KR20130086760A - Apparatus for cleaning semiconductor and display panel during manufacturing process of semiconductor and display panel - Google Patents

Abstract

PURPOSE: A semiconductor and a washing device for display panel manufacturing process are provided to completely remove plastic materials or high molecular organic matter by using the fluidic molten liquid of high temperature in a molten liquid cleaning bath. CONSTITUTION: A molten liquid cleaning bath (12) loads multiple cleaning objects. A first heating device mounts the heat of a predefined temperature to inorganic matter molten liquid filled in the molten liquid cleaning bath. A convection device (40) causes convection current. An exhaustion facility (20) is installed at housing. The exhaustion facility collects dust and filters fine dust and exhaust generated at the molten liquid cleaning bath. [Reference numerals] (40) Convection device; (50) Air blower

Description

Apparatus for Cleaning Semiconductor and Display Panel during Manufacturing Process of Semiconductor and Display Panel}

The present invention relates to an apparatus for cleaning a semiconductor and a display panel, and more particularly, to a cleaning apparatus for removing dots, adhesion or deposition on a semiconductor or a display panel, and other contaminants in a semiconductor or display panel manufacturing process. It is about.

In general, cleaning processes are essential in processes for manufacturing semiconductors and display panels. Semiconductor and display panels use a variety of raw materials or subsidiary materials in the manufacturing process, and the manufacturing process of the semiconductor and display panels requires a variety of cleaning processes in order to maintain a clean state.

Cleaning of semiconductors and display panels is for removing contaminants or removing oxide films. The cleaning process requires cleaning wafers, masks, or tool-related tools, and is a process that must be passed through before and after each process in the manufacture of display panels such as semiconductors, LCDs, LEDs, and OLEDs. In the washing process, hydrochloric acid, sulfuric acid, nitric acid, hydrofluoric acid, ammonia water, hydrogen peroxide water, ultrapure water, isopropyl alcohol (IPA) or various organic solvents are used alone or a mixed solution is used.

In addition, various chemical reactants generated after thin film application, photo, etching, ion implantation, etc. using a cleaning device using ultrasonic, plasma, laser, pressurized injection, or heating in parallel with the use of various chemicals. Removed or unnecessary foreign matter.

In the prior art, most of the problems for semiconductor and display panel cleaning can be solved. However, the polymerized foreign matter stuck to the semiconductor and display panel manufacturing process, or the lump of the organic material or the oxidized thin film that has undergone curing has a problem in that it is not easily removed due to its strong chemical resistance and physical strength or elasticity. Therefore, there is a need for a device that can solve this problem.

The present invention has been made to solve the above problems, using a small amount of chemical, that is, inorganic melt that is polymerized or hardened to the cleaning object such as semiconductors, display panels or wafers, masks or process-related tools, etc. The purpose is to remove effectively.

In order to achieve the above object, the present invention provides a cleaning apparatus for a semiconductor and display panel manufacturing process, comprising: a melt cleaning tank installed in a housing, filled with a predetermined amount of an inorganic melt, and loaded with a plurality of cleaning objects; A first heating device for applying heat of a predetermined temperature to the inorganic melt filled in the melt washing tank; A convection device that stirs the inorganic melt filled in the melt cleaning tank or causes convection by using ultrasonic waves or gas; And an exhaust system installed in the housing to collect and filter fine dust and exhaust gas generated in the melt cleaning tank, wherein the semiconductor is cleaned by burning or peeling off the organic and inorganic substances adhered to the cleaning object put into the melt cleaning tank. It is characterized by providing a cleaning device for a display panel manufacturing process.

In addition, in the present invention, the first heating device is a method of directly heating inside the melt cleaning tank or indirect heating is applied outside the melt cleaning tank, the first heating device is heated by electricity, gas burner or far infrared The first heating device may heat the melt that has already been heated and supplied from the outside, or increase or decrease the melt to reach a predetermined temperature, or allow the melt to be maintained at a predetermined temperature.

In addition, in the present invention, the convection device includes a mechanical rotating body or a rotating plate, and includes a blower for supplying a gas to the melt washing tank through the blower tube, the gas supplied may include air, oxygen, nitrogen or argon. .

In addition, in the present invention, the exhaust system is provided with a duct for guiding and discharging the air inside the housing, an exhaust fan for sucking and discharging the exhaust gas generated in the melt cleaning tank is installed in the duct, the exhaust duct An air shower or a dust collecting filter for collecting and filtering gas may be installed.

In addition, in the present invention, the second pipe for heating the circulating pipe connected from the upper side to the lower side to the melt cleaning tank side, and the melt flows from the lower portion of the melt cleaning tank to the predetermined temperature by heating to the upper portion of the melt cleaning tank. A melt circulating device incorporating the device may be installed.

In addition, the present invention provides a cleaning apparatus for a semiconductor and display panel manufacturing process, comprising: a plurality of sheet-type melt liquid washing tanks installed in a housing, filled with a predetermined amount of molten liquid, and filled with a cleaning object; A third heating device for applying heat of a predetermined temperature to the melt liquid filled in the sheet type melt liquid washing tank; A carrier supported by a support provided outside the sheet type melt cleaning tank and held by a frame fixed to the frame to move up and down to a sheet type melt cleaning tank; A filtering net mounted to the carrier side to filter the decomposition residue contained in the melt; A support member mounted to the support to receive a melt falling from the upper surface of the sheet-type melt cleaning tank under the object to be washed by the carrier when it is separated from the sheet-type melt cleaning tank by a carrier; And an exhaust system installed in the housing to collect and filter the exhaust gas generated in the sheet-type melt cleaning tank, and to clean or burn the organic and inorganic substances adhered to the cleaning object put into the sheet-type melt cleaning tank. And a cleaning apparatus for a display panel manufacturing process.

In addition, in the present invention, a supply device for supplying a solid inorganic material through the supply pipe, a meter for measuring the weight of the inorganic material supplied from the supply device through the supply pipe, and the inorganic pipe passed through the meter Pneumatic feeder for forcibly supplying the mechanical feeder or the inorganic material passed through the meter by a pneumatic pressure through the supply pipe through the mechanical feeder through the supply pipe, and melts the inorganic material in the solid state supplied to the supply pipe to supply to the melt washing tank in the liquid state The apparatus may further include a melter manufacturing and supplying apparatus including a melter and a supply controller for controlling an amount of the melted liquid supplied through the supply pipe.

In addition, in the present invention, any one of the plurality of sheet-type melt cleaning tank is kept in the idle state while the cleaning object is put into the cleaning, and in the idle state to heat the inside of the sheet-type melt cleaning tank to a constant temperature. Can be.

In addition, in the present invention, a plurality of washing tanks for washing the object to be cleaned in the sheet-type melt cleaning tank with pure water or gas is installed, the drying tank for drying the washing object washed in the washing tank may be further included.

In addition, in the present invention, the sieve is folded when the carrier is introduced into the single-sheet melt washing tank and is folded at an angle when the carrier is raised to fold to filter the decomposition residue contained in the melt, the sieve is the diameter of the melt It can be made of larger mesh.

In addition, the present invention provides a semiconductor and display panel cleaning apparatus, comprising: a plurality of sheet-type melt cleaning tanks installed in a housing to fill a predetermined amount of a molten liquid and a cleaning object is horizontally introduced; A fourth heating device for applying heat of a predetermined temperature to the melt filled in the sheet type melt cleaning tank; Carrier for holding the object to be fixed to the frame to lift the molten liquid washing tank; And an exhaust system installed in the housing to collect and filter the exhaust gas generated in the sheet-type melt cleaning tank, and to clean or burn the organic and inorganic substances adhered to the cleaning object put into the sheet-type melt cleaning tank. And a cleaning apparatus for a display panel manufacturing process.

The present invention can be completely removed by burning or peeling of plastic material or polymer organic matter by the high-temperature fluid melt in the melt cleaning tank by the above solution means, and relatively inexpensive energy source such as electric heater, far infrared generator, gas burner, etc. It can be used, by modularizing the melt cleaning tank applied to the existing cleaning device to reduce the cost, convenience of cleaning and reliability of the cleaning device.

1 is a block diagram showing a cleaning apparatus for a semiconductor and display panel manufacturing process according to a first embodiment according to the present invention.
2 is a block diagram showing a cleaning apparatus for a semiconductor and display panel manufacturing process according to a second embodiment of the present invention.
3 is a block diagram showing a cleaning apparatus for a semiconductor and display panel manufacturing process according to a third embodiment of the present invention.
Figure 4 is a block diagram showing a cleaning device for a semiconductor and display panel manufacturing process equipped with a sheet-type melt cleaning tank in a fourth embodiment according to the present invention.
5 is a block diagram showing a carrier according to the present invention.
6 is a perspective view showing that the carrier and the supporting member according to the present invention are coupled to the support.
FIG. 7 is a configuration diagram illustrating a cleaning apparatus for a semiconductor and display panel manufacturing process in which a cleaning object is horizontally introduced into a sheet type melt cleaning tank according to a fifth embodiment of the present invention.
Figure 8 is a block diagram showing a cleaning apparatus for a semiconductor and display panel manufacturing process equipped with a sheet type melt cleaning tank and a plurality of washing tank and drying tank according to the present invention.

Hereinafter, a cleaning apparatus for a semiconductor and display panel manufacturing process according to the present invention will be described in detail with reference to the accompanying drawings.

1, in the first embodiment of the present invention, the melt cleaning tank 12 is embedded in the housing 11 of the cleaning apparatus 10. In FIG. The cleaning device 10 is cleaned by the thermal decomposition action of the molten liquid 13 heated by the heating of the first heating device 14 and the convection of the heated molten liquid 13 by the convection device 40. In other words, cleaning is performed by removing foreign matters that have adhered to the semiconductor or display panel.

The melt cleaning tank 12 is installed in the housing 11 and is for loading one or more cleaning objects 1. The melt cleaning tank 12 has a volume into which one or more cleaning objects 1 can be put, and preferably has a structure in which the cleaning objects 1 can be easily added and separated.

The molten liquid 13 applied in the present invention is introduced into the molten liquid washing tank 12 in a predetermined amount to remove foreign matters fixed to the washing target 1. The molten liquid is introduced into the molten liquid washing tank 12 with an inorganic substance to remove foreign matters fixed to the washing target 1. The melt 13 is sodium carbonate, sodium hydrogen carbonate, potassium carbonate, calcium nitrate, sodium nitrate, potassium nitrate, sodium hydroxide, potassium hydroxide, potassium oxide, or the like, and any one or more of these inorganic substances may be mixed.

The exhaust system 20 is installed at one side of the housing 11 of the cleaning device 10. The exhaust system 15 sucks and discharges combustion gas generated in the housing 11 and the like. Exhaust system 20 is connected to the duct 21 to guide the air discharged from the housing (11). An exhaust fan 22 is mounted in the duct 21 to suck air containing the combustion gas inside the housing 11. In addition, an air shower 23 or a dust collecting filter 24 for collecting and filtering the combustion gas passing through the exhaust fan 22 may be selectively installed in the duct 21.

The 1st heating apparatus 14 is installed in the outer periphery of the melt washing tank 12, and heats the melt washing tank 12. As shown in FIG. The first heating device 14 includes an electric heater that generates heat with electric energy, a far infrared generator that generates far infrared rays, or a gas burner that generates heat with gas energy. If necessary, one or more electric heaters, far infrared generators, and gas burners may be used. The first heating device 14 is to heat the melt cleaning tank 12 by heating the melt cleaning tank 12 and may be installed inside the melt cleaning tank 12. Furthermore, the heating temperature of the molten liquid 13 injected into the molten liquid washing tank 12 is about 50 to 900 degreeC, Preferably it is about 350 degreeC.

In addition, the first heating device 14 is to heat the melt that has already been heated and supplied from the outside, or to raise or lower the melt to reach a predetermined temperature, or to maintain the melt at a constant temperature.

The convection device 40 stirs the melt 13 filled in the melt cleaning tank 12 or causes convection by using ultrasonic radiation or injection of gas. The convection device 40 includes a mechanical rotating body 41 or a rotating plate, and may further include a blower 50 for supplying gas to the melt cleaning tank 12 through the blower pipe 51. The gas supplied to the melt cleaning tank 12 includes air, oxygen, nitrogen, argon, or the like.

In addition, the melt cleaning tank 12 including the first heating device 14 may be configured as an integrated unit module and applied to the existing cleaning device. In addition, the cleaning object 1 may include a metal or stone, and the cleaning object 1 may be a semiconductor, a wafer, masks, or a tool associated with a process. In particular, the present invention is useful for separating and removing the polymerized foreign matter adhered to the surface of the semiconductor or display panel.

Next, Figure 2 shows a cleaning apparatus constructed as a second embodiment of the present invention, the housing 10 and the exhaust facility 20 is not shown.

The circulation pipe 31 is connected from the upper side to the lower side to the melt cleaning tank 12 side, and the circulation pipe 31 is provided with a melt liquid circulation device 30 having a second heating device 32. The second heating device 32 heats the molten liquid 13 introduced from the lower portion of the molten liquid washing tank 12 to a predetermined temperature to inject the molten liquid washing tank 12 into the upper portion. In this case, although both the first heating device 14 and the second heating device 32 may be installed, when the second heating device 32 is installed, the first heating device 14 may be omitted. The second heating device 32 is for heating while circulating the melt 13 so that the melt 13 filled in the melt cleaning tank 12 does not fall below a predetermined constant temperature.

In addition, the porous plate 45 may be installed in the lower portion of the melt cleaning tank 12 to filter foreign matter contained in the melt 13 filled in the melt cleaning tank 12.

Next, Figure 3 shows a cleaning apparatus constructed as a third embodiment of the present invention, the housing 10 and the exhaust system 20 is not shown.

The melt liquid production tank 12 is provided with a melt liquid production and supply device 60. Melt production and supply device 60 is a supply pipe 62 for supplying the melt 13 to the melt cleaning tank 12 from the supply device 61 to supply the inorganic matter in the solid state from the melt cleaning tank 12 Is installed. Under the supply device 61, a meter 63 for measuring the weight of the inorganic material supplied through the supply pipe 62 is installed. The meter 63 is for making it possible to determine the amount of the inorganic material used in the melt cleaning tank 12 by measuring the amount of the inorganic material introduced into the melt cleaning tank 12. In addition, the mechanical feeder 64 is provided in the supply pipe 62. The mechanical feeder 64 mechanically forces the inorganic material that has passed through the meter 63 through the supply pipe 62. In addition, a pneumatic feeder 65 is provided in the supply pipe 62. The pneumatic feeder 65 is forcibly supplying the inorganic material which has passed through the meter 63 through the supply pipe 62. The mechanical feeder 64 and the pneumatic feeder 65 installed in the feed pipe 62 may all or optionally be installed. In addition, the feed pipe 66 is provided with a melter 66. The melter 66 melt | dissolves the inorganic substance of the solid state supplied to the supply pipe 62 in a liquid state, and supplies it to the melt liquid washing tank 12. Therefore, dissolving a large amount of the inorganic melt in the melt cleaning tank 12 is inefficient in terms of time and energy supply is to supply after melting the inorganic material in the melter 66 of the melt production and supply device 60. Furthermore, the systemization of the present invention can be realized by continuously supplying as much as the amount of melt consumed after cleaning the object to be cleaned.

In addition, the supply control device 67 is for controlling the amount of the inorganic melt melted in the melter 66 is introduced through the supply pipe. The supply pipe 62 may be installed above the melt cleaning tank 12 or may be installed across the top.

In the third embodiment, the melt circulation apparatus 30 of the second embodiment may be omitted.

Next, Fig. 4 shows a cleaning apparatus constructed as a fourth embodiment of the present invention.

In the housing 11, a plurality of sheet type melt cleaning tanks 15 are provided. In FIG. 4, although the three sheet | seat type | mold liquid washing | cleaning tank 15 is provided for three sheets, it will be able to add or subtract as needed. Each of the sheet type melt cleaning tanks 15 is provided with a third heating device 75, and the third heating unit 75 heats the molten liquid filled in the sheet type melt cleaning tank 15 at a constant temperature. To add.

And the melt production and supply apparatus 60 is provided in the upper part of the sheet | leaf type | mold liquid washing | cleaning tank 15. The single-leaf melt cleaning tank 15 may not be easy to maintain a large amount of the melt at a uniform temperature in a single melt cleaning tank, so that it can be applied when the intended cleaning effect is not large. . In the case of washing the cleaning object 1 using the independent sheet type melt cleaning tank 15, there is an advantage that maintenance and maintenance are easy in addition to the preventive maintenance (PM) when any one of the sheet type melt cleaning tanks 15 is broken. have.

Rather than injecting the cleaning objects 1 into the sheet type melt cleaning tank 15 according to the fourth embodiment, the at least one sheet type melt cleaning tank 15 may maintain an idle state. . For example, while washing or separating by putting a cleaning object into two single sheet melt cleaning baths on both sides, the molten liquid is heated by the third heating device 75 without putting a cleaning object into the single sheet melting melt cleaning tank at the center. Meanwhile, to replenish the melt and to maintain a constant temperature.

In addition, in Fig. 5, the carrier for lifting or putting the object to be removed by lifting and removing the object to be washed with a single-layer melt washing tank. First, the frame 85 is fixedly coupled to the edge of the cleaning object 1. And the carrier 80 for holding and transporting or lifting the object (1) to which the frame 85 is coupled is provided. The carrier 80 is a jig for mechanical transportation required for cleaning the cleaning object 1. Therefore, any device for transporting the carrier 80 will be generally used conveyors and lifting devices and the like.

Carrier 80 is provided with a hook portion 81 for holding the upper and lower frame 85 on both sides of the frame 85 to which the cleaning object (1) is coupled, the sieve net 82 on the upper and lower rear surface of the carrier 80 ) Is installed. The sieve 82 is hinged so that the carrier 80 is folded when the carrier 80 is introduced into the sheet melt cleaning tank 15 and then unfolded at an angle when the carrier 80 rises from the sheet melt cleaning tank 15. To do that. The sieve 82 is folded to filter the decomposition residue contained in the melt 13. The mesh of sieve 82 should be formed of a mesh larger than the diameter of the melt. The angle at which the strainer 82 is unfolded is preferably within about 10 to 20 degrees from the horizontal to the top. Therefore, the hinge axis for supporting and rotating the strainer 82 may be designed so that the strainer 82 does not fall below a predetermined angle. In the strainer 82, the melt residue or decomposition residues are filtered out.

In FIG. 6, a support 86 is provided as a lifting device for lowering, injecting or raising the carrier 80 into the sheet-type melt washing tank 15, and the carrier 80 and the supporting member are provided in the support 86. (87) is combined. Carrier 80 is a structure capable of lifting the support 86 to the shaft is made by mechanical lifting by the rotational force of the motor or hydraulic or pneumatic. In addition, the support 86 may be additionally provided with a separate transfer device for transferring the carrier 80 to the left and right. In addition, the supporting member 87 is mounted on the support 86, and the carrier is disposed on the upper side of the sheet type melt cleaning tank when the cleaning object 1 is lifted and separated from the sheet type melt cleaning tank 15 by the carrier 80. 80 and the object to be cleaned below the object 1 to collect the molten liquid that falls on the object to be cleaned. The support member 87 may be coupled to a structure in which the support 86 is rotated about an axis, but may be coupled to a structure that is horizontally moved from the sheet-type melt cleaning tank 15. The supporting member 87 is intended to prevent the cleaning object 1 held by the carrier 80 and the melt liquid from the carrier 80 from flowing down during transportation and contacting the floor or other tool. Therefore, the supporting member 87 is in the shape of a container, and an absorbent capable of absorbing the molten liquid may be embedded in the supporting member 87.

Next, FIG. 7 shows a cleaning apparatus constructed as a fifth embodiment of the present invention. This is a configuration diagram showing a cleaning apparatus for a semiconductor and display panel manufacturing process in which a cleaning object is horizontally fed into a sheet-fed melt cleaning tank.

In the housing 11, a plurality of sheet type melt cleaning tanks 15 are provided. Although the sheet type melt | cleaning liquid washing tank 15 was shown to be installed in multiple numbers up and down, it may be provided in multiple numbers from side to side. This allows the cleaning object 1 to be poured into the sheet-type melt cleaning tank 15 horizontally using a shallow depth of molten liquid for cleaning. In this case, a carrier 90 capable of transporting and elevating the cleaning object 1 to which the frame 85 is coupled is provided, and a fourth heating device 85 is installed below the sheet type melt cleaning tank 15.

In addition, in FIG. 8, the washing | cleaning object in which the washing | cleaning was completed in the single | leaf type | mold liquid washing | cleaning tank 15 is wash | cleaned through the several washing tanks 16 and 17 and the drying tank 18, and are completed. The washing tanks 16 and 17 wash the washing object with pure water or gas. That is, after the first washing with deionized water (DIW) in the first washing tank (16) and the second washing with deionized water in the second washing tank (17), the drying tank (18) is washed in the washing tank (17) The object is washed with volatile liquids such as isopropyl alcohol (IPA), acetone, normal nucleic acid, and the like, followed by drying by generating hot air. Therefore, the washing tanks 16 and 17 and the drying tank 18 may be installed in plural and may be installed in the housing of the washing apparatus, but may be separately installed to wash and dry the washing objects washed in the melt washing tank. Go through the process.

Furthermore, since the cleaning object 1 separated from the melt cleaning tank 12 is a high temperature, it is cooled and washed at room temperature. The cleaning object or the cooling object (1) cooled at room temperature is added to ultrapure water or additionally sprayed by spraying ultrapure water or air, oxygen, nitrogen, argon, etc. Masks or process related tools can be cleaned.

While the invention has been shown and described in connection with specific embodiments thereof, it is well known in the art that various modifications and changes can be made without departing from the spirit and scope of the invention as indicated by the claims. Anyone who has a can easily know.

DESCRIPTION OF SYMBOLS 10 Cleaning | cleaning apparatus 11: Housing 12: Melting | cleaning liquid washing tank 13: Melt liquid 14, 32, 75, 95: Heating apparatus 15, 19: Single leaf type | mold liquid washing | cleaning tank 16, 17: Washing tank 18: Drying tank 20: Exhaust apparatus 21: Duct 22: exhaust fan 23: air shower 24: dust collecting filter 30: melt liquid circulation device 31: circulation pipe 40: convection device 41: rotating body 45: porous plate 50: blower 51: blower tube 60: melt production and supply device 61: supply device 62: supply pipe 63: meter 64: mechanical feeder 65: pneumatic feeder 66: melter 67: feed regulator 80, 90: carrier 81: hook 82: strainer 85: frame 86: support 87: support member

Claims (11)

In the cleaning device for semiconductor and display panel manufacturing process,
A molten liquid washing tank installed in the housing to fill a predetermined amount of the inorganic molten liquid and to be loaded with a plurality of cleaning objects;
A first heating device for applying heat of a predetermined temperature to the inorganic melt filled in the melt washing tank;
A convection device that stirs the inorganic melt filled in the melt cleaning tank or causes convection by using ultrasonic waves or gas; And
It is installed in the housing and includes an exhaust facility for collecting and filtering the fine dust and exhaust gas generated in the melt cleaning tank,
A cleaning device for a semiconductor and display panel manufacturing process for cleaning by burning or peeling off organic or inorganic matter stuck to a cleaning object put into the melt cleaning tank.
The method of claim 1, wherein the first heating device is a method of heating directly inside the melt cleaning tank or an indirect heating method outside the melt cleaning tank is applied, the first heating device is heated by electricity, gas burner or far infrared rays The first heating device is a cleaning device for a semiconductor and display panel manufacturing process for heating a melt that has already been heated from the outside to raise or lower the melt to reach a predetermined temperature or to maintain the melt at a constant temperature.
The semiconductor device of claim 1, wherein the convection device includes a mechanical rotating body or a rotating plate, and includes a blower for supplying a gas to the melt cleaning tank through a blower pipe, and the supplied gas includes air, oxygen, nitrogen, or argon; Cleaner for display panel manufacturing process.
According to claim 1, The exhaust system is a duct for inducing and discharging the air inside the housing is installed, the exhaust duct is provided with an exhaust fan for sucking and discharging the exhaust gas generated in the melt cleaning tank, the exhaust duct Cleaner for semiconductor and display panel manufacturing process equipped with an air shower or a dust collecting filter for collecting and filtering gas.
According to claim 1, wherein the circulating pipe connected from the upper side to the lower side to the melt cleaning tank side, and the second heating for heating the melt flows from the lower portion of the melt cleaning tank introduced into the circulating pipe to a predetermined temperature to the upper portion of the melt cleaning tank Cleaning device for semiconductor and display panel manufacturing process equipped with a melt liquid circulation device including a device.
In the cleaning device for semiconductor and display panel manufacturing process,
A plurality of sheet type melt liquid washing tanks installed in the housing and filled with a predetermined amount of melt liquid and into which a washing object is put;
A third heating device for applying heat of a predetermined temperature to the melt liquid filled in the sheet type melt liquid washing tank;
A carrier supported by a support provided outside the sheet type melt cleaning tank and held by a frame fixed to the frame to move up and down to a sheet type melt cleaning tank;
A filtering net mounted to the carrier side to filter the decomposition residue contained in the melt;
A support member mounted to the support to receive a melt falling from the upper surface of the sheet-type melt cleaning tank under the object to be washed by the carrier when it is separated from the sheet-type melt cleaning tank by a carrier; And
It is installed in the housing and includes an exhaust facility for collecting and filtering the exhaust gas generated in the sheet-type melt washing tank,
A cleaning apparatus for a semiconductor and display panel manufacturing process for cleaning by burning or peeling off organic and inorganic matters adhered to a cleaning object put into said sheet type melting liquid cleaning tank.
7. The apparatus according to claim 1 or 6, further comprising: a supply device for supplying a solid inorganic material through a supply pipe, a meter for weighing the inorganic material supplied from the supply device through a supply pipe, and the inorganic material passed through the meter. A mechanical feeder for forcibly supplying mechanically through a supply pipe or a pneumatic feeder for forcibly supplying minerals passed through the meter to a pneumatic pressure through a supply pipe, and a solid liquid melted by melting the inorganic minerals supplied to the supply pipe. And a melter manufacturing and supplying device including a melter supplied to the cleaning tank and a supply control device for controlling the amount of the melt supplied through the supply pipe.
The method according to claim 6, wherein any one of the plurality of sheet-type melt cleaning tanks maintains an idle state while a cleaning object is added and is cleaned, and in the idle state, the inside of the sheet-type melt cleaning tank is heated to a predetermined temperature. Cleaner for semiconductor and display panel manufacturing process.
The semiconductor and display of claim 6, further comprising a plurality of washing tanks for washing the cleaning objects cleaned in the sheet-type melt cleaning tank with pure water or gas, and further comprising a drying tank for drying the cleaning objects washed in the washing tank. Cleaner for panel manufacturing process.
7. The strainer according to claim 6, wherein the strainer is folded when the carrier is introduced into the single-sheet melt washing tank, and is folded at an angle when the carrier is raised to fold to filter out the decomposition residue contained in the melt, and the strainer is the diameter of the melt. Cleaner for semiconductor and display panel manufacturing process made of larger mesh.
In the cleaning device for semiconductor and display panel manufacturing process,
A plurality of sheet type melt cleaning tanks installed in the housing and filled with a predetermined amount of the molten liquid and the cleaning object is horizontally introduced;
A fourth heating device for applying heat of a predetermined temperature to the melt filled in the sheet type melt cleaning tank;
Carrier for holding the object to be fixed to the frame to lift the molten liquid washing tank; And
It is installed in the housing and includes an exhaust facility for collecting and filtering the exhaust gas generated in the sheet-type melt washing tank,
A cleaning apparatus for a semiconductor and display panel manufacturing process for cleaning by burning or peeling off organic and inorganic matters adhered to a cleaning object put into said sheet type melting liquid cleaning tank.

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