KR20120067036A - Flatness level inspection apparatus and method for inspecting measuring method using the same - Google Patents
Flatness level inspection apparatus and method for inspecting measuring method using the same Download PDFInfo
- Publication number
- KR20120067036A KR20120067036A KR1020100128428A KR20100128428A KR20120067036A KR 20120067036 A KR20120067036 A KR 20120067036A KR 1020100128428 A KR1020100128428 A KR 1020100128428A KR 20100128428 A KR20100128428 A KR 20100128428A KR 20120067036 A KR20120067036 A KR 20120067036A
- Authority
- KR
- South Korea
- Prior art keywords
- nozzle
- inspection object
- chuck
- voltage value
- inspection
- Prior art date
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-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B13/00—Measuring arrangements characterised by the use of fluids
- G01B13/22—Measuring arrangements characterised by the use of fluids for measuring roughness or irregularity of surfaces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D11/00—Component parts of measuring arrangements not specially adapted for a specific variable
- G01D11/30—Supports specially adapted for an instrument; Supports specially adapted for a set of instruments
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/12—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means
- G01D5/14—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
Abstract
The flatness inspection apparatus according to the present invention includes a chuck for supporting and fixing an inspection object, a nozzle for injecting fluid onto the surface of the inspection object, and sprayed from the nozzle according to a separation distance between the nozzle and the inspection object. A movement that senses a change in the fluid injection pressure and converts it into a voltage value, a lifting module for raising and lowering the nozzle, and horizontally moving at least one of the chuck and the nozzle so that the chuck and the nozzle move horizontally relative to each other. The actual measured voltage value measured while scanning the surface of the inspection object is used as a reference value by using the voltage value according to the change in the separation distance between the nozzle and the specific surface of the inspection object measured by the unit and the measurement unit as a reference value. Calculated as the surface height value of the inspection object, and the ratio of the calculated height values of the surface of the inspection object relatively And it comprises a calculation unit for determining the flatness.
Therefore, according to embodiments of the present invention, the flatness of the inspection object can be inspected without contacting the inspection object, thereby preventing the inspection object from being damaged by scratches or contaminants. In addition, the inspection object can be inspected irrespective of the optical characteristics of the inspection object, and can be applied to various inspection objects.
Description
The present invention relates to a flatness inspection apparatus and a flatness inspection method using the same, which can easily inspect the flatness of the inspection object and can increase the inspection reliability.
In the case of semiconductor devices such as light emitting diodes (LEDs), LCDs, PDPs, etc., the surface flatness of a substrate such as a silicon wafer or a glass substrate is an important parameter for determining the characteristics of the device. Thus, the flatness of the substrate is inspected before fabricating the semiconductor device.
In general, there is a flatness inspection device using a probe as a device for checking the flatness of the substrate. The flatness inspection device inspects the flatness of the substrate by horizontally moving the probe in contact with the substrate surface. In this case, as the tip of the probe contacts the surface of the substrate, scratches and contaminants caused by the probe may damage the substrate. To solve this problem, light is irradiated onto the substrate surface to measure the flatness of the substrate in a non-contact manner. Substrate inspection using light does not damage the substrate, but inspection of a substrate having excellent light transmittance such as a sapphire wafer is not easy, and inspection reliability is low. This is because 95% of the light passes through the sapphire wafer, so the change in the intensity is small, and it is difficult to determine whether the change in the intensity is due to the surface of the sapphire wafer or an external factor. Therefore, the flatness of the substrate cannot be inspected accurately, resulting in a defect of the semiconductor device, which causes a decrease in yield.
One technical problem of the present invention is to provide a flatness inspection apparatus and a flatness inspection method using the same, which can easily inspect the flatness of the inspection object and can increase the inspection reliability.
Another technical problem of the present invention is to provide a flatness inspection apparatus capable of inspecting the flatness of the inspection object by a non-contact method by injecting a fluid toward the inspection object, and a flatness inspection method using the same.
The flatness inspection apparatus according to the present invention includes a chuck for supporting and fixing an inspection object, a nozzle for injecting fluid onto the surface of the inspection object, and sprayed from the nozzle according to a separation distance between the nozzle and the inspection object. A measurement unit for detecting a change in the fluid injection pressure and converting the same into a voltage value, a lifting module for lifting up and down the nozzle, and horizontally moving at least one of the chuck and the nozzle so that the chuck and the nozzle move horizontally relative to each other. Actual measurement measured while scanning the surface of the inspection object using a voltage value according to a change in the separation distance between any one of the nozzle and the inspection object surface measured by the mobile unit and the measurement unit as a reference value The voltage value is calculated as the surface height value of the inspection object, and the calculated height values of the surface of the inspection object are calculated. And a calculating unit that relatively compares and determines flatness.
The measuring unit comprises an air micrometer.
The moving unit includes a chuck driving module for rotating or horizontally moving the chuck and a horizontal moving module for horizontally moving a nozzle of the measuring unit.
The nozzle is provided in plurality.
In relative movement of the chuck and the nozzle of the measuring unit,
Rotate the chuck using the chuck driving module and horizontally move the nozzle in one direction using the horizontal moving module, or horizontally move the nozzle in one direction using a horizontal moving module with the chuck fixed. Alternatively, the chuck may be horizontally moved using the chuck driving module while the nozzle is fixed, or the chuck and the nozzle may be horizontally moved, but moved in different directions.
The calculation unit includes a calculation unit that calculates the actual measured voltage value as a height value of the surface of the inspection object by using the reference value, and a comparison determination unit that relatively compares the calculated height values of the surface of the inspection object to determine flatness. .
The flatness inspection method according to the present invention comprises the steps of preparing a test object, the nozzle disposed above the surface of the test object, by spraying a fluid to a specific point on the surface of the test object while changing the height of the nozzle, Calculating a reference value by detecting a fluid injection pressure according to a distance from the one specific point and converting the fluid injection pressure into a voltage value, while horizontally moving at least one of the nozzle and the test object, inspecting the test through the nozzle Injecting a fluid to scan the surface of the object, to detect the fluid injection pressure in accordance with the change of the separation distance between the surface of the inspection object and the nozzle, and converting it to a voltage value, to calculate the actual measured voltage value, the above calculation The actual measured voltage value as the height value of the surface of the test object by using the calculated reference value The step of shipping, and relatively comparing the height values of the surface of the inspection object, determining the flatness of the inspection object.
In dispensing fluid to a specific point on the surface of the test object while varying the height of the nozzle, the nozzle is disposed above a specific point of one of the test object surface areas, and the nozzle is raised or lowered so that the nozzle and the test The fluid is ejected from the nozzle while varying the separation distance from the specific point on the surface of the object.
Injecting a fluid to scan the surface of the inspection object through the nozzle while horizontally moving at least one of the nozzle and the inspection object,
The shape in which the fluid scans the surface of the object to be inspected is one of a spiral and a zigzag shape.
By rotating the inspection object and horizontally moving the nozzle in one direction, the shape in which the fluid scans the inspection object surface becomes spiral.
The nozzle moves horizontally so as to pass through the center portion above the surface of the inspection object.
The nozzles are horizontally moved alternately in the X direction and the Y direction while the inspection object is fixed, or the inspection objects are alternately horizontally moved in the X direction and the Y direction while the nozzle is fixed, or the inspection object and By alternately horizontally moving the nozzles in the X direction and the Y direction, the shape in which the fluid scans the inspection object surface becomes a zigzag shape.
In the step of calculating the actual measured voltage value as a surface height value using the calculated reference value, using the voltage value according to the distance between the nozzle and the one particular point is calculated as a voltage gradient, The actual measured voltage value is calculated as the surface height value using the voltage slope to calculate the surface height value.
In the step of calculating the actual measured voltage value as the surface height value using the calculated reference value, the actual measured voltage value is compared with the calculated reference value to the actual measured voltage value to the corresponding surface height value Calculate.
The inspection object uses a flat substrate applied to a semiconductor device and a display device.
As described above, the flatness inspection apparatus according to the embodiments of the present invention injects a fluid onto the surface of the inspection object, and detects the change in pressure depending on the separation distance between the inspection object and the nozzle to inspect the flatness of the inspection object. do. Accordingly, the flatness of the inspection object can be inspected without contacting the inspection object, thereby preventing the inspection object from being damaged by scratches or contaminants. In addition, the substrate inspection can be performed irrespective of the optical characteristics of the inspection object and can be applied to various inspection objects.
1 is a view showing a flatness inspection apparatus according to an embodiment of the present invention
2 shows schematically a measuring unit according to an embodiment of the invention
FIG. 3A depicts an illustration of air scanning the substrate surface spirally. FIG.
3B is a view for explaining the injection of air while moving the nozzle in the horizontal direction;
FIG. 4 is a diagram to explain that air scans a substrate surface in a zigzag shape. FIG.
5 is a view showing a modification of the flatness inspection apparatus according to the embodiment of the present invention
6 is a flowchart illustrating a method of sequentially checking a flatness of an inspection object using the flatness inspection device according to an embodiment of the present invention.
FIG. 7 is a view for explaining a method of calculating a voltage change according to a distance from the nozzle with respect to one specific point of an inspection object surface area by using the flatness inspection device according to the embodiment; FIG.
FIG. 8 is a graph showing a voltage value and a slope of a voltage change according to a distance from the nozzle with respect to a specific point of one surface area of a test object; FIG.
9 is a view for explaining a method of calculating the respective voltage value according to the change in the separation distance from the nozzle to the surface of the inspection object.
10 is a graph showing a change in voltage according to a change in the separation distance from the nozzle to the surface of the inspection object. 11 is an image of the flatness of the entire area of the substrate surface
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but may be implemented in various forms, provided that the embodiments of the present invention are completed to those skilled in the art, and the scope of the invention to those skilled in the art. It is provided for complete information.
1 is a view showing a flatness inspection apparatus according to an embodiment of the present invention. 2 is a view schematically showing a measuring unit according to an embodiment of the present invention. FIG. 3A is a diagram to illustrate that air scans the substrate surface in a spiral. FIG. 3B is a view for explaining the injection of air while moving the nozzle in the horizontal direction. FIG. 4 is a diagram for explaining that air scans a substrate surface in a zigzag shape. 5 is a view showing a modification of the flatness inspection apparatus according to the embodiment of the present invention.
1 and 2, the flatness inspection apparatus according to the embodiment of the present invention is disposed on the
In the embodiment, a circular wafer substrate is used as the inspection object S, and the
The
In the above, the measuring
The elevating
The moving unit 800 includes a
Here, the
The horizontal moving
In the above, the
Also, in the above, the
Hereinafter, a method of measuring flatness of a substrate using a flatness inspection apparatus according to an embodiment of the present invention will be described with reference to FIGS. 1 to 10.
FIG. 6 is a flowchart for sequentially describing a method of inspecting flatness of an inspection object by using the flatness inspection apparatus according to an exemplary embodiment of the present invention. FIG. 7 is a view for explaining a method of calculating a voltage change according to a distance from the nozzle with respect to a specific point of one surface of an object to be inspected by using the flatness test apparatus according to the embodiment. 8 is a graph showing a voltage value and a slope of a voltage change according to a distance from the nozzle with respect to a specific point of one surface area of the inspection object. 9 is a view for explaining a method for calculating the respective voltage value according to the change in the separation distance from the nozzle to the surface of the inspection object. FIG. 10 is a graph illustrating a change in voltage according to a change in the separation distance from the nozzle with respect to the surface of the inspection object illustrated in FIG. 9.
Referring to FIG. 6, while controlling the heights of the
Hereinafter, a method of calculating the reference value will be described in detail. First, an inspection object, for example, a sapphire wafer substrate S, to be measured is placed on the
Subsequently, while moving at least one of the
For example, as shown in FIGS. 7 and 9, when a portion of the surface of the substrate S has a step portion positioned relatively higher than other regions, the entire surface of the substrate S and the
In the above, the method of inspecting the surface of the stepped substrate S as illustrated in FIG. 9 has been described. However, the test of the inclined substrate S may also be performed as shown in FIG. 11. Hereinafter, a method of inspecting the surface flatness of the substrate S having an inclination will be described with reference to FIGS. 11 and 12. In this case, the content overlapping with the above description will be omitted or briefly described.
11 is a view for explaining a method of calculating the respective voltage value according to the change of the separation distance from the nozzle with respect to the surface of the other inspection object. FIG. 12 is a graph illustrating a change in voltage according to a change in the separation distance from the nozzle with respect to the surface of the inspection object illustrated in FIG. 10.
As shown in FIG. 11, the substrate S may include an inclined surface. Hereinafter, for the convenience of description, S1 to S5 will be referred to according to the inclination and the relative height of the substrate S. FIG. When air is injected while the
Thereafter, the pesticide measurement voltage value is calculated as the height value of the surface of the substrate S by using the reference value calculated by the
In the case where the flatness of another region is to be inspected on the same object, that is, the same substrate S, the reference value calculating step, that is, the step S100 is omitted, and the actual measured voltage value of the other surface region of the substrate S is omitted. Step S200 of calculating is performed (S500). Thereafter, the actual measured voltage value of the other surface area of the substrate S is calculated as the height value. By repeating this process a plurality of times, the surface height value of the entire area of the surface of the substrate S can be calculated.
Subsequently, when surface height values of the surface of the substrate S are calculated, the flatness of the substrate S may be determined by comparing the surface height values with the comparison determination unit 720 (S400). Thereafter, the operator may visually determine the flatness of the substrate S by imaging and displaying the image. In the case of the actual substrate (S) has a slope of about several hundred micrometers, such a degree of inclination and flatness of the substrate (S) can be measured by the method according to the embodiment. Moreover, the height or the level | step difference of the surface of the board | substrate S can also be measured.
In the above, the method of inspecting the flatness of the substrate S using the flatness inspection device according to the embodiment has been described. However, the present invention is not limited thereto, and the thickness of the substrate S, the amount of change in height at a specific position, and the like can also be measured. Of course, the present invention is not limited to the example described above, but may be applied to various fields for inspecting the substrate S surface state.
200: chuck 300: measuring unit
400: chuck drive module 500: lifting module
600: horizontal moving module
Claims (15)
A measuring unit having a nozzle for injecting a fluid on the surface of the test object, detecting a change in the fluid jet pressure sprayed from the nozzle according to a separation distance between the nozzle and the test object, and converting the fluid into a voltage value;
An elevating module for elevating the nozzle;
A moving unit which horizontally moves at least one of the chuck and the nozzle so that the chuck and the nozzle move horizontally relative to each other;
The actual measured voltage value measured while scanning the surface of the inspection object is inspected by using, as a reference value, a voltage value according to a change in the distance between the nozzle measured by the measuring unit and a specific point of the surface of the inspection object as a reference value. And a calculating unit that calculates a surface height value of an object and determines flatness by relatively comparing the calculated height values of the surface of the inspection object.
And the measuring unit comprises an air micrometer.
And the moving unit includes a chuck driving module for rotating or horizontally moving the chuck and a horizontal moving module for horizontally moving a nozzle of the measuring unit.
Flatness inspection device provided with a plurality of nozzles.
In relative movement of the chuck and the nozzle of the measuring unit,
Rotate the chuck using the chuck driving module and horizontally move the nozzle in one direction using the horizontal moving module, or horizontally move the nozzle in one direction using a horizontal moving module with the chuck fixed. Or, the flatness inspection device for horizontally moving the chuck using the chuck drive module in the state in which the nozzle is fixed, or horizontally move the chuck and the nozzle, respectively, in different directions.
The calculation unit includes a calculation unit that calculates the actual measured voltage value as a height value of the surface of the inspection object by using the reference value, and a comparison determination unit that relatively compares the calculated height values of the surface of the inspection object to determine flatness. Flatness checking device.
By varying the height of the nozzle to inject a fluid to a specific point on the surface of the inspection object, by detecting the fluid injection pressure according to the separation distance between the nozzle and the one particular point and converting it into a voltage value, a reference value is calculated Doing;
While moving at least one of the nozzle and the inspection object horizontally, the fluid is sprayed to scan the surface of the inspection object through the nozzle to detect the fluid injection pressure according to the change of the separation distance between the surface of the inspection object and the nozzle, Calculating the actual measured voltage value by converting it into a voltage value;
Calculating the actual measured voltage value as a height value of the surface of the inspection object using the calculated reference value;
And comparing the height values of the surface of the inspection object to determine the flatness of the inspection object.
In spraying the fluid to a specific point on the surface of the inspection object while changing the height of the nozzle,
The nozzle is placed above a specific point of one of the inspection object surface areas, and the nozzle is raised or lowered to flatten the fluid from the nozzle while changing the distance between the nozzle and the specific point of the inspection object surface. method of inspection.
Injecting a fluid to scan the surface of the inspection object through the nozzle while horizontally moving at least one of the nozzle and the inspection object,
And the shape in which the fluid scans the surface of the test object is one of a spiral and a zigzag shape.
And rotating the test object and horizontally moving the nozzle in one direction so that the shape of the fluid scanning the test object surface becomes spiral.
And the nozzle moves horizontally so as to pass through the center portion above the test object surface.
The nozzles are horizontally moved alternately in the X direction and the Y direction while the inspection object is fixed, or the inspection objects are alternately horizontally moved in the X direction and the Y direction while the nozzle is fixed, or the inspection object and And horizontally moving the nozzles alternately in the X and Y directions so that the shape of the fluid scanning the surface of the inspection object becomes a zigzag shape.
In the step of calculating the actual measured voltage value as a surface height value using the calculated reference value,
A flatness that is calculated as a voltage gradient using a voltage value according to the distance between the nozzle and the one specific point, and calculates the actual measured voltage value as a surface height value using the voltage slope to calculate a surface height value Road inspection method.
In the step of calculating the actual measured voltage value as a surface height value using the calculated reference value,
And comparing the actual measured voltage value with the reference value calculated above to calculate the actual measured voltage value as a corresponding surface height value.
The inspection object is a flatness test method using a flat substrate applied to a semiconductor device and a display device.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020100128428A KR101215991B1 (en) | 2010-12-15 | 2010-12-15 | Flatness level inspection apparatus and method for inspecting measuring method using the same |
TW100146238A TWI439663B (en) | 2010-12-15 | 2011-12-14 | Flatness level inspection apparatus and method for inspecting flatness level using the same |
CN2011104173701A CN102564359A (en) | 2010-12-15 | 2011-12-14 | Flat level degree detection device and method using the device to detect flat level degree |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020100128428A KR101215991B1 (en) | 2010-12-15 | 2010-12-15 | Flatness level inspection apparatus and method for inspecting measuring method using the same |
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KR20120067036A true KR20120067036A (en) | 2012-06-25 |
KR101215991B1 KR101215991B1 (en) | 2012-12-27 |
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KR1020100128428A KR101215991B1 (en) | 2010-12-15 | 2010-12-15 | Flatness level inspection apparatus and method for inspecting measuring method using the same |
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KR (1) | KR101215991B1 (en) |
CN (1) | CN102564359A (en) |
TW (1) | TWI439663B (en) |
Cited By (4)
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KR101392163B1 (en) * | 2013-05-10 | 2014-05-12 | (주)여주전자 | Flatness testing apparatus of squeeze blade for screen printer |
KR20170104048A (en) * | 2016-03-03 | 2017-09-14 | 에이피시스템 주식회사 | Detecting method of substrate inverting for Laser lift off process |
CN107664488A (en) * | 2017-09-22 | 2018-02-06 | 芜湖禾丰离合器有限公司 | A kind of clutch plate hub flatness detection machine |
CN113295077A (en) * | 2017-03-26 | 2021-08-24 | 株式会社阿迪泰克工程 | Flatness measuring method |
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JP7012538B2 (en) * | 2018-01-11 | 2022-01-28 | 株式会社ディスコ | Wafer evaluation method |
CN111351464A (en) * | 2018-12-20 | 2020-06-30 | 鸿富锦精密电子(郑州)有限公司 | Flatness detection device and method |
CN110285783B (en) * | 2019-07-31 | 2021-08-31 | 三峡大学 | Hole part surface roughness measuring device and method |
CN110926316B (en) * | 2019-12-04 | 2021-04-09 | 龙口市江达汽车配件有限公司 | Flatness detection device for brake disc of new energy automobile |
CN113739726B (en) * | 2020-05-29 | 2023-01-13 | 上海微电子装备(集团)股份有限公司 | Warping sheet detection method, device and equipment |
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JPS5935103A (en) * | 1982-08-23 | 1984-02-25 | Hitachi Ltd | Method for measuring flatness of wafer |
JPH0493709A (en) * | 1990-08-10 | 1992-03-26 | Hitachi Zosen Corp | Flatness measuring apparatus |
KR100239579B1 (en) | 1997-12-31 | 2000-01-15 | 윤종용 | Distance measuring equipment using air pressure |
JP2000337845A (en) * | 1999-05-25 | 2000-12-08 | Toshiba Ceramics Co Ltd | Flatness measuring device for plate-like object |
DE10361160A1 (en) * | 2003-12-22 | 2005-07-21 | Voith Paper Patent Gmbh | measuring device |
JP2006007369A (en) * | 2004-06-25 | 2006-01-12 | Nippei Toyama Corp | Surface shape determining device for object to be measured in machine tool |
JP2006010466A (en) | 2004-06-25 | 2006-01-12 | Matsushita Electric Ind Co Ltd | Method and apparatus for measuring flatness of board |
CN101251375A (en) * | 2008-04-03 | 2008-08-27 | 合肥工业大学 | Micro-nano gradation press type gas needle sensor |
-
2010
- 2010-12-15 KR KR1020100128428A patent/KR101215991B1/en not_active IP Right Cessation
-
2011
- 2011-12-14 TW TW100146238A patent/TWI439663B/en not_active IP Right Cessation
- 2011-12-14 CN CN2011104173701A patent/CN102564359A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
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KR101392163B1 (en) * | 2013-05-10 | 2014-05-12 | (주)여주전자 | Flatness testing apparatus of squeeze blade for screen printer |
KR20170104048A (en) * | 2016-03-03 | 2017-09-14 | 에이피시스템 주식회사 | Detecting method of substrate inverting for Laser lift off process |
CN113295077A (en) * | 2017-03-26 | 2021-08-24 | 株式会社阿迪泰克工程 | Flatness measuring method |
CN113295077B (en) * | 2017-03-26 | 2023-09-12 | 株式会社阿迪泰克工程 | Flatness measuring method |
CN107664488A (en) * | 2017-09-22 | 2018-02-06 | 芜湖禾丰离合器有限公司 | A kind of clutch plate hub flatness detection machine |
Also Published As
Publication number | Publication date |
---|---|
TWI439663B (en) | 2014-06-01 |
KR101215991B1 (en) | 2012-12-27 |
CN102564359A (en) | 2012-07-11 |
TW201224393A (en) | 2012-06-16 |
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