KR20100019136A - 산화텅스텐 코팅재의 제조방법 및 산화텅스텐 박막의 제조방법 - Google Patents
산화텅스텐 코팅재의 제조방법 및 산화텅스텐 박막의 제조방법 Download PDFInfo
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- KR20100019136A KR20100019136A KR1020080078019A KR20080078019A KR20100019136A KR 20100019136 A KR20100019136 A KR 20100019136A KR 1020080078019 A KR1020080078019 A KR 1020080078019A KR 20080078019 A KR20080078019 A KR 20080078019A KR 20100019136 A KR20100019136 A KR 20100019136A
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- Prior art keywords
- tungsten
- tungsten oxide
- solution
- hydrogen peroxide
- tungstic acid
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- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 title claims abstract description 84
- 229910001930 tungsten oxide Inorganic materials 0.000 title claims abstract description 84
- 238000000576 coating method Methods 0.000 title claims abstract description 65
- 239000011248 coating agent Substances 0.000 title claims abstract description 58
- 239000010409 thin film Substances 0.000 title claims abstract description 49
- 239000000463 material Substances 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 111
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 53
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 claims abstract description 52
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 51
- 239000010937 tungsten Substances 0.000 claims abstract description 51
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 45
- 239000000843 powder Substances 0.000 claims abstract description 25
- 230000005587 bubbling Effects 0.000 claims abstract description 24
- 229910052751 metal Inorganic materials 0.000 claims abstract description 18
- 239000002184 metal Substances 0.000 claims abstract description 18
- 239000003960 organic solvent Substances 0.000 claims abstract description 17
- 238000010438 heat treatment Methods 0.000 claims abstract description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims abstract description 11
- 239000000126 substance Substances 0.000 claims abstract description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 36
- 239000002253 acid Substances 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 25
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 16
- 239000010408 film Substances 0.000 claims description 15
- 239000011521 glass Substances 0.000 claims description 14
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 9
- 238000003618 dip coating Methods 0.000 claims description 9
- 238000001704 evaporation Methods 0.000 claims description 8
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 7
- 238000004528 spin coating Methods 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 5
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 claims description 5
- 238000007764 slot die coating Methods 0.000 claims description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 3
- 239000007790 solid phase Substances 0.000 claims description 3
- 238000004821 distillation Methods 0.000 claims description 2
- CXKGGJDGRUUNKU-UHFFFAOYSA-N oxotungsten;hydrate Chemical compound O.[W]=O CXKGGJDGRUUNKU-UHFFFAOYSA-N 0.000 abstract description 14
- 230000015572 biosynthetic process Effects 0.000 abstract description 13
- 238000003786 synthesis reaction Methods 0.000 abstract description 13
- -1 peroxy tungstic acid Chemical compound 0.000 abstract description 9
- 230000035484 reaction time Effects 0.000 abstract description 9
- 230000002194 synthesizing effect Effects 0.000 abstract description 9
- 239000002904 solvent Substances 0.000 abstract description 8
- 239000007789 gas Substances 0.000 abstract description 7
- 238000007796 conventional method Methods 0.000 abstract description 6
- 238000001556 precipitation Methods 0.000 abstract description 3
- 150000001298 alcohols Chemical class 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 78
- 238000006243 chemical reaction Methods 0.000 description 20
- 150000001875 compounds Chemical class 0.000 description 20
- 238000002834 transmittance Methods 0.000 description 17
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 9
- 230000008901 benefit Effects 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 239000011630 iodine Substances 0.000 description 9
- 229910052740 iodine Inorganic materials 0.000 description 9
- 230000008859 change Effects 0.000 description 8
- 238000004455 differential thermal analysis Methods 0.000 description 8
- 239000002244 precipitate Substances 0.000 description 8
- 238000004448 titration Methods 0.000 description 7
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 6
- 239000012071 phase Substances 0.000 description 6
- 238000004040 coloring Methods 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- 238000006722 reduction reaction Methods 0.000 description 5
- 238000002411 thermogravimetry Methods 0.000 description 5
- 239000000047 product Substances 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000007416 differential thermogravimetric analysis Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000012086 standard solution Substances 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- 238000002076 thermal analysis method Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910013684 LiClO 4 Inorganic materials 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- NVIVJPRCKQTWLY-UHFFFAOYSA-N cobalt nickel Chemical compound [Co][Ni][Co] NVIVJPRCKQTWLY-UHFFFAOYSA-N 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- LBJNMUFDOHXDFG-UHFFFAOYSA-N copper;hydrate Chemical compound O.[Cu].[Cu] LBJNMUFDOHXDFG-UHFFFAOYSA-N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000005383 fluoride glass Substances 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- AWOORJZBKBDNCP-UHFFFAOYSA-N molybdenum;oxotungsten Chemical compound [Mo].[W]=O AWOORJZBKBDNCP-UHFFFAOYSA-N 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 239000004984 smart glass Substances 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical group O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 238000004832 voltammetry Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
Description
비교예 | 실시예 1 | 실시예 3 | |
퍼록소 텅스텐산의 부피 | 250㎖ | 220㎖ | 200㎖ |
퍼록소 텅스텐산의 pH | 1.70±0.2 | 1.50±0.3 | 1.40±0.2 |
퍼록소 텅스텐산의 점도 | 4.0±0.3 cP | 3.0±0.2 cP | 2.4±0.2 cP |
H2O/WO3 | 0.13±0.2 | 0.16±0.2 | 0.15±0.2 |
WO3·xH2O2·yH2O | WO3·0.13H2O2·10.0H2O | WO3·0.16H2O2·7.10H2O | WO3·0.15H2O2·0.5H2O |
산화텅스텐 코팅용액의 코팅 속도 | 100㎜/min | 150㎜/min | 200㎜/min |
산화텅스텐 박막의 투과율(Transmittance) | Tb-80%, Tc 10% | Tb-86%, Tc 8% | Tb-90%, Tc 5% |
산화텅스텐 박막의 전류밀도(Current Density) | 22.0±2 mC/㎠ | 20.0±2 mC/㎠ | 21.3±2 mC/㎠ |
산화텅스텐 박막 두께 | 240±20 ㎚ | 240±10 ㎚ | 200±10 ㎚ |
Claims (5)
- (a) 텅스텐(W) 금속분말 또는 텅스텐산(H2WO4) 분말을 과산화수소수에 용해시켜 투명한 텅스텐 용액을 형성하는 단계;(b) 상기 텅스텐 용액에 함유된 일정량의 물과 과산화수소를 제거하기 위하여 40∼90℃의 온도에서 가열하면서 질소(N2) 가스를 0.1∼100ℓ/min로 주입하여 상기 텅스텐 용액을 버블링(bubbling) 시키면서 과산화수소와 물을 증발시키는 단계; 및(c) WO3·xH2O2·yH2O의 화학식을 갖는 투명한 오렌지색의 퍼록소 텅스텐산을 형성함에 있어서 0.13<x<0.2, 0.5<y<10의 범위를 이루도록 증발되는 과산화수소의 양과 물의 양을 조절하여 원하는 조성의 퍼록소 텅스텐산을 얻는 단계를 포함하는 산화텅스텐 코팅재의 제조방법.
- 제1항에 있어서, 상기 (b) 단계 후에,회전농축기를 사용하여 40∼90℃의 온도에서 감압 증류하는 단계를 더 포함하되, 생성된 퍼록소 텅스텐산은 고상인 것을 특징으로 하는 산화텅스텐 코팅재의 제조방법.
- 텅스텐(W) 금속분말 또는 텅스텐산(H2WO4) 분말을 과산화수소수에 용해시켜 투명한 텅스텐 용액을 형성하는 단계; 및상기 텅스텐 용액에 함유된 일정량의 물과 과산화수소를 제거하기 위하여 회전농축기를 사용하여 40∼90℃의 온도에서 감압 증류하여 고상의 투명한 오렌지색의 퍼록소 텅스텐산을 얻는 단계를 포함하며,상기 퍼록소 텅스텐산은 WO3·xH2O2·yH2O의 화학식을 갖고 0.13<x<0.2, 0.5<y<10의 범위를 이루는 것을 특징으로 하는 산화텅스텐 코팅재의 제조방법.
- 제1항 내지 제3항 중 어느 하나의 항에 있어서, 생성된 상기 퍼록소 텅스텐산을 메탄올, 에탄올, 프로판올, 이소프로필 알코올 및 2-메톡시에탄올 중에서 선택된 적어도 하나의 유기 용매에 0.1∼1M의 농도를 갖도록 혼합하여 산화텅스텐 코팅용액을 형성하는 단계를 더 포함하는 산화텅스텐 코팅재의 제조방법.
- 투명 도전막이 코팅된 유리기판에 제4항에 기재된 산화텅스텐 코팅용액을 딥코팅, 스핀코팅, 바코팅 또는 슬롯다이코팅을 이용하여 50㎚∼1㎛의 두께로 코팅하고, 100∼500℃의 온도에서 열처리하여 비정질 산화텅스텐 박막 또는 결정질 텅스 텐 박막을 형성하는 것을 특징으로 하는 산화텅스텐 박막의 제조방법.
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CN117587405A (zh) * | 2024-01-16 | 2024-02-23 | 宁波爱柯迪科技产业发展有限公司 | 一种压铸模具用防铝液黏附抗冲蚀复合涂层及其制备方法 |
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KR20220141448A (ko) * | 2021-04-13 | 2022-10-20 | 한국에너지기술연구원 | 가시광-적외선 파장의 선택적 환원변색 물질 및 그 제조방법, 이를 이용한 전기변색 필름 및 소자 |
CN117587405A (zh) * | 2024-01-16 | 2024-02-23 | 宁波爱柯迪科技产业发展有限公司 | 一种压铸模具用防铝液黏附抗冲蚀复合涂层及其制备方法 |
CN117587405B (zh) * | 2024-01-16 | 2024-04-09 | 宁波爱柯迪科技产业发展有限公司 | 一种压铸模具用防铝液黏附抗冲蚀复合涂层及其制备方法 |
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