KR20140015200A - Touch panel manufacturing method - Google Patents

Abstract

A touch panel manufacturing method capable of improving durability by improving a masking method is provided. According to an embodiment of the present invention, the touch panel manufacturing method comprises a step of preparing reinforced glass including the predetermined cell area; a step of forming a touch sensor on the reinforced glass; a step of forming a first protection layer which covers the touch sensor using a first protection component; a step of forming a second protection layer for covering the first protection layer using a second protection component; a step of forming cell-reinforced glass by cutting the reinforced glass with the size of the predetermined cell; a step of removing a second protection layer of the cell-reinforced glass; and a step of removing the first protection layer of the cell-reinforced glass. [Reference numerals] (AA) Reinforced glass; (BB) Form a touch sensor; (CC) Form a first protection layer; (DD) Form a second protection layer; (EE) Form cell-reinforce glass; (FF) Remove a second protection layer; (GG) First processing; (HH) Second processing; (II) Remove a first protection layer

Description

Manufacturing method of touch panel {TOUCH PANEL MANUFACTURING METHOD}

The present invention relates to a method for manufacturing a touch panel.

The touch panel presses a screen displayed on the panel and inputs information corresponding to the screen. Recently, touch panels have been actively applied to all display devices due to ease of use.

In general, the touch panel extracts the coordinates of the pressed portion and inputs information using a capacitive method, a resistive film method, a surface ultrasonic method, an infrared method, and the like. Here, in the capacitive method, when the user touches the screen, the capacitive method detects a position by recognizing a change amount of current using the capacitance of the human body.

The present invention provides a method of manufacturing a touch panel that can improve durability by improving a masking method.

Method of manufacturing a touch panel according to an embodiment of the present invention comprises the steps of preparing a tempered glass having a set cell area, forming a touch sensor on one surface of the tempered glass, the first cover material to cover at least the touch sensor Forming a protective layer, forming a second protective layer covering at least the first protective layer using a second protective material, cutting the tempered glass to a size of a predetermined cell region, to form cell-reinforced glass; Removing the second protective layer of the cell tempered glass, and removing the first protective layer of the cell tempered glass.

The first protective material and the second protective material may be acid resistant materials, and the first protective material may be a photoresist. The thickness of a 1st protective layer can be 10-20 micrometers. The second protective material can be a film. Forming the cell-reinforced glass by cutting the tempered glass may be carried out by a cross-sectional etching method. Tempered glass may be formed of aluminosilicate series glass.

After removing the second protective layer of the cell-reinforced glass may further comprise the step of primary processing the cell-reinforced glass, and the step of the secondary processing of the primary processed cell-reinforced glass. Primary processing is a grinding process that processes the outer shape of the tempered glass surface with a dimension of about 0.1 ~ 0.2mm larger than the set product specification. Secondary processing is the etching process of the microchip generated during the primary processing. It can be set as the healing process to remove.

The thickness of the photoresist coating film can be formed about three to five times thinner than existing materials, which can reduce material costs and simplify process conditions.

In addition, it is possible to obtain a desired shape and dimensions in the outer portion of the cut glass tempered glass suitable for processing such as grinding and healing.

In addition, it is possible to reduce the failure to lift in the grinding process.

1 is a schematic flowchart of a method of manufacturing a touch panel according to an exemplary embodiment of the present invention.
Figure 2 is a photograph showing the cut surface of the cell-reinforced glass in the state where the film is removed to measure under a microscope.
3 is a photograph showing a processing surface of the cell-reinforced glass processed by the grinding process.
Figure 4 is a photograph showing the cut surface of the cell-reinforced glass cut by the cross-sectional spray process.
5A and 5B are diagrams comparing pre-etching images and post-etching images in a state in which only photoresist is applied by single masking.
6A and 6B are diagrams comparing pre-etching images and post-etching images in a state in which only a film is applied by single masking.

If any part is referred to as being "on" another part, it may be directly on the other part or may be accompanied by another part therebetween. In contrast, when a part is mentioned as "directly above" another part, no other part is intervened in between.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the invention. The singular forms as used herein include plural forms as long as the phrases do not expressly express the opposite meaning thereto. Means that a particular feature, region, integer, step, operation, element and / or component is specified, and that other specific features, regions, integers, steps, operations, elements, components, and / And the like.

Terms indicating relative space such as "below" and "above" may be used to more easily explain the relationship of one part to another part shown in the drawings. These terms are intended to include other meanings or acts of the apparatus in use, as well as intended meanings in the drawings. For example, when inverting a device in the figures, certain parts that are described as being "below" other parts are described as being "above " other parts. Thus, an exemplary term "below" includes both up and down directions. The device can be rotated 90 degrees or rotated at different angles, and the term indicating the relative space is interpreted accordingly.

Unless defined otherwise, all terms including technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art. Commonly used predefined terms are further interpreted as having a meaning consistent with the relevant technical literature and the present disclosure, and are not to be construed as ideal or very formal meanings unless defined otherwise.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art can easily carry out the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.

1 is a process flowchart schematically showing a method of manufacturing a touch panel according to an exemplary embodiment of the present invention. Referring to FIG. 1, the manufacturing method of the touch panel is merely for illustrating the present invention, and the present invention is not limited thereto.

First, a first step S100 of preparing tempered glass 10 having a set cell area is performed. In the case of tempered glass 10, soda-lime, aluminosilicate glass may be applied. Soda-lime has 10 ~ 15um compression depth (DOL) and 400 ~ 500MPa compressive stress, Wheel, Sandblast, Wet etching, Water Jet, Laser Cutting can be done in various ways. In the case of aluminosilicate series glass, the depth of compressive strengthening (DOL) is 20 ~ 40um and the compressive stress is more than 600MPa. As described above, the aluminosilicate-based glass has a high compressive stress, so that cracks tend to occur. For this reason, in the exemplary embodiment of the present invention, the aluminosilicate-based glass is made of tempered glass 10 because cracks can be reduced by using a single-sided spray cutting process, which is a single-sided etching method, while applying a film and photoresist simultaneously. Can be used.

When the above-described first step S100 is completed, the second step S102 of forming the touch sensor 12 on one surface of the tempered glass 10 is performed. The second step S102 is a step of forming each layer for driving the touch sensing. The formation of the touch sensor 12 may use an insulating film when forming the X-axis and the Y-axis on the tempered glass 10. Also, the X axis and the Y axis can be formed at the same time. In addition, any one of the X-axis and the Y-axis is formed first, and the other axis may include the case of forming on the film (Film).

When the above-described second step S102 is completed, a third step S104 of forming the first protective layer 14 covering at least the touch sensor 12 using the first protective material is performed. The first protective material may be an acid resistant material, and the first protective material may be a photoresist. The third step S104 forms a photoresist for application to the grinding process, which is a primary process, and the healing process, which is a secondary process, respectively. As the photoresist is formed, foreign matter and scratches may be minimized in the grinding process. In addition, when forming the photoresist, the pattern is formed to be about 0.1 mm larger than the design value in consideration of the removal area in the healing process. Formation of photoresist includes film formation / exposure / development and heating processes. Screen printing includes printing and drying processes. In addition, the material formation can be applied to both sides of the tempered glass 10, the thickness is preferably formed to about 10 ~ 20um. As the thickness of the photoresist is formed to about 10 ~ 20um, it is possible to reduce the cost and maintain the process conditions simply due to the lower thickness than the existing material, and to reduce the defects of lifting during the grinding process. In the prior art, tempered glass was processed using an acid resistant material of about 100 μm of photoresist or screen printing paste. However, when the thickness of the photoresist is thin, there is a high risk of delamination during etching, so that the alignment problem and the optimization of the exposure amount are difficult by repeating the photoresist forming process. Embodiments of the present invention simultaneously form an acid resistant photoresist and an acid resistant film for the post-grinding and healing process. The height of the acid resistant material can be formed as low as about 10 ~ 20um. Therefore, there is no need to repeat the photoresist formation process. If the photoresist is thickly formed as in the prior art, the photoresist may be lifted during the grinding process. In the third step S104, a photoresist may be formed, and a screen printing paste may be formed as necessary.

When the above-described third step S104 is completed, a fourth step S106 of forming the second protective layer 16 covering at least the first protective layer 14 using the second protective material is performed. The second protective material may be an acid resistant material, and the second protective material may be a film. The fourth step S106 forms a film for application to the chemical cutting process. It is preferable to form a pattern about 1 mm larger than the design value for dimensional accuracy in film formation. The film may be formed on both sides or one end face of the tempered glass 10.

When the fourth step S106 is completed, the fifth step S108 of forming the cell tempered glass 10a by cutting the tempered glass 10 to the size of the set cell area is performed. In a fifth step S108, a cutting process may be performed using a chemical etching method. The etching method may be a method such as a single side spray, a double side spray, a down flow, or the like. The hydrofluoric acid concentration is preferably 30 to 45%, and dimensional control is important according to the hydrofluoric acid concentration. Since the cut surface 20 of the cell-reinforced glass 10a is a region that is not strengthened, it may be vulnerable to external impact. Therefore, it is possible to supplement the reinforcement treatment by applying a paste containing hydrofluoric acid on the side that is not reinforced.

When the fifth step S108 is completed, the sixth step of removing the second protective layer 16 of the cell glass 10a is performed. The sixth step S110 is a process of peeling the film to perform the primary processing process. Grinding is not easy due to overetching if the film is not peeled off.

When the sixth step S110 is completed, the seventh step of primary processing the cell-reinforced glass 10a is performed. The seventh step S112 is a grinding process of forming the processing surface 22 by processing the outer shape of the cut surface 20 of the cell tempered glass 10a. Grinding process is about 0.1 ~ 0.2mm larger than the product specification set during the primary processing.

When the seventh step (S112) described above is completed, the eighth step (S114) for performing the second step of the primary processed cell-reinforced glass (10a) is performed. Secondary processing may be a healing process that removes a microchip generated during grinding using an etching method. Secondary processing is the process of etching about 0.1 ~ 0.2mm to meet the desired product specification. During secondary processing, light leakage is prevented by etching to the black matrix (BM) area, and etching using a dipping method is suitable. For reference, the relationship between the hydrofluoric acid concentration and the process time is inversely proportional.

When the eighth step S114 is completed, the ninth step S116 of removing the first protective layer 14 of the secondary tempered glass 10a is performed.

As described above, when the panel is formed of the tempered glass 10 and then cut into a plurality of cell-reinforced glass 10a, several cell-reinforced glass 10a at the same time as compared with the case of forming the panel from the cell-reinforced glass 10a previously cut. The same process can be applied to). Therefore, there is an advantage that can shorten the production time and efficiently manage the process. In addition, a photoresist, which is an acid resistant material, is formed as the first protective layer 14 and a second protective layer 16 covering the first protective layer 14 is formed as an acid resistant film for post-processing of grinding and healing. Therefore, the height of the photoresist can be formed as low as about 10 ~ 20um, the risk of peeling off during the etching cutting can be solved the problem of repeating the photoresist forming process. When the panel forming process of the tempered glass 10 is completed, a mask is applied to cut the plurality of cell tempered glass 10a, and fluorine etching is performed to cut the tempered glass 10 into the cell tempered glass 10a. . Thereafter, the second protective layer 16 is removed, the cutting surface 20 of the cell tempered glass 10a is ground and healed, and then the first protective layer 14 is removed to manufacture the touch panel.

Hereinafter, the present invention will be described in more detail with reference to experimental examples. These experimental examples are only for illustrating the present invention, and the present invention is not limited thereto.

Experimental Example

1) First step (S100)

A tempered glass 10 having a size of 370 mm x 470 mm and a thickness of 0.7 mm was prepared. The tempered depth was 40um and the compressive stress was 645MPa aluminosilicate series tempered glass.

2) second step (S102)

In the touch sensor 12, a bridge having a characteristic value of 200 μs of first electrode layer and 45 μs / square of sheet resistance was formed. After forming the first electrode layer, an insulator was formed to a thickness of 1.5 um. The second electrode layer exhibited characteristic values of 200 mA and a sheet resistance of 45 mA / □ as X and Y layers. The trace part was formed of molybdenum / aluminum / molybdenum (Mo / Al / Mo), and a thickness of 2,400 kPa (Mo; 300 kPa, Al; 1,600 kPa, Mo; 500 kPa) was formed. At this time, the sheet resistance was 0.4 k? / ?. In the following process, an overcoat was formed to a thickness of 1.5 um to protect the electrode layer (ITO) and the trace layer. The size of the touch sensor 12 is 120mm x 60mm, and arranged at intervals of 3mm to form 15 sheets.

3) Third Step (S104)

Acid resistant materials were formed using photoresist. As the acid resistant material, an acrylic resin was used. For the film formation, the coating method was bar coating and the coating thickness was 20 μm. Exposure was carried out using a metal halide or the like, the irradiation amount was 100mJ / cm2. Developing and post-exposure process was carried out for Na2CO3, 0.4% concentration, 150 seconds. The post exposure process was carried out at 1,000 mJ / cm 2. After forming one side, the other side proceeded in the same way. The dimension after the post-exposure process was 120.15 X 60.13 mm.

4) Fourth Step (S106)

The film was a PVC film, and after lamination, a pattern was formed using a laser, and the etching portion was removed. The opposite side was formed in the same way. The dimensions were 122.1 x 62.1 mm.

5) fifth step (S108)

The etching process was performed by horizontally spraying 30% hydrofluoric acid solution on the masked tempered glass 10 to one surface for 10 minutes at a spray pressure of a spray nozzle of 1.0 to 1.5 kgf / cm 2 at 30 ° C. In addition, etching was performed by spraying horizontally on another surface in the same manner. The etching process was performed to secure 15 cells without damage. Figure 2 is a photograph showing the cut surface 20 of the cell-reinforced glass (10a) with the film removed in order to measure under a microscope, the average measurement was 120.33 X 60.32mm.

6) sixth step (S110)

The film was peeled off to proceed with the grinding process. The film can be peeled off manually.

7) seventh step (S112)

In grinding process, the wheel size was 800mesh and the speed of rotation was 6,000rpm, and the chip size was made below 50um. 3 is a photograph showing the processing surface 22 of the cell-reinforced glass 10a processed by the grinding process. The dimension measurement result was 120.15 X 60.15 mm.

8) Eighth Step (S114)

Healing process was used for the dipping (Dipping) method, it was evaluated as 15% hydrofluoric acid, 15 minutes as a healing liquid. The shape of the processing surface 22 was not significantly different from the grinding, it was confirmed that the fine chip (Chip) is removed. The dimensions were 120.03 X 60.02mm, which satisfies the design standard of 50um.

9) 9th step (S116)

Photoresist stripping was performed at 12% sodium hydroxide (NaOH), process temperature of 60 ° C. for 2 minutes to remove residual photoresist. Meanwhile, the bending strength evaluation was conducted to secure the bending strength characteristics according to the healing process. The equipment was evaluated with a 3-axis bending machine, the span length was 80mm at the bottom, 40mm at the top, and the speed was 10mm / min. If only the grinding results are measured, Min. 11.04, Max 12.33kgf, the stiffness after healing was Min 28.7, Max. It was confirmed that the improvement was about 2 times or more to 40.36kgf. Cell-reinforced glass (10a) products were Min 29.40, Max 34.17kgf.

Experimental Example 2

In the second experimental example, most of the processes are the same as those of the first experimental example, and the tempered glass was cut by using a cross-sectional spray process during the cutting process. Hereinafter, detailed descriptions that overlap with the manufacturing method of the touch panel according to the first experimental example will be omitted. 4 is a photograph showing the cut surface 20a of the cell tempered glass 10b cut by the cross-sectional spray process. The cutting process time according to the second embodiment took 20 minutes. When cross-sectional etching is performed by the cross-sectional spray process as described above, the touch sensor 12 is positioned in the lower region of the cell-reinforced glass 10b and the cross-sectional etching is performed on the cell-reinforced glass 10b. As described above, cross-sectional etching at the upper portion of the cell tempered glass 10b has an effect of protecting the touch sensor 12 in the lower region.

As described above, in the embodiment of the present invention, the cell-reinforced glass 10b is cut by a double masking process for simultaneously applying a film and a photoresist, but the following problems occur in a single masking process for applying only one film or photoresist. It was.

5A and 5B show a comparison of an image before etching and an image after etching in a single masking state in which only one photoresist is coated.

The photoresist is not peeled off in the pre-etched image as shown in FIG. 5A, and the photoresist is peeled off in the post-etched image as shown in FIG. 5B. As shown in FIGS. 5A and 5B, when only the photoresist, which is an acid resistant material, is applied and the film is not used, the photoresist may be peeled off during the etching process, affecting the touch sensor, and then the process may not be performed. On the other hand, in the case of coating the photoresist twice repeatedly, black matrix damage of about 100 to 150 um was induced after etching.

6A and 6B are diagrams comparing pre-etching images and post-etching images in a state in which only a film is applied by single masking.

As shown in FIG. 6A, the black matrix region is not damaged in the pre-etching image, and the black matrix region is damaged in the post-etching image as in FIG. 6B. As shown in FIGS. 6A and 6B, when only the film is applied and the photoresist, which is an acid resistant material, is not used, the black matrix region may be damaged during the etching process. In addition, when only the film is applied with a single masking, the film may be peeled off in the grinding process, thereby damaging the touch sensor in the subsequent process.

It will be understood by those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the following claims.

10; Tempered glass 10a; Cell Tempered Glass
12; Touch sensor 14; First protective layer
16; Second protective layer

Claims (10)

Preparing a tempered glass having a set cell area;
Forming a touch sensor on one surface of the tempered glass;
Forming a first protective layer covering at least the touch sensor using a first protective material;
Forming a second protective layer covering at least the first protective layer using a second protective material;
Cutting the tempered glass to a size of a predetermined cell area to form cell-reinforced glass;
Removing the second protective layer of the cell glass; and
Removing the first protective layer of the cell tempered glass
The method comprising the steps of: The method of claim 1,
And said first protective material and said second protective material are acid resistant materials. 3. The method of claim 2,
And the first protective material is a photoresist. The method of claim 1,
The thickness of the first protective layer is a manufacturing method of the touch panel 10 ~ 20um. 3. The method of claim 2,
And the second protective material is a film. The method of claim 1,
Forming the cell-reinforced glass by cutting the tempered glass is a method of manufacturing a touch panel to proceed by the cross-sectional etching method. The method according to claim 6,
The tempered glass is an alumino silicate-based glass manufacturing method of the touch panel. The method of claim 1,
Removing the second protective layer of the cell tempered glass and first processing the cell tempered glass, and
Second step of the primary processed cell-reinforced glass
Method of manufacturing a touch panel further comprising. 9. The method of claim 8,
The primary processing is a manufacturing method of a touch panel, which is a grinding process of processing the outer shape of the tempered glass surface with a dimension of about 0.1 to 0.2 mm larger than a set product specification. 9. The method of claim 8,
The secondary processing is a method of manufacturing a touch panel which is a healing process of removing the microchips generated during the primary processing by an etching method.

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