KR20110091658A - 기체 액체 접촉기 및 유출물 정화 시스템 및 방법 - Google Patents

기체 액체 접촉기 및 유출물 정화 시스템 및 방법 Download PDF

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Publication number
KR20110091658A
KR20110091658A KR1020117009444A KR20117009444A KR20110091658A KR 20110091658 A KR20110091658 A KR 20110091658A KR 1020117009444 A KR1020117009444 A KR 1020117009444A KR 20117009444 A KR20117009444 A KR 20117009444A KR 20110091658 A KR20110091658 A KR 20110091658A
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KR
South Korea
Prior art keywords
gas
liquid
gas liquid
jet
nozzle
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Ceased
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KR1020117009444A
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English (en)
Korean (ko)
Inventor
데이비드 커트 노이만
니콜라스 제이. 밀러
보리스 알. 니자모브
토마스 리 헨쇼
앤드류 알. 오트리
제이슨 케이. 브라쇠르
키스 알. 홉스
제이슨 에이. 토비아스
윌리엄 이. 맥더멋
Original Assignee
노이만 시스템즈 그룹, 인크.
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Application filed by 노이만 시스템즈 그룹, 인크. filed Critical 노이만 시스템즈 그룹, 인크.
Publication of KR20110091658A publication Critical patent/KR20110091658A/ko
Ceased legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/095Processes or apparatus for excitation, e.g. pumping using chemical or thermal pumping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18Absorbing units; Liquid distributors therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/036Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2251/00Reactants
    • B01D2251/10Oxidants
    • B01D2251/106Peroxides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2251/00Reactants
    • B01D2251/20Reductants
    • B01D2251/206Ammonium compounds
    • B01D2251/2065Ammonium hydroxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2251/00Reactants
    • B01D2251/30Alkali metal compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2251/00Reactants
    • B01D2251/40Alkaline earth metal or magnesium compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2251/00Reactants
    • B01D2251/80Organic bases or salts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/30Sulfur compounds
    • B01D2257/302Sulfur oxides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/30Sulfur compounds
    • B01D2257/304Hydrogen sulfide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/40Nitrogen compounds
    • B01D2257/404Nitrogen oxides other than dinitrogen oxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/40Nitrogen compounds
    • B01D2257/406Ammonia
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/50Carbon oxides
    • B01D2257/504Carbon dioxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/60Heavy metals or heavy metal compounds
    • B01D2257/602Mercury or mercury compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2259/00Type of treatment
    • B01D2259/12Methods and means for introducing reactants
    • B01D2259/124Liquid reactants
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22Gases
    • H01S3/2215Iodine compounds or atomic iodine

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Gas Separation By Absorption (AREA)
  • Treating Waste Gases (AREA)
KR1020117009444A 2008-09-26 2009-07-06 기체 액체 접촉기 및 유출물 정화 시스템 및 방법 Ceased KR20110091658A (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US10060608P 2008-09-26 2008-09-26
US10056408P 2008-09-26 2008-09-26
US10059108P 2008-09-26 2008-09-26
US61/100,591 2008-09-26
US61/100,564 2008-09-26
US61/100,606 2008-09-26

Publications (1)

Publication Number Publication Date
KR20110091658A true KR20110091658A (ko) 2011-08-12

Family

ID=42060040

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117009444A Ceased KR20110091658A (ko) 2008-09-26 2009-07-06 기체 액체 접촉기 및 유출물 정화 시스템 및 방법

Country Status (9)

Country Link
EP (1) EP2329567A4 (enExample)
JP (1) JP5777215B2 (enExample)
KR (1) KR20110091658A (enExample)
CN (1) CN102217152B (enExample)
AU (1) AU2009297005B2 (enExample)
CA (1) CA2737637A1 (enExample)
MX (1) MX2011003098A (enExample)
NZ (1) NZ592100A (enExample)
WO (1) WO2010036436A1 (enExample)

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* Cited by examiner, † Cited by third party
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DE102012214065A1 (de) * 2012-08-08 2014-02-13 EnBW Energie Baden-Württemberg AG Verfahren zum Entfernen von Quecksilber aus Rauchgas in einem Nasswäscher
DE102014105030A1 (de) * 2014-04-09 2015-10-15 Heinz Tischmacher Vorrichtung sowie Verfahren zum Herstellen von Düngemitteln aus Abgasen einer Produktionsanlage
CN103920384B (zh) * 2014-04-25 2016-02-17 中国人民解放军63605部队 一种常压法吸收高浓度氮氧化物的设备
US9216934B1 (en) * 2014-09-29 2015-12-22 Cameron Solutions, Inc. System and method for pH control of lean MEG product from MEG regeneration and reclamation packages
CN104359723B (zh) * 2014-11-21 2018-01-23 中国环境科学研究院 用于采集大气中过氧化物的雾液吸收装置
JP6740036B2 (ja) 2016-06-30 2020-08-12 株式会社東芝 二酸化炭素回収システムおよび排ガス処理方法
CN107551763A (zh) * 2016-09-18 2018-01-09 叶涛 一种有机物废气的环保处理方法及其设备
CN106902633B (zh) * 2017-03-13 2020-06-16 华北电力大学(保定) 脱除烟气中元素汞的仿生酶吸收剂及其制备方法和应用
WO2019010344A2 (en) 2017-07-06 2019-01-10 Qatar Foundation For Education, Science And Community Development ACID GAS REMOVAL SYSTEM FOR REMOVING ACIDIC GAS FROM GASEOUS HYDROCARBONS
CN108585534B (zh) * 2018-07-25 2021-07-13 湖北鸿创科技有限公司 一种玻璃蚀刻用鼓泡装置
CN111115575A (zh) * 2020-01-17 2020-05-08 中国华能集团清洁能源技术研究院有限公司 一种基于燃烧前co2捕集系统的等温变换系统
CN112591769A (zh) * 2020-12-16 2021-04-02 湖南福千府生物科技有限公司 一种配置亚硫酸钠溶液装置
CN112933866B (zh) * 2021-03-22 2022-07-22 哈尔滨工程大学 一种可用于有害气体净化处理的气液两相引射器
CA3222376A1 (en) * 2021-04-13 2022-10-20 Enviro Ambient Corporation System and methods for carbon dioxide capture and recovery
US20250041789A1 (en) * 2021-12-03 2025-02-06 Michigan Technological University SIMULTANEOUS REMOVAL OF CARBON DIOXIDE, NOx and SOx USING SINGLE STAGE ABSORPTION COLUMN AND RELATED METHODS
CN114307693B (zh) * 2022-01-04 2022-11-11 大连理工大学 一种MOFs与聚合物双连续的混合基质膜的制备方法

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US1256808A (en) 1917-06-05 1918-02-19 Lanston Monotype Machine Co Mold for casting printers' leads and the like.
US3948608A (en) * 1972-03-24 1976-04-06 Weir Jr Alexander Apparatus for treating stack gases
US3985860A (en) * 1975-09-22 1976-10-12 Pullman Incorporated Method for oxidation of SO2 scrubber sludge
US4246245A (en) * 1979-01-02 1981-01-20 Bechtel International Corporation SO2 Removal
US4968328A (en) * 1986-05-16 1990-11-06 Duke Eddie D De-mister baffle and assembly
US4948402A (en) * 1988-12-09 1990-08-14 Davis Water & Waste Industries, Inc. Modular air scrubber system
JPH05293332A (ja) * 1992-04-21 1993-11-09 Showa Shell Sekiyu Kk 揮発性有機化合物含有ガスの除去方法
US5395482A (en) * 1992-11-13 1995-03-07 Fuji Photo Film Co., Ltd. Ultra high purity vapor phase treatment
JPH11114354A (ja) * 1997-10-14 1999-04-27 Japan Energy Corp 二酸化炭素吸収装置の防食方法
JPH11116223A (ja) * 1997-10-17 1999-04-27 Mayekawa Mfg Co Ltd 自家発電設備を備えた炭酸飲料工場におけるco2 の製造方法とその製造装置
JPH11197499A (ja) * 1998-01-17 1999-07-27 Kawasaki Heavy Ind Ltd 気液反応装置
US6875247B2 (en) * 2000-06-06 2005-04-05 Battelle Memorial Institute Conditions for fluid separations in microchannels, capillary-driven fluid separations, and laminated devices capable of separating fluids
JP2002136828A (ja) * 2000-11-07 2002-05-14 Fuji Photo Film Co Ltd 気液接触装置及び気液接触方法
US20040131531A1 (en) * 2001-04-20 2004-07-08 Geerlings Jacobus Johannes Cornelis Process for mineral carbonation with carbon dioxide
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Also Published As

Publication number Publication date
MX2011003098A (es) 2011-08-03
JP5777215B2 (ja) 2015-09-09
CN102217152B (zh) 2013-06-12
WO2010036436A1 (en) 2010-04-01
JP2012503541A (ja) 2012-02-09
CN102217152A (zh) 2011-10-12
NZ592100A (en) 2013-11-29
AU2009297005B2 (en) 2014-05-29
EP2329567A1 (en) 2011-06-08
AU2009297005A1 (en) 2010-04-01
CA2737637A1 (en) 2010-04-01
EP2329567A4 (en) 2012-03-14

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