KR20070113706A - Method of electrolytic gold plating for printed circuit board - Google Patents

Method of electrolytic gold plating for printed circuit board Download PDF

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KR20070113706A
KR20070113706A KR1020060047319A KR20060047319A KR20070113706A KR 20070113706 A KR20070113706 A KR 20070113706A KR 1020060047319 A KR1020060047319 A KR 1020060047319A KR 20060047319 A KR20060047319 A KR 20060047319A KR 20070113706 A KR20070113706 A KR 20070113706A
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South Korea
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layer
mask
gold plating
electrolytic gold
printed circuit
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KR1020060047319A
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Korean (ko)
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KR100787385B1 (en
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노재호
오화동
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대덕전자 주식회사
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing the conductive pattern
    • H05K3/243Reinforcing the conductive pattern characterised by selective plating, e.g. for finish plating of pads
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4661Adding a circuit layer by direct wet plating, e.g. electroless plating; insulating materials adapted therefor

Abstract

A method of electrolytic gold plating on a printed circuit board is provided to perform the electrolytic gold plating by applying a copper plating layer on the printed circuit board performing as a lead line. A method of electrolytic gold plating(15) on a printed circuit board includes the steps of: etching a copper layer from an epoxy resin substrate(10); applying an electroless copper plating(13) on an etched epoxy resin layer; forming a first mask layer for forming a circuit pattern; forming a circuit by performing electrolytic copper plating by using the first mask as a mask; forming a second mask layer defining an area to perform the electrolytic gold plating; performing the electrolytic gold plating by using the second mask as a mask; exfoliating the first and second mask layers; and removing an exposed electroless copper plating layer.

Description

인쇄 회로 기판의 전해 금도금 방법{METHOD OF ELECTROLYTIC GOLD PLATING FOR PRINTED CIRCUIT BOARD}Electrolytic gold plating method of a printed circuit board {METHOD OF ELECTROLYTIC GOLD PLATING FOR PRINTED CIRCUIT BOARD}

도1a는 본 발명에 따라 회로를 형성하기 전 에폭시 기판을 나타낸 도면.1A shows an epoxy substrate before forming a circuit in accordance with the present invention.

도1b는 본 발명에 따라 에칭을 수행한 에폭시 기판 위에 무전해 동도금을 실시한 후의 모습을 나타낸 도면.Figure 1b is a view showing a state after the electroless copper plating on the epoxy substrate subjected to the etching in accordance with the present invention.

도1c는 본 발명에 따라 회로를 형성하기 위해 드라이 필름 또는 감광성 잉크를 이용해서 마스크 회로를 제작한 상태를 나타낸 도면.1C is a view showing a state in which a mask circuit is manufactured using a dry film or photosensitive ink to form a circuit according to the present invention.

도1d는 본 발명에 따라 회로를 형성하기 위하여 전해 동도금을 실시한 후의 모습을 나타낸 도면.1D is a view showing a state after electrolytic copper plating to form a circuit according to the present invention.

도1e는 본 발명에 따라 전해 금도금을 할 부위만을 남기고 나머지 부위를 마스킹하는 과정을 나타낸 도면.Figure 1e is a view showing a process of masking the remaining portions leaving only the portion to be electroplated in accordance with the present invention.

도1f는 본 발명에 따라 전해 금도금을 한 후의 모습을 나타낸 도면.Figure 1f is a view showing a state after the electroplated gold plating in accordance with the present invention.

도1g는 전해 금도금을 위한 마스크 층을 박리한 후의 모습을 나타낸 도면.Figure 1g is a view showing the state after peeling off the mask layer for electrolytic gold plating.

도1h는 바닥의 무전해 동도금층을 제거한 후의 모습을 나타낸 도면.Figure 1h is a view showing the state after removing the electroless copper plating layer of the bottom.

<도면의 주요 부분에 대한 부호의 설명><Explanation of symbols for the main parts of the drawings>

10 : 에폭시 층10: epoxy layer

11 : 무전해 동도금층11: Electroless Copper Plating Layer

12 : 감광성 레지스트12 photosensitive resist

13 : 전해 동도금층13: electrolytic copper plating layer

14 : 마스크 층14: mask layer

15 : 전해 금도금층15: electrolytic gold plated layer

본 발명은 인쇄 회로 기판 제조 방법에 관한 것으로, 특히 리드선 없이 전해 금도금을 수행하는 방법에 관한 것이다. 인쇄 회로 기판을 표면 처리하는데 있어서 전해 금도금이 통용되고 있는데, 전해 금도금을 수행하기 위해서는 전기 공급을 위한 도금 리드선이 필요하다. The present invention relates to a method for manufacturing a printed circuit board, and more particularly, to a method for performing electrolytic gold plating without a lead wire. Electrolytic gold plating is commonly used to surface-treat printed circuit boards, and in order to perform electrolytic gold plating, a plating lead wire for electricity supply is required.

그런데, 최근 들어 인쇄 회로 기판의 회로 밀도가 높아짐에 따라서, 전해 금도금을 위한 리드선 설계에 어려움이 증가하고 있다. 집적도가 높은 회로 기판에 전해 금도금을 위한 리드선 설계 방법으로서 전해 금도금 완료 후에 라우터 또는 다이싱 방법 또는 화학적 에칭 방법으로 도금 리드선을 절단하는 방법이 소개된 바 있으나, 절단 이후에 리드선 일부분이 최종 제품에 잔류하게 되므로, RF 영역의 주파수에서 심각한 잡음 문제를 야기하게 된다.However, in recent years, as the circuit density of printed circuit boards increases, difficulty in designing lead wires for electroplating has increased. As a lead wire design method for electrolytic gold plating on a highly integrated circuit board, a method of cutting a plated lead wire by a router or dicing method or a chemical etching method after electrolytic gold plating has been introduced, but a part of the lead wire remains in the final product after cutting. This causes serious noise problems in the frequency of the RF domain.

따라서, 본 발명의 제1 목적은 회로 밀도가 높은 인쇄 회로 기판에 리드선 없이 전해 금도금을 수행할 수 있는 인쇄 회로 기판 제조 방법을 제공하는 데 있 다. Accordingly, a first object of the present invention is to provide a printed circuit board manufacturing method capable of performing electrolytic gold plating on a printed circuit board having a high circuit density without a lead wire.

본 발명의 제2 목적은 상기 제1 목적에 부가하여 회로 밀도가 높은 인쇄 회로 기판에 적용되면서도, 종래 기술에서 겪었던 RF 주파수에서의 잡음 문제를 해결하는 인쇄 회로 기판 제조 방법을 제공하는 데 있다.A second object of the present invention is to provide a printed circuit board manufacturing method which solves the noise problem at the RF frequency experienced in the prior art while being applied to a printed circuit board having a high circuit density in addition to the first object.

상기 목적을 달성하기 위하여, 본 발명은 인쇄 회로 기판 제조 방법에 있어서, 에폭시 수지층 위에 동박이 적층된 동장 적층판의 동박을 전면 식각하고, 그 결과 동박이 완전 박리 된 에폭시 수지층 또는 동박이 얇게 남아 있는 에폭시 수지층에 무전해 동도금을 도포한다. 이어서, 회로 패턴을 형성하기 위해 제1 마스크 층을 형성하고, 이를 마스크로 하여 전해 동도금을 실시하여 회로를 형성한다. In order to achieve the above object, the present invention, in the method of manufacturing a printed circuit board, the entire surface of the copper foil of the copper clad laminate laminated copper foil on the epoxy resin layer, and as a result, the epoxy resin layer or copper foil is completely peeled off copper foil Electroless copper plating is applied to the epoxy resin layer. Subsequently, a first mask layer is formed to form a circuit pattern, and electrolytic copper plating is performed using this as a mask to form a circuit.

그리고 나면, 전해 금도금을 할 부위를 정의하는 제2 마스크 층을 형성하고, 제2 마스크 층을 마스크로 하여 전해 금도금을 한다. 이어서, 제1 마스크 층과 제2 마스크 층을 모두 박리하고, 무전해 동도금층 중 노출된 부위를 제거한다.Then, a second mask layer defining a portion to be subjected to electrolytic gold plating is formed, and electrolytic gold plating is performed using the second mask layer as a mask. Subsequently, both the first mask layer and the second mask layer are peeled off, and the exposed portion of the electroless copper plating layer is removed.

본 발명에 따른 전해 금도금 방법은 에폭시 기판에 전면 무전해 동도금을 실시하고, 이를 리드선 역할을 하도록 하여 전해 금도금을 하는 것을 특징으로 한다.The electrolytic gold plating method according to the present invention is characterized in that the electroless copper plating is performed on the epoxy substrate, and the electrolytic gold plating is performed as a lead wire.

이하에서는 첨부도면 도1a 내지 도1h를 참조하여 본 발명에 따른 전해 금도금 방법의 양호한 실시예를 상세히 설명한다.Hereinafter, a preferred embodiment of the electrolytic gold plating method according to the present invention with reference to the accompanying drawings, Figures 1a to 1h.

도1a는 회로를 형성하기 전 에폭시 기판을 나타낸 도면이다. 즉, 기존의 동박 적층판(Copper Cladded Laminate; CCL)의 동박을 모두 에칭하여 제거한다. 즉, 동박을 모두 식각하고 나면 기판은 에폭시 층(10)만 남게 된다. 이때에, 본 발명 의 또 다른 실시예로서, 모두 식각하는 대신에 동박을 약 3㎛ 이하로 약간 잔류시킬 수도 있다.1A is a view showing an epoxy substrate before forming a circuit. That is, all copper foils of the existing copper clad laminated laminate (CCL) are etched and removed. That is, after etching all of the copper foil, the substrate leaves only the epoxy layer 10. At this time, as another embodiment of the present invention, instead of etching all of the copper foil may be slightly left to about 3㎛ or less.

도1b는 본 발명에 따라 에칭을 수행한 에폭시 기판 위에 무전해 동도금을 실시한 후의 모습을 나타낸 도면이다. 도1b를 참조하면, 에폭시 기판(10) 위에 무전해 동도금층(11)이 도시되어 있다.Figure 1b is a view showing a state after the electroless copper plating on the epoxy substrate subjected to the etching in accordance with the present invention. Referring to FIG. 1B, an electroless copper plating layer 11 is shown on an epoxy substrate 10.

도1c는 본 발명에 따라 회로를 형성하기 위해 드라이 필름 또는 감광성 잉크를 이용해서 마스크 회로를 제작한 상태를 나타낸 도면이다. 도1c를 참조하면, 무전해 동도금층(11) 위에 마스크 층으로서 드라이 필름 또는 감광성 레지스트(12)가 패턴 형성되어 있다. 1C is a view showing a state in which a mask circuit is fabricated using a dry film or photosensitive ink to form a circuit according to the present invention. Referring to FIG. 1C, a dry film or photosensitive resist 12 is patterned on the electroless copper plating layer 11 as a mask layer.

도1d는 본 발명에 따라 회로를 형성하기 위하여 전해 동도금을 실시한 후의 모습을 나타낸 도면이다. 도1d를 참조하면, 무전해 동도금층(11) 위에 마스크 층(1 2)이 가려지지 않는 노출 부위에 전해 동도금(13)이 형성된다. Figure 1d is a view showing the state after the electrolytic copper plating to form a circuit according to the present invention. Referring to FIG. 1D, an electrolytic copper plating 13 is formed on an exposed portion where the mask layer 12 is not covered on the electroless copper plating layer 11.

도1e는 본 발명에 따라 전해 금도금을 할 부위만을 남기고 나머지 부위를 마스킹하는 과정을 나타낸 도면이다. 도1e를 참조하면, 드라이 필름 또는 감광성 잉크를 이용하여 마스크 층(14)을 형성한다. 이때에, 마스크 층(14)으로 덮인 부위는 후속 전해 금도금 실시시에 금도금이 되지 않는다.Figure 1e is a view showing a process of masking the remaining portions leaving only the portion to be electroplated according to the present invention. Referring to FIG. 1E, the mask layer 14 is formed using a dry film or photosensitive ink. At this time, the portion covered with the mask layer 14 does not become gold plated during subsequent electrolytic gold plating.

도1f는 본 발명에 따라 전해 금도금을 한 후의 모습을 나타낸 도면이다. 도1f를 참조하며, 전해 금도금 층(15)이 형성되어 있으며, 실제 회로에서는 리드선이 없어서 금도금할 수 없지만 본 발명의 경우 무전해 동도금층(11)이 있으므로 리드선 역할을 하게 되어 전해 금도금할 수 있게 된다. Figure 1f is a view showing a state after the electroplated gold plating according to the present invention. Referring to FIG. 1F, an electrolytic gold plating layer 15 is formed, and in an actual circuit, since there is no lead wire, gold plating cannot be performed. do.

도1g는 전해 금도금을 위한 마스크 층을 박리한 후의 모습을 나타낸 도면이다. 도1g를 참조하면, 드라이 필름 또는 감광성 잉크 층으로 만들었던 마스크 층(14)을 제거하면 전해 동도금(14)과 전해 금도금 층(15)이 동시에 노출된다. 그 결과, 회로의 일부분에는 금도금이 형성되어 있고, 나머지 부분에는 회로가 형성된다.Figure 1g is a view showing a state after peeling off the mask layer for electrolytic gold plating. Referring to FIG. 1G, the electrolytic copper plating 14 and the electrolytic gold plating layer 15 are simultaneously exposed by removing the mask layer 14 made of the dry film or photosensitive ink layer. As a result, gold plating is formed in a part of the circuit, and a circuit is formed in the remaining part.

도1h는 바닥의 무전해 동도금층을 제거한 후의 모습을 나타낸 모습이다. 도1h를 참조하면, 전해 금도금(15)이 완성되고 나며, 소프트에칭을 통해 리드선으로 사용되었던 무전해 동도금층(11)을 제거하게 된다.Figure 1h is a view showing the state after removing the electroless copper plating layer of the bottom. Referring to FIG. 1H, after the electrolytic gold plating 15 is completed, the electroless copper plating layer 11 used as the lead wire is removed through soft etching.

전술한 내용은 후술할 발명의 특허 청구 범위를 더욱 잘 이해할 수 있도록 본 발명의 특징과 기술적 장점을 다소 폭넓게 개선하였다. 본 발명의 특허 청구 범위를 구성하는 부가적인 특징과 장점들이 이하에서 상술될 것이다. 개시된 본 발명의 개념과 특정 실시예는 본 발명과 유사 목적을 수행하기 위한 다른 구조의 설계나 수정의 기본으로서 즉시 사용될 수 있음이 당해 기술 분야의 숙련된 사람들에 의해 인식되어야 한다. The foregoing has somewhat broadly improved the features and technical advantages of the present invention to better understand the claims that follow. Additional features and advantages that make up the claims of the present invention will be described below. It should be appreciated by those skilled in the art that the conception and specific embodiments of the invention disclosed may be readily used as a basis for designing or modifying other structures for carrying out similar purposes to the invention.

또한, 본 발명에서 개시된 발명 개념과 실시예가 본 발명의 동일 목적을 수행하기 위하여 다른 구조로 수정하거나 설계하기 위한 기초로서 당해 기술 분야의 숙련된 사람들에 의해 사용되어질 수 있을 것이다. 또한, 당해 기술 분야의 숙련된 사람에 의한 그와 같은 수정 또는 변경된 등가 구조는 특허 청구 범위에서 기술한 발명의 사상이나 범위를 벗어나지 않는 한도 내에서 다양한 진화, 치환 및 변경이 가능하다. In addition, the inventive concepts and embodiments disclosed herein may be used by those skilled in the art as a basis for modifying or designing other structures for carrying out the same purposes of the present invention. In addition, such modifications or altered equivalent structures by those skilled in the art may be variously evolved, substituted and changed without departing from the spirit or scope of the invention described in the claims.

이상과 같이, 본 발명은 기판에 무전해 동도금층을 전면 도포하여 리드선 역할을 하도록 함으로써, 후속하는 전해 금도금 공정을 간편하고 신뢰성있게 수행할 수 있도록 한다.As described above, the present invention allows the entire surface of the electroless copper plating layer to be applied to the substrate to serve as a lead wire, so that the subsequent electrolytic gold plating process can be easily and reliably performed.

Claims (1)

인쇄 회로 기판 제조 방법에 있어서,In a printed circuit board manufacturing method, (a) 에폭시 수지층 위에 동박이 적층된 동장 적층판의 동박을 전면 식각하는 단계;(a) etching the entire copper foil of the copper clad laminate in which the copper foil is laminated on the epoxy resin layer; (b) 상기 단계(a) 결과 동박이 완전 박리된 에폭시 수지층 또는 부분 식각되어 동박이 얇게 남아 있는 에폭시 수지층에 무전해 동도금을 도포하는 단계;(b) applying the electroless copper plating to the epoxy resin layer in which the copper foil has been completely peeled off or partially etched as a result of the step (a); (c) 회로 패턴을 형성하기 위해 제1 마스크 층을 형성하는 단계;(c) forming a first mask layer to form a circuit pattern; (d) 상기 제1 마스크 층을 마스크로 하여 전해 동도금을 실시하여 회로를 형성하는 단계;(d) forming a circuit by electrolytic copper plating using the first mask layer as a mask; (e) 전해 금도금을 실시할 부위를 정의하는 제2 마스크 층을 형성하는 단계;(e) forming a second mask layer defining a portion to be electroplated; (f) 상기 제2 마스크 층을 마스크로 하여 전해 금도금을 실시하는 단계;(f) performing electrolytic gold plating using the second mask layer as a mask; (g) 상기 제1 마스크 층과 제2 마스크 층을 모두 박리하는 단계; 및(g) peeling off both the first mask layer and the second mask layer; And (h) 상기 무전해 동도금층 중 노출된 부위를 제거하는 단계(h) removing the exposed portion of the electroless copper plating layer 를 포함하는 인쇄회로 제조 방법.Printed circuit manufacturing method comprising a.
KR1020060047319A 2006-05-26 2006-05-26 Method of electrolytic gold plating for printed circuit board without lead KR100787385B1 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160107435A (en) 2015-03-04 2016-09-19 대덕전자 주식회사 Manufacturing method of printed circuit board
CN113038725A (en) * 2021-03-08 2021-06-25 深圳市迅捷兴科技股份有限公司 Method for forming conductive layer circuit side wall and surface gold plating by high-frequency circuit board chemical copper deposition

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100632577B1 (en) * 2004-05-03 2006-10-09 삼성전기주식회사 Electrolytic gold plating method of printed circuit board

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160107435A (en) 2015-03-04 2016-09-19 대덕전자 주식회사 Manufacturing method of printed circuit board
CN113038725A (en) * 2021-03-08 2021-06-25 深圳市迅捷兴科技股份有限公司 Method for forming conductive layer circuit side wall and surface gold plating by high-frequency circuit board chemical copper deposition

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