KR20070012221A - Removing and washing agent for a resin composition - Google Patents

Removing and washing agent for a resin composition Download PDF

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Publication number
KR20070012221A
KR20070012221A KR1020060067620A KR20060067620A KR20070012221A KR 20070012221 A KR20070012221 A KR 20070012221A KR 1020060067620 A KR1020060067620 A KR 1020060067620A KR 20060067620 A KR20060067620 A KR 20060067620A KR 20070012221 A KR20070012221 A KR 20070012221A
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South Korea
Prior art keywords
resin composition
acetate
alkylbenzene
removal
lactate
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KR1020060067620A
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Korean (ko)
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아키라 가타노
고지 하라다
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도쿄 오카 고교 가부시키가이샤
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Publication of KR20070012221A publication Critical patent/KR20070012221A/en

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    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D1/00Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/24Hydrocarbons
    • C11D7/247Hydrocarbons aromatic
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5004Organic solvents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • G03F7/422Stripping or agents therefor using liquids only

Abstract

Provided is a cleaning agent for removing a resin composition, which removes a resin composition adhered to a coating apparatus effectively and exhibits a cleaning property effective in removing a pigment-dispersible photosensitive resin composition. The cleaning agent for removing resin composition contains at least one solvent capable of dissolving and removing a resin composition adhered to the surface of an article, and a aromatic compound that disperses pigments contained in the adhered resin composition. The aromatic compound includes alkylbenzene. An alkyl group in the alkyl benzene has 3-5 carbon atoms. The alkylbenzene is contained in an amount of 5-50wt% based on the total weight of the cleaning agent.

Description

수지조성물 제거세정제{Removing and Washing Agent for a resin composition}Removing and Washing Agent for a resin composition

본 발명은, 수지 코팅 장치의 노즐, 프라이밍 롤러(priming roller), 배관 등의 물품의 표면에 부착한 수지조성물, 특히 안료가 분산되어 있는 감광성 수지조성물을, 상기 물품의 표면으로부터 효율적으로 제거하는데 바람직한 수지조성물 제거세정제에 관한 것이다.The present invention is suitable for efficiently removing a resin composition adhering to the surface of an article such as a nozzle of a resin coating device, a priming roller, a pipe, or a photosensitive resin composition in which a pigment is dispersed, from the surface of the article. The present invention relates to a resin composition removal cleaner.

반도체 소자나 액정표시 소자의 제조에 있어서는, 포토리소그래피 기술에 의해 포지티브형이나 네가티브형의 감광성 수지조성물층을 패터닝하여, 전기배선 패턴 등의 각종 패턴을 형성하고 있다. 상기 감광성 수지조성물은 도포액의 형태로 반도체 기판이나 글라스 기판 등의 기판 위에 도포되며, 적절히 건조처리가 실시되어 감광성 수지피막(감광성 수지층)을 형성한다. 이 피막을 선택적으로 노광하고, 이어서 현상처리함으로써, 패턴화된 피막이 형성된다.In the production of semiconductor devices and liquid crystal display devices, positive and negative photosensitive resin composition layers are patterned by photolithography techniques to form various patterns such as electric wiring patterns. The photosensitive resin composition is applied onto a substrate such as a semiconductor substrate or a glass substrate in the form of a coating liquid, and appropriately dried to form a photosensitive resin film (photosensitive resin layer). By selectively exposing this film and then developing, a patterned film is formed.

상기 감광성 수지조성물의 기판에 대한 도포방법으로서는, 스핀코팅(회전식 도포) 방법이 일반적이다. 하지만 근래에는, 특히 대형화가 진행되는 액정표시소자 제조의 분야에서는, 스핀 방식으로는 큰 면적을 균일하게 도포하기가 어렵기 때문 에, 코트·앤드·스핀 방식, 논스핀 방식 등의 코팅수단이 제안되고 있다.As a coating method to the board | substrate of the said photosensitive resin composition, the spin coating (rotary coating) method is common. However, in recent years, particularly in the field of liquid crystal display device manufacturing, in which the enlargement is progressing, since it is difficult to uniformly apply a large area by the spin method, coating means such as a coat-and-spin method and a non-spin method are proposed. It is becoming.

감광성 수지조성물의 코팅공정에서는, 기판 테두리, 기판 이면을 비롯하여, 수지 코팅장치의 토출노즐, 프라이밍 노즐, 이들 장치의 내벽, 이들 장치의 배관계가 감광성 수지조성물의 부착에 의해 오염되기 때문에, 정기적으로 혹은 수시로 이 오염부분들을 세정처리해야 할 필요가 있다. 상기 코팅 처리후, 코팅장치로의 수지부착량이 많고, 특히 프라이밍 롤러나 배관계로의 부착이 비교적 강고해지기 쉬워, 세정에 세심한 주위를 기울일 필요가 있다.In the coating process of the photosensitive resin composition, since the discharge nozzle of the resin coating apparatus, the priming nozzle, the inner wall of these apparatuses, and the piping system of these apparatuses are polluted by adhesion of the photosensitive resin composition, including a board | substrate edge and a back surface of a substrate, From time to time these contaminants need to be cleaned. After the coating treatment, the amount of resin adhered to the coating apparatus is large, and in particular, the adhesion to the priming roller and the piping system tends to be relatively strong, and attention to cleaning is necessary.

또한, 세정대상이 되는 수지조성물에 있어서, 안료가 분산된 감광성 수지조성물 예를 들어, 컬러필터나 블랙 매트릭스 패턴을 형성하기 위한 안료분산형 감광성 수지조성물이, 특히 세정제거가 어려운 것으로 지적되고 있으며, 이러한 안료분산형 감광성 수지조성물에 대해서도 뛰어난 세정성을 가지는 제거세정제가 종래 몇가지 제안되었다(예를 들어, 일본특허공개 2001-188364호 공보, 일본특허공개 2002-273370호 공보).In addition, in the resin composition to be cleaned, it is pointed out that the photosensitive resin composition in which the pigment is dispersed, for example, a pigment dispersion type photosensitive resin composition for forming a color filter or a black matrix pattern, is particularly difficult to remove. Several removal cleaners having excellent cleaning properties have been proposed for such pigment dispersion photosensitive resin compositions (for example, Japanese Patent Application Laid-Open No. 2001-188364 and Japanese Patent Application Laid-Open No. 2002-273370).

이 종래의 수지조성물 제거세정제는, 기본적으로는 용제에, 계면활성제나 안료분산제 등의 첨가제가 더해져 이루어진 것으로, 첨가제의 조성에 의해 세정성능의 향상을 꾀하고 있다. 용제로서는 시클로헥사논, 프로필렌글리콜모노메틸에테르아세테이트(PGMEA), 프로필렌글리콜모노메틸에테르(PGME), 초산에틸, 초산부틸, 유산에틸, 아세톤, 메틸이소부틸케톤(MIBK), 메틸에틸케톤(MEK), 메탄올, 에탄올, 디에틸에테르, 페놀 등의 관용의 수지용 용제가 사용되고 있다. 또한, 계면활성제 및 안료분산제로서도 마찬가지의 화합물이 사용되고 있으며, 예를 들어 부탈로시아닌 유도체, 오르가노실록산폴리머 등의 카티온계 계면활성제, 폴리옥시에틸렌라우릴에테르, 폴리에틸렌글리콜디라우레이트, 소르비탄 지방산 에스테르 등의 노니온계 계면활성제, 그 밖에 관용의 불소계 계면활성제나 아니온계 계면활성제가 사용되고 있다.This conventional resin composition removal detergent is basically formed by adding an additive such as a surfactant or a pigment dispersant to a solvent, and is intended to improve cleaning performance by the composition of the additive. As a solvent, cyclohexanone, propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME), ethyl acetate, butyl acetate, ethyl lactate, acetone, methyl isobutyl ketone (MIBK), methyl ethyl ketone (MEK) , Conventional resin solvents such as methanol, ethanol, diethyl ether and phenol are used. Moreover, the same compound is used also as surfactant and a pigment dispersant, For example, cationic surfactants, such as a butalocyanine derivative and an organosiloxane polymer, polyoxyethylene lauryl ether, polyethyleneglycol dilaurate, and sorbitan Nonionic surfactants such as fatty acid esters, and other conventional fluorine-based surfactants and anionic surfactants are used.

하지만, 상기 종래의 감광성 수지조성물 제거세정제에 대해서는, 다음과 같은 개선해야 할 문제점들이 지적되고 있다.However, the following problems to be improved with respect to the conventional photosensitive resin composition removal cleaner has been pointed out.

먼저, 기판의 대형화나 도포방법의 새로운 제안 등에 따라 세정영역이 확대되는 방향에 있어, 세정성능의 향상이 더욱 필요하다는 점이 지적되고 있다.First, it is pointed out that further improvement in cleaning performance is required in the direction in which the cleaning area is enlarged in accordance with the enlargement of the substrate, the new proposal of the coating method, and the like.

이어서, 안료가 첨가된 감광성 수지조성물을 사용한 경우에는, 코팅장치의 특히 토출 노즐이나 프라이밍 롤러나 배관계에 안료가 부착하기 쉬워, 그 부분의 안료의 세정제거가 불충분하다는 것이 지적되고 있다. 이 안료들의 세정잔존이 있으면 경시적으로 안료의 응집이 발생하여, 노즐의 토출이상이 발생하거나 안료응집물이 도막 안에 이물질로서 혼입하는 문제가 발생하게 된다. 또한, 제거세정제에 비(非)프로톤성 극성용매가 사용되고 있는 경우에는, 극성이 너무 강하여 안료가 응집하여 침강하고, 코팅장치의 배관계가 막히는 등의 문제가 발생하는 것도 지적되고 있다. 더욱이, 애당초 종래의 제거세정제는 안료분산형 감광성 수지조성물의 세정제거에 대해서는 세정성능이 약하기 때문에, 충분한 세정효과를 얻기 위해서는 많은 양의 세정제를 사용해야 하고, 그 때문에 폐액량이 증가하여, 환경부하가 커지는 것도 문제시되고 있다.Subsequently, when the photosensitive resin composition to which the pigment was added is used, it is pointed out that the pigment is easy to adhere to the ejection nozzle, the priming roller, and the piping system of the coating apparatus, and the cleaning and removal of the pigment of the portion is insufficient. If there is a cleaning residue of these pigments, the pigment aggregates over time, causing an abnormal discharge of the nozzle or a problem that the pigment aggregate aggregates as foreign matter in the coating film. In addition, when a non-protic polar solvent is used for the removal detergent, it is pointed out that problems such as the polarity is so strong that the pigment aggregates and precipitates and the piping system of the coating apparatus is blocked. Moreover, in the beginning, the conventional removal cleaners have poor cleaning performance in the cleaning removal of the pigment-dispersible photosensitive resin composition. Therefore, in order to obtain a sufficient cleaning effect, a large amount of the cleaning agent must be used, so that the amount of waste liquid increases and the environmental load increases. It is also a problem.

본 발명은 상기 종래의 사정에 감안하여 이루어진 것으로, 코팅장치 등의 물품의 표면에 부착한 수지조성물의 세정용으로서 적합한, 특히 컬러필터나 블랙 매트릭스 패턴을 형성하기 위한 안료분산형 감광성 수지조성물의 세정용으로서 뛰어난 특성을 가지는 제거세정제 및 수지조성물의 제거방법을 제공하는 것을 과제로 하고 있다.SUMMARY OF THE INVENTION The present invention has been made in view of the above conventional circumstances, and is particularly suitable for cleaning resin compositions adhering to surfaces of articles such as coating apparatuses, and particularly for cleaning pigment dispersion type photosensitive resin compositions for forming color filters or black matrix patterns. It is an object of the present invention to provide a removal detergent and a method for removing a resin composition having excellent properties.

본 발명자들은 상기 과제를 해결하기 위하여 세밀히, 연구 및 검토를 거듭한 결과, 아래와 같은 사실을 알게 되었다.MEANS TO SOLVE THE PROBLEM The present inventors discovered the following fact in detail as a result of repeating research and examination in order to solve the said subject.

본 발명은 이와 같은 식견에 근거하여 이루어진 것이다. 즉, 본 발명에 따른 감광성 수지조성물 제거세정제는, 물품의 표면에 고착한 수지조성물을 용해 제거할 수 있는 적어도 1종의 용제와, 상기 고착 수지조성물 안에 함유되어 있는 안료를 분산시키는 방향족계 화합물을 가지고 이루어지는 것을 특징으로 한다.This invention is made | formed based on such knowledge. That is, the photosensitive resin composition removal cleaner according to the present invention comprises an aromatic compound which disperses at least one solvent capable of dissolving and removing the resin composition fixed on the surface of the article and the pigment contained in the fixed resin composition. It is characterized by having.

구체적으로는, 종래 관용의 수지용 용제를 베이스 용제로 하고, 이 베이스 용제에 소정의 방향족계 화합물을 소정 양 혼합함으로써, 감광성 수지조성물의 세정 제거 성능이 현격히 높아지는 것, 또한 종래 세정이 어려웠던 안료분산형 감광성 수지조성물에 대해서도, 소량 사용하여도 충분한 세정이 가능하다는 것을 알게 되었다.Specifically, by using a conventional solvent for resin as a base solvent and mixing a predetermined amount of a predetermined aromatic compound with the base solvent, the washing and removing performance of the photosensitive resin composition is significantly increased, and the pigment dispersion which has been difficult to wash conventionally is difficult. Also with respect to the type photosensitive resin composition, it has been found that sufficient washing is possible even in a small amount.

상기 방향족계 화합물을 배합함으로써, 상기 세정제에 의해 수지가 제거된 후에, 수지 안에 분산되어 있는 안료(특히 물품의 표면에 대한 부착력이 강한 카본)가 응집하는 현상을 억제하는 효과를 얻을 수 있다.By mix | blending the said aromatic type compound, after the resin is removed by the said cleaning agent, the effect which suppresses the phenomenon which the pigment disperse | distributed in resin (especially carbon with strong adhesive force to the surface of an article) aggregates can be acquired.

물품 표면에 부착한 수지 성분 안에서, 카본 입자 등의 안료입자를 응집시키지 않고 효율적으로 분산시키기 위해서는, 상기 방향족계 화합물로서 알킬기를 함유하는 화합물을 첨가하는 것이 바람직하다.In order to disperse | distribute pigment particle | grains, such as carbon particle, efficiently in the resin component adhering to the article surface, it is preferable to add the compound containing an alkyl group as said aromatic type compound.

상기 알킬기를 함유하는 화합물로서는 함유 알킬기의 탄소수가 3~5인 알킬벤젠을 사용하는 것이 바람직하다.As a compound containing the said alkyl group, it is preferable to use the alkylbenzene of 3-5 carbon atoms of an containing alkyl group.

알킬벤젠의 함유 알킬기의 탄소수가 5 이상이 되면, 안료를 포함하는 수지조성물에 대한 세정특성은 확보할 수 있지만, 제거세정제 자체의 휘발성이 약해져, 세정후에 제거세정제가 물품의 표면에 잔류하여 세정제 자체가 오염물질이 될 우려가 있다.When the number of carbon atoms in the alkyl group of the alkylbenzene is 5 or more, the cleaning properties of the resin composition containing the pigment can be secured, but the volatility of the removal cleaner itself is weakened, and after the cleaning, the removal cleaner remains on the surface of the article, and thus the cleaning agent itself. May be a contaminant.

수지조성물 제거세정제에는, 수지 제거 특성뿐만 아니라, 자신의 제거 특성, 즉 휘발성이 확보되는 것도 중요하다. 이와 같은 관점에서 본 발명에서는, 첨가하는 알킬벤젠의 함유 알킬기의 탄소수를 5 이하로 하는 것이 바람직하다. 알킬기의 탄소수가 5 이하인 범위에서도, 탄소수가 3~5인 알킬벤젠과, 탄소수가 2 이하인 알킬벤젠에서는, 일정한 제거성능을 발휘하기 위한 배합량이 다르다. 탄소수 3~5의 알킬벤젠을 사용하는 경우에는, 보다 적은 배합량으로 세정효과를 얻을 수 있다. 또한, 탄소수가 많아지면 많아질수록 휘발성이 떨어지기 때문에, 배합량의 증가에 따른 세정특성의 향상과, 일정한 휘발성의 확보라는 2가지 조건을 적절히 만족하는 범위를 특정할 필요가 있다. 이러한 관점에서 설정한 것이, 상기 알킬벤젠(방향족계 화합물)의 함유량이다.In the resin composition removal cleaner, it is also important to ensure not only the resin removal characteristics but also its own removal characteristics, that is, volatility. From this viewpoint, it is preferable to make carbon number of the alkyl group containing alkylbenzene to add 5 or less. Even in the range where carbon number of an alkyl group is 5 or less, the compounding quantity for exhibiting a constant removal performance differs in the alkylbenzene of 3 to 5 carbon atoms and the alkylbenzene of carbon number 2 or less. When C3-C5 alkylbenzene is used, a washing | cleaning effect can be acquired by a smaller compounding quantity. In addition, as the number of carbon increases, the volatility decreases, so it is necessary to specify a range that satisfactorily satisfies two conditions, namely, an improvement in washing characteristics due to an increase in the amount of the compound and a certain volatility. What was set from such a viewpoint is content of the said alkylbenzene (aromatic compound).

알킬기의 탄소수가 3~5인 알킬벤젠을 사용하는 경우의 함유량은, 제거세정제 전체 양의 5~50질량%가 바람직하다.As for content in the case of using the alkylbenzene of 3-5 carbon atoms of an alkyl group, 5-50 mass% of the total amount of a removal detergent is preferable.

상기 함유 알킬기의 탄소수가 3~5인 알킬벤젠으로는, 프로필벤젠, 인단, 1-메틸에틸벤젠, 에틸메틸벤젠, 트리메틸벤젠, 1-메틸프로필벤젠, 2-메틸프로필벤젠, 디에틸벤젠, 에틸디메틸벤젠, 테트라메틸벤젠, 테트라메틸시클로펜타디엔, 디에틸메틸벤젠, 에틸트리메틸벤젠, 디메틸프로필벤젠으로부터 선택되는 것이 바람직하다.Examples of the alkylbenzene having 3 to 5 carbon atoms in the containing alkyl group include propylbenzene, indane, 1-methylethylbenzene, ethylmethylbenzene, trimethylbenzene, 1-methylpropylbenzene, 2-methylpropylbenzene, diethylbenzene, and ethyl. It is preferable to select from dimethylbenzene, tetramethylbenzene, tetramethylcyclopentadiene, diethylmethylbenzene, ethyltrimethylbenzene, and dimethylpropylbenzene.

상기 함유 알킬기의 탄소수가 3~5인 알킬벤젠으로서는, 2종 이상의 알킬벤젠 혼합물인 석유 유분(留分)을 사용하는 것이, 성능 대 비용의 면에서 바람직하다. 상기 석유 유분으로서 시판 중인 제품을 사용할 수 있으며, 또한 정제한 알킬벤젠 단독 혹은 이들의 조합 조성과 비교하여도, 본 발명의 목적인 안료분산형 감광성 수지조성물에 대한 세정특성에 손색이 없다. 예를 들어, 소르베소 100, 소르베소 150, 소르베소 200(이상, 일본 엑손카가쿠사 제품의 상품명) 등을 이용할 수 있다.As the alkylbenzene having 3 to 5 carbon atoms of the containing alkyl group, it is preferable to use petroleum oil, which is a mixture of two or more alkylbenzenes, in view of performance and cost. Commercially available products can be used as the petroleum fraction, and compared with purified alkylbenzenes alone or in combination thereof, there is no deterioration in the cleaning properties of the pigment-disperse photosensitive resin composition which is the object of the present invention. For example, sorbet 100, sorbet 150, sorbet 200 (above, the brand name of Exxon Chemical Co., Ltd. product) etc. can be used.

또한, 상기 알킬벤젠으로서는 그 알킬기의 탄소수가 2 이하인 알킬벤젠을 사용하여도 좋고, 그 바람직한 함유량은 세정제 전체의 20~60 질량%이다.Moreover, as said alkylbenzene, the alkylbenzene whose carbon number of this alkyl group is 2 or less may be used, and the preferable content is 20-60 mass% of the whole detergent.

상기 함유 알킬기의 탄소수가 2 이하인 방향족계 화합물로서는 아니솔, 톨루엔, 크실렌에서 선택된 적어도 1종을 사용할 수 있다.As the aromatic compound having 2 or less carbon atoms in the containing alkyl group, at least one selected from anisole, toluene and xylene can be used.

상기 알킬벤젠의 방향족계 화합물 전체 양에 대한 배합량은 70~100 질량%이며, 바람직하게는 80~100 질량%, 더욱 바람직하게는 95~100 질량%이다.The compounding quantity with respect to the total amount of the aromatic compound of the said alkylbenzene is 70-100 mass%, Preferably it is 80-100 mass%, More preferably, it is 95-100 mass%.

베이스 용제의 수지용 용제로서는 종래 관용의 수지용 용제를 사용할 수 있다. 구체적으로는 시클로헥사논, 프로필렌글리콜모노메틸에테르아세테이트(PGMEA), 프로필렌글리콜모노메틸에테르(PGME), 3-메톡시부틸아세테이트, 메톡시프로필아세테이트, 3-에톡시프로피온산 에틸, 초산에틸, 초산부틸, 초산프로필, 초산펜틸, 초산헥실, 초산헵틸, 초산옥틸, 유산에틸, 유산부틸, 유산펜틸, 유산헥실, 유산헵틸, 유산옥틸, 아세톤, 메틸이소부틸케톤(MIBK), 메틸에틸케톤(MEK), 2-헵타논(Heptanone), 메탄올, 에탄올, 프로판올, 부탄올, 펜탄올, 헥산올, 헵탄올, 옥탄올, 헥산, 헵탄, 옥탄, 노난, 데칸, 디에틸에테르, 시클로헥산, 시클로헥산올, 디옥산, 옥세탄, 페놀, 크레졸, 크실레놀(xylenol)을 들 수 있다. 이것들로 구성하는 상기 베이스 용제의 사용형태로는, 이들의 1종 또는 혼합물이어도 좋고, 더욱이 수지용 용제로서 시판되고 있는 조합된 혼합용제이어도 좋으며, 단독으로 조합한 것이어도 좋다.As the resin solvent of the base solvent, a conventional resin solvent can be used. Specifically, cyclohexanone, propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME), 3-methoxybutyl acetate, methoxypropyl acetate, 3-ethoxypropionate, ethyl acetate, butyl acetate , Propyl acetate, pentyl acetate, hexyl acetate, heptyl acetate, octyl acetate, ethyl lactate, butyl lactate, pentyl lactate, hexyl lactate, heptyl lactate, octyl lactate, acetone, methyl isobutyl ketone (MIBK), methyl ethyl ketone (MEK) , 2-heptanone, methanol, ethanol, propanol, butanol, pentanol, hexanol, heptanol, octanol, hexane, heptane, octane, nonan, decane, diethyl ether, cyclohexane, cyclohexanol, Dioxane, oxetane, phenol, cresol, and xylenol. As a usage form of the said base solvent comprised by these, these may be 1 type, or a mixture thereof, Furthermore, the combined mixed solvent marketed as a resin solvent may be sufficient, and it may combine individually.

그 중에서도 프로필렌글리콜모노알킬에테르아세테이트는, 감광성 수지조성물 중의 유기성분의 제거성에 효과가 있어 바람직하다. 이러한 프로필렌글리콜모노알킬에테르아세테이트로서는, 프로필렌글리콜모노메틸에테르아세테이트(PGMEA)가 가장 바람직하다.Among them, propylene glycol monoalkyl ether acetate is preferred because it is effective in the removal of organic components in the photosensitive resin composition. As such propylene glycol monoalkyl ether acetate, propylene glycol monomethyl ether acetate (PGMEA) is most preferable.

또한, 제거세정제의 휘발성(속건성(速乾性))을 구하기 위해서는, 프로필렌글리콜모노알킬에테르가 바람직하고, 특히 프로필렌글리콜모노메틸에테르(PGME)는 바람직한 용제이기 때문에, 상기 프로필렌글리콜모노알킬에테르아세테이트, 특히 프로필렌글리콜모노메틸에테르아세테이트(PGMEA)에 혼합하여, 혼합용제로서 사용하는 것이 바람직하다.In order to obtain the volatility (fast drying) of the removal detergent, propylene glycol monoalkyl ether is preferable, and in particular, propylene glycol monomethyl ether (PGME) is a preferable solvent, and thus the propylene glycol monoalkyl ether acetate, in particular It is preferable to mix with propylene glycol monomethyl ether acetate (PGMEA), and to use as a mixed solvent.

또한, 본 발명의 수지조성물의 제거방법은 수지 코팅장치의 노즐, 프라이밍 롤러, 배관 등의 물품의 표면에 부착한 수지조성물을 제거하는 방법으로서, 상기 중 어느 수지조성물 제거세정제를 사용하여 상기 물품의 표면에 부착한 상기 수지조성물을 제거하는 것을 특징으로 한다.In addition, the method of removing the resin composition of the present invention is a method of removing a resin composition adhering to the surface of an article such as a nozzle, a priming roller, a pipe, or the like of a resin coating apparatus. The resin composition attached to the surface is removed.

본 발명의 수지조성물의 제거방법으로는, 상술한 바와 같이 미리 바람직한 조성의 제거세정제를 조제해 두고, 이 제거세정제를 사용함으로써 물품의 표면에 부착한 수지조성물을 제거하여도 좋지만, 기존의 수지용 제제 제품에 소정의 방향족계 화합물을 소정량 혼합하고, 얻어진 혼합용매를 사용하여 물품의 표면으로부터 상기 수지조성물을 제거하여도 좋다.As a method of removing the resin composition of the present invention, as described above, a removal cleaner having a desired composition may be prepared in advance, and the resin composition adhering to the surface of the article may be removed by using the removal cleaner. The resin composition may be removed from the surface of the article using a mixed solvent obtained by mixing a predetermined amount of a predetermined aromatic compound in the formulation product.

한편, 본 발명의 제거세정제가 대상으로 하는 수지조성물에는 특별히 제한이 없고, 종래 사용하고 있는 모든 수지조성물의 세정제거에 사용할 수 있다. 여기서, 대상으로 하는 수지조성물에 대하여 정리하면 아래와 같다.On the other hand, there is no restriction | limiting in particular in the resin composition which the removal detergent of this invention makes object, It can be used for the washing removal of all the resin compositions used conventionally. Here, the resin composition to be targeted is summarized as follows.

(세정대상 수지조성물)(Resin composition to be cleaned)

종래의 제거세정제에서는 어려웠지만, 본 발명의 제거세정제에서는 충분한 세정효과를 발휘할 수 있는 감광성 수지조성물로서는, 안료가 분산된 감광성 수지조성물을 들 수 있다. 이와 같은 안료분산형 감광성 수지조성물 중, 적(R), 녹(G), 청(B)의 컬러필터 형성용 감광성 수지조성물, 블랙 매트릭스 패턴 형성용 감광성 수지조성물이 더욱 제거하기 어려웠는데, 본 발명의 제거세정제는, 이들 안료분산형 감광성 수지조성물에 대해서도 소량으로 충분한 세정효과를 발휘할 수 있다. 이 안료분산형 감광성 수지조성물은, 기본적으로는 수지성분 및 광중합 개시제 등의 감광성분을 필수 성분으로서 함유하며, 그 밖에 모노머 성분, 계면활성제, 산성분, 함질소 유기화합물, 안료, 용제 등을 함유한다.Although it was difficult in the conventional removal cleaner, the photosensitive resin composition which the pigment disperse | distributed is mentioned as the photosensitive resin composition which can exhibit sufficient washing | cleaning effect in the removal cleaner of this invention. Among such pigment-dispersible photosensitive resin compositions, red (R), green (G), and blue (B) photosensitive resin compositions for color filter formation and photosensitive resin compositions for black matrix pattern formation were more difficult to remove. The removal detergent of can exhibit a sufficient washing effect even in a small amount even for these pigment dispersion type photosensitive resin compositions. This pigment dispersion type photosensitive resin composition basically contains photosensitive components such as resin components and photopolymerization initiators as essential components, and also contains monomer components, surfactants, acid components, nitrogen-containing organic compounds, pigments, solvents and the like. do.

상기 수지성분으로서는 예를 들어, 아크릴산, 메타크릴산 등의 카르복시기를 가지는 모노머로부터 선택되는 1종 이상과, 아크릴산 메틸, 메타크릴산 메틸, 아크릴산 에틸, 메타크릴산 에틸, 2-히드록시에틸아크릴레이트, 2-히드록시에틸메타크릴레이트, 2-히드록시프로필메타크릴레이트, N-부틸아크릴레이트, N-부틸메타크릴레이트, 이소부틸아크릴레이트, 이소부틸메타크릴레이트, 벤질아크릴레이트, 벤질메타크릴레이트, 페녹시아크릴레이트, 페녹시메타크릴레이트, 이소보르닐아크릴레이트, 이소보르닐메타크릴레이트, 글리시딜메타크릴레이트, 스틸렌, 아크릴아미드, 아크릴로니트릴 등으로부터 선택되는 1종 이상과의 공중합체, 페놀노볼락형 에폭시 아크릴레이트 중합체, 페놀노볼락형 에폭시 메타크릴레이트 중합체, 크레졸노볼락형 에폭시 아크릴레이트 중합체, 크레졸노볼락형 에폭시메타크릴레이트 중합체, 비스페놀 A형 에폭시 아크릴레이트 중합체, 비스페놀 S형 에폭시 아크릴레이트 중합체 등의 수지를 들 수 있다.As the resin component, for example, one or more selected from monomers having a carboxyl group such as acrylic acid and methacrylic acid, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate and 2-hydroxyethyl acrylate , 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, N-butyl acrylate, N-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, benzyl acrylate, benzyl methacrylate With at least one selected from the group consisting of latex, phenoxy acrylate, phenoxy methacrylate, isobornyl acrylate, isobornyl methacrylate, glycidyl methacrylate, styrene, acrylamide, acrylonitrile and the like. Copolymer, phenol novolak type epoxy acrylate polymer, phenol novolak type epoxy methacrylate polymer, cresol novolak type epoxy ah Resin, such as a acrylate polymer, a cresol novolak-type epoxy methacrylate polymer, a bisphenol-A epoxy acrylate polymer, and a bisphenol S-type epoxy acrylate polymer, is mentioned.

상기 광중합 개시제로서는, 1-히드록시시클로헥실페닐케톤, 2-히드록시-2-메틸-1-페닐프로판-1-온, 1-[4-(2-히드록시에톡시)페닐]-2-히드록시-2-메틸-1-프로판-1-온, 1-(4-이소프로필페닐)-2-히드록시-2-메틸프로판-1-온, 1-(4-도데실페닐)-2-히드록시-2-메틸프로판-1-온, 2,2-디메톡시-1,2-디페닐에탄-1-온, 비스(4-디메틸아미노페닐)케톤, 2-메틸-1-[4-(메틸티오)페닐]-2-모노폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모노폴리노페닐)-부탄-1-온, 2,4,6-트리메틸벤조일디페닐포스핀옥시드, 4-벤조일-4'-메틸디메틸설파이드, 4-디메틸아미노 안식향산, 4-디메틸아미 노 안식향산 메틸, 4-디메틸아미노 안식향산 에틸, 4-디메틸아미노 안식향산 부틸, 4-디메틸아미노-2-에틸헥실 안식향산, 4-디메틸아미노-2-이소아밀 안식향산, 벤질-β-메톡시에틸아세탈, 벤질디메틸케탈, 1-페닐-1,2-프로판디온-2-(o-에톡시카르보닐)옥심, o-벤조일 안식향산 메틸, 2,4-디에틸티오크산톤, 2-클로로티오크산톤, 2,4-디메틸티오크산톤, 1-클로로-4-프로폭시티오크산톤, 티오크산텐, 2-클로로티오크산텐, 2,4-디에틸티오크산텐, 2-메틸티오크산텐, 2-이소프로필티오크산텐, 2-에틸안트라퀴논, 옥타메틸안트라퀴논, 1,2-벤즈안트라퀴논, 2,3-디페닐안트라퀴논, 아조비스(이소부티로)니트릴, 벤조일퍼옥사이드, 쿠멘퍼옥사이드, 2-메르캅토벤조이미다졸, 2-메르캅토벤조옥사졸, 2-메르캅토벤조티아졸, 2-(o-클로로페닐)-4,5-디(m-메톡시페닐)-이미다졸릴 이량체, 벤조페논, 2-클로로벤조페논, p,p'-비스(디메틸아미노)벤조페논, 4,4'-비스(디에틸아미노)벤조페논, 4,4'-디클로로벤조페논, 3,3'-디메틸-4-메톡시벤조페논, 벤질, 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인이소프로필에테르, 벤조인이소부틸에테르, 벤조인부틸에테르, 아세토페논, 2,2-디에톡시아세토페논, p-디메틸아세토페논, p-디메틸아미노프로피오페논, 디클로로아세토페논, 트리클로로아세토페논, p-tert-부틸아세토페논, p-디메틸아미노아세토페논, p-tert-부틸트리클로로아세토페논, p-tert-부틸디클로로아세토페논, α,α-디클로로-4-페녹시아세토페논, 티옥산톤, 2-메틸티옥산톤, 2-이소프로필티옥산톤, 디벤조스베론(benzosuberone), 펜틸-4-디메틸아미노벤조에이트, 9-페닐아크리딘, 1,7-비스-(9-아크리디닐)헵탄, 1,5-비스-(9-아크리디닐)헵탄, 1,3-비스-(9-아크리디닐)프로판, p-메톡시트리아진, 2,4,6-트리스(트리클로로메틸)-s-트리아진, 2-메틸-4,6-비스(트리클로로메틸)-s-트리아진, 2-[2-(5-메틸푸란-2-일)에테닐]-4,6-비스(트리클로로메틸)-s-트리아진, 2-[2-(푸란-2-일)에테닐]-4,6-비스(트리클로로메틸)-s-트리아진, 2-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-4,6-비스(트리클로로메틸)-s-트라아진, 2-[2-(3,4-디메톡시페놀)에테닐]-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-메톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-에톡시스티릴)-4,6-비스(트리클로로메틸)-s-트리아진, 2-(4-n-부톡시페닐)-4,6-비스(트리클로로메틸)-s-트리아진, 2,4-비스(트리클로로메틸)-6-(3-브로모-4-메톡시)페닐-s-트리아진, 2,4-비스(트리클로로메틸)-6-(2-브로모-4-메톡시)페닐-s-트리아진, 2,4-비스(트리클로로메틸)-6-(3-브로모-4-메톡시)스티릴페닐-s-트리아진, 2,4-비스(트리클로로메틸)-6-(2-브로모-4-메톡시)스티릴페닐-s-트리아진 등을 들 수 있다.As said photoinitiator, 1-hydroxycyclohexylphenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1- [4- (2-hydroxyethoxy) phenyl] -2- Hydroxy-2-methyl-1-propan-1-one, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1- (4-dodecylphenyl) -2 -Hydroxy-2-methylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethan-1-one, bis (4-dimethylaminophenyl) ketone, 2-methyl-1- [4 -(Methylthio) phenyl] -2-monopolynopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-monofolinophenyl) -butan-1-one, 2,4,6-trimethyl Benzoyldiphenylphosphine oxide, 4-benzoyl-4'-methyldimethylsulfide, 4-dimethylamino benzoic acid, 4-dimethylamino benzoic acid methyl, 4-dimethylamino benzoic acid ethyl, 4-dimethylamino butyl benzoate, 4-dimethylamino 2-ethylhexyl benzoic acid, 4-dimethylamino-2-isoamyl benzoic acid, benzyl-β-methoxyethylacetal, benzyldimethyl ketal, 1-phenyl-1, 2-propanedione-2- (o-ethoxycarbonyl) oxime, o-benzoyl benzoate, 2,4-diethyl thioxanthone, 2-chloro thioxanthone, 2,4-dimethyl thioxanthone, 1 -Chloro-4-propoxy thioxanthone, thioxanthene, 2-chlorothioxanthene, 2,4-diethyl thioxanthene, 2-methylthioxanthene, 2-isopropyl thioxanthene, 2-ethyl Anthraquinone, octamethylanthraquinone, 1,2-benzanthraquinone, 2,3-diphenylanthraquinone, azobis (isobutyro) nitrile, benzoylperoxide, cumeneperoxide, 2-mercaptobenzoimidazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole, 2- (o-chlorophenyl) -4,5-di (m-methoxyphenyl) -imidazolyl dimer, benzophenone, 2-chloro Benzophenone, p, p'-bis (dimethylamino) benzophenone, 4,4'-bis (diethylamino) benzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-4-methoxy Benzophenone, benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzo Phosphorus isopropyl ether, benzoin isobutyl ether, benzoin butyl ether, acetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropiophenone, dichloroacetophenone, trichloroacetophenone , p-tert-butylacetophenone, p-dimethylaminoacetophenone, p-tert-butyltrichloroacetophenone, p-tert-butyldichloroacetophenone, α, α-dichloro-4-phenoxyacetophenone, thioxane Ton, 2-methylthioxanthone, 2-isopropylthioxanthone, dibenzosuberone, pentyl-4-dimethylaminobenzoate, 9-phenylacridine, 1,7-bis- (9- Acridinyl) heptane, 1,5-bis- (9-acridinyl) heptane, 1,3-bis- (9-acridinyl) propane, p-methoxytriazine, 2,4,6-tris (Trichloromethyl) -s-triazine, 2-methyl-4,6-bis (trichloromethyl) -s-triazine, 2- [2- (5-methylfuran-2-yl) ethenyl]- 4,6-bis (trichloromethyl) -s-triazine, 2- [2- (furan-2-yl) Tenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- [2- (4-diethylamino-2-methylphenyl) ethenyl] -4,6-bis (trichloromethyl)- s-triazine, 2- [2- (3,4-dimethoxyphenol) ethenyl] -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxyphenyl) -4 , 6-bis (trichloromethyl) -s-triazine, 2- (4-ethoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-n-part Methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2,4-bis (trichloromethyl) -6- (3-bromo-4-methoxy) phenyl-s-triazine , 2,4-bis (trichloromethyl) -6- (2-bromo-4-methoxy) phenyl-s-triazine, 2,4-bis (trichloromethyl) -6- (3-bromo 4-methoxy) styrylphenyl-s-triazine, 2,4-bis (trichloromethyl) -6- (2-bromo-4-methoxy) styrylphenyl-s-triazine, etc. are mentioned. Can be.

상기 안료로서는 예를 들어, C.I. 피그멘트 옐로우 11, 24, 31, 53, 83, 99, 108, 109, 139, 150, 151, 154, 167, 180, 185, 193; C.I. 피그멘트 오렌지 36, 38, 43; C.I. 피그멘트 레드 105, 122, 149, 150, 155, 171, 175, 176, 177, 209, 224, 254, 264; C.I. 피그멘트 바이올렛 19, 23, 32, 39; C.I. 피그멘트 블루 1, 2, 15:1, 15:2, 15:3, 16, 22, 60, 66; C.I. 피그멘트 그린 7, 36, 37; C.I. 피그멘트 브라운 25, 28; C.I. 피그멘트 블랙 1, 7; 및 카본 블랙 등을 들 수 있다.As said pigment, it is C.I. Pigment yellow 11, 24, 31, 53, 83, 99, 108, 109, 139, 150, 151, 154, 167, 180, 185, 193; C.I. Pigment orange 36, 38, 43; C.I. Pigment red 105, 122, 149, 150, 155, 171, 175, 176, 177, 209, 224, 254, 264; C.I. Pigment violet 19, 23, 32, 39; C.I. Pigment blue 1, 2, 15: 1, 15: 2, 15: 3, 16, 22, 60, 66; C.I. Pigment green 7, 36, 37; C.I. Pigment brown 25, 28; C.I. Pigment black 1, 7; And carbon black.

상술한 안료분산형 감광성 수지조성물의 재료로서는 예를 들어, 일본특허공개 2004-69754호 공보, 일본특허공개 평11-231523호 공보, 일본특허공개 평11-84125호 공보, 일본특허공개 평10-221843호 공보, 일본특허공개 평9-269410호 공 보, 일본특허공개 평10-90516호 공보 등에 기재되어 있으며, 이 감광성 재료들에 대해서도, 본 발명에 제거세정제는 충분한 세정효과를 발휘할 수 있다.As a material of the pigment dispersion type photosensitive resin composition mentioned above, for example, Unexamined-Japanese-Patent No. 2004-69754, Unexamined-Japanese-Patent No. 11-231523, Unexamined-Japanese-Patent No. 11-84125, Unexamined-Japanese-Patent No. 10- 221843, Japanese Patent Application Laid-Open No. 9-269410, Japanese Patent Application Laid-Open No. 10-90516, and the like. For these photosensitive materials, the removal cleaner can exhibit a sufficient cleaning effect in the present invention.

이하, 본 발명에 따른 수지조성물 제거세정제의 실시예를 나타낸다. 이하 나타내는 실시예는 본 발명을 설명하기 위한 적절한 예시에 지나지 않으며, 절대 본 발명을 한정하는 것이 아니다.Hereinafter, the Example of the resin composition removal detergent which concerns on this invention is shown. The following examples are only suitable examples for describing the present invention, and do not limit the present invention.

(실시예 1)(Example 1)

수지조성물 제거세정제로서 PGMEA: PGME: 소르베소100= 6:2:2(질량비)의 혼합세정액을 조제하였다. 소르베소100의 주요성분은 트리메틸벤젠, 인단, 디에틸벤젠, 에틸디메틸벤젠, 1-메틸프로필벤젠, 2-메틸프로필벤젠, 에틸메틸벤젠, 프로필벤젠, 1-메틸에틸벤젠이다.As a resin composition removal detergent, a mixed washing liquid of PGMEA: PGME: Sorbetso 100 = 6: 2: 2 (mass ratio) was prepared. The main components of Sorbetso 100 are trimethylbenzene, indane, diethylbenzene, ethyldimethylbenzene, 1-methylpropylbenzene, 2-methylpropylbenzene, ethylmethylbenzene, propylbenzene and 1-methylethylbenzene.

(실시예 2)(Example 2)

수지조성물 제거세정제로서 PGMEA: PGME: 소르베소200= 6:2:2(질량비)의 혼합세정액을 조제하였다.As a resin composition removal detergent, a mixed washing liquid of PGMEA: PGME: Sorbetso 200 = 6: 2: 2 (mass ratio) was prepared.

(실시예 3)(Example 3)

수지조성물 제거세정제로서 PGMEA: PGME: 톨루엔= 6:2:2(질량비)의 혼합세정액을 조제하였다.As a resin composition removal cleaning agent, the mixed washing liquid of PGMEA: PGME: toluene = 6: 2: 2 (mass ratio) was prepared.

(실시예 4)(Example 4)

수지조성물 제거세정제로서 PGMEA: PGME: 크실렌= 6:2:2(질량비)의 혼합세정액을 조제하였다.As a resin composition removal cleaning agent, the mixed washing liquid of PGMEA: PGME: xylene = 6: 2: 2 (mass ratio) was prepared.

(실시예 5)(Example 5)

수지조성물 제거세정제로서 PGMEA: PGME: 아니솔(anisole)= 6:2:2(질량비)의 혼합세정액을 조제하였다.As a resin composition removal detergent, a mixed washing liquid of PGMEA: PGME: anisole = 6: 2: 2 (mass ratio) was prepared.

(비교예 1)(Comparative Example 1)

수지조성물 제거세정제로서 PGMEA 단독의 세정액을 조제하였다.A washing solution of PGMEA alone was prepared as a resin composition removing detergent.

(비교예 2)(Comparative Example 2)

수지조성물 제거세정제로서 PGMEA: PGME= 7:3(질량비)의 혼합세정액을 조제하였다.As a resin composition removal detergent, a mixed washing liquid of PGMEA: PGME = 7: 3 (mass ratio) was prepared.

(비교예 3)(Comparative Example 3)

수지조성물 제거세정제로서 소르베소100 단독의 세정액을 조제하였다.As a resin composition removal cleaning agent, the washing | cleaning liquid of sorbose 100 individual was prepared.

상기 각 실시예 및 비교예의 수지조성물 제거세정제를 사용하여 하기 배관 세정시험 및 침강시험을 하여, 각각의 수지조성물 제거세정제를 평가하였다.The following pipe cleaning test and sedimentation test were carried out using the resin composition removal cleaners of the respective examples and comparative examples, and the respective resin composition removal cleaners were evaluated.

(배관세정시험)(Pipe cleaning test)

글라스제의 1ml 피펫 안에 블랙 매트릭스 패턴 형성용 감광성 수지조성물인 'CFPR BK-5005SL'(상품명: 일본 도쿄오카(주) 제품)을 빨아들이고, 그 후 배출함으로써 피펫 내면에 안료분산형 수지조성물을 부착시켰다. 이어서, 해당 피펫 안을 1ml의 상기 각 제거세정제로 반복 세정처리하고, 세정정도를 육안으로 확인하여 세정에 몇 ml가 필요한지를 기록하였다. 세정횟수는 10회까지로 하였다. 10회의 세정으로 세정할 수 없는 경우에는, '세정불가'로 하였다. 그 결과를 아래 표 1에 나타낸다.A pigment-dispersed resin composition is attached to the inner surface of the pipette by sucking and discharging the CFPR BK-5005SL (trade name: manufactured by Tokyo Oka Co., Ltd.), a photosensitive resin composition for forming a black matrix pattern, into a 1 ml glass pipette. I was. Subsequently, the pipette was repeatedly washed with 1 ml of each of the above-described removal cleaners, and the degree of washing was visually checked to record how many ml were required for washing. The number of washings was up to 10 times. When it could not wash by 10 times of washing, it was set as "washing impossible". The results are shown in Table 1 below.

(침강시험)(Sedimentation Test)

컬러필터 형성용 그린 안료분산형 감광성 수지조성물인 CFPR GH-1004(상품명: 일본 도쿄오카(주) 제품) 10ml와 상기 각 제거세정제 90ml를 혼합한 용액을 내경 12mm의 글라스 튜브에 충전하고, 23℃에서 3주 동안 수직으로 그대로 두었다. 3주가 지난 뒤, 튜브 안의 혼합용액을 빼내고, 각 글라스 튜브 하부 내벽에 대한 안료의 응집침강을 확인하였다. 그 결과를 아래 표 1에 나타낸다. 표에서는 응집침강이 없는 경우를 ○으로 나타내고, 응집침강이 확인된 경우는 ×로 나타내었다.10 ml of CFPR GH-1004 (trade name: manufactured by Tokyo Oka Co., Ltd.), a green pigment dispersion-type photosensitive resin composition for color filter formation, and 90 ml of the above-described removal cleaners were filled into a glass tube having an inner diameter of 12 mm, and then Left vertically for 3 weeks. After 3 weeks, the mixed solution in the tube was removed and the coagulation sedimentation of the pigment on the inner wall of each glass tube was confirmed. The results are shown in Table 1 below. In the table, the case where there is no coagulation sedimentation is indicated by o, and when coagulation sedimentation is confirmed, it is indicated by x.

제거세정제 조성Detergent cleaner 배관세정시험Piping cleaning test 침강시험Sedimentation test 실시예 1Example 1 PGMEA: PGME: 소르베소100= 6:2:2PGMEA: PGME: SORBESO 100 = 6: 2: 2 8ml8ml 실시예 2Example 2 PGMEA: PGME: 소르베소200= 6:2:2PGMEA: PGME: SORBESO 200 = 6: 2: 2 8ml8ml 실시예 3Example 3 PGMEA: PGME: 톨루엔= 6:2:2PGMEA: PGME: Toluene = 6: 2: 2 9ml9 ml 실시예 4Example 4 PGMEA: PGME: 크실렌= 6:2:2PGMEA: PGME: Xylene = 6: 2: 2 9ml9 ml 실시예 5Example 5 PGMEA: PGME: 아니솔= 6:2:2PGMEA: PGME: Anisole = 6: 2: 2 9ml9 ml 비교예 1Comparative Example 1 PGMEA 단독PGMEA only 세정불가Not washable ×× 비교예 2Comparative Example 2 PGMEA: PGME= 7:3PGMEA: PGME = 7: 3 세정불가Not washable ×× 비교예 3Comparative Example 3 소르베소100 단독Sorbetso 100 Sole 세정불가Not washable ××

표 1에서 분명히 알 수 있듯이, 수지용 용제에 방향족 화합물을 혼합한 혼합용액을 제거세정제로서 사용함으로써, 소량의 제거세정제에 의해 안료분산형 감광성 수지조성물을 효과적으로 세정할 수 있는 것이 확인되었다.As apparent from Table 1, it was confirmed that the pigment dispersion type photosensitive resin composition can be effectively washed with a small amount of the removal detergent by using a mixed solution obtained by mixing an aromatic compound with the resin solvent as the removal detergent.

이상과 같이 본 발명에 따른 수지조성물 제거세정제는, 물품의 표면에 부착한 수지조성물의 세정제거에 유용하여, 특히 수지 코팅 장치의 노즐, 프라이밍 롤러, 배관 등의 물품의 표면에 부착한 안료분산형 감광성 수지조성물을 효과적으로 제거하기 위한 제거세정제에 바람직하다.As described above, the resin composition removing cleaner according to the present invention is useful for cleaning and removing the resin composition attached to the surface of the article, and in particular, a pigment dispersion type adhered to the surface of the article such as nozzles, priming rollers and pipes of the resin coating apparatus. It is suitable for a removal detergent for effectively removing the photosensitive resin composition.

본 발명에 따른 수지조성물 제거세정제는, 수지 코팅 장치의 노즐, 프라이밍 롤러, 배관 등의 물품의 표면에 부착한 수지조성물을 효율적으로 제거할 수 있다. 물품에 부착한 수지조성물에 있어서 감광성 수지조성물이 제거하기 어렵고, 또한 안료 분산형 감광성 수지조성물이 제거하기 어렵지만, 본 발명의 제거세정제는 수지용 용제를 베이스로 하여, 함유 알킬기의 탄소수가 5 이하인 방향족 화합물을 소정량 첨가함으로써, 물품 표면으로의 부착 수지 성분, 특히 안료분산 수지성분의 제거성능을 대폭 증강시키고 있다. 따라서, 본 발명의 수지조성물 제거세정제는, 종래에는 제거가 어려웠던 코팅 장치의 노즐이나 배관 계 등의 세정제 접촉면적이 적은 부분에서의 세정에도, 소량의 사용량으로도 충분한 세정효과를 발휘할 수 있다.The resin composition removal cleaner according to the present invention can efficiently remove the resin composition adhering to the surface of articles such as nozzles, priming rollers, pipes, and the like of the resin coating apparatus. In the resin composition attached to the article, the photosensitive resin composition is difficult to remove, and the pigment dispersion type photosensitive resin composition is difficult to remove, but the removal cleaner of the present invention is based on a resin solvent and contains an aromatic group having 5 or less carbon atoms in the containing alkyl group. By adding a predetermined amount of the compound, the removal performance of the adhesion resin component, especially the pigment dispersion resin component, to the article surface is greatly enhanced. Therefore, the resin composition removal cleaner of the present invention can exert a sufficient cleaning effect even with a small amount of use even for cleaning in a portion where the contact area of the cleaning agent such as a nozzle or a piping system of the coating apparatus, which has conventionally been difficult to remove.

Claims (7)

물품의 표면에 고착한 고착 수지조성물을 용해제거할 수 있는 적어도 1종의 용제와, 상기 고착 수지조성물 안에 함유되어 있는 안료를 분산시키는 방향족계 화합물을 함유하는 수지조성물 제거세정제.A resin composition removal and cleaning agent comprising at least one solvent capable of dissolving and removing a fixed resin composition fixed to a surface of an article, and an aromatic compound dispersing a pigment contained in the fixed resin composition. 제 1 항에 있어서,The method of claim 1, 상기 방향족계 화합물이 알킬벤젠을 포함하는 것을 특징으로 하는 수지조성물 제거세정제.The resin composition removal detergent, characterized in that the aromatic compound comprises alkylbenzene. 제 2 항에 있어서,The method of claim 2, 상기 알킬벤젠 중의 알킬기의 탄소수가 3~5이고, 또한 상기 제거세정제 전체 양에 대한 상기 알킬벤젠의 함유량이 5 질량%~50 질량%인 것을 특징으로 하는 수지조성물 제거세정제.The carbon number of the alkyl group in the said alkylbenzene is 3-5, and the content of the said alkylbenzene is 5 mass%-50 mass% with respect to the quantity of the said removal detergent, The resin composition removal detergent characterized by the above-mentioned. 제 1 항에 있어서,The method of claim 1, 상기 방향족계 화합물이 2종 이상의 알킬벤젠 혼합물을 함유하고, 이 알킬벤젠 혼합물로서 석유 유분이 사용되고 있는 것을 특징으로 하는 수지조성물 제거세정제.A resin composition removal and cleaning agent, characterized in that the aromatic compound contains a mixture of two or more kinds of alkylbenzenes, and petroleum oil is used as the alkylbenzene mixture. 제 2 항에 있어서,The method of claim 2, 상기 알킬벤젠은, 알킬기의 탄소수가 2 이하인 알킬벤젠을 더욱 포함하고, 이 알킬기의 탄소수가 2 이하인 알킬벤젠의 제거세정제 전체 양에 대한 함유량이 20 질량%~60 질량%인 것을 특징으로 하는 수지조성물 제거세정제.The alkylbenzene further comprises an alkylbenzene having 2 or less carbon atoms in the alkyl group, and the resin composition has a content of 20% by mass to 60% by mass with respect to the total amount of the removal detergent for the alkylbenzene having 2 or less carbon atoms in the alkyl group. Remove cleaner. 제 1 항에 있어서,The method of claim 1, 상기 방향족계 화합물이 아니솔, 톨루엔, 크실렌으로 이루어지는 군에서 선택되는 적어도 1종인 것을 특징으로 하는 수지조성물 제거세정제.And the aromatic compound is at least one member selected from the group consisting of anisole, toluene, and xylene. 제 1 항에 있어서,The method of claim 1, 상기 용제가, 시클로헥사논, 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노메틸에테르, 3-메톡시부틸아세테이트, 메톡시프로필아세테이트, 3-에톡시프로피온산에틸, 초산에틸, 초산부틸, 초산프로필, 초산펜틸, 초산헥실, 초산헵틸, 초산옥틸, 유산에틸, 유산부틸, 유산펜틸, 유산헥실, 유산헵틸, 유산옥틸, 아세톤, 메틸이소부틸케톤, 메틸에틸케톤, 2-헵타논, 메탄올, 에탄올, 프로판올, 부탄올, 펜탄올, 헥산올, 헵탄올, 옥탄올, 헥산, 헵탄, 옥탄, 노난, 데칸, 디에틸에테르, 시클로헥산, 시클로헥산올, 디옥산, 옥세탄, 페놀, 크레졸, 크실레놀으로 이루어지는 군에서 선택되는 적어도 1종인 것을 특징으로 하는 수지조성물 제거세정제.The solvent is cyclohexanone, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, 3-methoxybutyl acetate, methoxypropyl acetate, 3-ethoxypropionate ethyl, ethyl acetate, butyl acetate, propyl acetate, acetic acid Pentyl, hexyl acetate, heptyl acetate, octyl acetate, ethyl lactate, butyl lactate, pentyl lactate, hexyl lactate, heptyl lactate, octyl lactate, acetone, methyl isobutyl ketone, methyl ethyl ketone, 2-heptanone, methanol, ethanol, propanol Butanol, pentanol, hexanol, heptanol, octanol, hexane, heptane, octane, nonan, decane, diethyl ether, cyclohexane, cyclohexanol, dioxane, oxetane, phenol, cresol, xylenol Resin composition removal detergent, characterized in that at least one selected from the group consisting of.
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