KR20070046720A - 냉각파이프가 설치된 lcd 서셉터 - Google Patents
냉각파이프가 설치된 lcd 서셉터 Download PDFInfo
- Publication number
- KR20070046720A KR20070046720A KR1020060103523A KR20060103523A KR20070046720A KR 20070046720 A KR20070046720 A KR 20070046720A KR 1020060103523 A KR1020060103523 A KR 1020060103523A KR 20060103523 A KR20060103523 A KR 20060103523A KR 20070046720 A KR20070046720 A KR 20070046720A
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- South Korea
- Prior art keywords
- susceptor
- lcd
- cooling pipe
- cover
- heater
- Prior art date
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Nonlinear Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Liquid Crystal (AREA)
Abstract
Description
Claims (6)
- 일정두께를 갖는 서셉터 몸체(11);상기 서셉터 몸체(11)에 외부 공급장치부터 냉기를 공급하는 공급부(21)와, 공급부(21)의 최초 시작점으로부터 공급된 냉기가 서셉터(10)를 순환한 후 배출되는 배출부(22)로 구성되어 서셉터 몸체(11) 전체에 걸쳐 내장 설치된 냉각파이프(20); 및LCD를 일정온도로 유지시키도록 서셉터 몸체(11)를 가열하는 히터(30)로 구성된 것을 특징으로 하는 LCD 서셉터.
- 제1항에 있어서, 상기 히터(30)는 몸체(11)의 최하단부에 제1커버(31)에 의해 냉각파이프(20)와 접촉하지 않도록 구성하고, 냉각파이프(20)는 상기 히터(30)를 커버하는 제1커버(31)의 상부에 히터(30) 라인과 동일선상에 위치하도록 배치하는 것을 특징으로 하는 LCD 서셉터.
- 제1항에 있어서, 상기 냉각파이프(20)는 서셉터(10)의 몸체(11)에 내장되고 그 하측에 히터(30)가 구성되는 것을 고려하여 열전도 및 내식성이 우수하고 열에 잘 견디며 자성이 없는 구리(Cu) 또는 스테인레스강(Sus)을 사용하며, 구리 또는 스테인레스강에 금(Au) 또는 은(Ag)도금을 하여 산화를 방지하도록 하는 것을 특징으로 하는 LCD 서셉터.
- 제1항에 있어서, 상기 냉각파이프(20)는 제2커버(32)에 의해 커버되도록 구성되고, 제2커버(32)의 상부에는 냉각파이프(20)를 흐르는 냉기의 급속한 온도저하를 방지하도록 제3커버(33)가 구성되는 것을 특징으로 하는 LCD 서셉터.
- 제1항에 있어서, 상기 냉각파이프(20)는 그 외부형상 및 유로가 원형, 사각형 등 특정형상에 제한되지 않으며, 공급부(21)와 배출부(22)가 파이프 형태로 분리 구성되는 것을 특징으로 하는 LCD 서셉터.
- 제1항에 있어서, 상기 냉각파이프(20)에 흐르는 냉각물질은 인체에 무해한 가스, 공기(Air), 질소(GN2 ,PN2), He, PCW, 갈덴(Galden) 중 어느 하나인 것을 특징으로 하는 LCD 서셉터
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050102759 | 2005-10-31 | ||
KR20050102759 | 2005-10-31 |
Publications (2)
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KR20070046720A true KR20070046720A (ko) | 2007-05-03 |
KR100726931B1 KR100726931B1 (ko) | 2007-06-14 |
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KR1020060103523A KR100726931B1 (ko) | 2005-10-31 | 2006-10-24 | 냉각파이프가 설치된 lcd 서셉터 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100934403B1 (ko) * | 2007-11-30 | 2009-12-29 | (주)위지트 | 냉각 수단을 구비한 서셉터 |
US9691644B2 (en) | 2012-09-28 | 2017-06-27 | Semes Co., Ltd. | Supporting unit, substrate treating device including the same, and method of manufacturing the supporting unit |
US20210313547A1 (en) * | 2020-04-07 | 2021-10-07 | Samsung Display Co., Ltd. | Method of manufacturing display apparatus |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101412636B1 (ko) | 2012-09-28 | 2014-06-27 | 세메스 주식회사 | 지지 유닛 및 이를 포함하는 기판 처리 장치, 그리고 지지 유닛 제조 방법 |
KR101678099B1 (ko) | 2015-05-06 | 2016-11-22 | (주)티티에스 | 히터 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001355072A (ja) * | 2000-06-13 | 2001-12-25 | Anelva Corp | 基板処理装置 |
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2006
- 2006-10-24 KR KR1020060103523A patent/KR100726931B1/ko active IP Right Grant
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100934403B1 (ko) * | 2007-11-30 | 2009-12-29 | (주)위지트 | 냉각 수단을 구비한 서셉터 |
US9691644B2 (en) | 2012-09-28 | 2017-06-27 | Semes Co., Ltd. | Supporting unit, substrate treating device including the same, and method of manufacturing the supporting unit |
US20210313547A1 (en) * | 2020-04-07 | 2021-10-07 | Samsung Display Co., Ltd. | Method of manufacturing display apparatus |
US11647664B2 (en) * | 2020-04-07 | 2023-05-09 | Samsung Display Co., Ltd. | Method of manufacturing display apparatus |
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KR100726931B1 (ko) | 2007-06-14 |
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