KR20090083239A - 텅스텐계 산화물을 이용한 가시광 응답형 광촉매 조성물 및 그 제조방법 - Google Patents
텅스텐계 산화물을 이용한 가시광 응답형 광촉매 조성물 및 그 제조방법 Download PDFInfo
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- KR20090083239A KR20090083239A KR1020080009265A KR20080009265A KR20090083239A KR 20090083239 A KR20090083239 A KR 20090083239A KR 1020080009265 A KR1020080009265 A KR 1020080009265A KR 20080009265 A KR20080009265 A KR 20080009265A KR 20090083239 A KR20090083239 A KR 20090083239A
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- visible light
- compound
- alkaline earth
- metal
- photocatalyst composition
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- 239000011941 photocatalyst Substances 0.000 title claims abstract description 42
- 238000001308 synthesis method Methods 0.000 title abstract 2
- 150000001875 compounds Chemical class 0.000 claims abstract description 35
- 239000000203 mixture Substances 0.000 claims abstract description 32
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 19
- 150000003624 transition metals Chemical class 0.000 claims abstract description 19
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- 239000002184 metal Substances 0.000 claims abstract description 16
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims abstract description 15
- 150000001342 alkaline earth metals Chemical class 0.000 claims abstract description 15
- 229910005855 NiOx Inorganic materials 0.000 claims abstract description 9
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 7
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 7
- 229910052802 copper Inorganic materials 0.000 claims abstract description 6
- 229910052742 iron Inorganic materials 0.000 claims abstract description 6
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 47
- 238000004519 manufacturing process Methods 0.000 claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 239000012153 distilled water Substances 0.000 claims description 12
- 239000002994 raw material Substances 0.000 claims description 11
- 239000002002 slurry Substances 0.000 claims description 9
- 150000002739 metals Chemical class 0.000 claims description 8
- XAYGUHUYDMLJJV-UHFFFAOYSA-Z decaazanium;dioxido(dioxo)tungsten;hydron;trioxotungsten Chemical compound [H+].[H+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.O=[W](=O)=O.[O-][W]([O-])(=O)=O.[O-][W]([O-])(=O)=O.[O-][W]([O-])(=O)=O.[O-][W]([O-])(=O)=O.[O-][W]([O-])(=O)=O.[O-][W]([O-])(=O)=O XAYGUHUYDMLJJV-UHFFFAOYSA-Z 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 7
- 229910001510 metal chloride Inorganic materials 0.000 claims description 7
- 150000004767 nitrides Chemical class 0.000 claims description 7
- 239000011734 sodium Substances 0.000 claims description 7
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 6
- 238000005303 weighing Methods 0.000 claims description 6
- 238000001354 calcination Methods 0.000 claims description 4
- 238000010298 pulverizing process Methods 0.000 claims description 4
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 claims description 3
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 3
- 230000002194 synthesizing effect Effects 0.000 claims description 3
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 3
- 239000000126 substance Substances 0.000 abstract description 19
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 abstract description 6
- 208000008842 sick building syndrome Diseases 0.000 abstract description 3
- 239000012855 volatile organic compound Substances 0.000 abstract description 3
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 abstract 2
- 150000002894 organic compounds Chemical class 0.000 abstract 1
- 238000000354 decomposition reaction Methods 0.000 description 35
- 239000007791 liquid phase Substances 0.000 description 32
- 239000000843 powder Substances 0.000 description 23
- 239000007787 solid Substances 0.000 description 22
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 12
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 230000015556 catabolic process Effects 0.000 description 5
- 238000006731 degradation reaction Methods 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 230000001699 photocatalysis Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 5
- 229940043267 rhodamine b Drugs 0.000 description 5
- 238000010532 solid phase synthesis reaction Methods 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 239000003426 co-catalyst Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000001027 hydrothermal synthesis Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000013032 photocatalytic reaction Methods 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- 229910017061 Fe Co Inorganic materials 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 230000004298 light response Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 229910020599 Co 3 O 4 Inorganic materials 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910017709 Ni Co Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000011268 mixed slurry Substances 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000004482 other powder Substances 0.000 description 1
- 229960005489 paracetamol Drugs 0.000 description 1
- 239000000575 pesticide Substances 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000002336 sorption--desorption measurement Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
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- B01J23/85—Chromium, molybdenum or tungsten
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- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
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Abstract
Description
구분 | (A1-xA'x)WO4 | 합성법 | 밴드갭 (eV) | 분말입경 | 액상분해 (200W halogen lamp,>420nm ) | 기상분해 (200W halogen lamp, >420nm) | ||
x | A | A' | 3시간 후 Rhodamine B 분해(%) | 3시간 후 아세트알데히드 분해(%) | ||||
실시예1 | 0 | Cu | - | 고상법 | 2.3 | 0.8μm | 15 | 10 |
실시예2 | 액상법 | 50nm | 30 | 20 | ||||
실시예3 | 0 | Ni | - | 고상법 | 2.9 | 0.8μm | 30 | 13 |
실시예4 | 액상법 | 60nm | 50 | 25 | ||||
실시예5 | 0 | Co | - | 고상법 | 2.6 | 1μm | 20 | 13 |
실시예6 | 액상법 | 100nm | 35 | 28 | ||||
실시예7 | 0 | Fe | - | 고상법 | 1.6 | 0.6μm | 40 | 25 |
실시예8 | 액상법 | 40nm | 70 | 40 | ||||
실시예9 | 0 | Mn | - | 고상법 | 2.5 | 0.9μm | 15 | 5 |
실시예10 | 액상법 | 110nm | 25 | 10 | ||||
실시예11 | 0.1 | Fe | Cu | 고상법 | 1.9 | 0.6μm | 45 | 22 |
액상법 | 50nm | 72 | 30 | |||||
실시예12 | 0.1 | Fe | Ni | 고상법 | 2.2 | 0.6μm | 45 | 30 |
액상법 | 70nm | 75 | 44 | |||||
실시예13 | 0.1 | Fe | Co | 고상법 | 2.3 | 0.8μm | 42 | 28 |
액상법 | 90nm | 73 | 41 | |||||
실시예14 | 0.1 | Fe | Mg | 고상법 | 2.6 | 0.9μm | 50 | 30 |
액상법 | 120nm | 75 | 45 | |||||
실시예15 | 0.1 | Fe | Zn | 고상법 | 3.0 | 1μm | 20 | 15 |
액상법 | 500nm | 52 | 33 | |||||
실시예16 | 0.2 | Fe | Ni | 고상법 | 2.5 | 0.8μm | 50 | 30 |
액상법 | 70nm | 80 | 50 | |||||
실시예17 | 0.2 | Fe | Mn | 고상법 | 2.5 | 0.9μm | 35 | 8 |
액상법 | 100nm | 70 | 11 | |||||
실시예18 | 0.3 | Fe | Ni | 고상법 | 2.7 | 0.8μm | 48 | 29 |
액상법 | 70nm | 78 | 48 | |||||
실시예19 | 0.3 | Fe | Co | 고상법 | 2.5 | 0.9μm | 40 | 22 |
액상법 | 90nm | 68 | 35 | |||||
실시예20 | 0.3 | Ni | Co | 고상법 | 2.8 | 0.9μm | 33 | 15 |
액상법 | 90nm | 55 | 20 | |||||
실시예21 | 0.3 | Fe | Mg | 고상법 | 3.0 | 0.9μm | 15 | 7 |
액상법 | 150nm | 20 | 11 | |||||
실시예22 | 0.5 | Fe | Cu | 고상법 | 2.2 | 0.7μm | 35 | 20 |
액상법 | 50nm | 68 | 28 | |||||
비교예1 | TiO2 (P25) | - | 3.2 | 50 nm | 3 | 2 |
구분 | NiOx Loading | 합성법 | 분말크기 | 액상분해 (200W halogen lamp,>420nm ) | 기상분해 (200W halogen lamp, >420nm) |
3시간 후 Rhodamine B 분해(%) | 3시간 후 아세트알데히드분해(%) | ||||
실시예23 | CuWO4중량에 대하여 1wt% NiOx | 고상법 | 0.8 μm | 65 | 30 |
실시예24 | 액상법 | 50 nm | 80 | 45 | |
실시예25 | FeWO4중량에 대하여 1wt% NiOx | 고상법 | 0.6 μm | 65 | 50 |
실시예26 | 액상법 | 40 nm | 85 | 70 |
Claims (8)
- 하기 식 1로 표현되는 화합물을 포함하는 가시광 응답형 광촉매 조성물.<식 1>(A1-xA'x)WO4상기 식에서, A 및 A'는 전이금속 및 알칼리토금속 중 선택된 서로 같거나 다른 금속이며, x는 0 ≤ x ≤ 0.5임.
- 제 1 항에 있어서,전이금속은 Cu, Ni, Co, Fe 및 Mn 중 선택된 것이고, 알칼리토금속은 Mg 또는 Zn임을 특징으로 하는 가시광 응답형 광촉매 조성물.
- 제 1 항에 있어서,상기 식 1로 표현되는 화합물은 밴드갭이 3.0eV 이하인 것임을 특징으로 하는 가시광 응답형 광촉매 조성물.
- 제 1 항에 있어서,NiOx, Pt 및 RuO2 중 선택된 1종 이상의 화합물을 상기 식 1의 화합물에 대하여 0.1~5중량% 포함하는 것을 특징으로 하는 가시광 응답형 광촉매 조성물.
- 전이금속 및 알칼리토금속 산화물과 텅스텐 산화물을 몰비가 (A+A'):W = 1~3:1~3이 되도록 칭량하여 혼합하는 단계;혼합된 화합물을 600~800℃에서 하소하는 단계; 및하소된 화합물을 20~30시간 분쇄하는 단계를 포함하여 하기 식 1의 화합물을 제조하는 단계를 포함하는 가시광 응답형 광촉매 조성물 제조방법.<식 1>(A1-xA'x)WO4상기 식에서, A 및 A'는 전이금속 및 알칼리토금속 중 선택된 서로 같거나 다른 금속이며, x는 0 ≤ x ≤ 0.5임.
- 제 5 항에 있어서,전이금속은 Cu, Ni, Co, Fe 및 Mn 중 선택된 것이고, 알칼리토금속은 Mg 또는 Zn임을 특징으로 하는 가시광 응답형 광촉매 조성물 제조방법.
- 금속질화물 또는 금속염화물 중 선택된 한가지와 소디움텅스테이트(Na2WO4ㆍ2H2O) 또는 암모늄파라텅스테이트(H42N10O42W12-xH2O) 중 선택된 한가지를 적정 몰비가 되도록 칭량하여 증류수에 녹이는 단계;증류수에 녹인 원료의 산도를 조절하는 단계;산도가 조절된 원료를 120~180℃에서 수열합성하는 단계; 및수열합성된 슬러리를 원심분리한 후 건조하는 단계를 포함하여 하기 식 1의 화합물을 제조하는 단계를 포함하는 가시광 응답형 광촉매 조성물 제조방법.<식 1>(A1-xA'x)WO4상기 식에서, A 및 A'는 전이금속 및 알칼리토금속 중 선택된 서로 같거나 다른 금속이며, x는 0 ≤ x ≤ 0.5임.
- 금속질화물 또는 금속염화물 중 선택된 한가지와 소디움텅스테이트(Na2WO4ㆍ2H2O) 또는 암모늄파라텅스테이트(H42N10O42W12-xH2O) 중 선택된 한가지를 적정 몰비가 되도록 칭량하여 증류수에 녹이는 단계;증류수에 녹인 원료의 산도를 조절하는 단계;산도가 조절된 원료를 공기중에서 40~90oC로 가열하는 단계;가열된 슬러리를 원심분리한 후 건조하는 단계; 및350~400oC에서 열처리하는 단계를 포함하여 하기 식 1의 화합물을 제조하는 단계를 포함하는 가시광 응답형 광촉매 조성물 제조방법.<식 1>(A1-xA'x)WO4상기 식에서, A 및 A'는 전이금속 및 알칼리토금속 중 선택된 서로 같거나 다른 금속이며, x는 0 ≤ x ≤ 0.5임.
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