KR20080098158A - 잉크 젯 프린트 헤드 - Google Patents
잉크 젯 프린트 헤드 Download PDFInfo
- Publication number
- KR20080098158A KR20080098158A KR1020070043488A KR20070043488A KR20080098158A KR 20080098158 A KR20080098158 A KR 20080098158A KR 1020070043488 A KR1020070043488 A KR 1020070043488A KR 20070043488 A KR20070043488 A KR 20070043488A KR 20080098158 A KR20080098158 A KR 20080098158A
- Authority
- KR
- South Korea
- Prior art keywords
- ink
- nozzle
- membrane
- pressure chamber
- print head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000012528 membrane Substances 0.000 claims abstract description 49
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 238000007599 discharging Methods 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052710 silicon Inorganic materials 0.000 claims description 12
- 239000010703 silicon Substances 0.000 claims description 12
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 10
- 239000012212 insulator Substances 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 5
- 238000009736 wetting Methods 0.000 description 8
- 238000005530 etching Methods 0.000 description 7
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 5
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000007517 polishing process Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- ONRPGGOGHKMHDT-UHFFFAOYSA-N benzene-1,2-diol;ethane-1,2-diamine Chemical compound NCCN.OC1=CC=CC=C1O ONRPGGOGHKMHDT-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
- B41J2/04—Ink jet characterised by the jet generation process generating single droplets or particles on demand
- B41J2/045—Ink jet characterised by the jet generation process generating single droplets or particles on demand by pressure, e.g. electromechanical transducers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1604—Production of bubble jet print heads of the edge shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
Description
Claims (7)
- 압력 챔버에서 발생하는 압력 변화에 의해 외부로 잉크를 토출하는 노즐이 형성된 기판 상부에 접합하여 형성되며, 상기 노즐이 형성된 부분이 다른 부분보다 두껍게 형성된 멤브레인; 및상기 멤브레인 상부의 상기 압력 챔버에 대응하는 위치에 형성된 압전 액츄에이터를 포함하여 이루어지는 잉크 젯 프린트 헤드.
- 압력 챔버에서 발생하는 압력 변화에 의해 외부로 잉크를 토출하는 노즐이 형성된 기판 상부에 접합하여 형성되는 멤브레인;상기 멤브레인 상부의 상기 노즐에 대응하는 위치에 형성된 댐 구조물; 및상기 멤브레인 상부의 상기 압력 챔버에 대응하는 위치에 형성된 압전 액츄에이터를 포함하여 이루어지는 잉크 젯 프린트 헤드.
- 제1항 또는 제2항에 있어서,상기 잉크 젯 프린트 헤드는 사이드 슈터(Side Shooter) 방식인 것을 특징으로 하는 잉크 젯 프린트 헤드.
- 제1항 또는 제2항에 있어서,상기 기판은 표면이 (100)면 단결정 실리콘 기판인 것을 특징으로 하는 잉크 젯 프린트 헤드.
- 제1항 또는 제2항에 있어서,상기 멤브레인은 실리콘, 유리(Glass), SOI(Silicon On Insulator) 웨이퍼 중에서 선택된 어느 하나의 물질로 이루어지는 것을 특징으로 하는 잉크 젯 프린트 헤드.
- 제1항에 있어서,상기 노즐이 형성된 부분의 멤브레인의 두께는 300㎛~ 600㎛인 것을 특징으로 하는 잉크 젯 프린트 헤드.
- 제2항에 있어서,상기 댐 구조물의 두께는 300㎛~ 600㎛인 것을 특징으로 하는 잉크 젯 프린트 헤드.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020070043488A KR20080098158A (ko) | 2007-05-04 | 2007-05-04 | 잉크 젯 프린트 헤드 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020070043488A KR20080098158A (ko) | 2007-05-04 | 2007-05-04 | 잉크 젯 프린트 헤드 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20080098158A true KR20080098158A (ko) | 2008-11-07 |
Family
ID=40285737
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020070043488A Ceased KR20080098158A (ko) | 2007-05-04 | 2007-05-04 | 잉크 젯 프린트 헤드 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR20080098158A (ko) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8657412B2 (en) | 2011-09-30 | 2014-02-25 | Samsung Electro-Mechanics Co., Ltd. | Micro-ejection device |
| US8870356B2 (en) | 2010-06-28 | 2014-10-28 | Samsung Electro-Mechanics Co., Ltd. | Micro-ejector |
| US8919924B2 (en) | 2010-05-10 | 2014-12-30 | Samsung Electro-Mechanics Co., Ltd. | Inkjet print head and method of manufacturing the same |
-
2007
- 2007-05-04 KR KR1020070043488A patent/KR20080098158A/ko not_active Ceased
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8919924B2 (en) | 2010-05-10 | 2014-12-30 | Samsung Electro-Mechanics Co., Ltd. | Inkjet print head and method of manufacturing the same |
| US8870356B2 (en) | 2010-06-28 | 2014-10-28 | Samsung Electro-Mechanics Co., Ltd. | Micro-ejector |
| US8657412B2 (en) | 2011-09-30 | 2014-02-25 | Samsung Electro-Mechanics Co., Ltd. | Micro-ejection device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20070504 |
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| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20120504 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20070504 Comment text: Patent Application |
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| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20130626 Patent event code: PE09021S01D |
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| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20130830 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20130626 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |