KR20130030368A - Plasma photocatalyst filter - Google Patents
Plasma photocatalyst filter Download PDFInfo
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- KR20130030368A KR20130030368A KR1020110093786A KR20110093786A KR20130030368A KR 20130030368 A KR20130030368 A KR 20130030368A KR 1020110093786 A KR1020110093786 A KR 1020110093786A KR 20110093786 A KR20110093786 A KR 20110093786A KR 20130030368 A KR20130030368 A KR 20130030368A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/80—Type of catalytic reaction
- B01D2255/802—Photocatalytic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0892—Materials to be treated involving catalytically active material
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- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- Toxicology (AREA)
- Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Catalysts (AREA)
Abstract
Description
The present invention relates to a plasma photocatalyst filter, and more particularly, the filter itself is used as a plasma generating electrode, and the photocatalyst is coated thereon to simultaneously perform plasma treatment, filtration and photocatalytic reaction, thereby maximizing treatment efficiency. It relates to a photocatalyst filter.
The technology related to plasma generation and treatment is widely used in various fields such as surface modification of materials, air purification, and water treatment in semiconductor processes, even though the outline is not explained. It is well known that there are hundreds of related patent applications. It is true.
Recently, as well-being has emerged as a social issue, interest in air cleaning is increasing, and the Ministry of Environment is also tightening regulations on indoor air purification of various buildings including industries.
For example, factories equipped with various manufacturing facilities, hospitals and laboratories that require cleanliness, offices, department stores, hotel lobbies, etc. where people come and go, homes, restaurants, etc., various dust, soot (SOx, NOx, etc.), Air is easily contaminated by VOCs, CFCs, bacteria, viruses, and fungi that live in cigarette smoke and dust, which causes various respiratory diseases, odors, and secondary infections caused by pathogens through contaminated air. The problem of harm to health has been raised, and numerous air sterilization and purification techniques have been proposed and disclosed to solve the problem.
In addition, in the field of water treatment, E. coli, viruses, bacteria, erythrocytes, T. bacteria, cholera bacteria, tuberculosis bacteria, Pseudomonas aeruginosa contained in drinking water, domestic water, and industrial water as well as waste water to prevent water pollution. Various types of treatment techniques have been disclosed in which plasma technology is applied to sterilization and purification of pathogens such as tetanus and tetanus.
As related technologies, Patent Publication No. 2000-0059884 'Air Purification Device', Patent Publication No. 2005-0004638 'Plasma Filter for Air Sterilization and Hazardous Gas Decomposition', and Publication Patent No. 2003-0092205 'Low Temperature Plasma and Photocatalyst Noxious gas treatment apparatus using filter ', Published Patent No. 2004-0085249' Air purification apparatus and method using a plasma filter having a three-dimensional cell structure ', Published Patent No. 2010-0123786,' Multiple fine plasma generating system ', Published patent 2009-0013061 'Plasma Deodorizer', Journal of the Korean Institute of Electrical Engineers Vol. 56, No. 1 (2007.01, Author: Shin Yoon Shin, Jae Duck) "A Study on Harmful Gas and Particle Removal Characteristics of Corona Discharge Plasma Filter in Combination with Photocatalyst", Korea Air Cleaning Association 2005.06, Vol. 69, Photocatalyst Special Edition, "Air-Cleaning System Using Low Temperature Plasma / Photocatalyst" (Professor, Yonsei Univ. Korean Patent Application No. 2001-34024, "High Efficient Hazardous Gas Purification System Using Microwaves," Korean Patent Application No. 2001-340, including papers on Byun Jung-hoon, Park Jae-hong and Yoon Ki-young). Korean Patent Application No. 2001-46294 "A sterilization and sterilization apparatus using high density plasma and its method, Korean Utility Application No. 2002-9234" Sterilization and cleanness " Composite lighting device having a function "; Korean Patent Application No. 2001-80359" Sewage sterilization apparatus using large-capacity high-efficiency ultraviolet rays ", Korean Utility Application No. 2002- A large number of prior arts have been disclosed, such as 5822 "High Efficiency Sterilization System Using Vibration Stirring Means" and Korean Application No. 2002-30525 "High Efficiency Ultraviolet Sterilization System Using Vortex".
Although the plasma processing technology has been usefully applied to various fields in various forms as described above, most of the application technologies related to air purification and cleaning are separate implementations of plasma single treatment, separate filtering technology, and separate photocatalyst technology. And even if they are integrated, when looking at the aspects of the technologies disclosed so far, the individual components are simply assembled into a single unit and modularized, so that large-capacity processing is difficult, and for large-capacity processing, a complex structure is required rather than a simple structure. There is a disadvantage that the cost of equipment increases exponentially.
In addition, almost all of the disclosed plasma processing techniques are focused on the development of technologies that enable efficient processing in a uniform space and confined spaces. Therefore, large-area processing through asymmetric plasma generation is repeated while generating and extinguishing plasma. Possible forms of technology development are underdeveloped.
In addition, the filtration technology focuses only on the development of filters such as electrostatic precipitating filters, HEPA filters, ULPA filters, activated carbon and carbon filters, prefilters, medium filters and manganese filters. There is very little association with each other, and most of them are implemented to only cover the air filtration function after the plasma treatment.
As an example of the more advanced technology, efforts have been made to increase the treatment effect by combining the low temperature plasma and the photocatalyst as described in the above-mentioned paper.
Low temperature plasma is a plasma generated through a kind of dielectric barrier discharge that discharges using a dielectric as an inclusion, unlike a plasma generated by corona discharge.
Such low-temperature plasma has the advantage of excellent processing efficiency because of high electron density and high electron energy. However, this low temperature plasma has a capacity limit that can be processed over a large area, and for the air purification and treatment, a separate filter system is used as in the conventional form. It still has the structural limitations it must have.
Another development focus of the prior art related to plasma processing is to improve the structure of the electrode to increase the plasma generation efficiency.
However, it has been confirmed that the disclosed techniques are almost exclusively limited to the shape of the electrodes such as spire, needle, reticulated, lattice, etc., and have not been disclosed for improvement of the electrode itself.
The present invention was created in view of the above-mentioned problems in the prior art, and was created to solve this problem. As a concept that does not exist in the past, a pair of electrodes that are opposed to each other is necessary for plasma generation, but is essential for air cleaning. By implementing the filter itself to be included directly into one electrode for plasma generation, it is possible to realize a single plasma-filter module that is actually integrated, rather than simply attaching two separate components, and activated by low temperature plasma. The main purpose of the present invention is to provide a plasma photocatalyst filter which is applied to the filter itself so that the function of the plasma-photocatalyst-filter can be realized as one single unit, thereby increasing processing efficiency and generating asymmetric plasma over a large area. There is this.
It is another object of the present invention to provide a plasma photocatalyst filter having a single electrode pair structure which is also integrated with each other around a member having a dielectric function.
The present invention is a means for achieving the above object, an electrode used in a plasma processing apparatus, a base having a structure through which harmful gas can pass to include a filter function, a conductive photocatalyst layer applied to the outer surface of the base An anode electrode; It provides a plasma photocatalyst filter comprising a cathode electrode disposed opposite to the photocatalyst layer constituting the anode electrode, the cathode electrode having a structure that can pass harmful gases.
In addition, the present invention is an electrode used in the plasma processing apparatus, an anode comprising a base having a structure through which harmful gas can pass to include a filter function, a conductive photocatalyst layer applied to the outer surface of the base; A cathode electrode disposed to face the photocatalyst layer constituting the anode electrode and having a structure through which harmful gas can pass; It is disposed between the anode electrode and the cathode electrode, the anode electrode and the cathode electrode is fixed to each side integrally attached to one surface, the gap maintaining member is a breathable insulator; provides a plasma photocatalyst filter comprising a.
In this case, in the plasma filter having the gap holding member, a sub-anode electrode is further provided at a distance from the anode electrode and electrically connected to the anode electrode, and the sub-anode electrode also has a structure that allows fluid to pass therethrough. There is a characteristic.
According to the present invention, since the plasma generating electrode and the filter are integrated, the structure is simple, the manufacturing cost is low, the large-capacity processing over a large area is easy, and the processing efficiency can be obtained.
1 is an exemplary schematic cross-sectional view showing the basic structure of a plasma photocatalyst filter according to the present invention.
2 is an exemplary cross-sectional view showing a modification of the plasma photocatalyst filter according to the present invention.
3 is an exemplary cross-sectional view showing another modified example of the plasma photocatalyst filter according to the present invention.
Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.
[First Embodiment]
Plasma photocatalyst filter according to the present invention, as the term appears, is ultimately a filter, but the main feature is that the filter itself constitutes an electrode to enable plasma generation.
In addition, the plasma photocatalyst filter according to the present invention is an air purifier or an air purifier or a part that is embedded in a unit or a housing that implements an air purification or clean system. Configuration only).
More specifically, as shown in Figure 1, the plasma photocatalyst filter according to the present invention is the cathode electrode and the cathode which is spaced apart from the
In this case, the
In other words, the
As a result, the
Meanwhile, as shown in FIG. 1, the
In this case, the
In addition, the
In addition, the
Nevertheless, if the efficiency is low, it is possible to extend the lifespan and to use ultraviolet light emitting diodes (UV-LEDs) suitable for high-capacity processing as photocatalytic activation means.
In this case, as the photocatalyst for implementing the
As such, since the
Accordingly, the
That is, the plasma photocatalyst filter according to the first embodiment of the present invention does not have a structure in which a dielectric is interposed between the
Here, the thickness of the
Therefore, the low temperature plasma generated between the
In addition, the low temperature plasma excites the photocatalyst of the
Here, the photocatalytic oxidation reaction is a well-known matter, so it is not necessary to explain it. However, in order to clarify the process of treating harmful gases, when the photocatalyst is activated, the photocatalyst is activated in VB (Valence Band) and CB (Conduction Band), respectively. a hole (h +) and the excited electrons (e -) - formed by hydroxyl radicals by their high reactivity are formed and these and a hydroxyl radical (OH) and active oxygen (O 2) in the air, water and oxygen to react Refers to a strong oxidation reaction and free radicals to reduce organic matter.
For example, oxidative reaction of organic compounds, waste treatment of organic acids or cyanide, decomposition of chlorinated hydrocarbons, and the like, when photons are adsorbed on the semiconductor surface, the light energy hv is the semiconductor bond energy. If it is greater than or equal to, electrons are emitted from the valence band of the semiconductor.
hv + solid ----- → h + + e -
In this case, light rays in the near ultraviolet region are required, and in the case of the n-type semiconductor, the potential of the charged portion in the semiconductor is changed to move the photon holes to the surface. When TiO 2 particles are irradiated with ultraviolet rays, the following reactions occur.
TiO 2 ------- → TiO 2 (e - cb + h + vb )
The generated electrons and photon holes move to traps on the surface,
e - cb ------- → e - tr
h - vb ------- → h + tr
At this time, when oxygen is present on the surface of the photocatalyst, a superoxide anion radical is generated by acting as a reducing agent in the surface pores.
e - tr + O 2 → O 2 ------ -
On the other hand, the negative ions adsorbed on the surface react with the photon holes to form OH radicals.
e - tr + OH - ------ → OH
Photon holes also oxidize water or react with hydroxide ions on the particle surface to form OH radicals.
h - tr + H 2 O ------ → OH + H +
Mechanism of photocatalytic oxidation reactions electron and electron hole is H 2 O, OH - oxidation with - OH radical to participate in the reduction reaction is electron hole is H 2 O, OH -, oxidation with an adsorbent material, such as organic compounds, O 2 Produced by the reaction.
E is O 2 to participate in the reduction reaction of the adsorbed oxygen - to generate, wherein O 2 - is reacted with H 2 O sometimes generate OH radicals. The OH radical is the most important oxidant in the photocatalytic oxidation of organic matter.
As such, charge-holes form in the semiconductor, where both materials move to a surface that can recombine or react with adsorbents. The holes or electrons formed through this process will disappear through one of the following three reactions.
First, the photocatalytic reaction is as follows.
Aad (adsorbent A) + h + → (Aad) +
Bad (adsorbent B) + e cb - → ( Bad) -
(Aad) + + (Bad) - → product
In this reaction, the generated holes and electrons finally recombine, but the light energy already absorbed is used to supply the activation energy of the reaction.
The semiconductor used in the reaction remains unchanged.
Second is the change response of the lattice.
h + + grid → (grid) +
(Grid) + → lattice reaction products
In the case of the 'grid change reaction', the semiconductor used in the reaction changes as the reaction proceeds. The semiconductor used in the reaction remains unchanged. In fact, sulfide-based semiconductors such as CdS easily cause photocorrosion in aqueous solution by irradiation of light.
Third is the recombination reaction of electrons and holes.
h + + e cb - → heat
The recombination reaction between electrons and holes is a case where the generated holes and electrons recombine directly without participating in the photocatalytic oxidation reaction.
Since organic matter is decomposed through such a process, in the present invention, since low temperature plasma, photocatalysis by photocatalyst, and filtering are simultaneously performed, the separate components are connected to each other as if they were configured as one module. It will be appreciated that other new structures have been implemented and that this will maximize the processing efficiency.
[Second Embodiment]
The second embodiment according to the present invention has the conceptual structure as shown in FIG.
As shown in FIG. 2, the plasma photocatalyst filter according to the second embodiment of the present invention has a structure in which the
In this case, the
The
Accordingly, the electrode itself can be integrated into a single assembly, so assembly and installation and maintenance are easy, and the gap is fixed and maintained in a predetermined state, so that an electrode assembly having various gaps can be made according to the design according to the design at the time of initial production. Has
In particular, the plasma photocatalyst filter according to the second embodiment of the present invention is suitable for a dielectric barrier discharge method capable of generating low-temperature plasma, and above all, a large-capacity treatment for a large area when the flow of fluid is low It is possible and the processing efficiency can be maximized.
In addition, in the second embodiment of the present invention, the
At this time, electron avalanche is the electron in the material is accelerated by the electric field and collides with atoms or molecules of the material to ionize them to make secondary electrons, the original electron and secondary electrons are accelerated again by the electric field Collisions create tertiary electrons, and this process is repeated to increase the number of electrons exponentially.
In other words, in the present invention, when charge accumulation occurs in the
[Third Embodiment]
The third embodiment according to the present invention has the conceptual structure as shown in FIG.
As shown in FIG. 3, in the plasma photocatalyst filter according to the third embodiment of the present invention, the
At this time, the
However, depending on the control state, the amount of application to be distributed to the
For example, when an application amount of "100" is applied to the
When the
At this time, it is obvious that the
In addition, of course, the
In addition, if necessary, a plurality of conventional filters may be further interposed in the space between the
In addition, the structure of this third embodiment can be applied to the above-described first embodiment as it is.
By inverting the existing plasma electrode concept and establishing a new concept, high-efficiency processing that has not been achieved is possible, and large-scale processing over a large area can be easily implemented, but manufacturing cost is low, and installation and management are easy. First of all, the asymmetrical plasma generation and the generation and dissipation of ions and electrons can be repeated to rapidly process high density.
100: anode electrode 110: base
120: photocatalytic layer 140: sub-anode electrode
200: cathode electrode 300: gap holding member
Claims (3)
An anode comprising a base having a structure through which harmful gas can pass to include a filter function, and a conductive photocatalyst layer applied to an outer surface of the base;
And a cathode electrode disposed to face the photocatalyst layer constituting the anode and spaced apart from each other, the cathode electrode having a structure through which harmful gas can pass.
An anode comprising a base having a structure through which harmful gas can pass to include a filter function, and a conductive photocatalyst layer applied to an outer surface of the base;
A cathode electrode disposed to face the photocatalyst layer constituting the anode electrode and having a structure through which harmful gas can pass;
And a gap retaining member disposed between the anode electrode and the cathode electrode, wherein the gap retaining member is a breathable insulator in which the anode electrode and the cathode electrode are integrally attached and fixed to one surface of each surface.
And a sub anode electrode electrically connected to the anode electrode at a distance from the anode electrode, wherein the sub anode electrode also has a structure that allows fluid to pass therethrough.
Priority Applications (1)
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KR1020110093786A KR20130030368A (en) | 2011-09-19 | 2011-09-19 | Plasma photocatalyst filter |
Applications Claiming Priority (1)
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KR1020110093786A KR20130030368A (en) | 2011-09-19 | 2011-09-19 | Plasma photocatalyst filter |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210130878A (en) | 2020-04-22 | 2021-11-02 | 김창환 | Plasma air cleaner |
-
2011
- 2011-09-19 KR KR1020110093786A patent/KR20130030368A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20210130878A (en) | 2020-04-22 | 2021-11-02 | 김창환 | Plasma air cleaner |
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