KR20090005736A - 기판 가열 장치 - Google Patents

기판 가열 장치 Download PDF

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Publication number
KR20090005736A
KR20090005736A KR1020070069018A KR20070069018A KR20090005736A KR 20090005736 A KR20090005736 A KR 20090005736A KR 1020070069018 A KR1020070069018 A KR 1020070069018A KR 20070069018 A KR20070069018 A KR 20070069018A KR 20090005736 A KR20090005736 A KR 20090005736A
Authority
KR
South Korea
Prior art keywords
substrate
chamber
reflector
short wavelength
lamp heater
Prior art date
Application number
KR1020070069018A
Other languages
English (en)
Korean (ko)
Inventor
박원석
김기덕
이용현
최승대
Original Assignee
주성엔지니어링(주)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주성엔지니어링(주) filed Critical 주성엔지니어링(주)
Priority to KR1020070069018A priority Critical patent/KR20090005736A/ko
Priority to PCT/KR2008/004060 priority patent/WO2009008673A2/en
Priority to TW97126203A priority patent/TWI433249B/zh
Priority to CN200880023470A priority patent/CN101689505A/zh
Publication of KR20090005736A publication Critical patent/KR20090005736A/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020070069018A 2007-07-10 2007-07-10 기판 가열 장치 KR20090005736A (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020070069018A KR20090005736A (ko) 2007-07-10 2007-07-10 기판 가열 장치
PCT/KR2008/004060 WO2009008673A2 (en) 2007-07-10 2008-07-10 Substrate heating apparatus
TW97126203A TWI433249B (zh) 2007-07-10 2008-07-10 基板加熱裝置
CN200880023470A CN101689505A (zh) 2007-07-10 2008-07-10 衬底加热装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070069018A KR20090005736A (ko) 2007-07-10 2007-07-10 기판 가열 장치

Publications (1)

Publication Number Publication Date
KR20090005736A true KR20090005736A (ko) 2009-01-14

Family

ID=40229280

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070069018A KR20090005736A (ko) 2007-07-10 2007-07-10 기판 가열 장치

Country Status (4)

Country Link
KR (1) KR20090005736A (zh)
CN (1) CN101689505A (zh)
TW (1) TWI433249B (zh)
WO (1) WO2009008673A2 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103839854A (zh) * 2012-11-23 2014-06-04 北京北方微电子基地设备工艺研究中心有限责任公司 半导体加工设备及其去气腔室和加热组件
KR101796626B1 (ko) * 2014-05-29 2017-11-13 에이피시스템 주식회사 기판 열처리 장치
US10711348B2 (en) * 2015-03-07 2020-07-14 Applied Materials, Inc. Apparatus to improve substrate temperature uniformity
JP6554328B2 (ja) 2015-05-29 2019-07-31 株式会社Ｓｃｒｅｅｎホールディングス 熱処理装置
US10932323B2 (en) 2015-08-03 2021-02-23 Alta Devices, Inc. Reflector and susceptor assembly for chemical vapor deposition reactor
KR102407266B1 (ko) * 2019-10-02 2022-06-13 세메스 주식회사 지지 유닛, 이를 포함하는 기판 처리 장치 및 기판 처리 방법

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR920009371B1 (ko) * 1990-05-21 1992-10-15 재단법인 한국전자통신연구소 양면 가열형 급속열처리 장치
JP3224508B2 (ja) * 1996-05-23 2001-10-29 シャープ株式会社 加熱制御装置
JP2006279008A (ja) * 2005-03-02 2006-10-12 Ushio Inc ヒータ及びヒータを備えた加熱装置

Also Published As

Publication number Publication date
WO2009008673A3 (en) 2009-03-05
CN101689505A (zh) 2010-03-31
WO2009008673A2 (en) 2009-01-15
TW200933778A (en) 2009-08-01
TWI433249B (zh) 2014-04-01

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application