KR20110139851A - Nano template and fabrication method thereof - Google Patents

Abstract

PURPOSE: A nano template and a manufacturing method thereof are provided to produce a nano template with pores having a controlled aspect ratio by efficiently controlling the size of the pores. CONSTITUTION: A nano template comprises a substrate(30), a pattern layer(10), a deposition layer(20), and a protective layer. The pattern layer is formed on the substrate from oxide of metal selected from the group consisting of Al, Ti, Ta, Zr, Nb, and W and has pores(50) including an opening exposed on the surface of the pattern layer. The deposition layer is laminated on the surface of the pores in order to reduce the pores exposing the surface of the substrate. The protective layer includes polystyrene, paraffin wax, or nail polish and fills in the pores by covering the pattern layer on the opposite side of the substrate.

Description

Nano template and fabrication method

The present invention relates to a nano-template used as a mask in the process of forming a nanostructure on a substrate and a method for manufacturing the same, and more particularly, to a manufacturing method and a nano-template formed according to the control of the size of the pores formed in the nano-template. .

Recently, there has been increasing interest in nano-templates having nanometer-sized pores. This is because these nano templates are likely to be used in fields such as electronics, optical and micromechanical devices. In conventional lithographic processes, it is not easy to form nano templates with nanometer size and high aspect ratio pores over a wide area. However, using a method of anodizing aluminum in an acidic electrolyte, porous alumina can be obtained, which uses pores of columnar hexagonal cells with uniform diameters ranging from 14 to 200 nm. You can get an array. The pores are formed by chemical stress due to volume expansion as oxides form at the aluminum and alumina interface. The pore depth of the anodized aluminum may be determined in proportion to the anodization time, and in addition, a pore array having various areas and depths may be formed according to the temperature of the anodizing process, an applied voltage, and a solution to be used.

However, even when using the method of anodizing aluminum as described above, if the diameter of the pores is small, there is a limit to increase the aspect ratio of the pores. Thus, there is a need to provide a new method of making nano templates with pores with small diameters and high aspect ratios. In addition, there is a need to provide a method for efficiently controlling the size of the pores in combination with the method of anodizing aluminum.

The problem to be solved by the present invention is to provide a method for providing a nano-template comprising pores having a controlled aspect ratio, and the nano-template formed by controlling the size of the pores formed in the nano-template.

The scope of the present invention is not limited by the above-mentioned subject.

In order to solve the above problems, there is provided a nano-template manufacturing method according to an aspect of the present invention. The method includes forming a pattern layer comprising pores having openings and bottoms on the metal substrate, separating the pattern layer from the metal substrate, and removing the bottom of the pores so that the pores penetrate the pattern layer. And attaching the pattern layer on the substrate.

In this case, the method may further include forming a protective layer filling the inside of the pores before separating the pattern layer, and removing the protective layer after the attaching step. It may further include.

In addition, the method may further include forming a deposition layer to narrow the pores on the surface of the pores after the forming of the pattern layer described above.

In this case, the deposition layer may be formed by atomic layer deposition.

In addition, the step of forming the pattern layer, the first anodizing the surface of the metal base material, the step of removing the anodization film formed by the first anodization step and the second anodization of the surface from which the anodization film is removed It may include the step.

In this case, the above-described protective layer may be polystyrene, paraffin wax or nail polish.

In addition, the metal base material described above may be made of a metal selected from the group consisting of Al, Ti, Ta, Zr, Nb, and W, and the pattern layer and the deposition layer may be made of an oxide of the selected metal.

In addition, the method may further include widening the pores by using an acidic solution before separating the pattern layer.

According to another aspect of the invention, there is provided a nano template produced by the method of manufacturing a nano template described above.

A nano template provided according to an aspect of the present invention includes a pattern layer having pores, and a deposition layer deposited on the surface of the pores so that the pore surfaces grow.

In this case, one end of the pores may be open to the pattern layer and the other end may be closed by the pattern layer. At this time, the nano template may further include a metal base material in contact with the pattern layer at the other end side of the pores.

Alternatively, one end of the pores may be open relative to the pattern layer and the other end may be closed by the pattern layer. In this case, the nano-template may further include a protective layer filling the pores and covering the surface of the pattern layer at one end of the pores. At this time, the nano-template may further include a metal base material in contact with the pattern layer at the other end side of the pores.

The above-described nano-template may further include a protective layer filling the pores and covering the surface of the pattern layer on one end of the pores, wherein the pores penetrate the pattern layer, and one end and the other end of the pores with respect to the pattern layer. It may be open. In this case, the nano-template may further include a substrate covering the surface of the pattern layer on the other end side of the pores.

The above-described nano-template may further include a substrate covering the surface of the pattern layer toward the other end of the pores, the pores penetrate the pattern layer, and one end and the other end of the pores are open to the pattern layer ( may be open).

In the above-described nano template, the protective layer may be made of polystyrene, paraffin wax or nail polish, and the pattern layer is an oxide of a metal selected from the group consisting of Al, Ti, Ta, Zr, Nb, and W. It may be made of. In addition, the material of the deposition layer may be the same as the material of the pattern layer.

According to another aspect of the present invention, a nano-template is provided. The nano template includes a substrate, a patterned layer on the substrate and having a pore, and a deposition layer deposited on the surface of the pores to narrow the pores. At this time, the pores have openings exposed on the surface of the pattern layer opposite the substrate.

At this time, the surface of the substrate may be exposed by the pores.

In this case, the nano-template may further include a protective layer filling the pores and covering the surface of the pattern layer opposite to the substrate. In addition, the protective layer may comprise polystyrene, paraffin wax or nail polish.

At this time, the pattern layer may be made of an oxide of a metal selected from the group consisting of Al, Ti, Ta, Zr, Nb, and W. In addition, the material of the deposition layer may be the same as the material of the pattern layer.

According to another aspect of the present invention, a nano-template is provided. The nano template includes a pattern layer having pores and a deposition layer deposited on the surface of the pores to narrow the pores, the pores having openings exposed on the first side of the pattern layer.

According to the present invention, by controlling the size of the pores formed in the nano-template, it is possible to provide a method for producing a nano-template comprising pores having a controlled aspect ratio and a nano-template formed thereby.

The scope of the present invention is not limited by the above-mentioned effects.

1 is a view for explaining the structure and use of the metal oxide mask according to an embodiment of the present invention.
2 illustrates a flow of a method of manufacturing a metal oxide mask according to an embodiment of the present invention.
3 shows a flow of a method of manufacturing a metal oxide mask according to another embodiment of the present invention.
Figure 4 shows the flow of a method of manufacturing a metal oxide mask according to another embodiment of the present invention.

Hereinafter, the present invention will be described in detail by explaining preferred embodiments of the present invention. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in various forms, and only the present embodiments are intended to complete the disclosure of the present invention and to those skilled in the art to fully understand the scope of the invention. It is provided to inform you.

1 is a view for explaining the structure and use of the metal oxide mask according to an embodiment of the present invention.

According to one embodiment of the present invention, as shown in (a) of FIG. 1 (a) may be provided a nano-template (1) comprising a pattern layer 10 in which pores 50 are formed. The nano template 1 manufactured according to embodiments of the present invention may further include a deposition layer 20 and / or a substrate 30.

By using the nano-template 1 according to an embodiment of the present invention, a microstructure 110 such as a nanocapacitor may be formed on the substrate 30 by, for example, a method described below. That is, after forming the microstructure composition 100 on the substrate 30 through the pores 50 of the nano-template 1 ((ii) of FIG. 1 (a)), on the pattern layer 10 By removing the deposited microstructure composition 100 ((iii) of FIG. 1 (a)) and then removing the pattern layer 10, the substrate 30 on which the microstructure 110 is formed may be obtained ( (Iv) of Figure 1 (a). The microstructured composition 100 includes, for example, ferroelectric materials, conductive materials, insulating materials, semiconductor materials, and the like, and other materials may be used as the microstructured composition 100.

FIG. 1B shows a longitudinal cross section A-A 'of the nano-template 1 shown in FIG. 1A-i. The pores 50 formed through the pattern layer 10 may extend upward and downward, and the surface of the substrate 30 may be exposed through the pores 50. The pores 50 may have a nano size.

Nano template 1 manufactured according to an embodiment of the present invention to be described later may include a deposition layer 20 deposited on the side wall surface of the pores 50 as shown in (b) of FIG. The diameter or width of the pores 50 may be controlled by adjusting the thickness of the deposition layer 20. Accordingly, the aspect ratio of the pores 50 may be controlled.

However, in the nano-template 1 manufactured according to another embodiment of the present invention described below, the deposition layer 20 may not exist, as shown in FIG.

Hereinafter, the structure of the nano-template 1 which can be provided by the present invention and its manufacturing method will be described in detail with reference to the accompanying drawings for each embodiment. The dimensions of each component of the accompanying drawings may be exaggerated for explanation.

Example  One

Figure 2 shows the flow of the nano-template manufacturing method according to an embodiment of the present invention.

The nano template 1 may be generated from the metal base material 12 (see S201 of FIG. 2). The metal base material 12 may include any metal, but may include a metal such as Al, Ti, Ta, Zr, Nb, or W, which is particularly advantageous for anodization. Hereinafter, the method of manufacturing the nano template 1 from the Al metal base material will be described with reference to FIG. 2. Hereinafter, the nano-template 1 generated from the Al metal base material may be referred to as an AAO template. It will be appreciated that the method described below can be applied to other metals such as Ti, Ta, Zr, Nb, or W as well as Al.

Nano template manufacturing method according to an embodiment of the present invention may include (I) pre-treatment process, (II) anodization process, and (III) post-treatment process. As the metal base material 12, a 0.50 mm thick aluminum sheet having 99.999% purity can be used.

(I) pretreatment process (not shown)

The pretreatment process of the aluminum sheet may include an ultrasonication process and a cleaning process. The sonication process may be performed using acetone and ethanol, whereby organic matter attached to the aluminum surface may be removed. The washing process can be performed using deionized water (DI water).

Then, in a solution in which the perchloric acid (HClO ₄ ) and ethanol are mixed at a ratio of 1: 5, an electropolishing process may be performed for 4 minutes and 30 seconds under conditions of 18V and 10 ° C. This makes it possible to form a thin aluminum plate on a flat surface.

(II) Anodization Process (S202 ~ S204)

After the pretreatment process, the anodization process can proceed. The anodization process may further include three steps, a first anodization process (S202), an alumina film removal process (S203), and a second anodization process (S204).

First, the first anodization process (S202) may be performed at a voltage of 40V for 24 hours in a 0.3M electrolyte solution at a temperature of 7 ° C. The time required for the first anodization process S202 may affect the arrangement of the pores 50. Anodization may be performed for 24 hours to obtain well arranged pores 50 in a hexagonal pattern. An oxalic acid (C ₂ H ₂ O ₄ : oxalic acid) solution may be used as the electrolyte solution. Alternatively, sulfuric acid, phosphoric acid, chromic acid, or hydrofluoric acid may be used as the electrolyte solution to variously control the density or size of the pores.

Formation of the pores 50 is formed due to chemical stress due to volume expansion while oxide is formed at the interface between aluminum and alumina. If anodization is performed at low voltage or low temperature, this stress is small and it is difficult to obtain hexagonal arrays. In this case, if the anodization time is prolonged, the pores 50 may be well arranged.

Second, the alumina film (Al ₂ O ₃ layer) formed by the first anodization process, that is, the AAO layer may be removed (S203). Since the pores of the upper portion of the AAO layer generated by the first anodization process (S202) are irregularly formed, the AAO layer may be removed by chemical etching. At 60 ° C for this acid _{6wt% (H 3 PO 4:} phosphoric acid) and the chromic acid 1.8wt% (H ₂ CrO ₄ Using a mixture of: chromic acid, the alumina film (Al ₂ O ₃ ) formed by the first anodization process can be dissolved until substantially completely removed.

Third, the second anodization process may be performed after removing the AAO layer (S204). Since the pattern of the hexagonal structure left in aluminum by the step of removing the AAO layer acts as an AAO layer growth template in the second anodization step (S204), it is well suited in the second anodization step (S204). An aligned nanoporous aluminum template can be formed.

The secondary anodization step S204 may be performed at a voltage of 7 ° C. and 40 V, which is the same condition as the first anodization step S202. When the second anodization process (S204) is performed over 4 minutes, an AAO layer having a thickness of about 300 nm to 400 nm can be formed. The length of the anodized aluminum can be determined in proportion to the anodization time, and in addition, AAO templates of various sizes and lengths can be formed according to the temperature of the anodizing process, the applied voltage, and the solution used.

(III) post-processing steps (S205-S209)

After performing the above-described anodization processes (S202 to S204), post-processing processes (S205 to S209) may be performed.

AAO templates prepared from 0.3M oxalic acid (C ₂ H ₂ O ₄ : oxalic acid) solution at 7 ° C can be composed of hexagonal honeycomb dense packed pores 50 with an average diameter of about 35 nm. have.

After the second anodization process (S204) is completed, the protective layer 40 may be filled in the AAO template (S205). After filling the protective layer 40 may be subjected to a heat treatment for 2 hours at 80 ° C. The protective layer 40 serves to prevent breakage of the AAO pattern layers 10 and 11 having a thickness of 300 to 400 nm, and the size of the pores 50 is not intended when removing the bottom layer 11 under the AAO. It can be prevented from being widened, and the material can be easily handled in the subsequent process of manufacturing the nano template mask. Polystyrene (1.4 wt% PS / CHCl ₃ solution) may be used as the material of the protective layer 40. Hereinafter, the AAO layer filled with polystyrene as the protective layer 40 may be referred to as the PS / AAO layers 10, 11, and 40. However, it should be noted that various alternatives such as paraffin wax, nail polish, or the like may be used instead of polystyrene as the protective layer 40, or a spin coating type insulation may be used. have.

After the process of filling the protective layer 40 (S205), the supersaturated mercury chloride (HgCl ₂ ) may be used to separate the PS / AAO layers 10, 11, and 40 from the metal base material (aluminum) 12. (S206).

Next, the bottom layer 11 below the AAO may be removed from the PS / AAO layers 10, 11, and 40 (S207). To this end, first, deionized water may be used to wash the separated PS / AAO layers 10, 11, 40. Then, a solution of phosphoric acid (H ₃ PO ₄ ) may be added at 30 ° C. for 1 to 120 minutes to remove the bottom layer 11 under the AAO. In this case, since the thickness of the bottom layer 11 under the AAO may vary depending on the size of the pore 50 (eg, 1 nm to 95 nm), the pore 50 may be unintentionally uncontrolled if the time for adding the phosphoric acid solution is not well controlled. The problem is that it can be extended further.

After the bottom layer 11 under the AAO is removed, the PS / AAO layers 10 and 40 may be washed with deionized water and then placed on the substrate 30 in a state of deionized water (S208). In this case, the substrate 30 may be a conductive substrate (Pt / Ti / SiO ₂ / Si). Then, the heat treatment may be performed at 100 ° C. for 30 minutes to adsorb the PS / AAO layers 10 and 40 onto the substrate 30.

Finally, the PS / AAO layers 10 and 40 adsorbed on the substrate 30 may be immersed in chloroform (CHCl ₃ ) to completely remove the protective layer 40 (S209). As a result, an AAO mask can be formed on the substrate 40.

In order to explain the method of manufacturing a nano-template according to an embodiment of the present invention, a specific experimental example was described by presenting a specific numerical value, but the present invention is not limited to this specific numerical value, and it is obvious that the numerical value can be changed. Do. In addition, the present invention can be carried out completely even if some of the above-described steps are omitted. However, the step may be omitted may not achieve the intended effect.

Example  2

Figure 3 shows the flow of the nano-template manufacturing method according to another embodiment of the present invention.

Steps S301 to S304 of FIG. 3 correspond to steps S201 to S204 of FIG. 2, and steps S306 to S310 of FIG. 3 correspond to steps S205 to FIG. 2 of FIG. 2. Corresponding to step S209, in the method according to FIG. 3, step S305 is added.

The manufacturing method by FIG. 3 includes the (I) pretreatment process, (II) anodization process, and (III) post-treatment process demonstrated in FIG. In this case, in the manufacturing method of FIGS. 2 and 3, the (I) pretreatment process and (II) anodization process may be the same. However, step (S305) is added to the (III) post-treatment process of the manufacturing method of FIG. 2 in the (III) post-treatment process of the manufacturing method of FIG. Hereinafter, only steps S305 and subsequent steps will be described in order to avoid redundant description.

As described above, the AAO template prepared from 0.3 M oxalic acid (C ₂ H ₂ O ₄ : oxalic acid) solution at 7 ° C. has hexagonal honeycomb densely packed pores 50 having an average diameter of about 35 nm. It may consist of.

The size of the pores 50 can be reduced by using the AAO template prepared in this way (S305). Atomic Layer Deposition (ALD) is a deposition method using atomic deposition which can be deposited on nanoscale structures. Accordingly, the diameter of the pores 50 may be reduced to, for example, 1 nm by depositing the surface of the pores 50 inside the AAO with Al ₂ O ₃ using an atomic unit deposition method to grow the deposition layer 20. The deposition layer with Al ₂ O ₃ described above is an example of the deposition layer 20 shown in FIG. 1B.

On the other hand, after about 4 minutes of the above-described secondary anodization process, the inner surface of the AAO pores 50 may have a rough shape. At this time, if the AAO process is extended over about 30 minutes before the atomic unit deposition process is performed, and the pore size is extended to about 40 nm, the inside of the pores 50 may be made in a clean circular state. By this expansion process, the atomic deposition process can be performed efficiently.

Steps S306 to S310 after step S305 correspond to steps S205 to S209 of FIG. 2. The difference is that the deposition layer 20 is formed on the surface of the pores 50 formed in the pattern layer 10. The numerical values given in the second embodiment described above may be changed according to the target size of the pores.

Example  3

Figure 4 shows the flow of the nano-template manufacturing method according to another embodiment of the present invention.

Steps S401 through S404 of FIG. 4 correspond to steps S201 through S204 of FIG. 2, and steps S406 through S410 of FIG. 4 correspond to steps S205 and S205 of FIG. 2. Corresponding to step S209, in the method according to FIG. 4, step S405 is added.

The manufacturing method by FIG. 4 includes the (I) pretreatment process, (II) anodization process, and (III) post-treatment process demonstrated in FIG. 2 and 4, the (I) pretreatment step and the (II) anodization step are the same. However, step (S405) is added to the (III) post-treatment process of the manufacturing method according to FIG. 2 in the (III) post-treatment process of the manufacturing method according to FIG. 4. Hereinafter, only steps S405 and subsequent steps will be described to avoid redundant description.

As described above, the AAO template prepared from 0.3 M oxalic acid (C ₂ H ₂ O ₄ : oxalic acid) solution at 7 ° C. has hexagonal honeycomb densely packed pores 50 having an average diameter of about 35 nm. It may consist of.

The pore 50 of the AAO template thus made can be widened using 0.1M phosphoric acid (H ₃ PO ₄ ) solution (30 ° C) (S405). By the step S405, the diameter of the pores 50 may be increased to, for example, 95 nm. Steps S406 through S410 after step S405 correspond to steps S205 through S209 of FIG. 2. The numerical values given in the third embodiment described above may be changed according to the target size of the pores.

When the (II) anodization process is performed in Examples 1 to 3 described above, the first anodization process (S202, S302, S402) and the alumina film removing process (S203, S303, S403) may be omitted. . The primary anodization process (S202, S302, S402) and the alumina film removal process (S203, S303, S403) function to form the surface of the substrate preliminarily into a hexagonal structure. This is because the conditions of S204, S304, S404) can be adjusted at least in part.

Structures that can be provided in each step of the above-described Examples 1 to 3 are included in the protection scope of the present invention. Hereinafter, the structure that can be provided by the present invention will be described in more detail.

Example  4

According to an embodiment of the present invention, the deposition layer 20 deposited on the substrate, the pattern layer 10 on the substrate having the pores 50, and the pores 50 so that the pores 50 are narrowed Nano template structure comprising a may be provided. In this case, the pores 50 may have openings exposed on the surface of the pattern layer 10 opposite to the substrate.

At this time, the pattern layer 10 may be made of various oxides, for example, oxides of metals selected from the group consisting of Al, Ti, Ta, Zr, Nb, and W.

In addition, the material of the deposition layer 20 may be the same as the material of the pattern layer 10.

The nano-template structure described above may further include a protective layer 40 filling the pores 50 and covering the surface of the pattern layer 10 opposite to the substrate. In this case, the protective layer 40 may include polystyrene, paraffin wax, or nail polish.

The above-described substrate may be the metal base material 12 shown in FIG. 3, and the nano-template structure described above may correspond to the structure shown in step S305 of FIG. 3.

Alternatively, the above-described substrate may be the substrate 30 shown in FIG. 3, wherein the above-described nano template structure may correspond to the structure shown in step S310 of FIG. 3, in this case, the pores 50 ) May expose the surface of the substrate 30.

Example  5

According to another embodiment of the present invention, a nano-template structure comprising a pattern layer 10 having pores 50 and a deposition layer 20 deposited on the surface of the pores 50 to narrow the pores 50. Can be provided. In this case, the pattern layer 10 may have a first surface and a second surface opposite to the first surface. In this case, the pores 50 may have openings exposed on the first surface of the pattern layer 10.

At this time, the above-described pores 50 may have a bottom portion 11 on the opposite side of the opening. This bottom portion 11 is formed by the pattern layer 10. In addition, the nano-template structure described above may further include a protective layer 40 filling the pores 50 and covering the first surface. This structure may correspond to the structure provided by step S307 of FIG. 3.

Alternatively, the above-mentioned pores 50 may have another opening exposed on the second surface of the pattern layer 10 described above. Therefore, the pores 50 penetrate the pattern layer 10. In addition, the nano-template structure described above may further include a protective layer 40 filling the pores 50 and covering the first surface. This structure may correspond to the structure provided by step S308 of FIG. 3.

The above-described protective layer 40 may include polystyrene, paraffin wax, or nail polish.

Deformed Example

The above-mentioned (I) pretreatment process and (II) anodization process of Examples 1, 2 and 3 may be provided in one step. That is, steps S201 to S204 of FIG. 2 may be replaced by providing a structure shown in step S204. In other words, steps S201 to S204 of FIG. 2 may be regarded as one embodiment for providing the structure shown in step S204. The same applies to steps S301 to S304 of FIG. 3 and steps S401 to S404 of FIG. 4.

In addition, in the modification of the method of manufacturing a nano template according to FIG. 2, the step S205 of filling the protective layer 40 may be omitted. According to this, there is no need to remove the protective layer 40 after attaching the pattern layer 10 to the substrate 30.

 The foregoing description of specific embodiments of the invention has been presented for purposes of illustration and description. Therefore, the present invention is not limited to the above embodiments, and various modifications and changes are possible in the technical spirit of the present invention by combining the above embodiments by those skilled in the art. It is obvious.

The present invention is the basic research project of the Ministry of Education, Science and Technology (Task No .: 2008-0059952, 2009-0077593, 2010-0014925, 2010-0015014), Leading Research Center Development Project (Task No .: R11-2005-048-00000-0), It includes the results of research conducted in support of the Ministry of Knowledge Economy's Industrial Source Technology Development Project (Information and Communication) (Task No .: 10030559) and can be used to form nanostructures of controlled sizes in various industries.

1: Nano Template 10: Pattern Layer
11: bottom of pattern layer 12: metal base material
20: deposited layer 30: substrate
40: protective layer 50: pores
100: microstructure composition 110: nanostructure

Claims (16)

Board;
A pattern layer on the substrate and having pores; And
Deposition layer deposited on the surface of the pores to narrow the pores
Including;
The pores have openings exposed onto the surface of the pattern layer opposite the substrate,
Nano template. The nano template of claim 1, wherein the surface of the substrate is exposed by the pores. The nano template of claim 1, further comprising a protective layer filling the pores and covering a surface of the pattern layer opposite the substrate. The nano template of claim 3, wherein the protective layer comprises polystyrene, paraffin wax, or nail polish. The nano template of claim 1, wherein the pattern layer is formed of an oxide of a metal selected from the group consisting of Al, Ti, Ta, Zr, Nb, and W. 3. The nano template of claim 1, wherein the material of the deposition layer is the same as the material of the pattern layer. A pattern layer having pores; And
Deposition layer deposited on the surface of the pores to narrow the pores
Including;
The pores have an opening exposed on the first surface of the pattern layer,
Nano template. Forming a pattern layer including pores having openings and bottoms on the metal base material;
Separating the pattern layer from the metal base material;
Removing the bottom of the pore so that the pore passes through the pattern layer; And
Attaching the pattern layer on a substrate
Including,
Nano template manufacturing method. The method of claim 8,
Before the separating the pattern layer, further comprising the step of forming a protective layer filling the inside of the pores,
After the attaching step, further comprising removing the protective layer,
Nano template manufacturing method. The method of claim 8, further comprising, after forming the pattern layer, forming a deposition layer to narrow the pores on the surface of the pores. The method of claim 10, wherein the deposition layer is formed by atomic layer deposition. The method of claim 8, wherein the forming of the pattern layer comprises: a first anodizing step of anodizing the surface of the metal base material, removing an anodizing film formed by the first anodizing step, and the anodizing film And a second anodization step of anodizing this removed surface. The method of claim 9, wherein the protective layer is polystyrene, paraffin wax or nail polish. The nano template of claim 10, wherein the metal base material is made of a metal selected from the group consisting of Al, Ti, Ta, Zr, Nb, and W, and the pattern layer and the deposition layer are made of an oxide of the selected metal. Manufacturing method. The method of claim 8, further comprising widening the pores using an acidic solution before separating the pattern layer. Nano template prepared by the method of any one of claims 8 to 15.

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