KR20120123406A - Light-emitting device - Google Patents

Abstract

The present invention provides a light emitting device (1) having a plurality of organic EL elements having a configuration capable of forming an organic EL element having a different film thickness of a common layer with a small number of steps depending on the type of the organic EL element (11). do. The light emitting device is arranged between the support substrate, the partition walls 3 of a plurality of lines extending in a row direction different from the column direction at predetermined intervals in the predetermined column direction, and the partition walls adjacent to each other in the column direction. And a plurality of organic EL elements arranged at predetermined intervals in the direction, wherein the plurality of organic EL elements are classified into m types of organic EL elements, each of which has a common layer commonly provided in all kinds of organic EL elements; And an organic EL element having a pair of electrodes arranged to sandwich the common layer therebetween, and viewed from one side in the thickness direction of the support substrate, an area between the partition walls adjacent in the column direction is provided between the partition walls. The film thickness of the common layer of each organic EL element is set according to the area | region between partition walls seen from one side of the thickness direction.

Description

Light Emitting Device {LIGHT-EMITTING DEVICE}

The present invention relates to a light emitting device.

There are various display devices, such as a liquid crystal display device and a plasma display device. One of them is a display device using an organic electroluminescent (hereinafter referred to as EL) element as a light source of a pixel.

The organic EL elements are arranged in alignment with the substrate in the display device. Further, on the substrate, partition walls of a plurality of lines for separating the organic EL elements are arranged in a stripe shape. In other words, the concave portions of the plurality of lines divided by the partition walls of the plurality of lines are provided on the substrate in the form of stripes. Moreover, the some organic electroluminescent element is each provided in the recessed part of a several line, and the direction which a recessed part extends from each recessed part (henceforth "the direction which a recessed part extends" is called a row direction, and is perpendicular | vertical to this row direction. Direction, for example, in the column direction).

In the color display apparatus using organic electroluminescent element, three types of organic electroluminescent element which emits any one kind of light among red, green, and blue is usually provided in order to express desired color. For example, a color display device repeats three rows of the following (I) to (III) in which a plurality of organic EL elements emitting red, green, or blue are arranged in each recess, and is arranged in this order in the column direction. Is realized:

(I) a row in which a plurality of organic EL elements emitting red light are arranged at predetermined intervals,

(II) a row in which a plurality of organic EL elements emitting green light are arranged at predetermined intervals,

(III) A row in which organic EL devices emitting blue light are arranged at predetermined intervals.

An organic EL element is comprised including a pair of electrode and the light emitting layer provided between this electrode. The three types of organic EL elements can be produced by forming a light emitting layer for emitting one kind of light among red, green, and blue according to the type of organic EL element. In this case, it is necessary to form a light emitting layer that emits light of a predetermined color in a predetermined row (concave portion) according to the type of organic EL element. For example, in the case of forming a light emitting layer that emits red light, the red light is supplied by supplying ink containing a material to be a light emitting layer that emits red light to a row (concave portion) in which the light emitting layer should be formed, and solidifying it. The light emitting layer which emits light can be formed. The light emitting layer that emits blue or green light is similarly formed using a material that serves as the light emitting layer that emits light of a corresponding color. As described above, when three kinds of light emitting layers are formed in predetermined rows (concave portions), it is necessary to separately apply corresponding ink according to the rows (concave portions) in which various light emitting layers are formed.

The organic EL element may have not only a light emitting layer but also a hole injection layer, a hole transport layer, etc. between electrodes. Layers that do not affect the light emission color as compared with the light emitting layer, such as a hole injection layer, a hole transporting layer, etc., are common to all three types of organic EL devices irrespective of the light emission of the organic EL devices, that is, regardless of the type of the organic EL devices. It can provide as a layer (henceforth a common layer). Therefore, if all the common layers of all kinds of organic EL elements are formed with the same film thickness, the common layers of all three kinds of organic EL elements can be formed by the same process. That is, it is not necessary to apply | coat the ink containing the material used as a common layer according to predetermined row (concave part) separately.

However, for example, in order to adjust the distance between a pair of electrodes for the purpose of generating optical resonance, the film thickness of a common layer may differ for every kind of organic electroluminescent element. In order to adjust the film thickness of a common layer according to the kind of organic electroluminescent element, even if the material of a common layer is common to all three types of organic electroluminescent element, it is necessary to set the application amount of ink according to the kind of organic electroluminescent element. . That is, in order to form a common layer with a thick film thickness, it is necessary to make the quantity more than the application amount of the ink at the time of forming a common layer with a thin film thickness. Therefore, in the prior art, even if it is a common layer, the ink was apply | coated separately according to the kind of organic electroluminescent element similarly to a light emitting layer (for example, refer patent document 1).

Japanese Patent Publication No. 2009-164236

As described above, in the conventional art, since the common layer is formed in different steps for each type of organic EL device, there is a problem that the number of steps increases.

Accordingly, it is an object of the present invention to provide a light emitting device having a plurality of organic EL elements having a structure capable of forming an organic EL element having a different film thickness of a common layer according to the type of organic EL element with a small number of steps. .

The present invention provides the following [1] to [9].

[1] support substrates,

A plurality of lines of barrier ribs provided on the support substrate and extending in a row direction different from the column direction at predetermined intervals in a predetermined column direction on the support substrate;

A light emitting device including a plurality of organic electroluminescent elements provided at predetermined intervals in a row direction between each of adjacent partition walls in a column direction,

The plurality of organic electroluminescent devices are classified into two or more organic electroluminescent devices that emit light of different colors, respectively, and each is disposed between the common layer and the common layer, which are commonly provided in all kinds of organic electroluminescent devices. Having a pair of electrodes interposed therebetween,

As seen from one side of the thickness direction of the said support substrate, each area between the partition walls adjacent in a column direction is set for every kind of organic electroluminescent element provided between partition walls,

The film thickness of the common layer of each organic electroluminescent element is set according to the area between partition walls seen from one side of the said thickness direction.

[2] The above-mentioned [1], wherein the two or more organic electroluminescent elements are

In the row direction, organic electroluminescent elements of the same kind are provided at predetermined intervals,

A light emitting device provided in a row direction such that a predetermined array of all kinds of permutations of the two or more organic electroluminescent elements is arranged repeatedly so as to be continuous in the column direction.

[3] In the above [1] or [2], each partition wall has a side surface facing the partition wall adjacent in the column direction extending flat in the row direction,

A light emitting device in which each of the spaces between the partition walls adjacent to each other in the column direction is set for each type of organic electroluminescent element provided between the partition walls.

[4] The light emitting device according to any one of [1] to [3], wherein the plurality of organic electroluminescent devices are arranged at predetermined intervals such that the centers of the organic electroluminescent devices are equally spaced in the column direction. Device.

[5] The above-mentioned [1] or [2], wherein the spaces of the partition walls adjacent to each other in the column direction are arranged along the row direction in accordance with the type of the organic electroluminescent element provided between the partition walls. ) Is set to change.

[6] The organic electric field according to any one of the above [1] to [5], wherein the area between the partition walls adjacent in the column direction is viewed from one side in the thickness direction of the support substrate. The film thickness of the common layer of a light emitting element is set so that it may become the film thickness which optical resonance generate | occur | produces in an organic electroluminescent element.

[7] The organic material according to any one of [1] to [6], wherein the area between the partition walls adjacent to each other in the column direction is disposed between the partition walls as viewed from one side in the thickness direction of the support substrate. A light emitting device in which an emission wavelength of an electroluminescent element is set shorter and wider.

[8] The organic electroluminescent device according to any one of [1] to [7], wherein the organic electroluminescent device is set so that the width of the row direction of the organic electroluminescent device having the shortest device lifetime is widest among two or more organic electroluminescent devices. Light emitting device.

[9] The organic electroluminescent device according to any one of [1] to [8], wherein each organic electroluminescent element has a plurality of common layers,

The film thickness of all the common layers of each organic electroluminescent element is set according to the area between partition walls seen from one side of the said thickness direction.

In the present invention, since a common layer having a different film thickness can be formed in the same process according to the type of organic EL device, a light emitting device having a plurality of organic EL devices having a structure that can be formed with a small number of steps can be realized. Can be.

1 is a plan view schematically showing a light emitting device of an embodiment according to the present invention.
2 is a cross-sectional view schematically showing a light emitting device.
FIG. 3 is a diagram schematically showing a light emitting device in which the organic EL element having the shortest element lifetime among m kinds of organic EL elements is an organic EL element having the widest width in the row direction.
4 is a plan view schematically showing a light emitting device in which the optical narrowing of the intervals between the partition walls changes in the row direction according to the type of the organic EL element provided between the partition walls.
FIG. 5: is a top view which shows typically the light-emitting device set to the value which the space | interval P1, P2, P3 of the column direction Y of the center of several organic electroluminescent element changes periodically.

EMBODIMENT OF THE INVENTION Hereinafter, one Embodiment of this invention is described with reference to drawings. In addition, in the following description, each figure is only schematically shown the shape, size, and arrangement | positioning of a component so that an invention can be understood, and, therefore, this invention is not specifically limited. In addition, in each figure, the same code | symbol is attached | subjected about the same component, and the overlapping description may be abbreviate | omitted.

The light emitting device of the present invention includes a support substrate, a plurality of line partition walls which are provided on the support substrate and extend in a row direction different from the column direction at predetermined intervals in a predetermined column direction on the support substrate, A light emitting device including a plurality of organic EL elements provided at predetermined intervals in a row direction between partition walls adjacent to each other in a row direction, wherein each of the plurality of organic EL elements emits light of different colors (symbol) "M" represents two or more natural numbers), and a common layer, which is commonly provided in all kinds of organic EL elements, and a pair of electrodes disposed between the common layers. And an area between the partition walls adjacent in the column direction when viewed from one side in the thickness direction of the support substrate (hereinafter may be referred to as "planar view"). Is set for each type of organic EL element provided between partition walls, and the film thickness of the common layer of each organic EL element is set according to the area between partition walls seen from one side of the said thickness direction.

The light emitting device is used as a display device, for example. As the display device, there are mainly an active matrix drive type device and a passive matrix drive type device. The present invention can be applied to both drive type devices. In this embodiment, an active matrix drive type display device is described as an example. do.

<Configuration of the light emitting device>

First, the configuration of the light emitting device will be described. 1 is a plan view schematically showing the light emitting device of the present embodiment, and FIG. 2 is a cross-sectional view schematically showing the light emitting device.

As shown in Figs. 1 and 2, the light emitting device 1 mainly includes a support substrate 2, and a plurality of organic EL elements 11 (11R, 11G, 11B) formed on the support substrate 2; And a partition wall 3 provided to separate the plurality of organic EL elements 11 and an insulating film 4 electrically insulating the organic EL elements 11.

In the present embodiment, the plurality of organic EL elements 11 are arranged in a matrix on the support substrate 2, respectively. That is, the plurality of organic EL elements 11 are each arranged at predetermined intervals in the row direction X, and are arranged at predetermined intervals in the column direction Y, respectively. In addition, in this embodiment, the row direction X and the column direction Y are directions orthogonal to each other, and each of the row direction X and the column direction Y is orthogonal to the thickness direction Z of the support substrate 2.

In the present embodiment, a plurality of lines of straight partition walls 3 extending substantially parallel to each other in the row direction X are provided on the support substrate 2. This partition 3 is provided in a so-called stripe shape in plan view. Each partition 3 is provided between organic EL elements 11 adjacent to each other in the column direction Y, respectively. In other words, the plurality of organic EL elements 11 are provided between the partition walls 3 adjacent to each other in the column direction Y. The plurality of organic EL elements 11 are arranged at predetermined intervals in the row direction X between each of the adjacent partition walls 3. Hereinafter, the recessed part prescribed by the pair of partition 3 and the support substrate 2 which adjoin in the column direction Y may be called the recessed part 5. Each of the recesses 5 of the plurality of lines corresponds to a predetermined row.

In the present embodiment, three kinds of organic EL elements 11 are provided on the support substrate 2. That is, the symbol "m" representing two or more natural numbers represents the numerical value "3" in this embodiment. The organic EL elements 11 of the m type (in this embodiment, "m = 3") are provided with the same type of organic EL elements 11 at predetermined intervals in the row direction X, and in the column direction Y. The m type of organic EL elements 11 are repeatedly arranged so that a predetermined arrangement in which all kinds of organic EL elements 11 are permutated is continuous in the column direction so that the types of the organic EL elements 11 adjacent to each other do not overlap. They are arranged, and are repeatedly installed in the predetermined order.

The light emitting device 1 for a color display device is, for example, (I) a plurality of organic EL elements 11R emitting red light arranged at predetermined intervals in the row direction X, and (II) green light. Rows in which a plurality of organic EL elements 11G to emit are arranged at predetermined intervals in the row direction X, and (III) rows in which the organic EL elements 11B emitting blue light are arranged at predetermined intervals in the row direction X are arranged in this order. It is realized by repeating in the column direction Y (repeating from the lower side to the upper side in FIG. 1).

As shown in FIG. 3, the partition 3 has a rod-shaped shape in which a cross section perpendicular to the extending direction is trapezoidal. Each area between partitions 3 adjacent to each other in the column direction is set for each type of organic EL element 11 provided between partitions 3 as viewed from one side of the thickness direction of the supporting substrate 2. do. For example, the rows corresponding to the above (I), (II) and (III) have different areas when viewed in a plane between the partition walls 3 adjacent to each other in the column direction. The width of the column direction Y of each row of (I), (II), and (III) is defined by the space | interval L1, L2, L3 which adjoined partitions 3 comrades, In this embodiment, this adjacent partition wall (3) By making each space | interval L1, L2, and L3 mutually different, the area when it sees from the plane between adjacent partition walls 3 is made different.

That is, in this embodiment, the side surface 3a which mutually opposes the partition 3 adjacent in a column direction is extended in the row direction X, and the space | interval of the partition 3 adjacent in the column direction Y is adjacent. By setting each kind of organic EL element 11 provided between the partition walls 3 to be described, the area of the organic EL elements 11 when viewed from the plane between the partition walls 3 adjacent to each other in the column direction Y is viewed. Each kind is different.

In addition, the mutually opposing side surfaces 3a of the partition walls 3 adjacent to each other in the column direction Y extending in the row direction means that the partition walls 3 having a predetermined width maintain the width thereof in the row direction X. The width of the partition wall 3 along the row direction X is different from that of the partition wall 3 shown in FIG. 4 in which the width of the partition wall 3 varies along the row direction X. This means that it hardly fluctuates.

The intervals P between the centers C of the plurality of organic EL elements 11 adjacent to each other in the column direction Y may be the same, or one period may be set to a value that varies periodically with a numerical value "m". An example of the latter is shown in FIG. As shown in FIG. 5, the space | interval L1, L2, L3 of each adjacent partition 3 is set for every kind of organic electroluminescent element provided between the adjacent partition 3, for example, periodically In Fig. 5, one set of L1, L2, and L3 becomes one cycle, and the intervals P1, P2, and P3 of the centers C in the column direction Y of the plurality of organic EL elements 11 are periodically varied according to this variation. It can also be changed. In this case, the width | variety of the column direction Y of all the partition walls 3 can be made the same. On the other hand, as shown in FIG. 1, in the case of providing the organic EL elements 11 such that the intervals P between the centers C of the plurality of organic EL elements 11 adjacent to each other in the column direction Y are the same, the column direction Y By adjusting the position where the partition walls 3 are arranged with respect to, and the width of the column direction Y of the partition walls 3, the area when the partition walls 3 adjacent to each other in the column direction are viewed in a plane between each of the organic EL elements ( 11) can be different for each kind. In this case, in the nozzle printing method described later, ink can be applied at equal intervals irrespective of the type of the organic EL element 11, so that the configuration of the ink coating device and its adjustment are facilitated.

In the present embodiment, a lattice insulating film 4 for electrically insulating each organic EL element 11 is provided between the support substrate 2 and the partition wall 3. The insulating film 4 is formed by integrally forming a belt-like portion of a plurality of lines extending in the row direction X and a belt-like portion of a plurality of lines extending in the column direction Y. The opening 6 of the lattice-shaped insulating film 4 is formed at a position overlapping with the organic EL element 11 in plan view. The opening 6 of the insulating film 4 is formed in a planar shape, for example, in the shape of an elliptical, approximately circular, approximately elliptical and approximately rectangular. The partition wall 3 mentioned above is provided on the part extended in the row direction X which comprises a part of insulating film 4. This insulating film 4 is provided as needed. For example, the insulating film 4 is provided in order to ensure electrical insulation between the organic EL elements 11 adjacent to each other in the row direction X or the column direction Y.

In addition, since the current flowing in the thickness direction Z of the supporting substrate 2 flows only in the region where the opening 6 of the insulating film 4 is formed, only the region overlapping with the opening 6 in plan view is organic EL. It functions as the element 11 and emits light.

Since the width of the organic EL element 11 when viewed in the plane of the column direction Y and the row direction X is defined by the light emitting area, the column direction Y and the row direction X of the opening 6 of the insulating film 4 are respectively defined. It is defined by the width. In the case where the insulating film 4 is not provided, the width of the column direction Y and the row direction X of the organic EL element 11 when viewed in plan is the width of the column direction Y and the row direction X of one electrode 12 described later. It is defined by the width.

The organic EL elements 11 are classified into m kinds of elements (symbol "m" represents two or more natural numbers) that emit light of different colors, respectively. Each of the plurality of types of organic EL elements 11 provided on the supporting substrate 2 is provided between the common layer 14 which is commonly provided in all kinds of organic EL elements 11, and the common layer 14 therebetween. It has a pair of electrodes 12 and 13 arranged so that it may be arranged. In addition, the light emitting layer 15 is provided between the pair of electrodes of each organic EL element 11, respectively.

The common layer 14 has a different film thickness for each kind of the organic EL element 11. What makes the film thickness of the common layer 14 different for every kind of organic electroluminescent element is, for example, adjusting the film thickness of the common layer 14 in order to adjust the space | interval between a pair of electrodes so that light resonance may be generated. The film thickness of the common layer 14 which is adjusted for each kind of the organic EL element 11 or is optimal depending on the kind of the light emitting layer 15 may exist, and according to this optimum value, the kind of the organic EL element 11 This is because the film thickness of the common layer 14 may be adjusted every time.

Thus, by adjusting the film thickness of the common layer 14 for every kind of organic electroluminescent element 11, in order to form the common layer 14 of the optimal film thickness according to the material of the light emitting layer 15, or to generate optical resonance The spacing between the pair of electrodes can be adjusted.

Examples of the common layer 14 include an organic layer different from the light emitting layer 15, a layer containing an inorganic substance and an organic substance, an inorganic layer, and the like. Specifically, the so-called hole injection layer, hole transport layer, electron block layer, hole block layer, electron transport layer, electron injection layer and the like are provided as the common layer 14. The organic EL element 11 shown in FIG. 2 includes a pair of electrodes, a common layer 14 of one layer, and a light emitting layer 15 of one layer as an example. As described later, for example, the organic EL element 11 includes an anode corresponding to one electrode 12 among a pair of electrodes, a hole injection layer corresponding to the common layer 14, a light emitting layer 15, and a pair of electrodes. The cathode corresponding to the other electrode 13 of an electrode is laminated | stacked in this order from the support substrate 2 side, and is comprised.

In addition, below, although the organic electroluminescent element 11 of the structure by which one common layer 14 is arrange | positioned closer to one electrode 12 than the light emitting layer 15 is demonstrated, this invention is not limited to this structure, A plurality of common layers 14 may be provided, and a common layer 14 may be disposed closer to the other electrode 13 than the light emitting layer 15, and further, the light emitting layer 15 and one electrode 12. The common layer 14 may be arranged between both sides and between the light emitting layer 15 and the other electrode 13 side.

In addition, any one electrode of a pair of electrodes is comprised by the member which shows the light transmittance in order to transmit the light emitted from the light emitting layer 15, and to make it outgoing to the external field. Moreover, even if it is an electrode which shows a light transmittance, it does not transmit all the light which injects into an electrode, but part thereof is reflected.

Therefore, even if there is the so-called bottom emission type organic electroluminescent element 11 which comprised one electrode 12 as an electrode which shows light transmittance, for example, it is reflected by one electrode 12 once, and is made to the other electrode 13 further. Since the light reflected by the light emitted from the light emitting layer 15 resonates, it is possible to generate optical resonance by adjusting the film thickness of the common layer 14 shown in FIG.

Of course, in the case of the so-called top emission type organic EL element 11 which comprises the other electrode 13 by the electrode which shows light transmittance, one side is adjusted by adjusting the film thickness of the common layer 14 shown in FIG. Since the optical path length of the light reflected by the electrode 12 can be adjusted, optical resonance can be generated.

The pair of electrodes 12 and 13 is composed of an anode and a cathode. As one of the positive electrode and the negative electrode, one electrode 12 of the pair of electrodes is disposed near the support substrate 2, and the other electrode 13 of the pair of electrodes is one side of the other electrode of the positive electrode and the negative electrode. The electrode 12 is disposed farther from the support substrate 2.

Since the light emitting device 1 of the present embodiment is an active matrix type device, one electrode 12 is provided separately for each organic EL element 11. One electrode 12 is, for example, plate-shaped, and is formed in a substantially rectangular shape in plan view. One electrode 12 is provided on the support substrate 2 in a matrix corresponding to the position where each organic EL element 11 is provided. Each of the electrodes 12 is arranged at predetermined intervals in the row direction X, and is arranged at predetermined intervals in the column direction Y. That is, one electrode 12 is provided between the partition walls 3 adjacent to each other in the column direction Y in plan view. One electrode 12 is arranged at predetermined intervals in the row direction X between each of the partition walls 3. In this embodiment, one electrode 12 is formed in substantially the same shape as the opening 6 of the insulating film 4 described above in plan view, and is formed wider than the opening 6.

The above-mentioned lattice-shaped insulating film 4 is mainly formed in the area | region except one electrode 12 by planar view, and the one part is formed covering the periphery of one electrode 12. As shown in FIG. In other words, the opening 6 is formed in the insulating film 4 on one electrode 12. The surface of one electrode 12 is exposed from the insulating film 4 by this opening 6. In addition, the partition line 3 of the multiple lines mentioned above is provided on the belt-shaped part of several lines extended in the row direction X which comprises a part of insulating film 4.

The common layer 14 extends in the row direction X in the region sandwiched between the adjacent partition walls 3. That is, the common layer 14 is formed in the belt form in the some recessed part 5 defined by the partition 3 adjacent to the column direction Y. As shown in FIG. Therefore, the film thickness of the common layer 14 of each organic EL element 11 is set according to the area between adjacent partition walls 3 viewed from one side of the thickness direction.

In addition, the common layer 14 is formed by apply | coating and depositing the ink containing the material used as the common layer 14 to the recessed part 5, and solidifying this, so that it may mention later. Therefore, since the same quantity of ink is supplied to each recessed part 5, the common layer 14 formed between the partitions 3 so that the area | region between the partitions 3 in planar view is large is large. The film thickness of the film becomes thinner. On the contrary, the larger the area between the partition walls 3 is, the thicker the common layer 14 formed between the partition walls 3 is.

In the example shown in Fig. 2, the distance between adjacent partition walls 3 satisfies the relationship of L1> L2> L3, so that each common layer 14 is formed at &quot; film thickness of the region corresponding to L1 &quot; Film thickness of the corresponding region &quot; &quot; &quot; film thickness of the region corresponding to L3 &quot;.

Similar to the common layer 14, the light emitting layer 15 extends in the row direction X in a region sandwiched between adjacent partition walls 3. That is, the light emitting layer 15 is formed in the belt shape in the recessed part 5 defined by the partition 3 adjacent to each other in the column direction Y. As shown in FIG. In the present embodiment, the light emitting layer 15 is stacked on the common layer 14 and provided.

In the case of the color display apparatus, as mentioned above, it is necessary to provide three types of organic EL elements 11 which emit light of any one kind of red, green and blue on the support substrate 2, for example. In the present embodiment, three kinds of organic EL elements 11 that emit light of any one kind of red, green, and blue are produced by different kinds of the light emitting layers 15.

Therefore, three types of rows are provided: (i) a row in which a light emitting layer emitting red light is provided, (ii) a row in which a light emitting layer emitting green light is provided, and (iii) a row in which a light emitting layer emitting blue light is provided. It repeats in the column direction Y in this order (it repeats from the lower side to the upper side in FIG. 1), and arranges. That is, the light emitting layers emitting red light, the light emitting layers emitting green light, and the light emitting layers emitting blue light are each arranged so as to have two rows in the column direction Y, and extend in the row direction X. As a result, they are sequentially stacked on the common layer.

The other electrode 13 of the pair of electrodes is provided on the light emitting layer 15. In addition, in the present embodiment, the other electrode 13 is formed continuously over the plurality of organic EL elements 11 and is provided as an electrode common to the plurality of organic EL elements 11. That is, the other electrode 13 is formed not only on the light emitting layer 15 but also on the partition 3, and is formed on one surface such that the electrode on the light emitting layer 15 and the electrode on the partition 3 are continuous.

<Method of manufacturing light emitting device>

Next, the manufacturing method of a display apparatus is demonstrated.

First, the support substrate 2 is prepared. In the case of an active matrix display device, a substrate in which a drive circuit for individually driving the plurality of organic EL elements 11 can be used as the support substrate 2. For example, a TFT (Thin Film Transistor) substrate can be used as the support substrate 2.

(Step of Forming One Electrode of the Pair of Electrodes on the Support Substrate)

Next, the some one electrode 12 is formed in matrix form on the prepared support substrate 2. For example, one electrode 12 forms a conductive thin film on one surface of the support substrate 2, and the conductive thin film is subjected to a photolithography method (in the following description, the "photolithography method" is followed by a mask pattern forming step. Is patterned into a matrix using a patterning process such as an etching process). Further, for example, a mask pattern having an opening formed in a portion corresponding to the pattern on which one electrode 12 is formed is disposed on the support substrate 2, and the mask pattern is formed at a predetermined portion on the support substrate 2 through the mask pattern. One electrode 12 may be patterned by selectively depositing a conductive material. The material of one electrode 12 is mentioned later. In addition, in this process, the support substrate 2 in which the one electrode 12 was formed previously can also be prepared.

Next, in this embodiment, the insulating film 4 is formed in a lattice form on the support substrate 2. The insulating film 4 is made of organic or inorganic material. As organic substance which comprises the insulating film 4, resin, such as an acrylic resin, a phenol resin, and a polyimide resin, is mentioned. Examples of the inorganic material constituting the insulation film (4), and the SiO _x, SiN _x or the like.

When forming the insulating film 4 containing an organic substance, the positive type or negative type photosensitive resin is apply | coated to one surface, for example, and predetermined part is exposed and developed. Moreover, by hardening this, the insulating film 4 in which the opening 6 was formed in the predetermined site | part is formed. Moreover, photoresist can be used as photosensitive resin.

In the case of forming the insulating film 4 containing the inorganic material, a thin film containing the inorganic material is formed on one surface of the support substrate 2 by plasma CVD method, sputtering method or the like. Next, the insulating film 4 is formed by forming the opening 6 in a predetermined part. The opening 6 is formed by the photolithography method, for example. By forming this opening 6, the surface of one electrode 12 is exposed.

Next, in the present embodiment, a plurality of stripe-shaped partition walls 3 are formed on the insulating film 4. The partition 3 can be formed in a stripe shape in the same manner as the method of forming the insulating film 4 using, for example, a material exemplified as the material of the insulating film 4. In addition, in the present embodiment, each of the partition walls 3 is a type of the organic EL element 11 in which the distances L1, L2, and L3 of the adjacent partitions 3 are arranged between the partition walls 3 as described above. It is formed to follow the interval.

The shape of the partition 3 and the insulating film 4 and their arrangement are appropriately set according to the specifications of the display device such as the number of pixels and the resolution, ease of manufacture, and the like. For example, the width T1 of the column direction Y of the partition wall 3 is about 5 micrometers-50 micrometers, and the height T2 of the partition wall 3 is about 0.5 micrometers-5 micrometers, and the partition wall adjacent to a column direction Y (3) The space | interval T3 of each other, ie, the width T3 of the column direction Y of the recessed part 5, is about 10 micrometers-about 200 micrometers. In addition, the width | variety of the row direction X and the column direction Y of the opening 6 formed in the insulating film 4 is about 10 micrometers-about 400 micrometers, respectively.

(Step of Forming Common Layer)

In this embodiment, the common layer 14 is formed on one electrode 12. In this step, while supplying the liquid columnar ink containing the material to be the common layer 14 to a predetermined row defined by the partition wall 3, the predetermined row is moved by moving the position where the ink is supplied in the row direction. The common layer 14 is applied and formed into a film. That is, a common layer is formed by what is called a nozzle printing method.

In the nozzle printing method, ink is supplied to each row (concave part) by what is called a single writing. For example, the nozzle is reciprocated in the row direction X while discharging the liquid columnar ink from the nozzle disposed above the support substrate 2, and the support substrate 2 is opened in the column direction when the nozzle reciprocates. By moving only one row (the interval indicated by P in Fig. 1), ink is sequentially supplied to each row.

Specifically, while discharging the liquid columnar ink from the nozzle, (1) the nozzle is moved from one end of the row direction X toward the other end on the predetermined row (backward), and (2) the supporting substrate 2 is moved. (3) move the nozzle toward one end from the other end of the row direction X (return) on the predetermined row by moving only one row in the column direction Y (return), and (4) open the support substrate 2 Only one row is moved (returned) in the direction Y, and the operations of these (1) to (4) are repeated in this order to supply ink sequentially to all rows. In addition, in the example shown in FIG. 5, the support substrate 2 can be moved in a column direction by repeating in order of P1, P2, P3 at the time of returning the reciprocation of a nozzle.

Thus, by supplying ink to each row (concave portion) at once, the same amount of ink as each row is supplied.

As shown in Fig. 1, each of the areas between the partitions 3 adjacent to each other in the column direction is different for each type of the organic EL element 11 provided between the partitions 3, so that each row and When an equal amount of ink is supplied, the film thickness of the common layer 14 after it is solidified becomes a value corresponding to the area between the partition walls 3. That is, the larger the area between the partitions 3 is, the thinner the thickness of the common layer 14 formed between the partitions 3 is. On the contrary, the larger the area between the partitions 3 is, the thicker the film thickness of the common layer 14 formed between the partitions 3 is. Therefore, the film thickness of the common layer 14 can be made different for every kind of organic electroluminescent element 22, without separately apply | coating ink for every kind of organic electroluminescent element 11.

The common layer 14 can be formed by solidifying the ink supplied between the partitions 3. Solidification of ink can be performed by removing a solvent, for example. The solvent can be removed by natural drying, heat drying, vacuum drying, or the like. In addition, in the case of using an ink containing a material that polymerizes by applying energy such as light or heat, the ink can be solidified by applying energy such as light or heat after supplying ink between the partition walls 3. .

Although the process of apply | coating ink using one nozzle was demonstrated in this embodiment, in another embodiment, it is not limited to one, You can apply | coat ink using a nozzle of multiple lines. In addition, in this embodiment, although the common layer 14 of one layer was formed by the nozzle printing method, when the several common layer 14 is provided in one organic EL element 11, there are a plurality of common layers 14. The common layer 14 of at least 1 layer may be formed by the nozzle printing method mentioned above, and the some common layer 14 may be formed by the nozzle printing method mentioned above.

(Step of Forming Light Emitting Layer)

When manufacturing the light emitting device 1 used for a color display device as mentioned above, in order to produce three types of organic electroluminescent element 11, the material of the light emitting layer 15 was made into the organic electroluminescent element 11, for example. It is necessary to apply | coat separately according to the kind of. In order to form the three kinds of light emitting layers 15 in a row, a red ink containing a material emitting red light, a green ink containing a material emitting green light, and a blue ink containing a material emitting blue light are used. It is necessary to apply | coat at intervals of 2 rows in a column direction Y, respectively. For example, each of the light emitting layers 15 can be formed by applying a red ink, green ink, and blue ink sequentially to a predetermined row. As a method of sequentially applying a red ink, green ink, and blue ink to predetermined rows, coating methods such as a printing method, an inkjet method, a nozzle printing method, and the like can be given. For example, in the method for forming the common layer 14 described above, only three rows (the interval indicated by 3 × P in FIG. 1) of the support substrate 2 are moved in the column direction at the time of returning the reciprocating movement of the nozzle. In this way, the light emitting layer 15 can be formed in the same manner as the method of sequentially supplying ink to each row to form the common layer 14.

After the light emitting layer 15 is formed, a predetermined organic layer or the like is formed by a predetermined method as necessary.

These can also be formed using a predetermined coating method such as a printing method, an inkjet method, a nozzle printing method, or a predetermined dry method.

(Step of Forming the Other Electrode of the Pair of Electrodes)

Next, the other electrode 13 is formed. As described above, in the present embodiment, the other electrode 13 is formed on the entire surface on the support substrate 2. Thereby, the some organic electroluminescent element 11 can be formed on a board | substrate.

As described above, the area between the partitions 3 adjacent to each other in the column direction as viewed from one side in the thickness direction of the supporting substrate 2 is provided between the partitions 3 between the organic EL elements 11. By setting for each kind, even if the ink of the same quantity as each row is supplied using the nozzle printing method, the film thickness of the common layer 14 can be made different for every kind of organic electroluminescent element 11. In the prior art, the ink was divided and applied to each kind of the organic EL element 11 to adjust the film thickness of the common layer 14. In the present invention, the ink is not applied to each kind of the organic EL element 11 without applying the ink. Since the film thickness of the common layer 14 can differ for every kind of organic electroluminescent element 11, compared with the prior art, the number of processes can be reduced.

Moreover, the side surface 3a which opposes the partition 3 which each partition 3 adjoins in the column direction is extended flat in a row direction, The partition which adjoins in a column direction by adjusting the space | interval of partition 3 comrades (3) When the area between each other is set for each kind of organic EL element 11 provided between the partitions 3 (refer FIG. 1), the side surface 3a of the partition 3 is uneven | corrugated. Not flat. A flat film (common layer 14, light emitting layer 15, etc.) can be obtained by forming a thin film between the partition walls 3 with which such side surface 3a was flat by the apply | coating method. When the common layer 14 or the light emitting layer 15 is formed by an application method, the ink is gradually dried and solidified, and a film is formed along the side surface 3a of the partition wall 3, so that the side surface of the partition wall 3 ( 3a) is flat because a flat film is obtained.

In addition, when the some organic electroluminescent element 11 is arrange | positioned at predetermined intervals so that the space | interval of the center C of the organic electroluminescent element 11 may become equal to a column direction, in the nozzle printing method of the organic electroluminescent element 11 Regardless of the type, the ink can be applied at equal intervals (the interval indicated by P in Fig. 1), so that the configuration of the ink coating device and its adjustment are facilitated.

In addition, the area between the partitions 3 adjacent to each other in the column direction is common between the organic EL elements 11 provided between the partitions 3 as viewed from one of the thickness directions of the supporting substrate 2. It is preferable that the film thickness of the layer 14 is set to be the film thickness at which optical resonance occurs in the organic EL element 11. Optical resonance can be generated by adjusting the spacing of the pair of electrodes. The interval of a pair of electrodes can be adjusted by adjustment of the film thickness of the common layer 14. That is, optical resonance can be generated by adjusting the film thickness of the common layer 14.

In addition, in this specification, "light resonance" means the effect | action which strengthens the light intensity of a specific wavelength by reflecting light reflected from an electrode and the light emitted from the light emitting layer 15 mutually strengthening, or reflected light mutually strengthening each other. do. Therefore, by adjusting the film thickness of the common layer 14 so that optical resonance occurs, the spectrum can be narrowed and the luminous efficiency can be improved. For example, optical resonance adjusts the film thickness of the common layer 14 so that the phase difference between the light reflected by the electrode and returned to the light emitting layer 15 and the light emitted from the light emitting layer 15 is an integer multiple of 2 pi (radian). Can be.

In addition, each of the areas between the partition walls 3 adjacent to each other in the column direction as viewed from one side of the thickness direction of the supporting substrate 2 has light emission of the organic EL element 11 provided between the partition walls 3. It is preferable that the shorter the wavelength is, the wider it is. EMBODIMENT OF THE INVENTION Hereinafter, embodiment mentioned above is described. The emission wavelength is the shortest of the blue light, the green light is the middle length, and the red light is the longest. Therefore, the area between the partition walls 3 provided with the organic EL element 11B which emits blue light, the organic EL element 11G which emits green light, and the organic EL element 11R which emits red light is respectively SB and area. SG and area SR satisfy the relationship of "area SB"> "area SG"> "area SR".

The film thickness of the common layer 14 becomes thinner as the area becomes larger, and thicker as the area becomes smaller, as opposed to the area between the partition walls 3. Therefore, when the film thickness of each common layer 14 of organic electroluminescent element 11B, organic electroluminescent element 11G, and organic electroluminescent element 11R is set to film thickness LB, film thickness LG, and film thickness LR, respectively, "film thickness LB" << It satisfies the relationship between the film thickness LG "and" film thickness LR ".

Moreover, although the space | interval of a pair of electrodes when light resonates exists discretely, the narrowest space | interval among them is narrower as the emission wavelength is shorter. Therefore, in order to generate optical resonance, it is preferable to satisfy the relationship of "film thickness LB" <"film thickness LG" <"film thickness LR", and the organic EL element 11 provided between the partition walls 3 is preferable. The shorter the light emission wavelength is, the wider the area between the partition walls 3 is, so that the light emission wavelength of the organic EL element 11 is similar to the relationship between the distance between the pair of electrodes and the light emission wavelength when the light resonates. The shorter the interval, the narrower the interval between the pair of electrodes.

It is preferable that the organic electroluminescent element 11 with the shortest element lifetime is the organic electroluminescent element 11 with the largest width | variety of a row direction among the organic EL elements 11 of m type (symbol "m" represents the natural number of 2 or more). Do. In addition, element lifetime means the time required when the organic EL element is subjected to constant current driving until the luminance is lowered to 80% of the initial luminance from the start of driving.

As another embodiment, among the organic EL elements 11 of m type (symbol "m" represents two or more natural numbers), the organic EL element 11 having the shortest element lifetime is the organic EL element having the widest width in the row direction. The light emitting device 1 is schematically shown in FIG.

As mentioned above, since the width | variety of the column direction Y and the row direction X of the organic EL element 11 in planar view is prescribed | regulated by the area | region which emits light, the column direction of the organic EL element 11 in planar view The widths of Y and the row direction X are defined by the widths of the column direction Y and the row direction X of the opening 6 of the insulating film 4, respectively. Therefore, among the organic EL elements 11 of m type (symbol "m" represents a natural number of two or more), the organic EL element 11 having the shortest element life is determined in the column direction Y of the opening 6 of the insulating film 4. It can be set to be the widest.

For example, the device life of the organic EL device 11B that emits blue light is the shortest, the device life of the organic EL device 11G that emits green light is the next shortest, and the device life of the organic EL device 11R that emits red light is the longest. In the long case, the organic EL element 11B emitting blue light has the longest width in the column direction Y, and the organic EL element 11G emitting green light has the next longest width in the column direction Y of the organic EL element 11G. The width of the column direction Y of 11R can be made the shortest.

By defining the width of the organic EL element 11 in this manner, the organic EL element 11 having a shorter device lifetime can increase its light emitting area and reduce the amount of light emitted per unit area, thereby reducing the load at the time of driving. As a result, when the light emitting area is the same, the device life of the organic EL device with short device life can be lengthened in accordance with the device life of other organic EL devices.

In particular, the organic EL device having a shorter emission wavelength tends to have a shorter device lifetime. Therefore, the organic EL device 11 provided with each of the areas between the partition walls 3 adjacent to each other in the column direction is disposed between the partition walls 3. The shorter the emission wavelength is, the wider it is set, and the organic EL element of the m type (symbol "m" represents a natural number of 2 or more) has the shortest element lifetime and the width in the row direction is the shortest. A wide organic EL device can be formed, and light resonance is generated, and when the light emission area is the same, the device life of the organic EL device with short device life can be lengthened in accordance with the device life of other organic EL devices.

In still another embodiment, each organic EL element 11 has a plurality of common layers 14, and the film thicknesses of all the common layers 14 of each organic EL element 11 are viewed from one side in the thickness direction. It is preferable to set according to the area between partition 3s. As a conventional technique, a method of adjusting the distance between a pair of electrodes is known by adjusting the film thickness of a predetermined one layer provided between electrodes.

In the present embodiment, each area between the partitions 3 adjacent to each other in the column direction is set for each type of the organic EL element 11 provided between the partitions 3 so that each of the organic EL elements 11 The film thickness of all the common layers 14 can be adjusted for every kind of organic EL element 11.

Thus, by adjusting all the plurality of common layers 14 little by little, the amount of adjustment of the film thickness of each common layer 14 can be made small compared with the conventional technique which adjusts only the film thickness of a predetermined | prescribed one layer. Thereby, the influence on the element characteristic resulting from adjusting the film thickness of the common layer 14 can be suppressed.

Moreover, in another embodiment, the optical narrowing (size) of the space | interval of partition walls 3 may change in a row direction according to the kind of organic electroluminescent element provided between partition 3s. As an example of another embodiment, the top view which shows typically the light-emitting device 1 in which the optical narrow of the space | interval of partition walls changes along a row direction according to the kind of organic electroluminescent element provided between partition walls is shown in FIG. Illustrated.

As shown in FIG. 4, in this embodiment, the unevenness | corrugation (convex part) which changes the area of the surface (supporting substrate) exposed from the partition 3 along the row direction X to the side surface 3a of the partition 3 is provided. Form. For example, by setting the magnitude of each convex portion in plan view for each type of the organic EL element 11, the area between the partition walls 3 adjacent to each other in the column direction is provided between the partition walls 3. It can set for every kind of organic electroluminescent element 11. Specifically, when the area between the partitions 3 is reduced in plan view, the area when viewed from the plane of each convex portion is increased, and when the area between the partitions 3 is increased, the area between each convex portion is increased. The area when viewed in a plane can be reduced.

In addition, in FIG. 4, although the unevenness | corrugation is formed in both sides of the side surface 3a of the pair of partition walls 3 which face a predetermined row, you may provide an unevenness | corrugation only in one side of the side surface 3a of the pair of partition walls 3, respectively. have. In addition, irregularities may be formed on the side surfaces 3a of all the partition walls 3. Furthermore, as shown in FIG. 4, the partition 3 of which the both sides of the pair of partition 3 3 facing a predetermined row 3 is flat may be provided.

Moreover, the convex part which protrudes toward the partition 3 adjacent to one side of the column direction Y by planar view is provided between the organic EL element 11 and the organic EL element 11 which adjoin in row direction X, for example. It is desirable to. Although the area | region in which the organic electroluminescent element 11 is installed may be restrict | limited by providing a convex part in the partition 3, by providing a convex part so that it may be located between the adjacent organic electroluminescent element 11 in row direction X. FIG. The area in which the organic EL element 11 is provided can be limited in a possible range, and as a result, a decrease in the aperture ratio can be suppressed.

In the above embodiment, the symbol "m" representing two or more natural numbers has been described as representing the numerical value "3", but m may be two or four or more. For example, when m = 4, it is one of three colors of red, green, and blue as well as the three primary colors of light, but emits light of a slightly different color from one of the other colors. An organic EL element can also be provided.

Specifically, not only the organic EL element emitting red and green light but also the organic EL element emitting dark blue and light blue light may be provided. That is, two kinds of organic EL elements emitting light of dark blue and light blue having different spectra may be provided even though they are the same blue.

In this case, two kinds of organic EL elements emitting blue light are provided, and the followings are considered as the configuration thereof:

(1) two types of organic EL devices having light emitting layers of different types formed using blue materials having different types,

(2) Two kinds of organic EL elements having the same light emitting layer of the kind formed from the same blue material but having different film thicknesses of the common layer.

The organic EL elements of (2) have different resonance frequencies because the film thicknesses of the common layers are different from each other, and the spectrums of the light emitted as a result are different from each other.

For example, even in the same blue color, there may be a difference in device characteristics such as luminous efficiency and device life in the organic EL device emitting dark blue light and the organic EL device emitting light blue light. In this case, in normal light emission, one blue organic EL device having high device characteristics is made to emit light among dark blue and light blue, and the other blue organic EL device having low device characteristics only when the other blue is required. It can also emit light.

<Configuration of Organic EL Element>

Hereinafter, the structure of the organic electroluminescent element 11 is demonstrated. As described above, the organic EL element 11 has various layer configurations. Below, an example of the layer structure of the organic electroluminescent element 11, the structure of each layer, and the formation method of each layer is demonstrated.

The organic EL element 11 is provided with a pair of electrodes and a light emitting layer 15 disposed between the pair of electrodes. An organic layer different from the light emitting layer may be provided between the anode and the cathode, not limited to the light emitting layer, and in some cases, an inorganic layer different from the light emitting layer may be provided. As a layer different from the light emitting layer, in this embodiment, a common layer 14 common to the m kinds of organic EL elements 11 is provided between the pair of electrodes.

The organic material constituting the organic layer may be a low molecular compound, a high molecular compound, or a mixture of a low molecular compound and a high molecular compound, but a high molecular compound is preferred, and a high molecular compound having a number average molecular weight of 10 ³ to 10 ⁸ in terms of polystyrene. This is preferred.

In the case where the organic layer is formed by a coating method, since the polymer compound generally has better solubility in a solvent as compared to the low molecular compound, a polymer compound having good solubility in a solvent is preferable.

As a layer provided between a cathode and a light emitting layer, an electron injection layer, an electron carrying layer, a hole block layer, etc. are mentioned. When both layers of the electron injection layer and the electron transport layer are provided between the cathode and the light emitting layer, the layer close to the cathode is called an electron injection layer, and the layer close to the light emitting layer is called an electron transport layer.

As a layer provided between an anode and a light emitting layer, a hole injection layer, a hole transport layer, an electron blocking layer, etc. are mentioned. When both the hole injection layer and the hole transport layer are provided, the layer close to the anode is called the hole injection layer, and the layer close to the light emitting layer is called the hole transport layer.

The layer provided between these cathodes and the light emitting layer and the layer provided between the anode and the light emitting layer can be commonly provided to all organic EL elements as a common layer. In addition, it is preferable to form the common layer which can be formed in these common layers by the apply | coating method by the method of apply | coating the liquid columnar ink of this invention mentioned above.

An example of the element structure of the organic electroluminescent element 11 is shown below.

a) anode / light emitting layer / cathode

b) anode / hole injection layer / light emitting layer / cathode

c) anode / hole injection layer / light emitting layer / electron injection layer / cathode

d) anode / hole injection layer / light emitting layer / electron transport layer / cathode

e) anode / hole injection layer / light emitting layer / electron transport layer / electron injection layer / cathode

f) anode / hole transport layer / light emitting layer / cathode

g) anode / hole transport layer / light emitting layer / electron injection layer / cathode

h) anode / hole transport layer / light emitting layer / electron transport layer / cathode

i) Anode / hole transport layer / light emitting layer / electron transport layer / electron injection layer / cathode

j) Anode / hole injection layer / hole transport layer / light emitting layer / cathode

k) anode / hole injection layer / hole transport layer / light emitting layer / electron injection layer / cathode

l) Anode / hole injection layer / hole transport layer / light emitting layer / electron transport layer / cathode

m) Anode / hole injection layer / hole transport layer / light emitting layer / electron transport layer / electron injection layer / cathode

n) anode / light emitting layer / electron injection layer / cathode

o) anode / light emitting layer / electron transport layer / cathode

p) anode / light emitting layer / electron transport layer / electron injection layer / cathode

The symbol "/" has shown that each layer which interposes the symbol "/" is laminated | stacked adjacent to each other. The same applies to the following descriptions.

In addition, the organic EL element 11 may have two or more light emitting layers, and may constitute a so-called multiphoton type organic EL element having two or more light emitting layers and interposing a charge generating layer for generating charges between adjacent light emitting layers. It may be.

The organic EL element 11 may be further covered with a sealing member such as a sealing film or a sealing plate for sealing.

The organic EL element 11 of the present embodiment may further include an insulating layer having a film thickness of 2 nm or less adjacent to the electrode in order to improve adhesion to the electrode and to improve charge injection from the electrode. In addition, a thin buffer layer may be interposed between the above-described layers in order to improve adhesion at the interface, to prevent mixing, and the like.

The order of the layers to be laminated, the number of layers, and the thickness of each layer can be appropriately set in consideration of luminous efficiency and device life. In addition, the organic EL element may also place the anode near the support substrate and the cathode at a position spaced apart from the support substrate among the anode and the cathode, on the contrary, place the cathode close to the support substrate and position the anode at a position spaced apart from the support substrate. You can also place it. Specifically, in the configurations of a) to p), each layer may be laminated on the support substrate in order from the left layer, or conversely, each layer may be laminated on the support substrate in order from the right layer.

Next, the material and the formation method of each layer which comprise the organic electroluminescent element 11 are demonstrated more concretely.

<Support substrate>

As the support substrate 2, glass, a plastic, a silicon substrate, what laminated | stacked these, etc. are used, for example. Moreover, the board | substrate with which the electric circuit was formed previously can also be used as the support substrate 2 for forming the organic electroluminescent element 11 thereon. In addition, when mounting a bottom emission type organic electroluminescent element, the member which shows light transmittance is used as the support substrate 2.

<Anode>

In the case of the organic EL element of the structure which the light emitted from the light emitting layer 15 exits through an anode, the electrode which shows light transmittance is used as an anode. As an electrode which shows light transmittance, thin films, such as a metal oxide, metal sulfide, and a metal with high electrical conductivity, can be used, The thing with high light transmittance is used preferably.

Specifically, a thin film containing indium oxide, zinc oxide, tin oxide, indium tin oxide (ITO), indium zinc oxide (IZO), gold, platinum, silver and copper is used, and among these, ITO, IZO or tin oxide are used. A thin film containing is used preferably. Examples of the method for producing the anode include a vacuum vapor deposition method, a sputtering method, an ion plating method, a plating method, and the like. Moreover, organic transparent conductive films, such as polyaniline or its derivative (s), polythiophene or its derivative (s), can also be used as an anode.

The material which reflects light can also be used for an anode. As a material which reflects light, a metal, a metal oxide, or a metal sulfide having a work function of 3.0 eV or more is preferable.

The film thickness of the anode can be appropriately selected in consideration of light transmittance and electrical conductivity. The film thickness of the anode is, for example, 10 nm to 10 m, preferably 20 nm to 1 m, and more preferably 50 nm to 500 nm.

<Hole injection layer>

Examples of the hole injection material constituting the hole injection layer include oxides such as vanadium oxide, molybdenum oxide, ruthenium oxide and aluminum oxide, phenylamine compounds, starburst amine compounds, phthalocyanine compounds, amorphous carbon, polyaniline and polythiophene derivatives, and the like. Can be mentioned.

As a film-forming method of a hole injection layer, film-forming from the solution containing a hole injection material is mentioned, for example. The solvent of the solution used for film formation from the solution is not particularly limited as long as it dissolves the hole injection material. Aromatic hydrocarbon solvents, such as acetone, ketone solvents, such as methyl ethyl ketone, ester solvents, such as ethyl acetate, butyl acetate, and ethyl cellosolve acetate, and water are mentioned.

As a film formation method from a solution, a spin coating method, casting method, micro gravure coating method, gravure coating method, bar coating method, roll coating method, wire bar coating method, dip coating method, spray coating method, screen printing method, flexo Coating methods, such as a printing method, an offset printing method, an inkjet printing method, and a nozzle printing method, are mentioned, It is preferable to form a hole injection layer by the nozzle printing method mentioned above.

The film thickness of the hole injection layer is appropriately set in consideration of electrical characteristics, ease of film formation, and the like. The film thickness of the hole injection layer is, for example, 1 nm to 1 μm, preferably 2 nm to 500 nm, and more preferably 5 nm to 200 nm.

&Lt; Hole transport layer &

Examples of the hole transporting material constituting the hole transporting layer include polyvinylcarbazole or derivatives thereof, polysilane or derivatives thereof, polysiloxane derivatives having an aromatic amine in the side chain or the main chain, pyrazoline derivatives, arylamine derivatives, stilbene derivatives and triphenyldiamine Derivatives, polyaniline or derivatives thereof, polythiophene or derivatives thereof, polyarylamines or derivatives thereof, polypyrrole or derivatives thereof, poly (p-phenylenevinylene) or derivatives thereof, or poly (2,5-thienylenevinylene) Or derivatives thereof.

Among these, as the hole transporting material, polyvinylcarbazole or derivatives thereof, polysilane or derivatives thereof, polysiloxane derivatives having aromatic amine compound groups in the side chain or main chain, polyaniline or derivatives thereof, polythiophene or derivatives thereof, polyarylamines or the like Polymer hole transport materials such as derivatives, poly (p-phenylenevinylene) or derivatives thereof, or poly (2,5-thienylenevinylene) or derivatives thereof are preferable, and more preferably polyvinylcarbazole or Derivatives, polysilanes or derivatives thereof, polysiloxane derivatives having aromatic amines in the side chain or main chain. In the case of a low molecular hole transport material, it is preferable to disperse | distribute and use in a polymeric binder.

There is no restriction | limiting in particular in the film-forming method of a positive hole transport layer. In the case of using a low-molecular hole transporting material, film formation from a mixed solution containing a polymer binder and a hole transporting material may be mentioned. In the case of using a high-molecular hole transporting material, film formation from a solution containing a hole transporting material is used. Can be mentioned.

There is no restriction | limiting in particular as a solvent of the solution used for film-forming from a solution, if it melt | dissolves a hole transport material, For example, what was illustrated as a solvent of the solution used when forming a hole injection layer from a solution can be used.

As a film-forming method from a solution, the coating method similar to the film-forming method of the hole injection layer mentioned above is mentioned, It is preferable to form a positive hole transport layer by the nozzle printing method mentioned above.

As the polymer binder to be mixed, those which do not inhibit charge transport extremely, are preferably used, and those having low absorption of visible light are preferably used. For example, polycarbonate, polyacrylate, polymethylacrylate, polymethylmethacryl Latex, polystyrene, polyvinyl chloride, polysiloxane, and the like.

The film thickness of the hole transport layer is appropriately set in consideration of electrical characteristics, ease of film formation, and the like. The film thickness of the hole transport layer is, for example, 1 nm to 1 μm, preferably 2 nm to 500 nm, and more preferably 5 nm to 200 nm.

<Light Emitting Layer>

The light emitting layer 15 is usually formed mainly from an organic substance which emits fluorescence and / or phosphorescence, or from this organic substance and a dopant which assists it. Dopants are added, for example, to improve luminous efficiency and to change the luminous wavelength. The organic material may be a low molecular compound or a high molecular compound, and the light emitting layer 15 preferably includes a polymer compound having a number average molecular weight of 10 ³ to 10 ⁸ in terms of polystyrene. As a light emitting material which comprises the light emitting layer 15, the following pigment | dye material, a metal complex material, a polymeric material, and a dopant material are mentioned, for example.

(Color material)

As a coloring material, for example, a cyclopentamine derivative, a tetraphenylbutadiene derivative compound, a triphenylamine derivative, an oxadiazole derivative, a pyrazoloquinoline derivative, a distyryl benzene derivative, a distyryl arylene derivative, a pyrrole derivative, a thiophene ring A compound, a pyridine ring compound, a perinone derivative, a perylene derivative, an oligothiophene derivative, an oxadiazole dimer, a pyrazoline dimer, a quinacridone derivative, a coumarin derivative, etc. are mentioned.

(Metal complex material)

Examples of the metal complex material include rare earth metals such as Tb, Eu, and Dy, or oxadiazoles, thiadiazoles, phenylpyridines, and phenylbenzoimidazoles having Al, Zn, Be, Ir, and Pt as the center metals. The metal complex which has a quinoline structure etc. as a ligand is mentioned, For example, the metal complex which has light emission from triplet excited states, such as an iridium complex and a platinum complex, an aluminum quinolinol complex, a benzoquinolinol beryllium complex, benz An oxazolyl zinc complex, a benzothiazole zinc complex, an azomethyl zinc complex, a porphyrin zinc complex, a phenanthroline europium complex, etc. are mentioned.

(Polymer material)

Examples of the polymer material include polyparaphenylene vinylene derivatives, polythiophene derivatives, polyparaphenylene derivatives, polysilane derivatives, polyacetylene derivatives, polyfluorene derivatives, polyvinylcarbazole derivatives, the above pigment materials and metal complex luminescence And polymerized materials.

Examples of the light emitting material that emits blue light include distyryl arylene derivatives, oxadiazole derivatives and polymers thereof, polyvinylcarbazole derivatives, polyparaphenylene derivatives, and polyfluorene derivatives. Among them, polyvinylcarbazole derivatives, polyparaphenylene derivatives, polyfluorene derivatives and the like which are polymer materials are preferable.

Moreover, as an example of the material which emits green light, a quinacridone derivative, a coumarin derivative, these polymers, a polyparaphenylene vinylene derivative, a polyfluorene derivative, etc. are mentioned. Among these, polyparaphenylene vinylene derivatives and polyfluorene derivatives which are high molecular materials are preferable.

In addition, examples of materials emitting red light include coumarin derivatives, thiophene ring compounds and polymers thereof, polyparaphenylenevinylene derivatives, polythiophene derivatives, polyfluorene derivatives, and the like. Among these, polyparaphenylene vinylene derivatives, polythiophene derivatives, polyfluorene derivatives and the like which are polymer materials are preferable.

(Dopant material)

As the dopant material, for example, perylene derivatives, coumarin derivatives, rubrene derivatives, quinacridone derivatives, squarylium derivatives, porphyrin derivatives, styryl pigments, tetracene derivatives, pyrazolone derivatives, decacyclenes, phenoxazone Etc. can be mentioned. In addition, the thickness of such a light emitting layer is usually about 2 nm to 200 nm.

As an example of the film-forming method of a luminescent material, the printing method, the inkjet printing method, the nozzle printing method, etc. are mentioned. For example, as described above, the ink can be divided and applied for each m type of color by the nozzle printing method.

<Electron transport layer>

As the electron transporting material constituting the electron transporting layer, a known electron transporting material can be used. Examples of the electron transporting material include oxadiazole derivatives, anthraquinodimethane or derivatives thereof, benzoquinone or derivatives thereof, naphthoquinone or derivatives thereof, anthraquinone or derivatives thereof, tetracyanoanthhraquinomethane or derivatives thereof, fluorine Lenone derivatives, diphenyl dicyanoethylene or derivatives thereof, diphenoquinone derivatives, metal complexes of 8-hydroxyquinoline or derivatives thereof, polyquinoline or derivatives thereof, polyquinoxaline or derivatives thereof, polyfluorene or derivatives thereof and the like Can be mentioned.

Among these, as the electron transporting material, an oxadiazole derivative, a benzoquinone or a derivative thereof, an anthraquinone or a derivative thereof, a metal complex of 8-hydroxyquinoline or a derivative thereof, a polyquinoline or a derivative thereof, a polyquinoxaline or a derivative thereof, Polyfluorene or derivatives thereof are preferred, and 2- (4-biphenylyl) -5- (4-t-butylphenyl) -1,3,4-oxadiazole, benzoquinone, anthraquinone and tris (8 More preferred are -quinolinol) aluminum and polyquinoline.

There is no restriction | limiting in particular as a film-forming method of an electron carrying layer. In the case of using a low-molecular electron transporting material, vacuum deposition from powder or film formation from a solution or molten state may be mentioned. In the case of using a polymer electron transporting material, film formation from a solution or molten state may be mentioned. Can be. In addition, when forming into a film from a solution or molten state, a polymeric binder can also be used together. As a film-forming method from a solution, the coating method similar to the film-forming method of the hole injection layer mentioned above is mentioned.

The film thickness of the electron transport layer is appropriately set in consideration of electrical characteristics, ease of film formation, and the like. The film thickness of the electron transporting layer is, for example, 1 nm to 1 m, preferably 2 nm to 500 nm, and more preferably 5 nm to 200 nm.

<Electron injection layer>

As a material which comprises an electron injection layer, the optimal material is selected suitably according to the kind of light emitting layer 15. As shown in FIG. Examples of the material constituting the electron injection layer include oxides, halides, carbonates, or mixtures of alloys, alkali metals or alkaline earth metals containing at least one of alkali metals, alkaline earth metals, alkali metals and alkaline earth metals. Etc. can be mentioned. Examples of alkali metals, oxides, halides, and carbonates of alkali metals include lithium, sodium, potassium, rubidium, cesium, lithium oxide, lithium fluoride, sodium oxide, sodium fluoride, potassium oxide, potassium fluoride, rubidium oxide, rubidium fluoride, and oxides. Cesium, cesium fluoride, lithium carbonate and the like. Examples of the oxides, halides, and carbonates of alkaline earth metals and alkaline earth metals include magnesium, calcium, barium, strontium, magnesium oxide, magnesium fluoride, calcium oxide, calcium fluoride, barium oxide, barium fluoride, strontium oxide, and strontium fluoride. And magnesium carbonate. An electron injection layer may be comprised by the laminated body which laminated | stacked two or more layers, For example, the laminated body of a LiF film, Ca film, etc. are mentioned. The electron injection layer is formed by vapor deposition, sputtering, printing or the like. As a film thickness of an electron injection layer, about 1 nm-about 1 micrometer are preferable.

<Cathode>

As the material of the cathode, a material having a small work function, easy injection of electrons into the light emitting layer 15, and high electrical conductivity is preferable. Moreover, in the organic EL element which takes out light from the anode side, in order to reflect the light from a light emitting layer from a cathode to an anode side, the material with high visible light reflectance is preferable as a material of a cathode.

As the material of the negative electrode, for example, an alkali metal, an alkaline earth metal, a transition metal, a metal in Group 13 of the periodic table and the like can be used.

Examples of the material of the negative electrode include lithium, sodium, potassium, rubidium, cesium, beryllium, magnesium, calcium, strontium, barium, aluminum, scandium, vanadium, zinc, yttrium, indium, cerium, samarium, europium, terbium, ytterbium, and the like. A metal, an alloy of two or more kinds of the metals, one or more kinds of the metals, and one or more kinds of gold, silver, platinum, copper, manganese, titanium, cobalt, nickel, tungsten and tin, or graphite or graphite Interlayer compounds and the like. Examples of the alloys include magnesium-silver alloys, magnesium-indium alloys, magnesium-aluminum alloys, indium-silver alloys, lithium-aluminum alloys, lithium-magnesium alloys, lithium-indium alloys, calcium-aluminum alloys, and the like.

As the cathode, a transparent conductive electrode containing a conductive metal oxide, a conductive organic substance, or the like can be used. Specifically, examples of the conductive metal oxide include indium oxide, zinc oxide, tin oxide, ITO and IZO. Examples of the conductive organic substance include polyaniline or derivatives thereof, polythiophene or derivatives thereof. Moreover, the cathode may be comprised by the laminated body which laminated | stacked two or more layers. In addition, an electron injection layer may be used as a cathode.

The film thickness of the cathode is appropriately set in consideration of electrical conductivity and durability. The film thickness of the cathode is, for example, 10 nm to 10 m, preferably 20 nm to 1 m, and more preferably 50 nm to 500 nm.

As a manufacturing method of a cathode, the vacuum vapor deposition method, the sputtering method, the lamination method which thermo-compresses a metal thin film, etc. are mentioned.

&Lt; Insulating layer &

Examples of the material of the insulating layer include metal fluorides, metal oxides, organic insulating materials, and the like. Examples of the organic EL device provided with an insulating layer having a thickness of 2 nm or less include those having an insulating layer having a thickness of 2 nm or less adjacent to a cathode, and those having an insulating layer having a thickness of 2 nm or less adjacent to an anode. Can be.

1 Light emitting device
2 supporting substrate
3 bulkhead
3a side
4 insulating film
5 concave portion
6 opening
11 organic EL element
12 one electrode
13 other electrode
14 common floors
15 light emitting layer

Claims (9)

Support substrate,
A plurality of lines of barrier ribs provided on the support substrate and extending in a row direction different from the column direction at predetermined intervals in a predetermined column direction on the support substrate;
A light emitting device including a plurality of organic electroluminescent elements provided at predetermined intervals in a row direction between each of adjacent partition walls in a column direction,
The plurality of organic electroluminescent devices are classified into two or more organic electroluminescent devices that emit light of different colors. Having a pair of electrodes interposed therebetween,
As seen from one side of the thickness direction of the said support substrate, each area between the partition walls adjacent in a column direction is set for every kind of organic electroluminescent element provided between partition walls,
The film thickness of the common layer of each organic electroluminescent element is set according to the area between partition walls seen from one side of the said thickness direction. The method of claim 1, wherein the at least two organic light emitting devices
In the row direction, organic electroluminescent elements of the same kind are provided at predetermined intervals,
A light emitting device provided in a row direction such that a predetermined array of all kinds of permutations of the two or more organic electroluminescent elements is arranged repeatedly so as to be continuous in the column direction. According to claim 1, Each partition wall has a side facing the partition wall adjacent in the column direction is extended in the row direction,
A light emitting device in which each of the spaces between the partition walls adjacent in the column direction is set for each type of organic electroluminescent element provided between the partition walls. The light emitting device according to claim 1, wherein the plurality of organic electroluminescent elements are arranged at predetermined intervals such that the intervals of the centers of the organic electroluminescent elements are equal in the column direction. The light emitting device according to claim 1, wherein each of the spaces between the partition walls adjacent to each other in the column direction is set such that its optical narrowness is changed along the row direction according to the type of the organic electroluminescent element provided between the partition walls. The film thickness of the common layer of the organic electroluminescent element of Claim 1 WHEREIN: The area | region between the partition walls adjacent in a column direction is seen from one side of the thickness direction of the said support substrate, The film thickness of the common layer of the organic electroluminescent element provided between partition walls is an organic electric field. A light emitting device that is set to have a film thickness at which light resonance occurs in the light emitting element. The area of each of the partition walls adjacent to each other in the column direction is set to be wider as the emission wavelength of the organic electroluminescent element provided between the partition walls is shorter. Light emitting device. 2. The light emitting device of claim 1, wherein the organic electroluminescent element is set so as to have the widest width in the row direction of the organic electroluminescent element having the shortest element lifetime among two or more organic electroluminescent elements. The method of claim 1, wherein each organic electroluminescent device has a plurality of common layers,
The film thickness of all the common layers of each organic electroluminescent element is set according to the area between partition walls seen from one side of the said thickness direction.

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