KR20120130593A - liquid crystal display and method for an examination of a line of the same - Google Patents

liquid crystal display and method for an examination of a line of the same Download PDF

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Publication number
KR20120130593A
KR20120130593A KR1020110048649A KR20110048649A KR20120130593A KR 20120130593 A KR20120130593 A KR 20120130593A KR 1020110048649 A KR1020110048649 A KR 1020110048649A KR 20110048649 A KR20110048649 A KR 20110048649A KR 20120130593 A KR20120130593 A KR 20120130593A
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KR
South Korea
Prior art keywords
line
gate
data
inspection pattern
inspection
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KR1020110048649A
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Korean (ko)
Inventor
원대현
신창엽
이루다
진목규
Original Assignee
엘지디스플레이 주식회사
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Priority to KR1020110048649A priority Critical patent/KR20120130593A/en
Publication of KR20120130593A publication Critical patent/KR20120130593A/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1345—Conductors connecting electrodes to cell terminals
    • G02F1/13458—Terminal pads
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/69—Arrangements or methods for testing or calibrating a device

Abstract

PURPOSE: A liquid crystal display and a method for examining a line of the same are provided to measures a signal waveform which is supplied to a specific data line through a FPC(flexible printed circuit) pad even if laser welding is performed on an overlap region of a test pattern line and a data line. CONSTITUTION: Gate lines(11) are prepared on a substrate. Data lines(31) are crossed toward the gate lines. A pattern line for test(7) is overlapped with at least one among the gate lines and the data lines. If laser welding is performed on an overlap region of the pattern line for test and a gate connection line, the signal waveform which is supplied to the gate connection line through a specific gate line to a FP pad through the pattern line for test.

Description

Liquid crystal display and method for an examination of a line of the same}

The embodiment relates to a liquid crystal display device.

The embodiment relates to a line inspection method of a liquid crystal display device.

Various display devices capable of displaying information are being developed. The display device is, for example, a liquid crystal display device, a plasma display panel device, an electrophoretic display device, an organic electro-luminescence display device and a semiconductor. And a semi-conductor light-emitting display device. Among them, liquid crystal displays have excellent image quality, light weight, thin shape, low power consumption, and the like, and are attracting attention as representative display devices. For example, liquid crystal displays are widely used in cell phones, navigation, notebook computers, and televisions.

In the manufacturing process of the liquid crystal display device, a thin film transistor manufacturing process, a color filter manufacturing process, a liquid crystal cell manufacturing process, and a module manufacturing process proceed sequentially. In the thin film transistor manufacturing process, defects of the gate line or the data line may be caused. In the module manufacturing process, a poor contact between the gate driver and the gate line or a poor contact between the data driver and the data line may be caused.

 In the related art, a method of detecting whether a gate line or a data line is defective by measuring a waveform applied to a specific line by removing a color filter substrate has been proposed. However, this method has a problem that the panel is damaged due to the impact on the panel.

The embodiment provides a liquid crystal display device capable of detecting a defect on a specific line.

The embodiment provides a liquid crystal display device capable of measuring a waveform of a specific line.

The embodiment provides a line inspection method of a liquid crystal display device capable of detecting a defect on a specific line.

The embodiment provides a line inspection method of a liquid crystal display device capable of measuring a waveform of a specific line.

According to an embodiment, a liquid crystal display includes: a plurality of gate lines on a substrate; A plurality of data lines crossing the plurality of gate lines; An inspection pattern line overlapping the plurality of gate lines and the plurality of data lines; And an FPC pad electrically connected to the inspection pattern line.

According to an embodiment, a line inspection method of a liquid crystal display includes: forming a gate line and an inspection pattern line on a substrate; Forming a gate connection line crossing the gate line and connected to the data line and the gate line overlapping the inspection pattern line and overlapping the inspection pattern line; Laser welding a welding point where the gate connection line and the data line and the inspection pattern line overlap with each other during line inspection of the gate line or data line; And measuring a waveform with the inspection pattern line.

According to an exemplary embodiment, a line inspection method of a liquid crystal display includes: forming a gate line and a data connection line in a direction crossing the gate line on a substrate; A data line connected to the data connection line; Forming an inspection pattern line overlapping the data connection line and the gate line; Performing laser welding on a welding point where the gate line and the data connection line and the inspection pattern line overlap with each other when inspecting the gate line or the data line; And measuring a waveform with the inspection pattern line.

According to an embodiment, a line inspection method of a liquid crystal display includes: forming a gate line on a substrate; Forming a data line crossing the gate line; Forming an inspection pattern line overlapping the gate line and the data line; Performing laser welding on a welding point at which the gate line and the data line and the inspection pattern line overlap with each other when inspecting the gate line or the data line; And measuring a waveform with the inspection pattern line.

In an embodiment, defect detection on a specific line is possible.

In an embodiment, waveform measurement on a specific line is possible.

1 is a schematic diagram of a liquid crystal display.
FIG. 2A is an enlarged view of the liquid crystal display according to the first exemplary embodiment of region a of FIG. 1.
FIG. 2B is a cross-sectional view of a thin film transistor, a gate line, and a data line of the liquid crystal display of FIG. 2A.
2C is a diagram illustrating a line inspection method of a liquid crystal display according to a first embodiment.
2D is a cross-sectional view of a gate connection line in the line inspection method of the liquid crystal display according to the first embodiment.
FIG. 3A is an enlarged view of a liquid crystal display according to a second exemplary embodiment of region a of FIG. 1.
3B is a cross-sectional view of a gate line and a data line of the liquid crystal display of FIG. 3A.
FIG. 4A is an enlarged view of a liquid crystal display according to a third exemplary embodiment of region a of FIG. 1.
4B is a cross-sectional view of a gate line and a data line of the liquid crystal display of FIG. 4A.

1 is a schematic diagram of a liquid crystal display.

As shown in FIG. 1, the liquid crystal display according to the present invention includes a liquid crystal panel 9 including a display area 71 for displaying an image and a non-display area 73 for not displaying an image.

The display area 71 may include a plurality of pixel areas, and the non-display area 73 may include a gate driver 1, a data driver 3, and an FPC pad 5.

The plurality of pixel regions is defined by the intersection of the plurality of gate lines 11 and the plurality of data lines 31. The plurality of gate lines 11 are formed along a first direction, and the plurality of data lines 31 are formed along a second direction, that is, along a direction crossing the gate line 11.

The thin film transistor 20 is electrically connected to the gate line 11 and the data line 31 of the pixel region.

One side of the gate line 11 may be electrically connected to the gate driver 1, and the other side of the gate line 11 may be formed to overlap the inspection pattern line 7. In other words, the gate line 11 may be formed between the gate driver 1 and the inspection pattern line 7 and on the inspection pattern line 7.

One side of the data line 31 may be electrically connected to the data driver 3, and the other side of the data line 31 may be formed to overlap the inspection pattern line 7. In other words, the data line 31 may be formed between the data driver 3 and the inspection pattern line 7 and on the inspection pattern line 7.

Therefore, the inspection pattern line 7 may be formed to overlap the other side of the gate line 11 and the other side of the data line 31.

The FPC pad 5 may be electrically connected to a PCB substrate (not shown) for signal exchange between the outside and the liquid crystal panel 9. The FPC pad 5 may be electrically connected to the gate driver 1, the data driver 3, and the inspection pattern line 7.

For example, the FPC pad 5 receives a gate control signal, a data control signal, a data signal, etc. from a PCB substrate, supplies the gate control signal to the gate driver 1, and supplies the data control signal and the data signal. Can be supplied to the data driver 3.

In addition, the FPC pad 5 may receive an inspection signal from the inspection pattern line 7 and supply the inspection signal to the PCB substrate. The inspection signal supplied to the PCB substrate may determine whether the gate line or the data line is defective.

The FPC pad 5 may be disposed adjacent to the data driver 3.

The inspection pattern line 7 may be disposed along an edge area of the liquid crystal panel 9.

The inspection pattern line 7 may be formed in a '-' shape so as to overlap the plurality of gate lines 11 and the plurality of data lines 31.

2A and 2B illustrate a liquid crystal display according to a first embodiment.

FIG. 2A is an enlarged view of the liquid crystal display according to the first exemplary embodiment of region a of FIG. 1.

Referring to FIG. 2A, the liquid crystal display according to the first exemplary embodiment may include a thin film transistor 20, a gate line 11, a data line 31, and an inspection pattern line 7.

The gate line 11 is formed along a first direction and the data line 31 is formed along a second direction crossing the gate line 11. The pixel region is defined by the intersection of the gate line 11 and the data line 31.

The thin film transistor 20 may be electrically connected to the gate line 11 and the data line 31.

The thin film transistor 20 may include a gate electrode 21, a source electrode 22, a drain electrode 23, and a semiconductor layer 29.

The gate line 11 may be electrically connected to the gate electrode 21 of the thin film transistor 20, and the data line 31 may be electrically connected to the source electrode 22 of the thin film transistor 20. .

The gate electrode 21 may protrude from the gate line 11, and the source electrode 22 may protrude from the data line 31.

A pixel electrode 27 electrically connected to the drain electrode 23 of the thin film transistor 20 may be formed in the pixel region. The pixel electrode 27 may be formed of a transparent conductive material. The conductive material may be one of ITO, IZO, and ITZO.

One side of the gate line 11 may be electrically connected to the gate driver 1, and the other side of the gate line 11 may be electrically connected to the gate connection line 15. The gate line 11 and the gate connection line 15 may be connected through a gate contact hole 13.

The gate connection line 15 may be formed in the same direction as the gate line 11, that is, along the first direction. One side of the gate connection line 15 may be connected to the gate line 11 through the gate contact hole 13. The other side of the gate connection line 15 may be formed to overlap the inspection pattern line 7. The gate connection line 15 is formed on the inspection pattern line 7 and extends from the gate contact hole 13 to at least the gate contact hole 13 so as to be connected to the gate line 11 through the gate contact hole 13. Can be electrically connected.

One side of the data line 31 may be electrically connected to the data driver 3, and the other side of the data line 31 may be formed to overlap the inspection pattern line 7.

The inspection pattern line 7 may be formed in a '-' shape so as to overlap the plurality of gate connection lines 15 and the plurality of data lines 31. The inspection pattern line 7 may be formed of a gate metal. The inspection pattern line 7 may be formed on the same layer as the same material as the gate line 11.

FIG. 2B is a cross-sectional view of a thin film transistor, a gate line, and a data line of the liquid crystal display of FIG. 2A.

Referring to FIG. 2B, a first pattern group including a gate electrode 21, a gate line 11, and an inspection pattern line 7 is formed on the substrate 51. The gate electrode 21 is formed in the pixel region. The gate line 11 may be formed along the first direction. The gate electrode 21 may be electrically connected to the gate line 11. The gate electrode 21 may protrude from the gate line 11. The gate electrode 21, the gate line 11, and the inspection pattern line 7 may be formed of a gate metal. The gate metal may be at least one selected from the group consisting of Ti, Cr, Ni, Al, Pt, Au, W, Cu, Group. ≪ / RTI >

A gate insulating layer 53 is formed on the substrate 51 including the first pattern group. The gate insulating layer 53 is a layer for electrically separating the lines and electrodes of the first pattern group from the second pattern group to be formed in the future. Insulation characteristics are required, and the gate insulating layer 53 is formed of silicon nitride (SiNx) or silicon oxide (SiOx). It may include an inorganic insulating material such as or an organic insulating material such as benzocyclobutene (BCB).

A gate contact hole 13 may be formed through the gate insulating layer 53 to expose the gate line 11.

The semiconductor layer 29 may be formed on the gate insulating layer 53. The semiconductor layer 29 may be formed in the pixel area. The semiconductor layer 29 may include a channel layer 24 formed on the gate insulating layer 53, a source region 25 and a drain region 26 formed on both sides of the channel layer 24. Can be.

A second pattern group including a source electrode 22, a drain electrode 23, a data line 31, and a gate connection line 15 is formed on the gate insulating layer 53 including the semiconductor layer 29. do.

The data line 31 is formed along a second direction crossing the gate line 11. One side of the data line 31 may be electrically connected to the data driver 3. The other side of the data line 31 may be formed to overlap the inspection pattern line 7.

The source electrode 22 may be formed on the source region 25 of the semiconductor layer 29. The source electrode 22 may be electrically connected to the data line 31. The source electrode 22 may protrude from the data line 31.

The drain electrode 23 may be formed on the drain region 26 of the semiconductor layer 29.

The gate connection line 15 is formed along the first direction. One side of the gate connection line 15 may be connected to the gate line 11 through the gate contact hole 13. The other side of the gate connection line 15 may overlap the inspection pattern line 7. A weld P may be formed in an area where the gate connection line 15 and the inspection pattern line 7 overlap each other.

The inspection pattern line 7 may be formed in a '-' shape so as to overlap the plurality of gate connection lines 15 and the plurality of data lines 31.

The source electrode 22, the drain electrode 23, the data line 31, and the gate connection line 15 may be formed of data metal. The data metal may be at least one selected from the group consisting of Ti, Cr, Ni, Al, Pt, Au, W, Cu, Group. ≪ / RTI >

A protective layer 55 is formed on the gate insulating layer 53 including the second pattern group. The protective layer 55 serves to protect main materials such as transistors from the outside, and may include an inorganic insulating material such as silicon nitride (SiNx) or silicon oxide (SiOx) or an organic insulating material such as benzocyclobutene (BCB). have.

A pixel contact hole 28 through which the drain electrode 23 is exposed may be formed through the protective layer 55.

The pixel electrode 27 may be formed in the pixel area on the passivation layer 55. The pixel electrode 27 may be electrically connected to the drain electrode 23 through the pixel contact hole 28.

2C is a diagram illustrating a line inspection method of the liquid crystal display according to the first embodiment, and FIG. 2D is a cross-sectional view of a gate connection line in the line inspection method of the liquid crystal display according to the first embodiment.

2C and 2D, the inspection pattern line 7 overlaps the plurality of gate connection lines 15 and the plurality of data lines 31.

In order to inspect a specific line of the liquid crystal display, laser welding is performed on a region where a specific line to be measured and an inspection pattern line overlap. Through the laser welding, different metal layers of the overlapping regions may be electrically connected to form a connection portion Q.

For example, in the gate connection line 15 of FIG. 2D, laser welding is performed on a region where the gate connection line 15 and the inspection pattern line 7 overlap each other, thereby forming the gate connection line 15 in different metal layers. ) And the inspection pattern line 7 may be electrically connected to form a connection portion Q.

When laser welding is performed in a region where the gate connection line 15 and the inspection pattern line 7 overlap, a signal waveform applied to the gate connection line 15 is electrically connected through a specific gate line 11. The test pattern line 7 may be applied to the FPC pad 5. Therefore, the waveform applied to the specific gate line can be measured from the outside through the FPC pad, so that there is no impact on the substrate and the measurement is easier than the conventional method of removing the color substrate and measuring the waveform.

Even when the laser welding is performed in an area where the data line 31 and the inspection pattern line 7 overlap, the waveform applied to a specific data line can be externally measured through the FPC pad.

In order to perform line inspection on a plurality of lines, laser welding is performed on one line, and the waveform is measured. Then, the area adjacent to the inspection pattern line of the measured line is disconnected with a laser to make a cutout portion R, and the laser welding is performed on another line. By performing a method of measuring a waveform, a line inspection of a plurality of lines is possible.

3A and 3B illustrate a liquid crystal display according to a second embodiment.

FIG. 3A is an enlarged view of a liquid crystal display according to a second exemplary embodiment of region a of FIG. 1.

The second embodiment is almost identical to the first embodiment except that the inspection pattern line is formed of data metal.

Therefore, in the description of the second embodiment, the same reference numerals are assigned to the same elements as the first embodiment, and detailed description thereof will be omitted.

The gate line 11 is formed along the first direction. One side of the gate line 11 may be electrically connected to the gate driver 1, and the other side of the gate line 11 may overlap the inspection pattern line 107.

The data line 31 may be formed along a second direction crossing the gate line 11. One side of the data line 31 may be electrically connected to the data driver 3, and the other side of the data line 31 may be electrically connected to the data connection line 135. The data line 31 and the data connection line 135 may be connected through a data contact hole 133.

The data connection line 135 may be formed in the same direction as the gate line 11, that is, in a second direction. One side of the data connection line 135 may be electrically connected to the data line 31, and the other side of the data connection line 135 may overlap the inspection pattern line 107. The data connection line 135 is formed on the inspection pattern line 107 and extends from the data contact hole 133 to at least the data contact hole 133 and the data line 31 through the data contact hole 133. Can be electrically connected.

The inspection pattern line 107 may be formed in a '-' shape so as to overlap the plurality of gate lines 11 and the plurality of data connection lines 135. The inspection pattern line 107 may be formed of a data metal. The inspection pattern line 107 may be formed on the same layer as the same material as the data line 31.

3B is a cross-sectional view of a gate line and a data line of the liquid crystal display of FIG. 3A.

Referring to FIG. 3B, a first pattern group including a gate line 11 and a data connection line 135 is formed on the substrate 51.

The gate line 11 may be formed along the first direction. One side of the gate line 11 may be electrically connected to the gate driver 1, and the other side of the gate line 11 may be formed to overlap the inspection pattern line 107.

The data connection line 135 may be formed along a second direction. The gate line 11 and the data connection line 135 may be formed of a gate metal.

A gate insulating layer 53 is formed on the substrate 51 including the first pattern group.

A data contact hole 13 may be formed through the gate insulating layer 53 to expose the data connection line 135.

A second pattern group including the data line 31 and the inspection pattern line 107 may be formed on the gate insulating layer 53. The data line 31 and the inspection pattern line 107 may be formed of a data metal.

One side of the data line 31 may be electrically connected to the data driver 3, and the other side of the data line 31 may be electrically connected to the data connection line 135 through the data contact hole 13. have.

One side of the data connection line 135 may be electrically connected to the data line 31, and the other side of the data connection line 135 may overlap the inspection pattern line 107.

The inspection pattern line 107 may be formed in a '-' shape so as to overlap the plurality of gate lines 11 and the plurality of data connection lines 135.

A protective layer 55 is formed on the gate insulating layer 53 including the second pattern group.

The line inspection method of the liquid crystal display according to the second embodiment is the same as the line inspection method according to the first embodiment of FIGS. 2C and 2D.

4A and 4B illustrate a liquid crystal display according to a third embodiment.

FIG. 4A is an enlarged view of a liquid crystal display according to a third exemplary embodiment of region a of FIG. 1.

The third embodiment is almost identical to the first embodiment except that the inspection pattern line is formed of a transparent conductive material.

Therefore, in the description of the third embodiment, the same reference numerals are assigned to the same components as the first embodiment, and detailed description thereof will be omitted.

The gate line 11 is formed along the first direction. One side of the gate line 11 may be electrically connected to the gate driver 1, and the other side of the gate line 11 may be formed to overlap the inspection pattern line 207.

The data line 31 may be formed along a second direction crossing the gate line 11. One side of the data line 31 may be electrically connected to the data driver 3, and the other side of the data line 31 may be formed to overlap the inspection pattern line 207.

The inspection pattern line 207 may be formed in a '-' shape so as to overlap the plurality of gate lines 11 and the plurality of data lines 31. The inspection pattern line 207 may be formed of a transparent conductive material. The inspection pattern line 207 may be formed on the same layer as the same material as the pixel electrode 27 in the pixel area.

4B is a cross-sectional view of a gate line and a data line of the liquid crystal display of FIG. 4A.

Referring to FIG. 4B, the gate line 11 is formed on the substrate 51. The gate line 11 may be formed along the first direction. One side of the gate line 11 may be electrically connected to the gate driver 1, and the other side of the gate line 11 may be formed to overlap the inspection pattern line 207. The gate line 11 may be formed of a gate metal.

A gate insulating layer 53 is formed on the substrate 51 including the gate line 11.

The data line 31 is formed on the gate insulating layer. The data line 31 may be formed along a second direction crossing the gate line 11. One side of the data line 31 may be electrically connected to the data driver 3, and the other side of the data line 31 may be formed to overlap the inspection pattern line 207. The data line 31 may be formed of a data metal.

A protective layer 55 is formed on the gate insulating layer 53 including the data line 31.

An inspection pattern line 207 is formed on the protective layer 55. The inspection pattern line 207 may be formed in a '-' shape so as to overlap the plurality of gate lines 11 and the plurality of data lines 31. The inspection pattern line 207 may be formed of a transparent conductive material. The inspection pattern line 207 may be formed on the same layer as the same material as the pixel electrode 27 in the pixel area.

By forming the inspection pattern line 207 on the same layer as the pixel electrode 27, a gate contact hole or a data contact hole for adding a gate connection line or a data connection line in comparison with the first and second embodiments is formed. Since it is not necessary to form, one mask process can be omitted, which is advantageous in terms of production efficiency.

The line inspection method of the liquid crystal display according to the third embodiment is the same as the line inspection method according to the first embodiment of FIG. 2C.

1: gate driver 3: data driver
5: FPC pad 7, 107, 207: inspection pattern line
11: gate line 13: gate contact hole
15: gate connection line 20: thin film transistor
31: data line 133: data contact hole
135: data connection line 51: board
53: gate insulating layer 55: protective layer
Q: Connection R: Cut

Claims (16)

A plurality of gate lines on the substrate;
A plurality of data lines crossing the plurality of gate lines; And
And a test pattern line formed to overlap at least one of the plurality of gate lines and the plurality of data lines. The method of claim 1,
And an FPC pad electrically connected to the inspection pattern line. The method of claim 2,
And the gate line, the data line, the inspection pattern line, and the FPC pad are formed in a liquid crystal panel. The method of claim 3,
And the inspection pattern line is formed along an edge area of the liquid crystal panel. The method of claim 1,
A thin film transistor connected to the gate line and the data line; And
And a pixel electrode connected to the thin film transistor. The method of claim 5,
And the inspection pattern line is formed on the same layer as any one of the gate line, the data line, and the pixel electrode. The method according to claim 6,
When the inspection pattern is formed on the same layer as the gate line,
And a gate connection line connected to the gate line and overlapping the inspection pattern line. The method of claim 7, wherein
And the gate connection line is formed on the same layer as the data line. The method according to claim 6,
When the inspection pattern is formed on the same layer as the data line,
And a data connection line connected to the data line and overlapping the inspection pattern line. 10. The method of claim 9,
And the data connection line is formed on the same layer as the gate line. Forming a gate line and an inspection pattern line on the substrate;
Forming a gate connection line crossing the gate line and connected to the data line and the gate line overlapping the inspection pattern line and overlapping the inspection pattern line;
Laser welding a region where the gate connection line and the data line and the inspection pattern line overlap with each other during line inspection of the gate line or data line; And
A line inspection method of a liquid crystal display device comprising the step of measuring a waveform with the inspection pattern line. The method of claim 11,
Disconnecting the laser welded gate connection line or data line; And
And laser welding in an area where the other gate connection line or data line and the inspection pattern line which are not disconnected overlap. Forming a gate line and a data connection line in a direction crossing the gate line on the substrate;
A data line connected to the data connection line; Forming an inspection pattern line overlapping the data connection line and the gate line;
Laser welding a region where the gate line and the data connection line and the inspection pattern line overlap with each other when inspecting the gate line or the data line; And
A line inspection method of a liquid crystal display device comprising the step of measuring a waveform with the inspection pattern line. The method of claim 13,
Disconnecting the laser welded gate line or data connection line;
And laser welding to a region where the other gate line or data line which is not disconnected and the pattern line for inspection overlap. Forming a gate line on the substrate;
Forming a data line crossing the gate line;
Forming an inspection pattern line overlapping the gate line and the data line;
Laser welding a region in which the gate line and the data line and the inspection pattern line overlap with each other during line inspection of the gate line or data line; And
A line inspection method of a liquid crystal display device comprising the step of measuring a waveform with the inspection pattern line. 16. The method of claim 15,
Disconnecting the laser welded gate line or data line;
And laser welding to a region where the other gate line or data line which is not disconnected and the pattern line for inspection overlap.

KR1020110048649A 2011-05-23 2011-05-23 liquid crystal display and method for an examination of a line of the same KR20120130593A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020237888A1 (en) * 2019-05-29 2020-12-03 深圳市华星光电半导体显示技术有限公司 Display panel and detection method therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020237888A1 (en) * 2019-05-29 2020-12-03 深圳市华星光电半导体显示技术有限公司 Display panel and detection method therefor

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