KR20060115818A - Liquid crystal display device and method of fabricating thereof - Google Patents

Abstract

An LCD and a method for manufacturing the same are provided to improve aperture ratio, brightness, and transmittance of the LCD, by realizing an IPS(In-Plane Switching) mode and an FFS(Fringe Field Switching) mode in one pixel region. A gate line(216) and a data line(217) cross each other to define a pixel region. A thin film transistor is formed at a crossing portion of the gate line and the data line. A common electrode(208) is formed within the pixel region, and apart from the gate line at a predetermined distance. A common line has one or more branch lines(208a,208b,208L) parallel to the gate line. A pixel electrode(218) is formed above the common electrode and a common line. The pixel electrode is composed of one or more branch electrodes(218a,218b).

Description

Liquid crystal display and its manufacturing method {LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THEREOF}

1 is a plan view schematically illustrating a part of an array substrate of a general IPS mode LCD.

2 is a plan view schematically illustrating a portion of an array substrate of an FFS mode liquid crystal display;

3 is a cross-sectional view taken along line IIa-IIa 'of the array substrate shown in FIG. 2;

4 is a cross-sectional view taken along line IIb-IIb 'of the array substrate shown in FIG. 2;

5 is a plan view schematically illustrating a portion of an array substrate of a liquid crystal display according to an exemplary embodiment of the present invention.

6A through 6E are cross-sectional views sequentially illustrating a manufacturing process along lines Va-Va 'and Vb-Vb' of the array substrate illustrated in FIG. 5.

7A to 7E are plan views sequentially illustrating a manufacturing process along lines Va—Va ′ and Vb−Vb ′ of the array substrate illustrated in FIG. 5.

8A is a graph showing T-V characteristics of a general IPS mode LCD and an FFS mode LCD.

8B is a graph showing T-V characteristics of the liquid crystal display according to the exemplary embodiment of the present invention.

** Explanation of symbols for main parts of drawings **

108,208 Common electrode 116,216 Gate line

117,217 data line 118,218 pixel electrode

208a, 208b: second branch line 208c: connection line

208L: first branch line 218a: first branch electrode

218b: second branch electrode

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device having improved aperture ratio, brightness, and T-V characteristics, and a manufacturing method thereof.

Recently, with increasing interest in information display and increasing demand for using a portable information carrier, a lightweight flat panel display (FPD), which replaces a conventional display device, a cathode ray tube (CRT), is used. The research and commercialization of Korea is focused on. In particular, the liquid crystal display (LCD) is a device that displays an image using the optical anisotropy of the liquid crystal, and is excellent in resolution, color display and image quality, and is actively applied to a laptop or a desktop monitor. It is becoming.

In this case, a driving method generally used in the liquid crystal display device is a twisted nematic (TN) method for driving a nematic liquid crystal molecule in a vertical direction with respect to a substrate, but the liquid crystal display device of the method has a viewing angle. It has the disadvantage of being as narrow as 90 degrees. This is due to the refractive anisotropy of the liquid crystal molecules because the liquid crystal molecules oriented horizontally with the substrate are oriented almost perpendicular to the substrate when a voltage is applied to the liquid crystal display panel.

There is an In Plane Switching (IPS) mode in which the liquid crystal molecules are driven in a horizontal direction with respect to the substrate to improve the viewing angle to 170 degrees or more.

1 is a plan view showing a part of an array substrate of a general IPS mode liquid crystal display device. In an actual liquid crystal display device, N gate lines and M data lines cross each other, and MxN pixels exist. Only one pixel is shown.

As shown in the drawing, a gate line 16 and a data line 17 are formed on the transparent glass substrate 10 to be arranged laterally and horizontally to define a pixel area. The gate line 16 and the data line 17 are formed. ), A thin film transistor (TFT) 20 as a switching element is formed.

In this case, the thin film transistor 20 includes a gate electrode 21 connected to the gate line 16, a source electrode 22 connected to the data line 17, and a drain electrode 23 connected to the pixel electrode 18. . In addition, although not shown in the drawing, the thin film transistor 20 may be formed by insulating the gate electrode 21 and the source / drain electrodes 22 and 23 with an insulating film and gate voltage supplied to the gate electrode 21. An active layer, that is, a channel layer, that forms a conductive channel between the electrode 22 and the drain electrode 23 is included.

In the pixel region, the common electrode 8 and the pixel electrode 18 are alternately arranged in the longitudinal direction of the data line 17 to generate a transverse electric field. In this case, the pixel electrode 18 is connected to the pixel electrode line 18L through the first contact hole 40A to be electrically connected to the drain electrode 23, and the common electrode 8 is a gate line ( The common electrode line 8L and the second contact hole 40B arranged in parallel with each other are electrically connected to each other.

The common electrode 8 and the pixel electrode 18 are formed on the same plane with a transparent conductive material such as indium tin oxide (ITO).

In the IPS mode liquid crystal display device configured as described above, the gate line 16 and the common electrode line 8L are formed using the same opaque conductive material on the same layer. In this case, the common electrode line is used to improve the aperture ratio. When 8L is formed adjacent to the gate line 16, there is a possibility that a short occurs between the gate line 16 and the common electrode line 8L.

Disclosure of Invention The present invention has been made to solve the above problems, and an object of the present invention is to provide a liquid crystal display device and a method of manufacturing the same, which improve TV characteristics by implementing IPS mode and FFS mode in one pixel through proper patterning of common electrodes. do.

In addition, another object of the present invention is to provide a liquid crystal display device and a method of manufacturing the same having improved aperture ratio and brightness by implementing an IPS mode in a pixel region adjacent to a gate line.

Other objects and features of the present invention will be described in the configuration and claims of the invention described below.

In order to achieve the above object, the liquid crystal display device of the present invention comprises a plurality of gate lines and data lines arranged longitudinally and horizontally on a substrate to define a plurality of pixel regions, a thin film transistor formed in the intersection region of the gate line and the data line, A common electrode formed to be spaced apart from the gate line by a predetermined distance in the pixel region, a common line including at least one branch line arranged in the gate line direction, and an insulating layer on the common electrode and the common line; The pixel electrode may include at least one branch electrode.

In addition, the manufacturing method of the liquid crystal display of the present invention comprises the steps of forming a common electrode on a substrate, forming a common line including a gate electrode, a gate line and at least one branch line on the substrate, the first on the substrate Forming an insulating layer, forming a thin film transistor including an active layer, a source electrode, and a drain electrode on the gate electrode; forming a second insulating layer on the substrate; and forming a partial region of the second insulating layer. Forming a contact hole exposing a portion of the drain electrode to be removed; and overlapping or crossing the first branch electrode and the common electrode electrically connected to the drain electrode through the contact hole, or alternately with the branch line of the common line. Forming a pixel electrode composed of a second branch electrode.

Hereinafter, the liquid crystal display of the present invention configured as described above and a manufacturing method thereof will be described in detail with reference to examples.

FIG. 2 is a plan view schematically illustrating a portion of an array substrate of a fringe field switching (FFS) mode liquid crystal display, and FIG. 3 is a cross-sectional view taken along line IIa-IIa 'of the array substrate of FIG. 4 is a cross-sectional view taken along line IIb-IIb ′ of the array substrate illustrated in FIG. 2.

In this case, the FFS mode liquid crystal display drives a liquid crystal molecule by inducing a fringe field (Fringe Field), a parabolic transverse electric field, in the liquid crystal layer so that the electrode spacing of the pixel electrode is densely formed compared to the electrode width. do.

1 to 3, the common electrode 108 is formed in a box shape on the array substrate 110 of the FFS mode liquid crystal display, and the pixel electrode 118 is gate-insulated from the common electrode 108. It is formed in the form of a slit with the layer 115A and the protective layer 115B interposed therebetween. In this case, the distance L1 between the pixel electrodes 118 having the slit shape is smaller than the width L2 of the pixel electrode 118. In addition, the width L2 of the pixel electrode 118 includes liquid crystal molecules (not shown) that are present on the positive electrode due to an electric field generated between the positive electrode, that is, the common electrode 108 and the pixel electrode 118. All of them are substantially wide enough to be operated.

A gate line 116 and a data line 117 are formed on the array substrate 110 to define a pixel region, which are arranged in a matrix form. In this case, the gate line 116 is arranged in a first direction and the data line ( 117 is arranged in a second direction that is substantially perpendicular to the first direction.

The thin film transistor, which is a switching element, is formed at an intersection of the gate line 116 and the data line 117, and the thin film transistor is connected to the gate electrode 121 and the data line 117 connected to the gate line 116. The drain electrode 123 is connected to the source electrode 122 and the pixel electrode 118. In addition, the thin film transistor is connected to the source electrode 122 by the gate voltage supplied to the insulating layers 115A and 115B and the gate electrode 121 for insulating the gate electrode 121 and the source / drain electrodes 122 and 123. ) And a conductive channel between the drain electrode 123 and the drain electrode 123.

As described above, the common electrode 108 and the pixel electrode 118 are respectively formed in the unit pixel region of the array substrate 110 to form a fringe field electric field. At this time, the electric field formed is a parabolic electric field so that all of the liquid crystal molecules on the electrode are operated so that the long axis of the liquid crystal molecules is twisted according to the electric field. Accordingly, the user sees the long axis of the liquid crystal molecules in any direction, thereby improving the viewing angle of the liquid crystal display.

In this case, the pixel electrode 118 is electrically connected to the drain electrode 123 through the contact hole 140, and the common electrode 108 is disposed in parallel with the gate line 116. ) Is directly and electrically connected. In addition, the common electrode 108, the pixel electrode 118, and the common line 108L may be formed of a transparent conductive material such as indium tin oxide to improve the aperture ratio.

As described above, in the liquid crystal display of the FFS mode, the common electrode 108 made of a transparent conductive material is formed in a box shape, and the slit pixel electrode 118 has a width L2 wider than the distance between the pixel electrodes L1. As a result, the value of the storage capacitance Cst is increased and the voltage drop ΔVp of the pixel electrode 118 is decreased. Therefore, a high transmittance and a field strengthening effect can be obtained, and the display quality of the screen is improved.

Meanwhile, in the FFS mode liquid crystal display, the common electrode 108 is disposed near the gate line 116 in order to maximize the aperture ratio, and the gap between the common electrode 108 and the gate line 116 is narrowed. Short circuits may occur. In addition, when the common electrode 108 is too close to the gate line 116, light leakage occurs in a black state due to a parasitic electric field between the gate line 116 and the common electrode 108. There is a problem that is reduced.

5 is a plan view schematically illustrating a portion of an array substrate of a liquid crystal display according to an exemplary embodiment of the present invention.

At this time, in the actual liquid crystal display device, N gate lines and M data lines cross each other, and there are M × N pixels. However, only one pixel is shown in the figure for simplicity.

As shown in the figure, a gate line 216 and a data line 217 are formed on the array substrate of the liquid crystal display device according to the present embodiment and are arranged in a matrix to define a pixel area. A thin film transistor, which is a switching element, is formed in the cross region of the data line 217.

In this case, the gate line 216 is arranged in a first direction and the data line 217 is arranged in a second direction substantially perpendicular to the first direction.

The thin film transistor includes a gate electrode 221 connected to the gate line 216, a source electrode 222 connected to the data line 217, and a drain electrode 223 connected to the pixel electrode 218. In addition, the thin film transistor is an insulating layer (not shown) for insulating the gate electrode 221 and the source / drain electrodes 222 and 223 and the source electrode 222 by a gate voltage supplied to the gate electrode 221. And an active layer forming a conductive channel between the drain electrode and the drain electrode 223.

The common electrode 208 and the common lines 208a to 208c and 208L made of a transparent conductive material are formed in the pixel region, and the pixel electrode 218 overlaps the common electrode 208 with an insulating layer interposed therebetween. It is formed. In this case, the common lines 208a to 208c and 208L may include first branch lines 208L, second branch lines 208a and 208b and the data lines 217 arranged in the direction of the gate line 216. And a connection line 208c arranged in the direction to connect the upper and lower second branch lines 208a and 208b.

The first branch line 208L of the common line is arranged at the center portion of the pixel region (hereinafter referred to as the first region), and the second branch lines 208a and 208b are adjacent to the gate line 216 (hereinafter referred to as the second region). Area). As such, the branch lines 208a, 208b, and 208L of the common line formed in the first region and the second region generate a transverse electric field in the pixel region together with the upper pixel electrode 218 to form the first region and the second region. Allows you to implement IPS mode in 2 areas.

On the other hand, in the common electrode 208 including the plate electrode, the pattern of the first region, which is the center of the pixel region, and the second region adjacent to the gate line 216 is partially removed. And IPS mode in the second area.

In addition, the pixel electrode 218 including the plurality of branch electrodes 218a and 218b is formed to have a slit over the entire pixel region except for the first region.

At this time, the pixel electrode 218 of the present embodiment is to implement the FFS mode and the IPS mode mixed in the pixel, the branch electrodes 218a, 218b of the pixel electrode 218 and the first region in which the IPS mode is implemented; In the second region, the lower common lines 208a, 208b, and 208L are alternately arranged. In the third region in which the FFS mode is implemented except for the first region and the second region, the common region 208 overlaps with the lower common electrode 208. Are arranged.

That is, the pixel electrode 218 and the common lines 208a, 208b, and 208L are separated from each other in the first region and the second region in which the IPS mode is implemented. In the third region in the FFS mode, the pixel electrode ( The structure 218 and the common electrode 208 overlap. Here, the first region, the second region, and the third region in which the IPS mode and the FFS mode are respectively implemented are merely examples for describing the present invention, and the present invention is not limited thereto.

The pixel electrode 218 is electrically connected to the lower drain electrode 223 through the contact hole 240, and the common electrode 208 is a connection line 208c of a common line arranged in the direction of the data line 217. ) Is directly connected electrically.

Here, the common electrode 208, the pixel electrode 218, and the common lines 208a to 208c and 208L may be formed of a metal layer having high conductivity, but all of indium tin oxide (ITO) or indium- It is preferable to form a transparent electrode such as zinc zinc oxide (IZO) to improve brightness and aperture ratio of the liquid crystal display.

In addition, the distance between the second branch electrodes 218b of the pixel electrode 218 having a slit shape is denser than the width of the second branch electrodes 218b.

As described above, in the liquid crystal display according to the present exemplary embodiment, the common electrode 208 formed on the same layer as the gate line 216 in the second region adjacent to the gate line 216 or the second branch lines 208a and 208b of the common line. ) Is formed to be separated from the gate line 216 by a considerable distance, thereby solving the problem of short-circuit between the common electrode 208 or the second branch lines 208a and 208b of the common line and the gate line 216. . Further, in the second region adjacent to the gate line 216, the first branch electrode 218a of the pixel electrode formed adjacent to the gate line 216 and the common line formed to be spaced apart from the gate line 216. Since the IPS mode is implemented between the two branch lines 208a, light leakage due to an electric field between the gate line 216 and the second branch line 208a of the common line can be prevented and the aperture ratio can be improved. This will be described in detail through the following manufacturing process of the array substrate.

6A to 6E are cross-sectional views sequentially illustrating a manufacturing process along lines Va-Va 'and Vb-Vb' of the array substrate illustrated in FIG. 5, and FIGS. 7A to 7E are views of the array substrate illustrated in FIG. 5. It is a top view which shows the manufacturing process along the Va-Va 'line and the Vb-Vb' line sequentially.

6A to 6E sequentially illustrate a manufacturing process along the Va-Va 'line of the array substrate illustrated in FIG. 5, and the Vb-Vb' line of the array substrate illustrated in FIG. The manufacturing process is shown sequentially.

First, as shown in FIGS. 6A and 7A, a common electrode 208 is formed on a substrate 210 made of a transparent insulating material such as glass through a photolithography process (first mask process).

The common electrode 208 is formed in the pixel region by depositing a conductive metal material on the entire surface of the substrate 210 and then patterning the conductive metal material using a photolithography process. ) Is patterned to remove a portion of the pattern of the first region A, which is the central portion of the pixel region, and the second regions B, B 'adjacent to the gate line, as described above. ) And the second region (B, B ') to implement the IPS mode.

6B and 7B, the gate electrode 221, the gate line 216, and the common line are made of a conductive metal material on the substrate 210 using a photolithography process (second mask process). (208a-208c, 208L) are formed.

The common lines 208a to 208c and 208L may be arranged in the direction of the first branch line 208L and the second branch lines 208a and 208b and the data line 217 arranged in the direction of the gate line 216. It consists of a connection line 208c arranged to connect between the upper and lower second branch lines 208a and 208b.

The first branch line 208L of the common line may be arranged in a first region that is the center of the common electrode 208, and the second branch lines 208a and 208b may be arranged in a second region adjacent to the gate line 216. Can be. In this case, the second branch lines 208a and 208b of the common line may protrude further toward the gate line 216 than the common electrode 208, and the branch lines 208a, 208b and 208L of the common line are patterned. They are positioned above, below (ie, the first region) and in the center (that is, the second region) of the common electrode 208.

As such, the branch lines 208a, 208b, and 208L of the common lines formed in the first region and the second region generate a transverse electric field in the pixel region together with the pixel electrode to be formed in a later process, thereby forming the first region and the second region. To implement IPS mode.

In the present embodiment, the common electrode, the gate wiring, and the common line are formed using two mask processes, for example. However, the common electrode, the gate wiring, and the common electrode as described above are processed through one mask process using diffraction exposure. Lines may also be formed.

Next, as illustrated in FIGS. 6C and 7C, a first insulating layer 215A, which is a gate insulating layer, is formed on the entire surface of the substrate 210.

In addition, an amorphous silicon thin film and an n + amorphous silicon thin film are sequentially deposited on the entire surface of the substrate 110 on which the first insulating layer 215A is formed, and then the n + amorphous silicon thin film using a photolithography process (third mask process). The active layer 224 is formed in the device region by patterning the amorphous silicon thin film. In this case, the n + amorphous silicon thin film is also patterned to form an ohmic contact layer 225 between a source / drain electrode and a source / drain region of the active layer 224, which will be described later.

Thereafter, a conductive metal material is deposited on the entire surface of the substrate 210, and then the source metal material 222 and the drain electrode 223 are formed in the device region by patterning the conductive metal material using a photolithography process (a fourth mask process). To form. Thereafter, the source / drain electrodes 222 and 223 are used as masks to remove the ohmic contact layer 225 of the channel portion, thereby exposing the surface of the active layer 224.

In this embodiment, a thin film transistor is formed in the device region through two mask processes, for example. However, the present invention is not limited thereto. Thin film transistors may also be formed.

6D and 7D, after forming the second insulating layer 215B, which is a protective layer, on the entire surface of the substrate 210, the photolithography process (fifth mask process) is used. The contact hole 240 exposing a part of the drain electrode 223 is formed by removing a part of the second insulating layer 115B.

Next, as shown in FIGS. 6E and 7E, the pixel electrode 218 is formed of the conductive metal layer in the pixel region using a photolithography process (sixth mask process).

The pixel electrode 218 is composed of a plurality of branch electrodes 218a and 218b, and has a slit over the entire pixel region except for the first region where the first branch line 208L of the common line is arranged. Formed.

In this case, as described above, the branch electrodes 218a and 218b of the pixel electrode 218 are alternately arranged with the lower common lines 208a, 208b and 208L in the first region and the second region where the IPS mode is implemented. In the third region in which the FFS mode is implemented except for the first region and the second region, the third region is arranged to overlap the lower common electrode 208.

That is, the pixel electrode 218 and the common lines 208a, 208b, and 208L are separated from each other in the first region and the second region in which the IPS mode is implemented. In the third region in the FFS mode, the pixel electrode ( The structure 218 and the common electrode 208 overlap. Here, the first region, the second region, and the third region in which the IPS mode and the FFS mode are respectively implemented are merely examples for describing the present invention, and the present invention is not limited thereto.

The pixel electrode 218 is electrically connected to the lower drain electrode 223 through the contact hole 240 to receive a pixel voltage, and the common electrode 208 is a common line arranged in the direction of the data line 217. It is directly connected to the connection line 208c of the to receive a common voltage.

As described above, in the liquid crystal display according to the present exemplary embodiment, the common electrode 208 formed on the same layer as the gate line 216 in the second region adjacent to the gate line 216 or the second branch lines 208a and 208b of the common line. ) Is formed to be separated from the gate line 216 by a considerable distance, thereby solving the problem of short-circuit between the common electrode 208 or the second branch lines 208a and 208b of the common line and the gate line 216. . Further, in the second region adjacent to the gate line 216, the first branch electrode 218a of the pixel electrode formed adjacent to the gate line 216 and the common line formed to be spaced apart from the gate line 216. Since the IPS mode is implemented between the two branch lines 208a, light leakage due to an electric field between the gate line 216 and the second branch line 208a of the common line can be prevented and the aperture ratio can be improved.

In addition, the liquid crystal display of the present embodiment is formed by mixing the IPS mode and the FFS mode to improve the T-V characteristics, which will be described in detail with reference to the accompanying drawings.

FIG. 8A is a graph illustrating T-V characteristics of a general IPS mode LCD and an FFS mode LCD, and FIG. 8B is a graph illustrating T-V characteristics of an LCD according to an exemplary embodiment of the present invention.

As shown in Figure 8a, it can be seen that the IPS mode liquid crystal display and a FFS-mode liquid crystal display device In applying saturation represents the maximum transmission rate in accordance with the voltage (saturation) voltage area (S _I, S _F) to narrow. As described above, since the width of the saturated voltage regions S _I and S _F is narrow, it is difficult to use the voltage in the maximum transmissive region.

Next, as shown in FIG. 8B, the liquid crystal display according to the exemplary embodiment of the present invention implements a mixture of the IPS mode and the FFS mode to increase the saturation voltage region S _{F + I.} That is, the liquid crystal display device of the present invention can widen the voltage range of the saturation region by suitably controlling the number of the IPS mode and the FFS mode, within a pixel, and thus the saturation voltage region of maximum transmission because (S _{F + I)} wide, the The voltage of the region can be used.

Many details are set forth in the foregoing description but should be construed as illustrative of preferred embodiments rather than to limit the scope of the invention. Therefore, the invention should not be defined by the described embodiments, but should be defined by the claims and their equivalents.

As described above, the liquid crystal display according to the present invention provides an effect of increasing the yield by preventing a short circuit occurring between the gate line and the common electrode or the common line.

In addition, the liquid crystal display according to the present invention can block the generation of parasitic electric fields between the gate line and the common electrode or the common line, thereby preventing light leakage and improving the aperture ratio.

In addition, the liquid crystal display according to the present invention has an advantage that the saturated region voltage of the T-V curve can be used more widely by appropriately adjusting the number of IPS mode and FFS mode in one pixel.

Claims (15)

A plurality of gate lines and data lines arranged vertically and horizontally on a substrate to define a plurality of pixel regions; A thin film transistor formed at an intersection of the gate line and the data line; A common electrode formed in the pixel area spaced apart from the gate line by a predetermined distance; A common line including at least one branch line arranged in the gate line direction; And And a pixel electrode formed on the common electrode and the common line through the insulating layer, the pixel electrode including at least one branch electrode. 2. The liquid crystal display of claim 1, wherein the common electrode has a pattern of a first region adjacent to the gate line removed. 3. The liquid crystal display of claim 2, wherein the common electrode has a pattern of a second region located at the center of the pixel region removed. 4. The first branch line of claim 3, wherein the common line comprises a first branch line arranged in the first area, a second branch line arranged in the second area, and a first branch line arranged in the data line direction. Liquid crystal display comprising a connection line for connecting the. The liquid crystal display of claim 4, wherein the common electrode is electrically connected directly to a connection line of the common line. The at least one first branch of claim 4, wherein the pixel electrode is formed of a plurality of branch electrodes of a slit type, electrically connected to the drain electrode, and arranged at a predetermined distance from the first branch line of the common line. And a plurality of second branch electrodes arranged in a pixel region (third region) other than the first region and the second region. 7. The method of claim 6, wherein in the first region and the second region, the branch line of the pixel electrode and the common line are alternately arranged to implement the IPS mode, and in the third region, the pixel electrode and the common electrode are arranged so as to overlap the FFS mode. Liquid crystal display characterized in that is implemented. The liquid crystal display of claim 6, wherein a distance between the electrodes of the second branch electrode of the pixel electrode is formed to be denser than a width of the electrode. The liquid crystal display of claim 1, wherein the common electrode, the common line, and the pixel electrode are made of a transparent conductive material such as indium tin oxide or indium zinc oxide. Forming a common electrode on the substrate; Forming a common line on the substrate, the common line including a gate electrode, a gate line, and at least one branch line; Forming a first insulating layer on the substrate; Forming a thin film transistor including an active layer, a source electrode, and a drain electrode on the gate electrode; Forming a second insulating layer on the substrate and removing a partial region of the second insulating layer to form a contact hole exposing a part of the drain electrode; And Forming a pixel electrode comprising a first branch electrode electrically connected to a drain electrode through the contact hole and a second branch electrode overlapping the common electrode or intersecting with the branch line of the common line; Method for manufacturing a display device. The method of claim 10, wherein the common electrode is formed such that the pattern of the first region adjacent to the gate line is removed to be spaced apart from the gate line by a predetermined distance. The method of claim 11, wherein the common electrode is formed such that a pattern of a second region positioned in the center of the pixel region is removed. The upper and lower first branch lines of claim 12, wherein the common line includes first branch lines arranged in the first area, second branch lines arranged in the second area, and first branch lines arranged in the data line direction. Method for manufacturing a liquid crystal display device, characterized in that formed to be configured as a connection line for connecting. The pixel electrode of claim 13, wherein the pixel electrode is arranged in at least one first branch electrode spaced apart from the first branch line of the common line by a predetermined distance, and in a pixel region (third region) other than the first and second regions. And forming a plurality of second branch electrodes. 15. The liquid crystal of claim 14, wherein the first region and the second region are formed such that the branch lines of the pixel electrode and the common line are alternately arranged, and the pixel electrode and the common electrode are overlapped in the third region. Method for manufacturing a display device.

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