KR20100048631A - Probe unit for bonding probe and probe bonding method using the same - Google Patents
Probe unit for bonding probe and probe bonding method using the same Download PDFInfo
- Publication number
- KR20100048631A KR20100048631A KR1020080107885A KR20080107885A KR20100048631A KR 20100048631 A KR20100048631 A KR 20100048631A KR 1020080107885 A KR1020080107885 A KR 1020080107885A KR 20080107885 A KR20080107885 A KR 20080107885A KR 20100048631 A KR20100048631 A KR 20100048631A
- Authority
- KR
- South Korea
- Prior art keywords
- probe
- substrate
- bonding
- pad
- opening
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
- G01R1/06733—Geometry aspects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R3/00—Apparatus or processes specially adapted for the manufacture or maintenance of measuring instruments, e.g. of probe tips
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Geometry (AREA)
- Measuring Leads Or Probes (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
The present invention relates to a probe bonding probe unit, and more particularly, to a probe bonding probe unit used when bonding a probe to a substrate and a probe bonding method using the same.
In general, semiconductor devices have a fabrication process of forming contact pads for circuit patterns and inspections on a wafer, and an assembly process of assembling wafers having circuit patterns and contact pads into respective semiconductor chips. It is manufactured through.
An inspection process is performed between the fabrication process and the assembly process to inspect the electrical characteristics of the wafer by applying an electrical signal to the contact pads formed on the wafer. This inspection process is performed to inspect a defect of a wafer and to remove a portion of a wafer in which a defect occurs during an assembly process.
In the inspection process, inspection equipment called a tester for applying an electrical signal to a wafer and probe equipment for performing an interface function between the wafer and the tester are mainly used. Among them, the probe card includes a printed circuit board that receives an electrical signal applied from a tester and a plurality of probes in contact with contact pads formed on the wafer.
In recent years, as the demand for high integrated chips increases, circuit patterns formed on the wafer by the fabrication process and contact pads connected with the circuit patterns are highly integrated. That is, the spacing between neighboring contact pads is very narrow, and the size of the contact pad itself is also finely formed. As a result, since the probe of the probe card used in the inspection process must be in contact with the contact pad, the distance between neighboring probes corresponding to the contact pad must be formed very narrowly, and the size of the probe itself must also be finely formed.
Hereinafter, a method of manufacturing a conventional probe card will be described with reference to FIGS. 1 to 3.
1 to 3 are diagrams for explaining a conventional method of manufacturing a probe card.
First, as shown in FIG. 1, an
Next, as shown in FIG. 2, the probe card is completed by bonding each
The conventional method of manufacturing a probe card as described above bonds each
Hereinafter, another conventional method of manufacturing a probe card for solving the above problems will be described.
First, as shown in FIG. 1, an
Next, as shown in FIG. 3, the
Next, as shown in FIG. 2, the probe card is completed by separating the
As described above, another conventional method of manufacturing a probe card uses a photolithography technique used to form a pattern of a semiconductor, so that the size of the
However, according to another conventional method of manufacturing a probe card, when the plurality of
In addition, another conventional method of manufacturing a probe card has a problem in that the wet etching process takes a long time due to the thickness of the
In addition, another conventional method of manufacturing a probe card, when bonding the
In addition, another conventional method of manufacturing a probe card uses the heat to bond the
One embodiment of the present invention is to solve the above-described problems, an object of the present invention to provide a probe bonding probe unit and a probe bonding method using the same can reduce the manufacturing time and manufacturing cost.
In addition, an object of the present invention is to provide a probe bonding probe unit capable of identifying a position of a pad formed on a substrate and a probe bonding method using the same when a plurality of probes are collectively bonded to a substrate.
Another object of the present invention is to provide a probe bonding probe unit that can use various energy sources for probe bonding, and a probe bonding method using the same.
As a technical means for achieving the above-described technical problem, the first aspect of the present invention is a probe bonding probe unit used when bonding a probe to a substrate on which a pad is formed, the probe and a portion of the probe is seated And a plate formed of a conductive material and a conductive plate formed through the plate to correspond to the pad of the substrate, the conductive plate including an opening covered by a portion of the probe. do.
The probe includes an interconnect element, which may be located at a portion within the opening.
The opening may be formed in the plate portion in the form of an island.
According to another aspect of the present invention, there is provided a method of bonding a probe to a substrate on which a pad is formed, the method comprising: (a) the probe and a portion of the probe on which the probe is seated; Forming a probe unit for probe bonding, the probe unit including a conductive plate formed to penetrate through the plate portion, the conductive plate including an opening partially covered by another portion of the probe, and (b) on the pad of the substrate. Forming a substrate interconnection element, (c) positioning the probe bonding probe unit on the substrate such that at least a portion of the substrate interconnection element is located in the opening of the probe bonding probe unit to contact the probe (D) bonding the probe to the substrate interconnect element and (e) the plate portion It provides a bonding method of the probe comprising the step of separating from the probe.
Step (d) may be performed by irradiating a laser between the substrate interconnect element and the probe through the opening.
Step (d) may be performed by applying heat between the substrate interconnect element and the probe through the opening.
The method may further include forming a conductive paste on the substrate interconnect element to be positioned between the substrate interconnect element and the probe.
The step (e) may be performed using a wet etching process.
In addition, a third aspect of the present invention provides a method of bonding a probe including an interconnecting element to a pad-formed substrate, the method comprising: (a) the probe and a plate portion on which a portion of the probe is seated and made of a conductive material; A conductive plate formed through the plate portion so as to correspond to the pad of the substrate, the conductive plate including an opening that is partially covered by another portion of the probe, wherein an interconnection element of the probe is located at a portion within the opening; Forming a probe unit for bonding the probe, (b) positioning the probe bonding probe unit on the substrate such that the interconnection element of the probe contacts a pad of the substrate, and (c) Bonding the interconnection element of the probe to the pad and (d) the plate portion to the probe It provides the bonding method of the probe, including the step of separating.
Step (c) may be performed by irradiating a laser between the interconnect element of the probe and the pad of the substrate through the opening.
Step (c) may be performed by applying heat between the interconnect element of the probe and the pad of the substrate through the opening.
And forming a conductive paste on the pad of the substrate to be positioned between the interconnect element of the probe and the pad of the substrate.
The step (d) may be performed using a wet etching process.
According to one of the problem solving means of the present invention described above, by including the probe and the conductive plate, there is a technical effect that can reduce the manufacturing time and manufacturing cost.
In addition, since the conductive plate includes an opening, when the plurality of probes are collectively bonded to the substrate, there is a technical effect of confirming the position of the pad formed on the substrate.
In addition, since the conductive plate includes an opening, there is a technical effect that various energy sources can be used for probe bonding.
DETAILED DESCRIPTION Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.
Throughout the specification, when a part is located "on" with another part, this includes not only when a part is in contact with another part, but also when there is another part between the two parts. In addition, when a part is said to "include" a certain component, which means that it may further include other components, except to exclude other components unless otherwise stated.
Hereinafter, a probe bonding probe unit, a method of manufacturing a probe bonding probe unit, and a probe bonding method using a probe bonding probe unit will be described with reference to FIGS. 4 to 16.
First, a probe bonding probe unit according to a first embodiment of the present invention will be described with reference to FIGS. 4 and 5.
4 is a perspective view illustrating a probe bonding probe unit according to a first exemplary embodiment of the present invention, and FIG. 5 is a cross-sectional view taken along the line VV of FIG. 4.
4 and 5, the probe unit for probe bonding according to the first embodiment of the present invention includes a
The
The
The
The
The
The
The
In another embodiment, the
Hereinafter, a method of manufacturing the probe bonding probe unit according to the first embodiment of the present invention will be described with reference to FIGS. 5 to 12.
6 is a flowchart illustrating a method of manufacturing a probe bonding probe unit according to a first embodiment of the present invention, and FIGS. 7 to 12 illustrate a method of manufacturing a probe unit according to a first embodiment of the present invention. It is a cross section.
First, as shown in FIGS. 6 to 9, the
Hereinafter, a process of forming the
First, as shown in FIG. 7, a
Next, an
Next, when the light is received on the
Next, as shown in FIG. 8, a mask having an image corresponding to the
Next, as shown in FIG. 9, the
By the above process, the
Next, as shown in FIG. 10, the
Hereinafter, a process of forming the
First, a photoresist layer made of a photoresist material is formed on the
Next, after forming a photoresist layer made of a photoresist material on the first
Next, after forming a photoresist layer made of a photoresist material on the second
Through the above process, the
Next, as shown in FIGS. 10 to 12 and 5, the
Hereinafter, the process of forming the
First, as shown in FIG. 10, a
Next, as shown in FIG. 11, the
Next, the
Next, as illustrated in FIG. 12, the
By the above process, the portion surrounding the
Next, as shown in FIG. 5, through the
The probe according to the first embodiment of the present invention includes the
Hereinafter, a probe bonding method using the probe bonding probe unit according to the first embodiment of the present invention will be described with reference to FIGS. 13 to 16.
13 is a flowchart illustrating a probe bonding method using the probe bonding probe unit according to the first embodiment of the present invention, and FIGS. 14 to 16 are probes using the probe bonding probe unit according to the first embodiment of the present invention. It is sectional drawing for demonstrating the bonding method.
First, as shown in FIGS. 13 and 14, a probe bonding probe unit is formed (S210).
Specifically, the probe bonding probe unit is formed using the method for manufacturing the probe bonding probe unit according to the first embodiment of the present invention described above.
Next, the
Specifically, tin (Sn) or tin alloy (Au) is formed on a
In another embodiment, after forming a photoresist pattern having exposed portions exposing the
Next, the
Next, as shown in FIG. 15, the probe bonding probe unit is positioned on the substrate 2000 (S240).
Specifically, after the plurality of
Next, the
Specifically, laser or heat, etc., between the
In another embodiment, without forming the
As such, an energy source can be applied between the
Next, as shown in FIG. 16, the
Specifically, the
As described above, the probe bonding method using the probe bonding probe unit according to the first embodiment of the present invention is performed, and a probe card in which the
As described above, in the method of manufacturing the probe bonding probe unit, the probe bonding probe unit, and the manufacturing method using the probe bonding probe unit according to the first embodiment of the present invention, the plurality of
In addition, when the
In addition, a variety of energy sources may be used for bonding the
In addition, since the top surface of the
Hereinafter, a probe bonding probe unit, a method of manufacturing a probe bonding probe unit, and a probe bonding method using a probe bonding probe unit will be described with reference to FIGS. 17 to 29.
Hereinafter, only the characteristic parts distinguished from the first embodiment will be described and described, and the descriptions thereof will be omitted according to the first embodiment. In addition, in the second embodiment of the present invention, for the convenience of description, the same components will be described using the same reference numerals as in the first embodiment.
First, a probe bonding probe unit according to a second embodiment of the present invention will be described with reference to FIGS. 17 and 18.
FIG. 17 is a perspective view illustrating a probe bonding probe unit according to a second exemplary embodiment of the present invention, and FIG. 18 is a cross-sectional view taken along the line VIII-VIII of FIG. 4.
As shown in FIGS. 17 and 18, the probe bonding probe unit according to the second embodiment of the present invention includes a
The
The
Hereinafter, a method of manufacturing the probe bonding probe unit according to the second embodiment of the present invention will be described with reference to FIGS. 18 to 25.
19 is a flowchart illustrating a method of manufacturing a probe bonding probe unit according to a second embodiment of the present invention, and FIGS. 20 to 25 are cross-sectional views illustrating a method of manufacturing a probe unit according to a second embodiment of the present invention. to be.
First, as shown in FIGS. 19 and 20, the
Next, as shown in FIGS. 21 to 23, the
Hereinafter, a process of forming the
First, as shown in FIGS. 21 through 23, after forming the first
Next, a second
Next, a third
Through the above process, the
Next, as shown in FIGS. 23 to 25 and 18, the
Hereinafter, the process of forming the
First, as shown in FIG. 23, a
Next, as shown in FIG. 24, the
Next, the
Next, as shown in FIG. 25, the
By the above process, the part surrounding the
Next, as illustrated in FIG. 18, the penetrating
By the above process, the
Hereinafter, a probe bonding method using the probe bonding probe unit according to the second embodiment of the present invention will be described with reference to FIGS. 26 to 29.
26 is a flowchart illustrating a probe bonding method using a probe bonding probe unit according to a second embodiment of the present invention, and FIGS. 27 to 29 are probes using a probe bonding probe unit according to a second embodiment of the present invention. It is sectional drawing for demonstrating the bonding method.
First, as illustrated in FIGS. 26 and 27, a probe bonding probe unit is formed (S410).
Specifically, the probe bonding probe unit is formed using the method for manufacturing the probe bonding probe unit according to the second embodiment of the present invention described above.
Next, the
Specifically, the
Next, as shown in FIG. 28, the probe bonding probe unit is positioned on the substrate 2000 (S430).
Specifically, after the plurality of
Next, the
In detail, various energy sources such as laser or heat may be applied between the
In another embodiment, without forming the
As described above, since the energy source may be applied between the
Next, as shown in FIG. 29, the
Specifically, the
As described above, the probe bonding method using the probe bonding probe unit according to the second embodiment of the present invention is performed, and a probe card in which the
As described above, the method of manufacturing the probe bonding probe unit, the probe bonding probe unit, and the manufacturing method using the probe bonding probe unit according to the second embodiment of the present invention improve the reliability of the probe bonding process and simultaneously produce the probe card. Save time and manufacturing costs.
In addition, since the
The foregoing description of the present invention is intended for illustration, and it will be understood by those skilled in the art that the present invention may be easily modified in other specific forms without changing the technical spirit or essential features of the present invention. will be. It is therefore to be understood that the above-described embodiments are illustrative in all aspects and not restrictive. For example, each component described as a single type may be implemented in a distributed manner, and similarly, components described as distributed may be implemented in a combined form.
The scope of the present invention is shown by the following claims rather than the above description, and all changes or modifications derived from the meaning and scope of the claims and their equivalents should be construed as being included in the scope of the present invention. do.
1 to 3 are cross-sectional views for explaining a method of manufacturing a conventional probe card,
4 is a perspective view showing a probe unit for probe bonding according to a first embodiment of the present invention;
5 is a cross-sectional view taken along the line VV of FIG. 4,
6 is a flowchart illustrating a method of manufacturing a probe bonding probe unit according to a first embodiment of the present invention.
7 to 12 are cross-sectional views illustrating a method of manufacturing a probe bonding probe unit according to a first embodiment of the present invention.
13 is a flowchart illustrating a probe bonding method using the probe bonding probe unit according to the first embodiment of the present invention.
14 to 16 are cross-sectional views illustrating a probe bonding method using a probe bonding probe unit according to a first embodiment of the present invention.
17 is a perspective view illustrating a probe unit for probe bonding according to a second embodiment of the present invention;
18 is a cross-sectional view taken along the line VII-VII of FIG. 17,
19 is a flowchart illustrating a method of manufacturing a probe bonding probe unit according to a second embodiment of the present invention.
20 to 25 are cross-sectional views illustrating a method of manufacturing a probe bonding probe unit according to a second embodiment of the present invention.
FIG. 26 is a flowchart illustrating a probe bonding method using a probe bonding probe unit according to a second exemplary embodiment of the present invention.
27 to 29 are cross-sectional views illustrating a probe bonding method using a probe bonding probe unit according to a second exemplary embodiment of the present invention.
Claims (13)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080107885A KR20100048631A (en) | 2008-10-31 | 2008-10-31 | Probe unit for bonding probe and probe bonding method using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080107885A KR20100048631A (en) | 2008-10-31 | 2008-10-31 | Probe unit for bonding probe and probe bonding method using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20100048631A true KR20100048631A (en) | 2010-05-11 |
Family
ID=42275367
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080107885A KR20100048631A (en) | 2008-10-31 | 2008-10-31 | Probe unit for bonding probe and probe bonding method using the same |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20100048631A (en) |
-
2008
- 2008-10-31 KR KR1020080107885A patent/KR20100048631A/en not_active Application Discontinuation
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100841499B1 (en) | Semiconductor device and manufacturing method thereof | |
KR101051136B1 (en) | Space transducer, probe card including space transducer and method of manufacturing space transducer | |
WO2007119930A1 (en) | Method of bonding probes and method of manufacturing a probe card using the same | |
KR100830352B1 (en) | Probe tip, probe card, method of manufacturing the probe tip and method of manufacturing a probe structure | |
KR101043141B1 (en) | Probe Assembly For Accurate Soldering | |
KR200454211Y1 (en) | Probe Assembly Having Guide Structure | |
KR100977213B1 (en) | Method of manufacturing probe unit for bonding probe | |
KR100961454B1 (en) | Probe substrate and making method thereof | |
JPH06268098A (en) | Manufacture of semiconductor integrated circuit device | |
KR20100048631A (en) | Probe unit for bonding probe and probe bonding method using the same | |
KR100997179B1 (en) | Method of making probe and probe card | |
KR101010667B1 (en) | Probe bonding unit and manufacturing method of probe bonding unit, and probe bonding method using probe bonding unit | |
KR100961457B1 (en) | Probe substrate and making method thereof | |
KR101058513B1 (en) | Manufacturing method of probe card | |
KR100977209B1 (en) | Space transformer, probe card having space transformer, and method for manufacturing space transformer | |
KR100959797B1 (en) | Method for manufacturing contact structure | |
KR101347875B1 (en) | Method for manufacturing touching structure for testing semiconductor package, touching structure for testing semiconductor package and socket for testing semiconductor package including the same | |
JP2002260753A (en) | Manufacturing method of sheets with bumps | |
KR100996926B1 (en) | Method for manufacturing probe and probe card | |
KR20100027737A (en) | Method for manufacturing probe and probe card | |
TW202244510A (en) | Probe card and method for repairing probe card | |
KR101010671B1 (en) | Probe and method for manufacturing the same | |
KR101024098B1 (en) | Method for bonding probe | |
KR20100027740A (en) | Method for bonding probe | |
KR101092989B1 (en) | Metal layer pattern structure and forming of the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |