KR20120037744A - 기판처리시스템 - Google Patents
기판처리시스템 Download PDFInfo
- Publication number
- KR20120037744A KR20120037744A KR1020100099389A KR20100099389A KR20120037744A KR 20120037744 A KR20120037744 A KR 20120037744A KR 1020100099389 A KR1020100099389 A KR 1020100099389A KR 20100099389 A KR20100099389 A KR 20100099389A KR 20120037744 A KR20120037744 A KR 20120037744A
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- South Korea
- Prior art keywords
- chamber
- substrate
- main chamber
- opening
- processing system
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
- F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
- F16K3/16—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with special arrangements for separating the sealing faces or for pressing them together
- F16K3/18—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with special arrangements for separating the sealing faces or for pressing them together by movement of the closure members
- F16K3/188—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with special arrangements for separating the sealing faces or for pressing them together by movement of the closure members by means of hydraulic forces
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
본 발명에 의한 기판처리시스템은 측벽에 복수의 개구부가 형성된 메인챔버; 상기 메인챔버의 개구부 외측에 구비된 복수의 공정챔버; 및 일측에 개구부가 형성되고, 상기 메인챔버의 내부에 구비되어 회전에 의해 스탭운동하면서 상기 공정챔버에 기판을 공급하는 반송챔버;를 포함한다.
Description
도 3 내지 도 7은 도 1에 도시된 실시예의 작동상태를 나타낸 것이다.
11: 개구부 20: 로딩/언로딩챔버
30: 공정챔버 31: 개구부
32,33: 스퍼터건 40: 회전테이블
50: 반송챔버 B: 밸로우즈
G: 게이트밸브
Claims (10)
- 측벽에 복수의 개구부가 형성된 메인챔버;
상기 메인챔버의 개구부 외측에 구비된 복수의 공정챔버; 및
일측에 개구부가 형성되고, 상기 메인챔버의 내부에 구비되어 회전에 의해 스탭운동하면서 상기 공정챔버에 기판을 공급하는 반송챔버;를 포함하는 것을 특징으로 하는 기판처리시스템.
- 제1항에 있어서,
상기 메인챔버는 평면형상이 원형 또는 다각형인 것을 특징으로 하는 기판처리시스템.
- 제1항에 있어서,
상기 메인챔버와 공정챔버 사이에는 상기 개구부를 개폐하는 게이트밸브가 더 구비되는 것을 특징으로 하는 기판처리시스템.
- 제1항에 있어서,
상기 반송챔버를 회전시키는 회전수단이 더 구비되는 것을 특징으로 하는 기판처리시스템.
- 제4항에 있어서,
상기 회전수단은 상면에 상기 반송챔버가 장착된 회전테이블인 것을 특징으로 하는 기판처리시스템.
- 제4항에 있어서,
상기 메인챔버와 반송챔버의 개구부를 기류적으로 연통시키는 실링수단이 더 구비되는 것을 특징으로 하는 기판처리시스템.
- 제5항에 있어서,
상기 실링수단은 밸로우즈인 것을 특징으로 하는 기판처리시스템.
- 제1항에 있어서,
상기 기판을 고정한 상태에서 상기 반송챔버와 공정챔버 사이로 왕복운동하는 기판홀더가 더 구비되는 것을 특징으로 하는 기판처리시스템.
- 제8항에 있어서,
상기 기판홀더는 상기 기판을 기립하여 고정하는 것을 특징으로 하는 기판처리시스템.
- 제9항에 있어서,
상기 기판홀더는 양면에 각각 기판을 고정시키는 것을 특징으로 하는 기판처리시스템.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020100099389A KR101409808B1 (ko) | 2010-10-12 | 2010-10-12 | 기판처리시스템 |
Applications Claiming Priority (1)
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---|---|---|---|
KR1020100099389A KR101409808B1 (ko) | 2010-10-12 | 2010-10-12 | 기판처리시스템 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20120037744A true KR20120037744A (ko) | 2012-04-20 |
KR101409808B1 KR101409808B1 (ko) | 2014-07-02 |
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Application Number | Title | Priority Date | Filing Date |
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KR1020100099389A KR101409808B1 (ko) | 2010-10-12 | 2010-10-12 | 기판처리시스템 |
Country Status (1)
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KR (1) | KR101409808B1 (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101971276B1 (ko) * | 2018-07-18 | 2019-04-22 | 주식회사 필옵틱스 | 유리 성형 장치 |
CN111661605A (zh) * | 2020-06-23 | 2020-09-15 | 侯玉梅 | 一种用于易碎薄片的翻转装置及翻转方法 |
CN113130345A (zh) * | 2019-12-31 | 2021-07-16 | 中微半导体设备(上海)股份有限公司 | 基片处理系统及其维护方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102617710B1 (ko) | 2020-08-05 | 2024-01-25 | 주식회사 이노헨스 | 기판 처리장치 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100661299B1 (ko) * | 2005-02-01 | 2006-12-26 | 주식회사 야스 | 다층박막 제작장치 |
KR20070029032A (ko) * | 2005-09-08 | 2007-03-13 | 주성엔지니어링(주) | 이동식 이송챔버와 이를 포함하는 기판처리장치 |
KR101027509B1 (ko) * | 2008-08-21 | 2011-04-06 | 주식회사 선익시스템 | 막 증착 장치 |
-
2010
- 2010-10-12 KR KR1020100099389A patent/KR101409808B1/ko active IP Right Grant
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101971276B1 (ko) * | 2018-07-18 | 2019-04-22 | 주식회사 필옵틱스 | 유리 성형 장치 |
CN113130345A (zh) * | 2019-12-31 | 2021-07-16 | 中微半导体设备(上海)股份有限公司 | 基片处理系统及其维护方法 |
CN113130345B (zh) * | 2019-12-31 | 2023-12-08 | 中微半导体设备(上海)股份有限公司 | 基片处理系统及其维护方法 |
CN111661605A (zh) * | 2020-06-23 | 2020-09-15 | 侯玉梅 | 一种用于易碎薄片的翻转装置及翻转方法 |
CN111661605B (zh) * | 2020-06-23 | 2021-12-17 | 邳州市景鹏创业投资有限公司 | 一种用于易碎薄片的翻转装置及翻转方法 |
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Publication number | Publication date |
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KR101409808B1 (ko) | 2014-07-02 |
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