KR20070001374A - Liquid crystal display and manufacturing method thereof - Google Patents

Abstract

An LCD(Liquid Crystal Display) and a method of manufacturing the LCD are provided to improve the reliability of the LCD by preventing image from remaining. An LCD includes a light-shielding member formed on a substrate, a color filter formed on the light-shielding member, an overcoat film formed on the color filter, protrusions(251,252a,252b) formed on the overcoat film, and a common electrode formed on the overcoat film and the protrusions. The protrusions include a vertex and inclined faces. The protrusions and the overcoat film are integrated. The overcoat film is formed of a photosensitive organic insulating material. The LCD further includes a column spacer formed on the common electrode, and an alignment film formed on the column spacer.

Description

Liquid crystal display device and its manufacturing method {LIQUID CRYSTAL DISPLAY AND MANUFACTURING METHOD THEREOF}

1 is a layout view of a liquid crystal display according to an exemplary embodiment of the present invention.

FIG. 2 is a layout view of a thin film transistor array panel for the liquid crystal display of FIG. 1.

FIG. 3 is a layout view of a common electrode display panel for the liquid crystal display of FIG. 1.

FIG. 4 is a cross-sectional view of the liquid crystal display of FIG. 1 taken along the line IV-IV'-IV ''-IV '' '.

5 through 8 are cross-sectional views sequentially illustrating a method of manufacturing the common electrode display panel of FIG. 4.

※ Explanation of symbols on main parts of drawing ※

110: lower substrate 121: gate line

124: gate electrode 131: sustain electrode line

140: gate insulating film 151: semiconductor

171: data line 173: source electrode

175: drain electrodes 181, 182, and 185: contact holes

191: pixel electrode 251: center projection

252a: lower projection 252b: upper projection

The present invention relates to a liquid crystal display device and a manufacturing method thereof.

The liquid crystal display is one of the most widely used flat panel displays, and includes a field generating electrode that generates an electric field such as a pixel electrode and a common electrode, and a liquid crystal layer filled in the gap between the display panel and the display panel having a gap therebetween. It includes. In such a liquid crystal display, an electric field is formed on the liquid crystal layer by applying a voltage to two field generating electrodes to determine the alignment of liquid crystal molecules and to adjust the polarization of incident light to display an image.

The liquid crystal display includes a plurality of pixels including a field generating electrode and a thin film transistor connected thereto and arranged in a matrix form, and a plurality of signal lines transferring signals thereto. The signal line includes a gate line for transmitting a scan signal and a data line for transmitting a data signal, and each pixel includes a color filter for displaying color in addition to the field generating electrode and the thin film transistor.

The gate line, the data line, the pixel electrode, and the thin film transistor are disposed on one of the two display panels, and this display panel is commonly referred to as a thin film transistor display panel. The other display panel is generally provided with a common electrode and a color filter. The display panel is commonly referred to as a common electrode display panel, and a liquid crystal layer exists between the thin film transistor array panel and the common electrode display panel.

Such a liquid crystal display forms an electric field by applying different potentials to the pixel electrode and the common electrode to change the arrangement of the liquid crystal molecules, and thereby displays an image by adjusting the light transmittance.

On the other hand, the disadvantage of the liquid crystal display device is that the narrow viewing angle is disadvantageous, in order to widen the viewing angle, the liquid crystal molecules are oriented vertically with respect to the upper and lower substrates, and the pixel is divided into multiple domains by making a constant cutting pattern or protrusion on the pixel electrode and the common electrode. How to do this is becoming prominent. At this time, the projections include an organic insulator having a low dielectric constant.

However, when divided into multiple domains using protrusions, the protrusions exposed to the liquid crystal layer emit ionic materials or low molecular materials. For this reason, the liquid crystal layer may be contaminated and an afterimage may occur.

Accordingly, an object of the present invention is to provide a liquid crystal display device and a method of manufacturing the same, which prevents afterimages of the liquid crystal display device, thereby improving the reliability of the liquid crystal display device.

In order to solve this problem, a liquid crystal display and a method of manufacturing the same according to the present invention include a light blocking member formed on a substrate, a color filter formed on the light blocking member, an overcoat formed on the color filter, and an overcoat. And a projection formed thereon, and a common electrode formed on the overcoat and the projection, wherein the projection includes a vertex and an inclined surface.

The protrusion and the overcoat may be integrated.

The overcoat may include a photosensitive organic insulator.

It may further include a columnar spacer formed on the common electrode, and an alignment layer formed on the columnar spacer.

Forming a light blocking member on the substrate, forming a color filter on the light blocking member, forming an overcoat on the color filter, photo etching the overcoat to form protrusions on the surface, and the lid Forming a common electrode over the film.

The protrusion may have a vertex and an inclined surface.

The overcoat photo etch may use a slit mask.

The method may further include forming a columnar spacer on the common electrode, and applying an alignment layer on the common electrode and the columnar spacer.

DETAILED DESCRIPTION Embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.

In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Like parts are designated by like reference numerals throughout the specification. When a part of a layer, film, region, plate, etc. is said to be "on" another part, this includes not only the other part being "right over" but also another part in the middle. On the contrary, when a part is "just above" another part, there is no other part in the middle.

Next, the structure of the liquid crystal display according to the exemplary embodiment of the present invention will be described in detail with reference to FIGS. 1 to 4.

1 is a layout view of a liquid crystal display according to an exemplary embodiment of the present invention, FIG. 2 is a layout view of a thin film transistor array panel for the liquid crystal display of FIG. 1, and FIG. 3 is a common electrode display panel for the liquid crystal display of FIG. 1. 4 is a cross-sectional view of the liquid crystal display of FIG. 1 taken along the line IV-IV'-IV ''-IV '' '.

1 to 4, the liquid crystal display according to the present exemplary embodiment includes a thin film transistor array panel 100, a common electrode panel 200, and a liquid crystal layer 3 interposed therebetween.

First, the thin film transistor array panel 100 will be described with reference to FIGS. 1, 2, and 4.

A plurality of gate lines 121 and a plurality of storage electrode lines 131 are formed on an insulating substrate 110 made of transparent glass or plastic.

The gate line 121 transmits a gate signal and mainly extends in a horizontal direction. Each gate line 121 includes a plurality of gate electrodes 124 protruding up and down, and end portions 129 having a large area for connection with other layers or driving circuits. A gate driving circuit (not shown) for generating a gate signal may be mounted on a flexible printed circuit film (not shown) attached to the substrate 110 or directly mounted on the substrate 110, It may be integrated into the substrate 110. When the gate driving circuit is integrated on the substrate 110, the gate line 121 may extend to be directly connected to the gate driving circuit.

The storage electrode line 131 receives a predetermined voltage and has a stem line extending substantially in parallel with the gate line 121 and a plurality of first, second, third and fourth storage electrodes 133a, 133b, 133c, 133d) an assembly and a plurality of connecting portions 133e. Each of the storage electrode lines 131 is positioned between two adjacent gate lines 121, and the stem line is closer to the upper side of the two gate lines 12.

The first and second storage electrodes 133a and 133b extend in the vertical direction and face each other. The first storage electrode 133a has a fixed end connected to the stem line and a free end opposite thereto, and the free end includes a protrusion. The third and fourth storage electrodes 133c and 133d extend obliquely from the center of the first storage electrode 133a to the lower end and the upper end of the second storage electrode 133b. However, the shape and arrangement of the storage electrode line 131 may be modified in various ways.

Aluminum-based metals such as aluminum (Al) and aluminum alloys, silver-based metals such as silver (Ag) and silver alloys, copper-based metals such as copper (Cu) and copper alloys, and molybdenum-based metals such as molybdenum (Mo) and molybdenum alloys, and chromium ( Cr), tantalum (Ta) and titanium (Ti). However, they may have a multilayer structure including two conductive films (not shown) having different physical properties. One of the conductive films is made of a metal having low resistivity, such as aluminum-based metal, silver-based metal, or copper-based metal, so as to reduce signal delay or voltage drop. In contrast, other conductive films are made of other materials, particularly materials having excellent physical, chemical, and electrical contact properties with indium tin oxide (ITO) and indium zinc oxide (IZO), such as molybdenum-based metals, chromium, tantalum, and titanium. Good examples of such a combination include a chromium bottom film, an aluminum (alloy) top film, and an aluminum (alloy) bottom film and a molybdenum (alloy) top film. However, the gate line 121 and the storage electrode line 131 may be made of various other metals or conductors.

Side surfaces of the gate line 121 and the storage electrode line 131 are inclined with respect to the surface of the substrate 110, and the inclination angle thereof is preferably about 30 ° to about 80 °.

A gate insulating layer 140 made of silicon nitride (SiNx) or silicon oxide (SiOx) is formed on the gate line 121 and the storage electrode line 131.

On the gate insulating layer 140, a plurality of linear semiconductors 151 made of hydrogenated amorphous silicon (amorphous silicon is abbreviated a-Si), polycrystalline silicon, or the like are formed. The linear semiconductor 151 mainly extends in the vertical direction and includes a plurality of protrusions 154 extending toward the gate electrode 124. The linear semiconductor 151 has a wider width in the vicinity of the gate line 121 and the storage electrode line 131 and covers them widely.

A plurality of linear and island ohmic contacts 161 and 165 are formed on the semiconductor 151. The ohmic contacts 161 and 165 may be made of a material such as n + hydrogenated amorphous silicon in which n-type impurities such as phosphorus are heavily doped, or may be made of silicide. The linear ohmic contact 161 has a plurality of protrusions 163, and the protrusion 163 and the island-type ohmic contact 165 are paired and disposed on the protrusion 154 of the semiconductor 151.

Side surfaces of the semiconductor 151 and the ohmic contacts 161, 163, and 165 are also inclined with respect to the surface of the substrate 110, and the inclination angle is preferably about 30 ° to 80 °.

A plurality of data lines 171, a plurality of drain electrodes 175, and a plurality of isolated metal pieces are formed on the ohmic contacts 161, 163, and 165 and the gate insulating layer 140. 178 is formed.

The data line 171 transmits a data signal and mainly extends in a vertical direction to intersect the gate line 121, the stem line of the storage electrode line 131, and the connecting portion 133e. Each data line 171 includes a plurality of source electrodes 173 extending toward the gate electrode 124 and a wide end portion 179 for connection with another layer or an external device. It may be mounted on a data driving circuit (not shown) that generates a data signal, mounted directly on the substrate 110, or integrated on the substrate 110. When the data driving circuit is integrated on the substrate 110, the data line 171 may be extended to be directly connected to the data driving circuit.

The drain electrode 175 is separated from the data line 171 and faces the source electrode 173 with respect to the gate electrode 124. Each drain electrode 175 has one end portion having a large area and the other end portion having a rod shape. The wide end is partially surrounded by the bent source electrode 173.

One gate electrode 124, one source electrode 173, and one drain electrode 175 together with the protrusion 154 of the semiconductor 151 form one thin film transistor (TFT). A channel of the transistor is formed in the protrusion 154 between the source electrode 173 and the drain electrode 175.

The isolated metal piece 178 is positioned on the gate line 121 near the first storage electrode 133a.

The data line 171, the drain electrode 175, and the metal piece 178 are preferably made of a refractory metal such as molybdenum, chromium, tantalum, and titanium, or an alloy thereof, and a refractory metal film (not shown). And a low resistance conductive film (not shown). Examples of the multilayer structure include a double layer of chromium or molybdenum (alloy) lower layer and an aluminum (alloy) upper layer, and a triple layer of molybdenum (alloy) lower layer, aluminum (alloy) interlayer and molybdenum (alloy) upper layer. However, the data line 171, the drain electrode 175, and the metal piece 178 may be made of various other metals or conductors.

The side of the data line 171, the drain electrode 175, and the metal piece 178 may also be inclined at an inclination angle of about 30 ° to about 80 ° with respect to the surface of the substrate 110.

The ohmic contacts 161, 163, and 165 exist only between the semiconductors 151 and 154 below and the data line 171 and the drain electrode 175 thereon, thereby lowering the contact resistance. In most places, the width of the linear semiconductor 151 is smaller than the width of the data line 171. However, as described above, the width of the linear semiconductor 151 is widened at the portion where it meets the gate line 121 to smooth the profile of the surface. Prevents disconnection. The semiconductors 151 and 154 have portions exposed between the source electrode 173 and the drain electrode 175 and not covered by the data line 171 and the drain electrode 175.

A passivation layer 180 is formed on the data line 171, the drain electrode 175, the metal piece 178, and the exposed portion of the semiconductor 151. The passivation layer 180 may be made of an inorganic insulator or an organic insulator, and may have a flat surface. Examples of the inorganic insulator include silicon nitride and silicon oxide. The organic insulator may have photosensitivity and the dielectric constant is preferably about 4.0 or less. However, the passivation layer 180 may have a double layer structure of the lower inorganic layer and the upper organic layer so as not to damage the exposed portion of the semiconductor 151 while maintaining excellent insulating properties of the organic layer.

In the passivation layer 180, a plurality of contact holes 182 and 185 exposing the end portion 179 and the drain electrode 175 of the data line 171 are formed, respectively, and the passivation layer 180 and the gate insulating layer are formed. In the 140, a plurality of contact holes 181 exposing the end portion 129 of the gate line 121 and a plurality of contact holes 183a exposing a part of the storage electrode line 131 near the fixed end of the first storage electrode 133a. And a plurality of contact holes 183b exposing the protruding portion of the free end of the first storage electrode 133a.

A plurality of pixel electrodes 191, a plurality of contact assistants 81 and 82, and a plurality of overpasses 83 are formed on the passivation layer 180. These may be made of at least one of a transparent conductive material such as ITO or IZO or a metal having excellent reflectivity of aluminum or silver alloy.

The pixel electrode 191 is physically and electrically connected to the drain electrode 175 through the contact hole 185 to receive a data voltage from the drain electrode 175. The pixel electrode 191 to which the data voltage is applied determines the direction of the liquid crystal molecules 31 of the liquid crystal layer 3 by generating an electric field together with the common electrode 270. The pixel electrode 191 and the common electrode 270 form a capacitor (hereinafter, referred to as a "liquid crystal capacitor") to maintain an applied voltage even after the thin film transistor is turned off.

The pixel electrode 191 overlaps the storage electrode line 131 including the storage electrodes 133a-133d, and the capacitor is formed by the pixel electrode 191 and the drain electrode 175 electrically connected thereto overlap the storage electrode line 131. Is called a storage capacitor, which strengthens the voltage holding capability of the liquid crystal capacitor.

Each pixel electrode 191 has four peripheral sides substantially parallel to the gate line 121 or the data line 171 and has a substantially rectangular shape in which the left corner is chamfered.

The hypotenuse of the pixel electrode 191 forms an angle of about 45 ° with respect to the gate line 121.

A central cutout 91, a lower cutout 92a, and an upper cutout 92b are formed in the pixel electrode 191, and the pixel electrode 191 includes a plurality of regions by the cutouts 91-92b. It is divided into partitions. The cutouts 91-92b are almost inverted symmetric with respect to an imaginary transverse centerline that bisects the pixel electrode 191.

The lower and upper cutouts 92a and 92b extend obliquely from the right side to the left side of the pixel electrode 191, and are positioned at the lower half and the upper half with respect to the horizontal centerline of the pixel electrode 191. The lower and upper cutouts 92a and 92b extend perpendicular to each other at an angle of about 45 ° with respect to the gate line 121.

The central cutout 91 extends along the horizontal centerline of the pixel electrode 191 and has an inlet at the right side thereof. The inlet of the central incision 91 has a pair of hypotenuses substantially parallel to the lower incision 92a and the upper incision 92b, respectively.

Accordingly, the lower half of the pixel electrode 191 is divided into two regions by the lower cutout 92a, and the upper half is also divided into two regions by the upper cutout 92b. In this case, the number of regions or the number of cutouts may vary according to design elements such as the size of the pixel electrode 191, the length ratio of the horizontal side and the vertical side of the pixel electrode 191, and the type or characteristics of the liquid crystal layer 3.

The contact auxiliary members 81 and 82 are connected to the end portion 129 of the gate line 121 and the end portion 179 of the data line 171 through the contact holes 181 and 182, respectively. The contact auxiliary members 81 and 82 compensate for and protect the adhesion between the end portions 179 and 129 of the data line 171 and the gate line 121 and the external device.

The connecting leg 83 crosses the gate line 121, and exposes the first portion and the first holding portion of the storage electrode line 131 through contact holes 183a and 183b positioned on opposite sides with the gate line 121 interposed therebetween. The electrode 133a is connected to the exposed end of the free end. The connecting leg 83 may overlap the metal piece 178 and be electrically connected to the metal piece 178. The storage electrode lines 131, including the storage electrodes 133a-133d, may be used together with the connecting legs 83 and the metal pieces 178 to repair defects in the gate line 121, the data line 171, or the thin film transistor. .

Next, the common electrode display panel 200 will be described with reference to FIGS. 1, 3, and 4.

A light blocking member 220 is formed on an insulating substrate 210 made of transparent glass, plastic, or the like. The light blocking member 220 is called a black matrix and blocks light. The light blocking member 220 has a plurality of openings 225 facing the pixel electrode 191 and having substantially the same shape as the pixel electrode 191. However, the light blocking member 220 may include a portion corresponding to the gate line 121 and the data line 171 and a portion corresponding to the thin film transistor.

A plurality of color filters 230 is also formed on the substrate 210. The color filter 230 is mostly present in an area surrounded by the light blocking member 230, and may extend in the vertical direction along the column of the pixel electrodes 191. The color filter 230 may display one of primary colors such as three primary colors of red, green, and blue.

An overcoat 250 is formed on the color filter 230 and the light blocking member 220. The overcoat 250 has a plurality of protrusions 251, 252a, and 252b including a vertex and an inclined surface, and prevents the color filter 230 from being exposed. Here, the overcoat 250 is preferably made of a photosensitive organic insulator.

One set of protrusions 251-252b faces one pixel electrode 191 and includes a central protrusion 251, a lower protrusion 252a, and an upper protrusion 252b. Each of the protrusions 251-252b is disposed between adjacent cutouts 91, 92a, and 92b of the pixel electrode 191, or between the protrusions 251-252b and the hypotenuse of the pixel electrode 191. In addition, each of the protrusions 251-252b includes at least one diagonal line extending in parallel with the lower cutout 92a or the upper cutout 92b of the pixel electrode 191. The protrusions 251-252b are substantially inverted symmetric with respect to the horizontal center line of the pixel electrode 191.

The lower and upper protrusions 252a and 252b respectively include an oblique portion, a horizontal portion and a vertical portion. The diagonal portion extends from the upper side or the lower side of the pixel electrode 191 to the left side. The horizontal part and the vertical part extend from each end of the oblique part along the sides of the pixel electrode 191 while overlapping the sides and form an obtuse angle with the oblique part.

The central protrusion 251 includes a central horizontal portion, a pair of diagonal lines and a pair of longitudinal longitudinal portions. The central horizontal portion extends from the left side of the pixel electrode 191 to the right along the horizontal center line of the pixel electrode 191, and the pair of diagonal portions respectively lower toward the right side of the pixel electrode 191 from the end of the central horizontal portion. And almost parallel to the upper protrusions 252a and 252b. The vertical longitudinal portion extends along the right side of the pixel electrode 191 from the end of the diagonal line and overlaps the right side, and forms an obtuse angle with the diagonal line.

The protrusions 251-252b may be separated from the overcoat 250.

The common electrode 270 is formed on the overcoat 250. The common electrode 270 is made of a transparent conductor such as ITO or IZO. The common electrode 270 protrudes along the protrusions 251-252b formed on the overcoat 250.

As such, the common electrode 270 covers the protrusions 251-252b to prevent the protrusions 251-252b from discharging the ionic material or the low molecular material, thereby preventing contamination of the liquid crystal layer 3 and Afterimage can be removed.

The columnar spacer 320 is formed on the common electrode 270. The columnar spacer 320 maintains a gap between the display panels 100 and 200 and secures a space in which the liquid crystal layer 3 is to be injected.

Alignment layers 11 and 21 are coated on inner surfaces of the display panels 100 and 200, and they may be vertical alignment layers. In addition, polarizers 12 and 22 are provided on the outer surfaces of the display panels 100 and 200, and polarization axes of the two polarizers 12 and 22 are orthogonal and one polarization axis is parallel to the gate line 121. It is preferable. In the case of a reflective liquid crystal display, one of the two polarizers 12 and 22 may be omitted.

The liquid crystal display according to the present exemplary embodiment may further include a phase retardation film (not shown) for compensating for the delay of the liquid crystal layer 3.

The liquid crystal display may include a polarizer 12 and 22, a phase retardation film, display panels 100 and 200, and a backlight unit (not shown) for supplying light to the liquid crystal layer 3.

The liquid crystal layer 3 has negative dielectric anisotropy, and the liquid crystal molecules of the liquid crystal layer 3 are aligned such that their major axes are perpendicular to the surfaces of the two display panels 100 and 200 in the absence of an electric field. Therefore, incident light does not pass through the quadrature polarizers 12 and 22 and is blocked.

When a common voltage is applied to the common electrode 270 and a data voltage is applied to the pixel electrode 191, an electric field (electric field) substantially perpendicular to the surfaces of the display panels 100 and 200 is generated. In response to the electric field, the liquid crystal molecules attempt to change their long axis to be perpendicular to the direction of the electric field. In the future, the pixel electrode 191 and the common electrode 270 are collectively referred to as an electric field generating electrode.

The cutouts 91-92b of the field generating electrodes 191 and 270 distort the electric field to create horizontal components that determine the inclination direction of the liquid crystal molecules.

In addition, the protruding portions of the protrusions 251-252b and the common electrode 270 thereon tilt the liquid crystal molecules in advance. In addition, the protruding portion of the common electrode 270 distorts the electric field to produce a horizontal component.

The horizontal component of the electric field is substantially perpendicular to the sides of the cutouts 91-92b and the projections 251-252b and the sides of the pixel electrode 191.

Referring to FIG. 3, one set of cutouts 91-92b and protrusions 251-252b divide the pixel electrode 191 into a plurality of sub-areas, and each sub-region is the pixel electrode 191. It has two major edges forming an oblique angle with the periphery. Most of the liquid crystal molecules on each subregion are inclined in a direction perpendicular to the periphery thereof, and thus, the inclination directions are approximately four directions. As described above, when the liquid crystal molecules are inclined in various directions, the reference viewing angle of the liquid crystal display is increased.

The shape and arrangement of the cutouts 91-92b and the protrusions 251-252b may be modified.

Next, a method of manufacturing the common electrode display panel for the liquid crystal display device illustrated in FIGS. 1 to 4 according to an exemplary embodiment of the present invention will be described in detail with reference to FIGS. 5 to 8.

5 through 8 are cross-sectional views sequentially illustrating a method of manufacturing the common electrode display panel of FIG. 4.

First, as shown in FIG. 5, the light blocking member 220 is formed on the upper substrate 210 made of transparent glass or plastic, and the color filter 230 is formed thereon. The color filter 230 is present between the light blocking members 220 adjacent to each other, and extends in the vertical direction along the column of the pixel electrodes 191.

Next, an overcoat 250 made of a photosensitive organic insulator is coated on the color filter 230.

Next, as shown in FIG. 6, the photomask 60 is aligned on the overcoat 250.

The photomask 60 includes a transparent substrate 61 and an opaque light blocking layer 62 thereon, the light masking area BA, the first semi-transmissive area SA1 and the second semi-transmissive area SA2. Divided.

The light blocking layer 62 is present in the entire light blocking area BA. In the first transflective area SA1, the interval is constant to a predetermined value, and in the second transflective area SA2, the light blocking layer 62 includes a slit. It includes a plurality of parts that make up.

The second transflective area SA2 is present between the first transflective area SA1 and the light blocking area BA. In this case, the interval between the slits of the second transflective area SA2 may become narrower as it approaches the first transflective area SA1, and may become wider as it approaches the light blocking area BA.

On the other hand, the width of the slit of the second transflective area SA2 may become wider as it approaches the first transflective area SA1, and may become narrower as it approaches the light shielding area BA.

Therefore, when the light is irradiated onto the overcoat 250 through the photomask 60 and then developed, the overcoat 250 exposed to light with a predetermined intensity or more disappears. As shown in FIG. The portion 253 facing BA) remains as it is, and the portion 252 facing the first transflective area SA is reduced in thickness by disappearing an upper portion. The area 254 facing the second transflective area SA2 is formed on the surface of the part 252 facing the first transflective area SA1 with the vertex 253 facing the light blocking area BA. The thickness decreases until it is reached. That is, the overcoat 251 having the protrusion 251 including the vertex and the inclined surface is made. In the drawing, the hatched portions represent portions of the overcoat 250 that disappear after development.

Next, as shown in FIG. 8, the common electrode 270 is formed on the overcoat 250, and the columnar spacer 320 is formed thereon. Next, the alignment layer 21 is coated on the common electrode 270 and the columnar spacer 320.

As such, the common electrode 270 is disposed on the protrusions 251-252b to prevent the ionic material or the low-molecular material from the protrusions 251-252b from contaminating the liquid crystal layer 3. You can prevent it.

Next, the columnar spacer 320 is formed on the alignment layer 21 to maintain a space between the display panels 100 and 200 to secure a space into which the liquid crystal layer 3 is to be injected.

According to the present invention, when manufacturing a common electrode display panel for a liquid crystal display device, by forming a projection with an overcoat, cost can be reduced, and the ionic material or the low molecular material coming out of the projection forms a common electrode on the projection to form a liquid crystal layer. By preventing contamination, afterimages can be prevented.

In addition, the protrusion may distort the electric field to increase the direction change rate of the liquid crystal molecules, thereby improving performance and reliability of the liquid crystal display.

Although the preferred embodiments of the present invention have been described in detail above, the scope of the present invention is not limited thereto, and various modifications and improvements of those skilled in the art using the basic concepts of the present invention defined in the following claims are also provided. It belongs to the scope of rights.

Claims (8)

A light blocking member formed on the substrate, A color filter formed on the light blocking member; An overcoat formed on the color filter, A protrusion formed on the overcoat, and A common electrode formed on the overcoat and the protrusion Including; The protrusion includes a vertex and an inclined plane Liquid crystal display. In claim 1, And the projection and the overcoat are integrated. In claim 1, The overcoat includes a photosensitive organic insulator. In claim 1, A columnar spacer formed on the common electrode, and An alignment layer formed on the columnar spacer; Liquid crystal display further comprising. Board, Forming a light blocking member on the substrate; Forming a color filter on the light blocking member; Forming an overcoat on the color filter; Photo etching the overcoat to form protrusions on the surface; and Forming a common electrode on the overcoat Method of manufacturing a liquid crystal display comprising a. In claim 5, The projection is a manufacturing method of a liquid crystal display device having a vertex and an inclined surface In claim 5, The overcoat photolithography is a manufacturing method of a liquid crystal display using a slit mask. In claim 5, Forming a columnar spacer on the common electrode, and Applying an alignment layer on the common electrode and the columnar spacer; Method of manufacturing a liquid crystal display device further comprising.

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