KR20120043646A - Solvent for printing - Google Patents

Abstract

PURPOSE: Solvent or a solvent composition is provided to have excellent solubility and low moisture-absorbing ability, thereby preventing deterioration of organic EL devices due to moisture. CONSTITUTION: Solvent or a solvent composition, which is used at forming device patterns composing a plasma display or electronic paper, an organic thin film transistor, or a solar cell by a printing method, comprises a compound of which one end is methyl group, and the other end is a C3-5 linear or branched alkyl group of two terminated alkyl groups of propylene glycol dialkyl ether. The printing method is at least one kind of a method selected from inkjet method, screen method, steel plate method, offset method, gravure method, microcontact method, and nanoimprint method.

Description

Solvent or Solvent Composition for Printing {SOLVENT FOR PRINTING}

This invention relates to the solvent or solvent composition used at the time of pattern formation by the printing method which is hard to absorb moisture and excellent in resin solubility.

Conventionally, the pattern formation of electronic components, such as a wiring board and a display, was formed by the method called photolithography in many cases. Photolithography is a method of apply | coating a paste composition to a board | substrate, exposing and baking a micropattern, and removing a unnecessary part by an etching and performing pattern formation. However, in general, since the apparatus itself becomes huge because it requires an etching waste liquid treatment facility, a large amount of equipment investment is required, the use efficiency of materials is bad, and there are many manufacturing processes, and it was a problem that productivity was bad. In addition, since the capacity of the apparatus is limited, pattern formation on a large area substrate was difficult.

Therefore, in recent years, as a pattern formation method, a huge apparatus is unnecessary, the use efficiency of a material is good, and the inkjet method, the screen printing method, the iron plate printing method, the offset printing method, the gravure printing method which are easy to respond to a large area board | substrate Attention has been paid to printing methods such as the microcontact printing method and the nanoimprint method. As a solvent used for the paste composition used for the printing method, Ethylene glycol ether solvents, such as diethylene glycol dimethyl ether and diethylene glycol dibutyl ether, dipropylene glycol dimethyl ether, dipropylene glycol diethyl ether, dipropylene glycol In many cases, propylene glycol ether solvents such as dipropyl ether and dipropylene glycol dibutyl ether are used. However, ethylene glycol ether solvents have a problem that they are difficult to use because they have ecotoxicity (Non-Patent Document 1).

On the other hand, it is known to use it as a solvent for the paste composition which forms the element which comprises a solar cell with respect to a propylene glycol ether solvent (patent document 1), and patent document 2 has strong lipophilic property among propylene glycol dialkyl ethers. The use of propylene glycol dibutyl ether is described.

Moreover, in the paste composition which forms the element which comprises an organic thin film transistor, an electronic paper, and a plasma display, propylene glycol di, such as propylene glycol dimethyl ether, propylene glycol diethyl ether, propylene glycol dipropyl ether, and propylene glycol dibutyl ether It is known that alkyl ether is used as a solvent (patent documents 3, 4, 5).

International Publication WO 2003/052003 Japanese Patent Laid-Open No. 2001-135140 Japanese Patent Laid-Open No. 2007-167834 Japanese Patent Laid-Open No. 2004-61911 Japanese Patent Publication No. 2007-314376

 International Chemical Concise Evaluation Document No.41 Diethylene Glycol Dimethyl Ether (2002)

Propylene glycol dialkyl ether is excellent in volatility, in particular propylene glycol dimethyl ether is high in hydrophilicity and easy to absorb moisture, so as a solvent in the paste composition for forming a device pattern constituting a solar cell, an organic thin film transistor, an electronic paper or a plasma display. When used, the device may deteriorate. On the other hand, propylene glycol dibutyl ether has high lipophilic properties and low hygroscopicity. However, it is used as a printing solvent because the solubility of binder resins such as ethyl cellulose and acrylic resin contained in the paste composition is low. It was difficult to do.

Accordingly, an object of the present invention is to provide a solvent or solvent composition for printing a solar cell, an organic thin film transistor, an electronic paper, or a plasma display pattern printing having high solubility and low hygroscopicity of resin additives such as binder resin.

Another object of the present invention is to provide a paste composition for forming a solar cell, an organic thin film transistor, an electronic paper or a plasma display pattern containing the solvent or solvent composition for printing the solar cell, an organic thin film transistor, an electronic paper or a plasma display pattern. have.

It is still another object of the present invention to provide a pattern forming method for forming a pattern by using the paste composition for forming a solar cell, an organic thin film transistor, an electronic paper, or a plasma display pattern.

The present inventors have intensively studied a result, propylene glycol and the end group on one side, a methyl group of an alkyl ether, and a terminal alkyl group and the other terminal of a straight chain or branched chain C _{3 -5} alkyl group is to solve the aforementioned problems Excellent in the balance of the solubility and hygroscopicity of the resin additive, and when the compound is used as a solvent when forming a device pattern constituting a solar cell, an organic thin film transistor, an electronic paper or a plasma display, the formation of the device pattern by a printing method. It was found that sufficient binder resin solubility can be exerted to perform the step, and an element hardly deteriorated by moisture absorption can be formed. This invention is completed based on these knowledge.

That is, this invention is a solvent or solvent composition used when forming the element pattern which comprises a solar cell, an organic thin film transistor (henceforth "organic TFT"), an electronic paper, or a plasma display by the printing method. And a compound in which one of the two terminal alkyl groups of propylene glycol dialkyl ether is a methyl group and the other is a linear or branched alkyl group having 3 to 5 carbon atoms, or a solar cell, an organic thin film transistor, an electronic paper, or A solvent or solvent composition for plasma display pattern printing (hereinafter, simply referred to as "pattern printing solvent or solvent composition") is provided.

As the printing method, at least one method selected from the group consisting of an inkjet method, a screen printing method, an iron plate printing method, an offset printing method, a gravure printing method, a microcontact printing method and a nanoimprint method is preferable.

The present invention further relates to a solar cell, an organic thin film transistor, an electronic paper, or a plasma display pattern forming paste composition (hereinafter, simply referred to as a "pattern forming paste composition") containing at least the pattern printing solvent or the solvent composition and the binder resin. Is provided).

As said binder resin, cellulose resin and / or acrylic resin are preferable.

The present invention also provides a method for forming a pattern of a device constituting a solar cell, an organic TFT, an electronic paper or a plasma display, the method of printing a paste composition for forming the solar cell, an organic thin film transistor, an electronic paper or a plasma display pattern on a substrate. It provides the pattern formation method characterized by having the process of forming a pattern layer by apply | coating using it, and the process of hardening or baking the said pattern layer.

Since the solvent or solvent composition for pattern printing of this invention contains the compound whose one of the two terminal alkyl groups of the said propylene glycol dialkyl ether is a methyl group, and the other is a C3-C5 linear or branched alkyl group, binder resin It is excellent in the solubility of resin additives, such as these, and its very hygroscopicity is low.

Therefore, the pattern formation paste composition containing the solvent for pattern printing or the solvent composition of this invention can be apply | coated efficiently and uniformly also to a large area and / or a flexible base material by the printing method, A solar cell, an organic TFT In the production of devices constituting electronic paper, plasma displays, and the like, fine device patterns can be formed with high accuracy. In addition, since it is difficult to absorb moisture, deterioration of the device due to moisture can be suppressed.

[Solvent or Solvent Composition for Pattern Printing]

The solvent or solvent composition for pattern printing which concerns on this invention is a solvent or solvent composition used when forming the element which comprises a solar cell, an organic TFT, an electronic paper, or a plasma display by the printing method, and has two propylene glycol dialkyl ethers. It is characterized by including the compound whose one of a terminal alkyl group is a methyl group, and the other is a C3-C5 linear or branched alkyl group.

As said printing method, the inkjet method, the screen printing method, the iron plate printing method, the offset printing method, the gravure printing method, the microcontact printing method, the nanoimprint method, etc. are mentioned, for example.

As a C3-C5 linear or branched alkyl group in the terminal alkyl group of propylene glycol dialkyl ether, For example, linear alkyl groups, such as n-propyl, n-butyl, n-pentyl group; And branched alkyl groups such as isopropyl, isobutyl, s-butyl, t-butyl, isopentyl, s-pentyl and t-pentyl groups. In this invention, a C3-C5 linear alkyl group is especially preferable, and especially n-propyl, n-butyl, n-pentyl group is preferable at the point which procurement of a raw material is easy.

As a compound whose one of the two terminal alkyl groups of the propylene glycol dialkyl ether in this invention is a methyl group, and the other is a C3-C5 linear or branched alkyl group, For example, propylene glycol methyl- n-propyl ether, Propylene glycol methyl-n-butyl ether, propylene glycol methyl-n-pentyl ether, and the like. These may be used independently, or may mix and use 2 or more types.

Moreover, it is preferable that the solvent or solvent composition for pattern printing which concerns on this invention balanced the hydrophilicity and lipophilic property, for example, it is preferable that moisture content is 3% or less (among these, 1.5% or less). When moisture content exceeds the said range, the element formed using the solvent for pattern printing or the solvent composition which concerns on this invention tends to become easy to deteriorate.

Moreover, it is preferable that the solvent or solvent composition for pattern printing which concerns on this invention is excellent in the solubility of resin additives, such as ethyl cellulose, and it is preferable to melt | dissolve ethyl cellulose 5weight% or more, for example. When the dissolved amount of resin additives, such as ethyl cellulose, is less than the said range, a viscosity will become low and there exists a tendency for thixotropy and the shape stability of a printed matter to run short.

In addition to the propylene glycol dialkyl ether, other solvents may be used as the pattern printing solvent or the solvent composition of the present invention, if necessary, within the range of not impairing the balance between hydrophilicity and lipophilic. The compounding ratio of another solvent can be adjusted suitably.

As another solvent, the solvent generally used for a printing use can be used, For example, Carboxylic acids, such as caproic acid and caprylic acid; Alcohols such as isopropyl alcohol, 1-octanol, 1-nonanol and benzyl alcohol; Ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; Ethylene glycol monoalkyl ether acetates such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monobutyl ether acetate, and ethylene glycol monophenyl ether acetate; Diethylene glycol monoalkyl ethers such as diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether and diethylene glycol monobutyl ether; Diethylene glycol monoalkyl ether acetates such as diethylene glycol monoethyl ether acetate and diethylene glycol monobutyl ether acetate; Diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether and diethylene glycol diethyl ether; Other ethers such as benzyl ethyl ether, dihexyl ether and tetrahydrofuran; Propylene glycol monoalkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, and propylene glycol monobutyl ether acetate; Dipropylene glycol monoalkyl ether acetates such as dipropylene glycol methyl ether acetate; Propylene glycol monoalkyl ethers such as propylene glycol propyl ether and propylene glycol butyl ether; Dipropylene glycol monoalkyl ethers such as dipropylene glycol methyl ether, dipropylene glycol propyl ether and dipropylene glycol butyl ether; Tripropylene glycol monoalkyl ethers such as tripropylene glycol methyl ether and tripropylene glycol butyl ether; Propylene glycol dialkyl ethers other than the above, such as propylene glycol dimethyl ether and propylene glycol diethyl ether; Dipropylene glycol dialkyl ethers such as dipropylene glycol methyl propyl ether, dipropylene glycol methyl butyl ether, dipropylene glycol methyl pentyl ether, and dipropylene glycol dimethyl ether; Tripropylene glycol dialkyl ethers such as tripropylene glycol dimethyl ether; Diacetates such as propylene glycol diacetate, 1,3-butylene glycol diacetate, 1,6-hexanediol diacetate, and 1,4-butanediol diacetate; Other acetates such as cyclohexanol acetate, 3-methoxybutyl acetate, ethyl lactate, triacetin, dihydroterpinyl acetate; Ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, acetonyl acetone, cyclohexanone, isophorone, 2-heptanone and 3-heptanone; Methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, benzyl acetate, ethylacetyl lactate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, 2-hydroxy- Ethyl 2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, 2-hydroxy-3 Methyl methyl butyrate, 3-methyl-3-methoxybutyl acetate, 4-methoxybutyl acetate, 3-methyl-3-methoxybutylpropionate, ethyl acetate, propyl acetate, butyl acetate, amyl formate, acetic acid Esters such as amyl, butyl propionate, ethyl butyrate, propyl butyrate, butyl butyrate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate and ethyl 2-oxobutanoate; Aromatic hydrocarbons such as toluene and xylene; Amides such as N-methylpyrrolidone, N, N-dimethylformamide and N, N-dimethylacetamide; Terpenes such as terpineol, dihydroterpineol, dihydroterpinylpropionate, limonene, mentan and menthol; High boiling point solvents, such as mineral spirit, petroleum naphtha S-100, petroleum naphtha S-150, tetralin, and turpentine oil, etc. are mentioned.

[Paste Composition for Pattern Formation]

The paste composition for pattern formation which concerns on this invention contains at least the said solvent for pattern printing or a solvent composition, and binder resin, It is characterized by the above-mentioned.

It does not specifically limit as binder resin, Resin for the main pipe used for formation of the element in a solar cell, an organic TFT, an electronic paper, or a plasma display can be used, For example, methyl cellulose, ethyl cellulose, hydroxy cellulose, And vinyl resins such as cellulose resins such as methyl hydroxy cellulose, acrylic resins, polyvinylacetate, and polyvinyl alcohol. These can be used individually or in mixture of 2 or more types. In this invention, it is preferable to use a cellulose resin from the point which is excellent in the plate | board separation at the time of application | coating, and excellent in thixotropy property and the shape stability of printed matter.

As content of the said pattern printing solvent or solvent composition in the paste composition for pattern formation, it is about 1-99 weight%, for example, Preferably it is about 3-75 weight%. When content of the solvent for pattern printing or a solvent composition is less than the said range, the viscosity of the paste composition for pattern formation becomes high too much, and it exists in the tendency to use for a printing use. On the other hand, when content of the solvent for pattern printing or a solvent composition exceeds the said range, drying takes time and it exists in the tendency for a work efficiency to fall.

As content of binder resin in the paste composition for pattern formation, it is about 0.1-15 weight%, for example, Preferably it is about 1-10 weight%. If the content of the binder resin is less than the above range, thixotropy and the shape stability of the printed matter tend to be insufficient, while if the content of the binder resin exceeds the above range, the viscosity becomes too high and it is difficult to use for printing. .

The paste composition for pattern formation which concerns on this invention may express any of a conductor function, an insulation function, and a semiconductor function, and may mix | blend other additives other than the above. As other additives, for example, metal materials such as metal oxides and dielectric materials, organic TFT materials, conductive polymer materials, ion conductor materials, organic-inorganic hybrid ion conductive materials, organic or inorganic pigments, dispersants, antifoaming agents, stabilizers, antioxidants , A curing accelerator, a sensitizer, a filler, an ultraviolet absorber, an aggregation inhibitor, and the like. As a compounding quantity of another additive, what is necessary is just in the range which does not impair the effect of this invention, and is about 0.1 to 99 weight% of the whole pattern composition paste composition, for example.

The paste composition for pattern formation which concerns on this invention mix | blends the said pattern printing solvent or solvent composition, binder resin, and another additive as needed, for example, and knead | mixes enough using a stirring apparatus, such as a mixing mixer, and it is uniform. It can manufacture by dispersing.

Since the pattern formation paste composition which concerns on this invention can be pattern-formed by apply | coating to a base material etc. by the printing method, an element can be formed easily and efficiently also on a large area and a flexible substrate surface easily.

[Pattern Forming Method]

The pattern formation method which concerns on this invention is a pattern formation method of the element which comprises a solar cell, an organic TFT, an electronic paper, or a plasma display, The pattern layer is apply | coated by apply | coating the said pattern formation paste composition on a board | substrate using the printing method. It has a process (pattern printing process) to form, and the process (pattern hardening or baking process) of hardening or baking the said pattern layer, It is characterized by the above-mentioned.

As a printing method in a pattern printing process, at least 1 sort (s) of method chosen from the group which consists of an inkjet method, the screen printing method, the iron plate printing method, the offset printing method, the gravure printing method, the microcontact printing method, and the nanoimprinting method is mentioned. Can be.

The pattern layer formed by the said printing method can be hardened | cured by drying and heat-processing and / or light irradiation after that. Moreover, you may bake without drying, after hardening. As a drying method, the method of heating about 0.1 to 3 hours, etc. are mentioned, for example at the temperature of about 80-200 degreeC. When heat-processing, as the temperature, it can adjust suitably according to the component, catalyst type, etc. which are used for reaction, and it is about 50-200 degreeC, for example. Moreover, as heating time, it is about 0.5 to 3 hours, for example. When irradiating light, as a light source, a mercury lamp, a xenon lamp, a carbon arc lamp, a metal halide lamp, sunlight, an electron beam, a laser beam, etc. can be used, for example. As light irradiation time, it is about 0.5 to 30 minutes, for example. When baking, as baking temperature, it is about 200-1500 degreeC, for example. Moreover, as baking time, it is about 0.1 to 5 hours, for example.

The pattern layer thickness obtained by the said method can be adjusted suitably according to a use, and is about several nm-200 micrometers, for example.

As a board | substrate which forms a pattern layer, what has heat resistance and solvent resistance is preferable, For example, polyethylene terephthalate, polyethylene naphthalate, polyester, polyethylene, polypropylene, polystyrene, polyamide, polyimide, polyvinyl alcohol, poly Fluorine-containing resins such as vinyl butyral, polyvinyl chloride, polyvinylidene chloride, polyfluoroethylene, polycarbonate, acrylic resin, methacryl resin, cycloolefin copolymer, conductive polymer, nylon, cellulose, glass, ITO and the like Can be mentioned. As a board | substrate thickness, it is about 0.1-50 mm, for example.

In general, a solar cell (especially an organic solar cell) has a photoelectric conversion layer comprising an n-type semiconductor layer and a p-type semiconductor layer sandwiched between a light incident side electrode (including a bus electrode and a finger electrode) and a backside electrode. Has a structure.

A solar cell can be manufactured by the following method, for example. According to the pattern formation method which concerns on this invention, the element which comprises a solar cell can be formed with high precision.

1: The p-type semiconductor which added B (boron atom) etc. as an impurity is formed by the printing method.

2: The surface of the obtained p-type semiconductor is subjected to texture (concave-convex) processing, and then the n-type semiconductor including P (phosphorus atom) or the like as an impurity is laminated by a printing method.

3: An antireflection film of silicon nitride, titanium oxide or the like is formed on the p-type semiconductor surface.

4: A bus electrode and a finger electrode (light incidence side electrode) are formed on the n-type semiconductor surface by the printing method.

In general, the organic TFT is composed of an electrode layer (gate electrode layer, source electrode layer, drain electrode layer) and an organic semiconductor layer. According to the pattern formation method which concerns on this invention, the element which comprises an organic TFT can be formed with precision.

In general, electronic paper has a structure in which a display layer and a driver layer for controlling it are sandwiched between substrates. By employing the organic TFT as a driver layer, a flexible display can be realized.

In general, a plasma display has a structure in which a rare gas is enclosed by opposing a front glass substrate on which an electrode is formed on a surface and a back glass substrate on which an electrode and a phosphor layer are formed at narrow intervals.

A plasma display can be manufactured by the following method, for example. According to the pattern formation method according to the present invention, the elements constituting the plasma display can be formed with high precision.

1: A display electrode and a bus electrode are formed on a front glass substrate.

2: Further, a dielectric layer and an MgO layer are formed.

3: A data electrode is formed on a back glass substrate, a dielectric layer is formed, and a barrier rib and a phosphor layer are further formed.

4: After attaching a front glass substrate and a back glass substrate, exhausting and sealing a discharge gas, a printed circuit board is mounted.

Since the pattern forming method according to the present invention uses the printing method, the pattern can be formed in a non-contact state with respect to the substrate, and the pattern can be easily formed on a large area and / or a flexible substrate. Therefore, especially in manufacture of the element which comprises a solar cell, an organic TFT, an electronic paper, a plasma display, etc., a fine element pattern can be formed with high precision. In addition, it is possible to directly describe without going through a complicated process such as the manufacture of a mask, there is no need to use a microfabrication technology. In addition, it can be manufactured under an ambient temperature and normal pressure environment. Therefore, the manufacturing process can be greatly simplified, the equipment can be simplified, and the manufacturing cost can be reduced.

[Example]

EXAMPLES Hereinafter, although an Example demonstrates this invention more concretely, this invention is not limited by these Examples.

Example 1

20 g of propylene glycol methyl-n-butyl ether (trade name "PMNB", manufactured by Daicel Chemical Industries, Ltd., may be hereinafter referred to as "PMNB") and 20 g of distilled water in a 50 ml flask, and approximately 10 minutes After stirring, the mixture was allowed to stand for 10 minutes and the water content of the organic phase was measured. As a result, the water concentration in a 25 ° C environment was 0.7%.

20.00 g of each of the above-described PMNBs were put into four 50 ml flasks, and 1.05 g (5% solution) and 1.28 g (6% solution) of the brand name "Ethocell" (registered trademark) (ethyl cellulose, manufactured by DOW Corporation) respectively. ), 1.51 g (7% solution) and 1.74 g (8% solution) were added. Thereafter, the mixture was stirred at 65 ° C, left to stand, and naturally cooled to 25 ° C. The solubility of ethyl cellulose was visually confirmed and evaluated based on the following criteria.

Evaluation standard

Ethyl cellulose completely dissolved: ○

Ethylcellulose was partially or completely insoluble: ×

Example 2

20 g of propylene glycol methyl-n-propyl ether (trade name "PMNP", manufactured by Daicel Chemical Industries, Ltd., may be hereinafter referred to as "PMNP") and 20 g of distilled water in a 50 ml flask. After stirring, the mixture was allowed to stand for 10 minutes and the water content of the organic phase was measured. As a result, the water concentration in a 25 ° C environment was 1.0%.

The solubility of ethyl cellulose was evaluated in the same manner as in Example 1 except that PMNP was used instead of PMNB.

Comparative Example 1

20 g of propylene glycol dimethyl ether (trade name "High Solve MMPOM", manufactured by Toho Chemical Co., Ltd., may be referred to as "MMPOM" thereafter) and 20 g of distilled water in a 50 ml flask, followed by stirring for about 10 minutes. After standing for 10 minutes and measuring the moisture of the organic phase, the moisture concentration in 25 degreeC environment was 7.3%.

The solubility of ethyl cellulose was evaluated in the same manner as in Example 1 except that MMPOM was used instead of PMNB.

Comparative Example 2

20 g of propylene glycol dibutyl ether (hereinafter may be referred to as "PDB") synthesized by the method described in `` Fifth Edition Experiment Science Lecture 14 '' (Maruzen Kabushiki Kasho, P239-241), distilled water 20 g was placed in a 50 ml flask, the mixture was stirred for about 10 minutes, and then left standing for 10 minutes, and the moisture content of the organic phase was measured. The water concentration in a 25 ° C environment was 0.1%.

The solubility of ethyl cellulose was evaluated in the same manner as in Example 1 except that PDB was used instead of PMNB.

The results are shown in the following table.

Claims (5)

As a solvent or a solvent composition used when forming the element pattern which comprises a solar cell, an organic thin film transistor, an electronic paper, or a plasma display by the printing method, one of the two terminal alkyl groups of propylene glycol dialkyl ether is a methyl group, and the other A solvent or a solvent composition for printing a solar cell, an organic thin film transistor, an electronic paper or a plasma display pattern, wherein one comprises a compound which is a linear or branched alkyl group having 3 to 5 carbon atoms. The method according to claim 1, wherein the printing method is at least one method selected from the group consisting of an inkjet method, a screen printing method, an iron plate printing method, an offset printing method, a gravure printing method, a microcontact printing method and a nanoimprint method. Solvent or solvent composition for printing batteries, organic thin film transistors, electronic paper or plasma display patterns. A solar cell, an organic thin film transistor, an electronic paper or a plasma display pattern for forming a solar cell, an organic thin film transistor, an electronic paper or a plasma display pattern printing solvent or a solvent composition according to claim 1 or at least a binder resin. Paste composition. The paste composition for forming a solar cell, an organic thin film transistor, an electronic paper, or a plasma display pattern according to claim 3, wherein the binder resin is a cellulose resin and / or an acrylic resin. A pattern forming method of an element constituting a solar cell, an organic thin film transistor, an electronic paper or a plasma display, comprising: a paste for forming the solar cell, an organic thin film transistor, an electronic paper or a plasma display pattern according to claim 3 or 4 on a substrate It has a process of forming a pattern layer by apply | coating a composition using the printing method, and the process of hardening or baking the said pattern layer, The pattern formation method characterized by the above-mentioned.