KR20100062317A - Composition for dielectric substance of plasma display panel, plasma display panel comprising thereof - Google Patents

Abstract

PURPOSE: A dielectric substance composition for a plasma display panel, and the plasma display panel including thereof are provided to prevent the discoloration of an electrode by changing the composition of a dielectric layer at the plasma display panel. CONSTITUTION: A dielectric substance composition for a plasma display panel contains the following: 100 parts of glass frit by weight; 0.1~2 parts of cobalt oxide by weight; 0.1~2 parts of copper oxide by weight; and 0.1~2 parts of cerium oxide. 35~60 parts of glass frit by weight is included for the total composition. The plasma display panel includes a front substrate(101), a rear substrate(111); and dielectric layers(104,115) formed on the front and the rear substrates.

Description

Composition for plasma display panel dielectric, Plasma display panel including the same {Composition For Dielectric Substance Of Plasma Display Panel, Plasma Display Panel Comprising Thereof}

The present invention relates to a plasma display panel dielectric composition and a plasma display panel comprising the same.

The present invention relates to a plasma display panel dielectric composition and a plasma display panel comprising the same.

In general, a plasma display panel (Plasma Display Panel) is a unit cell formed by each of the upper and lower dielectric layers formed on the front substrate and the rear substrate and a barrier rip formed between the front substrate and the rear substrate. Is filled with a gas such as neon (Ne), helium (He) or a mixture of neon and helium (Ne + He) and an inert gas containing a small amount of xenon (Xe). Therefore, when discharged by a high frequency voltage, the inert gas generates vacuum ultraviolet rays and emits phosphors formed between the partition walls to realize an image. Such plasma display panels are not only easy to thin and large in size, but also greatly improved as a result of recent technology developments, and thus are attracting attention as next generation display devices.

On the other hand, in the dielectric layer, which serves to maintain the glow discharge by limiting the discharge current during plasma discharge and to decrease the memory function and voltage through the wall charge accumulation, the alkali metal as the constituent material reacts with silver (Ag) ions of the electrode. There is a problem that causes discoloration.

Therefore, there is a problem that the reliability of the plasma display panel is lowered.

Accordingly, the present invention provides a plasma display panel dielectric composition and a plasma display panel including the same, which can prevent discoloration of the electrode by changing the composition of the dielectric layer of the plasma display panel.

In order to achieve the above object, the composition for a plasma display panel dielectric according to an embodiment of the present invention comprises a glass frit in the composition for a plasma display panel dielectric, the glass frit, based on 100 parts by weight of the glass frit 0.1 to 2 parts by weight of cobalt oxide (CoO), 0.1 to 2 parts by weight of copper oxide (CuO) and 0.1 to 2 parts by weight of cerium oxide (CeO) may be included.

In addition, the plasma display panel according to an embodiment of the present invention includes a front substrate, a rear substrate facing the front substrate and a dielectric layer formed on the front substrate or the rear substrate, the dielectric layer includes a glass frit, The glass frit may include 0.1 to 2 parts by weight of cobalt oxide (CoO), 0.1 to 2 parts by weight of copper oxide (CuO) and 0.1 to 2 parts by weight of cerium oxide (CeO), respectively, based on 100 parts by weight of the glass frit. have.

The composition for a plasma display panel dielectric of the present invention and a plasma display panel including the same have an advantage of providing a plasma display panel having excellent reliability by preventing discoloration of electrodes.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a diagram for describing a plasma display panel according to an exemplary embodiment.

Referring to FIG. 1, a plasma display panel includes a front panel 100 having a scan electrode 102 and a sustain electrode 103 formed on a front substrate 101, and a scan electrode (described above) formed on a rear substrate 111 forming a rear surface thereof. The rear panel 110 having the plurality of address electrodes 113 arranged so as to intersect with the 102 and the sustain electrode 103 is positioned side by side with a predetermined distance therebetween.

In the front panel 100, a scan electrode 102 and a sustain electrode 103 are disposed in a discharge space, that is, to maintain discharge and light emission of the discharge cell. More specifically, a scan electrode 102 and a sustain electrode 103 including a transparent electrode 102a formed of a transparent ITO material and a bus electrode 102b made of an opaque metal material are included in pairs. The scan electrode 102 and the sustain electrode 103 are covered by one or more upper dielectric layers 104 that limit the discharge current and insulate the electrode pairs. A protective layer 105 on which magnesium oxide (MgO) is deposited is disposed on the upper dielectric layer 104 to facilitate discharge conditions.

The rear panel 110 includes a plurality of discharge spaces, that is, a closed type partition wall 112 of a well type or stripe type for partitioning discharge cells. Also, a plurality of address electrodes 113 are provided for supplying data pulses.

In the plurality of discharge cells partitioned by the partition wall 112, the phosphor layer 114 for emitting visible light for image display during address discharge, preferably red (R), green (G). A blue (B) phosphor layer is located.

The lower dielectric layer 115 is positioned between the address electrode 113 and the phosphor layer 114.

Here, it is not limited that the upper dielectric layer 104 and the lower dielectric layer 115 are formed on each of the front substrate 101 and the rear substrate 111, and on the contrary, the front substrate 101 and the rear substrate 110 are not limited thereto. It is also possible for the lower dielectric layer 115 and the upper dielectric layer 104 to be formed thereon.

In FIG. 1, only an example of the plasma display panel is shown and described, and the present invention is not limited to the plasma display panel having the structure of FIG. 1. For example, although the scan electrode 102, the sustain electrode 103, and the address electrode 113 are formed in the plasma display panel 100 of FIG. 1, the scan electrode 102 is formed in the plasma display panel of the present invention. At least one of the sustain electrode 103 and the address electrode 113 may be omitted.

In addition, in FIG. 1, only the case where the partition wall 112 for partitioning the discharge cells is formed on the rear substrate 111 is illustrated. Alternatively, the partition wall 112 may be formed on the front substrate 101. It may be formed on the front substrate 101 and the rear substrate 112, respectively.

In the plasma display panel according to an exemplary embodiment, the upper dielectric layer 104 and the lower dielectric layer 115 are formed on the front substrate 101 and the rear substrate 111, respectively.

Here, the dielectric layers 104 and 115 include a glass frit, and the glass frit is 0.1 to 2 parts by weight of cobalt oxide (CoO) and 0.1 to 2 parts by weight of copper oxide (CuO) based on 100 parts by weight of the glass frit, respectively. ) And 0.1 to 2 parts by weight of cerium oxide (CeO), other matters are changeable.

Hereinafter, a composition for a plasma display panel dielectric according to an embodiment of the present invention will be described in more detail.

The dielectric composition of the plasma display panel is for manufacturing a dielectric for maintaining glow discharge and accumulating wall charge, and may include a glass frit, a binder, a dispersant, a plasticizer and a solvent.

The composition for a plasma display panel dielectric according to an embodiment of the present invention includes a glass frit, and the glass frit may be included in an amount of 35 to 60 parts by weight based on the total composition for the plasma display panel dielectric.

The glass frit includes 3 to 50 parts by weight of zinc oxide (ZnO), 15 to 55 parts by weight of boron oxide (B ₂ O ₃ ), 0.1 to 30 parts by weight of silicon oxide (SiO ₂ ), respectively, based on 100 parts by weight of the glass frit; It may comprise 0.1 to 15 parts by weight of aluminum oxide (Al ₂ O ₃ ).

The composition for a plasma display panel dielectric according to an embodiment of the present invention may include 3 to 50 parts by weight of zinc oxide (ZnO) based on 100 parts by weight of glass frit. The zinc oxide (ZnO) serves to reduce the glass transition temperature (Tg) and the glass softening temperature (Ts) of the dielectric.

Therefore, when the content of zinc oxide (ZnO) is 3 parts by weight or more based on 100 parts by weight of the total glass frit, an effect sufficient to reduce the glass transition temperature (Tg) and the glass softening temperature (Ts) can be obtained. When the weight part or less, since the possibility of crystallization of the glass formed by the composition can be prevented, the zinc oxide (ZnO) may be included in 3 to 50 parts by weight.

In addition, the composition for the dielectric may include 15 to 55 parts by weight of boron oxide (B ₂ O ₃ ) based on 100 parts by weight of the glass frit. The boron oxide (B ₂ O ₃ ) serves to form the network structure of the dielectric composition.

Therefore, when the content of the boron oxide (B ₂ O ₃ ) is 15 parts by weight or more based on 100 parts by weight of the total glass frit can sufficiently form the network structure of the composition, when the content of the transition temperature of the composition is 55 parts by weight or less Since it can be prevented from rising, the boron oxide (B ₂ O ₃ ) may be included in 15 to 55 parts by weight.

In addition, the composition for the dielectric may include 0.1 to 30 parts by weight of silicon oxide (SiO ₂ ) based on 100 parts by weight of the glass frit. The silicon oxide (SiO ₂ ) serves to stabilize the glass chemically and optically as a glass forming component, and greatly increases the glass transition temperature (Tg) and the glass softening temperature (Ts).

Therefore, when the content of silicon oxide (SiO ₂ ) is 0.1 parts by weight or more with respect to 100 parts by weight of the total glass frit, the dielectric can be stabilized chemically and optically, and when the content is 30 parts by weight or less, the glass transition temperature (Tg) is Since the excessive rise can be prevented, the silicon oxide (SiO ₂ ) may be included in 0.1 to 30 parts by weight.

The composition for the dielectric may include 0.1 to 15 parts by weight of aluminum oxide (Al ₂ O ₃ ) based on 100 parts by weight of the glass frit. The aluminum oxide (Al ₂ O ₃ ) serves to reduce the coefficient of thermal expansion (CTE), increase the high temperature viscosity to improve the mechanical chemical, stability of the composition.

Therefore, when the content of the aluminum oxide (Al ₂ O ₃ ) is 0.1 parts by weight or more based on 100 parts by weight of the total glass frit can reduce the coefficient of thermal expansion (CTE) and improve the mechanical and chemical stability of the composition, 15 weight In the case of less than or equal to part, since the viscosity behavior is suitable in the coefficient of thermal expansion (CTE) and the sintering region, the aluminum oxide (Al ₂ O ₃ ) may be included in an amount of 0.1 to 15 parts by weight.

In addition, the composition for a plasma display panel dielectric according to an embodiment of the present invention is 0.1 to 10 parts by weight of phosphorus oxide (P ₂ O ₅ ), respectively, more than 0 to 5 parts by weight of sodium oxide (Na) with respect to 100 parts by weight of glass frit. At least one selected from the group consisting of ₂ O), 0.1 to 25 parts by weight of barium oxide (BaO), 5 to 20 parts by weight of potassium oxide (K ₂ O), and greater than 0 to 7 parts by weight of lithium oxide (Li ₂ O). It may further include.

The dielectric composition may include 0.1 to 10 parts by weight of phosphorus oxide (P ₂ O ₅ ) based on 100 parts by weight of glass frit. The phosphorus oxide (P ₂ O ₅ ) is a light-forming glass forming agent has an effect of slightly increasing the glass transition temperature (Tg) of the dielectric, and serves to lower the dielectric constant and slightly lower the gelation frequency.

Therefore, when the content of phosphorus oxide (P ₂ O ₅ ) is 0.1 parts by weight or more with respect to 100 parts by weight of the total glass frit, there is an effect of slightly increasing the glass transition temperature (Tg) of the dielectric, when the content is 10 parts by weight or less Since the dielectric constant of the phosphorus oxide (P ₂ O ₅ ) may be included in 0.1 to 10 parts by weight.

The dielectric composition may include sodium oxide (Na ₂ O) of more than 0 and 5 parts by weight or less based on 100 parts by weight of glass frit. The sodium oxide (Na ₂ O) is a yellow glass formula that can control the firing temperature by lowering the glass transition temperature (Tg) of the composition, increases the dielectric constant, and functions to slightly increase the coefficient of thermal expansion (CTE). .

Therefore, when the content of sodium oxide (Na ₂ O) exceeds 0 with respect to 100 parts by weight of the total glass frit, the glass transition temperature (Tg) is lowered to control the baking temperature, 5 parts by weight In the case below, since the thermal expansion coefficient of the dielectric may be increased to facilitate plasticity, the sodium oxide (Na ₂ O) may be included in an amount of more than 0 and 5 parts by weight or less.

The dielectric composition may include 0.1 to 25 parts by weight of barium oxide (BaO) based on 100 parts by weight of glass frit. The barium oxide (BaO) serves to control the dielectric constant and thermal expansion coefficient (CTE) of the dielectric composition.

Therefore, when the content of the barium oxide (BaO) is 0.1 parts by weight or more based on 100 parts by weight of the total glass frit, a stable dielectric constant and coefficient of thermal expansion can be obtained, and when 25 parts by weight or less, the coefficient of thermal expansion (CTE) is increased. In order to prevent the shape stability of the dielectric material from being lowered, the barium oxide (BaO) may be included in an amount of 0.1 to 25 parts by weight.

In addition, the composition for the dielectric may include 5 to 20 parts by weight of potassium oxide (K ₂ O) based on 100 parts by weight of the total glass frit. The potassium oxide (K ₂ O), like the copper oxide (CuO), serves to suppress the yellowing of the dielectric layer with a colorant.

Accordingly, when the content of potassium oxide (K ₂ O) is 5 parts by weight or more based on 100 parts by weight of the total glass frit, yellowing of the dielectric layer may be prevented, and when 20 parts by weight or less, the glass may be potassium oxide (K ₂ O). Since it is possible to prevent the coloring in), the calcium oxide (K ₂ O) may be included in 5 to 20 parts by weight.

The dielectric composition may further include lithium oxide (Li ₂ O) of more than 0 and 7 parts by weight or less based on 100 parts by weight of the total glass frit. The lithium oxide (Li ₂ O) can control the firing temperature by lowering the glass transition temperature (Tg) of the composition, increases the dielectric constant, and functions to slightly increase the coefficient of thermal expansion (CTE).

Therefore, when the content of the lithium oxide (LiO ₂ ) is more than 0 with respect to 100 parts by weight of the total glass frit, the dielectric constant can be prevented from being too low, and when the content of the lithium oxide (LiO ₂ ) is 7 parts by weight or less, an appropriate glass transition temperature (Tg) Since the firing may be facilitated, the lithium oxide (LiO ₂ ) may be included in more than 0 to 7 parts by weight or less.

In particular, the composition for a plasma display panel dielectric according to an embodiment of the present invention is 0.1 to 2 parts by weight of cobalt oxide (CoO), 0.1 to 2 parts by weight of copper oxide (CuO) and 0.1 to 2 to 100 parts by weight of the glass frit, respectively. A part by weight of cerium oxide (CeO) may be further included.

The dielectric composition may include 0.1 to 2 parts by weight of cobalt oxide (CoO) based on 100 parts by weight of glass frit. The cobalt oxide (CoO) serves to mask discoloration of the electrode with a colorant.

Therefore, the content of cobalt oxide (CoO) has an advantage that can cover the discoloration of the electrode when 0.1 parts by weight or more with respect to 100 parts by weight of the total glass frit, and when 2 parts by weight or less, the coloring effect is severe and colored in different colors Since it can be prevented, the cobalt oxide (CoO) may be included in 0.1 to 2 parts by weight.

The dielectric composition may include 0.1 to 2 parts by weight of copper oxide (CuO) and 0.1 to 2 parts by weight of cerium oxide (CeO), respectively, based on 100 parts by weight of glass frit. The copper oxide (CuO) and cerium oxide (CeO) is a discoloration inhibitor to prevent yellowing of the electrode and to maintain a proper color.

Therefore, the content of copper oxide (CuO) and cerium oxide (CeO) is an advantage of preventing the yellowing of the electrode when the content of more than 0.1 parts by weight based on 100 parts by weight of the total glass frit, and when the content of 2 parts by weight or less Since it is possible to prevent coloring on the copper oxide, the copper oxide (CuO) and cerium oxide (CeO) may be included in 0.1 to 2 parts by weight.

As described above, the plasma display panel dielectric composition according to the embodiment of the present invention includes a glass frit, and the glass frit is zinc oxide (ZnO), boron oxide (B ₂ O ₃ ), silicon oxide (SiO ₂ ), Aluminum oxide (Al ₂ O ₃ ), including phosphorus oxide (P ₂ O ₅ ), sodium oxide (Na ₂ O), barium oxide (BaO), potassium oxide (K ₂ O) and lithium oxide (Li ₂ O) It may further include any one or more selected from the group consisting of, in particular, may further include cobalt oxide (CoO), copper oxide (CuO) and cerium oxide (CeO).

The composition for a plasma display panel dielectric according to an embodiment of the present invention includes a binder, and the binder may be included in an amount of 30 to 50 parts by weight based on the total composition for the plasma display panel dielectric.

The binder may comprise a first monomer, a second monomer and a third monomer.

The first monomer may use a hexa acrylate monomer, for example hexa methacrylate or 2-ethyl hexa methacrylate.

As the second monomer, an acrylate monomer having an alkyl group having 1 to 5 carbon atoms may be used, for example, methacrylate, iso-butyl methacrylate, normal-butyl methacrylate, methyl methacrylate and ethyl methacrylate. At least one selected from the group consisting of a rate.

The third monomer may use a polar group-containing monomer, and may be, for example, any one or more selected from the group consisting of methacrylate, acrylate, 2-hydroxy ethyl methacrylate and methacrylic acid.

Here, the binder of the composition for a plasma display panel dielectric according to an embodiment of the present invention may include a first monomer, a second monomer and a third monomer, the content of each of the first monomer with respect to 100 parts by weight of the binder 50 to 85 parts by weight, the second monomer may be included in 10 to 30 parts by weight, the third monomer may be included in 1 to 20 parts by weight.

The composition for a plasma display panel dielectric according to an embodiment of the present invention may include a dispersant. The dispersant is to prevent the glass frit from being deposited on the dielectric layer by increasing the dispersing force of the glass frit, and may be included in an amount of 0.1 to 5 parts by weight based on the total composition of the plasma display panel.

The dispersant may be a polyamineamide compound.

The composition for a plasma display panel dielectric according to an embodiment of the present invention may include a plasticizer. The plasticizer controls the drying rate of the dielectric layer and at the same time provides flexibility to the dry film, and may be included in an amount of 0.1 to 5 parts by weight based on the total composition of the plasma display panel dielectric.

The plasticizer may include any one or more selected from the group consisting of phthalate-based, dioctyl amipate (DOA) -based, dioctylazolate (DOZ) -based and ester-based, and for example, butylbenzylphthalate, di Octyl phthalate, diisooctyl phthalate, dicapryl phthalate, dibutyl phthalate and the like can be used.

Plasma display panel dielectric composition according to an embodiment of the present invention may further include a solvent. As the solvent, the binder may be dissolved, and the boiling point may be 150 ° C. or higher while being well mixed with other additives.

The solvent may include any one or more selected from the group consisting of toluene, propylene glycol monomethyl ether (PGME), butyl acetate (BA), methyl ethyl ketone (MEK), and cyclohexanone (CYC). Other ethyl carbitol, butyl carbitol, ethyl carbitol acetate, butyl carbitol acetate, texanol, terpin oil, dipropylene glycol methyl ether, dipropylene glycol ethyl ether, dipropylene glycol monomethyl ether acetate, cellosolve acetate Butyl cellosolve acetate, tripropylene glycol, etc. can be used.

The composition for a plasma display panel dielectric according to an embodiment of the present invention may further include an additive.

The additives may include antioxidants, ultraviolet light absorbers to improve resolution, sensitizers to improve sensitivity, and the like. In addition, polymerization inhibitors and polyester-modified dimethylpolysiloxanes, polyhydroxycarboxylic acid amides, silicone-based polyacrylate copolymers or fluorine-based paraffin compounds which improve the storage properties of coating compositions such as phosphoric acid, phosphate esters and carboxylic acid-containing compounds It may further include a leveling agent for improving the flatness of the film during printing, such as.

Hereinafter, a composition for a plasma display panel dielectric including the composition according to an embodiment of the present invention and a manufacturing method thereof will be described.

Plasma display panel dielectric composition according to an embodiment of the present invention can be prepared by the following manufacturing method. First, the glass frit powder is uniformly mixed to a predetermined content and then melted into a platinum crucible. At this time, the melting temperature is preferably 1000 to 1500 ℃, the melting time is 10 to 60 minutes to maintain the components can be mixed evenly in the molten state.

The molten mixed raw material is quenched and then pulverized. In this case, the quenching process may be performed in a dry or wet manner, and water may be used in the wet process. The pulverization process after the quenching process may also be performed in a dry or wet manner, and water or an organic solvent may be used in the wet grinding process.

The pulverized glass frit powder is filtered, dried and pulverized to prepare a powder having a small particle size, for example, 0.1 to 10 μm in powder form. Subsequently, the glass frit powder, binder, dispersant, plasticizer and solvent are mixed and kneaded at a predetermined ratio to form a dielectric composition.

The dielectric according to an embodiment of the present invention may be formed by forming a green sheet of the prepared dielectric composition. That is, after coating a composition for dielectric on a base film such as polyester, a protective film may be formed on the coated dielectric composition to form a dielectric green sheet.

Hereinafter, embodiments of a method of manufacturing a plasma display panel dielectric according to an embodiment of the present invention will be described. However, the following embodiments are merely preferred embodiments of the present invention, and the present invention is not limited to the following embodiments.

<Example 1>

32 g of zinc oxide (ZnO), 28 g of boron oxide (B ₂ O ₃ ), 27 g of silicon oxide (SiO ₂ ), ₂ g of aluminum oxide (Al ₂ O ₃ ), 1 g of barium oxide (BaO), phosphorus oxide (P ₂ O ₅ ) 0.6 g, potassium oxide (K ₂ O) 6.5 g, lithium oxide (Li ₂ O) 0.5 g, sodium oxide (Na ₂ O) 0.5 g, cobalt oxide (CoO) 0.5 g, copper oxide (CuO) 0.4 g, oxidation 1 g of cerium (CeO) was mixed and the mixture was melted in a furnace at a temperature of 1200 ° C. The molten mixture was dry quenched and then ground to form 40 g of glass frit powder.

25 g of 2-ethyl hexa methacrylate, 15 g of iso-butyl methacrylate, and 10 g of 2-hydroxy ethyl methacrylate were mixed to form 50 g of binder.

A dispersant of 0.1 g of polyamineamide, a plasticizer of 0.1 g of dioctylphthalate, and a solvent of 9.8 g of toluene were prepared, and mixed with 40 g of the glass frit powder and 50 g of the binder prepared above to prepare a dielectric composition.

After coating the composition for the dielectric prepared on the polyester base film, a protective film was formed to form a green sheet for the dielectric. Next, a dielectric layer was formed by laminating and firing the dielectric green sheet on a rear substrate on which an address electrode was formed.

<Example 2>

Under the same process conditions as in Example 1, 32 g of zinc oxide (ZnO), 28 g of boron oxide (B ₂ O ₃ ), 27 g of silicon oxide (SiO ₂ ), ₂ g of aluminum oxide (Al ₂ O ₃ ), barium oxide (BaO) 1 g, phosphorus oxide (P ₂ O ₅ ) 0.6 g, potassium oxide (K ₂ O) 6.5 g, lithium oxide (Li ₂ O) 0.5 g, sodium oxide (Na ₂ O) 0.2 g, cobalt oxide (CoO) 0.8 g The dielectric layer was formed using only 0.4 g of copper oxide (CuO) and 1 g of cerium oxide (CeO).

<Example 3>

Under the same process conditions as in Example 1, 32 g of zinc oxide (ZnO), 28 g of boron oxide (B ₂ O ₃ ), 27 g of silicon oxide (SiO ₂ ), ₂ g of aluminum oxide (Al ₂ O ₃ ), barium oxide (BaO) 1 g, phosphorus oxide (P ₂ O ₅ ) 0.6 g, potassium oxide (K ₂ O) 6.5 g, lithium oxide (Li ₂ O) 0.5 g, sodium oxide (Na ₂ O) 0.4 g, cobalt oxide (CoO) 0.8 g 0.2 g of copper oxide (CuO) and 0.5 g of cerium oxide (CeO) differed only in the composition of the glass frit to form a dielectric layer.

<Example 4>

Under the same process conditions as in Example 1, 32 g of zinc oxide (ZnO), 28 g of boron oxide (B ₂ O ₃ ), 27 g of silicon oxide (SiO ₂ ), ₂ g of aluminum oxide (Al ₂ O ₃ ), barium oxide (BaO) 1 g, phosphorus oxide (P ₂ O ₅ ) 0.6 g, potassium oxide (K ₂ O) 6.5 g, lithium oxide (Li ₂ O) 0.7 g, sodium oxide (Na ₂ O) 0.5 g, cobalt oxide (CoO) 0.8 g 0.4 g of copper oxide (CuO) and 0.5 g of cerium oxide (CeO) differed only in the composition of the glass frit to form a dielectric layer.

Comparative Example 1

Under the same process conditions as in Example 1, 32 g of zinc oxide (ZnO), 28 g of boron oxide (B ₂ O ₃ ), 27 g of silicon oxide (SiO ₂ ), ₂ g of aluminum oxide (Al ₂ O ₃ ), barium oxide (BaO) 1 g, phosphorus oxide (P ₂ O ₅ ) 0.6 g, potassium oxide (K ₂ O) 7 g, lithium oxide (Li ₂ O) 1 g, sodium oxide (Na ₂ O) 0.5 g, cobalt oxide (CoO) 0.5 g, oxidation 0.4 g of copper (CuO) was used to vary the composition of the glass frit to form a dielectric layer.

Comparative Example 2

Under the same process conditions as in Example 1, 32 g of zinc oxide (ZnO), 28 g of boron oxide (B ₂ O ₃ ), 27 g of silicon oxide (SiO ₂ ), ₂ g of aluminum oxide (Al ₂ O ₃ ), barium oxide (BaO) 1 g, phosphorus oxide (P ₂ O ₅ ) 0.6 g, potassium oxide (K ₂ O) 6.9 g, lithium oxide (Li ₂ O) 1 g, sodium oxide (Na ₂ O) 0.5 g, cobalt oxide (CoO) 0.8 g, A dielectric layer was formed by varying only the composition of the glass frit with 0.5 g of cerium oxide (CeO).

Comparative Example 3

Under the same process conditions as in Example 1, 32 g of zinc oxide (ZnO), 28 g of boron oxide (B ₂ O ₃ ), 27 g of silicon oxide (SiO ₂ ), ₂ g of aluminum oxide (Al ₂ O ₃ ), barium oxide (BaO) 1 g, phosphorus oxide (P ₂ O ₅ ) 0.6 g, potassium oxide (K ₂ O) 6.5 g, lithium oxide (Li ₂ O) 0.5 g, sodium oxide (Na ₂ O) 0.4 g, cobalt oxide (CoO) 0.5 g The dielectric layer was formed by varying only the composition of the glass frit with 1.5 g of cerium oxide (CeO).

<Comparative Example 4>

Under the same process conditions as in Example 1, 32 g of zinc oxide (ZnO), 28 g of boron oxide (B ₂ O ₃ ), 27 g of silicon oxide (SiO ₂ ), ₂ g of aluminum oxide (Al ₂ O ₃ ), barium oxide (BaO) 1 g, phosphorus oxide (P ₂ O ₅ ) 0.6 g, potassium oxide (K ₂ O) 5 g, lithium oxide (Li ₂ O) 0.7 g, sodium oxide (Na ₂ O) 0.5 g, cobalt oxide (CoO) 0.5 g, 0.2 g of copper oxide (CuO) and 2.5 g of cerium oxide (CeO) differed only in the composition of the glass frit to form a dielectric layer.

Comparative Example 5

Under the same process conditions as in Example 1, 32 g of zinc oxide (ZnO), 28 g of boron oxide (B ₂ O ₃ ), 27 g of silicon oxide (SiO ₂ ), ₂ g of aluminum oxide (Al ₂ O ₃ ), barium oxide (BaO) 1 g, phosphorus oxide (P ₂ O ₅ ) 0.6 g, potassium oxide (K ₂ O) 6.5 g, lithium oxide (Li ₂ O) 1 g, sodium oxide (Na ₂ O) 0.5 g, copper oxide (CuO) 0.4 g, A dielectric layer was formed by varying only the composition of the glass frit with 1 g of cerium oxide (CeO).

Comparative Example 6

Under the same process conditions as in Example 1, 32 g of zinc oxide (ZnO), 28 g of boron oxide (B ₂ O ₃ ), 27 g of silicon oxide (SiO ₂ ), ₂ g of aluminum oxide (Al ₂ O ₃ ), barium oxide (BaO) 1g, phosphorus oxide (P ₂ O ₅ ) 0.6g, potassium oxide (K ₂ O) 7.4g, lithium oxide (Li ₂ O) 1g, sodium oxide (Na ₂ O) 1g different composition of the glass frit, the dielectric layer Formed.

The content of each component of the glass frit of Examples 1 to 4 and Comparative Examples 1 to 6 is shown in Table 1 below, and the breakdown voltage and electrode discoloration of the dielectric layer of the plasma display panel manufactured according to the Examples and Comparative Examples. The transmittance and dielectric constant were measured and shown in Table 2 below.

Content of each ingredient of glass frit (g) ZnO B ₂ O ₃ SiO ₂ Al ₂ O ₃ BaO P ₂ O ₅ K ₂ O Li ₂ O Na ₂ O CoO CuO CeO Example 1 32 28 27 2 One 0.6 6.5 0.5 0.5 0.5 0.4 1.0 Example 2 32 28 27 2 One 0.6 6.5 0.5 0.2 0.8 0.4 1.0 Example 3 32 28 27 2 One 0.6 6.5 0.5 0.4 0.8 0.2 0.5 Example 4 32 28 27 2 One 0.6 6.5 0.7 0.5 0.8 0.4 0.5 Comparative Example 1 32 28 27 2 One 0.6 7 One 0.5 0.5 0.4 0 Comparative Example 2 32 28 27 2 One 0.6 6.9 One 0.5 0.5 0 0.5 Comparative Example 3 32 28 27 2 One 0.6 6.5 0.5 0.4 0.5 0 1.5 Comparative Example 4 32 28 27 2 One 0.6 5 0.7 0.5 0.5 0.2 2.5 Comparative Example 5 32 28 27 2 One 0.6 6.5 One 0.5 0 0.4 1.0 Comparative Example 6 32 28 27 2 One 0.6 7.4 One One 0 0 0

Withstand voltage (Kv) Electrode discoloration (Y.I) Transmittance (%, 550nm) Dielectric constant (C ² / N · ㎡) Example 1 3.8 3.1 67.1 6.5 Example 2 4.0 2.0 64.5 7.3 Example 3 3.7 1.5 66.1 7.0 Example 4 3.5 0.1 67.2 6.2 Comparative Example 1 4.2 16.8 68.5 6.8 Comparative Example 2 3.8 15.5 67.2 6.8 Comparative Example 3 3.9 12.2 67.8 6.9 Comparative Example 4 3.5 10.2 55.8 7.1 Comparative Example 5 3.7 15.4 66.8 7.0 Comparative Example 6 3.6 28.6 69.5 6.9

Referring to Table 1 and Table 2, the breakdown voltage, electrode discoloration, transmittance and dielectric constant of the dielectric layer prepared according to the embodiments and comparative examples of the present invention are as follows.

First, in the case of withstand voltage of the dielectric layer, it can be seen that all except for Comparative Example 1 is well exhibited to be 4.0Kv or less, and in the case of transmittance and dielectric constant, it can be seen that both the examples and the comparative examples are good levels.

On the other hand, looking at the degree of electrode discoloration (Yellow Index), in the case of Examples 1 to 4 of the present invention it can be seen that the degree of discoloration is lower than 3.1, but in the case of Comparative Examples 1 to 6 all very high as 10 or more Able to know.

That is, in the case of the dielectric layers prepared according to Examples 1 to 4 of the present invention, it can be seen that the degree of discoloration of the electrode is remarkably low even when reacted with silver ions of the electrode.

Accordingly, the present invention provides a plasma display panel dielectric composition comprising 0.1 to 2 parts by weight of cobalt oxide (CoO), 0.1 to 2 parts by weight of copper oxide (CuO) and 0.1 to 2 parts by weight of cerium oxide (CeO). There is an advantage that it is possible to provide a plasma display panel with excellent reliability by preventing discoloration of the electrode.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It will be understood that the invention may be practiced. Therefore, the embodiments described above are to be understood as illustrative and not restrictive in all aspects. In addition, the scope of the present invention is shown by the claims below, rather than the above detailed description. Also, it is to be construed that all changes or modifications derived from the meaning and scope of the claims and their equivalent concepts are included in the scope of the present invention.

1 illustrates a plasma display panel according to an exemplary embodiment of the present invention.

Claims (19)

In the composition for a plasma display panel dielectric comprising a glass frit, The glass frit, A composition for a plasma display panel dielectric comprising 0.1 to 2 parts by weight of cobalt oxide (CoO), 0.1 to 2 parts by weight of copper oxide (CuO) and 0.1 to 2 parts by weight of cerium oxide (CeO), respectively, based on 100 parts by weight of the glass frit. . The method of claim 1, The glass frit includes 3 to 50 parts by weight of zinc oxide (ZnO), 15 to 55 parts by weight of boron oxide (B ₂ O ₃ ), 0.1 to 30 parts by weight of silicon oxide (SiO ₂ ), respectively, based on 100 parts by weight of the glass frit. A composition for a plasma display panel dielectric further comprising 0.1 to 15 parts by weight of aluminum oxide (Al ₂ O ₃ ). 3. The method of claim 2, The glass frit has 0.1 to 25 parts by weight of barium oxide (BaO), 0.1 to 10 parts by weight of phosphorus oxide (P ₂ O ₅ ), and 5 to 20 parts by weight of potassium oxide (K ₂ O), respectively, based on 100 parts by weight of the glass frit. And more than 0 and 7 parts by weight or less of lithium oxide (LiO ₂ ) and more than 0 and 5 parts by weight or less of sodium oxide (Na ₂ O). The method of claim 1, The dielectric composition further includes a binder, The binder comprises 50 to 85 parts by weight of the first monomer, 10 to 30 parts by weight of the second monomer and 1 to 20 parts by weight of the third monomer, respectively, based on 100 parts by weight of the binder. The method of claim 4, wherein The first monomer comprises hexa acrylate, the second monomer comprises an acrylate having an alkyl group having 1 to 5 carbon atoms, wherein the third monomer comprises a polar group. The method of claim 5, The hexa acrylate monomer is hexa methacrylate or 2-ethyl hexa methacrylate composition for plasma display panel dielectric. The method of claim 5, The acrylate monomer is iso-butyl methacrylate, normal-butyl methacrylate, methyl methacrylate or ethyl methacrylate composition for plasma display panel. The method of claim 5, The monomer containing the polar group is a composition for a plasma display panel dielectric comprising 2-hydroxy ethyl methacrylate or methacrylic acid. The method of claim 4, wherein The binder is 30 to 50 parts by weight based on the composition for the plasma display panel dielectric composition. The method of claim 1, The glass frit is 35 to 60 parts by weight based on the total composition of the plasma display panel dielectric composition. The method of claim 1, The plasma display panel dielectric composition further comprises a dispersant, The dispersant is a composition for a plasma display panel dielectric comprising a polyamineamide-based compound. The method of claim 11, The dispersant is 0.1 to 5 parts by weight of the total composition for the plasma display panel dielectric composition. The method of claim 1, The plasma display panel dielectric composition further comprises a plasticizer, The plasticizer is a composition for a plasma display panel dielectric comprising at least one selected from the group consisting of phthalate-based, dioctyl amipate (DOA), dioctyl azolate (DOZ) and ester (Esther). The method of claim 13, Wherein the plasticizer is 0.1 to 5 parts by weight based on the composition for the plasma display panel dielectric composition. The method of claim 1, The plasma display panel dielectric composition further includes a solvent, The solvent includes a plasma display panel including any one or more selected from the group consisting of toluene, propylene glycol monomethyl ether (PGME), butyl acetate (BA), methyl ethyl ketone (MEK), and cyclohexanone (CYC). Dielectric composition. The method of claim 15, Wherein the solvent is 5 to 20 parts by weight relative to the composition for the plasma display panel dielectric composition. Front substrate; A rear substrate facing the front substrate; And A dielectric layer formed on the front substrate or the back substrate; The dielectric layer comprises a glass frit, The glass frit, A plasma display panel comprising 0.1 to 2 parts by weight of cobalt oxide (CoO), 0.1 to 2 parts by weight of copper oxide (CuO) and 0.1 to 2 parts by weight of cerium oxide (CeO), respectively, based on 100 parts by weight of the glass frit. The method of claim 17, The glass frit comprises 3 to 50 parts by weight of zinc oxide (ZnO), 15 to 55 parts by weight of boron oxide (B ₂ O ₃ ), 0.1 to 30 parts by weight of silicon oxide (SiO ₂ ), respectively, based on 100 parts by weight of the total glass frit. Plasma display panel further comprises 0.1 to 15 parts by weight of aluminum oxide (Al ₂ O ₃ ). The method of claim 18, The glass frit has 0.1 to 25 parts by weight of barium oxide (BaO), 0.1 to 10 parts by weight of phosphorus oxide (P ₂ O ₅ ), and 5 to 20 parts by weight of potassium oxide (K ₂ O), respectively, based on 100 parts by weight of the total glass frit. And greater than 0 and 7 parts by weight or less of lithium oxide (LiO ₂ ) and greater than 0 and 5 parts by weight or less of sodium oxide (Na ₂ O).

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