KR20090068543A - A photo resist container - Google Patents
A photo resist container Download PDFInfo
- Publication number
- KR20090068543A KR20090068543A KR1020070136211A KR20070136211A KR20090068543A KR 20090068543 A KR20090068543 A KR 20090068543A KR 1020070136211 A KR1020070136211 A KR 1020070136211A KR 20070136211 A KR20070136211 A KR 20070136211A KR 20090068543 A KR20090068543 A KR 20090068543A
- Authority
- KR
- South Korea
- Prior art keywords
- photosensitive liquid
- storage container
- photoresist
- housing
- nozzle
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/005—Nozzles or other outlets specially adapted for discharging one or more gases
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
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- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Packging For Living Organisms, Food Or Medicinal Products That Are Sensitive To Environmental Conditiond (AREA)
Abstract
A housing having a lower shape in a shape of a funnel along an inner circumference such that the photosensitive liquid is collected by gravity; And a nozzle drawn into the housing to discharge the photosensitive liquid to the outside.
Description
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor photosensitive liquid storage container, and more particularly, to a photosensitive liquid storage container in which a photosensitive liquid remaining in a photosensitive liquid container can be used.
In general, a photo process for manufacturing a semiconductor includes a coating process of forming a photoresist film by applying a photo resist (PR; Photo Resist) on a wafer, and irradiating light for exposure on a wafer on which the photoresist film is formed. And an exposing step of drawing a pattern, and a developing step of developing an exposed wafer to form a pattern.
Among them, the coating process of applying the photoresist is mainly performed through spin coater equipment. As is well known, the spin coater drops the photoresist at the center of the wafer while rotating the wafer. It is to be uniformly spread outwards by the centrifugal force due to the rotation.
In general, the photosensitive liquid supplied to the spin coater is provided in a bottle unit from the beginning to prevent the possibility of contamination, and the internal photosensitive liquid is supplied to the spin coater side by pumping, and in one storage container When everything is exhausted, it will be replaced by a new reservoir.
The storage container is in the form of a conventional container having a storage space therein. Since the photoresist has a characteristic of reacting to light, the storage container is usually black so that the inflow of light is blocked, so that the remaining amount of the photoresist inside cannot be confirmed from the outside.
As described above, the storage container is inserted deeply through the inlet nozzle for the extraction of the photosensitive liquid therein.
However, in the past, a situation in which a portion of the photoresist accommodated therein may be left unused and partially discarded on the bottom, depending on the mounting position of the drawer nozzle of the storage container. As a result, some of the expensive photoresist, which occupies most of the cost of the process, is wasted, thereby increasing the manufacturing cost.
In addition, if the remaining photoresist is discarded as it is, the photoresist may cause environmental pollution.
An object of the present invention is to provide a semiconductor photosensitive liquid storage container which can reduce the waste of the photosensitive liquid.
The present invention provides a semiconductor photosensitive liquid storage container capable of preventing contamination of an environment caused by the container being discarded with the photosensitive liquid remaining.
The semiconductor photoconductive storage container according to the present invention for achieving these objects is characterized in that the inside of the container has a tapered shape so that the photoresist can remain to a minimum.
The detailed configuration of the semiconductor photosensitive liquid storage container according to the present invention is characterized in that the lower portion is formed of a funnel shape along the inner circumference so that the photosensitive liquid can be collected by gravity, and is introduced into the housing to discharge the photosensitive liquid to the outside. It is a point which comprises the nozzle for doing so.
Another detailed configuration of the semiconductor photoresist storage container according to the present invention is that the bottom of the funnel shape is located at the center of the container or at the lower side of the side of the container.
Another detailed configuration feature of the semiconductor photoresist storage container according to the present invention is that the nozzle is drawn from the top of the storage container or from the lower side of the side.
Effects of the semiconductor photoconductive storage container according to the present invention are as follows.
First, it is possible to reduce the remaining photoresist, which can prevent economic losses.
Second, it is possible to reduce the remaining photoresist to prevent environmental pollution.
Hereinafter, a semiconductor photoresist storage container according to the present invention will be described with reference to the accompanying drawings.
2 is an exemplary view showing the structure of a photosensitive liquid storage container according to an embodiment of the present invention.
The configuration of the photosensitive liquid storage container according to the present invention consists of two main elements. It consists of a housing having a space formed therein for storing the photosensitive liquid, and a nozzle introduced into the housing for discharging the photosensitive liquid volumed in the housing to the outside.
Looking at the configuration, the housing of the photosensitive liquid storage container according to the present invention is formed in the shape of the funnel along the inner periphery so that the photosensitive liquid can be collected by gravity. On the other hand, the nozzle is connected to the lowermost part so that the remaining photosensitive liquid collected at the lowermost part of the funnel shape can be discharged to the outside.
The angle of inclination of the bottom forming the funnel shape may vary depending on the viscosity of the photosensitive liquid used. In other words, the high viscosity of the volumetric photosensitive liquid has a high inclination structure, and the low viscosity of the photosensitive liquid allows the photosensitive liquid to be collected at the lowermost end of the center under the influence of gravity.
3 is an exemplary view showing the structure of a photosensitive liquid storage container according to another embodiment of the present invention. Unlike the embodiment illustrated in FIG. 2, it can be seen that the position of the lowermost end where the photoresist is collected is located at the lower side of the side rather than the center of the bottom of the container. In addition, the lowermost end is provided with a discharge port can discharge the photosensitive liquid to the outside through a nozzle connected to the discharge port.
In the present embodiment, but the nozzle is connected through the discharge port formed in the lower side of the side as an example, as in the embodiment of Figure 2, it may be drawn through the upper portion of the container may be connected to the lower end.
1 is an exemplary view showing a structure of a photosensitive liquid storage container generally used.
2 is an exemplary view showing the structure of a photosensitive liquid storage container according to an embodiment of the present invention.
3 is an exemplary view showing the structure of a photosensitive liquid storage container according to another embodiment of the present invention.
Claims (4)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020070136211A KR20090068543A (en) | 2007-12-24 | 2007-12-24 | A photo resist container |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020070136211A KR20090068543A (en) | 2007-12-24 | 2007-12-24 | A photo resist container |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20090068543A true KR20090068543A (en) | 2009-06-29 |
Family
ID=40995927
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020070136211A KR20090068543A (en) | 2007-12-24 | 2007-12-24 | A photo resist container |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR20090068543A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20130123488A (en) * | 2012-05-03 | 2013-11-13 | 주식회사 동진쎄미켐 | Sense system for detecting chemical solution and apparatus for supplying chemical solution by using the same |
-
2007
- 2007-12-24 KR KR1020070136211A patent/KR20090068543A/en not_active Application Discontinuation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20130123488A (en) * | 2012-05-03 | 2013-11-13 | 주식회사 동진쎄미켐 | Sense system for detecting chemical solution and apparatus for supplying chemical solution by using the same |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E601 | Decision to refuse application |