KR20070078553A - Liquid crystal display panel and manufacturing method thereof - Google Patents

Abstract

An LCD(Liquid Crystal Display) panel and a manufacturing method thereof are provided to prevent light leakage caused due to mis-alignment, by forming a key in forming a black matrix, thus facilitating checking of a position degree of a column spacer, and forming the column spacer at a precise location. A color filter substrate includes a black matrix(220) through which a key(221) passes, and the key defines a position where a column spacer is to be formed. A column spacer(260) is formed within an area defined by the key. The key is formed at each corner of a polygonal shape inscribed in the column spacer. The key is formed on a black matrix corresponding to an active area(A) of the thin film transistor substrate.

Description

Liquid Crystal Display Panel And Manufacturing Method Thereof {Liquid Crystal Display Panel And Manufacturing Method Thereof}

1 is a schematic cross-sectional view of a liquid crystal display panel according to an exemplary embodiment of the present invention.

2 is a plan view showing a color filter substrate according to a preferred embodiment of the present invention.

3A to 3C are flowcharts schematically illustrating the formation of a keyed black matrix according to a preferred embodiment of the present invention.

<Description of the symbols for the main parts of the drawings>

1: thin film transistor substrate 110: substrate

120: gate electrode 130: gate insulating film

140: active layer 150: ohmic contact layer

161: drain electrode 162: source electrode

170: organic insulating film 180: pixel electrode

2: color filter substrate 210: substrate

220: black matrix 221: key

230: color filter 240: overcoat

250: common electrode 260: column spacer

3: liquid crystal

A: active area

B: rectangle that inscribes the column spacer

The present invention relates to a liquid crystal display panel and a method of manufacturing the same. More specifically, by forming a key for forming a black matrix, the positional accuracy of the column spacer can be easily confirmed, and the alignment miss is formed by forming the column spacer at the correct position. The present invention relates to a liquid crystal display panel and a method of manufacturing the same, which can prevent light leakage defects caused by light.

Conventional liquid crystal display panels form column spacers to maintain cell gaps between thin film transistor substrates and color filter substrates. There was a problem in that light leakage caused by the miss.

In addition, when accurate distance management between the column spacer and the pixel electrode of the thin film transistor substrate is not performed, uneven line defects may occur, thereby degrading display quality.

Therefore, in order to check the position of the column spacer after forming the column spacer, it is conventionally used by using an in-line inspector or a Mac / Mic inspector. The above methods can only confirm the outline of the formed position. Because it is difficult to check the exact position, there was a fatal problem that is very vulnerable to the defect of smearing lead to light leakage or residue.

The present invention has been made to solve the above problems, an object of the present invention is to form a column spacer in the correct position to prevent poor light leakage due to misalignment and uneven line to the remaining balance to improve the display quality The present invention provides a liquid crystal display panel and a method of manufacturing the same.

In order to achieve the above object, a liquid crystal display panel according to the present invention includes: a color filter substrate having a black matrix through which a key is penetrated defining a position at which a column space is formed; And a column spacer formed in a region defined by the key.

And, the key is characterized in that formed on the corner of the polygon inscribed column spacer.

In addition, the key is formed on a black matrix corresponding to the active region of the thin film transistor substrate.

Here, the area of the key is 20um ² ~ 30um ² characterized in that the liquid crystal display panel.

On the other hand, the liquid crystal display panel manufacturing method according to the present invention comprises the steps of forming a black matrix through the key defining a position where the column space is to be formed on the substrate; And forming a column spacer in a region defined by the key.

In the forming of the black matrix, the key is formed at a corner of a quadrangle that inscribes the column spacer.

In the forming of the black matrix, the key is formed on the black matrix corresponding to the active region of the thin film transistor substrate.

Here, in the step of forming the black matrix, it characterized in that the area of the key to form a 20um ² ~ 30um ² .

Hereinafter, the specific configuration and operation of the present invention will be described in detail with reference to the drawings and the embodiments.

1 is a schematic cross-sectional view of a liquid crystal display panel according to an exemplary embodiment of the present invention.

Referring to FIG. 1, a liquid crystal display panel according to the present invention includes a thin film transistor substrate 1 and a color filter substrate 2 bonded together to face each other with a liquid crystal 3 therebetween.

The thin film transistor substrate 1 includes a thin film transistor formed on the insulating substrate 110 and a pixel electrode 180 connected to the thin film transistor.

In addition, the thin film transistor substrate 1 further includes an organic insulating layer 170 formed between the thin film transistor and the pixel electrode 180 to protect the thin film transistor.

The thin film transistor includes a gate electrode 120 connected to the gate line, a source electrode 162 connected to the data line, and a drain electrode 161 connected to the pixel electrode 180. The thin film transistor supplies the pixel signal supplied to the data line to the pixel electrode 180 in response to the scan signal supplied to the gate line. As the organic insulating layer 170, a photosensitive organic material such as acryl is used.

The pixel electrode 180 is connected to the drain electrode 161 of the thin film transistor through a contact hole 190 formed on the organic insulating layer 170 of each subpixel and penetrating the organic insulating layer 170.

Meanwhile, a black matrix 220 is formed on the color filter substrate 2 to prevent color mixing between the color filters and to prevent light leakage on the insulating substrate 210.

Here, the black matrix 220 is formed with a key 221 penetrated to determine the position of the column spacer in the portion where the column spacer 260 is to be formed.

On the black matrix 220, an RGB color filter 230, an overcoat 240 for maintaining a constant thickness of the color filter, and a common electrode 250 forming an electric field with the pixel electrode 180 are sequentially formed.

2 is a plan view showing a color filter substrate according to a preferred embodiment of the present invention.

Referring to FIG. 2, the column spacer 260 is formed between the active region A of the thin film transistor substrate 1 and the black matrix portion of the color filter substrate 2 corresponding thereto so as not to influence light leakage. Therefore, a key penetrating the black matrix 230 is formed in the black matrix corresponding to the active area A. FIG.

Figure 2 shows that the key 221 is formed in the corner of the rectangle (B) inscribed in the column spacer 260 in accordance with a preferred embodiment of the present invention, the key 221 according to the present invention is designed If the positional accuracy can be easily confirmed by limiting the position of the column spacer 260 may be formed in any position.

Therefore, it may be formed to define the column spacer 260 to be formed at the corner position of the polygon inscribed to the column spacer 260. In addition, since the column spacer 260 is generally designed to have a circular cross section, the column spacer 260 may be formed at a quadrant of the circle corresponding to the size of the column spacer 260 by design.

Here, in the case where the key 221 is formed at the corner of the polygon that inscribes the column spacer 260, the key 221 defines a larger area than the column spacer 260, but there is no problem in correct alignment. Is formed at the quadrant of the circle having the same size as the column spacer 260, it is difficult to accurately align the column spacer 260 in the micro process, and the column spacer 260 has a design size and an actual process error. Since the margin for error should be considered, it is preferable to form the key 221 at the quadrant of the circle formed larger than the size of the column spacer 260.

However, when the key 221 is formed at the quadrant of the circle that is too large than the column spacer 260, the column spacer 260 may be misaligned due to the positional dispersion, causing light leakage. It is good to form large enough to easily check the position accuracy. Preferably, the key 221 is formed at the quadrant of the circle formed 1.5um to 2.5um larger than the column spacer 260.

In addition, the key 221 may be formed in any shape as long as the positioning of the column spacer is easy.

On the other hand, if the size of the key 221 penetrating the black matrix 220 is too small, it is difficult to check the position of the column spacer 260. If the key 221 is too large, the key 221 is formed in the active area A. Since light leakage may occur, it is easy to check the position of the column spacer 260 and should be formed to a size that is not affected by light leakage.

for teeth. If the key 221 is a square, it is preferable to form the length of one side of 4.5um ~ 5.5um, and in the case of a circular shape, the diameter of 4.5um ~ 5.5um, 20um ² ~ 30um ² regardless of shape It is preferable to form.

A column spacer 260 is formed between the color filter substrate 2 and the thin film transistor substrate 1 to maintain a cell gap at a predetermined interval.

The column spacer 260 makes it easy to check the position accuracy of whether the column spacer 260 is formed at the correct position by the key 221 penetrated through the black matrix 220. Accordingly, the display quality of the liquid crystal panel may be improved by preventing light leakage or streaks caused by misalignment of the column spacer 260 due to misalignment of the column spacer 260.

Referring to the manufacturing method of the liquid crystal display panel according to the present invention, the thin film transistor substrate 1 and the color filter substrate 2 are manufactured through a separate process.

The thin film transistor substrate 1 deposits a gate metal on the insulating substrate 110 and forms a gate wiring including the gate electrode 120 by patterning the metal by a photolithograpy process and an etching process. do.

Thereafter, the gate insulating layer 130 is deposited, an amorphous silicon layer and an n + amorphous silicon layer are deposited, and then the n + amorphous silicon layer and the amorphous silicon layer are patterned by a photolithography process and an etching process to form an active layer ( 140 and an ohmic contact layer 150 are formed.

Subsequently, a data metal is deposited on the ohmic contact layer 150 and the gate insulating layer 130, and the data metal is patterned by photolithography and etching to form a data wiring including the source electrode 162 and the drain electrode 161. Form.

After forming the organic insulating film 170 on the data wiring and the gate insulating film 130 and forming the contact hole, the transparent conductive material is deposited on the organic insulating film 170 and patterned by photolithography and etching processes to form a pixel electrode. The thin film transistor substrate 1 is formed by forming the thin film transistor 180.

On the other hand, the color filter substrate 2 is a black matrix 220 formed with a key 221 penetrated by laminating a black metal or organic material on the insulating substrate 210 and then patterned by a photolithography process and an etching process. To form.

3A to 3C are schematic flowcharts illustrating the formation of a black matrix according to a preferred embodiment of the present invention.

3A through 3C, the black matrix 220 is formed and the key 221 is patterned for accurate alignment of the column spacer 260.

A black metal or organic material is coated on the substrate 210 and then patterned by a photolithography process. Here, the mask used in the photolithography process uses a mask made so as to pattern the key 221 at the same time as the black matrix 220.

When the metal or organic material to be applied is a negative type, the portion to be etched must be configured so that the lower portion of the mask substrate is not exposed due to the chromium (Cr) treatment. Therefore, in the color filter area and the key area which are all etched by the mask process, the lower portion of the mask substrate is subjected to chromium (Cr) treatment so that exposure is blocked, and the black matrix region that is not etched at all is not chromium (Cr) treated under the mask substrate. The photolithography process is performed through a mask fabricated to be exposed.

If the applied metal or organic material is a positive type, on the contrary, the lower portion of the mask substrate is not chromium (Cr) treated to expose the etched portion, and the lower portion of the mask substrate is exposed to chromium (Cr) so that the non-etched portion is exposed to light. The photolithography process is performed using the treated mask.

When the black matrix 220 and the key 221 are formed by the above process, the color filter PR is coated on the black matrix and then patterned by a photolithography process to form the RGB color filter 230, respectively.

Once the color filter is formed, an overcoat film is applied to the substrate as needed and patterned through a photolithography process to form an overcoat.

Thereafter, a transparent conductive material is deposited on the overcoat and patterned by photolithography and etching to form a common electrode.

On the other hand, an acrylic photosensitive resin is coated on the substrate 210 to form a column spacer, and patterned by a photolithography process to form the column spacer 260.

Here, it may be determined whether the column spacer 260 is aligned at the correct position through the key 221 patterned at the same time as the black matrix 220. Therefore, quality control is possible through the exact positioning of the column spacer, and since the column spacer is aligned at the correct position, it is possible to remove the tap light rays or residual lines that are caused by the positional distribution of the column spacer.

As described above, the liquid crystal display panel according to the present invention has an excellent effect of improving display quality by preventing column leakage defects due to misalignment and defects caused by residual misalignment by forming column spacers at precise positions.

Although the detailed description of the present invention described above has been described with reference to the preferred embodiment of the present invention, the protection scope of the present invention is not limited to the above embodiment, and those skilled in the art will appreciate It will be understood that various modifications and changes can be made in the present invention without departing from the spirit and scope of the invention.

Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification but should be defined by the claims.

Claims (8)

A color filter substrate having a black matrix through which a key is defined defining a position at which a column spacer is to be formed; And a column spacer formed in a region defined by the key. The liquid crystal display panel of claim 1, wherein the key is formed at a corner of a polygon inscribed with the column spacer. The liquid crystal display panel of claim 1 or 2, wherein the key is formed on a black matrix corresponding to an active region of the thin film transistor substrate. According to claim 1 or 2, wherein the liquid crystal display panel, characterized in that the area of the key is formed with ^two 20um 30um ~ ^2. Forming a keyed black matrix defining a position at which a column space is to be formed on the substrate; And forming a column spacer in a region defined by the key. 6. The method of claim 5, wherein the key is formed at a corner of a quadrangle in which the column spacer is inscribed in the forming of the black matrix. In the fifth or 6, wherein the liquid crystal display panel manufacturing method in the step of forming the black matrix so as to form an area of the key to 20um ² ~ 30um ^2. The method of claim 5, wherein, in the forming of the black matrix, the key is formed on a black matrix corresponding to the active region of the thin film transistor substrate.

Images