KR20110079830A - 반도체 웨이퍼 공정을 위한 음향 보조 단일 웨이퍼 습식 세정 - Google Patents

반도체 웨이퍼 공정을 위한 음향 보조 단일 웨이퍼 습식 세정 Download PDF

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Publication number
KR20110079830A
KR20110079830A KR1020117010010A KR20117010010A KR20110079830A KR 20110079830 A KR20110079830 A KR 20110079830A KR 1020117010010 A KR1020117010010 A KR 1020117010010A KR 20117010010 A KR20117010010 A KR 20117010010A KR 20110079830 A KR20110079830 A KR 20110079830A
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KR
South Korea
Prior art keywords
substrate
liquid medium
acoustic energy
rinse
transducer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020117010010A
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English (en)
Korean (ko)
Inventor
그랜트 펑
데이비드 무이
시-충 콘
Original Assignee
램 리써치 코포레이션
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Publication date
Application filed by 램 리써치 코포레이션 filed Critical 램 리써치 코포레이션
Publication of KR20110079830A publication Critical patent/KR20110079830A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

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  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
KR1020117010010A 2008-10-30 2009-10-14 반도체 웨이퍼 공정을 위한 음향 보조 단일 웨이퍼 습식 세정 Ceased KR20110079830A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/262,094 2008-10-30
US12/262,094 US8585825B2 (en) 2008-10-30 2008-10-30 Acoustic assisted single wafer wet clean for semiconductor wafer process

Publications (1)

Publication Number Publication Date
KR20110079830A true KR20110079830A (ko) 2011-07-08

Family

ID=42129948

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117010010A Ceased KR20110079830A (ko) 2008-10-30 2009-10-14 반도체 웨이퍼 공정을 위한 음향 보조 단일 웨이퍼 습식 세정

Country Status (6)

Country Link
US (2) US8585825B2 (https=)
JP (1) JP2012507858A (https=)
KR (1) KR20110079830A (https=)
CN (1) CN102197462B (https=)
TW (1) TW201029060A (https=)
WO (1) WO2010096041A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8926762B2 (en) 2011-09-06 2015-01-06 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and methods for movable megasonic wafer probe
KR20220014585A (ko) * 2020-07-29 2022-02-07 가천대학교 산학협력단 초고주파 진동을 이용한 고종횡비 나노채널의 세정 또는 에칭방법

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US8171877B2 (en) * 2007-03-14 2012-05-08 Lam Research Corporation Backside mounted electrode carriers and assemblies incorporating the same
US8075701B2 (en) * 2008-06-30 2011-12-13 Lam Research Corporation Processes for reconditioning multi-component electrodes
US8276604B2 (en) * 2008-06-30 2012-10-02 Lam Research Corporation Peripherally engaging electrode carriers and assemblies incorporating the same
US8957564B1 (en) * 2010-06-29 2015-02-17 Silicon Light Machines Corporation Microelectromechanical system megasonic transducer
US9117760B2 (en) * 2013-01-30 2015-08-25 Taiwan Semiconductor Manufacturing Co., Ltd. Method and system for energized and pressurized liquids for cleaning/etching applications in semiconductor manufacturing
US10079164B2 (en) 2013-09-18 2018-09-18 Naura Akrion Inc. System, apparatus, and method for processing substrates using acoustic energy
US10688536B2 (en) * 2014-02-24 2020-06-23 The Boeing Company System and method for surface cleaning
US10343193B2 (en) * 2014-02-24 2019-07-09 The Boeing Company System and method for surface cleaning
US11141762B2 (en) 2015-05-15 2021-10-12 Acm Research (Shanghai), Inc. System for cleaning semiconductor wafers
US10507498B2 (en) * 2016-06-15 2019-12-17 Taiwan Semiconductor Manufacturing Company Ltd. Apparatus for particle cleaning
WO2019095126A1 (en) * 2017-11-15 2019-05-23 Acm Research (Shanghai) Inc. Method for cleaning semiconductor wafers
US20210035821A1 (en) * 2018-01-23 2021-02-04 Acm Research (Shanghai) Inc. Methods and apparatus for cleaning substrates
JP6709010B2 (ja) * 2019-04-16 2020-06-10 株式会社ホロン 被洗浄体の異物除去装置およびその異物除去方法
CN118649930A (zh) * 2024-05-29 2024-09-17 苏州元脑智能科技有限公司 芯片处理方法、系统、装置、设备及存储介质

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US550785A (en) * 1895-12-03 J e friend
US4715392A (en) * 1983-11-10 1987-12-29 Nippon Kogaku K. K. Automatic photomask or reticle washing and cleaning system
US5505785A (en) 1994-07-18 1996-04-09 Ferrell; Gary W. Method and apparatus for cleaning integrated circuit wafers
JPH1133506A (ja) * 1997-07-24 1999-02-09 Tadahiro Omi 流体処理装置及び洗浄処理システム
US7520284B2 (en) * 2000-06-30 2009-04-21 Lam Research Corporation Apparatus for developing photoresist and method for operating the same
TW594444B (en) * 2000-09-01 2004-06-21 Tokuyama Corp Residue cleaning solution
JP2002093765A (ja) * 2000-09-20 2002-03-29 Kaijo Corp 基板洗浄方法および基板洗浄装置
US7810513B1 (en) * 2002-09-30 2010-10-12 Lam Research Corporation Substrate preparation using megasonic coupling fluid meniscus and methods, apparatus, and systems for implementing the same
US7198055B2 (en) * 2002-09-30 2007-04-03 Lam Research Corporation Meniscus, vacuum, IPA vapor, drying manifold
US7696141B2 (en) * 2003-06-27 2010-04-13 Lam Research Corporation Cleaning compound and method and system for using the cleaning compound
US7111632B2 (en) * 2003-09-22 2006-09-26 Seagate Technology Llc Ultrasonic cleaning device for removing undesirable particles from an object
JP2006005246A (ja) * 2004-06-18 2006-01-05 Fujimi Inc リンス用組成物及びそれを用いたリンス方法
EP1696011B1 (en) * 2005-02-23 2009-01-07 JSR Corporation Chemical mechanical polishing method
US7784478B2 (en) * 2006-01-20 2010-08-31 Akrion Systems Llc Acoustic energy system, method and apparatus for processing flat articles

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8926762B2 (en) 2011-09-06 2015-01-06 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and methods for movable megasonic wafer probe
US9764364B2 (en) 2011-09-06 2017-09-19 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and methods for movable megasonic wafer probe
KR20220014585A (ko) * 2020-07-29 2022-02-07 가천대학교 산학협력단 초고주파 진동을 이용한 고종횡비 나노채널의 세정 또는 에칭방법

Also Published As

Publication number Publication date
JP2012507858A (ja) 2012-03-29
WO2010096041A1 (en) 2010-08-26
US20140034096A1 (en) 2014-02-06
CN102197462B (zh) 2013-12-18
US8585825B2 (en) 2013-11-19
CN102197462A (zh) 2011-09-21
US20100108093A1 (en) 2010-05-06
TW201029060A (en) 2010-08-01

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