WO2014017856A1

WO2014017856A1 - Method for manufacturing touch panel

Info

Publication number: WO2014017856A1
Application number: PCT/KR2013/006691
Authority: WO
Inventors: 천병순; 조현일; 정용운; 김경호; 전헌국
Original assignee: 주식회사 동진쎄미켐
Priority date: 2012-07-27
Filing date: 2013-07-25
Publication date: 2014-01-30

Abstract

Provided is a method for manufacturing a touch panel, capable of improving durability by improving a masking method. The method for manufacturing a touch panel according to one embodiment of the present invention comprises the steps of: preparing tempered glass having a set cell region; forming a touch sensor on one side of the tempered glass; forming a first protective layer that covers at least the touch sensor using a first protective material; forming a second protective layer that covers at least the first protective layer using a second protective material; forming cellular tempered glass by cutting the tempered glass into the size of the set cell region; removing the second protective layer of the cellular tempered glass; and removing the first protective layer of the cellular tempered glass.

Description

【Specification】

[Name of invention]

Manufacturing Method of Touch Panel

Technical Field

This patent application is filed on July 27, 2012.

Priority was filed based on 0082715 and Korean Patent Application No. 2013-0087417 filed on July 24, 2013, which is incorporated by reference in the content of the present application.

The present invention relates to a method for manufacturing a touch panel.

Background Art

The touch panel presses a screen displayed on the panel and inputs information corresponding to the screen. Recently, touch panels have been actively applied to all display devices due to ease of use.

In general, the touch panel extracts the coordinates of the pressed portion by using a capacitance method, a resistive film method, a surface ultrasonic method, an infrared method, and inputs information. Here, in the capacitive method, when the user touches the screen, the capacitive method detects a position by recognizing a change amount of current using the capacitance of the human body.

[Content of invention]

[Action to be solved]

The present invention provides a method of manufacturing a touch panel that can improve durability by improving a masking method.

[Measures of problem]

According to an aspect of the present invention, there is provided a method of manufacturing a touch panel, the method comprising: preparing a tempered glass having a set cell area, forming a touch sensor on one surface of the tempered glass, and covering at least the touch sensor by using a first protective material. 1 forming a protective layer forming a second protective layer covering at least a first protective layer using a second protective material; cutting tempered glass to a size of a set cell area to form a thin tempered glass; Removing the second protective worm of the tempered glass ， And removing the first protective layer of sal tempered glass.

The first protective material and the second protective material may be acid resistant materials, and the first protective material may be a photoresist. The thickness of a 1st protective layer can be 10-20 micrometers. The second protective material can be a film. Forming the cell-reinforced glass by cutting the tempered glass may be carried out by a cross-sectional etching method. Tempered glass may be formed of aluminosilicate series glass.

After removing the second protective layer of the cell-reinforced glass may further comprise the step of primary processing the sal steel glass, and the step of secondary processing the primary processed cell-reinforced glass. Primary processing is a grinding process that processes the outer shape of the tempered glass surface with a dimension of about 0.1 ~ 0.2mm larger than the set product specification. Secondary processing is the etching process of the microchip generated during the primary processing. It can be done in a healing process.

【Effects of the Invention】

In the photoresist film thickness of about 3 to form ~ 5 times thinner than conventional materials can be simple ^hwahal, the material costs and process conditions.

In addition, it is possible to obtain a desired shape and dimensions on the outer portion of the cut tempered glass suitable for processing such as grinding and healing.

In addition, it is possible to reduce the failure to lift in the grinding process.

[Brief Description of Drawings]

1 is a schematic flowchart of a method of manufacturing a touch panel according to an exemplary embodiment of the present invention.

Figure 2 is a photograph showing the cut surface of the cell-reinforced glass in the state where the film is removed to measure under a microscope.

3 is a photograph showing a processing surface of the cell-reinforced glass processed by the grinding process.

Figure 4 is a photograph showing the ¾ section of the cell tempered glass cut by the cross-sectional spray process.

5A and 5B show a state in which only photoresist is applied by single masking. It is a drawing comparing the image before etching and the image after etching.

6A and 6B are diagrams comparing pre-etching images and post-etching images in a state in which only a film is applied by single masking.

[Specific contents to carry out invention]

When a part is referred to as being "on top" of another part, it may be directly on top of another part or may be accompanied by another part in between. In contrast, a part is said to be "directly above" another part. In this case, no other part is interposed therebetween.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the singular forms “a,” “an,” and “the” include plural forms as well, unless the phrases clearly indicate the opposite. _. As used herein, the meaning of "comprising" means to specify a particular characteristic, region, integer, step, operation, element and / or component, and other specific characteristics, region, integer, step, operation, element, component and / or component. It does not exclude the presence or addition of groups.

Terms indicating relative spaces such as "below" and "above" may be used to more easily describe the relationship of one part to another shown in the drawings. These terms may be used together with their intended meanings in the drawings. It is intended to include other meanings or operations of the device, for example, by inverting the device in the figures, some parts described as being "below" of other parts are described as being "above" other parts. . Thus, the exemplary term “below” encompasses both up and down directions, wherein the device may be rotated at 90 ^° or other angles, and terms representing relative space are also interpreted accordingly.

Although not defined otherwise, all terms including technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art. Commonly defined terms used in the related literature and the presently disclosed contents It is additionally construed as having a matching meaning and is not construed in an ideal or very formal sense unless defined.

DETAILED DESCRIPTION Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.

1 is a process flowchart schematically showing a method of manufacturing a touch panel according to an exemplary embodiment of the present invention. Referring to FIG. 1, the manufacturing method of the touch panel is merely for illustrating the present invention, and the present invention is not limited thereto. First, a first step S100 of preparing tempered glass 10 having a set cell area is performed. In the case of tempered glass 10, soda-lime, aluminosilicate glass may be applied. Soda-lime has 10 ~ 15um compression depth (D0L) and 400 ~ 500MPa compressive stress, Wheel, Sandblast, Wet etching, Water Jet, Laser Cutting can be done in various ways. In the case of aluminosilicate glass, the compressive strengthening depth (D0L) is 20-40um ₍ compressive stress is 600MPa or more, so it is not easy to cut by the usual method. For this reason, in the embodiment of the present invention, the alumina is made of tempered glass 10 because the cracks can be reduced by using a single-sided spray cutting process, which is a single-sided etching method, while applying a film and photoresist simultaneously. No silicide-based glass can be used.

When the above-described first step S100 is completed, the second step S102 of forming the touch sensor 12 on one surface of the tempered glass 10 is performed. The second step S102 is forming each layer for driving the touch sensing. The formation of the touch sensor 12 may use an insulating film when forming the X-axis and the Y-axis on the tempered glass 10. It is also possible to simultaneously form the X axis and the γ axis. In addition, any one of the X-axis and the γ-axis is formed first and the other axis is formed in the film (Film) Can be.

When the above-described second step S102 is completed, the third step S104 of forming the first protective layer 14 covering at least the touch sensor 12 using the first protective material is performed. The first protective material may be an acid resistant material, and the first protective material may be a photoresist. Step 3 (S104) forms a photoresist for application to the grinding process, which is a primary process, and the healing process, which is a secondary process, respectively. As the photoresist is formed, foreign matter and scratches can be minimized in the grinding process. In addition, when the photoresist is formed, a pattern is formed to be about 0.1 mm larger than the design value in consideration of the removal area in the healing process. Formation of photoresist includes film formation / exposure / development and heating processes. Screen printing includes printing and drying processes. In addition, the material formation can be applied to both sides of the tempered glass 10, the thickness is preferably formed to about 10 ~ 20um. As the thickness of the photoresist is formed to about 10 to 20um, cost reduction and process conditions can be easily maintained due to the lower thickness than the existing material, and the amount of lifting in the grinding process can be reduced. In the prior art, tempered glass was processed using an acid-resistant material of about 100 photoresist or a screen printing paste. However, when the thickness of the photoresist is thin, there is a high risk of delamination during etching cutting, so it is difficult to optimize the alignment problem exposure dose by repeating the photoresist forming process. The embodiment of the present invention simultaneously forms an acid resistant photoresist and an acid resistant film for the post-grinding and healing process. The height of the acid resistant material can be formed as low as about 10 ~ 20um. Therefore, there is no need to repeat the photoresist formation process. If the photoresist is thickly formed as in the prior art, the photoresist may be lifted during the grinding process. In the third step S104, a photoresist may be formed, and a screen printing paste may be formed as necessary.

When the above-described step 3 (S104) is completed, the fourth protective layer 16 is formed using the second protective material to form the second protective layer 16 covering at least the first protective layer 14. Step S106 is performed. The second protective material may be an acid resistant material, and the second protective material may be a film. The fourth step S106 forms a film for application to the chemical cutting process. It is preferable to form a pattern about 1 mm larger than the design value for dimensional accuracy in film formation. The film can be formed on both sides or on one side of the tempered glass 10.

When the fourth step S106 described above is completed, the fifth step S108 is performed to cut the tempered glass 10 to the size of the set sal region to form the cell tempered glass 10a. In a fifth step S108, a cutting process may be performed using a chemical etching method. Etching methods can be sprayed on one side, sprayed on both sides, down flow, etc. The hydrofluoric acid concentration is preferably 30 to 45%, and dimensional control is important according to the hydrofluoric acid concentration. Since the cut surface 20 of the sal tempered glass 10a is a region which has not been strengthened, it may be vulnerable to an outer layer gap. Therefore, it is possible to supplement the reinforcement treatment by applying a paste containing hydrofluoric acid on the side that is not reinforced.

When the fifth step S108 is completed, the sixth step of removing the second protective layer 16 of the sal tempered glass 10a is performed. The sixth step (S110) is a process of peeling the film in order to perform the primary processing process. Grinding is not easy due to overetching if the film is not peeled off.

When the sixth step S110 described above is completed, a seventh step of primary processing the tempered glass 10a is performed. A seventh step (S112) is a grinding (Grinding) tablets for processing the outer shape of the cut surface 20 of the cell-reinforced glass (10a) to form a machining surface (22). Grinding process is about 0.1 ~ 0.2mm larger than the product specification set during the primary processing.

When the seventh step (S112) described above is completed, the eighth step (S114) to perform the second step of the primary processed cell-reinforced glass (10a). Secondary processing may be a healing process that removes the microchips generated during grinding using an etching method. Secondary processing is the process of etching about 0.1 ~ 0.2 瞧 to meet the desired product specification. Black matrix at secondary processing (BM; It prevents light leakage by etching to the area of black matrix, and etching using dipping method is suitable. For reference, the relationship between the hydrofluoric acid concentration and the process time is inversely proportional.

When the eighth step (S114) described above is completed, removing the first protective layer 14 of the secondary tempered glass (10a) is carried out step 9 (S116).

The one described like glass 10 to the after forming the panel at the same time than the formation of the panel to the ^'cut-cell glass (10a) in advance, as cut into a plurality of cells glass (10a) several Sal glass ( The same process can be applied to 10a). Therefore, there is an advantage that can reduce the production time and efficiently manage the process. In addition, the photoresist B, which is an acid resistant material, is formed of the first protective layer 14 for the post-processing of grinding and healing, and the second protective layer 16 covering the first protective layer 14 is formed of an acid resistant film. . Therefore, the height of the photoresist can be formed as low as about 10-20um, and the risk of peeling during the etching cutting is high, thereby eliminating the problem of repeating the photoresist forming process. When the panel forming process of the tempered glass 10 is completed, a mask is applied to cut the plurality of sal tempered glass 10a, and fluorine etching is performed to convert the tempered glass 10 into the tempered glass 10a. Cut. Thereafter, the second protective layer 16 is removed, the cutting surface 20 of the cell tempered glass 10a is ground and healed, and then the first protective layer 14 is removed to manufacture the touch panel.

Hereinafter, the present invention will be described in more detail through experimental examples. These experimental examples are only for illustrating the present invention, and the present invention is not limited thereto.

Experimental Example 1

1) First step (S100)

A tempered glass 10 having a size of 370 mm x 470 mm and a thickness of 0.7 mm 3 was prepared. The tempering depth was 40um and the compressive force was 645MPa aluminosilicate series tempered glass.

2) second step (S102) The touch sensor 12 formed a bridge having a characteristic value of 200 A of the first electrode layer and 45 / 口 of sheet resistance. After the first electrode layer was formed, an insulator was formed to a thickness of 1.5 um. The second electrode layers are X, Y layers, and 200 A, and the sheet resistance is 45? The trace portion was formed of molybdenum / aluminum / molybdenum (Mo / Al / Mo) and had a thickness of 2,400 A (Mo; 300 A, A1; 1600 A, Mo; 500 A). At this time, the sheet resistance was 0.4 / k. In the following process, the overcoat was formed to a thickness of 1.5 um to protect the electrode layer and the trace layer. The size of the touch sensor 12 is 120mm x 60mm, and arranged at intervals of 3mm to form 15 sheets.

3) Third Step (S104)

Acid resistant materials were formed using photoresist. As the acid resistant material, acrylic resin was used. For the film formation, the coating method was bar coating and the coating thickness was 20. Exposure was carried out using a metal halide column, the irradiation amount was 100mJ / cm2. The developing and post-exposure process was carried out for Na 2 CO 3, concentration 0.4%, and time for 150 seconds. The post exposure process was carried out at l, 000 mJ / cm 2. After forming one side, the other side proceeded in the same way. The dimension after the post-exposure process was 120.15 X 60.13 mm.

4) Fourth Step (S106)

The film is a PVC film (PVC) film after lamination (Lamination) and then formed a pattern using a laser (Laser) to remove the etching portion. The opposite side was formed in the same way. The dimension was 122.1 X 62.1 mm 3.

5) The fifth step (S108)

The etching process was performed by horizontally spraying 30% blonic acid solution at 30 ^° C. against the masked tempered glass 10 at a spray pressure of 1.0 to 1.5 kgf / cm 2 for 10 minutes to one surface. In addition, etching was performed by spraying horizontally on another surface in the same manner. The etching process was performed to secure 15 cells without breakage. 2 is It was the photograph which showed the cut surface 20 of the sal tempered glass 10a in which the film was removed in order to measure with a microscope, and was 120.33 X 60.32 kPa on average.

6) Sixth Step (S110)

The film was peeled off to proceed with the grinding process. The film can be peeled off manually.

7) seventh step (S112)

In grinding process, the wheel size was 800mesh and the speed of rotation was 6,000rpm, and the chip size was made less than 50um. FIG. 3 is a photograph showing the processed surface 22 of the cell-reinforced glass 10a processed by the process per line. The dimension measurement result was 120.15 X 60.15 mm.

8) Eighth Step (S114)

The healing process was carried out using a dipping method, and the healing solution was evaluated as 15% hydrofluoric acid and 15 minutes. The shape of the processing surface 22 was not significantly different from the grinding, it was confirmed that the chip (chip) is removed. The dimension was 120.03 X 60.02 瞧 and satisfied the design standard ± 50um.

9) 9th step (S116)

Photoresist stripping was performed at 12% sodium hydroxide (NaOH) at 60 ° C. for 2 minutes to remove residual photoresist. Meanwhile, the bending strength evaluation was conducted to secure the bending strength characteristics according to the healing process. The equipment was evaluated with a 3-axis bending machine, and the span length was 80 mm at the bottom, 40 mm at the top, and the speed was 100 mm / min. If only the grinding results are measured, Min. 11.04, Max 12.33kgf, the stiffness after healing was Min 28.7, Max. It was confirmed that the improvement was about 2 times or more to 40.36kgf. In case of sal tempered glass (10a), Min 29.40 and Max 34.17kgf were used.

Experimental Example 2

In the second experimental example, most of the processes are the same as those of the first experimental example, and the tempered glass was cut by using a cross-sectional spray process during the cutting process. In the following, the first Detailed description overlapping with the manufacturing method of the touch panel according to the experimental example is omitted. Degree

4 is a photograph showing the cut surface 20a of the cell tempered glass 10b cut by the cross-sectional spray process. The cutting process time according to the second embodiment took 20 minutes. Is a cross-section etched in the upper portion of the cross-section of the spraying process, if _i cross-section etched with the touch position sensor 12 in the lower region of the glass cell (10b) and Sal glass (10b) as described above. As described above, cross-sectional etching on the upper part of the tempered glass 10b was effective in protecting the touch sensor 12 in the lower region.

As described above, in the embodiment of the present invention, the cell-reinforced glass 10b is cut by a double masking process for simultaneously applying a film and a photoresist, but the following problems occur in a single masking process for applying only one film or photoresist. It was.

5A and 5B show a comparison of an image before etching and an image after etching in a single masking state in which only one photoresist is coated.

The photoresist is not peeled off in the pre-etched image as shown in FIG. 5A, and the photoresist is peeled off in the post-etched image as shown in FIG. 5B. As shown in FIGS. 5A and 5B, when only the photoresist, which is an acid resistant material, is applied and the film is not used, the photoresist is peeled off during the etching process, affecting the touch sensor, and then the process cannot be performed. On the other hand, in the case of coating the photoresist twice repeatedly, black matrix damage of about 100 to 150 um was induced after etching.

Figure 6a and Figure 6b is the ^"image with the image before etching after etching while applying only a single masking film ratio ⁱ sophisticated drawing.

As shown in FIG. 6A, the black matrix region is not damaged in the pre-quenching image, and the black matrix region is damaged in the post-etching image as in FIG. 6B. As shown in FIGS. 6A and 6B, when only the film is applied and the photoresist, which is an acid resistant material, is not used, the black matrix region may be damaged during the etching process. Also, When only the film was applied with a single masking, the film was peeled off in the grinding process, which could damage the touch sensor in a later process.

Although the present invention has been described above, various modifications and variations are possible without departing from the spirit and scope of the claims set out below _. Those skilled in the art to which the present invention belongs will readily understand.

[Description of code]

10; tempered glass 10a; cell tempered glass

12; touch sensor 14; first protective layer

16; second protective layer

Claims

[Patent Claims]

[Claim 1]

Preparing a tempered glass having a set cell area;

Forming a touch sensor on one surface of the tempered glass;

Forming a first protective layer covering at least the touch sensor using a first protective material;

Forming a second protective layer covering at least the first protective layer using a second protective material;

Cutting the tempered glass to a size of a set sal region to form cell-reinforced glass;

Removing the second protective layer of the sal tempered glass; and

Removing the first protective layer of the cell tempered glass

Method of manufacturing a touch panel comprising a.

[Claim 2]

The method according to claim 1,

And the first protective material and the second protective material are acid resistant materials.

【Claims .3】

The method of claim 2,

And said first protective material is a photoresist.

[Claim 4]

The method of claim 1,

The thickness of the first protective layer is a manufacturing method of the touch panel 10 ~ 20um.

[Claim 5]

The method of claim 2,

And the second protective material is a film.

[Claim 6]

The method of claim 1, Forming the cell-reinforced glass by cutting the tempered glass is a method of manufacturing a touch panel to proceed by the cross-sectional etching method.

[Claim 7]

The method of claim 6,

The tempered glass is alumino silicate-based glass manufacturing method of the touch panel

[Claim 8]

The method of claim 1,

Removing the second protective layer of the cell tempered glass and first processing the cell tempered glass; and

Second step of the primary processed cell-reinforced glass

Method of manufacturing a touch panel further comprising.

[Claim 9]

According to claim 8,

The primary processing is a manufacturing method of a touch panel, which is a grinding process for processing the outer shape of the tempered glass surface to a dimension of about 0.1 ~ 0.2 隱 larger than the set product specifications.

[Claim 10]

The method of claim 8,

The secondary processing is a method of manufacturing a touch panel which is a healing process of removing the microchips generated during the first processing by a etching method.