KR20070088516A - Method of surface treatment - Google Patents

Method of surface treatment Download PDF

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KR20070088516A
KR20070088516A KR1020077006005A KR20077006005A KR20070088516A KR 20070088516 A KR20070088516 A KR 20070088516A KR 1020077006005 A KR1020077006005 A KR 1020077006005A KR 20077006005 A KR20077006005 A KR 20077006005A KR 20070088516 A KR20070088516 A KR 20070088516A
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treatment
weight
electrolytic
vacuum
removal
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KR101116517B1 (en
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사카에 이나요시
다케루 노무라
가쓰노부 이시자와
신이치 사이토
마나미 야마구치
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가부시키가이샤 알박
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00Brightening metals by chemical means
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/14Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
    • C23G1/19Iron or steel
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/14Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
    • C23G1/16Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions using inhibitors
    • C23G1/18Organic inhibitors
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F1/00Electrolytic cleaning, degreasing, pickling or descaling

Abstract

Any matter of chemical liquid, metal, etc. adhering to the surface of a member as a constituent of vacuum treatment apparatus, such as a vacuum vessel, is removed without the use of highly dangerous nitric acid, etc. There is provided a method of surface treatment for a metal part being a constituent of vacuum treatment apparatus as a treatment object, characterized in that the treatment object on its surface is first subjected to electrolytic polishing, partial electrolytic polishing, chemical polishing, pickling or electrolytic pickling and thereafter washed by means of an alkali chelate solution obtained by adding a carboxylic acid or carboxylic salt to a 0.5 to less than 3 wt.% dilute alkali solution up to a concentration of 0.5 to less than 10 wt.%.

Description

표면처리방법{METHOD OF SURFACE TREATMENT}Surface treatment method {METHOD OF SURFACE TREATMENT}

본 발명은, 진공처리장치를 구성하는 금속제 부품의 표면을 청정화하기 위한 표면처리방법에 관한 것이다.TECHNICAL FIELD This invention relates to the surface treatment method for cleaning the surface of the metal component which comprises a vacuum processing apparatus.

진공용기 등의 진공처리장치를 구성하는 스테인레스강부재는, 용접, 기계가공 등을 하고, 진공용기의 형상으로 한 후, 가공과정에 있어서 부착한 윤활제나 손의 지문 등을 제거하기 위해서 표면처리를 하도록 하고 있다.The stainless steel member constituting the vacuum processing device such as a vacuum container is welded, machined, or the like, and formed into a shape of a vacuum container, and then subjected to surface treatment in order to remove lubricants, fingerprints, and the like attached during processing. I'm trying to.

최근 진공장치가 대형화되어, 대형화한 진공처리장치를 구성하는 부재 전체를 한번에 처리하는 것이 곤란해졌기 때문에, 본 출원인은, 일본 특허출원 2004-219001에 있어서 부분 전해처리를 제안하였다. In recent years, since the vacuum apparatus has been enlarged and it has become difficult to process all the members constituting the enlarged vacuum processor at once, the present applicant has proposed partial electrolytic treatment in Japanese Patent Application 2004-219001.

이 부분 전해처리에서도, 처리를 위해서 사용한 약액을 제거하기 위해서 순수 등에 의한 세정이 필요하다. 부분 전해처리의 과정에서, 표면에 스머트(smut)라 불리는 금속성의 부착물(스테인레스강의 경우는, Cr, Ni, Fe 등의 산화물 및 염이 불균일하게 부착되어 있다)은, 고압제트를 이용한 순수세정을 해도 제거하는 것은 어렵고, 진공분위기하에서 상기 금속성 부착물이 공간에 방출되거나, 그 후의 성막시에 하전입자가 두드려서 공간으로 방출되거나 하여, 진공장치를 오염할 가능성이 있다고 하는 문제가 있었다. 이러한 금속성 부착물을 제거하기 위해서는, 부 분 전해처리 후에, 취급할 때의 위험성이 높은 질산을 사용하여 세정해야 한다는 문제가 있었다.Also in this partial electrolytic treatment, cleaning with pure water or the like is necessary to remove the chemical liquid used for the treatment. In the process of partial electrolytic treatment, metallic deposits called smuts (in the case of stainless steel, oxides and salts such as Cr, Ni, Fe, etc. are unevenly attached) are purely cleaned using a high pressure jet. It is difficult to remove even if it is, and there is a problem that the metallic deposit is released into the space under a vacuum atmosphere, or charged particles are released into the space during subsequent film formation, which may contaminate the vacuum apparatus. In order to remove such metallic deposits, there has been a problem that after partial electrolytic treatment, cleaning is performed using nitric acid having a high risk of handling.

장치의 표면처리방법으로서, 상술한 부분 전해처리 외, 종래부터 행하여지고 있는 전해연마, 화학연마 등이 있지만, 이러한 방법 모두, 처리 후에는, 금속 표면에 상술한 스머트가 부착된다. 스머트를 그대로 부착시켜 두는 것은, 부분 전해처리일 때와 같이 공간내에 방출되어 진공장치를 오염할 가능성이 문제가 있었다. 또한, 이러한 금속성 부착물을 제거하기 위해서는, 부분 전해처리 후에, 취급할 때의 위험성이 높은 질산을 사용하여 세정해야 한다는 문제가 있었다.As the surface treatment method of the apparatus, in addition to the partial electrolytic treatment described above, electrolytic polishing, chemical polishing and the like that have been conventionally performed, all of these methods adhere to the metal surface described above after the treatment. Leaving the smut as it was, there was a problem of being released into the space and contaminating the vacuum apparatus as in the case of partial electrolytic treatment. In addition, in order to remove such metallic deposits, there has been a problem that after partial electrolytic treatment, cleaning is performed using nitric acid having a high risk of handling.

따라서, 본 발명은, 상기 종래의 문제를 해결하기 위한 것으로, 진공용기 등의 진공처리장치를 구성하는 부재의 표면에 부착한 약액이나 금속 등의 부착물을, 위험성이 높은 질산 등을 사용하지 않고, 게다가, 침지처리하는 일없이 제거하는 것을 목적으로 한다.Accordingly, the present invention is to solve the above-mentioned conventional problems, and does not use a high-risk nitric acid or the like for chemical substances or metals attached to the surface of the members constituting the vacuum processing apparatus such as a vacuum container. Moreover, it aims at removing without immersion.

상기 과제를 해결하기 위해서, 본 발명자들은 예의 검토한 결과, 질산 대신에 알칼리계 킬레이트액을 사용하는 것에 의해, 상기 과제를 해결할 수 있다고 하는 견지에 기초하여, 아래와 같이 해결수단을 발견하였다.MEANS TO SOLVE THE PROBLEM In order to solve the said subject, as a result of earnestly examining, the present inventors discovered the following solution means based on the point that the said subject can be solved by using an alkaline chelating liquid instead of nitric acid.

즉, 본 발명의 표면처리방법은, 청구항 1에 기재된 바와 같이, 진공처리장치를 구성하는 금속제 부품을 피처리물로 하는 표면처리방법으로서, 상기 피처리물의 표면을 전해연마, 부분 전해처리, 화학연마, 산세 또는 전해 산세한 후에, 0.5중량% 이상 3중량% 미만의 희알칼리액에, 농도가 0.5중량% 이상 10중량% 미만이 되도록 카르본산 또는 카르본산염을 첨가하여 얻어진 알칼리계 킬레이트액에 의해, 상기 피처리물의 표면을 세정하는 것을 특징으로 한다.That is, the surface treatment method of this invention is a surface treatment method using the metal component which comprises a vacuum processing apparatus as a to-be-processed object as described in Claim 1, The surface of the said to-be-processed object is electropolishing, partial electrolytic treatment, chemical After polishing, pickling, or electrolytic pickling, to an alkaline chelate solution obtained by adding carboxylic acid or carboxylic acid so as to have a concentration of 0.5% by weight to less than 3% by weight so as to have a concentration of 0.5% by weight to less than 10% by weight. By this, the surface of the to-be-processed object is wash | cleaned.

또한, 청구항 2에 기재의 표면처리방법은, 청구항 1에 기재의 표면처리방법에 있어서, 상기 알칼리계 킬레이트액의 온도를, 10∼80℃로 하는 것을 특징으로 한다.The surface treatment method according to claim 2 is characterized in that, in the surface treatment method according to claim 1, the temperature of the alkali chelate liquid is set to 10 to 80 ° C.

본 발명의 표면처리방법에 의하면, 비교적 간소한 구성으로 피처리물의 표면을 세정할 수 있다. 또한, 피처리물 표면의 금속 등의 부착물을, 질산을 사용하지 않아도 제거할 수 있으므로 위험성이 적다. 또한, 본 발명에 의해 표면처리된 부재에 의해 진공처리장치를 구성하면, 진공 분위기하에서, 방출되는 가스를 줄일 수 있다.According to the surface treatment method of this invention, the surface of a to-be-processed object can be wash | cleaned with a comparatively simple structure. Further, since deposits such as metal on the surface of the workpiece can be removed without using nitric acid, there is little risk. In addition, if the vacuum treatment apparatus is constituted by the member surface-treated according to the present invention, it is possible to reduce the gas emitted in a vacuum atmosphere.

도 1은 실시예 3의 단위면적당 가스방출속도의 변화를 나타내는 그래프1 is a graph showing a change in gas release rate per unit area of Example 3

[부호의 설명][Description of the code]

1 : 킬레이트액에 의한 처리를 실시한 시료의 단위면적당 가스방출속도1: gas release rate per unit area of sample treated with chelating liquid

2 : 킬레이트액에 의한 처리를 하지 않았던 시료의 단위면적당 가스방출속도2: gas release rate per unit area of the sample which was not treated with chelating liquid

본 발명은, 진공처리장치를 구성하는 금속제 부품을 피처리물로 하는 표면처리방법으로서, 상기 피처리물의 표면을 전해연마, 부분 전해처리, 화학연마, 산세 또는 전해 산세한 후에, 0.5중량% 이상 3중량% 미만의 희알칼리액에, 농도가 0.5중량% 이상 10중량% 미만이 되도록 카르본산 또는 카르본산염을 첨가하여 얻어진 알 칼리계 킬레이트액에 의해, 상기 피처리물의 표면을 세정하는 것을 특징으로 하는 것이다.The present invention is a surface treatment method of using a metal component constituting a vacuum treatment apparatus as a workpiece, after the surface of the workpiece is subjected to electropolishing, partial electrolytic treatment, chemical polishing, pickling or electrolytic pickling, at least 0.5% by weight. The surface of the object is washed with an alkaline chelating solution obtained by adding carboxylic acid or carboxylic acid to a concentration of less than 3% by weight of the rare alkaline solution so that the concentration is 0.5% by weight to less than 10% by weight. It is to be done.

상기 진공처리장치를 구성하는 금속제 부품은, 진공처리 환경하에 있는 부품이면 특별히 제한하는 것은 아니다. 일례를 들면, 금속제 용기 등을 들 수 있다. 한편, 상기 금속으로서는, 스테인레스강, 알루미늄합금, 티탄합금 등을 들 수 있다. The metal component which comprises the said vacuum processing apparatus will not be restrict | limited in particular, if it is a component in a vacuum processing environment. As an example, a metal container etc. are mentioned. On the other hand, as said metal, stainless steel, an aluminum alloy, a titanium alloy etc. are mentioned.

상기 처리매체로서는, 상기 전극간에 전류를 흘릴 수 있으면, 재료나 형상은 한정되는 것은 아니지만, 예를 들면, 부직포를 사용할 수 있다.As the treatment medium, if the current can flow between the electrodes, the material and the shape are not limited. For example, a nonwoven fabric can be used.

상기 전해연마, 화학연마, 산세 또는 전해 산세는, 공지된 것이며, 또한, 부분 전해처리라 함은, 피처리물을 전원의 양극측에 접속하는 것과 함께, 음극측에 피처리물의 표면에 전해액을 접촉시키기 위한 처리매체를 접속하고, 전극간에, 전해액을 통하여 직류전류를 흘리는 것에 의해, 피처리물의 표면을 전해연마하는 것을 말하는 것으로 하고, 이 처리에 의해, 피처리물의 표면거칠기(Rmax)를 0.1㎛로 하는 것이 더 바람직하다. 한편, 구체적인 예는, 일본 특허출원 2004-219001에 기재되어 있다.The electrolytic polishing, chemical polishing, pickling or electrolytic pickling is well known, and the partial electrolytic treatment is to connect the workpiece to the anode side of the power supply, and to attach the electrolyte solution to the surface of the workpiece on the cathode side. Electrolytic polishing of the surface of the workpiece by connecting a treatment medium for contact and passing a DC current through the electrolyte between the electrodes, and by this treatment, surface roughness (R max ) of the workpiece is determined. It is more preferable to set it as 0.1 micrometer. In addition, the specific example is described in Japanese patent application 2004-219001.

상기 전해연마 또는 부분 전해처리에 사용되는 전해액으로서는, 무기산, 유기산, 무기산염 및 유기산염 중의 적어도 어느 하나를 포함하는 것으로, 구체적으로는, 인산, 황산, 구연산 암모늄, 염화암모늄, 인산2 수소암모늄, 황산암모늄, 질산나트륨, 구연산 등을 들 수 있다.The electrolytic solution used for the electropolishing or partial electrolytic treatment contains at least one of an inorganic acid, an organic acid, an inorganic acid salt and an organic acid salt. Specifically, phosphoric acid, sulfuric acid, ammonium citrate, ammonium chloride, ammonium dihydrogen phosphate, Ammonium sulfate, sodium nitrate, citric acid and the like.

또한, 부분 전해처리에 사용할 수 있는 처리매체로서는, 상기 전극간에 직류전류를 흘릴 수 있으면, 재료나 형상은 한정되는 것은 아니지만, 예를 들면, 부직포를 사용할 수 있다.In addition, as a processing medium which can be used for partial electrolytic treatment, if a direct current can flow between the electrodes, the material and shape are not limited, but a nonwoven fabric can be used, for example.

전해연마 또는 부분 전해처리에 있어서의 전해 전류밀도는, 피처리물에 따라 다르지만, 예를 들면, 스테인레스강이라면, 0.1∼0.5A/㎠이다.The electrolytic current density in the electropolishing or partial electrolytic treatment varies depending on the object to be treated, but is, for example, 0.1 to 0.5 A / cm 2 if it is stainless steel.

알칼리계 킬레이트액으로서는, 수산화나트륨 등의 희알칼리 수용액에, 구연산, 구연산나트륨, 옥살산암모늄, 프탈산나트륨, 주석산칼륨, 글루콘산나트륨, 사과산 등을 첨가한 용액 등을 들 수 있다.As an alkaline chelate liquid, the solution which added citric acid, sodium citrate, ammonium oxalate, sodium phthalate, potassium tartrate, sodium gluconate, malic acid, etc. to dilute alkaline aqueous solution, such as sodium hydroxide, etc. are mentioned.

상기 알칼리계 킬레이트액은, 10℃∼80℃로 하는 것이 바람직하다. 10℃ 미만에서는, 반응속도가 현저하게 저하하여, 80℃ 초과에서는 취급성이 나쁘고, 또한, 알칼리 부식의 우려가 있기 때문이다.It is preferable that the said alkali chelate liquid shall be 10 degreeC-80 degreeC. It is because when it is less than 10 degreeC, reaction rate will fall remarkably, and when it exceeds 80 degreeC, handleability will be bad and there exists a possibility of alkali corrosion.

또한, 상기 알칼리계 킬레이트액에 의한 처리는, 천 등의 처리매체에 스며들게 하여 실시하는 것이 바람직하다. 피처리물이 대형화되어도 국소적으로 표면처리를 할 수 있기 때문이다.In addition, the treatment with the alkali chelate solution is preferably carried out by infiltration into a treatment medium such as cloth. This is because the surface treatment can be performed locally even if the workpiece is enlarged.

[실시예 1]Example 1

SUS304(300mm×150mm×1mm)의 피처리물에 인산2 수소나트륨, 질산나트륨의 중화염에 의해 부분 전해처리를 실시하여, 표면에 생긴 적색 및 청색의 스머트에 대해서, 하기 2종류의 킬레이트액에 의해 다음의 처리를 실시하였다.Partial electrolytic treatment was carried out on the SUS304 (300 mm x 150 mm x 1 mm) to be treated with neutralized salts of sodium dihydrogen phosphate and sodium nitrate. The following treatment was performed by.

a) 1중량%의 수산화나트륨용액에, 농도가 3중량%이 되도록 구연산나트륨을 첨가한 용액a) A solution in which sodium citrate is added to 1% by weight of sodium hydroxide solution so that the concentration is 3% by weight.

b) 1중량%의 수산화나트륨용액에, 농도가 3중량%이 되도록 사과산을 첨가한 용액b) A solution in which 1% by weight of sodium hydroxide solution is added with malic acid so that the concentration is 3% by weight.

각 킬레이트액을 40∼50℃로 온도를 가하여, 세정포에 함유시켜서 피처리물의 전체 면에 와이핑을 실시하였다. 와이핑 종료후, 50℃로 온도를 가한 순수에 의해 고압제트세정을 실시하여, 전해연마에 사용한 약액 및 알칼리계 킬레이트용액의 제거를 실시하였다. 그리고, 마무리로서 기화시킨 액체 질소에 의해 건조하였다.Each chelating solution was added at a temperature of 40 to 50 ° C, contained in a cleaning cloth, and the entire surface of the object was wiped. After the completion of wiping, high-pressure jet cleaning was performed with pure water heated to 50 ° C to remove the chemical liquid and alkaline chelate solution used for electrolytic polishing. And it dried with the liquid nitrogen vaporized as finishing.

스머트 제거의 효과를 확인하기 위해서, 이온 크로마토 분석을 실시하였다. 상세하게는, 세정 전후의 피처리물을 대상으로 하여, 순수를 스며들게 한 세정포에 의해 전체 면을 와이핑한 후에, 상기 세정포에 스며든 순수 100ml를 추출하여, 단위면적당 각 이온량을 산출하였다.In order to confirm the effect of smut removal, ion chromatography analysis was performed. Specifically, the object was treated before and after washing, and after wiping the entire surface with a cleaning cloth infiltrated with pure water, 100 ml of pure water permeated into the cleaning cloth was extracted to calculate the amount of each ion per unit area. .

이 결과를, a에 대해서는, 표 1에, b에 대해서는 표 2에 나타낸다. This result is shown in Table 1 about a and Table 2 about b.

(ng·㎠)(ngcm2) 양이온Cation Na+ Na + NH4 + NH 4 + K+ K + Mg2 + Mg 2 + Ca2 + Ca 2 + NaH2PO4 NaH 2 PO 4 제거 전Before removal 25.125.1 26.726.7 19.619.6 NDND 22.122.1 제거 후After removal 1.71.7 1.81.8 0.20.2 NDND NDND NaNO3 NaNO 3 제거 전Before removal 33.133.1 35.935.9 22.722.7 NDND 34.234.2 제거 후After removal 1.51.5 0.50.5 0.10.1 NDND NDND

(ng·㎠)(ngcm2) 음이온Negative ion F- F - Cl- Cl - NO2 - NO 2 - Br- Br - NO3 - NO 3 - PO4 3 - PO 4 3 - SO4 2 - SO 4 2 - NaH2PO4 NaH 2 PO 4 제거 전Before removal 78.978.9 39.439.4 77.277.2 12.412.4 682.3682.3 247.2247.2 332.5332.5 제거 후After removal 00 1.31.3 3.73.7 NDND 1.31.3 4.94.9 2.62.6 NaNO3 NaNO 3 제거 전Before removal 77.377.3 34.134.1 789.5789.5 22.722.7 542542 324.1324.1 246.1246.1 제거 후After removal 1.81.8 3.73.7 7.67.6 NDND 5.35.3 1.91.9 3.83.8

(ng·㎠)(ngcm2) 양이온Cation Na+ Na + NH4 + NH 4 + K+ K + Mg2 + Mg 2 + Ca2 + Ca 2 + NaH2PO4 NaH 2 PO 4 제거 전Before removal 19.119.1 18.718.7 22.622.6 NDND 27.127.1 제거 후After removal 2.82.8 12.212.2 0.70.7 NDND NDND NaNO3 NaNO 3 제거 전Before removal 32.132.1 21.921.9 11.911.9 NDND 23.123.1 제거 후After removal 1.91.9 2.82.8 0.40.4 NDND NDND (ng·㎠)(ngcm2) 음이온Negative ion F- F - Cl- Cl - NO2 - NO 2 - Br- Br - NO3 - NO 3 - PO4 3 - PO 4 3 - SO4 2 - SO 4 2 - NaH2PO4 NaH 2 PO 4 제거 전Before removal 85.985.9 33.333.3 74.274.2 17.417.4 789.1789.1 251.6251.6 348348 제거 후After removal 00 1.91.9 4.74.7 NDND 1.91.9 6.96.9 1.61.6 NaNO3 NaNO 3 제거 전Before removal 57.357.3 19.919.9 54.7 54.7 11.611.6 967.1967.1 104.5104.5 127.5127.5 제거 후After removal 2.12.1 4.14.1 5.55.5 NDND 6.36.3 2.52.5 1.81.8

상기 표 1 및 표 2로부터, 스머트 제거 후는, 제거 전에 비하여 합금성분의 부착염이 되는 음이온과 함께, Na+의 양이온도 적어졌다.From the said Table 1 and Table 2, after a smut removal, the cation of Na <+> also became few with the anion used as an adhesion salt of an alloying component compared with before removal.

[실시예 2]Example 2

SUS304(300mm×150mm×1mm)의 피처리물에, 인산2 수소나트륨, 질산나트륨의 중화염에 의해 부분 전해처리를 실시하여, 표면에 생긴 적색 및 청색의 스머트에 대해서, 하기 2종류의 킬레이트액에 의해 다음의 처리를 실시하였다.The SUS304 (300 mm x 150 mm x 1 mm) was subjected to partial electrolytic treatment with neutralized salts of sodium dihydrogen phosphate and sodium nitrate, and the following two kinds of chelates were applied to the red and blue smuts formed on the surface. The following treatment was performed with the liquid.

a) 40℃로 온도를 가한 1중량%의 수산화 나트륨용액에, 농도가 3중량%이 되도록 구연산 나트륨을 첨가한 용액a) A solution obtained by adding sodium citrate to a concentration of 3% by weight in a 1% by weight sodium hydroxide solution at 40 ° C

b) 40℃로 가습한 1중량%의 수산화 나트륨용액에, 농도가 3중량%이 되도록 사과산을 첨가한 용액b) A solution in which 1% by weight of sodium hydroxide solution humidified at 40 ° C. is added malic acid so that the concentration is 3% by weight.

a, b의 킬레이트액에 대해서, 세정포에 함유시켜서 피처리물의 전체 면에 와이핑을 실시하였다. 와이핑 종료후, 스머트 제거의 효과를 확인하기 위해서, 사용한 각 세정포를 100ml의 순수에 침지하여, 각 킬레이트액에의 금속성분의 용출량을 순수에 추출하였다. 그리고, 분석대상이 되는 금속을 스테인레스합금의 성분인 Fe, Cr, Ni로서, 원자흡광분석에 의해 측정하였다.About the chelating liquid of a, b, it included in the washing cloth and wiped the whole surface of to-be-processed object. After the end of wiping, in order to confirm the effect of removing the smut, each used cleaning cloth was immersed in 100 ml of pure water, and the amount of elution of the metal component in each chelate solution was extracted into the pure water. The metal to be analyzed was measured by atomic absorption analysis as Fe, Cr, and Ni as components of the stainless alloy.

한편, 검출된 스테인레스강성분이 스머트 부분으로부터이며, 스테인레스강 자체로부터는 아닌 것을 나타내기 위해서, 30중량%의 질산용액에 의한 스머트 제거, 수세후, a에 의해 처리하여, 이 a에 의한 처리에 대해 사용한 세정포로부터 추출한 샘플을 작성하여, 이것을 c로 하였다. On the other hand, in order to show that the detected stainless steel component is from the smut portion and not from the stainless steel itself, the smut is removed by 30% by weight of nitric acid solution, after washing with water, and then treated by a, followed by the treatment by a. A sample extracted from the cleaning cloth used for was prepared, and this was referred to as c.

이 결과를, 표 3에 나타낸다.This result is shown in Table 3.

a(mg/L)a (mg / L) b(mg/L)b (mg / L) c(mg/L)c (mg / L) FeFe CrCr NiNi FeFe CrCr NiNi FeFe CrCr NiNi NaH2PO4 NaH 2 PO 4 1.421.42 0.060.06 NDND 1.181.18 NDND NDND NDND NDND NDND NaNO3 NaNO 3 1.331.33 0.080.08 NDND 1.671.67 0.070.07 NDND NDND NDND NDND

상기 결과로부터, a, b를 사용한 세정포로부터는, Fe, Cr이 검출되었다. 한편, c에서는, Fe, Cr, Ni의 스테인레스강을 구성하는 원소는 검출되지 않았다.From the above results, Fe and Cr were detected from the cleaning cloth using a and b. On the other hand, in c, the element which comprises stainless steel of Fe, Cr, and Ni was not detected.

이 결과로부터, a, b에서는, 피처리물 자체에 손상을 주는 일 없이, 스머트가 제거되는 것을 알 수 있었다.From this result, it turned out that a, b removes a smut, without damaging the to-be-processed object itself.

[실시예 3]Example 3

SUS304(300mm×150mm×1mm)의 피처리물에 인산2 수소암모늄, 질산나트륨의 중화염에 의해 부분 전해처리를 실시하여, 1중량%의 수산화나트륨용액에, 농도가 3중량%이 되도록 구연산 나트륨을 첨가하여 얻어진 용액을 세정포에 스며들게 하여 와이핑한 것과, 하지 않는 것의 가스방출특성을 평가하였다.Partial electrolytic treatment was carried out with a neutralized salt of ammonium dihydrogen phosphate and sodium nitrate to the treated material of SUS304 (300 mm × 150 mm × 1 mm), and sodium citrate was dissolved in 1% by weight of sodium hydroxide solution so that the concentration was 3% by weight. Was added to the cleaning cloth so as to infiltrate the cleaning cloth to evaluate the gas release characteristics of the wiping and the non-wiping.

가스방출특성은, 승온이탈법을 이용하여 실온으로부터 500℃까지 승온하는 동안에 방출되는 단위면적당 가스방출속도의 변화로 평가하였다.The gas release characteristic was evaluated by the change of the gas release rate per unit area discharged during the temperature increase from room temperature to 500 degreeC using the temperature release method.

도 1은, 단위면적당 가스방출속도의 변화를 나타내는 도면이고, 도면 중 1은, 킬레이트액에 의한 처리를 실시한 시료의 가스방출속도이고, 도면 중 2는, 처리를 실시하지 않았던 시료의 가스방출속도이다.1 is a diagram showing a change in gas release rate per unit area, in which 1 is a gas release rate of a sample treated with a chelating liquid, and 2 in the figure is a gas release rate of a sample not treated. to be.

도 1로부터, 킬레이트액에 의한 처리를 실시한 시료는, 처리를 하지 않았던 시료에 비해, 특히 250℃ 이상의 온도에서의 가스방출속도가 적어졌다. 이 온도영역에서 방출되는 가스의 근원이 킬레이트액에 의한 처리에 의해서 제거되었다.As shown in Fig. 1, the sample treated with the chelating liquid has a lower gas discharge rate especially at a temperature of 250 ° C or higher as compared with the sample which has not been treated. The source of gas released in this temperature range was removed by treatment with a chelating liquid.

[실시예 4]Example 4

SUS304(300mm×150mm×1mm)의 피처리물에 70% 인산, 30% 황산용액에 의해 전해 연마처리를 실시하여, 표면에 생긴 스머트에 대해서, 하기 1종류의 킬레이트액에 의해 다음의 처리를 실시하였다. The SUS304 (300 mm x 150 mm x 1 mm) was subjected to electropolishing treatment with 70% phosphoric acid and 30% sulfuric acid solution, and the following treatment was performed with one of the following chelate liquids on the smut formed on the surface. Was carried out.

a) 1%의 수산화 나트륨용액에, 농도가 3%가 되도록 구연산 나트륨을 첨가한 용액a) A solution of sodium citrate added to 1% sodium hydroxide solution so that the concentration is 3%.

상기 킬레이트액을 40℃∼50℃로 온도를 가하여, 청정포(淸淨布)에 함유시켜서 피처리물의 전체 면에 와이핑을 실시하였다. 와이핑 종료후, 50℃로 온도를 가한 순수를 사용한 고압제트 세정을 실시하여, 전해연마에 사용한 약액 및, 알칼리계 킬레이트 용액의 제거를 실시하였다. 마무리로서 기화시킨 액체질소에 의해 건조하였다.The said chelating liquid was added at 40 degreeC-50 degreeC, it contained in the clean cloth, and wiped the whole surface of to-be-processed object. After the wiping was completed, high-pressure jet washing using pure water heated to 50 ° C was carried out to remove the chemical liquid and the alkaline chelate solution used for electropolishing. It dried with the liquid nitrogen vaporized as a finish.

스머트 제거의 효과를 확인하기 위해서, 이온크로마토 분석을 실시하였다. 상세하게는, 세정 전후의 피처리물을 대상으로 하고, 순수를 스며들게 한 청정포에 전체 면을 와이핑한 후에, 상기 청정포에 스며든, 순수 100ml 추출하여, 단위면적당 각 이온의 양을 산출하였다. 결과를 표에 나타낸다.In order to confirm the effect of smut removal, ion chromatography analysis was performed. Specifically, the object to be treated before and after washing, and wipe the whole surface in a clean cloth infiltrated with pure water, and then extract 100ml of pure water permeated into the clean fabric to calculate the amount of each ion per unit area It was. The results are shown in the table.

양이온Cation Na+ Na + NH4 + NH 4 + K+ K + Mg2 + Mg 2 + Ca2 + Ca 2 + 제거 전Before removal 30.230.2 23.823.8 18.618.6 NDND 25.425.4 제거 후After removal 1.41.4 0.80.8 0.30.3 NDND NDND

음이온Negative ion F- F - Cl- Cl - NO2 - NO 2 - Br- Br - NO3 - NO 3 - PO4 3 - PO 4 3 - SO4 2 - SO 4 2 - 제거 전Before removal 81.181.1 29.529.5 81.281.2 15.815.8 822.1822.1 378.2378.2 423.5423.5 제거 후After removal 1.31.3 3.43.4 66 NDND 6.16.1 5.55.5 2.42.4

상기 표로부터, 스머트 제거 후는, 제거 전에 비하여 합금성분의 부착염이 되는 음이온과 함께, Na+의 양이온이 함께 적어진 것을 알 수 있다.From the above table, it can be seen that after the smut removal, the cations of Na + were reduced together with the anion serving as the adhesion salt of the alloying component as compared with before the removal.

Claims (2)

진공처리장치를 구성하는 금속제 부품을 피처리물로 하는 표면처리방법으로서, 상기 피처리물의 표면을 전해연마, 부분 전해처리, 화학연마, 산세 또는 전해 산세한 후에, 0.5중량% 이상 3중량% 미만의 희알칼리액에, 농도가 0.5중량% 이상 10중량% 미만이 되도록 카르본산 또는 카르본산염을 첨가하여 얻어진 알칼리계 킬레이트액에 의해, 상기 피처리물의 표면을 세정하는 것을 특징으로 하는 표면처리방법.A surface treatment method comprising a metal component constituting a vacuum treatment apparatus as a workpiece, wherein the surface of the workpiece is subjected to electropolishing, partial electrolytic treatment, chemical polishing, pickling, or electrolytic pickling, and at least 0.5% by weight and less than 3% by weight. The surface of the object to be treated with an alkaline chelating solution obtained by adding carboxylic acid or a carboxylic acid salt so as to have a concentration of at least 0.5% by weight and less than 10% by weight to the dilute alkaline liquid of. . 제 1 항에 있어서, 상기 알칼리계 킬레이트액의 온도를, 10∼80℃로 하는 것을 특징으로 하는 표면처리방법.The surface treatment method according to claim 1, wherein the temperature of the alkali chelate liquid is 10 to 80 ° C.
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