KR20140026814A - Method of manufacturing a nano pattern structure and apparatus for manufacturing a nano pattern structure - Google Patents

Abstract

According to a method for manufacturing a nanopattern structure, a resin layer is formed on a base substrate, a stamp with a first pattern comes in contact with the resin layer, and a cured resin layer pattern having a second pattern corresponds to the first pattern is formed by irradiating microwaves to the resin layer.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a method of manufacturing a nanopattern structure and a manufacturing method of the nanopattern structure,

The present invention relates to a method of manufacturing a nanopattern structure and an apparatus for manufacturing the nanopattern structure, and more particularly, to a method of manufacturing a nanopattern structure by forming a nanopattern structure on a substrate through a nanoimprinting process, And a device for manufacturing a nanopattern structure.

Recently, Nano Imprint Lithography (NIL) has been studied to realize a nano-sized fine pattern. In the nanoimprint lithography method, a surface of a substrate coated with a thermoplastic polymer such as PMMA (Polymethylmethacrylate) or the like is pressed with a stamp having a nano-sized structure (100 nm or less), and the pattern of the stamp is transferred onto the surface of the resin. At this time, the nanostructure imprinted on the resin is formed in the same shape as the stamp, and the stamp is mainly made of silicon or silicon oxide having a nano-sized pattern.

In the NIL method described above, a substrate formed of a silicon wafer is coated with a thermoplastic polymer such as PMMA or the like, and a stamp having a previously prepared nano pattern is pressed toward the PMMA. During the imprinting process, the PMMA is heated to a temperature higher than the glass transition temperature so as to be in a mucilage state so that the pattern of the stamp is accurately imprinted. Then, the PMMA is maintained in a compressed state until the temperature falls below the glass transition temperature, .

However, in such a hot embossing imprint lithography process, imprinting requires a high temperature above 180 ° C and a high pressure of up to 1000 psi. In order to perform such a high-temperature and high-pressure condition, a complex structure imprinting system is required and the application of the system is limited. Further, at high pressure, there is a problem that the embossed portion of the stamp formed of silicon oxide is deformed or broken when the PMMA is contacted. Furthermore, as the stamp, the substrate and the PMMA are both heated, a mis-alignment problem arises due to the difference between the stamp for the PMMA and the thermal expansion coefficient of the substrate.

In order to solve this problem, ultraviolet nanoimprint lithography (NIL) has been developed which uses a resin which is polymerized by ultraviolet (UV) instead of PMMA, and which is made of a transparent material such as a substrate or a stamp to enable transmission of ultraviolet rays .

According to the ultraviolet nanoimprint lithography process, since the substrate or the stamp is formed of a transparent material, the resin can be exposed to ultraviolet light, so that a separate heat curing step is unnecessary or the substrate is heated to a low temperature. Therefore, the problem of misalignment due to heating can be prevented, and the time required for heating and cooling the PMMA can be minimized.

As described above, in the nanoimprint lithography process, if the imprint film is an ultraviolet (UV) curable polymer, the stamp must be manufactured using a transparent material such as quartz depending on the material of the imprinting film. In the case of the thermoplastic polymer, Stamps should be manufactured using available materials. Therefore, there is a problem that the stamp must be made of a light transmitting material in the case of ultraviolet nanoimprint lithography process. In the hot embossing nanoimprint lithography process using a thermoplastic polymer, the thermal deformation and structure according to the high temperature / Destruction and multi-layer alignment, and furthermore, a relatively long process time due to heating and cooling may be required.

The present invention has been made in view of the above problems, and it is an object of the present invention to provide a method of manufacturing a nanopattern structure that can replace a curing process using heat or ultraviolet rays.

It is another object of the present invention to provide an apparatus for fabricating a pattern structure capable of implementing the method of manufacturing the nanopattern structure.

According to another aspect of the present invention, there is provided a method of manufacturing a nanopattern structure, comprising: forming a resin layer on a base substrate; contacting a stamp having a first pattern with the resin layer; . Then, the resin layer is irradiated with microwaves to form a cured resin layer pattern having a second pattern corresponding to the first pattern.

In one embodiment of the present invention, the resin layer may be formed by applying a sol-gel solution containing a metal oxide and a solvent on the substrate.

In one embodiment of the present invention, the resin layer may be formed by applying a resin solution in which nano metal molecules are dispersed on the substrate.

In one embodiment of the present invention, the stamp may be made of a PDMS polymer.

An apparatus for manufacturing a nanopattern structure according to an embodiment of the present invention includes a chamber for providing a process space, a base disposed within the process space, the base having a stamp having a first pattern and a resin layer imprinted using the stamp, And a microwave supply unit configured to irradiate microwave to the resin layer to form a cured resin layer pattern on the base substrate.

In one embodiment of the present invention, the microwave supply unit may include a microwave generator disposed at an inner upper portion of the chamber and irradiating the microwave toward the resin layer.

In one embodiment of the present invention, the chamber includes a window at its upper end, and the microwave supply unit includes a microwave generating unit disposed outside the chamber, and a microwave generating unit disposed on the window outside the chamber, And an antenna unit for guiding the microwave generated from the generating unit to the window.

The apparatus for manufacturing a nanopattern structure according to an embodiment of the present invention may further include a fluid pressure unit for supplying a fluid into the process chamber to press the stamp and the base substrate.

The apparatus for manufacturing a nanopattern structure according to an embodiment of the present invention may further include a vacuum forming unit for evacuating a space formed in the substrate supporting unit.

According to an embodiment of the present invention, the substrate supporting unit may include plates arranged to face each other and to be in contact with the stamp and the base substrate accommodated in the hollow; And clampers for clamping both ends of the plates, respectively.

In one embodiment of the present invention, the stamp may be made of a PDMS polymer.

According to the method for manufacturing a nanopattern structure and the apparatus for manufacturing a nanopattern structure according to an embodiment of the present invention, a thermosetting process for heating and curing the imprinted resin by irradiating microwave to the imprinted resin to cure the imprinted resin, It is possible to replace the ultraviolet curing process for curing. In addition, the efficiency of the imprint process can be improved by hardening the imprint resin using microwave having a high energy in a relatively short time. Furthermore, nanopattern structures can be produced using various materials as well as thermoplastic resins and ultraviolet curable resins.

1 to 5 are cross-sectional views illustrating a method of fabricating a nanopattern structure according to an embodiment of the present invention.
6 is a cross-sectional view illustrating an apparatus for fabricating a nanopattern structure according to an embodiment of the present invention.
7 is a cross-sectional view illustrating an apparatus for fabricating a nanopattern structure according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. The present invention is capable of various modifications and various forms, and specific embodiments are illustrated in the drawings and described in detail in the text. It should be understood, however, that the invention is not intended to be limited to the particular forms disclosed, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention. In the accompanying drawings, the sizes and the quantities of objects are shown enlarged or reduced from the actual size for the sake of clarity of the present invention.

The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as a second component, and similarly, the second component may also be referred to as a first component.

The terminology used in this application is used only to describe a specific embodiment and is not intended to limit the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In the present application, the terms "comprise", "comprising", and the like are intended to specify that there is a feature, step, function, element, or combination of features disclosed in the specification, Quot; or " an " or < / RTI > combinations thereof.

On the other hand, unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in commonly used dictionaries are to be interpreted as having a meaning consistent with the contextual meaning of the related art and are to be interpreted as either ideal or overly formal in the sense of the present application Do not.

1 to 5 are cross-sectional views illustrating a method of fabricating a nanopattern structure according to an embodiment of the present invention.

Referring to FIG. 1, a resin layer 120 'is first formed on one surface of a transparent base substrate 110.

The base substrate 110 may be formed of a material such as polyvinyl chloride (PVC), polyethylene terephthalate (PET), polyacrylate, polymethylmethacrylate, polyurethane, polycarbonate, polyethylene, polypropylene, cellulose acetate butyrate (CAB) Or a copolymer of two or more thereof.

The resin layer 120 'may be formed using an imprint resin. The imprint resin may include a pre-polymer that can be cured using microwaves. For example, the resin layer 120 'may be formed by a dispensing process. Alternatively, the resin layer 120 'may be formed through a spin coating process.

1 illustrates a resin layer 120 'formed on a whole surface of a base substrate 110 to have a predetermined thickness. However, when the resin layer 120' is formed by the dispensing process, the resin layer 120 ' And may be formed on the substrate 110 with a non-uniform thickness.

In one embodiment of the present invention, the resin layer may be formed using a sol solution including a metal oxide and an organic solvent. In this case, the resin layer may be formed on the base substrate through a spin coating process using the sol solution.

In one embodiment of the present invention, the resin layer may use a resin solution in which nano metal particles are dispersed in a solution instead of a polymer-based imprint resin.

Referring to FIG. 2, after the resin layer 120 'is formed, the stamp 10 is placed on the resin layer 120'. On one side of the stamp 10 facing the resin layer 120 ', a first pattern 10a having a width and depth of nanoscale or several to several tens of microns scale is formed. The first patterns 10a formed on the stamp 10 have the same shape and are spaced apart from each other in parallel with each other at a predetermined interval.

When the resin layer 120 'is formed using the imprinted resin solution in which the sol solution or nano metal particles are dispersed in the solution, a stamp capable of selectively removing the solvent may be used. An example of the stamp may be a polydimethylsiloxane (PDMS) resin.

Referring to FIG. 3, the stamp 10 is placed on the resin layer 120 ', and the stamp 10 is contacted to the base substrate 110.

When the resin layer 120 'is formed of a microwave-curable prepolymer, the resin layer 120' has an uncured state, that is, a relatively low viscosity. Therefore, the resin layer 120 ' It is possible to pressurize. However, in this case, the stamp 10 can be pressed in a vacuum state so that the prepolymer can evenly penetrate the first pattern of the stamp 10. It is possible to irradiate microwave to the microwave-curable prepolymer in a state in which the stamp 10 is completely pressed, thereby curing.

Referring to Fig. 4, the stamp 10 is separated from the patterned resin pattern 120 ". When the stamp 10 is removed, a resin layer pattern 120 '' having a second pattern corresponding to the first pattern 10a formed on the stamp 10 is formed on one side of the base substrate 110. [

Referring to FIG. 5, when the residual polymer material exists in the region between the resin layer patterns 120 '', the remaining polymer material can be removed by reactive ion etching or plasma etching. Of course, it is also possible to prevent the polymer material from remaining in the region between the resin layer patterns 120 '' by adjusting the amount and viscosity of the resin material forming the resin layer 120 '. In this case, the step of removing the residual polymer material using a reactive ion etching or plasma etching method may be omitted.

6 is a cross-sectional view illustrating an apparatus for fabricating a nanopattern structure according to an embodiment of the present invention.

Referring to FIG. 6, an apparatus 200 for manufacturing a nanopattern structure according to an embodiment of the present invention includes a chamber 205, a substrate support unit 230, and a microwave supply unit 250.

The chamber 205 provides a process space. The chamber 205 may be made of a refractory ceramic material.

The substrate support unit 230 is disposed within the process space. The substrate supporting unit 230 supports the stamp 10 and the base substrate 210 on which the resin layer is formed.

Here, a first pattern having a width and a depth of several nanometers or several tens of micrometers is formed on one surface of the stamp 10. For example, the first patterns may have a plurality of engraved portions having the same shape and spaced apart from each other in parallel and at regular intervals. Further, when the resin layer includes an imprinted resin in which a sol solution or nano-metal particles are dispersed in a solution, a stamp 10 capable of selectively removing the solvent may be used. An example of the stamp 10 may be a polydimethylsiloxane (PDMS) resin.

In one embodiment of the present invention, the substrate support unit 230 may include plates 231, 233 and clamper 235, 237.

The plates 231 and 233 are spaced apart from each other. For example, the plates 231 and 233 are vertically spaced from each other at regular intervals. Meanwhile, the plates 231 and 233 are provided to contact the base substrate 210 and the stamper 10 in a state where the plates 231 and 233 face each other. Each of the plates 231 and 233 may have a disk shape.

Each of the plates 231 and 233 may be made of an elastic material. Therefore, when the fluid is pressed against the plates 231 and 233, the plates 231 and 233 can press the base substrate 210 and the stamp 10.

The clamper 235 and 237 can clamp both ends of the plates 231 and 233, respectively. Therefore, the clamper 235, 237 and the plates 231, 233 can form a closed space. In this case, the base substrate 210 and the stamp 10 may be disposed inside the closed space. When the closed space is evacuated, a resin layer formed on the base substrate 210 may be introduced into the engraved portion of the stamp 10.

The clamper 235 and 237 may include a lower clamper 235 and an upper clamper 237 and a sealing member 239 for sealing the upper and lower clamper 235 and 237. In this case, do. The lower clamper 235 may be formed with a fluid passage for evacuating the closed space. When the fluid is discharged from the closed space through the fluid passage, the closed space can be evacuated.

The microwave supply unit 250 irradiates the resin layer with microwaves to cure the resin layer. For example, the microwave supplying unit 250 may include a microwave generating unit 251 for generating the microwave. The microwave generating unit 251 is disposed at an inner upper end of the chamber 205.

More specifically, when the stamp 10 contacts the resin layer, a resin layer pattern corresponding to the first pattern formed on the stamp 10 is formed, and the microwave generating part 251 forms the resin layer pattern The solvent contained in the resin layer is activated by the microwave and the activated solvent can be selectively removed by contacting the stamp 10. [

For example, when the resin layer pattern is formed using a sol solution, the microwave generating part 251 irradiates the resin layer pattern with microwaves to cure the resin layer pattern into a gel state, A ground pattern can be formed. Meanwhile, when the resin layer pattern is formed from a solution in which nanoparticles are dispersed, the microwave generating part 251 irradiates the resin layer pattern with microwaves, thereby clustering the nanoparticles included in the resin layer pattern ) Phenomenon and a necking phenomenon may occur to form a cured resin layer pattern.

The apparatus 200 for manufacturing a nanopattern structure according to an exemplary embodiment of the present invention may further include a vacuum forming unit 260 for evacuating the closed space. The vacuum forming part 260 is connected to a fluid passage formed in the lower clamper 235. Accordingly, the vacuum forming part 260 can vacuum the closed space by sucking fluid from the closed space through the fluid passage. Therefore, the resin layer can be supplied to the concave portion formed in the stamp 10.

The apparatus for fabricating a nanopattern structure according to an embodiment of the present invention can shorten the processing time by hardening the resin layer pattern using a microwave. Further, in the case where no additional pressing process is required for the resin layer pattern, a manufacturing apparatus for a nanopattern structure can be applied.

7 is a cross-sectional view illustrating an apparatus for fabricating a nanopattern structure according to an embodiment of the present invention.

Referring to FIG. 7, an apparatus 200 for manufacturing a nanopattern structure according to an exemplary embodiment of the present invention includes a chamber 205, a substrate support unit 230, and a microwave supply unit 250.

The chamber 205 provides a process space. The upper end of the chamber 205 is provided with a window 207. And microwaves can be radiated from the outside through the window 207 into the chamber 205. The window may be quartz.

Since the substrate supporting unit 230 has been described with reference to FIG. 6, a detailed description thereof will be omitted.

The micro-unit 250 includes a microwave generation unit 251 and an antenna unit 253 for guiding a microwave.

The microwave generating unit 251 is disposed outside the chamber 205. For example, the microwave generating unit 251 may be disposed adjacent to the window 207 at an upper portion of the chamber 205. The microwave generating unit 251 generates a microwave toward the window.

The antenna unit 253 is disposed on the window 207 outside the chamber 205. The antenna unit 253 guides the microwave to the window 207. The antenna unit 253 may include a plurality of vertically extending antennas.

The apparatus 200 for manufacturing a nanopattern structure according to an embodiment of the present invention may further include a fluid pressure unit 270.

The fluid pressure unit 270 supplies fluid into the process chamber 205. Accordingly, the fluid presser 270 can press the stamp 10 and the base substrate 210 by pressing the plates 231 and 233 included in the substrate support unit 230. The fluid pressure unit 270 may include a fluid tank for storing fluid and a fluid supply line for communicating the fluid tank and the process chamber 205.

According to the method for manufacturing a nanopattern structure and the apparatus for manufacturing a nanopattern structure, a thermosetting process for heating and curing the imprinted resin by irradiating microwave to the imprinted resin and curing the imprinted resin, and an ultraviolet curing process for irradiating the imprinted resin with ultraviolet rays Can be replaced. In addition, the efficiency of the imprint process can be improved by hardening the imprint resin using microwave having a high energy in a relatively short time. Furthermore, a nanopattern structure can be produced using various materials as well as thermoplastic resins and ultraviolet curable resins, under the condition of using a resin that can be cured into microwaves.

The method for fabricating a pattern structure and the apparatus for fabricating a nanopattern structure according to embodiments of the present invention can be applied to form a nanopattern structure included in a light emitting device, a solar cell, a functional optical film, a display, a flexible device,

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the present invention as defined by the following claims. It can be understood that it is possible.

Claims (11)

Forming a resin layer on the base substrate;
Contacting the resin layer with a stamp having a first pattern; And
And irradiating microwave to the resin layer to form a cured resin layer pattern having a second pattern corresponding to the first pattern. The method of claim 1, wherein forming the resin layer comprises applying a sol solution containing a metal oxide and a solvent on the substrate. The method of claim 1, wherein the forming of the resin layer comprises applying a solution containing nanomaterial molecules on the substrate. The method of any one of claims 2 and 3, wherein the step of contacting the stamp to the resin layer is performed using a stamp made of a PDMS polymer. A chamber providing a process space;
A substrate supporting unit disposed inside the process space for supporting a stamp having a first pattern and a base substrate on which a resin layer is formed using the stamp; And
And a microwave supply unit that irradiates microwave to the resin layer to form a cured resin layer pattern on the base substrate. 6. The apparatus of claim 5, wherein the microwave supply unit comprises a microwave generator disposed at an inner upper portion of the chamber and irradiating the microwave toward the resin layer. 6. The apparatus of claim 5, wherein the chamber includes a window at an upper end thereof,
A microwave generator disposed outside the chamber; And
And an antenna unit disposed on the window outside the chamber to guide microwaves generated from the microwave generating unit to the window. 6. The apparatus of claim 5, further comprising a fluid pressurizing unit for supplying a fluid into the process chamber to press the stamp and the base substrate. 6. The apparatus of claim 5, further comprising a vacuum forming unit for evacuating a space formed in the substrate supporting unit. The substrate processing apparatus according to claim 5,
Plates disposed to be spaced apart from each other to be in contact with the stamp and the base board accommodated in the hollow; And
And clampers for clamping both ends of the plates, respectively. 6. The apparatus of claim 5, wherein the stamp comprises a PDMS polymer.

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