spaced situation is comparatively desirable.In addition, uniformly-spaced be meant,, can allow the deviation that goes up to about ± 10% as long as in fact uniformly-spaced.
The manufacturing approach that the surface has the base material 11 of concaveconvex structure is not limited especially.For example, can be the applicant's the applying date this patent manufacturing approach that No. 4147247 communique is put down in writing.According to No. 4147247 communique of Jap.P.; Utilization has the metal stamping and pressing of adopting the concaveconvex structure of interfering exposure method and making; Concaveconvex structure heat is transferred on the thermoplastic resin, and on the direction that the bearing of trend with the concaveconvex structure of the thermoplastic resin of having given concaveconvex structure parallels, implements one of free end and extend processing.Consequently, the spacing that is transferred to the concaveconvex structure on the thermoplastic resin is dwindled, and can access the resin plate (after extending completion) with fine concaveconvex structure.Then,, utilize methods such as electrochemical plating, make metal stamping and pressing with fine concaveconvex structure by the resin plate that obtains (after extending completion) with fine concaveconvex structure.Utilize this metal stamping and pressing, transfer printing on base material 11 surfaces, the fine concaveconvex structure of formation can access the base material 11 with concaveconvex structure thus.In addition, also exist using silicon is the method for substrate etc., and said silicon is that substrate is that fine concaveconvex structure is made in the photoetching of using the semiconductor manufacturing.For example, the silicon that will have fine concaveconvex structure be substrate as mold, make the resin plate that has fine concaveconvex structure on the surface.Can adopt methods such as electrochemical plating by resin plate, make metal stamping and pressing with fine concaveconvex structure.
Adopt the metal stamping and pressing that is shaped as rectangular shape of the concaveconvex structure of section view; Concaveconvex structure heat is transferred on the thermoplastic resin; On the direction that the bearing of trend with the concaveconvex structure of the thermoplastic resin of having given concaveconvex structure parallels, implement extension of free end and add man-hour; Along with by extending the variation of processing the concaveconvex structure that causes, can make the section shape of concaveconvex structure become sine wave shape.At this; By the resin plate that obtains (extend accomplish after) with fine concaveconvex structure; Utilize methods such as electrochemical plating; Made under the situation of the metal stamping and pressing with fine concaveconvex structure, the shape that can make can transfer printing, form the concaveconvex structure at section visual angle becomes the metal stamping and pressing of the concaveconvex structure of sine wave shape.
S' the method for making of metal stamping and pressing of the shape of the concaveconvex structure below 0.45 times as the width W h of can transfer printing, being formed on the protuberance 11a of first height and position in the cross section view with respect to the width W l of the protuberance 11a of second height and position; For example, such method that can be listed below.
At first; Utilize the metal stamping and pressing that is shaped as rectangular shape of the concaveconvex structure of cross section view; Concaveconvex structure heat is transferred on the thermoplastic resin, on the direction that the bearing of trend with the concaveconvex structure of the thermoplastic resin of having given concaveconvex structure parallels, implements one of free end and extend processing.Then; On the surperficial face of the resin plate that obtains (extend accomplish back) (below be referred to as " concaveconvex structure face ") with concaveconvex structure with fine concaveconvex structure; Enforcement utilizes the surface treatment of UV-ozone, utilizes method such as electrochemical plating to make the metal stamping and pressing with fine concaveconvex structure.So; Can process can transfer printing, form the metal stamping and pressing of the shape of following such concaveconvex structure; Promptly; In the cross section view concaveconvex structure on base material 11 surface be shaped as sine wave shape, and the width W h of the protuberance 11a of first height and position is below 0.45 times with respect to the width W l of the protuberance 11a of second height and position.
At this; Do not implement under the above-mentioned surface-treated situation; Not only can't make the width W h of the protuberance 11a of first height and position in the cross section view is below 0.45 times with respect to the width W l of the protuberance 11a of second height and position, and can't make the thickness attenuation of horizontal direction of the highest the 11c of base material protuberance 11a.The thickness of the horizontal direction of the highest the 11c of protuberance 11a is thicker, and when vapor deposition, electric conductor 12 is grown easy the highest 11c from protuberance 11a to the top, thereby the electric conductor 12 of growth self will become the structure of giving screening effect.Consequently; Electric conductor 12 generates on the direction with respect to base material 11 Surface Vertical easily when electric conductor 12 vapor depositions; Even the slope of the first imaginary line L1 is identical with the symbol of the slope of the second imaginary line L2; But the average absolute of the slope of the first and second imaginary line L1, L2 becomes than 6 big, is difficult to form the electric conductor shape of relative tilt.
In addition, do not limit, can use methods such as UV-ozone method, corona discharge method, plasma method, dry etching method as the concaveconvex structure face of resin plate with fine concaveconvex structure (extend and accomplish the back) is implemented the surface-treated method.In addition; The method for making that has the metal stamping and pressing of desirable concaveconvex structure in the cross section view; Also be not limited to above-mentioned method, can also easily expect following such method, for example; Change to metal stamping and pressing with implementing the surface-treated object by the resin plate with micro concavo-convex structure (after extending completion); The concaveconvex structure face of metal stamping and pressing is carried out the such method of surface treatment, or microfabrication through photoetching, make and have the mold of desirable concaveconvex shape, thereby need not carry out the such method of surface treatment.
(electric conductor)
< electric conductor formation method >
Consider throughput rate, optical characteristics etc., the formation method of electric conductor 12 preferably adopts the direction that tilts from the vertical direction with respect to the surface of the base material with concaveconvex structure 11 to carry out the oblique evaporation method of vapor deposition.The oblique evaporation method is meant, in the cross section view of base material 11, vapor deposition source with respect to the vertical direction on base material 11 surfaces with the incident angle vapor deposition of regulation, the method for lamination metal.Incident angle decides preferred range by the section shape of the electric conductor 12 of the protuberance 11a of concaveconvex structure and made, in general, is preferably 5 degree～45 degree, more preferably 5 degree～35 degree.Further, consider the drop shadow effect of the metal of lamination in the vapor deposition, little by little reduce or increase incident angle, be suitable for controlling the section shapes such as height of electric conductor 12.In addition, under the situation of base material 11 surface curvatures, also can carry out vapor deposition from the direction that tilts with respect to base material 11 normal to a surface directions.
Specifically; Base material 11 has on the surface at the concaveconvex structure of specific direction with the spacing P1 almost parallel ground extension of regulation; With respect to the center that vapor deposition source is set on the above direction less than 45 degree of 5 degree by the vertical direction at the center in vapor deposition zone on base material 11 surface, thus on concaveconvex structure formation electric conductor 12.Further be preferably, with respect to the center that vapor deposition source is set on the angle direction less than 35 degree more than 5 degree by the vertical direction at the center in vapor deposition zone on base material 11 surfaces.Thus, can electric conductor 12 be arranged on a certain side side 11b of protuberance 11a of concaveconvex structure on base material 11 surface selectively.In addition, transmitting on the limit under the situation of base material 11 limit vapor depositions, also can be to be carried out vapor deposition by the state that above-mentioned condition is satisfied at the center of the center in vapor deposition zone and vapor deposition source in a flash at certain.
Utilize under the situation of above-mentioned oblique evaporation method, the protuberance 11a of the concaveconvex structure on base material 11 surfaces is identical with the bearing of trend of electric conductor 12.For the metal evaporation amount of the shape of reaching electric conductor 12 is decided by the shape of the protuberance 11a of concaveconvex structure, in general, average vapor deposition thickness is about 50nm to 200nm.Here said average thickness is meant, supposes at the thickness of the vapor deposition thing from the perpendicular direction evaporation material of glass time the on the smooth glass substrate, uses as the reference value of metal evaporation amount.
In addition, from the viewpoint of optical characteristics, be preferably through etching and remove unnecessary electric conductor 12.Have no particular limits for lithographic method; So long as can not give base material 11, after the dielectric layer stated bring harmful effect; The method that can remove electric conductor 12 selectively gets final product, and the viewpoint from the shape of throughput rate and electric conductor 12 is controlled is preferably isotropic etching; For example, can preferably be impregnated into alkalescence the WS in lithographic method.
(dielectric)
In this embodiment, the wire grid shown Pian vibration sheet 1 in order to improve the material constituting the substrate 11 and the conductive block 12? Adhesion, can be appropriately used between the two adhesion containing have a high dielectric layer of a dielectric material.For example, can use perhaps their potpourri of single component of oxide, nitride, halogenide, the carbonide of the metal that single component or its potpourri (in the dielectric single component, sneaking into the dielectric of other elements, single component or compound), aluminium (Al), chromium (Cr), yttrium (Y), zirconium (Zr), tantalum (Ta), titanium (Ti), barium (Ba), indium (In), tin (Sn), zinc (Zn), magnesium (Mg), calcium (Ca), cerium (Ce), the copper (Cu) of oxide, nitride, halogenide, the carbonide of silicon (Si) such as silicon dioxide waits.As long as the dielectric material is transparent in fact in going for through the wavelength region may of polarization property.Lamination method to the dielectric material has no particular limits, and for example, can suitably use physical vapor depositions such as vacuum vapour deposition, metallikon, ion plating method.
(substrate)
Portion's material as the base material 11 that keeps having concaveconvex structure can use substrate.As substrate, can use inorganic material, resin materials such as glass, be preferably use and can make wire grid polarizer and tabular resin material easy and other opticses bondings through roll process.
Can select for use as resin material; For example, polymethacrylate resin (PMMA), polycarbonate resin, polystyrene resin, cyclic olefin resins (COP), cross-linked polyethylene resin, Corvic, polyacrylate resin, polyphenylene oxide resin, modified polyphenylene ether resin, polyetherimide resin, polyethersulfone resin, polysulfone resin, polyether ketone resin, polyethylene terephthalate (PET) resin, PEN resin, polyvinyl resin, acrylic resin, polybutylene terephthalate resin, aromatic polyester resins, polyformaldehyde resin, polyamide, triacetyl cellulose are ultraviolet ray (UV) gel-type resin or the thermohardening type resin of resin (TAC) etc. or acrylic compounds, epoxies, polyurethanes etc.In addition, also can combinations such as the inorganic substrate of UV gel-type resin or thermohardening type resin and glass etc., thermoplastic resin be used, perhaps use separately.
Phase differential in the face of substrate, low for fear of degree of polarization, be preferably reduction with respect to phase differential in the face of provision wavelengths, when for example considering to utilize visible light, the value that is preferably with respect to the phase differential of wavelength 550nm is below the 30nm.More preferred situation is below the 15nm.In addition; For the degree of polarization that prevents the polarization that wire grid polarizer causes inhomogeneous in face; Need manage any 2 phase difference value in the real estate; When for example considering to utilize visible light, being preferably with respect to phase difference value in the face of wavelength 550nm is below the 10nm, and more preferred situation phase difference value is below the 5nm.As the substrate with characteristic like this, preferably using triacetyl cellulose is resin (TAC), cyclic olefin resins (COP), polycarbonate resin (PC), polymethacrylate resin resin materials such as (PMMA).
(reflective liquid crystal projection apparatus)
Then, the related projection type image display device of the example of the utility model is described.Projector as the related projection type image display device of this example; For utilizing the reflective liquid crystal projection apparatus of reflection type liquid crystal display element; As the polarizing beam splitter of reflective liquid crystal projection apparatus, can be suitable for the related wire grid polarizer of above-mentioned example.
With reference to Fig. 2 the projection type image display device that uses the related wire grid polarizer of above-mentioned example is described.Fig. 2 is the synoptic diagram as the reflective liquid crystal projection apparatus of projection type image display device.As shown in Figure 2, the related reflective liquid crystal projection apparatus 2 of this example constitutes to have: the light source 21 of LED etc.; Wire grid polarizer 1 as polarizing beam splitter; And the reflection type liquid crystal display element 22 that on the light of light source, adds image information.Can have the projecting lens 23 that enlarges projection image's light as required.
The light of the light source that penetrates from light source 21 incides on the wire grid polarizer 1 as polarizing beam splitter.By polarization separation and the polarized light of transmission or reflection, incide on the reflection type liquid crystal display element 22 and modulated outgoing afterwards at wire grid polarizer 1.From the emergent light of reflection type liquid crystal display element 22 outgoing, see through or reflection at wire grid polarizer 1, after being enlarged, project on the screen by projecting lens 23.
When using above-mentioned example related wire grid polarizer 1 as polarizing beam splitter, it is identical symbol that preferred disposition becomes the slope of the first imaginary line L1 in the cross section view of wire grid polarizer 1 and the slope of the second imaginary line L2.Through such configuration, because the side incident of the opposition side of the side's who is provided with electric conductor 12 of the protuberance 11a of the concaveconvex structure of incident light from cross section view side 11b, thereby can access good polarization characteristic.
In addition, wire grid polarizer 1 preferably is configured to its conductor construction face towards reflection type liquid crystal display element 22.This is because because the face reflectivity of the opposition side of the conductor construction face of wire grid polarizer 1 is relatively low, can reduces unwanted reflected light, promptly reduce parasitic light, thereby can improve the quality of projection image's light.Particularly, the spacing of the protuberance of concaveconvex structure is 130nm when following, can reduce unwanted parasitic light significantly.That is, be configured to improve the display precision of image towards reflection type liquid crystal display element 22 through conductor construction face with wire grid polarizer 1.
The wire grid polarizer 1 that this example is related when using as polarizing beam splitter, can be fitted on the level and smooth glass plate and use, and it is used agley.In addition, can carry out AR (antireflection) to the face of the opposition side of conductor construction face and handle, perhaps additional moth ocular structure.
In addition, the related wire grid polarizer 1 of the utility model can not damage optical characteristics ground in the zone of visible light, near infrared light and infrared light and uses, and therefore can show fields uses such as purposes, pick-up purposes, sensor applications at image.Yet the utility model is not limited to described example, can carry out various changes and implement.In addition, the material in the said example, quantity etc. are merely an example, possibly suitably change.In addition, can in the scope of the technical thought that does not exceed the utility model, suitably change.
Embodiment
Below, through embodiment the utility model is elaborated, but the utility model is not limited by following these embodiment.At first, the measuring method to the measured value among the embodiment describes.
The measurement of＜transmitance and reflectivity＞
Spectrophotometer (U-4100 of Hitachi's high-tech company system) has been used in the measurement of transmitance and reflectivity.This spectrophotometer has polarizing elements near light source, keep the measuring samples platform of measuring samples to have an identical action turning axle with light-receiving device, can move separately according to measuring purpose.
The measurement of phase difference value in the＜face＞
As the measuring equipment of phase difference value in the face, used the polarization resolver (KOBRA-WR of prince's instrumentation machine Co., Ltd. system) that utilizes parallel Nicol method.The measurement light wavelength is 550nm, is that 0 phase difference value when spending is as phase difference value in the face with incident angle.
The measuring method of＜refractive index＞
Apparatus for measuring refractive index (the laser refraction rate measuring instrument Model2010 of Metricon corporate system) has been used in the measurement of refractive index.When being cured the measurement of type resin, refractive Index Measurement after having carried out cured.According to the measurement result of the refractive index of the wavelength 532nm, 633nm and the 824nm that obtain by apparatus for measuring refractive index, utilize Cauchy dispersion formula to try to achieve the wavelength dispersion figure of refractive index, thereby obtain the refractive index of wavelength 589nm.
(method for making of wire grid polarizer)
Then, the method for making of the employed wire grid polarizer of present embodiment is carried out following explanation.
(making of mould)
Concaveconvex structure extends in one direction, and the concaveconvex structure in the cross section view is a rectangular shape, and the spacing of using photoetching technique making concaveconvex structure is that each silicon of 145nm, 130nm and 100nm is substrate.Go up to apply about 3 μ m acrylic acid series UV gel-type resins (refractive index 1.52) at PET film (A-4300: Co., Ltd.'s system is spun by Japan), make that each silicon is that concaveconvex structure face and the UV gel-type resin of substrate joins, and distinguish stacked together.Use the UV lamp of centre wavelength, carry out 1000mJ/cm from PET film side as 365nm
2UV irradiation, thereby be that the concaveconvex structure of substrate is transferred on the PET film with silicon.When observing surface and the concaveconvex structure in the cross section view of PET film with SEM, concaveconvex structure extends on a direction, and its spacing is 145nm, 130nm and 100nm, has confirmed transfer printing silicon to be the concaveconvex structure of substrate.On the concaveconvex structure face of above-mentioned PET film, as the conductionization processing, cover concaveconvex structure with the platinum palladium through metallikon, electronickelling respectively afterwards, thus produce the nickel pressing mold that the surface has concaveconvex structure.In addition, will by the surface have spacing be the nickel pressing mold that forms of the PET film production of the concaveconvex structure of 145nm as mould A, with spacing be 130nm as mould C, with spacing be 100nm as mould E.
Utilizing mould A, C and the E of made, is the surface transfer concaveconvex structure of cyclic olefin resins (the following COP that the slightly is called) plate of 0.5mm through hot punch press method at thickness, makes each one of COP plate A, C and E that the surface has concaveconvex structure.Then, for transfer printing COP plate A, C and the E of concaveconvex structure on above-mentioned each mould A, C and E surface, its concaveconvex structure face is carried out the surface treatment of UV-ozone.Utilize ultraviolet surface processing device (Photo Surface Processor, model: PM906N-2, SEN special light sources Co., Ltd. system), the illumination to the concaveconvex structure face illumination wavelength 254nm of COP plate A, C and E is 34mW/cm respectively
2UV30 second.With the surface of COP plate A, C and E after the surface treatment of SEM observation UV-ozone and the concaveconvex structure in the cross section view; The width W h of the protuberance of first height and position (with reference to Fig. 1) is below 0.45 times of width W l (with reference to Fig. 1) of the protuberance of second height and position, and it is shaped as sinusoidal wave shape.COP plate A after the surface treatment, C and E are done the conductionization processing, cover concaveconvex structure with the platinum palladium through metallikon, electronickelling respectively afterwards, thus make the nickel pressing mold.The nickel pressing mold that to be made by the COP plate A after the surface treatment is as mould B, and the nickel pressing mold that will be made by the COP plate C after the surface treatment is as mould D, and the nickel pressing mold that will be made by the COP plate E after the surface treatment is as mould F.
(using the making of the concaveconvex structure transfer film of UV gel-type resin)
Utilize above-mentioned mould A, B, D, E and F, make the transfer film that the surface has sag and swell.Base material for by the triacetyl cellulose of thickness 80 μ m be the TAC film that constitutes of resin (TD80UL-H: film Co., Ltd. of Fuji system), the TAC film be 3.5nm with respect to phase difference value in the face of wavelength 550nm.On the TAC film, apply about 3 μ m acrylic acid series UV gel-type resins (refractive index 1.52), and the mould that on the TAC film, superposes.Operation center's wavelength is the UV lamp of 365nm, carries out 1000mJ/cm from TAC film side
2UV irradiation, thereby the concaveconvex structure of mould is transferred on the UV gel-type resin.The TAC film is peeled off from mould, thus the transfer film of concaveconvex structure that has been formed in the substrate surface transfer printing that constitutes by the UV gel-type resin.Each mould A, B, D, E and F are carried out above operation, process transfer film A, B, D, E and the F shown in the below table 1.Expression is observed the surface of each transfer film and the result of the concaveconvex structure in the cross section view with SEM in the below table 1.The shape of the concaveconvex structure in " concaveconvex structure " expression cross section view of below table 1." spacing P1 " is the interval (spacing) of concaveconvex structure, and " protuberance height H " is the highest the difference in height to the lowest part of recess from the protuberance of concaveconvex structure, " protuberance width ratio " value for calculating through following relational expression (1).
The width W l of the protuberance of width W h/ second height and position of the protuberance of first height and position ... Formula (1)
Table 1
| Transfer film | Concaveconvex structure | Spacing P1 | The protuberance height H | Protuberance width ratio |
| A | Rectangular shape | 145nm | 145nm | 0.70 |
| B | Sine wave shape | 145nm | 130nm | 0.35 |
| D | Sine wave shape | 130nm | 148nm | 0.35 |
| E | Rectangular shape | 100nm | 140nm | 0.62 |
| F | Sine wave shape | 100nm | 130nm | 0.33 |
(using the formation of the dielectric layer of metallikon)
Then on the substrate surface of each transfer film A, B, D, E and F with concaveconvex structure, through metallikon with the silicon dioxide film forming as dielectric layer.The coating apparatus condition is Ar gaseous tension 0.2Pa, spraying plating power 770W/cm
2, coverage speed 0.1nm/s, film forming makes that the dielectric body thickness conversion form flat film on the transfer film is 3nm.
(utilizing the formation of the electric conductor of oblique evaporation method)
Then, on the substrate surface of each transfer film A, B, D, E and F with concaveconvex structure, through vacuum evaporation with aluminium (Al) film forming.The vapor deposition condition of Al is under the normal temperature, vacuum tightness 2.0 * 10
-3Pa, evaporation rate 40nm/s.In cross section view, will be set at 20 degree with respect to the vapor deposition angle of the vertical direction of base material, make that to transfer film A and B evaporating Al the Al average thickness is 120nm.For transfer film D, the vapor deposition angle is set at 18 degree, the Al average thickness is 110nm.For transfer film E and F, the vapor deposition angle is set at 15 degree, the Al average thickness is 100nm.In addition; At this said average thickness is that glass substrate with surface smoothing inserts in the evaporation coating device with each transfer film A, B, D, E and F; Measurement is by the resulting value of Al thickness on the smooth glass substrate of vapor deposition; Be meant the thickness of hypothesis, use as the reference value of vapor deposition amount at the vapor deposition thing during from the vertical direction evaporation material on the smooth glass substrate.
(removal of unnecessary Al)
Then in order to remove unnecessary Al, with vapor deposition each transfer film of Al at room temperature impregnated in 70 seconds in the sodium hydrate aqueous solution of 0.1 weight %, washing immediately is dry with film then.So, make wire grid polarizer A, B, D, E and F by each transfer film A, B, D, E and F.
Through the concaveconvex structure in the cross section view of each wire grid polarizer A of SEM observation, B, D, E and F and the shape of electric conductor; Electric conductor is located at a side the side of the protuberance of the concaveconvex structure on the base material partially, and the part of electric conductor is positioned at the top at top of the protuberance of concaveconvex structure.In addition, the width W m (with reference to Fig. 1) of the electric conductor of the 3rd height and position in the cross section view is thinner with respect to the width of the treble electric conductor of concaveconvex structure protuberance.Below table 2 shows the shape with concaveconvex structure in the cross section view of observed each wire grid polarizer of SEM and electric conductor." the spacing P1 " of below table 2 is the interval (spacing) of concaveconvex structure; " protuberance height H " is height poor from the highest of the protuberance of concaveconvex structure to the lowest part of recess; " protuberance width ratio " value for calculating by above-mentioned relation formula (1); " slope mean value " value for being calculated by following relational expression (2) is the mean value of the slope of the slope of imaginary line L1 and imaginary line L2.
(absolute value of the slope of the absolute value of the slope of imaginary line L1+imaginary line L2)/2 ... Formula (2)
Table 2
| Wire grid polarizer | Spacing P1 | The protuberance height H | Protuberance width ratio | Slope mean value |
| A | 145nm | 145nm | 0.70 | 9.0 |
| B | 145nm | 130nm | 0.35 | 4.0 |
| D | 130nm | 148nm | 0.35 | 3.8 |
[0120]?
| E | 100nm | 140nm | 0.62 | 10 |
| F | 100nm | 130nm | 0.33 | 5.9 |
(embodiment 1 to embodiment 3 and comparative example 1, comparative example 2)
Having measured spacing P1 with spectrophotometer (U-4100 of Hitachi's high-tech company system) is wire grid polarizer A, the B of 145nm, and spacing P1 is the wire grid polarizer D of 130nm, and spacing P1 is the wire grid polarizer F of 100nm, the parallel transmitance of G.Parallel transmitance is measured at the action turning axle of measuring samples platform and polarizing elements and as the seeing through under the perpendicular condition of direction of principal axis of each wire grid polarizer of measuring object.As 0 degree, is 30 degree, 45 degree and 60 degree to the angle initialization of the measuring light of each wire grid polarizer A, B, D, E and F incident with the vertical direction of wire grid polarizer, has measured the corresponding parallel transmitance of incident angle.In addition; With the state of measuring light each wire grid polarizer A, B, D, E and F are arranged on the measuring samples platform from the incident of conductor construction face; Make the opposition side incident that the electric conductor of protuberance of the concaveconvex structure of measuring light from cross section view is established face partially, measuring wavelength is the wavelength 555nm that human eye can sense strongly.Below table 3 has been represented the parallel transmitance of each measured incident angle.In addition, according to the measurement result of resulting parallel transmitance, with the parallel transmitance Tp of incident angle 30 degree, 45 degree or 60 degree
(λ=555nm, θ)Maximal value be made as MaxTp
(λ), minimum value is made as MinTp
(λ), rate of change (angle rate of change) the Δ Tp that calculates the parallel transmitance of incident angle through following relational expression (3)
(λ=555nm)(%).The angle rate of change Δ Tp that below table 3 has been represented to be calculated (λ=555nm).
Δ Tp
(λ=555nm)=100-(MinTp
(λ)/ MaxTp
(λ)) * 100 ... Formula (3)
Angle rate of change Δ Tp
(λ, θ)The variation that sees through characteristic of the parallel transmitance that expression changes along with incident angle means that what approach 0 wire grid polarizer more is that the rate of change of parallel transmitance of light of extensive angle incident of 45 degree ± 15 degree is more little with incident angle.
Table 3
| Wire grid polarizer | 30 degree | 45 degree | 60 degree | The angle rate of change |
| A (comparative example 1) | 86.2% | 82.8% | 76.7% | 11.0% |
| B (embodiment 1) | 87.1% | 87.8% | 85.3% | 2.8% |
| D (embodiment 2) | 87.8% | 88.8% | 87.6% | 1.4% |
| E (comparative example 2) | 80.5% | 74.4% | 68.9% | 14.4% |
| F (embodiment 3) | 85.5% | 85.1% | 81.5% | 4.7% |
Can be known that by table 3 comparative example 1, comparative example 2 are compared with embodiment 1 to embodiment 3, incident angle is that the parallel transmitance of 45 degree is lower less than 85%, and in addition, its angle rate of change is very big more than 10%.Embodiment 1 to embodiment 3, because electric conductor roughly tilts, with respect to comparative example 1, comparative example 2, the optical characteristics during oblique incidence is good.As stated, can think that embodiment 1 to embodiment 3 is for with the angle direction of the 45 degree little wire grid polarizer of rate of change as the parallel transmitance of the light of the extensive angle incident at center.Fig. 3 has represented wire grid polarizer E (embodiment 2), and Fig. 4 has represented wire grid polarizer A (comparative example 1).Wire grid polarizer E as shown in Figure 3, that embodiment 2 is related, imaginary line L1 and imaginary line L2 be respectively to x axial one distolateral inclination, and the mean value of the slope of the slope of imaginary line L1 and imaginary line L2 satisfies more than 1 below 6.On the other hand, as shown in Figure 4, can learn the wire grid polarizer A that comparative example 1 is related, Provisional thinks that the inclination of line L1 and imaginary line L2 is less.
(embodiment 4, embodiment 5, comparative example 3)
With spectrophotometer (U-4100 of Hitachi's high-tech company system), measuring light is incident to the vertical reflection rate under the situation of conductor construction face of the wire grid polarizer E that wire grid polarizer B that spacing P1 is 145nm, wire grid polarizer D that spacing P1 is 130nm and spacing P1 be 100nm and measures as the vertical reflection rate of the real estate of the face of its opposition side.The direction of principal axis that sees through of each wire grid polarizer of action turning axle and the measuring object of measuring samples platform is paralleled, and near the polarizing elements the light source of the action turning axle of measuring samples platform and measurement mechanism through direction of principal axis quadrature mutually.Vertical direction with wire grid polarizer B, D, E is spent as 0; To be 56.5 degree of roughly Brewster angle of substrate and the base material of each wire grid polarizer B, D, E to the angle initialization of the measuring light of each wire grid polarizer B, D, E incident, measure the vertical reflection rate of the wavelength 555nm of incident angle.After the measurement, the vertical reflection rate of conductor construction face is made as R
Al (λ=555nm), real estate the vertical reflection rate be made as R
TAC (λ=555nm), calculate the vertical reflection rate through following relational expression (4) and compare R
Ratio (λ=555nm)The vertical reflection rate compares R
Ratio (λ=555nm)Approaching 1 vertical reflection rate that means the two sides does not more have difference, and the vertical reflection rate compares R
Ratio (λ=555nm)It is the reduction that situation below 1 means the vertical reflection rate of real estate.
R
Ratio (λ=555nm)=R
TAC (λ=555nm)/ R
Al (λ=555nm)Formula (4)
Below table 4 has been represented each wire grid polarizer B, D, the spacing P1 of E, conductor width Wm (with reference to Fig. 1), R
Ratio (λ=555nm)
Table 4
Can know that by table 4 the vertical reflection rate on the two sides of the wire grid polarizer B of comparative example 3 there are differences hardly.Relative therewith; Can learn, be embodiment 4, the wire grid polarizer D of embodiment 5, wire grid polarizer E below the 130nm for spacing P1, and the vertical reflection rate on two sides there are differences; Compare with the vertical reflection rate of conductor construction face, the vertical reflection rate of real estate is lower.This is because because the spacing P1 of protuberance in the cross section view is below the 130nm, can make that the conductor width Wm of the 3rd height and position in the cross section view is below the 40nm.
Utilize possibility on the industry
The utlity model has with will with respect to the substrate surface in the cross section view be the angle direction of 45 degree as the rate of change of the parallel transmitance of the light of the extensive angle incident at center the little and high such effect of parallel transmitance; For example, can be suitable as polarizing beam splitter uses.
Claims (7)
1. wire grid polarizer, it comprises, has the base material of the concaveconvex structure that specific direction from the teeth outwards extends, and with the electric conductor of the state setting of a side's of the protuberance of being located at said concaveconvex structure partially side, it is characterized in that,
In the cross section view of the direction vertical with respect to the bearing of trend of said concaveconvex structure; To be set at the protuberance height H from the highest difference of said protuberance to the height of the lowest part of recess; Will from the height and position of said lowest part on short transverse roughly the set positions of 9/10H be first height and position; Will be when roughly the set positions of 1/10H be second height and position on short transverse from the height and position of said lowest part; Under the situation of the specified point C4 of the said electric conductor of the specified point C2 of the said concaveconvex structure of the specified point C3 of the said electric conductor of the specified point C1 of the said concaveconvex structure of having set said first height and position, said first height and position, said second height and position and said second height and position; The average absolute of the slope of the slope of first imaginary line by said specified point C1 and said specified point C2 and second imaginary line by said specified point C3 and said specified point C4 is more than 1 below 6
The width of the said protuberance of said first height and position is below 0.45 times of width of the said protuberance of said second height and position, more than 1/2 of spacing P1 that said protuberance height H is said protuberance.
2. wire grid polarizer as claimed in claim 1 is characterized in that, at least a portion of said electric conductor is arranged at the treble top of the protuberance of said concaveconvex structure.
3. according to claim 1 or claim 2 wire grid polarizer is characterized in that the spacing of the protuberance of said concaveconvex structure is below the 130nm.
4. according to claim 1 or claim 2 wire grid polarizer is characterized in that, is below the 40nm from the lowest part of the protuberance of said concaveconvex structure at the width of the electric conductor of the 3rd height and position of rising 1/3H on the short transverse.
5. wire grid polarizer as claimed in claim 3 is characterized in that, is below the 40nm from the lowest part of the protuberance of said concaveconvex structure at the width of the electric conductor of the 3rd height and position of rising 1/3H on the short transverse.
6. projection type image display device; It comprises like any described wire grid polarizer, light source and a reflection type liquid crystal display element in the claim 1 to 5; It is characterized in that perhaps reflecting in said wire grid polarizer transmission from the light that said light source penetrates; Incide said reflection type liquid crystal display element afterwards, the light of modulating through said reflection type liquid crystal display element reflects perhaps transmission and projection image at said wire grid polarizer.
7. projection type image display device as claimed in claim 6 is characterized in that, the conductor construction face of said wire grid polarizer is adapted to towards reflection type liquid crystal display element.
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| JP2010-238974 | 2010-10-25 | ||
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| CN103842862B (en) | 2011-10-14 | 2017-04-05 | 旭化成株式会社 | Wire grid polarizer and projection type image display device |
| JP2019061125A (en) * | 2017-09-27 | 2019-04-18 | デクセリアルズ株式会社 | Polarizer, manufacturing method for the same and optical equipment |
| TWI702424B (en) | 2017-10-24 | 2020-08-21 | 日商旭化成股份有限公司 | Image display device, wire grid polarizer and its manufacturing method, observation method of wire grid polarizer, and method of estimating the direction of polarization axis of wire grid polarizer |
| JP6423124B1 (en) * | 2018-08-03 | 2018-11-14 | デクセリアルズ株式会社 | Polarizing plate, method for producing the same, and optical instrument |
| JP7046759B2 (en) * | 2018-08-03 | 2022-04-04 | デクセリアルズ株式会社 | Optical equipment and its manufacturing method |
| JPWO2020071257A1 (en) * | 2018-10-01 | 2021-09-24 | Ａｇｃ株式会社 | Wire grid type polarizer, polarizing plate, image display device |
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-
2011
- 2011-06-01 JP JP2011123354A patent/JP2012108468A/en active Pending
- 2011-10-24 CN CN2011204086925U patent/CN202472025U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108351452A (en) * | 2015-06-05 | 2018-07-31 | 可隆工业株式会社 | Wire grid polarizer and liquid crystal display device including it |
| CN114080553A (en) * | 2019-06-28 | 2022-02-22 | 3M创新有限公司 | Structured surface and optical ferrule including the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012108468A (en) | 2012-06-07 |
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Effective date of registration: 20160520 Address after: Japan's Tokyo Chiyoda jimbocho Kanda a chome 105 times Patentee after: Asahi Kasei Kogyo K. K. Address before: Japan's Tokyo Chiyoda jimbocho Kanda a chome 105 times Patentee before: Asahi Chemical Corp. |
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| CX01 | Expiry of patent term |
Granted publication date: 20121003 |