KR20130061015A - Touch screen and method for manufacturing the same - Google Patents

Abstract

PURPOSE: A touch screen and a manufacturing method of the same are provided to skip a contact process of an insulating layer, thereby decreasing the number of masks. CONSTITUTION: A first sub electrode pattern is formed in a first layer by excluding a crossing part of first and second electrodes and overlapping with the second electrode. A second sub electrode pattern is formed in a second layer by excluding the crossing part of the first and second electrodes and overlapping with the first electrode. An interlayer insulating layer is formed between the first and second layers. A first metal routing line(131) is directly connected with an end of the first electrode. A second metal routing line is directly connected with the first sub electrode pattern.

Description

Technical Field [0001] The present invention relates to a touch screen and a manufacturing method thereof,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a touch screen, and more particularly, to a touch screen that reduces the number of masks and shortens a process time by omitting a contact process of an insulating film and a manufacturing method thereof.

In recent years, as the information age has come to a full-fledged information age, a display field for visually expressing electrical information signals has been rapidly developed. In response to this, various flat panel display devices having excellent performance of thinning, light weight, Flat Display Device) has been developed to replace CRT (Cathode Ray Tube).

Specific examples of such flat panel display devices include a liquid crystal display device (LCD), a plasma display panel (PDP), a field emission display (FED) (Electro Luminescence Display Device: ELD). In general, a flat panel display panel that realizes an image is an essential component. The flat panel display panel has a pair of light emitting or polarizing material layers interposed therebetween And a transparent insulating substrate facing each other.

In recent years, there has been a growing demand for a touch screen panel capable of recognizing a touch area through a human hand or a separate input device and transmitting additional information corresponding thereto. Currently, such a touch screen panel is applied in a form attached to the outer surface of a flat panel display.

According to the touch sensing method, a resistance method, a capacitance method, and an infrared sensing method are categorized. Recently, in consideration of convenience of manufacturing method and sensing power, recently, a capacitance method is attracting attention.

2. Description of the Related Art Recently, a touch screen panel, which is used as an important input device embedded in a smart phone or a smart book, has been increasingly applied to mobile devices. Accordingly, in touch screen panel manufacturers, Efforts are being made to reduce costs.

Particularly, the manufacturing process of the touch screen panel employs a metal routing formation, a touch sensor transparent electrode patterning, a contact process for connecting transparent electrodes or metal wires of different layers, and they are commonly used for photo-lithography and Etching process. These photolithography and etching processes have a direct effect on the yield. By reducing these processes, it becomes possible to greatly reduce the manufacturing cost.

The conventional touch screen has the following problems.

When forming the X electrode and the Y electrode in the direction crossing each other and forming the X electrode pattern and the Y electrode in the same layer, a connection pattern connecting the pattern of the X electrode in the direction crossing the Y electrode in the other layer is formed In this case, a contact process is required between the X electrode pattern and the connection pattern. Particularly, such a contact process is performed through a process of photo-exposing and etching an insulating film. The patterning of such an insulating film requires a mask, and there is a problem that the number of steps increases and the yield is reduced.

It is an object of the present invention to provide a touch screen and a method of manufacturing the touch screen which can reduce the number of masks and reduce the process time by omitting the contact process of the insulating film.

According to an aspect of the present invention, there is provided a touch screen including a first electrode and a second electrode formed on a first layer and a second layer, the first electrode and the second electrode intersecting with each other, A first auxiliary electrode pattern formed on the first layer so as to overlap with the second electrode except for an intersection of the first electrode and the second electrode; A second auxiliary electrode pattern formed on the first layer, a second auxiliary electrode pattern formed on the second layer, an interlayer insulating film formed between the first layer and the second layer, a first metal routing wiring directly connected to one end of the first electrode, And a second metal routing wiring directly connected to the first auxiliary electrode pattern.

The first electrode and the second electrode, and the first auxiliary electrode pattern and the second auxiliary electrode pattern are transparent electrodes.

Wherein the first electrode is formed in a row direction or a column direction and includes a first connection pattern connecting a plurality of first electrode patterns and a neighboring first electrode pattern in the row or column direction, Includes a second connection pattern connecting a plurality of second electrode patterns and a second electrode pattern adjacent to the first electrode pattern in a line crossing the first electrode. Here, the first auxiliary electrode pattern overlaps only the second electrode pattern of the second electrode, and the second auxiliary electrode pattern overlaps only the first electrode pattern of the first electrode.

In addition, coupling capacitances are provided at overlapping portions of the first auxiliary electrode pattern and the second electrode pattern, and overlapping portions of the second auxiliary electrode pattern and the first electrode pattern, respectively. In this case, due to the coupling capacitance between the first auxiliary electrode pattern connected to the second metal routing wiring and the overlapping portion of the second electrode pattern, an electrical signal of the second electrode is electrically connected to the second metal routing wiring Or an electrical signal of the second metal routing wiring is transmitted to the second electrode.

Further, the interlayer insulating film does not have a hole penetrating between the first layer and the second layer.

The first layer may be formed on the substrate, the second layer may be formed on the interlayer insulating film, or vice versa, the second layer may be formed on the substrate, Can be formed on the insulating film. On the other hand, the substrate may be glass or a film. In this case, the substrate may be an upper substrate of the flat panel display panel, and the first and second layers may be positioned on the back side of the upper substrate.

In addition, the touch screen of the present invention for the same purpose has a substrate having a touch sensing portion in a central region thereof, a plurality of first metal routing wirings formed in the first and second directions crossing each other, A first electrode formed in the first direction on the touch sensing unit and overlapped with a portion of each of the first metal routing wirings; An interlayer insulating layer formed on the substrate to cover the first electrode and the first auxiliary electrode pattern; And a second electrode formed on the interlayer insulating film so as to overlap with the first auxiliary electrode pattern in the second direction.

In this case, an electrical signal of the second metal routing wiring is applied to the second electrode through the coupling capacitance formed at the overlapping portion of the first auxiliary electrode pattern and the second electrode.

Alternatively, an electrical signal of the second electrode may be transmitted to the second metal routing wiring through a coupling capacitance formed at an overlapping portion of the first auxiliary electrode pattern and the second electrode.

According to another aspect of the present invention, there is provided a method of manufacturing a touch screen, comprising: forming a plurality of first metal routing wirings and a plurality of second metal routing wirings in first and second directions crossing each other A first electrode connected to the first metal routing wiring in the first direction, and a first auxiliary electrode pattern spaced apart from the first electrode in the second direction, Forming an interlayer insulating film on the substrate so as to cover the first electrode and the first auxiliary electrode pattern; forming an interlayer insulating film on the interlayer insulating film so as to overlap the first auxiliary electrode pattern in the second direction, A second electrode having an intersection with the first electrode, a second auxiliary electrode pattern spaced apart from the second electrode in a shape of a line and overlapped with the first electrode, There is another feature in including the system.

Here, the first auxiliary electrode pattern adjacent to the outer edge of the substrate may overlap the second metal routing wiring.

The above-described touch screen of the present invention and its manufacturing method have the following effects.

First, the first electrode is directly formed on the upper portion of the metal routing wiring for electrical signal transmission. The second electrode includes a first auxiliary electrode pattern spaced apart from the first electrode and overlapped with the second electrode and the metal routing wiring , Electrical signals are transmitted to the metal routing wiring through the coupling capacitance defined by the interlayer insulating film between the first auxiliary electrode pattern and the second electrode. In this case, the first auxiliary electrode pattern completely overlaps with the second electrode to form a coupling capacitance having a large value, and a thin interlayer insulating film is disposed between the two layers, An electrical signal transmitted from the metal routing wiring to the first auxiliary electrode pattern is transmitted to the second electrode.

Second, in this case, it is not necessary to pattern the interlayer insulating film provided between the first electrode and the second electrode, and thus a mask required for patterning the interlayer insulating film is unnecessary, and exposure, development and etching processes for patterning the interlayer insulating film Can be omitted, and the process yield can be improved.

Third, direct sensing with metal routing wiring or signal transmission by coupling capacitance provides a similar level of sensing sensitivity to the intermetal contact process structure.

1 is a plan view showing a touch screen according to a comparative example;
2A is a circuit diagram showing a touch screen according to the first embodiment of the present invention.
2B is a circuit diagram schematically showing a connection portion of a touch sensing portion and a metal routing wiring of a touch screen according to a first embodiment of the present invention.
3 is a plan view showing a touch screen according to the first embodiment of the present invention.
4 is an enlarged view of the area A in Fig.
Figs. 5A to 5C show process plan views of region A
FIGS. 6A to 6D are cross-sectional views of steps I to I 'and II to II'
7 is a flowchart of a method of manufacturing a touch screen of the present invention
8 is a circuit diagram of a touch screen according to a comparative example
9 is a graph showing a voltage signal input to a touch screen according to the present invention and a comparative example
FIG. 10 is a graph showing the approximate touch-screen touch and the non-touch Vcs charge voltage
11 is a graph showing output results of the output voltage according to the present invention and a comparative example when the voltage signal of FIG. 9 is applied
12A is a circuit diagram illustrating a touch screen according to a second embodiment of the present invention.
12B is a circuit diagram schematically showing a connection portion of a touch sensing portion and a metal routing wiring of a touch screen according to a second embodiment of the present invention.
13 is an enlarged view of the outermost metal routing part of the touch screen and the first and second electrodes connected thereto according to the second embodiment of the present invention.
Figs. 14A to 14C are cross-

Hereinafter, a touch screen and a method of manufacturing the same according to the present invention will be described in detail with reference to the accompanying drawings.

1 is a plan view showing a touch screen according to a comparative example.

As shown in FIG. 1, the touch screen according to the comparative example includes X electrodes and Y electrodes in the direction crossing each other.

The X electrodes 20 overlap the first electrode patterns 21 adjacent to each other with the first electrode patterns 21 spaced apart from each other in the shape of a rhomboid in the lateral direction and the electrical contact portions 30 overlap the overlapped first electrode patterns 21, And a first connection pattern 21a having a first connection pattern 21a. The first connection pattern 21a is formed in a layer different from the first electrode pattern 21 and the first electrode pattern 21 and the first connection pattern 21a are formed in an interlayer insulating layer (not shown) A metal of the first connection pattern 21a is connected to the first electrode pattern 21 via the electrical contact portion 30 so that the first connection pattern 21a is electrically connected to the first electrode pattern 21, An electrical signal in the direction of the X electrode is transmitted.

The Y electrode 10 includes a second connection pattern 11a that integrally connects the second electrode patterns 11 adjacent to the second electrode patterns 11 in the shape of a rhombus in the vertical direction.

In this case, the first electrode pattern 21 of the X electrode, the second electrode pattern 11 and the second connection pattern 11a of the Y electrode are formed in the same layer, and the first connection pattern The electrical contact portion 30 is defined in the interlayer insulating film for electrical connection with the contact portion 21a.

A first metal routing wiring 31 and an outermost first electrode pattern 21 are connected to one end of each X electrode 20 and a second metal routing wiring 41 And the outermost second electrode pattern 11 are connected.

Meanwhile, between the X and Y electrodes 20 and 10, mutual capacitance Cm due to fringing capacitance is formed between the X and Y electrodes.

In this comparative example, the first electrode pattern 21, the second electrode pattern 10 and the second connection pattern 10a of the first layer and the first connection pattern 21a of the second layer are formed as transparent electrodes or Patterning for forming electrical contact portions in the interlayer insulating film for connecting the first connection pattern 21a and the first electrode pattern 21 is required. As described above, in the comparative example, a mask for patterning is required for each layer of the first layer, the second layer, and the interlayer insulating film between these layers, and there is a problem in yield reduction in the exposure and etching processes. In order to improve this, the structure change and the mask process are changed.

* First Embodiment *

FIG. 2A is a circuit diagram showing a touch screen according to a first embodiment of the present invention, and FIG. 2B is a circuit diagram schematically showing a connection portion of a touch sensing portion and a metal routing wiring of a touch screen according to a first embodiment of the present invention.

2A, the touch screen according to the first embodiment of the present invention includes resistances Rtx and Rrx (201 and 202) of first and second electrodes crossed with each other and a mutual capacitance Cm ) 203, and a coupling capacitance Cc (204) between the touch control IC for sensing the output voltage (Vout).

The sensing unit is defined as a matrix in a touch sensing unit defined at the center of the substrate (see 100 in FIGS. 6A to 6D). As shown in FIG. 2B, the matrix is formed in a direction intersecting each other The first electrode and the second electrode connected to the first metal routing wiring X0, X1, X2, ..., Xm and the second metal routing wiring Y0, Y1, Y2, ..., (See FIG. 3). Here, the sensing unit is formed at each intersection of the first electrode and the second electrode.

Each of the first metal routing wiring and the second metal routing wiring is connected to a pad electrode (refer to 150 in Fig. 3) provided at one side of the substrate, and the pad electrode 150 is connected to a flexible cable Printed Cable (see 160 in Fig. 3).

The first metal routing wiring is applied with an input voltage signal Vin for touch sensing and the second metal routing wiring detects a voltage from a connected second electrode and is connected to the pad electrode through the FPC, The touch controller IC provided in the FPC senses the amplified output voltage Vout.

The coupling capacitance Cc is formed by the inter-layer overlapping auxiliary electrode pattern and the electrode pattern (see FIG. 4). The coupling capacitance Cc is formed corresponding to the sensing unit in each matrix within the matrix of the touch sensing unit for sensing touch sensing, In the sensing unit, the sensing unit is formed symmetrically in four directions and has the same value. In the sensing unit, the sensing unit does not change its value depending on whether or not the sensing is performed, and does not greatly affect sensing operation.

The coupling capacitance Cc is most largely affected by the second metal routing wiring which is the connection portion between the second metal routing wiring and the touch sensing portion and which is not directly in contact with the second metal routing wiring, The two electrodes have an effect similar to the inter-metal contact through the coupling capacitance Cc between the second electrode and the first auxiliary electrode pattern.

In the first embodiment shown in the figure, the coupling capacitance is shown near the connection of the second metal routing wiring for outputting the voltage. In this case, the pad electrode connected to the second metal routing wiring is touch- The output voltage Vout is detected in the IC.

The touch control IC amplifies and senses the current sensed through the metal routing line 132 by the OP-amp 210. The lead-out line is connected to the (-) input terminal, The reference voltage Vref is applied to the input terminal. The voltage Vout output from the output terminal is an amplified value of the sensed voltage value. Here, a feedback capacitor (Cs) 220 is formed between the (-) input terminal and the output terminal.

On the other hand, the transmission resistance Rtx formed at the first electrode is defined in connection with the first metal routing wiring receiving the input voltage Vin, and the transmission resistance Rrx formed at the second electrode is a voltage And is connected to the second metal routing wiring.

In the first embodiment, an input voltage Vin is transmitted to the first metal routing wiring, and a coupling capacitance Cc (n) is provided between the touch sensing unit and the second metal routing wiring in the touch sensing unit having the sensing unit as a matrix. The two-metal routing wiring and the touch controller IC are connected to each other, and the output voltage Vout is sensed.

Hereinafter, the specific configuration of the touch sensing unit including the routing wiring will be described with reference to the drawings.

FIG. 3 is a plan view of a touch screen according to a first embodiment of the present invention, and FIG. 4 is an enlarged view of a region A in FIG.

As shown in FIGS. 3 and 4, the touch screen according to the first embodiment of the present invention includes a first electrode 1100 (see FIG. 3) formed in a first layer and a second layer on a substrate 100, (See 115 in FIG. 6D) formed between the first layer and the second layer, and a second electrode 1200 (see FIG. 5C) formed directly between one end of the first electrode and the second layer And a second metal routing wiring 132 formed outside the touch sensing unit in a direction intersecting with the first metal routing wiring 131 and the first metal routing wiring 132 connected thereto.

The first electrode 1100 is formed in a row direction and includes a first connection pattern 110a connecting a plurality of first electrode patterns 110 and a first electrode pattern 110 adjacent to each other in the row direction, .

The second electrode 1200 connects the plurality of second electrode patterns 120 and the adjacent second electrode patterns 120 in a direction crossing the first electrode 1100 And a second connection pattern 120a.

The first auxiliary electrode 1100 and the second auxiliary electrode 1200 overlap the second electrode pattern 120 of the second electrode 1200 except for the intersection of the first electrode 1100 and the second electrode 1200, A pattern 111 is formed and a second auxiliary electrode pattern 121 overlaps with the first electrode pattern 110 of the first electrode 1100 and is formed on the second layer.

Here, the first electrode pattern 110, the first connection pattern 110a, and the first auxiliary electrode pattern 111 are formed on the same first layer, and the second electrode pattern 120, The second auxiliary electrode pattern 120a and the second auxiliary electrode pattern 121 are formed in the same second layer.

A coupling capacitance Cca in the column direction is formed between the overlapping portions of the first electrode pattern 110 and the second auxiliary electrode pattern 121 with an interlayer insulating film interposed therebetween, 120 and the first auxiliary electrode pattern 111 are formed with a coupling capacitance Ccb in the row direction via an interlayer insulating film.

The first electrode 1100 and the second electrode 1200 and the first auxiliary electrode pattern 111 and the second auxiliary electrode pattern 121 are formed on the lower surface of the touch screen And a transparent electrode.

Here, the interlayer insulating layer 115 does not have a hole penetrating between the first layer and the second layer.

A coupling capacitance is formed between the overlapping portion of the first auxiliary electrode pattern 111 and the second electrode pattern 120 and the overlapping portion of the second auxiliary electrode pattern 121 and the first electrode pattern 110, Cca, Ccb). When the overlap areas are the same, the coupling capacitances Cca and Ccb are the same.

The first auxiliary electrode pattern 111 connected to the second metal routing wiring 132 (Y0, Y1, Y2, ..., Yn) and the coupling portion of the overlapping portion of the second electrode pattern 120 The electrical signal of the second electrode 1200 is transferred to the second metal routing wiring 132 (Y0, Y1, Y2, ..., Yn) by the electrostatic capacitance Ccb, The electrical signals of the wirings 132 (Y0, Y1, Y2, ..., Yn) are transmitted to the second electrode 1200. The former case is connected to a touch control IC which outputs an output voltage through a pad electrode of the second metal routing wiring 132. In the latter case, an input voltage is applied through a pad electrode.

The first layer 1100 and the first auxiliary electrode 111 may be located on the substrate 100. The second layer may be formed on the interlayer insulating layer 115 ). ≪ / RTI > Alternatively, the second layer may be formed on the substrate 100, and the first layer may be formed on the interlayer insulating layer 115.

The substrate 100 may be a glass substrate or an insulating film. In this case, the substrate 100 can be used as an upper substrate of a flat panel display panel such as a liquid crystal display panel, an organic light emitting display panel, a plasma display panel, a quantum dot display panel, an electrophoretic panel, And may be located on the back side of the upper substrate.

On the other hand, the first auxiliary electrode pattern 111 may be positioned only corresponding to the connection portion of the second metal routing wiring 132, and may be omitted in the remaining region of the touch sensing portion. That is, it may be formed only for the purpose of coupling capacitance for electrical signal transmission with the second metal routing wiring 132. Also in this case, the interlayer insulating film between the first and second layers is formed entirely in the touch sensing portion, and the interlayer insulating film can be formed without a contact portion.

Hereinafter, a method of manufacturing a touch screen of the present invention will be described with reference to the drawings.

Figs. 5A to 5C are process plan views of region A, and Figs. 6A to 6D are process sectional views of I to I 'and II to II' lines of Fig. 3, respectively. 7 is a flowchart of a method of manufacturing the touch screen of the present invention.

As shown in FIGS. 5A and 6A, a metal having high light-shielding conductivity is first deposited on the substrate 100 and then selectively removed to form a first routing wiring 131 in a direction crossing the touch sensing unit, And a second routing wiring 132 are formed (10S). The first routing wiring 132 and the second routing wiring 132 are connected to the electrodes in the row direction and the column direction, respectively, and contact one side of the electrode formed in the touch sensing unit. The first and second routing wirings are connected to a pad electrode (not shown) formed on one side of the substrate 100 so as to be gathered on one side of the substrate 100 along the edge of the substrate. The pad electrode may be formed together with the first and second routing wirings 131 and 132 in the same process.

Next, the transparent electrodes of the first layer are deposited on the substrate 100, and then the transparent electrodes are selectively removed. As shown in FIGS. 5B and 6B, the first electrodes, which are connected to the first routing wiring 132 in the row direction, And a first auxiliary electrode pattern 111 separated from the first electrode in a column direction and formed in a columnar shape in a column direction (20S).

3 and 5B, the first electrode 1100 includes a first connection pattern 110a connecting a first electrode pattern 110 and a first electrode pattern 110 adjacent to each other. The first electrode pattern 110 and the first connection pattern 110a are integrally formed. The electrode formed at the end of the first electrode pattern 110 in the row direction has a triangular shape in which the rhombic shape is bisected and the side in contact with the first metal routing wiring 131 side is a hypotenuse. The first metal routing wiring 131 has a protruding pattern protruding in the shape of the first metal routing wiring 131 so as to have a portion directly connected to the first metal routing wiring 131. In this case, the protruding pattern may have the same shape as the first metal routing wiring 131, or may be formed overlapping only a part of the connection portion of the touch sensing portion and the first metal routing wiring 131. In some cases, the first metal routing wiring 131 and the side surface contact of the first electrode pattern 110 may have a configuration. In this case, the contact area may be small and the resistance may be large. Therefore, It is preferable to cover the upper portion of the first metal routing wiring 131.

The first auxiliary electrode pattern 111 is formed in the same layer as the first electrode 1100, and is formed in a shape of a star, separated from the edge of the first electrode 1100. And the second electrode pattern formed when the transparent electrode of the second layer after the first auxiliary electrode pattern 111 is patterned. Accordingly, the first auxiliary electrode pattern 111 on the island has a diamond shape, and the shape formed at the end of the column direction has a triangular shape in which the diamond shape is divided into two parts. Also in this case, similarly to the connection structure of the first metal routing wiring 131 and the first electrode pattern 110, the first auxiliary electrode pattern 111 also has the shape of the second metal routing wiring 132 Respectively.

 6C, an interlayer insulating layer 115 is formed on the entire surface of the substrate 100 on which the first and second metal routing wirings 131 and 132, the first electrode 1100, and the first auxiliary electrode pattern 111 are formed. (30S).

5C and 6D, the first auxiliary electrode pattern 111 and the second auxiliary electrode pattern 111 are formed on the interlayer insulating layer 115 in the column direction, A second electrode 1200 having an intersection with the first electrode 110 and a first electrode pattern 110 of the first electrode 1100 separated from the second electrode 1200, The second auxiliary electrode pattern 121 overlapping the second auxiliary electrode pattern 121 is formed (40S).

3 and 5C, the second electrode 1200 includes a second connection pattern 120a connecting the second electrode pattern 120 and the second electrode pattern 120 adjacent to each other. The second electrode pattern 120 and the second connection pattern 120a are integrally formed. The electrode formed at the end of the second electrode pattern 120 in the column direction has a triangular shape in which the rhombic shape is bisected and the side in contact with the second metal routing wiring 132 side is a hypotenuse. In this case, between the second electrode patterns 120, which are in contact with the second metal routing wiring 132 and overlapped with the first auxiliary electrode pattern 111, a coupling (not shown) A capacitance is formed to mediate electrical signal transmission between the second metal routing wiring 132 and the second electrode 1200.

The second auxiliary electrode pattern 121 is formed on the same layer as the second electrode 1200, and is formed in a shape of a prism separated from the second electrode 1200. This is in conformity with the first electrode pattern 110. Therefore, the second auxiliary electrode pattern 121 on the island has a rhombic shape of a substantially rectangular shape, and the shape formed at the end of the row direction has a triangular shape that is divided into rhombic halves.

As described above, in the method of manufacturing a touch screen of the present invention, the contact portion forming step can be omitted in the interlayer insulating film forming step, and the masking process and the process yield can be improved by simplifying the process by omitting the step of patterning the insulating film.

The sensing sensitivity of the touch screen formed by the manufacturing method of the present invention and the touch screen formed by the manufacturing method of the touch screen according to the comparative example of the structure of FIG. 1 are as follows.

8 is a circuit diagram of a touch screen according to a comparative example.

8, the sensing unit of the touch screen according to the comparative example follows a serial configuration of a transmission resistance Rtx 31, a mutual capacitance Cm 32, and a reception resistance Rrx 33, The controller IC also follows a configuration similar to that of the first embodiment of the present invention of the OP-amp 40 and feedback capacitor Cs. However, no separate coupling capacitance is interposed between the touch controller IC and the sensing portion, which means that the connection from the sensing portion to the metal routing wiring is directly connected to the electrode and the metal routing wiring through the contact process.

FIG. 9 is a graph illustrating a voltage signal input to a touch screen according to the present invention and a comparative example, and FIG. 10 is a graph illustrating a schematic touch time of a touch screen and a non-touch Vcs charge voltage.

As shown in FIG. 9, the input voltage (Vin) signal input to the touch screen is a square wave, and the drive time of one cycle is about 2 to 3 μs. In general, a plurality of intersections between the first electrode and the second electrode are provided so that the mutual capacitance Cm increases proportionally as shown in FIG. 10, and in the case of touching, the amount of current that is grounded by the finger And the difference between the charging voltage values is read to detect the touch.

11 is a graph showing output voltage signal results according to the present invention and a comparative example when the voltage signal of FIG. 9 is applied.

The output voltage values according to the configuration according to the first embodiment of the present invention and the comparison according to FIG. 1 are substantially simulated through a sensing unit. The transmission resistance Rtx, the reception resistance Rtx, and the mutual capacitance Cm And finally the output voltage is detected. The output voltage signal has a delay element having a time constant (T = Rtx + Rrx) * Cm and has an output as shown in FIG.

It can be seen that the detected output voltage value shows a slight decrease tendency in the present invention, but it has a waveform at a level similar to that of the comparative example with a decrease value of about 5% of the comparative example. As a result, as in the first embodiment of the present invention, by the electrical signal transmission between the second metal routing wiring and the second electrode in the coupling capacitance configuration rather than the direct contact on the second metal routing wiring side, This is possible.

* Second Embodiment *

12A is a circuit diagram showing a touch screen according to a second embodiment of the present invention, and FIG. 12B is a circuit diagram schematically showing a connection portion of a touch sensing portion and a metal routing wiring of a touch screen according to a second embodiment of the present invention.

12B, the touch screen according to the second embodiment of the present invention has a coupling capacitance between the side of the first metal routing wiring 131 (X0, X1, X2, ..., Xm) (Cc) < / RTI >

In this case, the first metal routing wiring 131 is connected to a pad electrode to which an input voltage Vin for touch detection is applied.

12A, the touch sensing unit is defined by resistances Rtx and Rrx 201 and 202 of the first electrode and the second electrode formed to intersect with each other and a mutual capacitance Cm 203 between them The sensing unit is arranged in a matrix.

The sensing unit is defined as a matrix in a touch sensing unit defined at the center of the substrate (refer to 100 in FIGS. 6A to 6D). As shown in FIG. 12B, the matrix is formed in a direction intersecting each other The first electrode and the second electrode connected to the first metal routing wiring X0, X1, X2, ..., Xm and the second metal routing wiring Y0, Y1, Y2, ..., (See FIG. 3). Here, the sensing unit is formed at each intersection of the first electrode and the second electrode.

Each of the first metal routing wiring 131 and the second metal routing wiring 132 is connected to a pad electrode (see 150 in Fig. 3) provided at one side of the substrate, and the pad electrode 150 is connected to a touch controller IC (Refer to 160 in Fig. 3).

The first metal routing wiring is applied with an input voltage signal Vin for touch sensing and the second metal routing wiring detects a voltage from a connected second electrode and is connected to the pad electrode through the FPC, The touch controller IC provided in the FPC senses the amplified output voltage Vout.

The coupling capacitance Cc is formed by the first auxiliary electrode pattern 310 and the second electrode pattern 330 overlapping each other (refer to FIG. 13 to FIG. 14C) However, in the sensing unit, the sensing unit is formed symmetrically in four directions and has the same value. In the sensing unit, the sensing unit does not change its value depending on whether or not the sensing is performed.

The coupling capacitance Cc has the greatest effect as shown in FIG. 12B, which is the connection portion between the first metal routing wiring 131 and the touch sensing portion. The first metal routing The wiring and the second electrode 3300 have an effect similar to the intermetallic contact through the coupling capacitance Cc between the second electrode pattern 330 and the first auxiliary electrode pattern 310. [

In the illustrated second embodiment, the coupling capacitance is shown in the first metal routing wiring and the touch sensing portion connecting the input voltage. In this case, as shown in FIG. 3, the second metal routing wiring The output voltage (Vout) is detected in the touch control IC through the pad electrode connected to the FPC.

The touch control IC amplifies and senses the current sensed through the second metal routing wiring 132 by the OP-amp 210. The lead-out line is connected to the (-) input terminal, +) Input terminal is applied with a reference voltage Vref. The voltage Vout output from the output terminal is an amplified value of the sensed voltage value. Here, a feedback capacitor (Cs) 220 is formed between the (-) input terminal and the output terminal.

In the second embodiment, an input voltage Vin is transmitted to the first metal routing wiring, and a coupling capacitance Cc (n) is provided between the touch sensing unit and the second metal routing wiring in the touch sensing unit having the sensing unit as a matrix. And the two-metal routing wiring and the touch controller IC are connected, and the output voltage Vout is sensed.

FIG. 13 is an enlarged view of an outermost metal routing part of a touch screen and first and second electrodes connected to the outermost metal routing part according to the second embodiment of the present invention, and FIGS. 14A to 14C are process plan views of FIG.

As shown in FIG. 14A, first, metal having a high light-shielding conductivity is deposited on a substrate (see 100 in FIG. 3) and then selectively removed to form a first routing wiring 131 And the second routing wiring 132 are formed. The first routing wiring 132 and the second routing wiring 132 are connected to the electrodes in the row direction and the column direction, respectively, and contact one side of the electrode formed in the touch sensing unit. 3, the first and second routing wirings 131 and 132 are formed on one side of the substrate 100 along the edge of the substrate 100, Not shown). The pad electrode may be formed together with the first and second routing wirings 131 and 132 in the same process.

Next, the first transparent electrode is deposited on the substrate 100 and then selectively removed to form a first electrode 3200 (see FIG. 14B) directly connected to the second routing wiring 132 in the column direction, And a first auxiliary electrode pattern 310 spaced apart from the first electrode 3200 in a row direction.

The first electrode 3200 includes a first connection pattern 320a connecting the first electrode pattern 320 and the first electrode pattern 320 adjacent to each other. The first electrode pattern 320 and the first connection pattern 320a are integrally formed. The electrode formed at the end of the first electrode pattern 320 in the column direction has a triangular shape in which the rhombic shape is bisected and the side in contact with the second metal routing wiring 132 side is a hypotenuse. And has a protruding pattern protruding in the shape of the second metal routing wiring 132 so as to have a portion directly connected to the second metal routing wiring 132. In this case, the protruding pattern may have the same shape as the second metal routing wiring 132, or may be formed overlapping only a part of the connection portion of the touch sensing portion and the second metal routing wiring 132. In some cases, the second metal routing wiring 132 and the side surface contact of the first electrode pattern 320 may have a configuration. In this case, the contact area may be small and the resistance may be large. Therefore, It is preferable to cover the upper portion of the second metal routing wiring 132.

The first auxiliary electrode pattern 310 is formed in the same layer as the first electrode 3200, and is formed in a shape of a prism, spaced apart from the edge of the first electrode 3200. And the second electrode pattern formed when the transparent electrode of the second layer after the first auxiliary electrode pattern 320 is patterned. Accordingly, the first auxiliary electrode pattern 310 on the island has a rhombic shape, and the shape formed at the end of the row direction has a triangular shape that is divided into rhombic halves. Also in this case, similarly to the connection structure between the second metal routing wiring 131 and the first electrode pattern 320, the first auxiliary electrode pattern 310 also has the shape of the first metal routing wiring 131 Respectively.

 6C) is formed on the entire surface of the substrate 100 on which the first and second metal routing wirings 131 and 132, the first electrode 3200 and the first auxiliary electrode pattern 310 are formed. .

Then, the transparent electrode of the second layer is deposited and then selectively removed to overlap the first auxiliary electrode pattern 310 in the row direction on the interlayer insulating layer 115 as shown in FIG. 14C, A second electrode 3300 having an intersection with the first electrode 3200 is formed and the first electrode 3200 is overlapped with the first electrode pattern 320 of the first electrode 3200, A second auxiliary electrode pattern 340 is formed.

The second electrode 3300 includes a second connection pattern 330a connecting the second electrode pattern 330 and the second electrode pattern 330 adjacent to each other. The second electrode pattern 330 and the second connection pattern 330a are integrally formed. The electrode formed at the end of the second electrode pattern 330 in the row direction has a triangular shape in which the rhombic shape is bisected and the side in contact with the first metal routing wiring 131 side is a hypotenuse. In this case, between the second electrode pattern 330 which is in contact with the first metal routing wiring 131 and overlaps with the first auxiliary electrode pattern 310, a coupling (interlayer insulating film) 115 interposed therebetween A capacitance is formed to mediate electrical signal transmission between the first metal routing wiring 131 and the second electrode 3300.

The second auxiliary electrode pattern 340 is formed on the same layer as the second electrode 3300, and is formed in a shape of a prism separated from the second electrode 3300. This is in conformity with the first electrode pattern 320. Accordingly, the second auxiliary electrode pattern 340 on the island has a diamond shape of a generally rectangular shape, and the shape formed at the end of the column direction has a triangular shape that is divided into two by a rhomboidal shape.

As described above, the second embodiment shows an example in which coupling capacitance is formed in the first metal routing wiring to which an input signal for touch detection is applied and the touch sensing unit.

In some cases, a voltage output signal for touch detection may be transmitted to the first metal routing wiring, and a voltage input signal for touch detection may be applied to the second metal routing wiring wiring side. In this case as well, as described in the first and second embodiments, the coupling capacitance can be formed in either of the metal routing wirings. That is, the metal routing wiring on one side is directly connected to the electrode, the metal routing wiring on the other side is connected to the auxiliary electrode pattern overlapping the electrode, and then the coupling capacitance at the overlapped portion between the electrode and the auxiliary electrode pattern It is possible to transmit an electrical signal. In any case, the interlayer insulating film between the first electrode and the second electrode has a shape that is formed entirely without a hole for a contact portion.

Meanwhile, the interlayer insulating layer may be partially removed in the step of forming the pad electrode when forming the protective film on the top portion after forming the first and second electrodes.

The interlayer insulating film may be an inorganic insulating film of, for example, an oxide film (SiO2) or a nitride film (SiNx), or may be an organic insulating film of an acrylic resin component such as photoacryl.

On the other hand, the thickness of the interlayer insulating film is set to a thickness of 4000 ANGSTROM or less for an inorganic insulating film, and the thickness is set to 1 to 3 mu m for an organic insulating film.

While the present invention has been described in connection with what is presently considered to be the most practical and preferred embodiment, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. Will be apparent to those of ordinary skill in the art.

100: substrate 110: first electrode pattern
110a: first connection pattern 111: first auxiliary electrode pattern
115: interlayer insulating film
120: second electrode pattern 120a: second connection pattern
121: second auxiliary electrode pattern 131: first metal routing wiring
132: second metal routing wiring 150: pad electrode
160: FPC 1100: first electrode
1200: second electrode

Claims (18)

A first electrode and a second electrode formed on the first and second layers different from each other in a direction intersecting with each other;
A first auxiliary electrode pattern formed on the first layer so as to overlap the second electrode except an intersection of the first electrode and the second electrode;
A second auxiliary electrode pattern formed on the second layer so as to overlap with the first electrode except for the intersection of the first electrode and the second electrode;
An interlayer insulating film formed between the first layer and the second layer;
A first metal routing wiring directly connected to one end of the first electrode; And
And a second metal routing wiring directly connected to the first auxiliary electrode pattern. The method according to claim 1,
Wherein the first electrode and the second electrode, and the first auxiliary electrode pattern and the second auxiliary electrode pattern are transparent electrodes. 3. The method of claim 2,
Wherein the first electrode is formed in a row direction or a column direction and includes a first connection pattern connecting a plurality of first electrode patterns and a neighboring first electrode pattern in the row or column direction,
Wherein the second electrode includes a second connection pattern connecting a plurality of second electrode patterns and a second electrode pattern adjacent to the first electrode pattern in a line crossing the first electrode. The method of claim 3,
Wherein the first auxiliary electrode pattern overlaps only the second electrode pattern of the second electrode, and the second auxiliary electrode pattern overlaps only the first electrode pattern of the first electrode. The method according to claim 1,
Wherein an overlapping portion of the first auxiliary electrode pattern and the second electrode pattern and an overlapping portion of the second auxiliary electrode pattern and the first electrode pattern have coupling capacitances, respectively. 6. The method of claim 5,
An electrical signal of the second electrode is transmitted to the second metal routing wiring by the coupling auxiliary capacitance between the first auxiliary electrode pattern connected to the second metal routing wiring and the overlapping portion of the second electrode pattern Wherein the touch screen is a touch screen. 6. The method of claim 5,
An electrical signal of the second metal routing wiring is transmitted to the second electrode by the first auxiliary electrode pattern connected to the second metal routing wiring and the coupling capacitance of the overlapping portion of the second electrode pattern Wherein the touch screen is a touch screen. The method according to claim 1,
Wherein the interlayer insulating film does not include a hole penetrating between the first layer and the second layer. The method according to claim 1,
Wherein the first layer is formed on a substrate, and the second layer is formed on the interlayer insulating film. The method according to claim 1,
Wherein the second layer is formed on a substrate, and the first layer is formed on the interlayer insulating film. The method according to claim 1,
Wherein the substrate is a glass or a film. 11. The method according to claim 9 or 10,
Wherein the substrate is an upper substrate of the flat panel display panel, and the first and second layers are positioned on the back side of the upper substrate. A substrate having a touch sensing portion in a central region thereof;
A plurality of first metal routing wirings and second metal routing wirings formed outside the touch sensing unit and formed in first and second directions intersecting with each other;
A first electrode overlappingly connected to a portion of each of the first metal routing wirings and formed in the first direction in the touch sensing portion;
A first auxiliary electrode pattern formed overlappingly with a part of each of the second metal routing wirings and formed on the touch sensing portion;
An interlayer insulating film formed on the substrate to cover the first electrode and the first auxiliary electrode pattern; And
And a second electrode formed on the interlayer insulating film so as to overlap with the first auxiliary electrode pattern in the second direction. 14. The method of claim 13,
Wherein an electrical signal of the second metal routing wiring is applied to the second electrode through a coupling capacitance formed at an overlapping portion of the first auxiliary electrode pattern and the second electrode. 14. The method of claim 13,
And an electrical signal of the second electrode is transmitted to the second metal routing wiring through a coupling capacitance formed at an overlapping portion of the first auxiliary electrode pattern and the second electrode. 14. The method of claim 13,
Wherein the substrate is a glass or a film. Forming a plurality of first metal routing wirings and a plurality of second metal routing wirings in first and second directions intersecting with each other at an outer periphery of the substrate;
Forming a first electrode connected to each of the first metal routing wirings in the first direction and forming a first auxiliary electrode pattern spaced apart from the first electrode in the second direction and formed in a shape of a line;
Forming an interlayer insulating film on the substrate so as to cover the first electrode and the first auxiliary electrode pattern;
Forming a second electrode overlapping the first auxiliary electrode pattern in the second direction on the interlayer insulating film and having an intersection with the first electrode, separating the second electrode from the first electrode, And forming a second auxiliary electrode pattern which overlaps with the second auxiliary electrode pattern. 18. The method of claim 17,
Wherein the first auxiliary electrode pattern adjacent to the outer edge of the substrate overlaps the second metal routing wiring.

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