KR20100072184A - 지지체에 나노입자를 퇴적시키는 방법 - Google Patents

지지체에 나노입자를 퇴적시키는 방법 Download PDF

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Publication number
KR20100072184A
KR20100072184A KR1020107005411A KR20107005411A KR20100072184A KR 20100072184 A KR20100072184 A KR 20100072184A KR 1020107005411 A KR1020107005411 A KR 1020107005411A KR 20107005411 A KR20107005411 A KR 20107005411A KR 20100072184 A KR20100072184 A KR 20100072184A
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South Korea
Prior art keywords
nanoparticles
support
plasma
colloidal solution
gold
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Withdrawn
Application number
KR1020107005411A
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English (en)
Korean (ko)
Inventor
프랑수아 르니에
프레데릭 데무아종
쟝-쟈끄 피로
Original Assignee
유니베르시테 리브레 드 브룩크젤즈
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Priority claimed from EP08151463A external-priority patent/EP2093305A1/fr
Application filed by 유니베르시테 리브레 드 브룩크젤즈 filed Critical 유니베르시테 리브레 드 브룩크젤즈
Publication of KR20100072184A publication Critical patent/KR20100072184A/ko
Withdrawn legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00Coating starting from inorganic powder
    • C23C24/02Coating starting from inorganic powder by application of pressure only
    • C23C24/04Impact or kinetic deposition of particles
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06Metallic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06Metallic material
    • C23C4/08Metallic material containing only metal elements
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134Plasma spraying
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/14Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying for coating elongate material
    • C23C4/16Wires; Tubes

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Powder Metallurgy (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Carbon And Carbon Compounds (AREA)
KR1020107005411A 2007-08-14 2008-08-14 지지체에 나노입자를 퇴적시키는 방법 Withdrawn KR20100072184A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP07114344.0 2007-08-14
EP07114344 2007-08-14
EP08151463.0 2008-02-14
EP08151463A EP2093305A1 (fr) 2008-02-14 2008-02-14 Procédé de dépôt de nanoparticules sur un support

Publications (1)

Publication Number Publication Date
KR20100072184A true KR20100072184A (ko) 2010-06-30

Family

ID=39800555

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107005411A Withdrawn KR20100072184A (ko) 2007-08-14 2008-08-14 지지체에 나노입자를 퇴적시키는 방법

Country Status (7)

Country Link
US (1) US20120003397A1 (enExample)
EP (1) EP2179071B1 (enExample)
JP (1) JP2010535624A (enExample)
KR (1) KR20100072184A (enExample)
CN (1) CN101821421A (enExample)
CA (1) CA2696081A1 (enExample)
WO (1) WO2009021988A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100983224B1 (ko) * 2008-04-10 2010-09-20 김선휘 흑연의 미세입자 및 흑연 콜로이드 제조방법
KR20180103525A (ko) * 2017-03-10 2018-09-19 경북대학교 산학협력단 플라즈마 발생장치

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KR101127121B1 (ko) * 2009-06-12 2012-03-20 한국과학기술원 공기 분사를 이용하여 목표 기판에 금속 나노입자층을 형성시키는 방법
DE102009037846A1 (de) * 2009-08-18 2011-02-24 Siemens Aktiengesellschaft Partikelgefüllte Beschichtungen, Verfahren zur Herstellung und Verwendungen dazu
CN101840852A (zh) * 2010-04-02 2010-09-22 中国科学院半导体研究所 在图形化的半导体衬底上制作有序半导体纳米结构的方法
EP2611948A2 (en) * 2010-09-01 2013-07-10 Facultés Universitaires Notre-Dame de la Paix Method for depositing nanoparticles on substrates
CN102258921A (zh) * 2011-05-27 2011-11-30 安徽南风环境工程技术有限公司 一种油烟吸附过滤网及其制备方法
DK2736837T3 (da) 2011-07-26 2021-10-25 Oned Mat Inc Fremgangsmåde til fremstilling af nanosiliciumtråde
US9963345B2 (en) * 2013-03-15 2018-05-08 The United States Of America As Represented By The Administrator Of Nasa Nanoparticle hybrid composites by RF plasma spray deposition
KR101622033B1 (ko) * 2013-08-01 2016-05-17 주식회사 엘지화학 탄소 담체 - 금속 나노 입자 복합체의 제조방법 및 이에 의해 제조된 탄소 담체 - 금속 나노 입자 복합체
EP2937890B1 (en) * 2014-04-22 2020-06-03 Europlasma nv Plasma coating apparatus with a plasma diffuser and method preventing discolouration of a substrate
KR102254644B1 (ko) * 2014-12-19 2021-05-21 (주)바이오니아 바인더 결합형 탄소나노구조체 나노다공막 및 그의 제조방법
CN104711568B (zh) * 2015-02-27 2017-11-14 南京邮电大学 一种在金属丝上包裹碳纳米材料的制备方法及其装置
US20180248199A1 (en) * 2015-08-27 2018-08-30 Osaka University Method for manufacturing metal nanoparticles, method for manufacturing metal nanoparticle-loaded carrier, and metal nanoparticle-loaded carrier
CN105369180A (zh) * 2015-12-02 2016-03-02 广州有色金属研究院 一种致密氧离子-电子混合导体氧化物涂层的制备方法
ES3032418T3 (en) 2016-07-15 2025-07-18 Oned Mat Inc Manufacturing apparatus and method for making silicon nanowires on carbon based powders for use in batteries
AU2019364543A1 (en) * 2018-10-24 2021-05-27 Atmospheric Plasma Solutions, Inc. Plasma source and method for preparing and coating surfaces using atmospheric plasma pressure waves

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KR100983224B1 (ko) * 2008-04-10 2010-09-20 김선휘 흑연의 미세입자 및 흑연 콜로이드 제조방법
KR20180103525A (ko) * 2017-03-10 2018-09-19 경북대학교 산학협력단 플라즈마 발생장치

Also Published As

Publication number Publication date
JP2010535624A (ja) 2010-11-25
CN101821421A (zh) 2010-09-01
US20120003397A1 (en) 2012-01-05
EP2179071B1 (fr) 2016-04-13
CA2696081A1 (en) 2009-02-19
EP2179071A1 (fr) 2010-04-28
WO2009021988A1 (fr) 2009-02-19

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PA0105 International application

Patent event date: 20100311

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid