KR20120000095A - Polyester composite for forming thermoset films - Google Patents

Polyester composite for forming thermoset films Download PDF

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KR20120000095A
KR20120000095A KR1020117024896A KR20117024896A KR20120000095A KR 20120000095 A KR20120000095 A KR 20120000095A KR 1020117024896 A KR1020117024896 A KR 1020117024896A KR 20117024896 A KR20117024896 A KR 20117024896A KR 20120000095 A KR20120000095 A KR 20120000095A
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film formation
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타다시 하타나카
이사오 아다치
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닛산 가가쿠 고교 가부시키 가이샤
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    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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    • G02F1/133711Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
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    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
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Abstract

[과제] 경화막 형성 후에는 높은 용제내성, 액정 배향성, 내열성, 고투명성 그리고 고평탄화성을 나타낼 뿐 아니라, 경화막 형성 시에는, 컬러필터의 평탄화막의 제작라인에 적용 가능한 글리콜계 용제나 유산에스테르계 용제에 용해될 수 있는 재료를 제공할 것. [해결수단] (A)성분, (B)성분 및 (C)성분을 함유하는 열경화막 형성용 폴리에스테르 조성물: (A)성분: 테트라카르본산 이무수물과 디올 화합물을 반응시켜 얻어지는 폴리에스테르, (B)성분: 에폭시기를 2개 이상 갖는 에폭시 화합물, (C)성분: 디아민 화합물, 디카르본산 무수물 및 테트라카르본산 이무수물을 반응시켜 얻어지는 아미노기 함유 카르본산 화합물.[PROBLEMS] After the cured film is formed, not only does it exhibit high solvent resistance, liquid crystal alignment property, heat resistance, high transparency and high flattening property, but also when the cured film is formed, a glycol-based solvent or lactic acid ester applicable to the production line of the flattening film of the color filter. Provide materials that are soluble in solvents. SOLUTION: The polyester composition for thermosetting film formation containing (A) component, (B) component, and (C) component: (A) component: Polyester obtained by making tetracarboxylic dianhydride and a diol compound react, (B) component: The epoxy compound which has two or more epoxy groups, (C) component: The amino-group containing carboxylic compound obtained by making a diamine compound, a dicarboxylic acid anhydride, and tetracarboxylic dianhydride react.

Description

열경화막 형성용 폴리에스테르 조성물{POLYESTER COMPOSITE FOR FORMING THERMOSET FILMS}Polyester composition for thermosetting film formation {POLYESTER COMPOSITE FOR FORMING THERMOSET FILMS}

본 발명은, 열경화막 형성용 폴리에스테르 조성물 및 이로부터 얻어지는 경화막에 관한 것이다. 보다 상세하게는, 높은 투명성, 평탄화성을 가지며, 액정 배향능, 높은 용제내성 그리고 내열성을 갖는 열경화막 형성용 폴리에스테르 조성물 및 그 경화막, 그리고 그 경화막의 적용에 관한 것이다. 이 열경화막 형성용 폴리에스테르 조성물은, 특히 액정 디스플레이에서의 액정 배향 기능을 겸비한 컬러필터 오버코트제에 적합하다.This invention relates to the polyester composition for thermosetting film formation, and the cured film obtained from this. More specifically, it relates to the application of the polyester composition for thermosetting film formation, its cured film, and its cured film which have high transparency, planarization property, and has liquid crystal aligning ability, high solvent resistance, and heat resistance. This polyester composition for thermosetting film formation is especially suitable for the color filter overcoat agent which has the liquid crystal aligning function in a liquid crystal display.

일반적으로, 액정 표시 소자, 유기 EL(electroluminescent) 소자, 고체 촬상 소자 등의 광디바이스에서는, 소자 표면이 제조공정 중에 용제나 열에 쬐이는 것을 방지하기 위해 보호막이 설치된다. 이 보호막은 보호할 기판과의 밀착성이 높고 용제내성이 높을 뿐 아니라, 투명성, 내열성 등의 성능도 요구된다.Generally, in optical devices, such as a liquid crystal display element, an organic electroluminescent (EL) element, and a solid-state image sensor, a protective film is provided in order to prevent that an element surface is exposed to a solvent or heat during a manufacturing process. This protective film has high adhesion to the substrate to be protected, high solvent resistance, and also requires performance such as transparency and heat resistance.

이와 같은 보호막은, 컬러 액정 표시 장치나 고체 촬상소자에 이용되는 컬러필터의 보호막으로 사용하는 경우에는, 일반적으로 그 하지 기판의 컬러필터 혹은 블랙 매트릭스 수지를 평탄화하는 성능, 즉, 평탄화막으로서의 성능을 갖는 것이 요구된다. 특히 STN 방식이나 TFT 방식의 컬러 액정 표시 소자를 제조할 때에는, 컬러필터 기판과 대향 기판의 접합 정밀도를 매우 엄밀하게 행할 필요가 있으며, 기판 간의 셀 갭을 균일하게 하는 것이 필수적이다. 이에 더하여, 컬러필터를 투과하는 빛의 투과율을 유지하기 위해, 그 보호막인 이들 평탄화막에는 높은 투명성이 필요해지게 된다.When such a protective film is used as a protective film of a color filter used in a color liquid crystal display device or a solid-state image sensor, generally, the performance of flattening the color filter or the black matrix resin of the underlying substrate, that is, the performance as a flattening film To be required. In particular, when manufacturing a color liquid crystal display device of the STN method or the TFT method, it is necessary to perform a very precise bonding accuracy of the color filter substrate and the counter substrate, and it is essential to make the cell gap between the substrates uniform. In addition, in order to maintain the transmittance of light passing through the color filter, high transparency is required for these planarization films, which are protective films.

한편, 최근, 액정 디스플레이의 셀 내에 위상차재를 도입함으로써 저비용화, 경량화가 검토되고 있으며, 이와 같은 위상차재에는 액정 모노머를 도포하고 배향시킨 후, 광경화시킨 재료가 일반적으로 이용된다. 이 위상차재를 배향시키기 위해서는 하층막이 러빙 처리 후, 배향성을 갖는 재료일 필요가 있다. 따라서 컬러필터의 오버코트 상에 액정 배향층을 성막한 후, 위상차재가 형성된다(도 2(a) 참조). 이 액정 배향층과 컬러필터의 오버코트를 겸하는 막(도 2(b) 참조)을 형성할 수 있다면, 저비용화, 프로세스수의 삭감 등 큰 메리트를 얻을 수 있다는 점에서, 이와 같은 재료가 강하게 요구되고 있다.On the other hand, cost reduction and weight reduction are examined by introducing a phase difference material into the cell of a liquid crystal display recently, The material which photocured after apply | coating and orienting a liquid crystal monomer to such a phase difference material is generally used. In order to orient this retardation material, the underlayer film needs to be a material having an orientation after rubbing treatment. Therefore, after forming a liquid crystal aligning layer on the overcoat of a color filter, a phase difference material is formed (refer FIG. 2 (a)). If it is possible to form a film (see Fig. 2 (b)) which also serves as an overcoat of the liquid crystal alignment layer and the color filter, such a material is strongly required in that a large merit such as low cost and reduced number of processes can be obtained. have.

일반적으로 이 컬러필터의 오버코트에는, 투명성이 높은 아크릴 수지가 사용된다. 이들 아크릴 수지에는 프로필렌글리콜모노메틸에테르나 프로필렌글리콜모노메틸에테르아세테이트와 같은 글리콜계의 용매나 유산에틸, 유산부틸과 같은 에스테르계 용매가 안전성, 핸들링성의 관점으로부터 널리 이용되고 있다. 이와 같은 아크릴 수지는 열경화나 광경화시킴으로써 내열성이나 내용제성을 부여하고 있다(특허문헌 1,2). 그러나 종래의 열경화성이나 광경화성의 아크릴 수지에서는 적당한 투명성이나 평탄화성을 나타내지만, 이와 같은 평탄화막을 러빙 처리해도 충분한 배향성을 나타낼 수는 없었다.Generally, the acrylic resin with high transparency is used for the overcoat of this color filter. For these acrylic resins, glycol solvents such as propylene glycol monomethyl ether and propylene glycol monomethyl ether acetate, and ester solvents such as ethyl lactate and butyl lactate are widely used from the viewpoint of safety and handling properties. Such acrylic resin is providing heat resistance and solvent resistance by thermosetting or photocuring (patent document 1, 2). However, in the conventional thermosetting and photocurable acrylic resins, proper transparency and flatness are exhibited, but even when such a flattening film is rubbed, sufficient orientation cannot be exhibited.

한편, 액정 배향층에는 용제가용성 폴리이미드나 폴리아믹산으로 이루어진 재료가 통상적으로 이용되고 있다. 이들 재료는 포스트베이크 시에 완전히 이미드화시킴으로써 내용제성을 부여하고, 러빙 처리에 의해 충분한 배향성을 나타낸다는 것이 보고되고 있다(특허문헌 3). 그러나, 컬러필터의 평탄화막으로서 본 경우, 평탄화성과 투명성이 크게 저하된다는 등의 문제가 있었다. 또한, 폴리이미드나 폴리아믹산은 N-메틸-2-피롤리돈이나 γ-부티로락톤과 같은 용제에 가용이지만, 글리콜계 용제나 에스테르계 용제에 대한 용해성이 낮아, 평탄화막 제작라인에 적용하기는 어려웠다.On the other hand, the material which consists of solvent-soluble polyimide and a polyamic acid is used normally for a liquid crystal aligning layer. It is reported that these materials impart solvent resistance by completely imidating at the time of post-baking and exhibit sufficient orientation by rubbing treatment (Patent Document 3). However, when viewed as a flattening film of a color filter, there existed a problem that planarization and transparency fell significantly. In addition, polyimide and polyamic acid are soluble in solvents such as N-methyl-2-pyrrolidone and γ-butyrolactone, but have low solubility in glycol solvents and ester solvents, and thus are applicable to flattening film production lines. Was difficult.

일본 특허공개 2000-103937호 공보Japanese Patent Laid-Open No. 2000-103937 일본 특허공개 2000-119472호 공보Japanese Patent Laid-Open No. 2000-119472 일본 특허공개 2005-037920호 공보Japanese Patent Publication No. 2005-037920

본 발명은, 상기한 사정에 기초하여 이루어진 것으로, 그 해결하고자 하는 과제는, 경화막 형성 후에는 높은 용제내성, 액정 배향성, 내열성, 고투명성 그리고 고평탄화성을 나타낼 뿐 아니라, 경화막 형성 시에는, 컬러필터의 평탄화막의 제작라인에 적용 가능한 글리콜계 용제나 유산에스테르계 용제에 용해될 수 있는 재료를 제공하는 데에 있다.The present invention has been made on the basis of the above circumstances, and the problem to be solved is not only exhibiting high solvent resistance, liquid crystal alignment, heat resistance, high transparency and high flattening property after the cured film is formed, The present invention provides a material which can be dissolved in a glycol solvent or a lactic acid ester solvent applicable to a production line of a flattening film of a color filter.

본 발명자는, 상기한 과제를 해결하기 위해 예의 연구한 결과, 본 발명을 발견하였다.MEANS TO SOLVE THE PROBLEM This inventor discovered this invention as a result of earnestly researching in order to solve the said subject.

즉, 제1 관점으로서, (A)성분, (B)성분 및 (C)성분을 함유하는 열경화막 형성용 폴리에스테르 조성물에 관한 것이다.That is, as a 1st viewpoint, it is related with the polyester composition for thermosetting film formation containing (A) component, (B) component, and (C) component.

(A)성분: 테트라카르본산 이무수물과 디올 화합물을 반응시켜 얻어지는 폴리에스테르,(A) component: Polyester obtained by making tetracarboxylic dianhydride and a diol compound react,

(B)성분: 에폭시기를 2개 이상 갖는 에폭시 화합물,(B) component: The epoxy compound which has 2 or more of epoxy groups,

(C)성분: 디아민 화합물, 디카르본산 무수물 및 테트라카르본산 이무수물을 반응시켜 얻어지는 아미노기 함유 카르본산 화합물.(C) component: The amino group containing carboxylic acid compound obtained by making a diamine compound, dicarboxylic anhydride, and tetracarboxylic dianhydride react.

제2 관점으로서, 상기 (A)성분이 하기 식(1)로 표시되는 구조 단위를 포함하는 폴리에스테르인, 제1 관점에 기재된 열경화막 형성용 폴리에스테르 조성물에 관한 것이다.As a 2nd viewpoint, it is related with the polyester composition for thermosetting film formation as described in a 1st viewpoint whose said (A) component is polyester containing the structural unit represented by following formula (1).

Figure pct00001
Figure pct00001

(식 중, A는 지환식기 또는 지방족기에 4개의 결합수가 결합된 4가의 유기기를 나타내고, B는 지환식기 또는 지방족기에 2개의 결합수가 결합된 2가의 유기기를 나타낸다.)(Wherein A represents a tetravalent organic group having four bonds bonded to an alicyclic group or an aliphatic group, and B represents a divalent organic group having two bonds bonded to an alicyclic or aliphatic group.)

제3 관점으로서, 상기 (A)성분이 하기 식(i)로 표시되는 테트라카르본산 이무수물과 식(ii)로 표시되는 디올 화합물을 반응시켜 얻어지는 폴리에스테르인, 제1 관점 또는 제2 관점에 기재된 열경화막 형성용 폴리에스테르 조성물에 관한 것이다.As a 3rd viewpoint, the said (A) component is polyester obtained by making tetracarboxylic dianhydride represented by following formula (i) and the diol compound represented by formula (ii) react to a 1st viewpoint or a 2nd viewpoint. It relates to the polyester composition for thermosetting film formation described.

Figure pct00002
Figure pct00002

(식 중, A는 지환식기 또는 지방족기에 4개의 결합수가 결합된 4가의 유기기를 나타내고, B는 지환식기 또는 지방족기에 2개의 결합수가 결합된 2가의 유기기를 나타낸다.)(Wherein A represents a tetravalent organic group having four bonds bonded to an alicyclic group or an aliphatic group, and B represents a divalent organic group having two bonds bonded to an alicyclic or aliphatic group.)

제4 관점으로서, 상기 식(1) 중, A는 하기 식(A-1) 내지 식(A-8)로 표시되는 기로부터 선택되는 적어도 1종의 기를 나타내고, B가 하기 식(B-1) 내지 식(B-5)로 표시되는 기로부터 선택되는 적어도 1종의 기를 나타내는, 제2 관점 또는 제3 관점에 기재된 열경화막 형성용 폴리에스테르 조성물에 관한 것이다.As a 4th viewpoint, in said Formula (1), A represents at least 1 sort (s) of group chosen from group represented by following formula (A-1)-formula (A-8), B is a following formula (B-1) The polyester composition for thermosetting film formation as described in a 2nd viewpoint or a 3rd viewpoint which shows at least 1 sort (s) of group chosen from group represented by the formula (I)-(B-5).

Figure pct00003
Figure pct00003

Figure pct00004
Figure pct00004

제5 관점으로서, (A)성분인 폴리에스테르의 중량평균분자량이 폴리스티렌 환산으로 1,000 내지 30,000인, 제1 관점 내지 제4 관점 중 어느 한 항에 기재된 열경화막 형성용 폴리에스테르 조성물에 관한 것이다.As a 5th viewpoint, the weight average molecular weight of polyester which is (A) component is related with the polyester composition for thermosetting film formation in any one of 1st viewpoint to 4th viewpoint which is 1,000-30,000 in polystyrene conversion.

제6 관점으로서, (C)성분이, 테트라카르본산 이무수물 1몰에 대해, 디아민 화합물 2몰과, 디카르본산 무수물 2몰을 반응시켜 얻어지는 아미노기 함유 카르본산 화합물인, 제1 관점 내지 제5 관점 중 어느 한 항에 기재된 열경화막 형성용 폴리에스테르 조성물에 관한 것이다.As a 6th viewpoint, (C) component is the amino group containing carboxylic acid compound obtained by making 2 mol of diamine compounds and 2 mol of dicarboxylic anhydrides react with respect to 1 mol of tetracarboxylic dianhydrides, 1st viewpoint thru | or 5th It relates to the polyester composition for thermosetting film formation in any one of a viewpoint.

제7 관점으로서, (C)성분이, 하기 식(iii), (iv) 및 (v)로 표시되는 화합물을 반응시켜 얻어지는 아미노기 함유 카르본산 화합물인, 제1 관점 내지 제5 관점 중 어느 한 항에 기재된 열경화막 형성용 폴리에스테르 조성물에 관한 것이다.As a 7th viewpoint, (C) component is any of 1st viewpoint thru | or 5th viewpoint which is an amino-group containing carboxylic acid compound obtained by making the compound represented by following formula (iii), (iv) and (v) react. It relates to the polyester composition for thermosetting film formation of description.

Figure pct00005
Figure pct00005

(상기 식(iii) 및 (iv) 중, P 및 Q는 각각 독립적으로 2가의 유기기를 나타내고, 식(v) 중, Z는 4가의 유기기를 나타낸다.)(In said Formula (iii) and (iv), P and Q respectively independently represent a divalent organic group, and in Formula (v), Z represents a tetravalent organic group.)

제8 관점으로서, (A)성분의 100질량부에 기초하여, 3 내지 50질량부의 (B)성분, 5 내지 80질량부의 (C)성분을 함유하는, 제1 관점 내지 제7 관점 중 어느 한 항에 기재된 열경화막 형성용 폴리에스테르 조성물에 관한 것이다.As an 8th viewpoint, Any of the 1st viewpoint thru | or a 7th viewpoint which contains 3-50 mass parts (B) component and 5-80 mass parts (C) component based on 100 mass parts of (A) component. It relates to the polyester composition for thermosetting film formation of description.

제9 관점으로서, 추가로, (D)성분으로서 비스말레이미드 화합물을 함유하는, 제1 관점 내지 제8 관점 중 어느 한 항에 기재된 열경화막 형성용 폴리에스테르 조성물에 관한 것이다.As a 9th viewpoint, it further relates to the polyester composition for thermosetting film formation as described in any one of 1st viewpoint thru | or 8 viewpoint which contains a bismaleimide compound as (D) component.

제10 관점으로서, (A)성분의 100질량부에 기초하여, 0.5 내지 50질량부의 (D)성분을 함유하는, 제9 관점에 기재된 열경화막 형성용 폴리에스테르 조성물에 관한 것이다.As a 10th viewpoint, it is related with the polyester composition for thermosetting film formation as described in a 9th viewpoint containing 0.5-50 mass parts (D) component based on 100 mass parts of (A) component.

제11 관점으로서, 제1 관점 내지 제10 관점 중 어느 한 항에 기재된 열경화막 형성용 폴리에스테르 조성물을 사용하여 얻어지는 경화막에 관한 것이다.As a 11th viewpoint, it is related with the cured film obtained using the polyester composition for thermosetting film formation in any one of a 1st viewpoint thru | or a 10th viewpoint.

제12 관점으로서, 제1 관점 내지 제10 관점 중 어느 한 항에 기재된 열경화막 형성용 폴리에스테르 조성물을 사용하여 얻어지는 액정 배향층에 관한 것이다. As a 12th viewpoint, it is related with the liquid crystal aligning layer obtained using the polyester composition for thermosetting film formation in any one of a 1st viewpoint thru | or a 10th viewpoint.

본 발명의 열경화막 형성용 폴리에스테르 조성물은, 높은 평탄화성, 높은 투명성, 높은 용제내성, 높은 내열성과 함께, 액정 배향능을 갖는 경화막을 형성할 수 있으므로, 액정 배향막이나 평탄화막의 형성 재료로서 이용할 수 있다. 특히, 종래에 독립적으로 형성되어 있던 액정 배향막과 컬러필터의 오버코트층을, 양자의 특성을 겸비하는 「액정 배향층」으로서 동시에 형성할 수 있게 되므로, 제조공정의 간략화 및 프로세스수의 저감에 따른 저비용화 등을 실현할 수 있다.Since the polyester composition for thermosetting film formation of this invention can form the cured film which has liquid crystal aligning ability with high planarization property, high transparency, high solvent resistance, and high heat resistance, it can be used as a formation material of a liquid crystal aligning film or a planarization film. Can be. In particular, since the liquid crystal aligning film and the overcoat layer of the color filter which were formed independently independently can be simultaneously formed as a "liquid crystal aligning layer" which has both the characteristics, the low cost by simplifying a manufacturing process and reducing the number of processes It can realize the sum.

또한, 본 발명의 열경화막 형성용 폴리에스테르 조성물은, 글리콜계 용제 및 유산에스테르계 용제에 가용인 점으로부터, 이들 용제를 주로 사용하는 평탄화막의 제작라인에 적합하게 사용할 수 있다.Moreover, since the polyester composition for thermosetting film formation of this invention is soluble in a glycol type solvent and a lactic acid ester solvent, it can be used suitably for the production line of the planarization film which mainly uses these solvents.

도 1은, 단차 기판에 본 발명의 열경화막 형성용 폴리에스테르 조성물을 도포했을 때에 형성된 경화막을 나타낸 모델도이다.
도 2는, 종래 기술에 의해 액정 배향막을 형성한 액정셀(a)과, 본 발명의 열경화막 형성용 폴리에스테르 조성물을 사용하여 평탄화막을 형성한 액정셀 (b)을 비교하여 나타낸 모델도이다.
1 is a model diagram showing a cured film formed when the polyester composition for thermosetting film formation of the present invention is applied to a stepped substrate.
Fig. 2 is a model diagram showing a comparison between a liquid crystal cell (a) in which a liquid crystal alignment film is formed according to the prior art and a liquid crystal cell (b) in which a flattening film is formed using the polyester composition for thermosetting film formation of the present invention. .

상기 서술한 바와 같이, 종래에 제안되어 있는 아크릴 수지계 및 폴리이미드계의 경화막에서는, 액정 배향막이나 평탄화막에 요구되는 평탄화성, 투명성, 배향성 등의 모든 성능을 충분히 만족시키는 것이 없었다.As mentioned above, in the cured film of the acrylic resin system and polyimide system proposed conventionally, there was no thing which fully satisfy | fills all the performances, such as planarization property, transparency, orientation property, which are required for a liquid crystal aligning film and a planarization film.

또, 지금까지도 액정 표시 소자의 배향재료로서 폴리에스테르 사용의 제안(일본 특허공개 H5-158055호 공보, 일본 특허공개 2002-229039호 공보 참조)이 이루어진 적은 있었지만, 이들은 모두 열경화성을 갖는 것이 아니었고, 형성된 막의 내용제성은 좋지 못했다.Moreover, although proposals for the use of polyesters (see Japanese Patent Application Laid-Open No. H5-158055 and Japanese Patent Application Laid-Open No. 2002-229039) have been made until now, they have not all had thermosetting properties. Solvent resistance of the formed film was not good.

본 발명은, 열경화성인 폴리에스테르를 사용하여 상기 서술한 성능 향상을 도모했다는 점에 특징이 있으며, 즉, (A)성분의 폴리에스테르와, (B)성분의 에폭시기를 2개 이상 갖는 에폭시 화합물, (C)성분의 아미노기 함유 카르본산 화합물을 함유하는 열경화막 형성용 폴리에스테르 조성물이다. 그리고, (A)성분, (B)성분, (C)성분에 더하여, (D)성분으로서 비스말레이미드 화합물까지 함유할 수 있는 열경화막 형성용 폴리에스테르 조성물이다.This invention has the characteristics that the performance improvement mentioned above was aimed at using the thermosetting polyester, ie, the epoxy compound which has polyester of (A) component and two or more epoxy groups of (B) component, It is a polyester composition for thermosetting film formation containing the amino-group containing carboxylic acid compound of (C) component. And in addition to (A) component, (B) component, and (C) component, it is the polyester composition for thermosetting film formation which can contain even a bismaleimide compound as (D) component.

이하, 각 성분을 상세하게 설명한다.
Hereinafter, each component is explained in full detail.

[(A)성분][(A) component]

(A)성분의 폴리에스테르는, 바람직하게는 하기 식(1)로 표시되는 구조 단위를 포함하는 폴리에스테르로, 보다 바람직하게는 식(1)로 표시되는 구조 단위로 이루어진 폴리에스테르이다.Polyester of (A) component becomes like this. Preferably it is polyester containing the structural unit represented by following formula (1), More preferably, it is polyester which consists of a structural unit represented by Formula (1).

Figure pct00006
Figure pct00006

상기 식 중, A는 지환식기 또는 지방족기에 4개의 결합수가 결합된 4가의 유기기를 나타내고, B는 지환 또는 지방족기에 2개의 결합수가 결합된 2가의 유기기를 나타낸다.In the above formula, A represents a tetravalent organic group in which four bonds are bonded to an alicyclic or aliphatic group, and B represents a divalent organic group in which two bonds are bonded to an alicyclic or aliphatic group.

상기 A는, 바람직하게는 하기 식(1A1), 식(1A2) 또는 식(1A3)로 표시되는 기이다.A is preferably a group represented by the following formula (1A1), formula (1A2) or formula (1A3).

Figure pct00007
Figure pct00007

식 중에서 A1는 환상 포화 탄화수소기를 나타내고, 바람직하게는 탄소원자수 4 내지 8의 환상 포화 탄화수소기를 나타내고, 보다 바람직하게는 탄소원자수 4 내지 6의 환상 포화 탄화수소기를 나타낸다. 여기서, A1기 중에 포함되는 임의의 수소원자는 각각 독립적으로 지방족기로 치환되어 있을 수도 있고, 또, 이들 중 2개의 치환기가 서로 결합하여 4 내지 6원환을 형성할 수도 있다.In the formula, A 1 represents a cyclic saturated hydrocarbon group, preferably a cyclic saturated hydrocarbon group having 4 to 8 carbon atoms, and more preferably a cyclic saturated hydrocarbon group having 4 to 6 carbon atoms. Here, the arbitrary hydrogen atoms contained in the A 1 group may be each independently substituted with an aliphatic group, and two of these substituents may be bonded to each other to form a 4 to 6 membered ring.

여기서, 상기 치환기인 지방족기는, 탄소원자수 1 내지 5의 지방족기가 바람직하고, 보다 바람직하게는 탄소원자수 1 내지 3의 지방족기이다. 이들 치환기가 결합하여 환을 형성하는 경우에는, 예를 들어, 노보넨기나 아다만탄기 등의 가교환식 탄화수소기, 일부 또는 전부가 수소화된 축합다환식 탄화수소기가 된다.Herein, the aliphatic group as the substituent is preferably an aliphatic group having 1 to 5 carbon atoms, more preferably an aliphatic group having 1 to 3 carbon atoms. When these substituents combine to form a ring, a temporary exchangeable hydrocarbon group, such as a norbornene group and an adamantane group, or a part or all becomes hydrogenated condensed polycyclic hydrocarbon group, for example.

상기 식 중, R1은 단결합, 카르보닐기, 에테르기, 술포닐기, 탄소원자수 1 내지 8의 포화 탄화수소기 또는 불소원자로 치환된 탄소원자수 1 내지 8의 포화 탄화수소기를 나타낸다. 바람직하게는 단결합, 카르보닐기, 에테르기, 술포닐기, 탄소원자수 1 내지 5의 포화 탄화수소기 또는 불소원자로 치환된 탄소원자수 1 내지 5의 포화 탄화수소기를 나타낸다.In the above formula, R 1 represents a single bond, a carbonyl group, an ether group, a sulfonyl group, a saturated hydrocarbon group having 1 to 8 carbon atoms or a saturated hydrocarbon group having 1 to 8 carbon atoms substituted with a fluorine atom. Preferably, a single bond, a carbonyl group, an ether group, a sulfonyl group, a saturated hydrocarbon group having 1 to 5 carbon atoms or a saturated hydrocarbon group having 1 to 5 carbon atoms substituted with a fluorine atom is represented.

또한, R2은 탄소원자수 1 내지 8의 포화 탄화수소기를 나타내고, 바람직하게는 탄소원자수 1 내지 5의 포화 탄화수소기를 나타내고, 보다 바람직하게는 탄소원자수 1 내지 3의 포화 탄화수소기를 나타낸다.R 2 represents a saturated hydrocarbon group having 1 to 8 carbon atoms, preferably a saturated hydrocarbon group having 1 to 5 carbon atoms, and more preferably a saturated hydrocarbon group having 1 to 3 carbon atoms.

식(1)에서의 4가의 유기기인 A의 바람직한 구체예를 하기의 식(A-1) 내지 식(A-8)에 나타낸다. 하기 (A-1) 내지 식(A-8)로 표시되는 기 중에서도, A는 특히 식(A-1) 또는 (A-2)로부터 선택되는 기인 것이 바람직하다.The preferable specific example of A which is a tetravalent organic group in Formula (1) is shown to following formula (A-1)-formula (A-8). Among groups represented by the following (A-1) to formula (A-8), A is particularly preferably a group selected from formula (A-1) or (A-2).

Figure pct00008
Figure pct00008

상기 식(1) 중, B는 지환식기 또는 지방족기에 2개의 결합수가 결합된 2가의 유기기를 나타내고, 바람직하게는 하기 식(1B1) 또는 식(1B2)로 표시되는 기이다.In said formula (1), B represents the bivalent organic group which two bond water couple | bonded with an alicyclic group or an aliphatic group, Preferably it is group represented by following formula (1B1) or formula (1B2).

Figure pct00009
Figure pct00009

식 중에서 B1는 환상 포화 탄화수소기를 나타내고, 바람직하게는 탄소원자수가 4 내지 8인 환상 포화 탄화수소기를 나타내고, 보다 바람직하게는 탄소원자수가 4 내지 6인 환상 포화 탄화수소기를 나타낸다. B1기 중에 포함되는 임의의 수소원자는 각각 독립적으로 지방족기로 치환되어 있을 수도 있다.In the formula, B 1 represents a cyclic saturated hydrocarbon group, preferably a cyclic saturated hydrocarbon group having 4 to 8 carbon atoms, and more preferably a cyclic saturated hydrocarbon group having 4 to 6 carbon atoms. Any hydrogen atom contained in the B 1 group may be independently substituted with an aliphatic group.

여기서, 상기 치환기인 지방족기는, 탄소원자수 1 내지 5의 지방족기가 바람직하고, 보다 바람직하게는 탄소원자수 1 내지 3의 지방족기이다. 이들 치환기가 결합하여 환을 형성하는 경우에는, 예를 들어, 노보넨기나 아다만탄기 등의 가교환식 탄화수소기, 일부 또는 전부가 수소화된 축합다환식 탄화수소기가 된다.Herein, the aliphatic group as the substituent is preferably an aliphatic group having 1 to 5 carbon atoms, more preferably an aliphatic group having 1 to 3 carbon atoms. When these substituents combine to form a ring, a temporary exchangeable hydrocarbon group, such as a norbornene group and an adamantane group, or a part or all becomes hydrogenated condensed polycyclic hydrocarbon group, for example.

또한, B2는 페닐렌기를 나타낸다.In addition, B 2 represents a phenylene group.

식 중, R3은 단결합, 카르보닐기, 에테르기, 술포닐기, 탄소원자수 1 내지 8의 포화 탄화수소기 또는 불소원자로 치환된 탄소원자수 1 내지 8의 포화 탄화수소기를 나타내고, 바람직하게는, 단결합, 카르보닐기, 에테르기, 술포닐기, 탄소원자수 1 내지 5의 포화 탄화수소기 또는 불소원자로 치환된 탄소원자수 1 내지 5의 포화 탄화수소기를 나타낸다.In the formula, R 3 represents a single bond, a carbonyl group, an ether group, a sulfonyl group, a saturated hydrocarbon group having 1 to 8 carbon atoms or a saturated hydrocarbon group having 1 to 8 carbon atoms substituted with a fluorine atom, and preferably, a single bond or carbonyl group And an ether group, a sulfonyl group, a saturated hydrocarbon group having 1 to 5 carbon atoms or a saturated hydrocarbon group having 1 to 5 carbon atoms substituted with a fluorine atom.

R4, R5는 각각 독립적으로 단결합 또는 탄소원자수 1 내지 5의 알킬렌기를 나타내고, 바람직하게는 단결합, 탄소원자수 1 내지 3의 알킬렌기를 나타낸다.R 4 and R 5 each independently represent a single bond or an alkylene group having 1 to 5 carbon atoms, and preferably a single bond or an alkylene group having 1 to 3 carbon atoms.

R6, R7는 각각 독립적으로 탄소원자수 1 내지 5의 알킬렌기를 나타내고, 바람직하게는 탄소원자수 1 내지 3의 알킬렌기를 나타낸다.R 6 and R 7 each independently represent an alkylene group having 1 to 5 carbon atoms, preferably an alkylene group having 1 to 3 carbon atoms.

또한, k는 0 또는 1을 나타낸다.
In addition, k represents 0 or 1.

식(1)에서의 2가의 유기기인 B의 바람직한 구체예를 하기의 식(B-1) 내지 식(B-5)에 나타낸다. 하기 (B-1) 내지 식(B-5)로 표시되는 기 중에서도, B는 특히 (B-1) 내지 (B-4)로부터 선택되는 기인 것이 바람직하다.The preferable specific example of B which is a divalent organic group in Formula (1) is shown to following formula (B-1)-formula (B-5). Among the groups represented by the following (B-1) to formula (B-5), it is particularly preferable that B is a group selected from (B-1) to (B-4).

Figure pct00010
Figure pct00010

(A)성분의 폴리에스테르는, 식(1)로 표시되는 구조 단위 중, A가 식(1A1) 내지 식(1A3)로 표시되는 기로 이루어진 군으로부터 선택되는 적어도 1종의 구조를 포함하는 것이 바람직하지만, 식(1A1) 내지 식(1A3)로 표시되는 기 이외의 구조를 포함하고 있을 수도 있다. 이 때, 폴리에스테르의 구조를 형성하는 것이라면 그 구조는 특별히 한정되지 않지만, 하기 식(1A4) 내지 식(1A5)로 표시되는 기로 이루어진 군으로부터 선택되는 적어도 1종의 구조인 것이 바람직하다.It is preferable that the polyester of (A) component contains at least 1 sort (s) of structure chosen from the group which A has from group represented by Formula (1A1)-formula (1A3) among the structural units represented by Formula (1). However, it may contain structures other than the group represented by Formula (1A1)-Formula (1A3). Under the present circumstances, if the structure of polyester is formed, the structure will not be specifically limited, It is preferable that it is at least 1 sort (s) of structure chosen from the group which consists of group represented by following formula (1A4)-formula (1A5).

Figure pct00011
Figure pct00011

상기 식 중, R8, R9, R10는 각각 독립적으로 단결합, 카르보닐기, 에테르기, 술포닐기, 탄소원자수 1 내지 8의 포화 탄화수소기 또는 불소원자로 치환된 탄소원자수 1 내지 8의 포화 탄화수소기를 나타내고, 바람직하게는 단결합, 카르보닐기, 에테르기, 술포닐기, 탄소원자수 1 내지 5의 포화 탄화수소기 또는 불소원자로 치환된 탄소원자수 1 내지 5의 포화 탄화수소기를 나타낸다.Wherein R 8 , R 9 and R 10 each independently represent a single bond, a carbonyl group, an ether group, a sulfonyl group, a saturated hydrocarbon group having 1 to 8 carbon atoms or a saturated hydrocarbon group having 1 to 8 carbon atoms substituted with a fluorine atom And preferably a single bond, a carbonyl group, an ether group, a sulfonyl group, a saturated hydrocarbon group having 1 to 5 carbon atoms or a saturated hydrocarbon group having 1 to 5 carbon atoms substituted with a fluorine atom.

특히, R8은 단결합, 카르보닐기, 에테르기, 술포닐기, 탄소원자수 1 내지 5의 포화 탄화수소기 또는 불소원자로 치환된 탄소원자수 1 내지 5의 포화 탄화수소기인 것이 바람직하고, R9는 에테르기, 탄소원자수 1 내지 5의 포화 탄화수소기 또는 불소원자로 치환된 탄소원자수 1 내지 5의 포화 탄화수소기인 것이 바람직하고, 그리고 R10은 카르보닐기, 에테르기, 술포닐기, 탄소원자수 1 내지 5의 포화 탄화수소기 또는 불소원자로 치환된 탄소원자수 1 내지 5의 포화 탄화수소기인 것이 바람직하다.In particular, R 8 is preferably a single bond, a carbonyl group, an ether group, a sulfonyl group, a saturated hydrocarbon group having 1 to 5 carbon atoms or a saturated hydrocarbon group having 1 to 5 carbon atoms substituted with a fluorine atom, and R 9 is an ether group, a carbon source It is preferably a saturated hydrocarbon group having 1 to 5 carbon atoms or a saturated hydrocarbon group having 1 to 5 carbon atoms substituted with a fluorine atom, and R 10 is a carbonyl group, an ether group, a sulfonyl group, a saturated hydrocarbon group having 1 to 5 carbon atoms or a fluorine atom It is preferably a substituted hydrocarbon group of 1 to 5 carbon atoms.

또한, h는 0 또는 1을 나타낸다.H represents 0 or 1;

상기 식(1A4) 내지 식(1A5)의 바람직한 구체예를 하기의 식(a1) 내지 식(a7)에 나타낸다.Preferable specific examples of the formulas (1A4) to (1A5) are shown in the following formulas (a1) to (a7).

Figure pct00012
Figure pct00012

본 발명에서 이용되는 (A)성분의 폴리에스테르에서, 상기 식(1)로 표시되는 구조 단위에 있어서, A가 상기 식(1A1) 내지 식(1A3)로 표시되는 기로 이루어진 군으로부터 선택되는 적어도 1종의 구조 단위를 적어도 60몰% 이상을 포함하는 것이 바람직하다.In the polyester of (A) component used by this invention, in the structural unit represented by the said Formula (1), at least 1 selected from the group which consists of group represented by said Formula (1A1)-formula (1A3). It is preferable to contain at least 60 mol% or more of a structural unit of a species.

(A)성분의 폴리에스테르의 중량평균분자량은, 바람직하게는 1,000 내지 30,000이고, 보다 바람직하게는 1,500 내지 10,000이다. (A)성분의 폴리에스테르의 중량평균분자량이 상기 범위보다 작은 경우, 배향성 및 용제내성이 저하되는 경향이 있으며, 상기 범위를 초과하면, 평탄화성이 저하되는 경우가 있다.
The weight average molecular weight of the polyester of (A) component becomes like this. Preferably it is 1,000-30,000, More preferably, it is 1,500-10,000. When the weight average molecular weight of the polyester of (A) component is smaller than the said range, there exists a tendency for orientation and solvent tolerance to fall, and when it exceeds the said range, planarization property may fall.

<(A)성분의 제조방법><Production Method of (A) Component>

본 발명에서, (A)성분인 폴리에스테르는, 예를 들어, 테트라카르본산 이무수물과 디올 화합물을 중합시켜 얻을 수 있다. 보다 바람직하게는, 하기 식(i)로 표시되는 테트라카르본산 이무수물을 포함하는 테트라카르본산 이무수물(이하, 산 성분이라고도 함)과, 하기 식(ii)로 표시되는 디올 화합물을 포함하는 디올 화합물(이하, 디올 성분이라고도 함)을 반응시켜 얻어진다.In this invention, polyester which is (A) component can be obtained by polymerizing tetracarboxylic dianhydride and a diol compound, for example. More preferably, the diol containing the tetracarboxylic dianhydride (henceforth an acid component) containing the tetracarboxylic dianhydride represented by following formula (i), and the diol compound represented by following formula (ii). It is obtained by making a compound (henceforth a diol component) react.

Figure pct00013
Figure pct00013

상기 식 중, A 및 B는 상술한 식(1)에서 설명한 정의와 동일하며, 바람직한 형태 또한 상술한 것과 동일하다.In said formula, A and B are the same as the definition demonstrated by Formula (1) mentioned above, and a preferable aspect is also the same as that mentioned above.

본 발명에서, 식(i)로 표시되는 테트라카르본산 이무수물, 식(ii)로 표시되는 디올 화합물은 각각 독립적으로, 1종을 단독으로 사용할 수도 있으며, 혹은 2종 이상을 사용할 수 있다.In the present invention, the tetracarboxylic dianhydride represented by the formula (i) and the diol compound represented by the formula (ii) may each be used alone or in combination of two or more.

상기 (A)성분인 폴리에스테르는, 산 성분으로서 상기 식(i)로 표시되는 테트라카르본산 이무수물 뿐 아니라, 그 이외의 테트라카르본산 이무수물(이하, 다른 산 이무수물이라고도 함)을 병용할 수 있다. 이 때, 다른 산 이무수물은, 본 발명의 효과를 저하시키지 않는 한, 특별히 한정되는 것은 아니다. 바람직하게는 하기 식(i2)로 표시되는 테트라카르본산 이무수물이다.The polyester which is the said (A) component can use not only tetracarboxylic dianhydride represented by said formula (i) as an acid component, but also tetracarboxylic dianhydride (henceforth another acid dianhydride) other than that. Can be. Under the present circumstances, another acid dianhydride is not specifically limited unless the effect of this invention is reduced. Preferably, it is tetracarboxylic dianhydride represented by following formula (i2).

Figure pct00014
Figure pct00014

여기서, 상기 식(i2)의 W는, 상술한 식(1)에서 정의한 식(1A4) 및 식(1A5)로 표시되는 기로 이루어진 군으로부터 선택되는 적어도 1종의 구조로, R8, R9, R10, h도 상기 설명한 정의와 동일하다.Here, W of said Formula (i2) is at least 1 sort (s) of structure chosen from the group which consists of group represented by Formula (1A4) and Formula (1A5) defined by Formula (1) mentioned above, R <8> , R <9> , R 10 and h are also the same as defined above.

이에 더하여, 식(1A4) 및 식(1A5)의 바람직한 구체예도 상술한 식(al) 내지 식(a7)로 표시된다.In addition, preferable specific examples of the formulas (1A4) and (1A5) are also represented by the above-described formulas (al) to (a7).

본 발명에서는, 식(i)로 표시되는 테트라카르본산 이무수물이 산 성분 중의 적어도 60몰% 이상을 포함하는 것이 바람직하다.In this invention, it is preferable that the tetracarboxylic dianhydride represented by Formula (i) contains at least 60 mol% or more in an acid component.

상기 (A)성분의 폴리에스테르에서, 테트라카르본산 이무수물의 합계량(산 성분의 합계량)과 디올 화합물의 합계량(디올 성분의 합계량)의 배합비, 즉, <디올 화합물의 합계 몰수>/<테트라카르본산 이무수물화합물의 합계 몰수>는 0.5 내지 1.5인 것이 바람직하다. 통상의 중축합 반응과 마찬가지로, 이 몰비가 1에 가까울수록 생성되는 폴리에스테르의 중합도는 커져, 분자량이 증가한다.In the polyester of the said (A) component, the compounding ratio of the total amount (the total amount of an acid component) and the total amount (the total amount of a diol component) of a tetracarboxylic dianhydride, ie, <the total mole number of a diol compound> / <tetracarboxylic acid The total number of moles of the dianhydride compound> is preferably 0.5 to 1.5. As in the normal polycondensation reaction, the closer the molar ratio is to 1, the higher the degree of polymerization of the resulting polyester and the higher the molecular weight.

(A)성분의 폴리에스테르는, 저장 안정성의 저하를 피하기 위해, 그 말단을 산무수물 말단으로 하는 것이 바람직하다.In order to avoid the fall of storage stability, it is preferable that the polyester of (A) component makes the terminal into an acid anhydride terminal.

상기 폴리에스테르의 말단은 산 성분과 디올 성분의 배합비에 의존하여 변한다. 예를 들어, 산 성분을 과잉 반응시킨 경우, 말단은 산무수물이 되기 쉽다.The terminal of the polyester changes depending on the blending ratio of the acid component and the diol component. For example, when an acid component is made to overreact, the terminal becomes an acid anhydride easily.

또한, 디올 성분을 과잉 이용하여 중합한 경우에는, 말단은 수산기가 되기 쉽다. 이 경우, 상기 말단 수산기에 카르본산 무수물을 반응시키고, 말단 수산기를 산무수물로 봉지할 수 있다. 이와 같은 카르본산 무수물의 예로는 프탈산 무수물, 트리멜리트산 무수물, 무수말레인산, 나프탈산 무수물, 수소화프탈산 무수물, 무수이타콘산, 테트라하이드로프탈산 무수물, 1,2-시클로헥산디카르본산 무수물, 4-메틸-1,2-시클로헥산디카르본산 무수물, 4-페닐-1,2-시클로헥산디카르본산 무수물, 메틸-5-노보넨-2,3-디카르본산 무수물, 테트라하이드로프탈산 무수물, 메틸테트라하이드로프탈산 무수물, 비시클로[2.2.2.]옥텐-2,3-디카르본산 무수물 등을 들 수 있다. In addition, when superposing | polymerizing using a diol component excessively, a terminal becomes a hydroxyl group easily. In this case, the carboxylic acid anhydride can be reacted with the terminal hydroxyl group, and the terminal hydroxyl group can be sealed with an acid anhydride. Examples of such carboxylic anhydrides include phthalic anhydride, trimellitic anhydride, maleic anhydride, naphthalic anhydride, hydrogenated phthalic anhydride, itaconic anhydride, tetrahydrophthalic anhydride, 1,2-cyclohexanedicarboxylic anhydride, and 4-methyl anhydride. -1,2-cyclohexanedicarboxylic anhydride, 4-phenyl-1,2-cyclohexanedicarboxylic anhydride, methyl-5-norbornene-2,3-dicarboxylic acid anhydride, tetrahydrophthalic anhydride, methyltetra Hydrophthalic anhydride, bicyclo [2.2.2.] Octene-2,3-dicarboxylic acid anhydride, and the like.

상기 (A)성분의 폴리에스테르의 제조에 있어서, 산 성분과 디올 성분과의 반응 온도는 50 내지 200℃, 바람직하게는 80 내지 170℃의 임의의 온도를 선택할 수 있다. 예를 들어, 반응 온도는 100℃ 내지 140℃, 반응 시간 2 내지 48시간으로 폴리에스테르를 얻을 수 있다.In manufacture of the polyester of the said (A) component, the reaction temperature of an acid component and a diol component can select arbitrary temperature of 50-200 degreeC, Preferably it is 80-170 degreeC. For example, polyester can be obtained by reaction temperature 100 to 140 degreeC and reaction time 2 to 48 hours.

또한, 말단 수산기를 산무수물로 보호하는 경우의 반응 온도는 50 내지 200℃, 바람직하게는 80 내지 170℃의 임의의 온도를 선택할 수 있다.In addition, the reaction temperature at the time of protecting a terminal hydroxyl group by an acid anhydride can select arbitrary temperature of 50-200 degreeC, Preferably it is 80-170 degreeC.

상기 산 성분과 디올 성분과의 반응은, 통상, 용제 내에서 행해진다. 이 때 사용 가능한 용제로는, 수산기나 아미노기 등, 산무수물과 반응하는 관능기를 함유하지 않는 것이라면 특별히 한정되지 않는다. 예를 들어, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, N-메틸-2-피롤리돈, N-비닐피롤리돈, N-메틸카프로락탐, 디메틸설폭사이드, 테트라메틸요소, 디메틸술폰, 헥사메틸설폭사이드, m-크레졸, γ-부티로락톤, 시클로헥사논, 시클로펜타논, 메틸에틸케톤, 메틸이소부틸케톤, 2-헵타논, 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜프로필에테르아세테이트, 3-메톡시프로피온산메틸, 2-메톡시프로피온산메틸, 3-메톡시프로피온산에틸, 2-메톡시프로피온산에틸, 3-에톡시프로피온산에틸, 2-에톡시프로피온산에틸 등을 들 수 있다.The reaction between the acid component and the diol component is usually carried out in a solvent. As a solvent which can be used at this time, if it does not contain the functional group reacting with an acid anhydride, such as a hydroxyl group and an amino group, it will not specifically limit. For example, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, N-vinylpyrrolidone, N-methylcaprolactam, dimethyl sulfoxide, tetramethylurea , Dimethyl sulfone, hexamethyl sulfoxide, m-cresol, γ-butyrolactone, cyclohexanone, cyclopentanone, methyl ethyl ketone, methyl isobutyl ketone, 2-heptanone, propylene glycol monomethyl ether acetate, propylene glycol Propyl ether acetate, methyl 3-methoxypropionate, methyl 2-methoxypropionate, ethyl 3-methoxypropionate, ethyl 2-methoxypropionate, ethyl 3-ethoxypropionate, ethyl 2-ethoxypropionate, and the like. .

이들 용제는 단독으로 사용할 수도 있고, 혼합하여 사용할 수도 있지만, 안전성, 컬러필터의 오버코트제 라인으로의 적용성의 관점에서 볼 때 프로필렌글리콜모노메틸에테르아세테이트가 더욱 바람직하다.These solvents may be used alone or in combination, but propylene glycol monomethyl ether acetate is more preferable from the viewpoint of safety and applicability of the color filter to the overcoat agent line.

또한, 폴리에스테르를 용해하지 않는 용제이더라도, 중합 반응에 의해 생성된 폴리에스테르가 석출되지 않는 범위에서, 상기 용제에 혼합하여 사용할 수도 있다.Moreover, even if it is a solvent which does not melt | dissolve polyester, it can also mix and use for the said solvent in the range which does not precipitate the polyester produced | generated by the polymerization reaction.

또한, 상기 산 성분(식(i 및 식(i2)))과 디올 성분(식(ii))과의 반응 시에는, 촉매를 사용할 수도 있다.In addition, a catalyst can also be used at the time of reaction of the said acid component (formula (i and formula (i2))) with a diol component (formula (ii)).

폴리에스테르의 중합시에 사용하는 촉매의 구체예로는, 벤질트리메틸암모늄클로라이드, 벤질트리메틸암모늄브로마이드, 벤질트리에틸암모늄클로라이드, 벤질트리에틸암모늄브로마이드, 벤질트리프로필암모늄클로라이드, 벤질트리프로필암모늄브로마이드, 테트라메틸암모늄클로라이드, 테트라에틸암모늄브로마이드, 테트라프로필암모늄클로라이드, 테트라프로필암모늄브로마이드 등의 4급 암모늄염, 테트라페닐포스포늄클로라이드, 테트라페닐포스포늄브로마이드, 벤질트리페닐포스포늄클로라이드, 벤질트리페닐포스포늄브로마이드, 에틸트리페닐포스포늄클로라이드, 에틸트리페닐포스포늄브로마이드 등의 4급 포스포늄염을 들 수 있다.As a specific example of the catalyst used at the time of superposition | polymerization of polyester, benzyl trimethyl ammonium chloride, benzyl trimethyl ammonium bromide, benzyl triethyl ammonium chloride, benzyl triethyl ammonium bromide, benzyl tripropyl ammonium chloride, benzyl tripropyl ammonium bromide, tetra Quaternary ammonium salts such as methyl ammonium chloride, tetraethylammonium bromide, tetrapropylammonium chloride, tetrapropylammonium bromide, tetraphenylphosphonium chloride, tetraphenylphosphonium bromide, benzyltriphenylphosphonium chloride, benzyltriphenylphosphonium bromide, And quaternary phosphonium salts such as ethyltriphenylphosphonium chloride and ethyltriphenylphosphonium bromide.

이렇게 얻어진 (A)성분의 폴리에스테르를 포함하는 용액은, 열경화막 형성용 폴리에스테르 조성물의 조제에 그대로 이용할 수 있다. 또한, 얻어진 폴리에스테르를 물, 메탄올, 에탄올, 디에틸에테르, 헥산 등의 빈(貧)용매에 침전 단리시켜 회수한 후에 사용할 수도 있다.
The solution containing polyester of (A) component thus obtained can be used as it is for preparation of the polyester composition for thermosetting film formation. The obtained polyester may also be used after being precipitated and recovered in a poor solvent such as water, methanol, ethanol, diethyl ether, and hexane.

<(B)성분><(B) component>

본 발명의 (B)성분인 에폭시기를 2개 이상 갖는 에폭시 화합물로는, 예를 들어, 트리스(2,3-에폭시프로필)이소시아누레이트, 1,4-부탄디올디글리시딜에테르, 1,2-에폭시-4-(에폭시에틸)시클로헥산, 글리세롤트리글리시딜에테르, 디에틸렌글리콜디글리시딜에테르, 2,6-디글리시딜페닐글리시딜에테르, 1,1,3-트리스[p-(2,3-에폭시프로폭시)페닐]프로판, 1,2-시클로헥산디카르본산디글리시딜에스테르, 4,4'-메틸렌비스(N,N-디글리시딜아닐린), 3,4-에폭시시클로헥실메틸-3,4-에폭시시클로헥산카르복시레이트, 트리메티롤에탄트리글리시딜에테르 및 비스페놀-A-디글리시딜에테르 및 펜타에리스리톨폴리글리시딜에테르 등을 들 수 있다.As an epoxy compound which has two or more epoxy groups which are (B) component of this invention, For example, tris (2, 3- epoxypropyl) isocyanurate, 1, 4- butanediol diglycidyl ether, 1, 2-epoxy-4- (epoxyethyl) cyclohexane, glycerol triglycidyl ether, diethylene glycol diglycidyl ether, 2,6-diglycidylphenylglycidyl ether, 1,1,3-tris [ p- (2,3-epoxypropoxy) phenyl] propane, 1,2-cyclohexanedicarboxylic acid diglycidyl ester, 4,4'-methylenebis (N, N- diglycidylaniline), 3, 4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, trimetholethane triglycidyl ether, bisphenol-A- diglycidyl ether, pentaerythritol polyglycidyl ether, etc. are mentioned.

또한, 입수가 용이하므로 시판품인 화합물을 사용할 수도 있다. 이하에 그 구체예(상품명)를 들지만, 이들에 한정되는 것은 아니다: YH-434, YH434L(Tohto Kasei Co.,Ltd. 제) 등의 아미노기를 갖는 에폭시 수지; Epolead GT-401, Epolead GT-403, Epolead GT-301, Epolead GT-302, Ceroxide 2021, Ceroxide 3000(Daicel Chemical Industries, Ltd,.제) 등의 시클로헥센옥사이드 구조를 갖는 에폭시 수지; Epikote 1001, Epikote 1002, Epikote 1003, Epikote 1004, Epikote 1007, Epikote1009, Epikote 1010, Epikote 828(이상, Yuka Shell Epoxy Co., Ltd.(현, Japan Epoxy Resin Co. Ltd.) 제) 등의 비스페놀 A형 에폭시 수지; Epikote 807(Yuka Shell Epoxy Co., Ltd.(현, Japan Epoxy Resin Co. Ltd.) 제) 등의 비스페놀F형 에폭시 수지; Epikote 152, Epikote 154(이상, Yuka Shell Epoxy Co., Ltd.(현, Japan Epoxy Resin Co. Ltd.) 제), EPPN 201, EPPN 202(이상, Nippon Kayaku Co., Ltd. 제) 등의 페놀노볼락형 에폭시 수지; EOCN-102, EOCN-103S, EOCN-104S, EOCN-1020, EOCN-1025, EOCN-1027(이상, Nippon Kayaku Co., Ltd. 제), Epikote 180S75(Yuka Shell Epoxy Co., Ltd.(현, Japan Epoxy Resin Co. Ltd.) 제) 등의 크레졸노볼락형 에폭시 수지; Denacol EX-252(Nagase ChemteX Corporation 제), CY175, CY177, CY179, Araldite CY-182, Araldite CY-192, Araldite CY-184(이상, CIBA-GEIGYA.G 제), Epiclon 200, Epiclon 400(이상, Dainippon Ink and Chemicals, Inc.(현, 주식회사 DIC) 제), Epikote 871, Epikote 872(이상, Yuka Shell Epoxy Co., Ltd.(현, Japan Epoxy Resin Co. Ltd.) 제), ED-5661, ED-5662(이상, Celanese Coating Co. 제) 등의 지환식에폭시 수지; Denacol EX-611, Denacol EX-612, Denacol EX-614, Denacol EX-622, Denacol EX-411, Denacol EX-512, Denacol EX-522, Denacol EX-421, Denacol EX-313, Denacol EX-314, Denacol EX-321(Nagase ChemteX Corporation 제) 등의 지방족폴리글리시딜에테르 등. Moreover, since it is easy to obtain, you may use a compound which is a commercial item. Although the specific example (brand name) is given to the following, it is not limited to these: Epoxy resin which has amino groups, such as YH-434 and YH434L (made by Tohto Kasei Co., Ltd.); Epoxy resins having a cyclohexene oxide structure such as Epolead GT-401, Epolead GT-403, Epolead GT-301, Epolead GT-302, Ceroxide 2021, Ceroxide 3000 (manufactured by Daicel Chemical Industries, Ltd.); Bisphenol A, such as Epikote 1001, Epikote 1002, Epikote 1003, Epikote 1004, Epikote 1007, Epikote1009, Epikote 1010, Epikote 828 (above, Yuka Shell Epoxy Co., Ltd. (current, Japan Epoxy Resin Co. Ltd.)) Type epoxy resins; Bisphenol F-type epoxy resins such as Epikote 807 (manufactured by Yuka Shell Epoxy Co., Ltd. (present, Japan Epoxy Resin Co. Ltd.)); Phenolic, such as Epikote 152, Epikote 154 (above, Yuka Shell Epoxy Co., Ltd. (present, Japan Epoxy Resin Co. Ltd.), EPPN 201, EPPN 202 (above, Nippon Kayaku Co., Ltd.) Novolac type epoxy resins; EOCN-102, EOCN-103S, EOCN-104S, EOCN-1020, EOCN-1025, EOCN-1027 (above, manufactured by Nippon Kayaku Co., Ltd.), Epikote 180S75 (Yuka Shell Epoxy Co., Ltd. (present, Cresol novolak-type epoxy resins such as those produced by Japan Epoxy Resin Co. Ltd.); Denacol EX-252 (manufactured by Nagase ChemteX Corporation), CY175, CY177, CY179, Araldite CY-182, Araldite CY-192, Araldite CY-184 (above, made by CIBA-GEIGYA.G), Epiclon 200, Epiclon 400 (or above, Dainippon Ink and Chemicals, Inc. (currently manufactured by DIC Corporation), Epikote 871, Epikote 872 (above, manufactured by Yuka Shell Epoxy Co., Ltd. (currently manufactured by Japan Epoxy Resin Co. Ltd.), ED-5661, Alicyclic epoxy resins such as ED-5662 (above, manufactured by Celanese Coating Co.); Denacol EX-611, Denacol EX-612, Denacol EX-614, Denacol EX-622, Denacol EX-411, Denacol EX-512, Denacol EX-522, Denacol EX-421, Denacol EX-313, Denacol EX-314, Aliphatic polyglycidyl ethers such as Denacol EX-321 (manufactured by Nagase ChemteX Corporation).

또한, 적어도 2개의 에폭시기를 갖는 화합물로는 에폭시기를 갖는 폴리머를 사용할 수 있다. 이러한 폴리머로서는, 에폭시기를 갖는 것이라면 특별한 제한 없이 사용할 수 있다.As the compound having at least two epoxy groups, a polymer having an epoxy group can be used. As such a polymer, if it has an epoxy group, it can use without a restriction | limiting in particular.

상기 에폭시기를 갖는 폴리머는, 예를 들면, 에폭시기를 갖는 부가중합성 모노머를 이용한 부가중합에 의해 제조할 수 있다. 일예로서, 폴리글리시딜아크릴레이트, 글리시딜메타크릴레이트와 에틸메타크릴레이트의 공중합체, 글리시딜메타크릴레이트와 스티렌과 2-하이드록시에틸메타크릴레이트의 공중합체 등의 부가중합폴리머나, 에폭시노볼락 등의 축중합 폴리머를 들 수 있다.The polymer which has the said epoxy group can be manufactured by addition polymerization using the addition polymerization monomer which has an epoxy group, for example. As an example, an addition polymer such as polyglycidyl acrylate, a copolymer of glycidyl methacrylate and ethyl methacrylate, a copolymer of glycidyl methacrylate and styrene and 2-hydroxyethyl methacrylate, and the like And polycondensation polymers, such as an epoxy novolak, are mentioned.

혹은, 상기 에폭시기를 갖는 폴리머는, 수산기를 갖는 고분자 화합물과 에피클로로히드린, 글리시딜토실레이트 등의 에폭시기를 갖는 화합물과의 반응에 의해 제조하는 것도 가능하다.Or the polymer which has the said epoxy group can also be manufactured by reaction of the high molecular compound which has a hydroxyl group, and the compound which has epoxy groups, such as epichlorohydrin and glycidyl tosylate.

이와 같은 폴리머의 중량평균분자량으로는, 예를 들어, 300 내지 200,000이다.As a weight average molecular weight of such a polymer, it is 300-200,000, for example.

이들 에폭시기를 2개 이상 갖는 에폭시 화합물은, 단독 또는 2종 이상을 조합하여 사용할 수 있다.The epoxy compound which has 2 or more of these epoxy groups can be used individually or in combination of 2 or more types.

본 발명의 열경화막 형성용 폴리에스테르 조성물에서의 (B)성분의 에폭시기를 2개 이상 갖는 에폭시 화합물의 함유량은, (A)성분의 폴리에스테르 100질량부에 기초하여 3 내지 50질량부인 것이 바람직하고, 보다 바람직하게는 5 내지 40질량부이고, 특히 바람직하게는 10 내지 30질량부이다. 이 비율이 너무 작은 경우에는, 열경화막 형성용 폴리에스테르 조성물로부터 얻어지는 경화막의 용제내성이나 내열성이 저하되는 한편, 너무 큰 경우에는 용제내성이 저하되거나 저장 안정성이 저하되는 경우가 있다.
It is preferable that content of the epoxy compound which has two or more epoxy groups of (B) component in the polyester composition for thermosetting film formation of this invention is 3-50 mass parts based on 100 mass parts of polyester of (A) component. More preferably, it is 5-40 mass parts, Especially preferably, it is 10-30 mass parts. When this ratio is too small, the solvent resistance and heat resistance of the cured film obtained from the polyester composition for thermosetting film formation fall, and when too large, solvent resistance may fall or storage stability may fall.

<(C)성분>&Lt; Component (C) >

(C)성분은, 디아민 화합물, 디카르본산 무수물, 테트라카르본산 이무수물을 반응시켜 얻어지는 아미노기 함유 카르본산 화합물이다. 상세하게는, 테트라카르본산 이무수물 1몰에 대해, 디아민 화합물 2몰과, 디카르본산 무수물 2몰을 반응시켜 얻어지는 아미노기 함유 카르본산 화합물이다.(C) component is an amino-group containing carboxylic compound obtained by making a diamine compound, a dicarboxylic anhydride, and tetracarboxylic dianhydride react. Specifically, it is an amino group containing carboxylic compound obtained by making 2 mol of diamine compounds and 2 mol of dicarboxylic anhydrides react with respect to 1 mol of tetracarboxylic dianhydrides.

상기 디아민 화합물, 디카르본산 무수물, 테트라카르본산 이무수물로는, 예를 들면, 하기 식(iii) 내지 (v)로 표시되는 화합물을 들 수 있다.As said diamine compound, dicarboxylic anhydride, tetracarboxylic dianhydride, the compound represented by following formula (iii)-(v) is mentioned, for example.

Figure pct00015
Figure pct00015

상기 식(iii) 및 식(iv)에 있어서, P 및 Q는 각각 독립적으로 2가의 유기기를 나타내고, 식(v)에 있어서, Z는 4가의 유기기를 나타낸다.In the formulas (iii) and (iv), P and Q each independently represent a divalent organic group, and in formula (v), Z represents a tetravalent organic group.

따라서, 상기 식(iii)로 표시되는 디아민 화합물, 식(iv)로 표시되는 디카르본산 무수물 그리고 식(v)로 표시되는 테트라카르본산 이무수물을 반응시킴으로써, 하기 식(2)로 표시되는 화합물이 얻어진다.Therefore, the compound represented by following formula (2) is made by making the diamine compound represented by said Formula (iii), the dicarboxylic anhydride represented by Formula (iv), and the tetracarboxylic dianhydride represented by Formula (v) react. Is obtained.

Figure pct00016
Figure pct00016

식(2)에 있어서, P, Q, Z는 상기 식(iii), 식(iv), 식(v)에서 설명하는 정의와 동일하다.In Formula (2), P, Q, and Z are the same as the definition demonstrated by said Formula (iii), Formula (iv), and Formula (v).

본 발명에서, 디아민 화합물, 디카르본산 무수물, 테트라카르본산 이무수물은, 각각 1종류만을 사용할 수도 있고, 복수종을 사용할 수도 있다. 따라서, 본 발명의 (C)성분의 아미노기 함유 카르본산 화합물로는, 식(2)로 표시되는 화합물을 1종 뿐만 아니라, 복수종을 이용할 수 있다.In this invention, only 1 type may be used for a diamine compound, dicarboxylic acid anhydride, and tetracarboxylic dianhydride, respectively, and multiple types may be used for it. Therefore, as an amino-group containing carboxylic acid compound of (C) component of this invention, not only 1 type but multiple types of compounds represented by Formula (2) can be used.

상기 P 및 Q는, 그 중에서도, 각각 독립적으로 환 구조를 갖는 2가의 유기기인 것이 바람직하다. 여기서, 환 구조로서는, 벤젠환, 지환, 축합다환식 탄화수소를 들 수 있다.Especially, it is preferable that said P and Q are bivalent organic groups which have ring structure each independently. Here, as a ring structure, a benzene ring, an alicyclic ring, and a condensed polycyclic hydrocarbon are mentioned.

식(iii) 중, P가 갖는 환 구조로서는, 벤젠환, 탄소원자수 4 내지 8의 지환, 탄소원자수 7 내지 16의 축합다환식 탄화수소가 바람직하다.In the formula (iii), as the ring structure of P, a benzene ring, an alicyclic ring having 4 to 8 carbon atoms, and a condensed polycyclic hydrocarbon having 7 to 16 carbon atoms is preferable.

따라서, 이 같은 환 구조를 갖는 디아민 화합물의 구체예로는 이하의 것을 들 수 있다: p-페닐렌디아민, m-페닐렌디아민, 2,4-디아미노톨루엔, 2,5-디아미노톨루엔, 2,6-디아미노톨루엔, 2,4-디메틸-1,3-디아미노벤젠, 2,5-디메틸-1,4-디아미노벤젠, 2,3,5,6-테트라메틸-1,4-디아미노벤젠, 2,4-디아미노페놀, 2,5-디아미노페놀, 4,6-디아미노레조르시놀, 2,5-디아미노안식향산, 3,5-디아미노안식향산, N,N-디알릴-2,4-디아미노아닐린, N,N-디알릴-2,5-디아미노아닐린, 4-아미노벤질아민, 3-아미노벤질아민, 2-(4-아미노페닐)에틸아민, 2-(3-아미노페닐)에틸아민, 1,5-나프탈렌디아민, 2,7-나프탈렌디아민, 4,4'-디아미노비페닐, 3,4'-디아미노비페닐, 3,3'-디아미노비페닐, 2,2'-디메틸-4,4'-디아미노비페닐, 3,3'-디메틸-4,4'-디아미노비페닐, 3,3'-디메톡시-4,4'-디아미노비페닐, 3,3'-디하이드록시-4,4'-디아미노비페닐, 3,3'-디카르복시-4,4'-디아미노비페닐, 3,3'-디플루오로-4,4'-디아미노비페닐, 2,2'-트리플루오로메틸-4,4'-디아미노비페닐, 3,3'-트리플루오로메틸-4,4'-디아미노비페닐, 4,4'-디아미노디페닐메탄, 3,3'-디아미노디페닐메탄, 3,4'-디아미노디페닐메탄, 4,4'-디아미노디페닐에테르3,3'-디아미노디페닐에테르, 3,4'-디아미노디페닐에테르, 4,4'-디아미노디페닐술폰, 3,3'-디아미노디페닐술폰, 4,4'-디아미노디페닐아민, 3,3'-디아미노디페닐아민, 3,4'-디아미노디페닐아민, N-메틸(4,4'-디아미노디페닐)아민, N-메틸(3,3'-디아미노디페닐)아민, N-메틸(3,4'-디아미노디페닐)아민, 4,4'-디아미노벤조페논, 3,3'-디아미노벤조페논, 3,4'-디아미노벤조페논, 4,4'-디아미노벤즈아닐리드, 1,2-비스(4-아미노페닐)에탄, 1,2-비스(3-아미노페닐)에탄, 4,4'-디아미노트란, 1,3-비스(4-아미노페닐)프로판, 1,3-비스(3-아미노페닐)프로판, 2,2-비스(4-아미노페닐)프로판, 2,2-비스(3-아미노페닐)프로판, 2,2-비스(3-아미노-4-메틸페닐)프로판, 2,2-비스(4-아미노페닐)헥사풀루오로프로판, 2,2-비스(3-아미노페닐)헥사플루오로프로판, 2,2-비스(3-아미노-4-메틸페닐)헥사풀루오로프로판, 1,3-비스(4-아미노페녹시)프로판, 1,4-비스(4-아미노페녹시)부탄, 1,5-비스(4-아미노페녹시)펜탄, 1,6-비스(4-아미노페녹시)헥산, 1,7-비스(4-아미노페녹시)헵탄, 1,8-비스(4-아미노페녹시)옥탄, 1,9-비스(4-아미노페녹시)노난, 1,10-비스(4-아미노페녹시)데칸, 1,11-비스(4-아미노페녹시)운데칸, 1,12-비스(4-아미노페녹시)도데칸, 비스(4-아미노페닐)프로판디오에이트, 비스(4-아미노페닐)부탄디오에이트, 비스(4-아미노페닐)펜탄디오에이트, 비스(4-아미노페닐)헥산디오에이트, 비스(4-아미노페닐)헵탄디오에이트, 비스(4-아미노페닐)옥탄디오에이트, 비스(4-아미노페닐)노난디오에이트, 비스(4-아미노페닐)데칸디오에이트, 1,4-비스(4-아미노페닐)벤젠, 1,3-비스(4-아미노페닐)벤젠, 1,4-비스(4-아미노페녹시)벤젠, 1,3-비스(4-아미노페녹시)벤젠, 1,4-비스(4-아미노벤질)벤젠, 1,3-비스(4-아미노벤질)벤젠, 비스(4-아미노페닐)테레프탈레이트, 비스(3-아미노페닐)테레프탈레이트, 비스(4-아미노페닐)이소프탈레이트, 비스(3-아미노페닐)이소프탈레이트, 1,4-페닐렌비스[(4-아미노페닐)메타논], 1,4-페닐렌비스[(3-아미노페닐)메타논], 1,3-페닐렌비스[(4-아미노페닐)메타논], 1,3-페닐렌비스[(3-아미노페닐)메타논], 1,4-페닐렌비스(4-아미노벤조에이트), 1,4-페닐렌비스(3-아미노벤조에이트), 1,3-페닐렌비스(4-아미노벤조에이트), 1,3-페닐렌비스(3-아미노벤조에이트), N,N'-(1,4-페닐렌)비스(4-아미노벤즈아미드), N,N'-(1,3-페닐렌)비스(4-아미노벤즈아미드), N,N'-(1,4-페닐렌)비스(3-아미노벤즈아미드), N,N'-(1,3-페닐렌)비스(3-아미노벤즈아미드), 비스(4-아미노페닐)테레프탈아미드, 비스(3-아미노페닐)테레프탈아미드, 비스(4-아미노페닐)이소프탈아미드, 비스(3-아미노페닐)이소프탈아미드, 2,2-비스[4-(4-아미노페녹시)페닐]프로판, 2,2-비스[4-(4-아미노페녹시)페닐]헥사풀루오로프로판, 4,4'-비스(4-아미노페녹시)디페닐술폰, 2,6-디아미노피리딘, 2,4-디아미노피리딘, 2,4-디아미노-1,3,5-트리아진, 2,6-디아미노디벤조퓨란, 2,7-디아미노디벤조퓨란, 3,6-디아미노디벤조퓨란, 2,6-디아미노카바졸, 2,7-디아미노카바졸, 3,6-디아미노카바졸, 2,4-디아미노-6-이소프로필-1,3,5-트리아진, 2,5-비스(4-아미노페닐)-1,3,4-옥사디아졸, 1,4-디아미노시클로헥산, 1,3-디아미노시클로헥산, 비스(4-아미노시클로헥실)메탄, 비스(4-아미노-3-메틸시클로헥실)메탄 등.Accordingly, specific examples of the diamine compound having such a ring structure include the following: p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, 2,5-diaminotoluene, 2,6-diaminotoluene, 2,4-dimethyl-1,3-diaminobenzene, 2,5-dimethyl-1,4-diaminobenzene, 2,3,5,6-tetramethyl-1,4 -Diaminobenzene, 2,4-diaminophenol, 2,5-diaminophenol, 4,6-diaminoresorcinol, 2,5-diaminobenzoic acid, 3,5-diaminobenzoic acid, N, N -Diallyl-2,4-diaminoaniline, N, N-diallyl-2,5-diaminoaniline, 4-aminobenzylamine, 3-aminobenzylamine, 2- (4-aminophenyl) ethylamine, 2- (3-aminophenyl) ethylamine, 1,5-naphthalenediamine, 2,7-naphthalenediamine, 4,4'-diaminobiphenyl, 3,4'-diaminobiphenyl, 3,3'- Diaminobiphenyl, 2,2'-dimethyl-4,4'-diaminobiphenyl, 3,3'-dimethyl-4,4'-diaminobiphenyl, 3,3'-dimethoxy-4,4 '-Diaminobiphenyl, 3,3'-dihydroxy -4,4'-diaminobiphenyl, 3,3'-dicarboxy-4,4'-diaminobiphenyl, 3,3'-difluoro-4,4'-diaminobiphenyl, 2, 2'-trifluoromethyl-4,4'-diaminobiphenyl, 3,3'-trifluoromethyl-4,4'-diaminobiphenyl, 4,4'-diaminodiphenylmethane, 3 , 3'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylether 3,3'-diaminodiphenylether, 3,4'-diaminodi Phenylether, 4,4'-diaminodiphenylsulfone, 3,3'-diaminodiphenylsulfone, 4,4'-diaminodiphenylamine, 3,3'-diaminodiphenylamine, 3,4 '-Diaminodiphenylamine, N-methyl (4,4'-diaminodiphenyl) amine, N-methyl (3,3'-diaminodiphenyl) amine, N-methyl (3,4'-dia Minodiphenyl) amine, 4,4'-diaminobenzophenone, 3,3'-diaminobenzophenone, 3,4'-diaminobenzophenone, 4,4'-diaminobenzanilide, 1,2- Bis (4-aminophenyl) ethane, 1,2-bis (3-aminophenyl) ethane, 4,4'-diaminotran, 1,3-bis (4- Minophenyl) propane, 1,3-bis (3-aminophenyl) propane, 2,2-bis (4-aminophenyl) propane, 2,2-bis (3-aminophenyl) propane, 2,2-bis ( 3-amino-4-methylphenyl) propane, 2,2-bis (4-aminophenyl) hexafuluropropane, 2,2-bis (3-aminophenyl) hexafluoropropane, 2,2-bis (3 -Amino-4-methylphenyl) hexafuluropropane, 1,3-bis (4-aminophenoxy) propane, 1,4-bis (4-aminophenoxy) butane, 1,5-bis (4-amino Phenoxy) pentane, 1,6-bis (4-aminophenoxy) hexane, 1,7-bis (4-aminophenoxy) heptane, 1,8-bis (4-aminophenoxy) octane, 1,9 -Bis (4-aminophenoxy) nonane, 1,10-bis (4-aminophenoxy) decane, 1,11-bis (4-aminophenoxy) undecane, 1,12-bis (4-aminophenoxy Dodecane, bis (4-aminophenyl) propanedioate, bis (4-aminophenyl) butanedioate, bis (4-aminophenyl) pentanedioate, bis (4-aminophenyl) hexanedioate, bis (4- Army Phenyl) heptanedioate, bis (4-aminophenyl) octanedioate, bis (4-aminophenyl) nonanddioate, bis (4-aminophenyl) decanedioate, 1,4-bis (4-aminophenyl) Benzene, 1,3-bis (4-aminophenyl) benzene, 1,4-bis (4-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 1,4-bis (4 -Aminobenzyl) benzene, 1,3-bis (4-aminobenzyl) benzene, bis (4-aminophenyl) terephthalate, bis (3-aminophenyl) terephthalate, bis (4-aminophenyl) isophthalate, bis (3-aminophenyl) isophthalate, 1,4-phenylenebis [(4-aminophenyl) methanone], 1,4-phenylenebis [(3-aminophenyl) methanone], 1,3-phenyl Lenbis [(4-aminophenyl) methanone], 1,3-phenylenebis [(3-aminophenyl) methanone], 1,4-phenylenebis (4-aminobenzoate), 1,4- Phenylenebis (3-aminobenzoate), 1,3-phenylenebis (4-aminobenzoate), 1,3-phenylenebis (3-aminobenzoate), N, N ' -(1,4-phenylene) bis (4-aminobenzamide), N, N '-(1,3-phenylene) bis (4-aminobenzamide), N, N'-(1,4- Phenylene) bis (3-aminobenzamide), N, N '-(1,3-phenylene) bis (3-aminobenzamide), bis (4-aminophenyl) terephthalamide, bis (3-aminophenyl ) Terephthalamide, bis (4-aminophenyl) isophthalamide, bis (3-aminophenyl) isophthalamide, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 2,2-bis [4- (4-aminophenoxy) phenyl] hexafuluropropane, 4,4'-bis (4-aminophenoxy) diphenylsulfone, 2,6-diaminopyridine, 2,4-diaminopyridine , 2,4-diamino-1,3,5-triazine, 2,6-diaminodibenzofuran, 2,7-diaminodibenzofuran, 3,6-diaminodibenzofuran, 2,6 -Diaminocarbazole, 2,7-diaminocarbazole, 3,6-diaminocarbazole, 2,4-diamino-6-isopropyl-1,3,5-triazine, 2,5-bis (4-aminophenyl) -1,3,4-oxadiazole, 1,4-diaminocyclohexane, 1, 3-diaminocyclohexane, bis (4-aminocyclohexyl) methane, bis (4-amino-3-methylcyclohexyl) methane and the like.

또한, 상기 식(iv) 중, Q가 갖는 환 구조로서는, 벤젠환, 탄소원자수 4 내지 8의 지환, 탄소원자수 7 내지 16의 축합다환식 탄화수소가 바람직하다. 보다 바람직하게는 지환이다.Moreover, as said ring structure which Q has in said formula (iv), a benzene ring, the alicyclic ring of 4-8 carbon atoms, and the condensed polycyclic hydrocarbon of 7-16 carbon atoms are preferable. More preferably, it is alicyclic.

이와 같은 환 구조를 갖는 디카르본산 무수물의 구체예로는, 프탈산 무수물, 트리멜리트산 무수물, 무수말레인산, 나프탈산 무수물, 수소화프탈산 무수물, 메틸-5-노보넨-2,3-디카르본산 무수물, 무수이타콘산, 테트라하이드로프탈산 무수물 등을 들 수 있다.Specific examples of the dicarboxylic acid anhydride having such a ring structure include phthalic anhydride, trimellitic anhydride, maleic anhydride, naphthalic anhydride, hydrogenated phthalic anhydride, methyl-5-norbornene-2,3-dicarboxylic anhydride And itaconic anhydride, tetrahydrophthalic anhydride, etc. are mentioned.

상기 식(v) 중, Z는 환 구조를 갖는 4가의 유기기인 것이 바람직하다. 여기서, 환 구조로서는, 벤젠환, 지환, 축합다환식 탄화수소를 들 수 있다. 보다 바람직하게는, 지환식기 또는 지방족기에 4개의 결합수가 결합된 4가의 유기기이고, 더욱 바람직하게는 하기 식(Z-1), 식(Z-2) 또는 식(Z-3)으로 표시되는 기이다.In the formula (v), Z is preferably a tetravalent organic group having a ring structure. Here, as a ring structure, a benzene ring, an alicyclic ring, and a condensed polycyclic hydrocarbon are mentioned. More preferably, it is a tetravalent organic group which four bond water couple | bonded with an alicyclic group or an aliphatic group, More preferably, it is represented by a following formula (Z-1), a formula (Z-2), or a formula (Z-3). Qi.

Figure pct00017
Figure pct00017

식 중, Z1은 환상 포화 탄화수소기를 나타내고, 바람직하게는 탄소원자수 4 내지 8의 환상 포화 탄화수소기를 나타내고, 보다 바람직하게는 탄소원자수 4 내지 6의 환상 포화 탄화수소기를 나타낸다. 여기서, Z1기 중에 포함되는 임의의 수소원자는 각각 독립적으로 지방족기로 치환되어 있을 수도 있고, 또, 이들 중 2개의 치환기가 서로 결합하여 4 내지 6원환을 형성할 수도 있다.In the formula, Z 1 represents a cyclic saturated hydrocarbon group, preferably a cyclic saturated hydrocarbon group having 4 to 8 carbon atoms, and more preferably a cyclic saturated hydrocarbon group having 4 to 6 carbon atoms. Here, arbitrary hydrogen atoms contained in the Z 1 group may be each independently substituted with an aliphatic group, and two of these substituents may be bonded to each other to form a 4 to 6 membered ring.

여기서, 상기 치환기인 지방족기는, 탄소원자수 1 내지 5의 지방족기가 바람직하고, 보다 바람직하게는 탄소원자수 1 내지 3의 지방족기이다. 이들 치환기가 결합하여 환을 형성하는 경우에는, 예를 들어, 노보넨기나 아다만탄기 등의 가교환식 탄화수소기, 일부 또는 전부가 수소화된 축합다환식 탄화수소기가 된다.Herein, the aliphatic group as the substituent is preferably an aliphatic group having 1 to 5 carbon atoms, more preferably an aliphatic group having 1 to 3 carbon atoms. When these substituents combine to form a ring, a temporary exchangeable hydrocarbon group, such as a norbornene group and an adamantane group, or a part or all becomes hydrogenated condensed polycyclic hydrocarbon group, for example.

상기 식 중, Y1은 단결합, 카르보닐기, 에테르기, 술포닐기, 탄소원자수 1 내지 8의 포화 탄화수소기 또는 불소원자로 치환된 탄소원자수 1 내지 8의 포화 탄화수소기를 나타낸다. 바람직하게는 단결합, 카르보닐기, 에테르기, 술포닐기, 탄소원자수 1 내지 5의 포화 탄화수소기 또는 불소원자로 치환된 탄소원자수 1 내지 5의 포화 탄화수소기를 나타낸다.In the above formula, Y 1 represents a single bond, a carbonyl group, an ether group, a sulfonyl group, a saturated hydrocarbon group having 1 to 8 carbon atoms or a saturated hydrocarbon group having 1 to 8 carbon atoms substituted with a fluorine atom. Preferably, a single bond, a carbonyl group, an ether group, a sulfonyl group, a saturated hydrocarbon group having 1 to 5 carbon atoms or a saturated hydrocarbon group having 1 to 5 carbon atoms substituted with a fluorine atom is represented.

또한 Y2은 탄소원자수 1 내지 8의 포화 탄화수소기를 나타내고, 바람직하게는 탄소원자수 1 내지 5의 포화 탄화수소기를 나타내고, 보다 바람직하게는 탄소원자수 1 내지 3의 포화 탄화수소기를 나타낸다.Y 2 represents a saturated hydrocarbon group having 1 to 8 carbon atoms, preferably a saturated hydrocarbon group having 1 to 5 carbon atoms, and more preferably a saturated hydrocarbon group having 1 to 3 carbon atoms.

Z의 바람직한 구체예로는, 상기한 식(A-1) 내지 식(A-8)을 들 수 있다. 이 중에서도, 특히 식(A-1) 또는 (A-2)로부터 선택되는 기인 것이 바람직하다.Preferred specific examples of Z include the above formulas (A-1) to (A-8). Among these, it is especially preferable that it is group chosen from Formula (A-1) or (A-2).

식(v)로 표시되는 테트라카르본산 이무수물의 예로는, 피로멜리트산 이무수물, 2,3,6,7-나프탈렌테트라카르본산 이무수물, 1,2,5,6-나프탈렌테트라카르본산 이무수물, 1,4,5,8-나프탈렌테트라카르본산 이무수물, 2,3,6,7-안트라센테트라카르본산 이무수물, 1,2,5,6-안트라센테트라카르본산 이무수물, 3,3',4,4'-비페닐테트라카르본산 이무수물, 2,2',3,3'-비페닐테트라카르본산 이무수물, 2,3,3',4'-비페닐테트라카르본산 이무수물, 3,3',4,4'-벤조페논테트라카르본산 이무수물, 2,3,3',4'-벤조페논테트라카르본산 이무수물, 비스(3,4-디카르복시페닐)메탄 이무수물, 비스(3,4-디카르복시페닐)에테르 이무수물, 비스(3,4-디카르복시페닐)술폰 이무수물, 2,2-비스(3,4-디카르복시페닐)프로판 이무수물, 2,2-비스(3,4-디카르복시페닐)헥사플루오로프로판 이무수물, 2,5-디카르복시메틸테레프탈산 이무수물, 4,6-디카르복시메틸이소프탈산 이무수물, 4-(2,5-디옥소테트라하이드로-3-푸라닐)프탈산 무수물, 1,4-비스(2,5-디옥소테트라하이드로-3-푸라닐)벤젠, 1,4-비스(2,6-디옥소테트라하이드로-4-피라닐)벤젠, 1,4-비스(2,5-디옥소테트라하이드로-3-메틸-3-푸라닐)벤젠, 1,4-비스(2,6-디옥소테트라하이드로-4-메틸-4-피라닐)벤젠, 1,2,3,4-부탄테트라카르본산 이무수물, 1,2,3,4-시클로부탄테트라카르본산 이무수물, 1,2-디메틸-1,2,3,4-시클로부탄테트라카르본산 이무수물, 1,3-디메틸-1,2,3,4-시클로부탄테트라카르본산 이무수물, 1,2,3,4-테트라메틸-1,2,3,4-시클로부탄테트라카르본산 이무수물, 1,2,3,4-시클로펜탄테트라카르본산 이무수물, 2,3,4,5-테트라하이드로퓨란테트라카르본산 이무수물, 2,3,5-트리카르복시시클로펜틸아세트산 이무수물, 1,2,4,5-시클로헥산테트라카르본산 이무수물, 4-(2,5-디옥소테트라하이드로-3-푸라닐)-시클로헥산-1,2-디카르본산 무수물, 5-(2,5-디옥소테트라하이드로-3-푸라닐)-3-메틸-3-시클로헥센-1,2-디카르본산 무수물, 비시클로[2.2.2]옥트-7-엔-2,3,5,6-테트라카르본산 이무수물, 3,4-디카르복시-1,2,3,4-테트라하이드로-1-나프탈렌숙신산 이무수물, 3,4-디카르복시-1,2,3,4-테트라하이드로-6-메틸-1-나프탈렌숙신산 이무수물, 비시클로[3.3.0]옥탄-2,4,6,8-테트라카르본산 이무수물, 3,3',4,4'-비시클로헥실테트라카르본산 이무수물, 2,3,5,6-노보넨테트라카르본산 이무수물, 3,5,6-트리카르복시노보넨-2-아세트산 이무수물, 트리시클로[4.2.1.02,5]노난-3,4,7,8-테트라카르본산 이무수물, 테트라시클로[4.4.1.02,5.07,10]운데칸-3,4,8,9-테트라카르본산 이무수물, 헥사시클로[6.6.0.12,7.03,6.19,14.010,13]헥사데칸-4,5,11,12-테트라카르본산 이무수물, 1,4-비스(2,5-디옥소테트라하이드로-3-푸라닐)헥산, 4-비스(2,6-디옥소테트라하이드로-4-피라닐)헥산 등을 들 수 있다.Examples of the tetracarboxylic dianhydride represented by the formula (v) include pyromellitic dianhydride, 2,3,6,7-naphthalene tetracarboxylic dianhydride and 1,2,5,6-naphthalene tetracarboxylic dianhydride. , 1,4,5,8-naphthalenetetracarboxylic dianhydride, 2,3,6,7-anthracenetetracarboxylic dianhydride, 1,2,5,6-anthracenetetracarboxylic dianhydride, 3,3 ' , 4,4'-biphenyltetracarboxylic dianhydride, 2,2 ', 3,3'-biphenyltetracarboxylic dianhydride, 2,3,3', 4'-biphenyltetracarboxylic dianhydride, 3,3 ', 4,4'-benzophenonetetracarboxylic dianhydride, 2,3,3', 4'-benzophenonetetracarboxylic dianhydride, bis (3,4-dicarboxyphenyl) methane dianhydride, Bis (3,4-dicarboxyphenyl) ether dianhydride, bis (3,4-dicarboxyphenyl) sulfone dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2- Bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride, 2,5-dicarboxymethylte Phthalic dianhydride, 4,6-dicarboxymethylisophthalic dianhydride, 4- (2,5-dioxotetrahydro-3-furanyl) phthalic anhydride, 1,4-bis (2,5-dioxotetrahydro -3-furanyl) benzene, 1,4-bis (2,6-dioxotetrahydro-4-pyranyl) benzene, 1,4-bis (2,5-dioxotetrahydro-3-methyl-3 -Furanyl) benzene, 1,4-bis (2,6-dioxotetrahydro-4-methyl-4-pyranyl) benzene, 1,2,3,4-butanetetracarboxylic dianhydride, 1,2 , 3,4-cyclobutanetetracarboxylic dianhydride, 1,2-dimethyl-1,2,3,4-cyclobutanetetracarboxylic dianhydride, 1,3-dimethyl-1,2,3,4-cyclo Butanetetracarboxylic dianhydride, 1,2,3,4-tetramethyl-1,2,3,4-cyclobutanetetracarboxylic dianhydride, 1,2,3,4-cyclopentanetetracarboxylic dianhydride, 2,3,4,5-tetrahydrofurantetracarboxylic dianhydride, 2,3,5-tricarboxycyclopentylacetic dianhydride, 1,2,4,5-cyclohexanetetra Carboxylic dianhydride, 4- (2,5-dioxotetrahydro-3-furanyl) -cyclohexane-1,2-dicarboxylic acid anhydride, 5- (2,5-dioxotetrahydro-3-fura Yl) -3-methyl-3-cyclohexene-1,2-dicarboxylic acid anhydride, bicyclo [2.2.2] oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, 3, 4-dicarboxy-1,2,3,4-tetrahydro-1-naphthalenesuccinic dianhydride, 3,4-dicarboxy-1,2,3,4-tetrahydro-6-methyl-1-naphthalenesuccinic dianhydride Water, bicyclo [3.3.0] octane-2,4,6,8-tetracarboxylic dianhydride, 3,3 ', 4,4'-bicyclohexyltetracarboxylic dianhydride, 2,3,5, 6-norbornenetetracarboxylic dianhydride, 3,5,6-tricarboxynorbornene-2-acetic acid dianhydride, tricyclo [4.2.1.0 2,5 ] nonane-3,4,7,8-tetracarboxylic acid Dianhydrides, tetracyclo [4.4.1.0 2,5 .0 7,10 ] undecane-3,4,8,9-tetracarboxylic dianhydride, hexahexa [6.6.0.1 2,7 .0 3,6 . 1 9,14 .0 10,13] hexadecane -4,5,11,12- Te Lacarboxylic dianhydride, 1,4-bis (2,5-dioxotetrahydro-3-furanyl) hexane, 4-bis (2,6-dioxotetrahydro-4-pyranyl) hexane and the like Can be.

상기 (C)성분의 화합물의 제조에 있어서, 테트라카르본산 이무수물과 디아민 화합물 및 디카르본산 무수물과의 반응 온도는 5 내지 50℃, 바람직하게는 10 내지 35℃의 임의의 온도를 선택할 수 있다. 반응 시에 폴리머화를 피하기 위해서는, 우선 디아민 화합물을 임의의 용제에 용해시킨 후, 반응시의 발열에 의해 중합되는 것을 피하기 위해 23℃로 수냉한 상태에서 테트라카르본산 이무수물과 디카르본산 무수물을 첨가하는 것이 더욱 바람직하다.In the preparation of the compound of the component (C), the reaction temperature of the tetracarboxylic dianhydride, the diamine compound and the dicarboxylic anhydride may be selected from 5 to 50 ° C, preferably 10 to 35 ° C. . In order to avoid polymerisation during the reaction, first, the diamine compound is dissolved in an arbitrary solvent, and then tetracarboxylic dianhydride and dicarboxylic anhydride are dissolved in a water-cooled state at 23 ° C in order to avoid polymerization by exothermic heat during the reaction. It is more preferable to add.

상기 반응은, 통상, 용제 내에서 행해진다. 이 때 사용 가능한 용제로는, 수산기나 아미노기 등, 산무수물과 반응하는 관능기를 함유하지 않는 것이라면 특별히 한정되지 않는다. 예를 들어, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, N-메틸-2-피롤리돈, N-비닐피롤리돈, N-메틸카프로락탐, 디메틸이미다졸, 디메틸설폭사이드, 테트라메틸요소, 디메틸술폰, 헥사메틸설폭사이드, m-크레졸, γ-부티로락톤, 시클로헥사논, 시클로펜타논, 메틸에틸케톤, 메틸이소부틸케톤, 2-헵타논, 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜프로필에테르아세테이트, 3-메톡시프로피온산메틸, 2-메톡시프로피온산메틸, 3-메톡시프로피온산에틸, 2-메톡시프로피온산에틸, 3-에톡시프로피온산에틸, 2-에톡시프로피온산에틸, 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트, 메틸셀루솔브, 에틸셀루솔브, 부틸셀루솔브, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜프로필에테르, 유산에틸, 유산부틸, 시클로헥산올, 아세트산에틸, 아세트산부틸, 유산에틸, 유산부틸 등을 들 수 있다.The said reaction is normally performed in a solvent. As a solvent which can be used at this time, if it does not contain the functional group reacting with an acid anhydride, such as a hydroxyl group and an amino group, it will not specifically limit. For example, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, N-vinylpyrrolidone, N-methylcaprolactam, dimethylimidazole, dimethyl sulfoxide Said, tetramethyl urea, dimethyl sulfone, hexamethyl sulfoxide, m-cresol, γ-butyrolactone, cyclohexanone, cyclopentanone, methyl ethyl ketone, methyl isobutyl ketone, 2-heptanone, propylene glycol monomethyl Ether acetate, propylene glycol propyl ether acetate, methyl 3-methoxypropionate, methyl 2-methoxypropionate, ethyl 3-methoxypropionate, ethyl 2-methoxypropionate, ethyl 3-ethoxypropionate, ethyl 2-ethoxypropionate , Methyl cellosolve acetate, ethyl cellosolve acetate, methyl cellosolve, ethyl cellosolve, butyl cellosolve, propylene glycol monomethyl ether, propylene glycol propyl ether, ethyl lactate, butyl lactate, cyclohexanol, ethyl acetate Butyl acetate, ethyl lactate, butyl lactate, and the like.

이들 용제는 단독으로 사용할 수도 있고, 혼합하여 사용할 수도 있지만, 용해성의 관점에서 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노메틸에테르아세테이트, N,N-디메틸아세트아미드, N-메틸-2-피롤리돈, 디메틸이미다졸이 바람직하다.These solvents may be used alone or may be used after mixing, but from the viewpoint of solubility, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, Dimethylimidazole is preferred.

또한, 아미노기 함유 카르본산 화합물을 용해하지 않는 용제이더라도, 중합 반응에 의해 생성된 아미노기 함유 카르본산 화합물이 석출되지 않는 범위에서, 상기 용제에 혼합하여 사용할 수도 있다.Moreover, even if it is a solvent which does not melt | dissolve an amino-group containing carboxylic acid compound, it can also be mixed and used for the said solvent in the range which does not precipitate the amino-group-containing carboxylic acid compound produced by a polymerization reaction.

본 발명의 열경화막 형성용 폴리에스테르수지 조성물에서의 (C)성분의 함유량은, (A)성분의 폴리에스테르 중합체 100질량부에 기초하여 5 내지 80질량부인 것이 바람직하고, 보다 바람직하게는 5 내지 60질량부이다. 이 비율이 너무 작은 경우에는, 열경화막 형성용 폴리에스테르수지 조성물로부터 얻어지는 경화막의 배향성이 저하되는 한편, 너무 큰 경우에는 투과율이 저하되거나 평탄화성이 저하되는 경우가 있다.
It is preferable that content of (C) component in the polyester resin composition for thermosetting film formation of this invention is 5-80 mass parts based on 100 mass parts of polyester polymers of (A) component, More preferably, it is 5 To 60 parts by mass. When this ratio is too small, the orientation of the cured film obtained from the polyester resin composition for thermosetting film formation falls, while when too large, the transmittance | permeability may fall or planarization property may fall.

<(D)성분><(D) component>

본 발명에서는 (D)성분으로서 하기의 식(3)으로 표시되는 비스말레이미드 화합물을 함유할 수도 있다.In this invention, you may contain the bismaleimide compound represented by following formula (3) as (D) component.

(D)성분인 비스말레이미드 화합물은, 평탄화성을 더욱 향상시키는 데에 있어 유효하다.The bismaleimide compound which is (D) component is effective in further improving planarization property.

Figure pct00018
Figure pct00018

식 중, X는, 지방족기, 환식 구조를 포함하는 지방족기 및 방향족기로 이루어진 군으로부터 선택되는 유기기 또는 이들 군으로부터 선택되는 복수의 유기기의 조합으로 이루어진 유기기이다. 그리고, X에는, 에스테르 결합, 에테르 결합, 아미드 결합, 우레탄 결합 등의 결합을 포함할 수도 있다.In the formula, X is an organic group consisting of an organic group selected from the group consisting of an aliphatic group, an aliphatic group containing a cyclic structure and an aromatic group, or a combination of a plurality of organic groups selected from these groups. And X may also contain bonds, such as an ester bond, an ether bond, an amide bond, and a urethane bond.

이와 같은 비스말레이미드 화합물로는, 예를 들어, N,N'-3,3-디페닐메탄비스말레이미드, N,N'-(3,3-디에틸-5,5-디메틸)-4,4-디페닐-메탄비스말레이미드, N,N'-4,4-디페닐메탄비스말레이미드, 3,3-디페닐술폰비스말레이미드, 4,4-디페닐술폰비스말레이미드, N,N'-p-벤조페논비스말레이미드, N,N'-디페닐에탄비스말레이미드, N,N'-디페닐에테르비스말레이미드, N,N'-(메틸렌디-디테트라하이드로페닐)비스말레이미드, N,N'-(3-에틸)-4,4-디페닐메탄비스말레이미드, N,N'-(3, 3-디메틸)-4,4-디페닐메탄비스말레이미드, N,N'-(3,3-디에틸)-4,4-디페닐메탄비스말레이미드, N,N'-(3,3-디클로로)-4,4-디페닐메탄비스말레이미드, N,N'-이소포론비스말레이미드, N,N'-톨리딘비스말레이미드, N,N'-디페닐프로판비스말레이미드, N,N'-나프탈렌비스말레이미드, N,N'-m-페닐렌비스말레이미드, N,N'-5-메톡시-1,3-페닐렌비스말레이미드, 2,2-비스(4-(4-말레이미드페녹시)페닐)프로판, 2,2-비스(3-클로로-4-(4-말레이미드페녹시)페닐)프로판, 2,2-비스(3-브로모-4-(4-말레이미드페녹시)페닐)프로판, 2,2-비스(3-에틸-4-(4-말레이미드페녹시)페닐)프로판, 2,2-비스(3-프로필-4-(4-말레이미드페녹시)페닐)프로판, 2,2-비스(3-이소프로필-4-(4-말레이미드페녹시)페닐)프로판, 2,2-비스(3-부틸-4-(4-말레이미드페녹시)페닐)프로판, 2,2-비스(3-메톡시-4-(4-말레이미드페녹시)페닐)프로판, 1,1-비스(4-(4-말레이미드페녹시)페닐)에탄, 1,1-비스(3-메틸-4-(4-말레이미드페녹시)페닐)에탄, 1,1-비스(3-클로로-4-(4-말레이미드페녹시)페닐)에탄, 1,1-비스(3-브로모-4-(4-말레이미드페녹시)페닐)에탄, 3,3-비스(4-(4-말레이미드페녹시)페닐)펜탄, 1,1,1,3,3,3-헥사플루오로-2,2-비스(4-(4-말레이미드페녹시)페닐)프로판, 1,1,1,3,3,3-헥사플루오로-2,2-비스(3,5-디메틸-4-(4-말레이미드페녹시)페닐)프로판, 1,1,1,3,3,3-헥사플루오로-2,2-비스(3,5-디브로모-4-(4-말레이미드페녹시)페닐)프로판, N,N'-에틸렌디말레이미드, N,N'-헥사메틸렌비스말레이미드, N,N'-도데카메틸렌비스말레이미드, N,N'-m-크실렌비스말레이미드, N,N'-p-크실렌비스말레이미드, N,N'-1,3-비스메틸렌시클로헥산비스말레이미드, N,N'-2,4-토릴렌비스말레이미드, N,N'-2,6-토릴렌비스말레이미드, 등을 들 수 있다. 이들 비스말레이미드 화합물은 특별히 상기한 것에 한정되는 것은 아니다. 이들은, 단독 또는 2종 이상의 성분을 병용하는 것이 가능하다.As such a bismaleimide compound, For example, N, N'-3,3-diphenylmethanebismaleimide, N, N '-(3,3-diethyl-5,5-dimethyl) -4 , 4-diphenyl-methanebismaleimide, N, N'-4,4-diphenylmethanebismaleimide, 3,3-diphenylsulfonbismaleimide, 4,4-diphenylsulfonbismaleimide, N , N'-p-benzophenonebismaleimide, N, N'-diphenylethanebismaleimide, N, N'-diphenyletherbismaleimide, N, N '-(methylenedi-ditetrahydrophenyl) Bismaleimide, N, N '-(3-ethyl) -4,4-diphenylmethanebismaleimide, N, N'-(3, 3-dimethyl) -4,4-diphenylmethanebismaleimide, N, N '-(3,3-diethyl) -4,4-diphenylmethanebismaleimide, N, N'-(3,3-dichloro) -4,4-diphenylmethanebismaleimide, N , N'-isophoronebismaleimide, N, N'-tolidine bismaleimide, N, N'-diphenylpropanebismaleimide, N, N'-naphthalenebismaleimide, N, N'-m- Phenylenebismaleimide, N, N'-5-methoxy-1, 3-phenylenebismaleimide, 2,2-bis (4- (4-maleimidephenoxy) phenyl) propane, 2,2-bis (3-chloro-4- (4-maleimidephenoxy) phenyl) Propane, 2,2-bis (3-bromo-4- (4-maleimidephenoxy) phenyl) propane, 2,2-bis (3-ethyl-4- (4-maleimidephenoxy) phenyl) propane , 2,2-bis (3-propyl-4- (4-maleimidephenoxy) phenyl) propane, 2,2-bis (3-isopropyl-4- (4-maleimidephenoxy) phenyl) propane, 2,2-bis (3-butyl-4- (4-maleimidephenoxy) phenyl) propane, 2,2-bis (3-methoxy-4- (4-maleimidephenoxy) phenyl) propane, 1 , 1-bis (4- (4-maleimidephenoxy) phenyl) ethane, 1,1-bis (3-methyl-4- (4-maleimidephenoxy) phenyl) ethane, 1,1-bis (3 -Chloro-4- (4-maleimidephenoxy) phenyl) ethane, 1,1-bis (3-bromo-4- (4-maleimidephenoxy) phenyl) ethane, 3,3-bis (4- (4-maleimidephenoxy) phenyl) pentane, 1,1,1,3,3,3-hexafluoro-2,2-bis (4- (4-maleimidephenoxy) phenyl) propane, 1, 1,1,3 , 3,3-hexafluoro-2,2-bis (3,5-dimethyl-4- (4-maleimidephenoxy) phenyl) propane, 1,1,1,3,3,3-hexafluoro -2,2-bis (3,5-dibromo-4- (4-maleimidephenoxy) phenyl) propane, N, N'-ethylenedimaleimide, N, N'-hexamethylenebismaleimide, N, N'-dodecamethylenebismaleimide, N, N'-m-xylenebismaleimide, N, N'-p-xylenebismaleimide, N, N'-1,3-bismethylenecyclohexanebis Maleimide, N, N'-2,4- toylene bismaleimide, N, N'-2,6- toylene bismaleimide, etc. are mentioned. These bismaleimide compounds are not specifically limited to what was mentioned above. These can use together single or 2 types or more of components.

이들 비스말레이미드 중 2,2-비스(4-(4-말레이미드페녹시)페닐)프로판, N,N'-4,4-디페닐메탄비스말레이미드, N,N'-(3,3-디에틸-5,5-디메틸)-4,4-디페닐-메탄비스말레이미드 등의 방향족 비스말레이미드가 바람직하다.Of these bismaleimides, 2,2-bis (4- (4-maleimidephenoxy) phenyl) propane, N, N'-4,4-diphenylmethanebismaleimide, N, N '-(3,3 Aromatic bismaleimides such as -diethyl-5,5-dimethyl) -4,4-diphenyl-methanebismaleimide are preferred.

또한, 이들 방향족 비스말레이미드 중, 보다 높은 평탄화성을 얻기 위해서는 분자량 1,000 이하인 것이 바람직하다.Moreover, in order to obtain higher planarity among these aromatic bismaleimide, it is preferable that it is molecular weight 1,000 or less.

본 발명에서 (D)성분의 비스말레이미드 화합물의 사용 비율은, (A)성분의 폴리에스테르 100질량부에 대해 0.5 내지 50질량부인 것이 바람직하고, 보다 바람직하게는 1 내지 30질량부이고, 특히 바람직하게는 2 내지 20질량부이다. 이 비율이 너무 작은 경우에는, 열경화막 형성용 폴리에스테르 조성물로부터 얻어지는 경화막의 평탄화성이 저하되고, 너무 큰 경우에는 경화막의 투과율이 저하되거나 도막이 거칠어지거나 하는 경우가 있다.
In this invention, it is preferable that the use ratio of the bismaleimide compound of (D) component is 0.5-50 mass parts with respect to 100 mass parts of polyester of (A) component, More preferably, it is 1-30 mass parts, Especially Preferably it is 2-20 mass parts. When this ratio is too small, the flattening property of the cured film obtained from the polyester composition for thermosetting film formation falls, and when too large, the transmittance | permeability of a cured film may fall or a coating film may become rough.

<용제><Solvent>

본 발명의 열경화막 형성용 폴리에스테르 조성물은, 용제에 용해된 용액 상태로 사용되는 경우가 많다. 이 때 사용되는 용제는, (A)성분 내지 (C)성분, 필요에 따라 (D)성분 및/또는 후술하는 그 밖의 첨가제를 용해하는 것으로, 이러한 용해능을 갖는 용제라면, 그 종류 및 구조 등은 특별히 한정되는 것은 아니다.The polyester composition for thermosetting film formation of this invention is used in the solution state melt | dissolved in the solvent in many cases. The solvent used at this time melt | dissolves (A) component-(C) component, if needed, (D) component and / or the other additive mentioned later, if it is a solvent which has such a solubility, the kind, structure, etc. Is not specifically limited.

이러한 용제로는, (A)성분의 중합에 사용한 용제나 하기의 용제를 들 수 있다. 예를 들어, 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트, 메틸셀루솔브, 에틸셀루솔브, 부틸셀루솔브, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜프로필에테르, 유산에틸, 유산부틸, 시클로헥산올, 아세트산에틸, 아세트산부틸, 유산에틸, 유산부틸 등을 들 수 있다.As such a solvent, the solvent used for superposition | polymerization of (A) component, and the following solvent are mentioned. For example, methyl cellosolve acetate, ethyl cellosolve acetate, methyl cellosolve, ethyl cellosolve, butyl cellosolve, propylene glycol monomethyl ether, propylene glycol propyl ether, ethyl lactate, butyl lactate, cyclohexanol, acetic acid Ethyl, butyl acetate, ethyl lactate, butyl lactate, etc. are mentioned.

이들 용제는, 1종 단독으로, 또는 2종 이상을 조합하여 사용할 수 있다.
These solvents can be used individually by 1 type or in combination of 2 or more type.

<그 밖의 첨가제><Other additives>

또한, 본 발명의 열경화막 형성용 폴리에스테르 조성물은, 본 발명의 효과를 저하시키지 않는 한, 필요에 따라, 계면활성제, 레올로지 조정제, 실란 커플링제 등의 접착보조제, 안료, 염료, 보존안정제, 소포제, 다가페놀이나 다가카르본산 등의 용해촉진제, 산화방지제 등을 함유할 수 있다.In addition, the polyester composition for thermosetting film formation of this invention is an adhesive adjuvant, such as surfactant, a rheology regulator, and a silane coupling agent, a pigment, dye, a storage stabilizer, as needed, unless the effect of this invention is reduced. , Antifoaming agents, dissolution accelerators such as polyhydric phenol and polycarboxylic acid, antioxidants and the like.

산화방지제로는 특히 페놀류가 바람직하고, 그 구체예로서, 2,6-디-t-부틸-4-크레졸, 2,6-디-t-부틸-페놀, 2,4,6-트리스(3',5'-디-t-부틸-4'-하이드록시벤질)메시틸렌, 펜타에리스리톨테트라키스[3-(3',5'-디-t-부틸-4'-하이드록시페닐)프로피오네이트], 아세톤비스(3,5-디-t-부틸-4-하이드록시페닐)메르캅토르, 4,4'-메틸렌비스(2,6-디-t-부틸페놀), 3-(3,5-디-t-부틸-4-하이드록시페닐)프로피온산메틸, 4,4'-티오디(2,6-디-t-부틸페놀), 트리스(3,5-디-t-부틸-4-하이드록시벤질)이소시아누르산, 비스(3,5-디-t-부틸-4-하이드록시벤질)설파이드 등을 들 수 있다.
As the antioxidant, phenols are particularly preferable, and specific examples thereof include 2,6-di-t-butyl-4-cresol, 2,6-di-t-butyl-phenol, 2,4,6-tris (3 ', 5'-di-t-butyl-4'-hydroxybenzyl) mesitylene, pentaerythritol tetrakis [3- (3', 5'-di-t-butyl-4'-hydroxyphenyl) propio Nate], acetone bis (3,5-di-t-butyl-4-hydroxyphenyl) mercaptor, 4,4'-methylenebis (2,6-di-t-butylphenol), 3- (3 , 5-di-t-butyl-4-hydroxyphenyl) methyl propionate, 4,4'-thiodi (2,6-di-t-butylphenol), tris (3,5-di-t-butyl- 4-hydroxybenzyl) isocyanuric acid, bis (3,5-di-t-butyl-4-hydroxybenzyl) sulfide, etc. are mentioned.

<열경화막 형성용 폴리에스테르 조성물><Polyester composition for thermosetting film formation>

본 발명의 열경화막 형성용 폴리에스테르 조성물은, (A)성분의 폴리에스테르, (B)성분의 에폭시기를 2개 이상 갖는 에폭시 화합물, (C)성분의 아미노기 함유 카르본산 화합물을 함유하고, 원하는 경우 (D)성분의 비스말레이미드 화합물, 또한 그 밖의 첨가제 중 1종 이상을 함유할 수 있는 조성물이다. 그리고, 통상은, 이들이 용제에 용해된 용액으로서 사용되는 경우가 많다.The polyester composition for thermosetting film formation of this invention contains the polyester of (A) component, the epoxy compound which has two or more epoxy groups of (B) component, and the amino-group containing carboxylic acid compound of (C) component, and wants The bismaleimide compound of the case (D) component, and also a composition which can contain 1 or more types of other additives. And these are usually used as a solution which melt | dissolved in the solvent.

그 중에서도, 본 발명의 열경화막 형성용 폴리에스테르 조성물의 바람직한 예는, 이하와 같다.Especially, the preferable example of the polyester composition for thermosetting film formation of this invention is as follows.

[1]: (A)성분 100질량부에 기초하여, 3 내지 50질량부의 (B)성분, 5 내지 80질량부의 (C)성분을 함유하는 열경화막 형성용 폴리에스테르 조성물.[1]: Polyester composition for thermosetting film formation containing 3-50 mass parts (B) component and 5-80 mass parts (C) component based on 100 mass parts of (A) component.

[2]: (A)성분 100질량부에 기초하여, 3 내지 50질량부의 (B)성분, 5 내지 80질량부의 (C)성분, 용제를 함유하는 열경화막 형성용 폴리에스테르 조성물.[2]: Polyester composition for thermosetting film formation containing 3-50 mass parts (B) component, 5-80 mass parts (C) component, and a solvent based on 100 mass parts of (A) component.

[3]: (A)성분 100질량부에 기초하여, 3 내지 50질량부의 (B)성분, 5 내지 80질량부의 (C)성분, 0.5 내지 50질량부의 (D)성분을 함유하는 열경화막 형성용 폴리에스테르 조성물.[3]: Thermosetting film containing 3 to 50 parts by mass of (B) component, 5 to 80 parts by mass of (C) component and 0.5 to 50 parts by mass of (D) component based on 100 parts by mass of (A) component. Polyester composition for formation.

[4]: (A)성분 100질량부에 기초하여, 3 내지 50질량부의 (B)성분, 5 내지 80질량부의 (C)성분, 0.5 내지 50질량부의 (D)성분, 용제를 함유하는 열경화막 형성용 폴리에스테르 조성물.
[4]: heat containing 3 to 50 parts by mass of (B) component, 5 to 80 parts by mass of (C) component, 0.5 to 50 parts by mass of (D) component and solvent based on 100 parts by mass of (A) component Polyester composition for cured film formation.

본 발명의 열경화막 형성용 폴리에스테르 조성물이 용액의 형태인 경우의 배합비율, 조제방법 등을 이하에 상세하게 설명한다.The mixing | blending ratio, preparation method, etc. when the polyester composition for thermosetting film formation of this invention is a form of a solution are demonstrated in detail below.

본 발명의 열경화막 형성용 폴리에스테르 조성물에서의 고형분의 비율은, 각 성분이 균일하게 용제에 용해되어 있는 한, 특별히 한정되는 것은 아니지만, 1 내지 80질량%이고, 바람직하게는 5 내지 60질량%이고, 보다 바람직하게는 10 내지 50질량%이다. 여기서, 고형분이란, 열경화막 형성용 폴리에스테르 조성물의 전체 성분에서 용제를 제외한 것을 의미한다.Although the ratio of solid content in the polyester composition for thermosetting film formation of this invention is not specifically limited as long as each component is melt | dissolving uniformly in a solvent, it is 1-80 mass%, Preferably it is 5-60 mass %, More preferably, it is 10-50 mass%. Here, solid content means what remove | excluding the solvent from the all components of the polyester composition for thermosetting film formation.

본 발명의 열경화막 형성용 폴리에스테르 조성물의 조제방법은, 특별히 한정되지 않지만, 그 조제법으로는, 예를 들어, (A)성분을 용제에 용해하고, 이 용액에 (B)성분, (C)성분, 추가로, (D)성분을 소정의 비율로 혼합해, 균일한 용액으로 하는 방법, 혹은, 이 조제법의 적당한 단계에서, 필요에 따라 그 밖의 첨가제를 추가로 첨가하여 혼합하는 방법을 들 수 있다.Although the preparation method of the polyester composition for thermosetting film formation of this invention is not specifically limited, As the preparation method, (A) component is melt | dissolved in a solvent, for example, (B) component, (C) in this solution. ), The method of mixing (D) component in a predetermined ratio and making it into a uniform solution, or the method of adding and adding another additive further as needed at the suitable stage of this preparation method. Can be.

본 발명의 열경화막 형성용 폴리에스테르 조성물을 조제하는데 있어서는, 용제 중에서의 중합 반응에 의해 얻어지는 폴리에스테르의 용액을 그대로 사용할 수 있다. 이 경우, 이 (A)성분의 용액에 상기와 동일하게 (B)성분, (C)성분, (D)성분 등을 넣어 균일한 용액으로 할 때에, 농도 조정을 목적으로 하여 추가로 용제를 추가 투입할 수도 있다. 이 때, 폴리에스테르의 생성과정에서 사용되는 용제와, 열경화막 형성용 폴리에스테르 조성물의 조제 시에 농도 조정을 위해 사용되는 용제는, 동일할 수도 있고, 상이할 수도 있다.In preparing the polyester composition for thermosetting film formation of this invention, the solution of the polyester obtained by the polymerization reaction in a solvent can be used as it is. In this case, when (B) component, (C) component, (D) component, etc. are put into the solution of this (A) component, and it is set as a uniform solution, a solvent is further added for the purpose of concentration adjustment. You can also put in. At this time, the solvent used in the production | generation process of polyester and the solvent used for density | concentration adjustment at the time of preparation of the polyester composition for thermosetting film formation may be the same, and may differ.

그리고, 조제된 열경화막 형성용 폴리에스테르 조성물의 용액은, 공경이 0.2㎛ 정도인 필터 등을 이용하여 여과한 다음 사용하는 것이 바람직하다.
And it is preferable to use, after filtering the prepared solution of the polyester composition for thermosetting film formation using a filter etc. which have a pore size of about 0.2 micrometer.

<도막, 경화막 및 액정 배향층><Film, Cured Film, and Liquid Crystal Alignment Layer>

본 발명의 열경화막 형성용 폴리에스테르 조성물을 기판(예를 들어, 실리콘/이산화실리콘 피복 기판, 실리콘나이트라이드 기판, 금속, 예를 들어, 알루미늄, 몰리브덴, 크롬 등이 피복된 기판, 유리 기판, 석영 기판, ITO 기판 등)이나 필름(예를 들어, 트리아세틸셀룰로오스 필름, 폴리에스테르 필름, 아크릴 필름 등의 수지 필름) 등의 위에, 회전 도포, 흘림 도포, 롤 도포, 슬릿 도포, 슬릿에 이은 회전 도포, 잉크젯 도포, 인쇄 등에 의해 도포하고, 그 후, 핫플레이트 또는 오븐 등으로 예비 건조(프리베이크)함으로써, 도막을 형성할 수 있다. 그 후, 이 도막을 가열 처리함으로써, 피막이 형성된다.The polyester composition for forming a thermosetting film of the present invention may be a substrate (for example, a silicon / silicon dioxide coated substrate, a silicon nitride substrate, a metal, for example, a substrate coated with aluminum, molybdenum, chromium, etc., a glass substrate, Rotational coating, flow coating, roll coating, slit coating, slit followed by rotation on a quartz substrate, an ITO substrate, or the like) or a film (for example, a resin film such as a triacetylcellulose film, a polyester film, an acrylic film, etc.) It is apply | coated by application | coating, inkjet coating, printing, etc., and then preliminary drying (prebaking) with a hotplate or oven etc. can form a coating film. Then, a film is formed by heat-processing this coating film.

이 가열 처리의 조건으로는, 예를 들어, 온도 70℃ 내지 160℃, 시간 0.3 내지 60분간의 범위 중에서 적당히 선택된 가열 온도 및 가열 시간이 채용된다. 가열 온도 및 가열 시간은, 바람직하게는 80℃ 내지 140℃, 0.5 내지 10분간이다.As conditions of this heat processing, the heating temperature and heating time suitably selected from the range of the temperature of 70 degreeC-160 degreeC, and time for 0.3 to 60 minutes are employ | adopted, for example. Heating temperature and a heat time become like this. Preferably they are 80 degreeC-140 degreeC, and 0.5 to 10 minutes.

또한, 열경화막 형성용 폴리에스테르 조성물로 형성되는 피막의 막두께는, 예를 들면, 0.1 내지 30㎛이고, 사용하는 기판의 단차나 광학적, 전기적 성질을 고려하여 적당히 선택할 수 있다.In addition, the film thickness of the film formed from the polyester composition for thermosetting film formation is 0.1-30 micrometers, for example, and can select suitably in consideration of the level | step difference of the board | substrate to be used, and the optical and electrical property.

포스트베이크로는, 일반적으로, 온도 140℃ 내지 250℃의 범위 중에서 선택된 가열 온도로, 핫플레이트 상인 경우에는 5 내지 30분간, 오븐 속인 경우에는 30 내지 90분간 처리하는 방법이 채용된다.The postbaking is generally carried out at a heating temperature selected from the range of 140 ° C. to 250 ° C. for 5 to 30 minutes in the case of a hot plate and 30 to 90 minutes in the oven.

상기한 바와 같은 조건을 토대로, 본 발명의 열경화막 형성용 폴리에스테르 조성물을 경화시킴으로써, 기판의 단차를 충분히 평탄화할 수 있고, 고투명성을 갖는 경화막을 형성할 수 있다.By hardening the polyester composition for thermosetting film formation of this invention based on conditions mentioned above, the level | step difference of a board | substrate can fully be planarized and the cured film which has high transparency can be formed.

이렇게 형성한 경화막은 러빙 처리를 행함으로써 액정재 배향층, 즉, 액정성을 갖는 화합물을 배향시키는 층으로서 기능시킬 수 있다.Thus formed cured film can function as a layer which orientates a liquid-crystal material orientation layer, ie, a compound which has liquid crystallinity, by performing a rubbing process.

러빙 처리의 조건으로는, 일반적으로 회전 속도 300 내지 1,000rpm, 이송 속도 3 내지 200mm/초, 압입량 0.1 내지 1mm라는 조건이 사용된다.Generally as conditions of a rubbing process, the conditions of 300 to 1,000 rpm of rotation speeds, 3 to 200 mm / sec of feed rates, and 0.1-1 mm of indentation amount are used.

그 후, 순수 등을 사용하여 초음파 세정에 의해 러빙을 통해 생성된 잔사가 제거된다.Thereafter, residues generated through rubbing are removed by ultrasonic cleaning using pure water or the like.

이렇게 형성된 액정 배향층 위에, 위상차 재료를 도포한 후, 위상차 재료를 액정 상태로 하여 광경화시켜, 광학 이방성을 갖는 층을 형성할 수 있다.After apply | coating a phase difference material on the liquid crystal aligning layer formed in this way, it can photocure by making a phase difference material into a liquid crystal state, and can form the layer which has optical anisotropy.

위상차 재료로는, 예를 들어, 중합성 기를 갖는 액정 모노머 또는 이를 함유하는 조성물 등이 이용된다.As a retardation material, the liquid crystal monomer which has a polymeric group, the composition containing this, etc. are used, for example.

그리고, 액정 배향층을 형성하는 재료가 필름인 경우에는, 광학 이방성 필름으로서 유용하다.And when the material which forms a liquid crystal aligning layer is a film, it is useful as an optically anisotropic film.

또한, 상기와 같이 하여 형성된 액정 배향층을 갖는 2매의 기판을, 스페이서를 사이에 두고 액정 배향층이 마주보도록 접합한 후, 이들 기판 사이에, 액정을 주입하여, 액정이 배향된 액정 표시 소자로 할 수 있다.In addition, after bonding two board | substrates which have the liquid crystal aligning layer formed as mentioned above so that a liquid crystal aligning layer may face through a spacer, the liquid crystal is inject | poured between these board | substrates, and the liquid crystal display element in which the liquid crystal was orientated You can do

그러므로, 본 발명의 열경화막 형성용 폴리에스테르 조성물은, 각종 광학 이방성 필름, 액정 표시 소자에 적합하게 이용할 수 있다.Therefore, the polyester composition for thermosetting film formation of this invention can be used suitably for various optically anisotropic films and liquid crystal display elements.

또한, 본 발명의 열경화막 형성용 폴리에스테르 조성물은 적어도 필요한 수준의 평탄화성을 갖기 때문에, 박막 트랜지스터(TFT)형 액정 표시 소자, 유기 EL 소자 등의 각종 디스플레이에서의 보호막, 평탄화막, 절연막 등의 경화막을 형성하는 재료로서도 유용하고, 특히, 컬러필터의 오버코트재, TFT형 액정 소자의 층간절연막, 유기 EL 소자의 절연막 등을 형성하는 재료로서도 적합하다.
In addition, the polyester composition for forming a thermosetting film of the present invention has at least the required level of flattening properties, so that a protective film, a flattening film, an insulating film, or the like in various displays such as a thin film transistor (TFT) type liquid crystal display device, an organic EL device, and the like. It is also useful as a material for forming a cured film of the present invention, and is particularly suitable as a material for forming an overcoat material of a color filter, an interlayer insulating film of a TFT type liquid crystal element, an insulating film of an organic EL element, and the like.

[실시예][Example]

이하, 실시예를 들어 본 발명을 더욱 자세하게 설명하는데, 본 발명은 이들 실시예에 한정되는 것은 아니다.
Hereinafter, although an Example is given and this invention is demonstrated in more detail, this invention is not limited to these Examples.

[실시예에서 사용하는 약기호][Weak symbol used in the Example]

이하의 실시예에서 사용하는 약기호의 의미는, 다음과 같다.
The meaning of the abbreviation used in the following Example is as follows.

<폴리에스테르 중합체 원료><Polyester Polymer Raw Material>

HBPDA: 3,3'-4,4'-비시클로헥실테트라카르본산 이무수물HBPDA: 3,3'-4,4'-bicyclohexyltetracarboxylic dianhydride

THPA: 1,2,5,6-테트라하이드로프탈산 무수물THPA: 1,2,5,6-tetrahydrophthalic anhydride

BPDA: 비페닐테트라카르본산 이무수물BPDA: biphenyltetracarboxylic dianhydride

HBPA: 수소화비스페놀 AHBPA: Hydrogenated Bisphenol A

BTEAC: 벤질트리에틸암모늄클로라이드
BTEAC: benzyltriethylammonium chloride

<아미노기 함유 카르본산 화합물 원료><Amino group-containing carboxylic acid compound raw material>

HBPDA: 3,3'-4,4'-비시클로헥실테트라카르본산 이무수물HBPDA: 3,3'-4,4'-bicyclohexyltetracarboxylic dianhydride

CBDA: 1,2,4,5-시클로헥산테트라카르본산 이무수물CBDA: 1,2,4,5-cyclohexanetetracarboxylic dianhydride

THPA: 1,2,5,6-테트라하이드로프탈산 무수물THPA: 1,2,5,6-tetrahydrophthalic anhydride

DA-4P: 1,3-비스(4-아미노페닐)벤젠DA-4P: 1,3-bis (4-aminophenyl) benzene

DDS: 4,4'-디아미노디페닐술폰
DDS: 4,4'-diaminodiphenylsulfone

<폴리이미드 전구체 원료><Polyimide precursor raw material>

CBDA: 1,2,4,5-시클로헥산테트라카르본산 이무수물CBDA: 1,2,4,5-cyclohexanetetracarboxylic dianhydride

pDA: p-페닐렌디아민
pDA: p-phenylenediamine

<아크릴 공중합체 원료><Acrylic copolymer raw material>

MAA: 메타크릴산MAA: methacrylic acid

MMA: 메틸메타크릴레이트MMA: Methyl methacrylate

HEMA: 2-하이드록시에틸메타크릴레이트HEMA: 2-hydroxyethyl methacrylate

CHMI: N-시클로헥실말레이미드CHMI: N-cyclohexylmaleimide

AIBN: 아조비스이소부티로니트릴
AIBN: azobisisobutyronitrile

<에폭시 화합물><Epoxy compound>

CEL: Daicel Chemical Industries, Ltd,. 제 Ceroxide P-2021(제품명)(화합물명: 3,4-에폭시시클로헥세닐메틸-3',4'-에폭시시클로헥센카르복시레이트)
CEL: Daicel Chemical Industries, Ltd .. Ceroxide P-2021 (Product Name) (Compound name: 3,4-epoxycyclohexenylmethyl-3 ', 4'-epoxycyclohexenecarboxylate)

<비스말레이미드 화합물><Bismaleimide compound>

BMI1: N,N'-(3,3-디에틸-5,5-디메틸)-4,4-디페닐-메탄비스말레이미드
BMI1: N, N '-(3,3-diethyl-5,5-dimethyl) -4,4-diphenyl-methanebismaleimide

<용제><Solvent>

PGMEA: 프로필렌글리콜모노메틸에테르아세테이트PGMEA: propylene glycol monomethyl ether acetate

PGME: 프로필렌글리콜모노메틸에테르PGME: Propylene Glycol Monomethyl Ether

DMAc: N,N-디메틸아세트아미드DMAc: N, N-dimethylacetamide

NMP: N-메틸-2-피롤리돈
NMP: N-methyl-2-pyrrolidone

이하의 합성예를 따라 얻어지는 폴리에스테르 중합체, 폴리이미드 전구체 및 아크릴 공중합체의 수평균분자량 및 중량평균분자량은, JASCO Corporation 제GPC장치(Shodex(등록상표) 컬럼 KF803L 및 KF804L)를 이용해, 용출 용매 테트라하이드로퓨란을 유량 1ml/분으로 컬럼 중에 (컬럼 온도 40℃) 흘려 용리시키는 조건으로 측정하였다. 한편, 하기의 수평균분자량(이하, Mn이라고 함) 및 중량평균분자량(이하, Mw라고 함)은, 폴리스티렌 환산값으로 나타내었다.
The number average molecular weight and the weight average molecular weight of the polyester polymer, the polyimide precursor, and the acrylic copolymer obtained according to the following synthesis examples were obtained by using the GPC apparatus (Shodex® column KF803L and KF804L) manufactured by JASCO Corporation. Hydrofuran was measured under conditions such that the flow rate was eluted by flowing the column (column temperature 40 ° C.) at a flow rate of 1 ml / min. In addition, the following number average molecular weight (henceforth Mn) and weight average molecular weight (henceforth Mw) were shown by polystyrene conversion value.

<합성예 1>Synthesis Example 1

HBPDA 12.0g, HBPA 10.2g, THPA 0.95g, BTEAC 0.22g을 PGMEA 54.48g 중에서 120℃로 19시간 반응시킴으로써, 폴리에스테르 중합체 용액(고형분 농도: 30.0질량%)을 얻었다(P1). 얻어진 폴리에스테르 중합체의 Mn은 2,280, Mw는 4,200이었다.The polyester polymer solution (solid content concentration: 30.0 mass%) was obtained by making HBPDA 12.0g, HBPA 10.2g, THPA 0.95g, and BTEAC0.22g react at 120 degreeC in 54.48g of PGMEA for 19 hours (P1). Mn of the obtained polyester polymer was 2,280 and Mw was 4,200.

<합성예 2>&Lt; Synthesis Example 2 &

DA-4P 14.6g을 DMAc 40.68g에 용해시킨 후에 수냉하고 23℃로 유지하였다. 이 용액에 CBDA 4.90g, THPA 7.60g을 23℃에서 24시간 반응시킴으로써 아미노기 함유 카르본산 화합물 용액(고형분 농도40.0질량%)을 얻었다. (A1)14.6 g of DA-4P was dissolved in 40.68 g of DMAc, followed by water cooling and holding at 23 ° C. The amino group containing carboxylic acid compound solution (solid content concentration 40.0 mass%) was obtained by making CBDA 4.90g and THPA7.60g react with this solution for 24 hours at 23 degreeC. (A1)

<합성예 3>&Lt; Synthesis Example 3 &

DDS 4.97g을 DMAc 14.95g에 용해시킨 후에 수냉하고 23℃로 유지하였다. 이 용액에 CBDA 1.96g, THPA 3.04g을 23℃에서 24시간 반응시킴으로써 아미노기 함유 카르본산 화합물 용액(고형분 농도40.0질량%)을 얻었다. (A2)4.97 g of DDS was dissolved in 14.95 g of DMAc, followed by water cooling and kept at 23 ° C. The amino group containing carboxylic acid compound solution (solid content concentration 40.0 mass%) was obtained by making CBDA 1.96g and THPA3.04g react at this solution for 24 hours at 23 degreeC. (A2)

<합성예 4>&Lt; Synthesis Example 4 &

DA-4P 14.61g을 DMAc 41.82g에 용해시킨 후에 수냉하고 23℃로 유지하였다. 이 용액에 HBPDA 7.66g, THPA 7.60g을 23℃에서 24시간 반응시킴으로써 아미노기 함유 카르본산 화합물 용액(고형분 농도40.0질량%)을 얻었다. (A3)14.61 g of DA-4P was dissolved in 41.82 g of DMAc, followed by water cooling and holding at 23 ° C. 7.66 g of HBPDA and 7.60 g of THPA were reacted with the solution at 23 ° C. for 24 hours to obtain an amino group-containing carboxylic acid compound solution (solid content concentration of 40.0% by mass). (A3)

<합성예 5>&Lt; Synthesis Example 5 &

BPDA 40.0g, HBPA 35.3g, THPA 3.31g, BTEAC 0.77g을 PGMEA 175.7g 중에서 120℃로 19시간 반응시킴으로써, 폴리에스테르 중합체 용액(고형분 농도: 30.0질량%)을 얻었다(P2). 얻어진 폴리에스테르 중합체의 Mn은 1,100, Mw는 2,580이었다.The polyester polymer solution (solid content concentration: 30.0 mass%) was obtained by making BPDA40.0g, HBPA 35.3g, THPA3.31g, and BTEAC0.77g react at 120 degreeC in 175.7g of PGMEA for 19 hours (P2). Mn of the obtained polyester polymer was 1,100 and Mw was 2,580.

<합성예 6>&Lt; Synthesis Example 6 &

CBDA 17.7g, pDA 10.2g을 NMP 66.4g 중에서 23℃에서 24시간 반응시킴으로써, 폴리이미드 전구체 용액(고형분 농도: 30.0질량%)을 얻었다(P3). 얻어진 폴리이미드 전구체의 Mn은 5,800, Mw는 12,500이었다.Polyimide precursor solution (solid content concentration: 30.0 mass%) was obtained by making CBDA17.7g and pDA10.2g react in NMP66.4g for 24 hours at 23 degreeC (P3). Mn of the obtained polyimide precursor was 5,800 and Mw was 12,500.

<합성예 7>&Lt; Synthesis Example 7 &

모노머 성분으로서, MAA 10.9g, CHMI 35.3g, HEMA 25.5g, MMA 28.3g을 사용하고, 라디칼 중합개시제로서 AIBN 5g을 사용하고, 이것들을 용제 PGMEA 150g 중에서 온도 60℃ 내지 100℃로 중합 반응시킴으로써, 아크릴 공중합체 용액(고형분 농도: 40.0질량%)을 얻었다(P4). 얻어진 아크릴 공중합체 용액의 Mn은 3,800, Mw는 6,700이었다.As the monomer component, 10.9 g of MAA, 35.3 g of CHMI, 25.5 g of HEMA, and 28.3 g of MMA were used, and 5 g of AIBN was used as a radical polymerization initiator, and these were polymerized at 150 ° C. solvent PGMEA at a temperature of 60 ° C. to 100 ° C., An acrylic copolymer solution (solid content concentration: 40.0 mass%) was obtained (P4). Mn of the obtained acrylic copolymer solution was 3,800 and Mw was 6,700.

<실시예 1 내지 실시예 6 및 비교예 1 내지 비교예 4><Examples 1 to 6 and Comparative Examples 1 to 4>

표 1에 나타내는 조성으로 실시예 1 내지 실시예 6 및 비교예 1 내지 비교예 4의 각 조성물을 조제하고, 각각에 대하여 평탄화성, 용제내성, 투과율 그리고 배향성을 평가하였다.Each composition of Examples 1-6 and Comparative Examples 1-4 was prepared with the composition shown in Table 1, and planarization, solvent tolerance, transmittance | permeability, and orientation property were evaluated about each.

Figure pct00019
Figure pct00019

※ P1~P2: 폴리에스테르 중합체 용액※ P1-P2: Polyester polymer solution

P3: 폴리이미드 전구체 용액P3: polyimide precursor solution

P4: 아크릴 공중합체 용액
P4: acrylic copolymer solution

[평탄화성의 평가][Evaluation of Flatness]

실시예 1 내지 실시예 6, 그리고 비교예 1 내지 비교예 4의 각 조성물을 높이 0.5㎛, 라인폭 10㎛, 라인간 스페이스 50㎛의 단차 기판(유리제) 위에 스핀코터를 이용하여 도포한 후, 온도 100℃에서 120초간 핫플레이트 상에서 프리베이크하여, 막두께 2.8㎛의 도막을 형성하였다. 막두께는 FILMETRICS사 제의 F20를 이용하여 측정하였다. 이 도막을 온도 230℃에서 30분간 가열함으로써 포스트베이크를 행해 막두께 2.5㎛의 경화막을 형성하였다.Each composition of Examples 1 to 6 and Comparative Examples 1 to 4 was applied on a stepped substrate (made of glass) with a height of 0.5 μm, a line width of 10 μm, and an interline space of 50 μm using a spin coater. It prebaked on the hotplate for 120 second at the temperature of 100 degreeC, and formed the coating film of 2.8 micrometers in film thickness. The film thickness was measured using F20 by FILMETRICS. This coating film was heated at the temperature of 230 degreeC for 30 minutes, post-baking was carried out, and the cured film with a film thickness of 2.5 micrometers was formed.

단차 기판 라인 상의 도막과 스페이스 상의 도막의 막두께 차를 측정하고(도 1 참고), 평탄화율(DOP)=100×〔1-{도막의 막두께 차(㎛)/단차 기판의 높이(0.5㎛)}〕의 식을 이용하여 평탄화율을 구하였다.The film thickness difference between the coating film on the stepped substrate line and the coating film on the space is measured (see Fig. 1). )}] Was used to determine the planarization rate.

[용제내성의 평가][Evaluation of Solvent Tolerance]

실시예 1 내지 실시예 6, 그리고 비교예 1 내지 비교예 4의 각 조성물을 실리콘 웨이퍼에 스핀코터를 이용하여 도포한 후, 온도 100℃에서 120초간 핫플레이트 상에서 프리베이크하여, 막두께 2.8㎛의 도막을 형성하였다. 막두께는 FILMETRICS사 제의 F20를 이용하여 측정하였다. 이 도막을 온도 230℃에서 30분간 핫플레이트 상에서 포스트베이크를 행해, 막두께 2.5㎛의 경화막을 형성하였다.Each composition of Examples 1 to 6 and Comparative Examples 1 to 4 was applied to a silicon wafer using a spin coater, and then prebaked on a hot plate at a temperature of 100 ° C. for 120 seconds to obtain a film thickness of 2.8 μm. A coating film was formed. The film thickness was measured using F20 by FILMETRICS. This coating film was post-baked on the hotplate for 30 minutes at the temperature of 230 degreeC, and the cured film with a film thickness of 2.5 micrometers was formed.

이 경화막을 PGMEA 또는 NMP 중에 60초간 침지시킨 후, 각각 온도 100℃로 60초간 건조하여, 막두께를 측정하였다. PGMEA 또는 NMP 침지 후 막두께 변화가 없는 것을 ○, 침지 후에 막두께의 감소가 보여진 것을 ×로 하였다.After immersing this cured film in PGMEA or NMP for 60 second, it dried at the temperature of 100 degreeC for 60 second, respectively, and measured the film thickness. (Circle) and thing which showed the decrease of the film thickness after dipping were made into (circle) that there was no change in film thickness after PGMEA or NMP immersion.

[광투과율(투명성)의 평가][Evaluation of Light Transmittance (Transparency)]

실시예 1 내지 실시예 6, 그리고 비교예 1 내지 비교예 4의 각 조성물을 석영 기판 상에 스핀코터를 이용하여 도포한 후, 온도 100℃에서 120초간 핫플레이트 상에서 프리베이크를 행해 막두께 2.8㎛의 도막을 형성하였다. 막두께는 FILMETRICS사 제의 F20를 이용하여 측정하였다. 이 도막을 온도 230℃에서 30분간 핫플레이트 상에서 포스트베이크를 행해 경화막을 형성하였다.Each of the compositions of Examples 1 to 6 and Comparative Examples 1 to 4 was applied onto a quartz substrate using a spin coater, and then prebaked on a hot plate at a temperature of 100 ° C. for 120 seconds to obtain a film thickness of 2.8 μm. The coating film of was formed. The film thickness was measured using F20 by FILMETRICS. This coating film was post-baked on the hotplate for 30 minutes at the temperature of 230 degreeC, and the cured film was formed.

이 경화막을 자외선 가시 분광 광도계(Shimadzu Corporation 제, SHIMADSU UV-2550 모델번호)를 이용하여 파장 400nm 시의 투과율을 측정하였다.The transmittance | permeability at the wavelength of 400 nm was measured for this cured film using the ultraviolet-visible spectrophotometer (The SHIMADSU UV-2550 model number by Shimadzu Corporation).

[배향성의 평가][Evaluation of Orientation]

실시예 1 내지 실시예 6, 그리고 비교예 1 내지 비교예 4의 각 조성물을 ITO 기판 상에 스핀코터를 이용하여 도포한 후, 온도 100℃에서 120초간 핫플레이트 상에서 프리베이크를 행해 막두께 2.8㎛의 도막을 형성하였다. 막두께는 FILMETRICS사 제의 F20를 이용하여 측정하였다. 이 막을 온도 230℃에서 30분간 핫플레이트 상에서 포스트베이크를 행해 경화막을 형성하였다.Each of the compositions of Examples 1 to 6 and Comparative Examples 1 to 4 was applied onto an ITO substrate using a spin coater, and then prebaked on a hot plate at a temperature of 100 ° C. for 120 seconds for a film thickness of 2.8 μm. The coating film of was formed. The film thickness was measured using F20 by FILMETRICS. This film was post-baked on the hotplate for 30 minutes at the temperature of 230 degreeC, and the cured film was formed.

이 경화막을 회전 속도 300rpm, 이송 속도 10mm/초, 압입량 0.45mm로 러빙 처리하였다. 러빙 처리한 기판을 순수로 5분간 초음파 세정하였다. 이 기판 상에 액정 모노머로 이루어진 위상차 재료를 스핀코터를 이용하여 도포한 후, 100℃에서 40초간, 55℃에서 30초간 핫플레이트 상에서 프리베이크를 행해 막두께 1.1㎛의 도막을 형성하였다. 이 기판을 질소 분위기하 2,000mJ로 노광하였다. 제작된 기판을 편향판에 끼워, 배향성을 육안으로 확인하였다. 기판을 45도로 기울였을 때와 기울이지 않았을 때 빛의 투과성이 현저하게 변하는 것을 ○, 변하지 않은 것을 ×로 하였다.The cured film was subjected to a rubbing treatment at a rotational speed of 300 rpm, a feed rate of 10 mm / sec, and an indentation amount of 0.45 mm. The rubbed substrate was ultrasonically cleaned for 5 minutes with pure water. After apply | coating the phase difference material which consists of liquid crystal monomers on this board | substrate using a spin coater, it prebaked on the hotplate for 40 second at 100 degreeC, and 30 second at 55 degreeC, and formed the coating film of 1.1 micrometers in thickness. This substrate was exposed to 2,000 mJ in a nitrogen atmosphere. The produced board | substrate was inserted into the deflection plate, and the orientation was visually confirmed. When the board | substrate was inclined at 45 degree | times, and when it did not incline, the thing which remarkably changed the light was made (circle) and the thing which did not change was made into x.

[내열성의 평가][Evaluation of Heat Resistance]

실시예 1 내지 실시예 6, 그리고 비교예 1 내지 비교예 4의 각 조성물을 석영 기판 상에 스핀코터를 이용하여 도포한 후, 온도 100℃에서 120초간 핫플레이트 상에서 프리베이크 한 후, 온도 230℃에서 30분간 핫플레이트 상에서 포스트베이크를 행해 경화막을 형성하고, 막두께를 FILMETRICS사 제의 F20를 이용하여 측정하였다. 그 후에 추가로 경화막을 온도 230℃로 60분간 핫플레이트 상에서 소성하여 재차 막두께를 측정하고, 포스트베이크 후로부터의 막두께의 변화량을 산출하였다.Each composition of Examples 1 to 6 and Comparative Examples 1 to 4 was applied onto a quartz substrate using a spin coater, and then prebaked on a hot plate at a temperature of 100 ° C. for 120 seconds, followed by a temperature of 230 ° C. Post-baking was performed on the hotplate for 30 minutes at and the cured film was formed, and the film thickness was measured using F20 by FILMETRICS. Thereafter, the cured film was further baked at a temperature of 230 ° C. for 60 minutes on a hot plate to measure the film thickness again, and the amount of change in the film thickness after postbaking was calculated.

[평가의 결과][Evaluation result]

이상의 평가를 행한 결과를, 다음의 표 2에 나타낸다.The results of the above evaluation are shown in Table 2 below.

Figure pct00020
Figure pct00020

실시예 1 내지 실시예 6은, 평탄화율, 내열성이 높고, PGMEA, NMP 중 어느 것에 대해서도 내성이 보여졌다. 또, 어느 것이나 양호한 배향성을 나타내고, 고온 소성 후에도 높은 투과율(투명성)을 달성하였다. Examples 1 to 6 had high planarization rate and high heat resistance, and showed resistance to any of PGMEA and NMP. Moreover, all showed the favorable orientation and achieved high transmittance | permeability (transparency) even after high temperature baking.

한편, 비교예 1은 용제내성, 배향성, 평탄화율은 양호했지만, 내열성이 매우 낮은 결과를 나타내었다.On the other hand, Comparative Example 1 showed good solvent resistance, orientation, and planarization rate, but very low heat resistance.

또한, 비교예 2는 경화막이 형성되지 않았다.In addition, in the comparative example 2, the cured film was not formed.

또한, 비교예 3은, 용제내성, 내열성 및 배향성은 양호했지만, 평탄화율이 매우 낮은 결과를 나타내었다.In addition, Comparative Example 3 showed good solvent resistance, heat resistance, and orientation, but had a very low planarization rate.

그리고 비교예 4는, 평탄화율, 내열성, 용제내성 및 투과율은 양호한 결과가 얻어졌지만, 배향성이 악화되는 결과를 보였다.In Comparative Example 4, although the results of good flatness, heat resistance, solvent resistance, and transmittance were obtained, the orientation was deteriorated.

이상과 같이, 본 발명의 열경화막 형성용 폴리에스테르수지 조성물은, 경화막 형성시에 프로필렌글리콜모노메틸에테르아세테이트 등의 글리콜계 용제의 사용이 가능했으며, 그뿐 아니라, 얻어진 경화막은, 우수한 광투과성, 용제내성, 평탄화성 및 배향성의 어떠한 성능도 양호한 결과가 얻어졌다.As mentioned above, the polyester resin composition for thermosetting film formation of this invention was able to use glycol-type solvents, such as propylene glycol monomethyl ether acetate at the time of cured film formation, Furthermore, the obtained cured film was excellent in light transmittance. Good results were obtained with any performance of solvent resistance, planarization and orientation.

Claims (12)

(A)성분, (B)성분 및 (C)성분을 함유하는 열경화막 형성용 폴리에스테르 조성물.
(A)성분: 테트라카르본산 이무수물과 디올 화합물을 반응시켜 얻어지는 폴리에스테르,
(B)성분: 에폭시기를 2개 이상 갖는 에폭시 화합물,
(C)성분: 디아민 화합물, 디카르본산 무수물 및 테트라카르본산 이무수물을 반응시켜 얻어지는 아미노기 함유 카르본산 화합물.
The polyester composition for thermosetting film formation containing (A) component, (B) component, and (C) component.
(A) component: Polyester obtained by making tetracarboxylic dianhydride and a diol compound react,
(B) component: The epoxy compound which has 2 or more of epoxy groups,
(C) component: The amino group containing carboxylic acid compound obtained by making a diamine compound, dicarboxylic anhydride, and tetracarboxylic dianhydride react.
제1항에 있어서,
상기 (A)성분이 하기 식(1)로 표시되는 구조 단위를 포함하는 폴리에스테르인 열경화막 형성용 폴리에스테르 조성물.
[화학식 1]

(식 중, A는 지환식기 또는 지방족기에 4개의 결합수가 결합된 4가의 유기기를 나타내고, B는 지환식기 또는 지방족기에 2개의 결합수가 결합된 2가의 유기기를 나타낸다.)
The method of claim 1,
The polyester composition for thermosetting film formation whose said (A) component is polyester containing the structural unit represented by following formula (1).
[Formula 1]

(Wherein A represents a tetravalent organic group having four bonds bonded to an alicyclic group or an aliphatic group, and B represents a divalent organic group having two bonds bonded to an alicyclic or aliphatic group.)
제1항 또는 제2항에 있어서,
상기 (A)성분이 하기 식(i)로 표시되는 테트라카르본산 이무수물과 식(ii)로 표시되는 디올 화합물을 반응시켜 얻어지는 폴리에스테르인 열경화막 형성용 폴리에스테르 조성물.
[화학식 2]
Figure pct00022

(식 중, A는 지환식기 또는 지방족기에 4개의 결합수가 결합된 4가의 유기기를 나타내고, B는 지환식기 또는 지방족기에 2개의 결합수가 결합된 2가의 유기기를 나타낸다.)
The method according to claim 1 or 2,
The polyester composition for thermosetting film formation whose said (A) component is polyester obtained by making tetracarboxylic dianhydride represented by following formula (i) react with the diol compound represented by Formula (ii).
(2)
Figure pct00022

(Wherein A represents a tetravalent organic group having four bonds bonded to an alicyclic group or an aliphatic group, and B represents a divalent organic group having two bonds bonded to an alicyclic or aliphatic group.)
제2항 또는 제3항에 있어서,
상기 식(1) 중, A는 하기 식(A-1) 내지 식(A-8)로 표시되는 기로부터 선택되는 적어도 1종의 기를 나타내고, B가 하기 식(B-1) 내지 식(B-5)로 표시되는 기로부터 선택되는 적어도 1종의 기를 나타내는 열경화막 형성용 폴리에스테르 조성물.
[화학식 3]
Figure pct00023

[화학식 4]
Figure pct00024
The method according to claim 2 or 3,
In said formula (1), A represents at least 1 sort (s) of group chosen from group represented by following formula (A-1)-formula (A-8), B is following formula (B-1)-formula (B The polyester composition for thermosetting film formation which shows at least 1 sort (s) of group chosen from group represented by -5).
(3)
Figure pct00023

[Chemical Formula 4]
Figure pct00024
제1항 내지 제4항 중 어느 한 항에 있어서,
(A)성분인 폴리에스테르의 중량평균분자량이 폴리스티렌 환산으로 1,000 내지 30,000인 열경화막 형성용 폴리에스테르 조성물.
5. The method according to any one of claims 1 to 4,
The polyester composition for thermosetting film formation whose weight average molecular weight of polyester which is (A) component is 1,000-30,000 in conversion of polystyrene.
제1항 내지 제5항 중 어느 한 항에 있어서,
(C)성분이, 테트라카르본산 이무수물 1몰에 대해, 디아민 화합물 2몰과, 디카르본산 무수물 2몰을 반응시켜 얻어지는 아미노기 함유 카르본산 화합물인 열경화막 형성용 폴리에스테르 조성물.
The method according to any one of claims 1 to 5,
The polyester composition for thermosetting film formation whose (C) component is an amino-group containing carboxylic acid compound obtained by making 2 mol of diamine compounds and 2 mol of dicarboxylic anhydrides react with 1 mol of tetracarboxylic dianhydrides.
제1항 내지 제5항 중 어느 한 항에 있어서,
(C)성분이, 하기 식(iii), (iv) 및 (v)로 표시되는 화합물을 반응시켜 얻어지는 아미노기 함유 카르본산 화합물인 열경화막 형성용 폴리에스테르 조성물.
[화학식 5]
Figure pct00025

(상기 식(iii) 및 (iv) 중, P 및 Q는 각각 독립적으로 2가의 유기기를 나타내고, 식(v) 중, Z는 4가의 유기기를 나타낸다.)
The method according to any one of claims 1 to 5,
The polyester composition for thermosetting film formation whose (C) component is an amino-group containing carboxylic acid compound obtained by making the compound represented by following formula (iii), (iv), and (v) react.
[Chemical Formula 5]
Figure pct00025

(In said Formula (iii) and (iv), P and Q respectively independently represent a divalent organic group, and in Formula (v), Z represents a tetravalent organic group.)
제1항 내지 제7항 중 어느 한 항에 있어서,
(A)성분의 100질량부에 기초하여, 3 내지 50질량부의 (B)성분, 5 내지 80질량부의 (C)성분을 함유하는 열경화막 형성용 폴리에스테르 조성물.
The method according to any one of claims 1 to 7,
The polyester composition for thermosetting film formation containing 3-50 mass parts (B) component and 5-80 mass parts (C) component based on 100 mass parts of (A) component.
제1항 내지 제8항 중 어느 한 항에 있어서,
추가로, (D)성분으로서 비스말레이미드 화합물을 함유하는 열경화막 형성용 폴리에스테르 조성물.
The method according to any one of claims 1 to 8,
Furthermore, the polyester composition for thermosetting film formation containing a bismaleimide compound as (D) component.
제9항에 있어서,
(A)성분의 100질량부에 기초하여, 0.5 내지 50질량부의 (D)성분을 함유하는 열경화막 형성용 폴리에스테르 조성물.
10. The method of claim 9,
The polyester composition for thermosetting film formation containing 0.5-50 mass parts (D) component based on 100 mass parts of (A) component.
제1항 내지 제10항 중 어느 한 항에 기재된 열경화막 형성용 폴리에스테르 조성물을 사용하여 얻어지는 경화막.The cured film obtained using the polyester composition for thermosetting film formation in any one of Claims 1-10. 제1항 내지 제10항 중 어느 한 항에 기재된 열경화막 형성용 폴리에스테르 조성물을 사용하여 얻어지는 액정 배향층.The liquid crystal aligning layer obtained using the polyester composition for thermosetting film formation in any one of Claims 1-10.
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