KR20070112679A - Laser irradiation device and fabrication method of organic light emitting display device using the same - Google Patents

Abstract

A laser irradiating apparatus and a method for manufacturing an organic light emitting device using the same are provided to perform various pixel arrangements by using a symmetrical microlens array and a mask. A laser irradiating apparatus(200) includes a light source apparatus(210), a collimation lens(220), a symmetrical microlens array(230), and a mask(240). The collimation lens is placed at the lower part of the light source apparatus. The symmetrical microlens array is placed at the lower part of the collimation lens. The mask is placed at the lower part of the symmetrical microlens array. The symmetrical microlens array is a combination of symmetrical microlenses(230a) of transparent material, and is movable up and down between the collimation lens and the mask. The focal length of the symmetrical microlens is 10~300mm.

Description

Laser irradiation device and fabrication method of organic light emitting device using the same {laser irradiation device and fabrication method of organic light emitting display device using the same}

1 is a schematic diagram for explaining a method for manufacturing an organic light emitting display device using a conventional laser irradiation device.

2 is a plan view showing a pixel patterned with a conventional laser irradiation apparatus.

Figure 3a is a schematic diagram for explaining a method of manufacturing an organic light emitting device using a laser irradiation apparatus according to an embodiment of the present invention.

3B is a cross-sectional view illustrating a relationship between a symmetric microlens and a pixel of the laser irradiation apparatus according to the present invention.

4 is a plan view showing a pixel patterned with a laser irradiation device according to the present invention.

The present invention relates to a laser irradiation apparatus and a method for manufacturing an organic light emitting device using the same, and more particularly, includes a symmetric micro lens array defining a pixel to be patterned in the laser irradiation apparatus and a mask capable of performing various pixel arrangement methods. It relates to a laser irradiation apparatus and a method for manufacturing an organic light emitting device using the same.

In general, an organic light emitting display device which is a flat panel display device includes an anode electrode and a cathode electrode, and an organic layer interposed between the anode electrode and the cathode electrode. The organic layer includes at least an organic light emitting layer. The organic light emitting diode is classified into a polymer organic light emitting diode and a low molecular organic light emitting diode according to the material of the organic light emitting layer.

In order to realize full colorization in such an organic light emitting device, each of the light emitting layers showing three primary colors of R, G, and B must be patterned. Here, as a method for patterning the light emitting layer, there is a method of using a shadow mask in the case of a low molecular organic EL device, and an ink jet printing or laser thermal transfer method in the case of a polymer organic EL device. Thermal Imaging (hereinafter referred to as LITI). Among these, LITI has the advantage of being able to finely pattern the organic film layer, to be used for a large area, and to be advantageous for high resolution, and the inkjet printing is a wet process, whereas it is a dry process.

1 is a schematic diagram illustrating a method of manufacturing an organic light emitting display device using a conventional laser irradiation device.

Referring to FIG. 1, a substrate 161 on which a first electrode 162 is formed is provided. A thin film transistor, an insulating film, and a capacitor may be included between the first electrode 162 and the substrate 161.

Subsequently, the laser transfer donor substrate 150 is laminated on the substrate 161. Here, the donor substrate 150 has a base layer 151, a light-to-heat conversion layer 152 on the base layer 151, and a transfer layer 153 on the light-to-heat conversion layer 152 in turn. It is provided in a stacked structure.

On the other hand, the laser irradiation apparatus 100 is provided separately from the substrate 161 and the donor substrate 150. The laser irradiation apparatus 100 includes a light source device 110, a patterned mask 120, and a projection lens 130.

Subsequently, the laser beam 140 generated by the light source device 110 passes through the mask 120 which is patterned, and the passed laser beam 140 is refracted by the projection lens 130 to form the base layer. Some area of 151 is irradiated.

The laser beam 140 irradiated to a portion of the base layer 151 is absorbed by the light-heat conversion layer 152 and converted into thermal energy. The photo-thermal conversion layer 152 adheres the transfer layer 153 on the substrate 161 by the absorbed thermal energy. Subsequently, as the adhesion between the transfer layer 153 is broken, the transfer layer 153 is transferred onto the substrate 161 to form an organic layer pattern (not shown).

2 is a plan view showing a pixel patterned using a conventional laser irradiation apparatus.

Referring to FIG. 2, a red pixel, which is one of unit pixels such as red (R), blue (B), and green (G), is patterned in the laser scanning direction on each pixel of the substrate 161.

However, in the conventional laser irradiation apparatus, only one unit pixel of red (R), blue (B), and green (G) must be patterned in each pixel in the laser scanning direction, so that the same laser scanning direction is different. There is a problem in that color unit pixels cannot be patterned, and patterning must be performed only in the form of stripes.

Accordingly, an object of the present invention is to provide a laser irradiation apparatus capable of addressing various pixel arrangement methods and the like and a method of manufacturing an organic light emitting device using the same.

In order to achieve the above object, the present invention relates to a laser irradiation apparatus and a method for manufacturing an organic light emitting device using the same that can correspond to various pixel arrangement methods, the light source device; A collimation lens positioned under the light source device; A symmetrical microlens array positioned below the collimator lens; And a mask positioned under the symmetric micro lens array.

The present invention also provides a substrate on which a first electrode is formed; Providing a donor substrate having a substrate layer, a light-heat conversion layer on the base layer, and a structure in which a transfer layer is sequentially stacked on the light-heat conversion layer; The transfer layers are spaced apart from each other so as to face the substrate; A laser irradiation apparatus including a light source device, a collimating lens, a symmetric micro lens array, and a mask is used to irradiate a laser to a portion of the base layer to transfer the transfer layer to form an organic layer pattern on the substrate. It provides a method for manufacturing an organic light emitting device comprising the.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings in order to describe the present invention in more detail. However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. In the figures, where a layer is said to be "on" another layer or substrate, it may be formed directly on the other layer or substrate, or a third layer may be interposed therebetween. Like numbers refer to like elements throughout the specification.

3A is a schematic diagram illustrating a method of manufacturing a laser irradiation apparatus and an organic light emitting display device according to the present invention.

Referring to FIG. 3A, a substrate 261 in which a first electrode 262 is formed is provided. A thin film transistor, an insulating film, a capacitor, and the like may be included between the substrate 261 and the first electrode 262.

The donor substrate 250 for laser transfer is provided separately from the substrate 261. The donor substrate 250 includes a base layer 251, a light-to-heat conversion layer 252 on the base layer 251, and a transfer layer 253 on the light-to-heat conversion layer 252. Structure. In addition, a gas generation layer (not shown) may be further included between the light-to-heat conversion layer 252 and the transfer layer 253.

The base layer 251 should have transparency in order to transmit light to the light-to-heat conversion layer 252, and may be made of a material having suitable optical properties and sufficient mechanical stability. For example, it may be made of glass or at least one polymeric material selected from the group consisting of polyester, polyacrylic, polyepoxy, polyethylene and polystyrene. More preferably, the substrate layer 251 may be polyethylene terephthalate. The substrate layer 251 serves as a support substrate, and complex multiple systems may be used.

The light-heat conversion layer 252 is a layer for absorbing light in the infrared-visible light region to convert a portion of the light into heat, and preferably includes a light absorbing material for absorbing light. In addition, the light-to-heat conversion layer 252 may be a metal film made of Al, Ag, oxides and sulfides thereof, or an organic film made of a polymer including carbon black, graphite, or infrared dye. Here, the metal film may be formed by vacuum deposition, electron beam deposition, or sputtering, and the organic film is a conventional film coating method, and includes gravure, extrusion, spin, and knife coating. It can be formed by one of the methods.

When the gas generating layer (not shown) absorbs light or heat, it causes a decomposition reaction to release nitrogen gas or hydrogen gas, thereby providing a transfer energy, and pentaerythrite (PETN), trinitrotoluene ( TNT) and the like.

The transfer layer 253 may include one single layer film or one or more multilayer films selected from the group consisting of a hole injection layer, a hole transport layer, an organic light emitting layer, a hole suppression layer, an electron transport layer and an electron injection layer.

The hole injection layer facilitates hole injection into the organic light emitting layer of the organic light emitting diode and serves to increase the life of the device. The hole injection layer may be formed of an aryl amine compound, starburst amines, and the like. More specifically, 4,4 ', 4 "-tris (3-methylphenylamino) triphenylamino (m-MTDATA), 1,3,5-tris [4- (3-methylphenylamino) phenyl] benzene (m- MTDATB) and phthalocyanine copper (CuPc) and the like.

The hole transport layer may be made of an arylene diamine derivative, a starburst compound, a biphenyldiamine derivative having a spiro group, a ladder compound, and the like. More specifically N, N-diphenyl-N, N'-bis (4-methylphenyl) -1,1'-biphenyl-4,4'-diamine (TPD) or 4,4'-bis [N- (1-naphthyl) -N-phenylamino] biphenyl (NPB).

The organic light emitting layer is a low molecular material such as Alq3 (host) / DCJTB (fluorescent dopant), Alq3 (host) / DCM (fluorescent dopant), CBP (host) / PtOEP (phosphorescent organometallic complex), which is a red light emitting material, and a PFO polymer High molecular weight materials such as Alq3, Alq3 (host) / C545t (dopant), CBP (host) / IrPPY (phosphorescent organic complex), green light emitting materials and PFO polymer, PPV Polymeric materials, such as system type polymers, can be used. In addition, low molecular weight materials such as DPVBi, Spiro-DPVBi, Spiro-6P, Distylbenzene (DSB), and Distriarylene (DSA), which are blue light emitting materials, and polymer materials such as PFO-based polymers and PPV-based polymers may be used. .

The hole suppression layer serves to prevent the hole from moving to the electron injection layer when the hole mobility is greater than the electron mobility in the organic light emitting layer. Wherein the hole suppression layer is 2-biphenyl-4-yl-5- (4-t-butylphenyl) -1,3,4-oxydiazole (PBD), spiro-PBD and 3- (4'-t -Butylphenyl) -4-phenyl-5- (4'-biphenyl) -1,2,4-triazole (TAZ).

The electron transport layer may be made of a metal compound that can accept electrons well, and may be made of 8-hydroquinoline aluminum salt (Alq3) having excellent properties of stably transporting electrons supplied from the cathode electrode.

The electron injection layer may be made of one or more materials selected from the group consisting of 1,3,4-oxydiazole derivatives, 1,2,4-triazole derivatives, and LiF.

In addition, such an organic film may be formed by a method such as extrusion, spin, knife coating, vacuum deposition, or CVD.

The donor substrate 250 may further include not only the above layers but also layers having various uses, and may be used by changing the lamination structure according to the use.

Subsequently, the pixel area of the substrate 261 and the transfer layer 253 of the donor substrate are spaced apart from each other so as to face each other, and then are uniformly laminated.

The lamination is accomplished by pressing using a roller, gas press or crown press. The lamination may proceed in a direction from the center to the outside. In addition, the lamination may proceed in one direction.

When the lamination is made outward from the center, bubbles between the donor substrate 250 and the substrate 261 may be effectively prevented, and thus lamination is preferably performed outward from the center.

Meanwhile, the laser irradiation apparatus 200 is provided separately from the substrate 261 and the donor substrate 250. The laser irradiation apparatus 200 includes a light source device 210, a collimation lens 220, a symmetrical microlens array 230, and a mask 240.

The light source device 210 separates the transfer layer 253 from the donor substrate 250 to transfer the transfer layer 253 onto the substrate 261 to generate a laser beam 240 required to form a predetermined pattern.

The collimating lens 220 serves to parallelize the laser beam 270 emitted from the light source device 210.

The symmetric micro lens array 230 is an optical means for forming a plurality of beams from parallel laser beams passing through the collimating lens 220, and forming a focus for each beam, and defines a pixel to be patterned. do

The symmetric micro lens array 230 is composed of a combination of a plurality of symmetric micro lenses 230a. For this reason, the laser irradiation apparatus 200 may manufacture an organic light emitting display device by performing a multi-scan method that can simultaneously pattern a plurality of pixels of the same color.

Since the symmetrical microlens array 230 is movable up and down between the collimating lens 220 and the mask 240, the focal length of the symmetrical microlens 230a can be adjusted to free the pattern size of the pixel region. I can regulate it by material.

The symmetric micro lens array 230 is preferably made of glass or plastic which is a transparent material.

3B is a cross-sectional view illustrating a relationship between a symmetric microlens and a unit pixel, that is, an organic film pattern, of the laser irradiation apparatus according to the present invention.

Referring to FIG. 3B, the pitch of the symmetric microlens 230a is P1, the diameter of the symmetric microlens 230a is S1, the focal length of the symmetric microlens 230a is f1, and the symmetric microlens 230a is And d is the distance to the unit pixel representing any one of red (R), green (G), and blue (B), the width of the unit pixel is S2, the red (R), green (G), and blue (B). ) The sum of the widths of the unit pixels is expressed as P2.

Here, the range of the focal length f1 of the symmetric microlens is 10 to 300 mm. When the focal length f1 is 10 mm or less, when the patterning is performed, a space cannot be secured between the substrate and the lens and other additional devices cannot be secured. You may not. In addition, the problem that the size of the device is too large if more than 300mm.

The distance d between the symmetric microlens and the pixel is 20/3 to 200 mm. The reason for limiting the distance d between the microlens and the pixel is the same as the reason for limiting the range of the focal length f1 of the symmetric microlens.

If the pixel is manufactured at approximately 50 to 300 ppi (pixel per inch), the size P2 of the pixel is 60 to 500 µm. In addition, the diameter P1 of the symmetric microlens is equal to the size of the pixel P2. The size of the unit pixel S2 representing any one of the red (R), the green (G), and the blue (B) is 20 to 500/3 µm.

Subsequently, to sum it up with a simple equation, we need to pattern three colors R, G, and B per pixel,

P2: S2 = 3: 1 <---- (1)

Using the theorem of triangles

f1: f1-d = 3: 1 <---- (2)

f1: f1-d = S1: S2 <---- (3)

In formula (2), d = 2 × f1 / 3 <---- (4)

In the equation (3), P1 and S2 are the same

(f1-d) × P1 = f1 × S2 <---- (5)

Substituting (4) into the equation

The equation is given by S2 = P1 / 3 <---- (6).

(Example)

When producing 17-inch UXGA, the pixel count is 1600 × 1200. The pixel pitch is 72 x 216 mu m. In this case, the laser irradiation apparatus is designed as follows.

If f1 is 20 cm, S2 is 72 m.

When (6) is introduced, P1 is 216 µm and d is 13.34 cm.

Subsequently, referring again to FIG. 3A, the mask 240 is patterned in various shapes to correspond to the pixel arrangement to be patterned on the substrate 261. For example, when the openings are arranged in the delta method according to the arrangement shape of the openings of the mask 240, the pixels may be patterned in the delta method.

Subsequently, the laser beam 240 generated by the light source device 210 of the laser irradiation apparatus 200 is parallelized by passing through the collimating lens 220, and the parallelized laser beam 240 is the symmetric microlens. Pass 230a. The laser beam passing through the symmetric microlens 230a is patterned to define the pixel region, thereby automatically adjusting the size of the pattern of the pixel region by the symmetric microlens 230a. The patterned laser beam passes through the mask 240. The passed laser beam irradiates a portion of the base layer 251 to transfer the transfer layer 253 onto the substrate 261 to form an organic layer pattern (not shown).

Here, the transfer process of forming the organic layer pattern by using the laser irradiation apparatus 200 may be performed in an N ₂ atmosphere. This is to prevent oxidation of the organic layer pattern by oxygen existing in the atmosphere. Here, since much time and cost must be invested to create an N ₂ atmosphere, considering the condition that the organic layer does not affect oxygen or moisture, until O ₂ and H ₂ O are each 100 ppm or less. Preference is given to charging N ₂ .

In addition, the transfer process may be carried out in a vacuum atmosphere, it is possible to suppress the generation of bubbles between the donor substrate and the substrate during the process of laminating the donor substrate on the front surface of the substrate.

4 is a plan view of a pixel patterned by the laser irradiation device of the present invention.

Referring to FIG. 4, unit pixels such as red (R), blue (B), and green (G) are variously patterned in the laser scanning direction on each pixel formed on the substrate 261. Since unnecessary portions are blocked by using the mask 240 of the laser irradiation apparatus 200, a desired unit pixel may be patterned on each pixel irrespective of the laser scanning direction.

As described above, the present invention has an advantage that various pixel arrangement methods can be performed by manufacturing an organic light emitting display device using a laser irradiation apparatus having a symmetric micro lens array and a mask.

While the invention has been shown and described with reference to certain preferred embodiments, the invention is not so limited, and the invention is not limited to the scope and spirit of the invention as defined by the following claims. It will be readily apparent to one of ordinary skill in the art that various modifications and variations can be made.

As described above, the present invention has an advantage that various pixel arrangement methods can be performed by manufacturing an organic light emitting display device using a laser irradiation apparatus having a symmetric micro lens array and a mask.

Claims (16)

Light source device; A collimation lens positioned under the light source device; A symmetrical microlens array positioned below the collimator lens; And And a mask positioned below the symmetric microlens array. The method of claim 1, The symmetric micro lens array is a laser irradiation apparatus, characterized in that made of a combination of a plurality of symmetric micro lenses made of a transparent material. The method of claim 1, And the symmetrical micro lens array is movable up and down between the collimating lens and the mask. The method of claim 1, The focal length of the symmetric micro lens is a laser irradiation apparatus, characterized in that 10 ~ 300mm. The method of claim 1, The diameter of the symmetric micro lens is a manufacturing method of an organic light emitting device, characterized in that 60 ~ 500㎛. The method of claim 1, And the mask blocks a laser beam passing through some micro lenses of the symmetric micro lens array. The method of claim 2, The transparent material is a laser irradiation apparatus, characterized in that the glass or transparent plastic. Providing a substrate on which a first electrode is formed; Providing a donor substrate having a substrate layer, a light-heat conversion layer on the base layer, and a structure in which a transfer layer is sequentially stacked on the light-heat conversion layer; The transfer layers are spaced apart from each other so as to face the substrate; A laser irradiation apparatus including a light source device, a collimating lens, a symmetric micro lens array, and a mask is used to irradiate a laser to a portion of the base layer to transfer the transfer layer to form an organic layer pattern on the substrate. Method of manufacturing an organic light emitting device comprising the. The method of claim 8, The donor substrate further comprises a gas generating layer between the photo-thermal conversion layer and the buffer layer. The method of claim 8, The symmetric microlens array is a method of manufacturing an organic light emitting display device, characterized in that made of a combination of a plurality of symmetric microlenses made of a transparent material. The method of claim 8, The symmetric micro lens array is a method of manufacturing an organic light emitting display device, characterized in that the movable between the collimating lens and the mask up and down. The method of claim 8, The focal length of the symmetric microlens is a manufacturing method of an organic light emitting device, characterized in that 10 ~ 300mm. The method of claim 8, The diameter of the symmetric micro lens is a manufacturing method of an organic light emitting device, characterized in that 60 ~ 500㎛. The method of claim 8, The distance between the symmetric microlens and the donor substrate is 20/3 ~ 200㎜ manufacturing method of the organic light emitting device. The method of claim 8, The size of the organic layer pattern is a manufacturing method of an organic light emitting device, characterized in that 20 ~ 500 / 3㎛. The method of claim 8, The laser irradiation apparatus is a method of manufacturing an organic light emitting display device, characterized in that performed in a multi-scan method.

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