KR20080113324A - Apparatus for forming an alignment layer of liquid crystal display device and method for forming an alignment layer using the same - Google Patents

Abstract

An apparatus for forming an alignment layer of a liquid crystal display device is provided to form an alignment layer using an optical non-contact method, thereby preventing the generation of foreign material on the surface of the alignment pattern, and removing the washing process. An alignment forming device(100) of a liquid crystal display device comprises a chamber(110), a stage(120), a plurality of light source, and a light splitter(150). The alignment layer is formed on the stage. The plurality of light source is prepared on the top of the stage. The light splitter splits light from the light source, and irradiates the split light to the alignment layer. An optical system(140) forms the alignment layer on the orientation film.

Description

Apparatus for forming an alignment layer of liquid crystal display device and method for forming an alignment layer using the same}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an alignment film forming apparatus for a liquid crystal display device, and more particularly, to an alignment film forming apparatus for a liquid crystal display device and an alignment film forming method using the same, in which an alignment pattern of the alignment film can be formed by optical interference of a laser.

Recently, as the modern society becomes information society, the importance of liquid crystal display (LCD), which is one of the information display devices, is gradually increasing in importance, and in particular, its size, weight, and low power consumption Due to such advantages, the use area is gradually increasing as an alternative means of overcoming the disadvantages of CRT (Cathode Ray Tube) and PDP (Plasma Display Panel).

In general, such a liquid crystal display device has a structure in which liquid crystal molecules are injected between two glass substrates. In this case, the liquid crystal molecules injected between the organic substrates are arranged in a specific direction in accordance with an electrical signal applied from the outside and are dynamic. By causing scattering, it serves to ensure that the light transmittance of the device is adjusted to an appropriate amount.

In this case, in order for the liquid crystal display device to exhibit a particular optical effect, it is necessary to align the liquid crystal molecules in a specific direction. Since the conventional liquid crystal molecules are only locally oriented, in the conventional production line, the liquid crystal molecules are aligned in a specific direction. In order to achieve this, an organic polymer film in direct contact with liquid crystal molecules is artificially formed on the ITO electrode. Such organic polymer films are commonly referred to as alignment films.

In a conventional production line, a rubbing cloth made of, for example, rayon, nylon, or the like is wound on a roller, and then the roller is brought into contact with the alignment film and rubbed with the surface of the alignment film, whereby the alignment film is " uniaxially or more than a predetermined level ( Uni-directional alignment "and" a range of pretilt angles "induce a series of alignment patterns to be formed.

In a conventional production line, such a process is commonly referred to as a "rubbing process". The rubbing process of an alignment film according to the prior art is described in, for example, US Pat. No. 4,634,228 "Ferroelectric liquid crystal cell having a rubbed polyimide alignment film", US Pat. No. 5,501,595, "An alignment film having a specific surface energy difference before and after rubbing. US Patent Publication No. 5710610 "Method and Apparatus for Generating Multiple Inclination Angles on Alignment Films Applied to Thin Film Transistors through Rubbing and Color Filter Glass Substrate of Liquid Crystal Display", US Patent No. 5744203 "Liquid Crystal Oriented film ”and the like.

In a conventional production line, for example, an alignment film raw material liquid consisting of "polyamic acid", "soluble polyimide", or the like is applied onto a substrate, and then pre-cured at about 60 ° C to 80 ° C with the alignment film raw material solution. curing) process and the rubbing process mentioned above with the polyimide oriented film by carrying out polyimide of the polyamic acid and soluble polyimide which were mentioned above, for example, by carrying out the main-curing process of about 180 to 200 degreeC. By advancing, the final finished alignment film can form a series of alignment patterns.

Thereafter, the production line cleans the surface of the alignment layer through a separate washing process using a cleaning solution, so that the final alignment layer can maintain the cleanliness above a predetermined standard.

However, as described above, in the conventional production line, the rubbing process is performed with a polyimide oriented film so that the final oriented film can receive a series of alignment patterns. In this case, the alignment film is unavoidably rubbing of the roller. The structure is in direct contact with the gun.

As such, when the conventional rubbing process is performed while the rubbing cloth of the roller and the alignment layer are in direct contact, various foreign substances such as particles and debris remains on the surface of the final alignment patterns, and these foreign substances are shipped. By continuing to exist in the liquid crystal display device, which has a huge adverse effect on the function of the liquid crystal display device.

As described above, in order to remove such foreign matters, since a separate washing process must be performed at the last step of the rubbing process, the entire process becomes complicated and the process efficiency must be taken.

On the other hand, as described above, when the rubbing process is carried out, the roller equipped with the rubbing cloth causes a wide range of friction with the surface of the alignment layer, in this case, strong static electricity is generated on the surface of the alignment layer, the static electricity is the final completion By remaining in the liquid crystal display device, the thin film transistors formed on the substrate are damaged, resulting in a problem that the function of the liquid crystal display device is remarkably degraded and the yield of the product is remarkably degraded.

Moreover, since the conventional rubbing process is essentially a "mechanical way" in which the rubbing cloth and the alignment film are in direct contact, it is inevitable in the production line to suffer the problem that the shape of the final completed alignment patterns cannot be precisely controlled. You must do it.

If the shape of the corresponding alignment patterns is not precisely controlled, and each of the alignment patterns has a "non-uniform profile" or a "partially broken profile", the liquid crystals in contact with the alignment patterns do not have a smooth alignment. As a result, the final liquid crystal display device has a problem that can not maintain the image quality of the excellent performance.

The present invention has been made to solve the above problems, an alignment film forming apparatus for a liquid crystal display device to form an alignment pattern of the alignment film by changing the alignment pattern forming method from the conventional mechanical contact method to the optical non-contact method and The purpose is to provide a method for forming an alignment film using the same.

In addition, the present invention has been made to solve the above problems, by forming an alignment film using an optical non-contact method to prevent the generation of foreign substances remaining on the surface of the alignment patterns in advance and at the same time a separate cleaning process An object of the present invention is to provide an alignment film forming apparatus for a liquid crystal display and an alignment film forming method using the same.

In addition, the present invention has been made to solve the above problems, by forming an alignment layer using an optical non-contact method to ensure a uniform profile of each alignment pattern of the alignment layer and at the same time liquid crystals can maintain a uniform alignment An object of the present invention is to provide an alignment film forming apparatus for a liquid crystal display device and an alignment film forming method using the same.

According to an aspect of the present invention, there is provided an alignment film forming apparatus for a liquid crystal display device comprising: a chamber for forming a process space; a stage on which the substrate on which the alignment film layer is formed is provided; The light source provided in the upper part to generate light and the light emitted from the light source are separated into a pair of light, and the separated pair of light is irradiated to the alignment film layer of the substrate to the alignment film layer by the pair of optical interference patterns. An optical system for forming an alignment film is provided.

The optical system includes a light splitter that separates the light into a pair of light having the same wavelength, and a first auxiliary optical system that enlarges one light separated by the light splitter and irradiates the alignment layer of the substrate at a predetermined angle. And a second auxiliary optical system for enlarging the other light separated by the light splitter and irradiating the same light with the position irradiated by the first auxiliary optical system.

The optical system further includes an optical expander for expanding the area of the light emitted from the light source, a spatial filter for removing unnecessary light from the light extended by the optical expander, and a light adjusting member for adjusting the characteristics of the light emitted from the light source. Equipped.

The first and second auxiliary optical systems each include a plurality of reflecting mirrors forming optical paths of the respective light and galvano mirrors for adjusting the optical paths of the light.

The alignment layer is formed by constructive interference of one light irradiated from the first auxiliary optical system and the other light irradiated from the second auxiliary optical system.

The stage further includes a substrate chuck for fixing the substrate.

The stage is provided as a cooling stage for preventing the substrate seated on the stage from being heated.

And a blower for blowing the process gas generated when the alignment layer is formed on the stage, and an inhaler provided at a position opposite to the blower to suck and discharge the process gas.

The stage is further provided with a transfer stage for transferring the stage on which the substrate is mounted in horizontal and vertical directions.

According to an aspect of the present invention, there is provided a method of forming an alignment layer for a liquid crystal display device, the substrate preparing step of forming an alignment layer on a surface of a substrate, separating light emitted from a light source into a pair of light, and separating the pair of light And a light irradiation step of expanding the light to the alignment film layer of the substrate at the same position so as to have a predetermined angle and forming the alignment film by optical interference in the alignment film layer by the pair of light.

In the light irradiation step, the light having a predetermined wavelength is emitted from the light source, separating the emitted light into a pair of light, expanding the separated light to irradiate the alignment layer layer, the remaining separated Expanding one light to irradiate at the same position as the one light.

In the forming of the alignment film, the alignment film is formed by constructive interference of the one light and the other light irradiated to the alignment film layer.

As described above, according to the alignment layer forming apparatus for a liquid crystal display and the alignment layer forming method using the same according to the present invention, the formation of the alignment layer using an optical non-contact method prevents generation of foreign substances remaining on the surface of the alignment patterns in advance. At the same time, there is an effect that can omit a separate cleaning process.

In addition, according to the alignment layer forming apparatus for a liquid crystal display device and the alignment layer forming method using the same according to the present invention, by forming an alignment layer using an optical non-contact method to ensure a uniform profile of each alignment pattern of the alignment layer and at the same time the liquid crystal is uniform There is an effect that can maintain one orientation.

In the description of the present invention, the terms defined are defined in consideration of functions in the present invention, and should not be understood as meanings that limit the technical components of the present invention.

First, the structure of a general liquid crystal display device will be briefly described before explaining the present invention.

1 is a cross-sectional view showing the internal structure of a general liquid crystal display device.

As shown, the liquid crystal display device is largely divided into a TFT substrate 10 and a color filter substrate 30 and a liquid crystal layer 20 provided between the TFT substrate 10 and the color filter substrate 30.

The TFT substrate 10 has a gate electrode 11 made of a conductive material such as a metal, and a gate insulating film 12 made of a silicon nitride film (SiNx) or a silicon oxide film (SiO ₂ ) is formed thereon. Covering. An active layer 13 made of amorphous silicon is formed on the gate insulating layer 12 on the gate electrode 11, and an ohmic contact layer 14 made of amorphous silicon doped with impurities is formed thereon.

A source electrode 14a and a drain electrode 14b made of a conductive material such as a metal are formed on the ohmic contact layer 14. The source electrode 14a and the drain electrode 14b are formed together with the gate electrode 11. It forms a thin film transistor.

Although not shown, the gate electrode 11 is connected to the gate wiring, the source electrode 14a is connected to the data wiring, and the gate wiring and the data wiring are orthogonal to each other to define the pixel region.

Next, a protective layer 15 made of a silicon nitride film, a silicon oxide film, or an organic insulating film is formed on the source electrode 14a and the drain electrode 14b, and the protective layer 15 includes a contact hole exposing the drain electrode 14b. Has 16).

A pixel electrode 17 made of a transparent conductive material is formed in the pixel area above the passivation layer 15, and the pixel electrode 17 is connected to the drain electrode 14b through the contact hole 16. The first alignment layer 18 formed of a material such as polyimide and having a predetermined direction is formed on the pixel electrode 17.

On the other hand, the TFT substrate 10 is spaced apart from the TFT substrate 10 at regular intervals, and a transparent color filter substrate 30 is disposed.

A black matrix 31 is formed at a portion corresponding to the thin film transistor under the color filter substrate 30. Although not shown, the black matrix 31 covers portions other than the pixel electrode 17. A color filter 32 is formed below the black matrix 31, and the color filter 32 includes three colors of red (R), green (G), and blue (B) in sequence, and one color The color corresponds to one pixel area. Next, a common electrode 33 made of a transparent conductive material is formed under the color filter 32, and a second alignment layer made of a material such as polyimide and formed on the surface thereof in a predetermined direction under the common electrode 33. 34 is formed.

Such a liquid crystal display includes a TFT substrate 10 forming process for forming a thin film transistor and a pixel electrode, a color filter substrate 30 forming process for forming a color filter and a common electrode, and an arrangement of the two substrates 10 and 30 manufactured. And a liquid crystal cell process in which a liquid crystal material is injected and encapsulated, and a polarizer (not shown) is attached.

Meanwhile, the alignment layer forming apparatus to be described below is for the first and second alignment layers 18 and 34 formed on the TFT substrate 10 and the color filter substrate 30, respectively, and the substrate 200 and the alignment layer 220 will be described below. The description and drawings of other components than the substrate 200 and the alignment layer 220 may be omitted since they may obscure the subject matter of the present invention.

Hereinafter, an alignment layer forming apparatus for a liquid crystal display according to the present invention will be described in detail with reference to the accompanying drawings.

2 is a conceptual diagram illustrating an alignment film forming apparatus for a liquid crystal display according to the present invention, and FIG. 3 is a perspective view illustrating a main part of the alignment film forming apparatus for a liquid crystal display according to the present invention.

As illustrated, the alignment layer forming apparatus 100 according to the present invention includes a stage 110 on which a chamber 110 forming a process space and a substrate 200 provided inside the chamber 110 are mounted. 120, the light source 130 provided on the stage 120 to generate laser light, and the alignment film layer 210 applied to the substrate 200 by processing light emitted from the light source 130. The optical system 140 for forming the alignment film 220 is provided.

The substrate 200 is made of a material having a high transmittance such as glass, quartz or CaF ₂ having excellent light transmittance. Preferably, the TFT substrate 200 and the color filter substrate 200 may be formed of a material suitable for use.

The alignment layer 210 applied to the substrate 200 is formed on the surface of the substrate 200 by dyeing, printing, pigment dispersion, electrodeposition, or the like. Preferably, a pigment dispersion method is used. As such, the alignment layer 210 is mainly made of a polyimide organic material. The organic material of the polyimide series is easy to be oriented and is suitable for mass production, stable in orientation and easy to control the pretilt angle.

The chamber 110 is to create a process environment for forming the alignment layer 220 on the alignment layer 210 formed on the substrate 200, and the substrate 200 is introduced or discharged on one side (or one side and the other side). A door (not shown) to be provided is provided, and a separate load lock chamber (not shown) for supplying and recovering the substrate 200 may be further provided adjacent to the door. The chamber 110 is provided to maintain a vacuum state according to the process environment of the substrate 200.

The stage 120 is for fixing the substrate 200 to which the alignment layer 210 is applied, and a substrate chuck 122 having a predetermined flatness is provided. The substrate chuck 122 may be provided as a ceramic electrostatic chuck (ESC) using a constant power, a polyimide electrostatic chuck or a vacuum chuck using a vacuum suction force.

In addition, the stage 120 may cover the substrate 200 to prevent the substrate 200 from being heated by light irradiation when the alignment layer is formed as light is irradiated onto the alignment layer layer 210 applied to the substrate 200. It may be provided in the form of a cooling stage for cooling. Such a cooling stage may be implemented by injecting nitrogen gas (N ₂ ) at low temperature and circulating nitrogen gas.

On the other hand, the stage 120 is transferred to the stage 120 to sequentially form the alignment layer on the surface of the alignment layer layer 210 of the substrate 200 by moving the substrate 200 in the horizontal and vertical direction as the area of the substrate increases in size. A separate transfer stage (not shown) may be further provided to horizontally and vertically transfer the seated substrate 200.

In addition, a separate blower 124 may be disposed at one side of the stage 120 to remove a process gas generated when the alignment layer 220 is formed by interference by a pair of first and second lights L1 and L2 that are irradiated. It may be further provided, on the opposite side of the blower 124 may be further provided with an inhaler 126 for suctioning and discharging the process gas moved by the blower 124. At this time, the gas discharged by the blower 124 is preferably inert gas nitrogen gas.

The light source 130 irradiates a pair of first and second lights L1 and L2 to the pair of first and second lights L1 and L2 irradiated by irradiating the pair of first and second lights L1 and L2 onto the alignment layer layer 210 applied to the substrate 200. This is for forming the alignment film by constructive interference and destructive interference.

The light source 130 is a parallel light flux, and a laser light source that emits laser light in the form of a coherent excellent coherent wave is preferable, and high power such as CO ₂ laser, Nd: YAG laser, Ar laser, Kr laser, and the like. The laser can be selected and used according to the situation of the production line.

 On the other hand, the light L emitted from the light source 130 preferably has a wavelength (several nm to several hundred nm) required for forming the alignment layer 220 of the alignment layer 210 applied to the substrate 200.

The optical system 140 processes the light L emitted from the light source 130 to be separated into a pair of first and second lights L1 and L2, and separates the pair of first and second lights L1 and L2. The first and second light areas of the substrate 200 are enlarged to overlap the irradiation with the alignment layer 210 of the substrate 200.

The optical system 140 includes a light expander 141 for firstly expanding the light L emitted from the light source 130, and a spatial filter for removing unnecessary light from the light L extended by the light expander 141. 142, a light adjusting member 143 for adjusting characteristics of light emitted from the light source, a light splitter 150 for separating light L into a pair of first and second lights L1 and L2, and light First and second auxiliary optical systems 144a and 144b which enlarge each of the first and second lights L1 and L2 separated by the divider 150 and irradiate the same area of the alignment layer 210 at a predetermined angle. do.

Here, the optical expander 141 is composed of a plurality of lenses to expand the incident light L to a size suitable for processing light components. The optical expander 141 may be provided in plural if necessary according to the optical area extended by the first and second auxiliary optical systems 144a and 144b which will be described later.

And the light adjusting member 143 may be provided as a polarizing plate for adjusting the optical properties, such light control member 143 is installed when precise control of the light (L), the light emitted from the light source ( If the characteristics of L) are guaranteed, they may not be installed.

In addition, the light splitter 150 divides the light L emitted from the light source 130 into a pair of first and second lights L1 and L2, and repeatedly deposits two or more kinds of materials having different refractive indices. It has a structure. The light splitter 150 divides the incident light L at a predetermined ratio to refract one light L and pass the other light L.

On the other hand, the first and second auxiliary optical systems 144a and 144b extend the pair of first and second lights L1 and L2 divided by the above-described light splitter 150, respectively, and are applied to the alignment layer layers ( In order to irradiate the same area of the 210, a plurality of reflecting mirrors 145 for forming the respective optical paths, and the respective light formed by the reflecting mirrors 145 to the same path of the substrate 200 The first and second extended irradiation machines 147a and 147b which are enlarged and irradiated to a predetermined area are provided in the.

Here, one reflecting mirror 145 of the plurality of reflecting mirrors 145 provided in the first and second auxiliary optical systems 144a and 144b is used to correct the light paths formed by the respective reflecting mirrors 145. It may be provided with galvano mirrors (146a, 146b).

In addition, the first and second extended radiators 147a and 147b form an area in which the alignment layer 220 is formed by the pair of first and second lights L1 and L2 reflected by the reflection mirror 145 toward the substrate 200. The film is enlarged and irradiated onto the alignment film layer 210 of the substrate 200. The first and second expansion timings 147a and 147b are formed by a plurality of lens combinations, and are preferably spherical by a plurality of cylindrical lenses.

 Accordingly, each of the lights L, which are enlarged by the first and second extended radiators 147a and 147b and irradiated onto the substrate 200, causes reinforcement interference and destructive interference in the alignment layer 210 of the substrate 200, thereby causing the alignment layer ( Partial shrinkage of the 210 may be caused to form the alignment layer 220.

Accordingly, the operation of the alignment film forming apparatus for a liquid crystal display device according to the present invention will be described in detail with reference to the embodiment. Each of the elements mentioned below should be understood with reference to the above description and FIGS. 1 to 3.

4 is a flowchart illustrating an operation process of the alignment film forming apparatus for a liquid crystal display according to the present invention, and FIGS. 5A to 5C are process charts showing the formation of the alignment film by the alignment film forming apparatus for a liquid crystal display according to the present invention.

First, prior to explaining the operation of the alignment film forming apparatus 100 according to the present invention, the alignment film layer 210 is preferentially formed on the substrate 200 of the present invention and is supplied to the alignment film forming apparatus 100. The alignment layer 210 formed on the substrate 200 is formed by applying a polyimide-based organic material, and heating the alignment layer 210 to a predetermined temperature (about 60 to 105 ° C.) to perform a polyimidization reaction. Induced to form a cured alignment layer 210 (step S110).

 The substrate 200 prepared by the above process is introduced into the alignment layer forming apparatus 100 according to the present invention, and the substrate 200 provided in the chamber 110 is seated on the stage 120 and the stage 120 is provided. The substrate is fixed by the substrate chuck 122 provided in the).

Thereafter, the light L having a predetermined wavelength is emitted from the light source 130, and the light L emitted from the light source 130 is the light expander 141, the spatial filter 142, and the light adjusting member 143. The optical characteristic is adjusted by the light splitter 150 and split into a pair of first and second lights L1 and L2 by the light splitter 150.

Each of the first and second beams L1 and L2 divided therefrom proceeds to the first and second extended radiators 147a and 147b by a plurality of reflecting mirrors 145 and galvano mirrors 146a and 146b. Each of the first and second light beams L1 and L2 traveling to the first and second extended radiators 147a and 147b is formed on the substrate 200 by the first and second extended radiators 147a and 147b. Is irradiated to the same area (step S120).

In this case, each of the first and second lights L1 and L2 irradiated to the alignment layer 210 has a wavelength of several nm to several hundred nm, and each of the first and second lights L1 and L2 is irradiated to the same area. Therefore, interference phenomena (reinforcement interference and destructive interference) are generated by the same wavelength, and such interference phenomenon causes light induced generation of mobile charge according to the intensity of the interference pattern in the alignment layer 210. ) Is generated (step S130).

Accordingly, the shrinkage of the alignment layer 210 according to the interference pattern is induced according to the intensity of the interference pattern generated in the alignment layer 210, and a groove is formed by the contraction of the alignment layer 210.

Meanwhile, in the case of using the high power light source 130, grooves may be formed while the alignment layer 210 is melted or evaporated according to the strength of the interference pattern generated in the alignment layer 210.

In addition, the process gas generated when the alignment layer layer 210 is contracted (or melted or evaporated) is processed and discharged by the blower 124 and the inhaler 126. By the groove formed by this process, the alignment layer 220 which serves to align the liquid crystal molecules in a specific direction is formed.

Meanwhile, an additional curing process may be performed for stability of the groove formed on the alignment layer 220 in the above-described process, and particles remaining on the surface of the alignment layer 220 may be removed through a separate cleaning process using a cleaning solution. .

Although described in detail with respect to preferred embodiments of the present invention as described above, those of ordinary skill in the art, without departing from the spirit and scope of the invention as defined in the appended claims Various modifications may be made to the invention. Therefore, changes in the future embodiments of the present invention will not be able to escape the technology of the present invention.

1 is a cross-sectional view showing the internal structure of a general liquid crystal display device.

2 is a conceptual diagram illustrating an alignment film forming apparatus for a liquid crystal display according to the present invention.

3 is a perspective view showing the main part of the alignment film forming apparatus for a liquid crystal display device according to the present invention.

4 is a flowchart illustrating an operation process of an alignment layer forming apparatus for a liquid crystal display according to the present invention.

5A to 5C are process drawings showing the formation of an alignment film by the alignment film forming apparatus for a liquid crystal display device according to the present invention.

** Description of the symbols for the main parts of the drawings **

100: alignment film forming apparatus

110: chamber

120 stages

130: light source

140: optical system

Claims (15)

A chamber forming a process space, When provided inside the chamber, the stage on which the substrate on which the alignment layer is formed is seated; At least one light source provided on the stage to generate light; And an optical system for separating the light emitted from the light source into a pair of light and irradiating the separated pair of light to the alignment film layer of the substrate to form the alignment film on the alignment film layer by the pair of optical interference patterns. An alignment film forming apparatus for a liquid crystal display device. The method of claim 1, wherein the optical system, A light splitter for separating the light into a pair of light; A first auxiliary optical system which enlarges one light separated by the light splitter and irradiates the alignment layer of the substrate at a predetermined angle; And a second auxiliary optical system for enlarging the other light separated by the optical splitter and irradiating the same to the position irradiated by the first auxiliary optical system. The method of claim 2, wherein the optical system An optical expander for expanding an area of the light emitted from the light source; A spatial filter for removing unnecessary light from the light extended by the optical expander; And a light adjusting member for adjusting a property of light emitted from the light source. The method of claim 2, The first auxiliary optical system and the second auxiliary optical system include a plurality of reflecting mirrors forming an optical path of each light; And a galvano mirror for adjusting the optical path of the light, respectively. The method of claim 2, And the alignment layer is formed by constructive interference of one light irradiated from the first auxiliary optical system and the other light irradiated from the second auxiliary optical system. The method of claim 1, And the stage further comprises a substrate chuck for fixing the substrate. The method of claim 1, And the substrate chuck is a vacuum chuck using a vacuum suction force. The method of claim 1, And the substrate chuck is selected from a ceramic electrostatic chuck using a electrostatic force, a polyimide electrostatic chuck, and the like. The method of claim 1, And the stage is provided as a cooling stage for preventing the substrate seated on the stage from being heated. The method of claim 1, And a blower for blowing the process gas generated when the alignment layer is formed on the stage, and an inhaler provided at a position opposite to the blower to suck and discharge the process gas. Forming device. The method of claim 1, And the stage further comprises a transfer stage for transferring the stage on which the substrate is mounted in horizontal and vertical directions. The method of claim 1, And the chamber is formed in a vacuum state to create a process environment of the substrate. A substrate preparation step of forming an alignment layer on the surface of the substrate, A light irradiation step of separating the light emitted from the light source into a pair of light, and expanding the incident light into the same position to have a predetermined angle on the alignment layer of the substrate, And an alignment film forming step of forming an alignment film by optical interference in the alignment film layer by the pair of light. The method of claim 13, wherein the light irradiation step Emitting light having a predetermined wavelength from a light source, Separating the emitted light into a pair of light, Expanding the separated single light to irradiate the alignment layer; And expanding the remaining one light to be irradiated at the same position as the one light. The method of claim 13, wherein the forming of the alignment layer comprises: And the alignment film is formed by constructive interference between the one light and the other light irradiated to the alignment film layer.

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