KR20080030912A - Substrate for liquid crystal display device and method of fabricating the same - Google Patents

Abstract

A substrate for an LCD(Liquid Crystal Display) and a method of manufacturing the substrate are provided to prevent light leakage by using light-shielding regions formed through a simplified process and reduce the number of masks. A transparent substrate(101) is located on a stage of a laser apparatus. A laser beam with a predetermined power is irradiated to the transparent substrate to form light-shielding regions(LS) surrounding first, second and third light-transmitting regions(LT1,LT2,LT3). A color filter layer(115) including red, green and blue sub-color filters(115a,115b,115c) respectively located in the first, second and third light-transmitting regions is formed. The boundaries of the red, green and blue sub-color filters respectively correspond to the light-shielding regions.

Description

Substrate for liquid crystal display and its manufacturing method {SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME}

1 is an exploded perspective view of a liquid crystal display according to the related art.

2A to 2G are cross-sectional views of a conventional color filter substrate for manufacturing a liquid crystal display device.

3A to 3D are cross-sectional views illustrating a manufacturing process of a color filter substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

4A through 4D are cross-sectional views illustrating a manufacturing process of a color filter substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

5 is a schematic cross-sectional view of a liquid crystal display according to an embodiment of the present invention.

6 is a cross-sectional view of a color filter on thin film transistor (COT) structure liquid crystal display device according to an exemplary embodiment of the present invention.

<Description of the symbols for the main parts of the drawings>

101: substrate

115a, 115b, 115c: R, G, B sub-color filter

115: color filter layer 120: common electrode

LS: Light Blocking Area

LT1, LT2, LT3: first, second and third light transmission areas

The present invention relates to a liquid crystal display device, and more particularly, to a substrate for a liquid crystal display device including a light blocking region or a light blocking layer capable of preventing light leakage without a black matrix by a photolithography process, and a manufacturing method thereof. Recently, liquid crystal displays have been spotlighted as next generation advanced display devices having low power consumption, good portability, high technology value, and high added value. Among the liquid crystal display devices, an active matrix liquid crystal display device having a thin film transistor, which is a switching element that can control voltage on / off for each pixel region, has received the most attention due to its excellent resolution and video performance. have.

1 is an exploded perspective view of a liquid crystal display according to the related art. As shown in the drawing, the array substrate 10 and the color filter substrate 20 face each other with the liquid crystal layer 30 interposed therebetween, and the lower array substrate 10 has a top surface of the transparent substrate 12. And a plurality of gate lines 14 and data lines 16 arranged vertically and horizontally to define a plurality of pixel regions P, and the thin film transistor T is disposed at the intersections of the two lines 14 and 16. And a one-to-one correspondence with the pixel electrode 18 provided in each pixel region P. The color filter substrate 20 facing the array substrate is formed on the rear surface of the transparent substrate 22. A lattice-shaped black matrix 25 is formed around each pixel region P so as to cover non-display regions such as the gate wiring 14, the data wiring 16, and the thin film transistor T. Red is arranged in sequence to correspond to each pixel area (P) in, A green and blue color filter layer 26 is formed, and a transparent common electrode 28 is provided over the entire surface of the black matrix 25 and the red, green and blue color filter layers 26.

Although not shown in the drawings, these two substrates 10 and 20 are sealed with a sealant or the like along the edges to prevent leakage of the liquid crystal layer 30 interposed therebetween. In the boundary portion of each of the substrates 10 and 20 and the liquid crystal layer 30, upper and lower alignment layers (not shown) which impart reliability to the molecular alignment direction of the liquid crystal are interposed, and at least one of each of the substrates 10 and 20. The outer surface of the polarizing plate (not shown) is provided. In addition, a back-light is provided on the outer surface of the array substrate to supply light. The on / off signals of the thin film transistor T are sequentially scanned by the gate wiring 14. When the image signal of the data wiring 16 is transmitted to the pixel electrode 18 of the pixel region P applied and selected, the liquid crystal molecules are driven by the vertical electric field therebetween, and thus the light transmittance is changed. Branch images can be displayed.

A general liquid crystal display device having the above-described structure forms an array substrate and a color filter substrate, respectively, through an array substrate manufacturing process for forming a thin film transistor and a pixel electrode and a color filter substrate manufacturing process for forming a color filter and a common electrode, The cell process is completed through the cell process of bonding the liquid crystal between the two substrates, and after that, the manufacturing process of the color filter substrate after such a manufacturing process will be described with reference to the drawings.

2A through 2G are cross-sectional views of a conventional color filter substrate for manufacturing a liquid crystal display.

First, as shown in FIG. 2A, a metal material including chromium (Cr) or the like is deposited on the entire surface of the transparent substrate 60 to form a black matrix material layer 62, and then a photoresist is applied thereon. The photoresist layer 64 is formed.

Thereafter, an exposure mask 66 having a light transmission area TA and a blocking area BA is positioned on the photoresist layer 64, and then the photoresist layer 64 is formed through the exposure mask 66. Exposure is performed.

Next, as shown in FIG. 2B, the exposed photoresist layer (64 of FIG. 2A) is developed to form the photoresist pattern 68 corresponding to the portion where the black matrix is to be formed on the black matrix material layer 62. Form.

Next, as shown in FIG. 2C, the black matrix layer 62 (FIG. 2B) exposed to the outside of the photoresist pattern 68 is etched and removed to have first to third openings 70a, 70b, and 70c. The black matrix 72 is formed. Although not shown in the drawings, in plan view, the black matrix 72 has a lattice shape.

Next, as shown in FIG. 2D, the photoresist pattern (68a of FIG. 2C) remaining on the black matrix 72 is removed by stripping, and the first to third openings 70a are removed. A resist having one of red, green, and blue colors, for example, a red resist, is coated on the entire surface of the black matrix 72 having 70b and 70c, to form a red resist layer. Thereafter, an exposure mask (not shown) having a light transmission region and a light blocking region is positioned above the red resist layer (not shown), and then exposed to the red resist layer (not shown), and then When the exposed red resist layer (not shown) is developed, a red resist layer corresponding to a region to which light (UV light) is irradiated is left on the substrate 60 after the development, and light (UV light) The red resist layer (not shown) of the portion that is not irradiated and blocked by the blocking region of the exposure mask (not shown) is removed to correspond to the first opening 70a. 74a) is formed. In this case, the edge portion of the red sub color filter 74a is positioned to overlap the black matrix 72.

Next, as shown in FIG. 2E, the second and third openings are processed in the same manner as the method of forming the red sub color filter 74a, that is, the green resist and the blue resist are respectively applied and the mask process is performed to pattern the same. Green and blue sub-color filters 74b and 74c are sequentially formed at 70b and 70c, respectively.

Next, as shown in FIG. 2F, an overcoat layer 68 is formed by depositing a resin material on the red, green, and blue sub color filters 65a, 65b, and 65c. This is because the red, green, and blue sub-color filters 74a, 74b, and 74c of the portion formed overlapping with the black matrix 72 form a step with the portions formed in the openings 70a, 70b, and 70c. This is to form a flattened common electrode which does not have a step on the surface by having a surface.

Next, as illustrated in FIG. 2G, a transparent conductive material, indium-tin-oxide (ITO) or indium-zinc-oxide (IZO), is deposited on the overcoat layer 76 having the flat surface. 78), the color filter substrate for the liquid crystal display device is completed.

However, as described above, as the conventional black matrix is generally formed by a photolithography process, process time and cost are high. Furthermore, when the color filter and the black matrix are formed on the same substrate, at least four photolithography processes are required, and four exposure masks are required for this purpose. Therefore, since the exposure mask used in such a photovisual process is expensive, the use of the exposure mask in the manufacture of a color filter substrate increases the manufacturing cost, and the manufacturing process also increases, resulting in lower productivity. do.

In addition, the red, green, and blue sub color filters 74a, 74b, and 74c eliminate the steps of the red, green, and blue sub color filters 74a, 74b, and 74c and the common electrode 78 due to the step of the black matrix. Since the overcoat layer 76 must be further formed to have a flat surface between the) and the common electrode 78, there is a problem in that the productivity is further reduced because the process addition and the material cost are increased.

In addition, the black matrix 72 may be completely removed and left at the portion where the substrate 60 is to be exposed without being completely removed, thereby causing black spot defects, thereby lowering the yield.

In order to solve the above problems, it is a first object of the present invention to provide a substrate for a liquid crystal display device and a method for manufacturing the same, which prevent light leakage by using light blocking means manufactured by a simplified process.

A second object of the present invention is to provide a substrate for a liquid crystal display device and a method of manufacturing the same, which can reduce the number of masks.

It is a third object of the present invention to provide a substrate for a liquid crystal display device and a method of manufacturing the same, which can improve process yield by preventing black spot defects.

In order to achieve the above objects, in a first aspect of the present invention, there is provided a method comprising: disposing a transparent substrate on a stage of a laser device; Irradiating a laser beam having a predetermined power to the transparent substrate to form a light blocking region surrounding the first to third light transmitting regions in the transparent substrate; Forming a color filter layer including red, green, and blue sub color filters positioned in each of the first to third light transmitting regions; Boundary portions of the red, green, and blue sub-color filters correspond to the light blocking region, thereby providing a method of manufacturing a substrate for a liquid crystal display device.

The irradiating the laser beam may include moving the laser beam at a speed of 7,000 mm / sec to 10,000 mm / sec based on the substrate, wherein the predetermined power is 100 Watt to 200 Watt. The light blocking region has a thickness of one fifth (1/5) to one third (third) of the thickness of the transparent substrate.

The laser device is a neodymium-yttrium aluminum garnet (Nd-YAG) laser device for generating a laser beam having a wavelength of 1064 nanometers (nm), the transparent substrate is cesium (Cs), aluminum It is characterized in that the glass (glass) having at least one of (Al), rubidium (Rb) and sodium (Na).

In a second aspect of the invention, there is provided a method of forming a resin layer on a substrate; Placing the substrate on the stage of the laser device; Irradiating a laser beam having a predetermined power on the transparent substrate to form a light blocking region surrounding the first to third light transmitting regions in the resin layer; Forming a color filter layer including red, green, and blue sub color filters positioned in each of the first to third light transmitting regions; The boundary parts of the red, green, and blue sub color filters may correspond to the light blocking area.

The laser device is a neodymium-yttrium aluminum garnet (Nd-YAG) laser device for generating a laser beam having a wavelength of 1064 nanometers (nm), the step of irradiating the laser beam is the substrate It characterized in that it comprises a step of moving the laser beam at a speed of 10,000mm / sec to 12,000mm / sec based on, the predetermined power is characterized in that the 30 Watt (Watt) to 100 watts.

The resin layer may include a carbonate polymer, a polyester resin, and a black coloring agent compound. The resin layer may be formed to form a light blocking layer in the light blocking region. And removing the resin layer portion in the first to third light transmitting regions.

In a third aspect of the present invention, there is provided a transparent substrate comprising: a transparent substrate; A light blocking region surrounding the first to third light transmitting regions in the transparent substrate; Provided is a substrate for a liquid crystal display device including a color filter layer including red, green, and blue sub color filters respectively positioned in the first to third light transmitting regions and having the same thickness.

And a common electrode disposed on the color filter layer, wherein the light blocking region has a fifth (1/5) to one third (1/3) of the thickness of the transparent substrate. The transparent substrate is characterized in that the glass (glass) having at least one of cesium (Cs), aluminum (Al), rubidium (Rb) and sodium (Na).

In a fourth aspect of the present invention, there is provided a transparent substrate; A light blocking layer disposed on the transparent substrate and surrounding the first to third light transmitting regions; The light blocking layer includes red, green, and blue sub-color filters respectively positioned in the first to third light transmitting regions and having the same thickness as each other, wherein the light blocking layer includes carbonate polymer, polyester resin, and It provides a substrate for a liquid crystal display device, which is a resin containing a black colorant compound.

According to a fifth aspect of the present invention, there is provided a semiconductor device comprising: a first substrate, a second substrate corresponding to the first substrate and including first to third light transmitting regions surrounded by the light blocking region and the light blocking region; A red, green, and blue sub color filter on an inner surface of any one of the first and second substrates so as to correspond to the first to third light transmitting regions, respectively; a boundary of the red, green, and blue sub color filters A color filter layer corresponding to the light blocking region; Provided is a liquid crystal display including a liquid crystal layer positioned between the first and second substrates.

A common electrode on the second substrate; A thin film transistor positioned on an inner surface of the first substrate; A pixel electrode connected to the thin film transistor and corresponding to each of the red, green, and blue sub color filters; The semiconductor device may further include a patterned spacer positioned between the common electrode and the pixel electrode and corresponding to the light blocking region.

The color filter layer is positioned between the second substrate and the common electrode, and the color filter layer is positioned between the thin film transistor and the pixel electrode.

According to a sixth aspect of the present invention, a first substrate and a second substrate positioned to correspond to the first substrate and an inner surface on the second substrate surround the first to third light transmitting regions, and include a carbonate polymer and a poly A light blocking layer made of a resin material containing an ester resin and a black colorant compound; A red, green, and blue sub color filter on an inner surface of any one of the first and second substrates so as to correspond to the first to third light transmitting regions, respectively; a boundary of the red, green, and blue sub color filters A color filter layer corresponding to the light blocking region; Provided is a liquid crystal display including a liquid crystal layer positioned between the first and second substrates.

A common electrode on the second substrate; A thin film transistor positioned on an inner surface of the first substrate; A pixel electrode connected to the thin film transistor and corresponding to each of the red, green, and blue sub color filters; The semiconductor device may further include a patterned spacer positioned between the common electrode and the pixel electrode and corresponding to the light blocking layer.

The color filter layer is positioned between the second substrate and the common electrode, and the color filter layer is positioned between the thin film transistor and the pixel electrode.

Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

The substrate for a liquid crystal display according to the present invention uses a neodymium-yttrium aluminum garnet (Nd-YAG) laser device to apply a resin material layer on the substrate itself or the substrate, and then a specific wavelength with respect to the resin material layer. It is characterized by replacing the irradiated part by irradiating a laser beam of the black matrix to replace it with a neodymium-yttrium aluminum garnet (Nd-YAG) laser device used in the manufacture of a substrate having such characteristics Explain.

The laser device used in the present invention is a neodymium yag laser device that generates a laser beam having a wavelength of 1,064 nm. The neodymium yag laser is a solid-state laser source whose beam is generated by Nd ³⁺ ions, has high amplification, and is characterized by excellent mechanical properties and temperature properties.

The neodymium-yttrium aluminum garnet (Nd-YAG) laser device used in the present invention has a power of 100 Watts to 200 Watts and irradiates a laser beam at a speed of 7,000 mm / sec to 12,000 mm / sec. It is characterized by. In this case, the speed is a moving speed of the stage on which the laser head or substrate for irradiating the laser beam is placed. In the case of a CW (continuous wave) type laser, the time for which the laser beam is irradiated varies according to the laser head or stage speed. Finally, the energy density is determined.

The liquid crystal display substrate according to the present invention is a glass substrate when irradiating a transparent glass substrate or a resin material layer by appropriately adjusting the power or irradiation distance and the moving speed of the laser head (or stage) of the neodymium yag laser beam having such characteristics Alternatively, the laser beam irradiated portion of the resin material layer may be discolored to black to have the same effect as forming a black matrix.

Hereinafter, a method of manufacturing a color filter substrate for a liquid crystal display device using the neodymium yag laser device described above will be described.

3A to 3D are cross-sectional views illustrating a manufacturing process of a color filter substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

First, as shown in FIG. 3A, 100 Watts to 200 Watts above the transparent glass substrate 101 including one of cesium (Cs), aluminum (Al), rubidium (Rb), and sodium (Na). The head 191 of the neodymium yag laser device having a power of about watts and having a wavelength of 1,064 nm is positioned at a distance of about 10 mm to 20 mm with respect to the substrate 101, and has a speed of 7,000 mm / sec to 10,000 mm / sec. The laser beam is irradiated to the surface of the substrate 101 to move.

In this case, the laser beam irradiation process is relatively large for the substrate 101 made of a glass material containing one component of the cesium (Cs), aluminum (Al), rubidium (Rb), and sodium (Na). Since a laser beam having a power of 100 Watts to 200 Watts is irradiated, since a lot of heat is generated at the portion where the laser beam is irradiated, the substrate 101 is placed on the laser device (not shown). The stage (not shown) is preferably equipped with a cooling system to properly irradiate the laser beam 193 while appropriately cooling the substrate 101 so that the glass substrate 101 is not deformed by high heat.

In this case, the black matrix is typically formed to correspond to the gate wiring and the data wiring on the array substrate. In order to form a discolored portion in the same shape, the black matrix is formed to correspond to the portion where the conventional black matrix is formed. By turning the laser beam 193 on and off in one direction and turning the laser beam 193 on, the black discolored region (hereinafter referred to as the light blocking region LS) is formed with respect to the substrate 101. In this case, the line width w1 of the laser beam 193 can be selectively changed to 5 mm or more and several mm units, and after appropriately adjusting to 5 μm to 20 μm, the laser beam 193 is irradiated. The black-colored light blocking region LS having a width of about 5 μm to 20 μm may be formed inside the substrate 101. This is because one component of Cesium (Cs), Aluminum (Aluminum; Al), Rubidium (Rb), and Sodium (Na) contained in the glass substrate has a specific wavelength band (1064 nm) and power (energy density). It uses the characteristic of discoloring black in a transparent state by photon energy absorption by the laser beam irradiation of the. In this case, the glass substrate itself has many unbonded pairs of oxygen elements in addition to the cesium (Cs), aluminum (Al), rubidium (Rb), and sodium (Na) components, thereby absorbing energy by laser beam irradiation. As a result of the formation of electron-hole pairs, and due to the structural characteristics that can absorb energy, cesium (Cs), aluminum (Al), rubidium (Rb), and sodium (Na) may be sufficiently discolored. It is characterized by making the state a little faster.

In this case, the width w2 of the light blocking region LS formed by the irradiation of the laser beam 193 in the substrate 101 substantially by the resolution and the process error of the laser beam 193 and the thermal diffusion in the substrate 101. Is formed to have a width of about 1 μm to 2 μm larger than the line width w1 of the laser beam 193.

In this case, portions of the substrate 101 that are not irradiated with the laser beam 193, that is, portions surrounded by the light blocking region LS that are turned black by being irradiated with the laser beam 193, are each first for convenience of description. To third light transmissive regions LT1, LT2, and LT3. In this case, the first light transmission region LT1 is a region where a red sub-color filter will be formed later, the second light transmission region LT2 is green, and the third light transmission region LT3 is A blue sub-color filter is to be formed. Although not shown in the drawings, when viewed in plan view, the light blocking area LS has a lattice shape.

At this time, in the present invention, the light blocking region LS is not discolored to have a black color with respect to the entire thickness t1 of the substrate 101, but is thickened based on the upper surface of the substrate 101. It is preferable that only about 1/5 to 1/3 of (t1) be discolored. This black discolored portion, that is, the thickness t2 of the light blocking region LS can be adjusted by appropriately adjusting the intensity of the laser beam 193, more accurately, the power (100 Watts to 200 Watts) of the laser device (not shown). have.

On the other hand, in the laser beam irradiation process using the above-described laser device (not shown), the condition, in particular, the moving speed of the laser head 191 is adjusted to 10,000mm / sec, the line width (w1) of the laser beam to 10㎛ In one case, assuming that the laser beam 193 is irradiated with a single laser head 191 at intervals of 100 μm and 200 μm in the horizontal and longitudinal directions, respectively, on the substrate 101 having a length of 1m * 1m, It takes about 25 minutes, and if you divide the area on the substrate 101 with four laser heads or six laser heads, the processing time is about 4 to 6 minutes. This is a process time for depositing a metal material such as chromium (several to several tens of s / sec), and exposing, developing, etching, and stripping to form a black matrix (moving between unit process equipment in addition to unit processes). At least 10 minutes, including time, etc.) will be less than 1/2. Therefore, the process time is shortened, and further, the material cost is reduced by not using a developer, an etchant, a photoresist, or the like.

In this case, the substrate 101 itself having a flat surface is discolored to define the light blocking region LS and the first to third light transmitting regions LT1, LT2, and LT3, wherein the light blocking region LS is defined as Since the step is not formed inside the surface of the substrate 101, it is the biggest feature of the present invention that the problem of the step difference caused by the material layer formed on the upper part does not occur due to the progress of the process later.

Next, as shown in FIG. 3B, a red resist layer is applied by applying a red resist onto the substrate 101 including the light blocking region LS formed by being blackly discolored by irradiation of the laser beam (193 of FIG. 3A) without a step. (Not shown), and exposing it using an exposure mask (not shown) having a transmission region and a blocking region, and subsequently developing the exposed red resist layer to red the plurality of first regions 110a. The sub color filter 115a is formed. In this case, the red sub color filter 115a may be formed to surround the first region 110a and overlap the light blocking region LS formed on the substrate 101 itself. Since the light blocking area LS is formed inside the substrate 101 itself, the light blocking area LS does not generate a step, and thus the red sub color filter 115a overlaps the light blocking area LS and the first zero area. All of the portions formed in the station 110a are formed to have the same height h2 from the surface of the substrate 101.

The third thickness TT3 of the red sub color filter 115a across the first light transmitting region LT1 and the light blocking region LS is substantially uniform because the light blocking region LS and This is because the first to third light transmitting regions LT1, LT2, and LT3 have flat surfaces.

Next, as shown in FIG. 3C, the green resist is coated on the entire surface of the red sub color filter 115a, and the pattern is formed by performing the same process as the red sub color filter 115a. The green sub color filter 115b is formed for the second light transmission region LT2 of the second light transmission region LT2.

Thereafter, a blue resist is applied to the entire surface of the red and green sub color filters 115a and 115b, and then patterned as if the red and green sub color filters 115a and 115b are formed to form the plurality of third light transmissions. The blue sub color filter 115c is formed in the region LT3.

The red, green, and blue sub color filters 115a, 115b, and 115c are spaced apart from each other at an upper portion of the light blocking area LS.

Next, as illustrated in FIG. 3D, a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO) is disposed on the red, green, and blue sub color filters 115a, 115b, and 115c. By depositing a to form a common electrode 120 having a flat surface to complete the color filter substrate 101 for a liquid crystal display device according to the first embodiment of the present invention.

Alternatively, a patterned spacer (not shown) may be formed on the common electrode 120 above the light blocking region LS. For example, the patterned spacer may include benzocyclobutene (BCB), photo acryl, cytop, and perfluorocyclobutene (PFCB) on the light blocking region LS. May be formed by coating and patterning one).

On the other hand, the color filter substrate for a liquid crystal display device according to the first embodiment manufactured by the manufacturing method as described above is to form a light blocking layer by discoloring the irradiated portion by applying a laser beam irradiation to the substrate itself. After that, as a second embodiment of the present invention, a light blocking layer with a minimum step difference is formed by irradiating a relatively weak power of a neodymium yag laser beam to a resin material layer instead of the substrate itself. The manufacturing method of a color filter substrate is demonstrated.

In the method of manufacturing a color filter substrate for a liquid crystal display device according to a second embodiment of the present invention, heat is generated so as to deform the substrate at an irradiated portion by irradiating a laser beam through a neodymium yag laser device having a relatively small power. It is characteristic that a laser beam irradiation process can be performed, without providing a cooling apparatus in the stage which mounts a board | substrate.

4A to 4D are cross-sectional views illustrating a manufacturing process of a color filter substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

First, as shown in FIG. 4A, a resin layer 205 is formed on a transparent insulating substrate 201 such as glass. The resin layer 205 may be made of a resin material including a carbonate polymer, a polyester resin, and a black coloring agent compound.

For example, the resin layer 205 may have a thickness of 3,000 angstroms to 1 micron.

Subsequently, the substrate 201 on which the resin layer 205 is formed is positioned on a stage (not shown) of a neodymium yag laser device (not shown), and has a spaced interval h3 about 20 mm above the resin layer 205. After positioning the laser head 291 for irradiating the laser beam 293, the laser head 291 is moved to a linear reciprocating motion at a speed of 10,000mm / sec to 12,000mm / sec and the laser to the resin layer 205 The beam 293 is irradiated.

In this case, the neodymium yag laser device (not shown) generates a 1064nm wavelength laser beam 293 having a frequency of about 60 Hz and a power of about 30 Watts to about 100 Watts. The laser beam 293 generated in the neodymium yag laser device (not shown) has less heat generation at the portion whose intensity is irradiated smaller than the laser beam generated in the neodymium yag laser device according to the first embodiment.

The resin layer 205 in the remaining region is removed from the substrate except for the resin layer 205 which is turned into black by being irradiated with the laser beam 209. For example, selectively removing only the uncolored resin layer 205 by dipping a substrate including the resin layer 205 to which the laser beam 209 is irradiated in an isopropyl alcohol or an alcohol. can do.

Through the removing step, the light blocking layer 210 made of the resin layer 205 discolored in black is completed, and the areas in which the resin layer 205 is removed are first, second, and third of the light blocking layer 210. The open portions 215a, 215b, and 215c are formed. Although not shown in the drawing, when viewed in plan, the light blocking layer 210 has a lattice shape.

Since the thickness of the light blocking layer 210 is formed to be much thinner than that of the conventional chromium-based black matrix or resin-based black matrix, even if a step is generated between the open part and the light blocking layer 210 through the removing step, the thickness is negligible. Corresponds to the thickness of.

The problem caused by the step difference of the existing black matrix is a low-cell gap structure because the color filter overlapping with the black matrix is much higher than the height from the substrate of the color filter formed in the open portion of the substrate. In consideration of the trend, there is a problem that a short circuit may occur due to the height of the color filter overlapping the black matrix, but the black matrix according to the present invention hardly contributes to the height difference of each position of the color filter. The problem can be solved. Since the resin layer 205 used in the present invention itself includes a black colorant material, the resin layer 205 is easily discolored in comparison with glass even through a laser beam 293 having a relatively small intensity (energy density per unit area). The single layer 210 is formed, and the heat generation amount is also reduced in proportion to the intensity of the laser beam.

Next, as shown in FIG. 4B, a red resist layer is formed on the resin layer 205 to form a red resist layer (not shown), and an exposure mask (not shown) having a transmission region and a blocking region is used. The red sub color filter 220a is formed to overlap the first opening 215a and a portion of the light blocking layer 210 surrounding the first open part 215a by developing the exposed red resist layer (not shown).

Next, as shown in FIG. 4C, the green resist is coated on the entire surface of the red sub color filter 220a, and the pattern is formed by performing the same process as the red sub color filter 220a. The green sub color filter 220b is formed on the second open portion 215b of the light emitting layer and a portion of the light blocking layer 210 surrounding the same, and the same process is performed on the blue resist in succession to thereby form the plurality of third open portions 215c. ) And a blue sub color filter 220c for the light blocking layer 210 surrounding the light blocking layer 210.

Next, as shown in FIG. 4D, a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO) is applied onto the red, green, and blue sub color filters 220a, 220b, and 220c. Is deposited to form a common electrode 225 having a flat surface on the front surface, thereby completing the color filter substrate 201 for the liquid crystal display device according to the second embodiment of the present invention. In this step, the common electrode 225 is substantially flat and does not make a significant step with the substrate 201. Therefore, a separate overcoat layer is not required between the color filter layer 220 and the common electrode 225.

Meanwhile, in the above-described first and second embodiments, only the common electrode is formed as an example. However, recently, spacers configured to make the thickness of the liquid crystal layer of the liquid crystal display device constant are patterned on the color filter substrate. It is forming and can also be applied to the present invention.

Accordingly, when the first and second embodiments of the present invention are applied, a colorless transparent resin material such as benzocyclobutene (BCB), photo acryl, cytotope, and perfluorocyclobutene is disposed on the common electrode. By applying one of the (perfluorocyclobutene; PFCB) to form a second resin material layer and patterning it can be further formed to form a columnar patterned spacer having a predetermined height and spaced apart from each other to correspond to the light blocking layer.

5 is a schematic cross-sectional view of a liquid crystal display according to an exemplary embodiment of the present invention.

As illustrated, the array substrate 300 and the color filter substrate 400 face each other, and the liquid crystal layer 350 is disposed between the array substrate 300 and the color filter substrate 400. The array substrate 300 includes a first transparent substrate 302, a thin film transistor T including a gate electrode, a semiconductor layer, a source, and a drain electrode on the first transparent substrate 302, and the thin film transistor. And a pixel electrode 318 connected to (T). Specifically, the gate electrode 304 is located on the first transparent substrate 302, the gate insulating film 306 is located on the gate electrode 304, and the semiconductor layer 308 is the gate electrode 304. The upper portion of the gate insulating layer 306 is disposed on the gate insulating layer 306, and the drain electrode 312 spaced apart from the source electrode 310 is disposed on the semiconductor layer 308. Furthermore, a data line is connected to the source electrode 310, and the source electrode 310 extends substantially from the data line 314. The passivation layer 316 is formed on the source and drain electrodes 310 and 312 and has a drain contact hole 318 exposing a portion of the drain electrode 312. The pixel electrode 320 is formed on the passivation layer 316 and is connected to the drain electrode 312 through the drain contact hole 318.

The color filter substrate 400 includes red, green, and blue subs in the second transparent substrate 402 including the light blocking region LS and the first to third light transmitting regions LT1 (not shown). And a color filter layer 406 including color filters 406a and 406c, and a common electrode 408 on the color filter layer 406. Substantially, the pixel electrode 320 is formed to correspond to each of the red, green, and blue sub color filters 406a (not shown) 406c.

In addition, the patterned spacer 360 is positioned between the array substrate 300 and the color filter substrate 400 and corresponds to the light blocking area LS. Although not shown in the drawings, the first and second alignment layers (not shown) are formed inside the array substrate 300 and the color filter substrate 400 and contact the patterned spacer 360.

Alternatively, the patterned spacer 360 may be applied to a liquid crystal display device including a color filter substrate 400 having a light blocking layer 210 made of a resin material, as mentioned in the second embodiment. .

Hereinafter, a liquid crystal display device having a structure in which a color filter and an array element to which a black matrix is applied according to the present invention is formed on the same substrate will be described with reference to the drawings.

6 is a cross-sectional view of a color filter on thin film transistor (COT) structure liquid crystal display device according to an exemplary embodiment of the present invention.

As shown, the first substrate 500 has a structure in which the first and second substrates 500 and 600 are disposed to face each other and the liquid crystal layer 550 is interposed between the two substrates 500 and 600. The thin film transistor T including the gate electrode 502, the semiconductor layer 506, the source electrode 508, and the drain electrode 510 is formed thereon. The data line 512 is formed in connection with the source electrode 508, and a first passivation layer 514 is formed in an area covering the thin film transistor T, and the upper portion of the first passivation layer 514. A color filter layer 516 is formed thereon, and a second passivation layer 518 is formed on the color filter layer 516. The color filter layer 516 is composed of red, green, and blue sub color filters 516a, 516b (not shown). In the drawing, the color filter layer 516 is formed around the green sub color filter 516b. An adjacent red color filter 516a region is shown as an example. The first protective layer 514, the color filter layer 516, and the second protective layer 518 form a drain contact hole 520 that partially exposes the drain electrode 510. A pixel electrode 522 is formed on the second passivation layer 518 to be connected to the drain electrode 510 through the drain contact hole 520.

On the inner surface of the second substrate 600, which is another substrate, the light blocking region LS serving as a black matrix at a position corresponding to the thin film transistor T and the data line 512 is defined. The blocking region LS corresponds to a region in which only a part of the second substrate 600 is changed into black by laser beam irradiation. The method of forming the light blocking region LS has been described with reference to FIGS. 3A to 3D.

A common electrode 602 is formed on an inner surface of the second substrate 600 including the light blocking area LS, and the liquid crystal layer 550 described above is substantially the pixel electrode 522 and the common electrode. Positioned between 602. The thickness of the liquid crystal layer 550 has a value corresponding to the cell gap CG, has a value corresponding to the cell gap CG, and has a light blocking area in a section between the pixel electrode 522 and the common electrode 602. The patterned spacer 560 is formed at a position corresponding to the LS) and the data line 512. In FIG. 6, the patterned spacer 560 is positioned in a section between the red sub color filter 516a and the green subcolor filter 516b, but the position of the patterned spacer 560 is in the light blocking region LS. It can be changed in various ways depending on the position of.

As such, applying the black matrix and the method of manufacturing the same according to the present invention may be effective in simplifying the overall process and reducing the cost even in a COT structure in which the black matrix and the color filter are formed on different substrates.

Although not shown in the drawings, the black matrix according to the present invention and a manufacturing method thereof may be applied to a TOC structure as another structure in which the black matrix and the color filter are formed on different substrates.

However, the present invention is not limited to the above embodiments but may be practiced in various ways without departing from the spirit of the present invention.

As described above, according to the substrate for a liquid crystal display device and a method of manufacturing the same, a light blocking region is obtained by discoloring a portion of the glass substrate with a laser beam without using a black matrix formed by a conventional photolithography process. After applying a resin material layer containing a black colorant or by applying a laser beam, only a part of the area is irradiated with a laser beam and discolored to black, and other areas are removed to be used as a light blocking layer. It can effectively save time and money. In addition, when applied to the color filter substrate, only the photolithography process for the color filter may be performed, thereby reducing the total number of photolithography processes.

Furthermore, since the light blocking region or the light blocking layer used as the black matrix according to the present invention does not generate a step or almost no step, a separate overcoat layer may be omitted, thereby reducing process time and cost associated therewith. It works. In addition, since the light blocking region or the light blocking layer used as the black matrix according to the present invention selectively discolors only the desired region to black, other regions may be used as the light transmitting region, and thus remain unremoved as before. Since no black spot defects are generated, the problem of low yield can be solved.

Claims (25)

Disposing a transparent substrate on a stage of the laser device; Irradiating a laser beam having a predetermined power to the transparent substrate to form a light blocking region surrounding the first to third light transmitting regions in the transparent substrate; Forming a color filter layer including red, green, and blue sub color filters positioned in each of the first to third light transmitting regions; And boundary portions of the red, green, and blue sub-color filters corresponding to the light blocking region. The method of claim 1, The irradiating of the laser beam may include moving the laser beam at a speed of 7,000 mm / sec to 10,000 mm / sec based on the substrate. The method of claim 1, The predetermined power is a method of manufacturing a substrate for a liquid crystal display device, characterized in that 100 Watt (Watt) to 200 watts. The method of claim 1, And the light blocking region has a thickness of one fifth (1/5) to one third (third) of the thickness of the transparent substrate. The method of claim 1, The laser device is a neodymium-yttrium aluminum garnet (Nd-YAG) laser device for generating a laser beam having a wavelength of 1064 nanometers (nm) laser manufacturing method of a substrate for a liquid crystal display device. The method of claim 1, The transparent substrate is a method for manufacturing a substrate for a liquid crystal display device, characterized in that the glass (glass) having at least one of cesium (Cs), aluminum (Al), rubidium (Rb) and sodium (Na). Forming a resin layer on the substrate; Placing the substrate on the stage of the laser device; Irradiating a laser beam having a predetermined power on the transparent substrate to form a light blocking region surrounding the first to third light transmitting regions in the resin layer; Forming a color filter layer including red, green, and blue sub color filters positioned in each of the first to third light transmitting regions; And boundary portions of the red, green, and blue sub-color filters corresponding to the light blocking region. The method of claim 7, wherein The laser device is a neodymium-yttrium aluminum garnet (Nd-YAG) laser device for generating a laser beam having a wavelength of 1064 nanometers (nm) laser manufacturing method of a substrate for a liquid crystal display device. The method of claim 7, wherein The irradiating the laser beam may include moving the laser beam at a speed of 10,000 mm / sec to 12,000 mm / sec based on the substrate. The method of claim 7, wherein The predetermined power is a 30W (Watt) to 100W manufacturing method of the substrate for a liquid crystal display device. The method of claim 7, wherein The resin layer comprises a carbonate polymer (carbonate polymer), polyester resin (polyester resin), and a black coloring agent compound (black coloring agent compound) method for manufacturing a substrate for a liquid crystal display device. The method of claim 7, wherein And removing a portion of the resin layer in the first to third light transmitting regions so as to form a light blocking layer in the light blocking region. A transparent substrate; A light blocking region surrounding the first to third light transmitting regions in the transparent substrate; Color filter layers including red, green, and blue sub color filters positioned in the first to third light transmitting regions and having the same thickness as each other. Liquid crystal display substrate comprising a. The method of claim 13, And a common electrode positioned on the color filter layer. The method of claim 13, And the light blocking area has a thickness of one fifth (1/5) to one third (1/3) of the thickness of the transparent substrate. The method of claim 13, The transparent substrate is a liquid crystal display device substrate, characterized in that the glass (glass) having at least one of cesium (Cs), aluminum (Al), rubidium (Rb) and sodium (Na). A transparent substrate; A light blocking layer disposed on the transparent substrate and surrounding the first to third light transmitting regions; In including the color filter layer including the red, green, blue sub-color filter located in the first to third light transmission region, each having the same thickness, And the light blocking layer is a resin including a carbonate polymer, a polyester resin, and a black colorant compound. A second substrate corresponding to the first substrate and including first to third light transmissive regions surrounded by the light blocking region and the light blocking region; A red, green, and blue sub color filter on an inner surface of any one of the first and second substrates so as to correspond to the first to third light transmitting regions, respectively; a boundary of the red, green, and blue sub color filters A color filter layer corresponding to the light blocking region; Liquid crystal layer positioned between the first and second substrates Liquid crystal display comprising a. The method of claim 18, A common electrode on the second substrate; A thin film transistor positioned on an inner surface of the first substrate; A pixel electrode connected to the thin film transistor and corresponding to each of the red, green, and blue sub color filters; And a patterned spacer disposed between the common electrode and the pixel electrode and corresponding to the light blocking region. The method of claim 19, The color filter layer is positioned between the second substrate and the common electrode. The method of claim 19, And the color filter layer is positioned between the thin film transistor and the pixel electrode. A first substrate and a second substrate positioned corresponding to the first substrate; A light blocking layer on an inner surface of the second substrate, the light blocking layer comprising first and third light transmitting regions, the resin material comprising a carbonate polymer, a polyester resin, and a black colorant compound;  A red, green, and blue sub color filter on an inner surface of any one of the first and second substrates so as to correspond to the first to third light transmitting regions, respectively; a boundary of the red, green, and blue sub color filters A color filter layer corresponding to the light blocking region; Liquid crystal layer positioned between the first and second substrates Liquid crystal display comprising a. The method of claim 22, A common electrode on the second substrate; A thin film transistor positioned on an inner surface of the first substrate; A pixel electrode connected to the thin film transistor and corresponding to each of the red, green, and blue sub color filters; And a patterned spacer disposed between the common electrode and the pixel electrode and corresponding to the light blocking layer. The method of claim 23, wherein The color filter layer is positioned between the second substrate and the common electrode. The method of claim 23, wherein And the color filter layer is disposed between the thin film transistor and the pixel electrode.

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