KR100796596B1 - The laser irradiation device and the fabrication method of organic light emitting display device using the same - Google Patents

Abstract

The present invention relates to a laser irradiation device capable of increasing the utilization efficiency of the laser beam and a method for manufacturing an organic light emitting device using the same, a light source device; A collimation lens positioned under the light source device; A symmetrical DOE lens array positioned below the collimating lens; And a cylindrical lens positioned below the symmetrical diode lens array.

The present invention also provides a substrate on which a first electrode is formed; Providing a donor substrate for a laser transfer manufactured by laminating a base layer, a light-to-heat conversion layer on the base layer, and a transfer layer on the light-to-heat conversion layer; The transfer layers are spaced apart from each other so as to face the substrate; By using a laser irradiation apparatus comprising a light source device, a collimating lens positioned below the light source device, a symmetrical diy lens array positioned below the collimating lens, and a cylindrical lens positioned below the symmetrical dioi lens array, It provides a method of manufacturing an organic light emitting device comprising irradiating a laser to a portion of the region to perform the transfer of the transfer layer to form an organic layer pattern on the substrate.

Laser irradiation apparatus, symmetrical diode lens array, cylindrical lens, organic light emitting diode

Description

The laser irradiation device and the fabrication method of organic light emitting display device using the same}

1 is a schematic diagram for explaining a method for manufacturing an organic light emitting display device using a laser irradiation apparatus according to the prior art.

Figure 2a is a schematic diagram for explaining a method of manufacturing an organic light emitting device using a laser irradiation apparatus according to an embodiment of the present invention.

2B is a perspective view illustrating a relationship between a symmetrical diode lens and a cylindrical lens of the laser irradiation apparatus according to the present invention.

3 is a perspective view showing a symmetrical diode lens shape of the laser irradiation apparatus according to the present invention.

<Brief Description of Drawings>

100, 200: laser irradiation device 110, 210: light source device

120: mask 130: projection lens

140,240: laser 150,250: donor substrate

151,251 substrate layer 152,252 photo-thermal conversion layer

153,253: transfer layer 161,261: substrate

162, 262: first electrode 220: collimation lens

230: symmetrical diode lens array 230a: symmetrical diode lens

240: cylindrical lens

The present invention relates to a laser irradiation apparatus and a method of manufacturing an organic light emitting device using the same, and more particularly, laser irradiation including a symmetrical diode lens array defining a pixel to be patterned and a cylindrical lens capable of adjusting the short side of the laser beam. An apparatus and a method of manufacturing an organic light emitting display device using the same.

In general, an organic light emitting display device which is a flat panel display device includes an anode electrode and a cathode electrode, and an organic layer interposed between the anode electrode and the cathode electrode. The organic layer includes at least an organic light emitting layer. The organic light emitting diode is classified into a polymer organic light emitting diode and a low molecular organic light emitting diode according to the material of the organic light emitting layer.

In order to realize full colorization in such an organic light emitting device, each of the light emitting layers showing three primary colors of R, G, and B must be patterned. Here, as a method for patterning the light emitting layer, there is a method of using a shadow mask in the case of a low molecular organic light emitting diode, and an ink jet printing or laser thermal transfer method in the case of a polymer organic light emitting diode. Induced Thermal Imaging (hereinafter referred to as LITI). Among these, LITI has the advantage of being able to finely pattern the organic film layer, to be used for a large area, and to be advantageous for high resolution, and the inkjet printing is a wet process, whereas it is a dry process.

1 is a schematic diagram illustrating a method of manufacturing an organic light emitting display device using a conventional laser irradiation device.

Referring to FIG. 1, a substrate 161 on which a first electrode 162 is formed is provided. A thin film transistor, a capacitor, and the like may be included between the first electrode 162 and the substrate 161.

Subsequently, a donor substrate 150 is laminated on the substrate 161. The donor substrate 150 includes a base layer 151, a light-to-heat conversion layer 152 on the base layer 151, and a transfer layer 153 stacked on the light-to-heat conversion layer 152 in this order. Structure.

In addition, a gas generation layer (not shown) may be further included between the light-to-heat conversion layer 152 and the transfer layer 153.

Meanwhile, the laser irradiation apparatus 100 is provided separately from the donor substrate 150 and the substrate 161. The laser irradiation apparatus 100 includes a light source device 110, a patterned mask 120, and a projection lens 130.

Subsequently, the laser beam 140 generated by the light source device 110 of the laser irradiation apparatus 100 passes through the mask 120 which is patterned, and the passed laser beam 140 passes through the projection lens 130. Refracted by) and irradiated on a portion of the base layer 151.

The laser beam 140 irradiated to a portion of the base layer 151 is absorbed by the light-heat conversion layer 152 and converted into thermal energy. The photo-thermal conversion layer 152 adheres the transfer layer 153 on the substrate 161 by the absorbed thermal energy. Subsequently, as the adhesion between the transfer layer 153 is broken, the transfer layer 153 is transferred onto the substrate 161 to form an organic layer pattern (not shown).

However, the mask of the conventional laser irradiation apparatus has a problem of having to replace the mask according to the pattern size and model of the unit pixel, thereby increasing the process time and manufacturing cost. In addition, there is a problem in that the laser beam loss caused by the mask of the conventional laser irradiation apparatus is lowered, the efficiency of the laser beam, the mask is bent when the laser power is increased.

Accordingly, an object of the present invention is to provide a laser irradiation apparatus and a method of manufacturing an organic light emitting display device using the same, which can shorten the process time while efficiently using a laser beam and solve the above problems. There is this.

In order to achieve the above object, the present invention relates to a laser irradiation apparatus and a method for manufacturing an organic electroluminescent device using the same that can increase the utilization efficiency of the laser beam, a light source device; A collimation lens positioned under the light source device; A symmetrical DOE lens array positioned below the collimating lens; And a cylindrical lens positioned below the symmetrical diode lens array.

The present invention also provides a substrate on which a first electrode is formed; Providing a donor substrate for a laser transfer manufactured by laminating a base layer, a light-to-heat conversion layer on the base layer, and a transfer layer on the light-to-heat conversion layer; The transfer layers are spaced apart from each other so as to face the substrate; By using a laser irradiation apparatus comprising a light source device, a collimating lens positioned below the light source device, a symmetrical diy lens array positioned below the collimating lens, and a cylindrical lens positioned below the symmetrical dioi lens array, It provides a method of manufacturing an organic light emitting device comprising irradiating a laser to a portion of the region to perform the transfer of the transfer layer to form an organic layer pattern on the substrate.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings in order to describe the present invention in more detail. However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. In the figures, where a layer is said to be "on" another layer or substrate, it may be formed directly on the other layer or substrate, or a third layer may be interposed therebetween. Like numbers refer to like elements throughout the specification.

2A is a schematic diagram illustrating a method of manufacturing a laser irradiation apparatus and an organic light emitting display device according to the present invention.

Referring to FIG. 2A, a substrate 261 in which a first electrode 262 is formed is provided. A thin film transistor, an insulating film, a capacitor, and the like may be included between the substrate 261 and the first electrode 262.

The donor substrate 250 for laser transfer is provided separately from the substrate 261. The donor substrate 250 includes a base layer 251, a light-to-heat conversion layer 252 on the base layer 251, and a transfer layer 253 on the light-to-heat conversion layer 252. Structure.

In addition, a gas generation layer (not shown) may be further included between the light-to-heat conversion layer 252 and the transfer layer 253.

The base layer 251 should have transparency in order to transmit light to the light-to-heat conversion layer 252, and may be made of a material having suitable optical properties and sufficient mechanical stability. For example, it may be made of glass or at least one polymeric material selected from the group consisting of polyester, polyacrylic, polyepoxy, polyethylene and polystyrene. More preferably, the substrate layer 251 may be polyethylene terephthalate. The substrate layer 251 serves as a support substrate, and complex multiple systems may be used.

The light-heat conversion layer 252 is a layer for absorbing light in the infrared-visible light region to convert a portion of the light into heat, and preferably includes a light absorbing material for absorbing light. In addition, the light-to-heat conversion layer 252 may be a metal film made of Al, Ag, oxides and sulfides thereof, or an organic film made of a polymer including carbon black, graphite, or infrared dye. Here, the metal film may be formed by vacuum deposition, electron beam deposition, or sputtering, and the organic film is a conventional film coating method, and includes gravure, extrusion, spin, and knife coating. It can be formed by one of the methods.

When the gas generating layer (not shown) absorbs light or heat, it causes a decomposition reaction to release nitrogen gas or hydrogen gas, thereby providing a transfer energy, and pentaerythrite (PETN), trinitrotoluene ( TNT) and the like.

The transfer layer 253 may include one single layer film or one or more multilayer films selected from the group consisting of a hole injection layer, a hole transport layer, an organic light emitting layer, a hole suppression layer, an electron transport layer and an electron injection layer.

The hole injection layer facilitates hole injection into the organic light emitting layer of the organic light emitting diode and serves to increase the life of the device. The hole injection layer may be formed of an aryl amine compound, starburst amines, and the like. More specifically, 4,4 ', 4 "-tris (3-methylphenylamino) triphenylamino (m-MTDATA), 1,3,5-tris [4- (3-methylphenylamino) phenyl] benzene (m- MTDATB) and phthalocyanine copper (CuPc) and the like.

The hole transport layer may be made of an arylene diamine derivative, a starburst compound, a biphenyldiamine derivative having a spiro group, a ladder compound, and the like. More specifically N, N-diphenyl-N, N'-bis (4-methylphenyl) -1,1'-biphenyl-4,4'-diamine (TPD) or 4,4'-bis [N- (1-naphthyl) -N-phenylamino] biphenyl (NPB).

The organic light emitting layer is a low molecular material such as Alq3 (host) / DCJTB (fluorescent dopant), Alq3 (host) / DCM (fluorescent dopant), CBP (host) / PtOEP (phosphorescent organometallic complex), which is a red light emitting material, and a PFO polymer High molecular weight materials such as Alq3, Alq3 (host) / C545t (dopant), CBP (host) / IrPPY (phosphorescent organic complex), green light emitting materials and PFO polymer, PPV Polymeric materials, such as system type polymers, can be used. In addition, low molecular weight materials such as DPVBi, Spiro-DPVBi, Spiro-6P, Distylbenzene (DSB), and Distriarylene (DSA), which are blue light emitting materials, and polymer materials such as PFO polymer and PPV polymer can be used. .

The hole suppression layer serves to prevent the hole from moving to the electron injection layer when the hole mobility is greater than the electron mobility in the organic light emitting layer. Wherein the hole suppression layer is 2-biphenyl-4-yl-5- (4-t-butylphenyl) -1,3,4-oxydiazole (PBD), spiro-PBD and 3- (4'-t -Butylphenyl) -4-phenyl-5- (4'-biphenyl) -1,2,4-triazole (TAZ).

The electron transport layer may be made of a metal compound that can accept electrons well, and may be made of 8-hydroquinoline aluminum salt (Alq3) having excellent properties of stably transporting electrons supplied from the cathode electrode.

The electron injection layer may be made of one or more materials selected from the group consisting of 1,3,4-oxydiazole derivatives, 1,2,4-triazole derivatives, and LiF.

In addition, such an organic film may be formed by a method such as extrusion, spin, knife coating, vacuum deposition, or CVD.

Subsequently, the substrate 261 is disposed to be spaced apart from each other to face the transfer layer 253 of the donor substrate 250 and then laminated.

The lamination is accomplished by pressing using a roller, gas press or crown press. The lamination may proceed in a direction from the center to the outside. In addition, the lamination may proceed in one direction.

When the lamination is made outward from the center, bubbles between the donor substrate 250 and the substrate 261 may be effectively prevented, and thus lamination is preferably performed outward from the center.

The laser irradiation apparatus 200 is provided separately from the substrate 261 and the donor substrate 250. The laser irradiation apparatus 200 includes a light source device 210, a collimation lens 220, a symmetrical DOE lens array 230, and a cylindrical lens.

The light source device 210 separates the transfer layer 253 from the donor substrate 250 to transfer the transfer layer 253 onto the substrate 261 to generate a laser beam 270 required to form a predetermined pattern.

The collimating lens 220 serves to parallelize the laser beam emitted from the light source device 210.

The symmetrical diode lens array 230 is an optical device using a diffraction phenomenon of light, and converges light into one point using a method of matching phases. While the laser beam from the light source reaches the store, the laser beams that pass each path do not have the same light path but reach the store in the same phase, so that the thin film has the same effect as passing the same light path in the refractive lens. .

The symmetrical diode lens array 230 is a combination of a plurality of symmetrical diode lens 230a. For this reason, the laser irradiation apparatus 200 may manufacture an organic light emitting display device by performing a multi-scan method that can simultaneously pattern a plurality of pixels of the same color.

Since the symmetrical diode lens array 230 can move up and down between the collimating lens 220 and the cylindrical lens 240, the focal length of the symmetrical diode lens 230a can be adjusted, so that the pattern size of the pixel region is increased. I can regulate it freely.

2B is a cross-sectional view illustrating a relationship between a symmetrical diode lens array and a cylindrical lens of the laser irradiation apparatus according to the present invention.

2B, the cylindrical lens 240 is positioned below the symmetrical diode lens 230a.

The focal length f1 of the symmetric diode lens 230a is 10 to 300 mm. When the focal length f1 of the symmetrical diode lens 230a is 10 mm or less, when patterning, a space cannot be secured between the substrate and the lens so that other additional devices other than the donor substrate cannot enter and are spaced apart during scanning There may be no space for this to work. In addition, the problem that the size of the device is too large if more than 300mm.

The focal length f2 of the cylindrical lens 240 is 10 to 300 mm. The reason for the range limitation of the focal length f2 of the cylindrical lens 240 is the same as the reason for the range limitation of the focal length f1 of the symmetrical diode lens 230a.

The distance d1 between the symmetrical diode lens 230a and the cylindrical lens 240 is 5 to 250 mm. If the distance d1 between the symmetrical diode lens 230a and the cylindrical lens 240 is less than or equal to 5 mm, the refractive effect of the symmetrical diode lens 230a does not appear. The problem is that the size is too large.

The distance d2 between the cylindrical lens 240 and the unit pixel P2 is 5 to 250 mm. The reason for the distance limitation is the same as the reason for the limitation of the distance d1 between the symmetrical diode lens 230a and the cylindrical lens 240. In addition, the sum of the distance d1 between the symmetrical diode lens 230a and the cylindrical lens 240 and the distance d2 between the cylindrical lens 240 and the unit pixel P2 is equal to the symmetrical diode lens 230a. ) Is 2/3 of the focal length f1.

In addition, when a pixel is manufactured at 50 to 300 ppi (pixel per inch), the unit pixel representing all of red (R), green (G), and blue (B) is called P2, and the size is 60 to 500 µm. . The pitch of the symmetrical diode lens 230a is referred to as P1, and P1 is 60 to 500 µm. The pitch of the cylindrical lens 240 by the symmetrical diode lens 230a is referred to as Px, and Px should be greater than zero and less than or equal to 491 (2/3) mu m.

The formula of the lens is given by f2 = -1 / (f1-d1) + 1 / x ---- (1).

Using the law of triangle proportionality

P1: Px = f: (f1-d1) ---- (2)

Px: 1/3 × P2 = (f1-d1) :( f1-d1-d2) ---- (3)

P1: 1/3 × P2 = f1: (f1-d1-d2) ---- (4)

Is given by

(Example)

When producing 17-inch UXGA, the pixel count is 1600 × 1200. The pixel pitch is 72 x 216 mu m. In this case, the laser irradiation apparatus is designed as follows.

If f1 is 100 mm, f2 is 100 mm, d1 is 20 mm and d2 is 40 mm,

P2 is determined to be 216 μm,

In equation (2), Px = 0.8 × P1, and substituting this in equation (3)

P1 = 180 micrometers.

If d2 is not given, then in (3)

Since P2 = (1036.8-5.4 x d2) mu m, as d2 increases, P2 decreases.

Subsequently, referring again to FIG. 2A, the symmetric diode lens array 230 may be made of glass or plastic, which is a transparent material.

3 is a perspective view showing the shape of the symmetrical diode lens of the laser irradiation apparatus according to the present invention.

Referring to FIG. 3, the shape of the symmetrical diode lens 230a may be any one selected from a blaze shape (a), a plate shape (b), and a step shape (c, d). It may be hemispherical as shown in FIGS. 2A and 2B. In addition, the shape of the symmetrical diode lens 230a can be adjusted according to the size of the pattern. In particular, in the case of the symmetrical diode lens 230a of the stepped shapes (c, d), the number of steps to finely manufacture the pattern You can also increase

Subsequently, the cylindrical lens 240 shortens the laser beam passing through the symmetrical diode lens array 230 in a unilateral direction. For example, the square laser beam may be transformed into a rectangular laser beam, and the circular laser beam may be transformed into an elliptical laser beam to adjust the size of the pattern. In addition, the laser beam passing through the cylindrical lens 240 has a uniform intensity.

In addition, the cylindrical lens 240 is movable up and down between the symmetrical diode lens array 230 and the donor substrate 250, so as to freely size the pattern of the pixel region like the symmetrical diode lens array 230. I can regulate it by material.

Subsequently, the laser beam 270 generated by the light source device 210 of the laser irradiation apparatus 200 is parallelized by passing through the collimating lens 220, and the parallelized laser beam 270 is the symmetrical diode lens. Passing through the array 230 causes diffraction. The laser beam passing through the symmetrical diode lens array 230 is diffracted to adjust the phase of the wavefront through a change in refractive index, height and period of surface relief, and optical path. Therefore, the laser beams have different diffraction angles, and phase coherence occurs on the surface of the cylindrical lens 240, thereby forming a shape of a laser beam that is regularly patterned.

Subsequently, a patterned laser beam arrives at a predetermined distance on the base layer 251 of the donor substrate 250, and the patterned laser beam irradiates a partial region of the base layer 251 to transmit the transfer layer 253. Transfer to the substrate 261 to form an organic layer pattern (not shown).

Here, the transfer process of forming the organic layer pattern by using the laser irradiation apparatus 200 may be performed in an N ₂ atmosphere. This is to prevent oxidation of the organic layer pattern by oxygen existing in the atmosphere. Here, since much time and cost must be invested to create an N ₂ atmosphere, considering the condition that the organic layer does not affect oxygen or moisture, until O ₂ and H ₂ O are each 100 ppm or less. Preference is given to charging N ₂ .

In addition, the transfer process may be carried out in a vacuum atmosphere, it is possible to suppress the generation of bubbles between the donor substrate and the substrate during the process of laminating the donor substrate on the front surface of the substrate.

As described above, the present invention has the effect of shortening the process time and reducing the manufacturing cost by manufacturing the organic light emitting device using a laser irradiation device having a diode lens array and a cylindrical lens. Therefore, the present invention can ensure the reliability of the organic light emitting device as well as improve the production yield.

While the invention has been shown and described with reference to certain preferred embodiments, the invention is not so limited, and the invention is not limited to the scope and spirit of the invention as defined by the following claims. It will be readily apparent to one of ordinary skill in the art that various modifications and variations can be made.

As described above, the present invention has the effect of shortening the process time and reducing the manufacturing cost by manufacturing the organic light emitting device using a laser irradiation device having a diode lens array and a cylindrical lens. Therefore, the present invention can ensure the reliability of the organic light emitting device as well as improve the manufacturing yield.

Claims (14)

Light source device; A collimation lens positioned under the light source device; A symmetrical DOE lens array positioned below the collimating lens; And And a cylindrical lens positioned below the symmetric diode lens array. The method of claim 1, The symmetric diode lens array is a laser irradiation apparatus, characterized in that made of a combination of a plurality of symmetric diode lens made of a transparent material. The method of claim 1, And the symmetric diode lens array is movable up and down between the collimating lens and the cylindrical lens. The method of claim 1, The shape of the symmetric diode lens is a laser irradiation apparatus, characterized in that any one selected from hemispherical, blaze shape, step shape and plate shape. The method of claim 1, The focal length of the symmetric diode lens is a laser irradiation apparatus, characterized in that 10 ~ 300mm. The method of claim 1, The pitch of the symmetric diode lens is a laser irradiation apparatus, characterized in that 60 ~ 500㎛. The method of claim 1, And a distance between the symmetric diode lens and the cylindrical lens is 5 to 250 mm. The method of claim 1, The focal length of the cylindrical lens is a laser irradiation apparatus, characterized in that 10 ~ 300mm. The method of claim 2, The transparent material is a laser irradiation apparatus, characterized in that the glass or transparent plastic. Providing a substrate on which a first electrode is formed; Providing a donor substrate for a laser transfer manufactured by laminating a base layer, a light-to-heat conversion layer on the base layer, and a transfer layer on the light-to-heat conversion layer; The transfer layers are spaced apart from each other so as to face the substrate; By using a laser irradiation apparatus comprising a light source device, a collimating lens positioned below the light source device, a symmetrical diy lens array positioned below the collimating lens, and a cylindrical lens positioned below the symmetrical dioi lens array, A method of manufacturing an organic light emitting display device, the method comprising: irradiating a laser to a portion of the region to transfer the transfer layer to form an organic layer pattern on the substrate. The method of claim 10, The symmetric diode lens array is a method of manufacturing an organic light emitting display device, characterized in that consisting of a plurality of symmetrical diode lenses made of a transparent material. The method of claim 10, The symmetric diode lens manufacturing method of the organic light emitting device, characterized in that the movable up and down between the collimating lens and the cylindrical lens. The method of claim 10, And the cylindrical lens is movable up and down between the donor substrate and the symmetric diode lens array. The method of claim 10, The laser irradiation apparatus is a method of manufacturing an organic light emitting display device, characterized in that to perform a multi-scan method.

Images