KR20080061915A - Apparatus for preventing chemical liquid splattering of a substrate - Google Patents

Apparatus for preventing chemical liquid splattering of a substrate Download PDF

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Publication number
KR20080061915A
KR20080061915A KR1020060137108A KR20060137108A KR20080061915A KR 20080061915 A KR20080061915 A KR 20080061915A KR 1020060137108 A KR1020060137108 A KR 1020060137108A KR 20060137108 A KR20060137108 A KR 20060137108A KR 20080061915 A KR20080061915 A KR 20080061915A
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KR
South Korea
Prior art keywords
substrate
chemical liquid
upper head
blocking plate
main body
Prior art date
Application number
KR1020060137108A
Other languages
Korean (ko)
Inventor
김종담
한남진
Original Assignee
엘지디스플레이 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지디스플레이 주식회사 filed Critical 엘지디스플레이 주식회사
Priority to KR1020060137108A priority Critical patent/KR20080061915A/en
Publication of KR20080061915A publication Critical patent/KR20080061915A/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Liquid Crystal (AREA)

Abstract

An apparatus for preventing a chemical liquid from splattering to a substrate is provided to block EBR(Edge Bead Remover) which is jetted to remove edge beads of the substrate after photoresist is coated on the substrate from splattering. An apparatus for preventing a chemical liquid from splattering to a substrate(140) includes an upper head(110), a lower head(120), and blocking plate(130). The upper head is extended from the main body(100) of the apparatus toward the top face of the substrate to jet the chemical liquid to the top face of the substrate. The lower head is extended from the main body toward the bottom face of the substrate to jet the chemical liquid to the bottom face of the substrate. The blocking plate is located under the upper head and blocks the chemical liquid used to remove edge beads of the substrate from splattering to an active region of the substrate.

Description

Chemical liquid splash prevention device of board {APPARATUS FOR PREVENTING CHEMICAL LIQUID SPLATTERING OF A SUBSTRATE}

1 is an exploded perspective view schematically showing the structure of a liquid crystal display device according to the prior art;

2 is a front view of a chemical liquid splash prevention apparatus for a substrate according to the present invention.

*** Description of the symbols for the main parts of the drawings ***

100: main body 110: upper head

111,121: chemical liquid injection unit 112,122: gas injection unit

113,123 Cleaning part 120 Lower head part

130: blocking plate 140: substrate

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for preventing a substrate from being damaged by an EBR chemical liquid when removing edge beads generated in a manufacturing process of a liquid crystal display, and in particular, an EBR sprayed to remove an edge bead on a substrate. (EBR: Edge Bead Remover) The present invention relates to a chemical liquid splash prevention apparatus of a substrate, which is suitable for preventing the chemical liquid from splashing into an active area and damaging the portion thereof.

Recently, with the development of various electronic devices such as mobile phones, PDAs, computers, and large TVs, the demand for flat panel display devices that can be applied thereto is gradually increasing.

Such flat panel displays are being actively researched, such as LCD (Liquid Crystal Display), PDP (Plasma Display Panel), FED (Field Emission Display), VFD (Vacuum Fluorescent Display), but mass production technology, ease of driving means, Liquid crystal displays (LCDs) are in the spotlight for reasons of implementation.

In general, a liquid crystal display device individually supplies data signals according to image information to liquid crystal cells arranged in a matrix so that the light transmittance of the liquid crystal cells can be displayed in such a manner as to display a desired image. One flat panel display.

FIG. 1 is an exploded perspective view schematically illustrating a structure of a general liquid crystal display device. Referring to the drawings, the liquid crystal display device will be described.

As shown in the figure, the liquid crystal display device includes a liquid crystal panel 1, which includes an array substrate 21, a color filter substrate 20 facing the array substrate 21, and the array substrate 21. And a liquid crystal layer 22 formed between the color filter substrate 20.

The liquid crystal forming the liquid crystal layer 22 is a material having optical anisotropy, and thus the light transmittance may be adjusted because the orientation is changed according to the applied voltage. Accordingly, a still image or a moving image corresponding to the light transmittance of the liquid crystal layer 22 is displayed on the liquid crystal display device.

In the array substrate 21, the gate lines 4 and the data lines 5 are vertically and horizontally arranged on the substrate to define pixels. A thin film transistor (TFT) 9, which is a switching element for driving the pixel, is formed at the intersection of the gate line 4 and the data line 5. The pixel electrode 7 is connected to the thin film transistor 9 to form an electric field with the common electrode 16 formed on the color filter substrate 20 to align the liquid crystal.

The color filter substrate 20 has a black matrix 2 formed at the boundary between the color filter layer 44 of red (R), green (G), and blue (B) color and the color filter layer for realizing color. The common electrode 16 is formed on the front surface of the color filter substrate 20.

The array substrate 21 and the color filter substrate 20 are bonded by a sealing material (not shown), and the liquid crystal layer is driven by driving the liquid crystal molecules by the thin film transistor 9 formed on the array substrate 21. Controlling the amount of light passing through (22) causes the information to be displayed.

The process for manufacturing the liquid crystal display includes a thin film deposition process, a photolithography process of exposing and developing a selected region of the thin film, and an etching process of removing the thin film of the selected region a plurality of times. In particular, the photolithography process includes a coating process for forming a photoresist film of a photosensitive material on a substrate and an exposure and developing process for patterning the same using a mask having a predetermined pattern.

In this case, a coating process for forming a photoresist film generally has various methods, but a spin coating method for coating a photoresist film by rotating the substrate is mainly used.

When the process of coating the photoresist film is completed, an edge bead removal device is used to remove the photoresist applied to unnecessary areas during the coating process. The edge bit removing device is provided with a pair of nozzles in the upper and lower portions of the substrate, one nozzle is a nozzle for injecting a chemical solution, another nozzle is a mixture of EBR chemical liquid and edge beads are dissolved It is a gas injection nozzle for discharging waste liquid to the outside of the substrate.

However, in the conventional edge bead removal device, the EBR chemical liquid injected to remove the edge bead splashes into the active region, and the portion thereof is damaged, thereby lowering the LCD manufacturing yield.

Accordingly, it is an object of the present invention to provide a chemical liquid splash prevention apparatus that blocks the ejection of the EBR chemical liquid sprayed to remove the edge bead of the substrate after coating the photoresist film on the substrate to the active region.

The present invention for achieving the above object comprises: an upper head portion extending from the main body in the direction of the upper surface of the substrate for injecting the chemical liquid on the upper side of the substrate; A lower head portion extending from the main body toward the lower surface of the substrate for injecting the chemical liquid to the lower side of the substrate; It is characterized in that it comprises a blocking plate installed in the lower portion of the upper head portion to block the chemical liquid injected to remove the edge bead of the substrate to the active area on the substrate.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

2 is a front view of the chemical liquid splash prevention apparatus of the substrate according to the present invention, as shown therein, extending from the main body 100 in the upper surface direction of the substrate 140 to spray the chemical liquid on the upper side of the substrate 140. An upper head part 110; A lower head part 120 extending from the main body 100 in a lower direction of the substrate 140 and injecting a chemical solution to the lower side of the substrate 140; It is configured to include a blocking plate 130 is installed in the lower portion of the upper head portion 110 to block the chemical liquid sprayed to remove the edge bead of the substrate 140 to the active area on the substrate.

The upper head part 110 is provided with a cleaning unit 113 for removing the edge bead formed on the upper surface of the substrate 140, the cleaning unit 113 and the chemical liquid injection unit 111 is injected with the chemical liquid It is composed of a gas injection unit 112 is injected gas.

The lower head part 120 is provided with a cleaning part 123 for removing the edge bead formed on the lower surface of the substrate 140, the cleaning part 123 and the chemical liquid injection part 121 to which the chemical liquid is injected; It is composed of a gas injection unit 122 is injected gas.

The operation of the edge bead shock prevention device of the present invention configured as described above is as follows.

The substrate 140, which is the object to be cleaned, is provided in a rectangular plate shape having long sides and short sides, and has a predetermined thickness. The substrate 140 is fixed at a predetermined distance between the upper head part 110 and the lower head part 120 of the edge bead removing device, and a fixing part (not shown) is installed for this purpose.

The edge bead removing device according to the present invention includes an upper head portion 110 which extends from the main body 100 in the upper surface direction of the substrate 140 and injects a chemical solution on the upper side of the substrate 140. The lower head portion 120 extending in the lower surface direction of the 140 and spraying the chemical liquid on the lower side of the substrate 140 is provided. The upper head portion 110 and the lower head portion 120 are spaced apart from each other so as not to contact the substrate 140. As a result, the main body 100 has a shape having an opening through which the substrate 140 is inserted as a whole.

The upper head part 110 is provided with a cleaning part 113 for removing the edge bead formed on the upper surface of the substrate 140, the cleaning part 113 is a chemical liquid injection part 111 and the gas to which the chemical liquid is injected It is composed of a gas injection unit 112 is injected.

The chemical liquid injection part 111 includes a chemical liquid container containing a chemical liquid for dissolving edge beads and a nozzle for injecting the chemical liquid onto a substrate. The chemical liquid dissolves and washes off the edge beads, although not particularly limited, thinner is preferable.

The gas injection unit 112 is provided to guide the chemical liquid in which the edge bead is dissolved and the waste liquid in which the edge bead is mixed to the outside of the substrate 140. To be guided out of 140.

The gas injected from the gas injection unit 112 is preferably a stable gas that does not affect the substrate 140 or other components, and is not particularly limited, but nitrogen gas (N 2 ) is preferable.

The chemical liquid injection unit 111 is to spray the chemical liquid in the direction perpendicular to the substrate 140, the chemical liquid is guided to the discharge port (not shown in the drawing) direction by the gas injected from the gas injection unit 112. The gas injection part 112 is formed to be inclined to a certain degree so that the injected chemical liquid is guided smoothly toward the outlet.

The lower head part 120 is provided with a cleaning part 123 for removing edge beads formed on the lower surface of the substrate 140 similarly to the upper head part 110. The difference is that the direction of the chemical liquid and the gas injected from the lower head portion 120 is the direction corresponding to the upper head portion 110.

In addition, the edge bead removing device according to the present invention may further comprise a moving device (for example, a motor) for moving the substrate 140. The edge bead removing device removes edge beads while moving in parallel from one end to the other end of the substrate 140 by the moving device. On the contrary, the edge bead may be removed as described above while the main body 100 of the edge bead removing device is fixed and the substrate 140 is moved.

However, some of the EBR chemical liquid injected to remove the edge bead of the substrate 140 sticks out toward the active region on the substrate 140, that is, the region opposite to the chemical liquid discharge direction. The blocking plate 130 was installed at the lower portion of the unit 110.

The blocking plate 130 is installed at the rear of the gas injection part 112 side by side with a slight distance from the gas injection part 112, and the lowermost part is also installed to maintain a predetermined distance from the substrate 140. .

As described in detail above, the present invention, after coating the photoresist film on the substrate of the liquid crystal display device, the edge bead by blocking the ejection of the EBR chemical to be sprayed to the active region to remove the edge bead on the substrate with a blocking plate, In the removal process, it is possible to prevent the LCD yield from being lowered by the EBR chemical.

Claims (3)

An upper head portion extending from the main body toward the upper surface of the substrate to inject the chemical liquid onto the substrate; A lower head portion extending from the main body toward the lower surface of the substrate for injecting the chemical liquid to the lower side of the substrate; And a blocking plate fixed to the lower portion of the upper head portion to block the chemical liquid ejected to remove the edge beads of the substrate from protruding into the active region on the substrate. 2. The chemical liquid splash prevention apparatus according to claim 1, wherein the blocking plate is disposed side by side with a slight distance from the gas injection unit at the rear of the gas injection unit installed in the upper head part. 2. The chemical liquid splash prevention apparatus according to claim 1, wherein the lowermost end of the blocking plate is provided to maintain a predetermined distance from the substrate.
KR1020060137108A 2006-12-28 2006-12-28 Apparatus for preventing chemical liquid splattering of a substrate KR20080061915A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020060137108A KR20080061915A (en) 2006-12-28 2006-12-28 Apparatus for preventing chemical liquid splattering of a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060137108A KR20080061915A (en) 2006-12-28 2006-12-28 Apparatus for preventing chemical liquid splattering of a substrate

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KR20080061915A true KR20080061915A (en) 2008-07-03

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100937913B1 (en) * 2008-03-14 2010-01-21 학교법인 두원학원 Coating Apparatus of Compressor Swash Plate and Coating Method Thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100937913B1 (en) * 2008-03-14 2010-01-21 학교법인 두원학원 Coating Apparatus of Compressor Swash Plate and Coating Method Thereof

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