KR20060071020A - Color filter substrate, method of manufacturing the same, and liquid crystal display panel having the same - Google Patents

Abstract

A color filter substrate for improving display characteristics, a method of manufacturing the same, and a liquid crystal panel including the same are disclosed. A plurality of exposed portions for exposing the substrate in a slit type are formed in the color pixels formed on the substrate. The planarization film covers the substrate and the color pixels exposed by the exposed portions. Accordingly, the white balance can be maintained and the polarization efficiency can be kept high by reducing the step difference of the planarization film to reduce the cell gap variation of the liquid crystal layer.

Color pixel, planarization film, step, cell gap

Description

COLOR FILTER SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY PANEL HAVING THE SAME}

1 is a cross-sectional view of a color filter substrate according to an embodiment of the present invention.

2 is a cross-sectional view of a color filter substrate according to a comparative example of the present invention.

3 is a plan view of a color filter substrate according to an exemplary embodiment of the present invention.

4 is a cross-sectional view of a liquid crystal panel according to an embodiment of the present invention.

5 to 8 are cross-sectional views illustrating a manufacturing process of the color filter substrate illustrated in FIG. 1.

<Description of the symbols for the main parts of the drawings>

100: color filter substrate 110: base substrate

120: black matrix 130: color pixel

140: planarization layer 150: common electrode layer

200: array substrate 210: second base substrate

220: protective film 230: insulating film

240: transparent electrode 250: reflective electrode

300: liquid crystal layer

The present invention relates to a color filter substrate, a method for manufacturing the same, and a liquid crystal panel including the same, and more particularly, to a color filter substrate for improving display characteristics, a method for manufacturing the same, and a liquid crystal panel including the same.

The transflective liquid crystal display displays an image in a reflection mode using external light where the amount of external light is abundant and displays an image in a transmissive mode using internal light generated by consuming electric energy charged therein where the external light is insufficient. Display.

The transflective liquid crystal display device includes a liquid crystal panel including an array substrate, a color filter substrate facing the array substrate, and a liquid crystal layer interposed between the array substrate and the color filter substrate.

The array substrate includes a transparent electrode and a reflective electrode. The region where the reflective electrode is formed on the transparent electrode is a reflective region, and the region where the reflective electrode is not formed on the transparent electrode is a transmission region. The reflective and transmissive regions are defined not only in the array substrate but also in the color filter substrate corresponding to the array substrate, so that the reflective and transmissive regions can be defined in the entire liquid crystal panel. The color filter substrate includes a base substrate, a color pixel composed of red (R), green (G), and blue (B) color pixels, and a common electrode, and is coupled to face the array substrate.

In the reflective region of the transflective liquid crystal display, external light passes through a first path, for example, a path sequentially passing through a color pixel, a common electrode, a liquid crystal, a reflective electrode, a liquid crystal, a common electrode, and a color pixel. On the other hand, the internal light in the transmission region passes through a second path, for example, a path sequentially passing through the transparent electrode-liquid crystal-common electrode-color pixel.

As described above, since the external light passes through the color pixel twice in the reflection region, and the internal light passes through the color pixel once in the transmission region, color reproducibility in the reflection region and the transmission region is achieved. The difference occurs. In addition, since the color pixels are made of color pixels that are colored in different colors, the color visibility and luminance difference of each color pixel are generated.

The difference in color reproducibility between the transmission region and the reflection region and the difference in color visibility and luminance occurring between the respective color pixels are factors that lower display characteristics of the liquid crystal display.

Therefore, the difference in color visibility and luminance occurring between each of the color pixels is overcome by adjusting the thickness or area of each of the color pixels, and the difference in color reproducibility in the transmission area and the reflection area is determined by the color filter substrate. The hole is formed in each of the color pixels to overcome the method of changing a part of the external light.

For example, in the reflection region, a path passing sequentially through the pixel, the common electrode, the liquid crystal, the reflective electrode, the liquid crystal, the common electrode, instead of the first path, or the common electrode, the liquid crystal, the reflective electrode, the liquid crystal, the common electrode, and the color. A portion of the external light passes through a path that sequentially passes through the pixel.

Holes formed in some areas of the color pixels may overcome the difference in color reproducibility in the transmission area and the reflection area.However, the cell gap of the liquid crystal layer interposed between the array substrate and the color filter substrate may be caused by the holes. There is a problem in that it is not kept constant in the reflection region, and the white balance collapses and the polarization efficiency is lowered.

In order to overcome the problem, a flattening film covering the base substrate and the color pixels exposed by the holes is formed, but a step is generated because the formation of a substantially flat film is difficult, and in particular, the larger the surface area of the holes, There is a problem that the step is larger.

Accordingly, the technical problem of the present invention is to improve such a problem, and a first object of the present invention is to provide a color filter substrate including a flattening film having a small step.

A second object of the present invention is to provide a method for producing the color filter substrate.

It is a third object of the present invention to provide a liquid crystal panel having the color filter substrate.

According to one aspect of the present invention, there is provided a color filter substrate including: a substrate, a color pixel having a plurality of exposed portions formed on the substrate and exposing the substrate in a slit type; And a planarization layer covering the substrate and the color pixels exposed by the exposed portions.

According to another aspect of the present invention, there is provided a method of manufacturing a color filter substrate, the method including: forming a color pixel on a substrate and forming a plurality of exposed portions exposing the substrate in a slit type; And forming a planarization film covering the substrate and the color pixel exposed by the exposed portions.

According to one aspect of the present invention, a liquid crystal panel includes an array substrate, a liquid crystal layer, and a color pixel having a plurality of exposed portions formed on the substrate and exposing the substrate in a slit type. And a color filter substrate accommodating the liquid crystal layer through coalescence with the array substrate.

According to such a color filter substrate, a method of manufacturing the same, and a liquid crystal panel including the same, the white gap can be maintained and the polarization efficiency can be maintained by reducing the cell gap deviation of the liquid crystal layer by reducing the step difference of the flattening film.

Hereinafter, with reference to the accompanying drawings, it will be described in detail the present invention.

1 is a cross-sectional view of a color filter substrate according to an embodiment of the present invention.

Referring to FIG. 1, the color filter substrate 100 may include a base substrate 110, a black matrix 120, a color pixel 130, a planarization layer 140, and a common electrode layer 150.

A color pixel 130 including red (R), green (G), and blue (B) color pixels is formed on the base substrate 110, and the base substrate 110 is formed at a boundary between the color pixels. Although the black matrix 120 is formed between the color pixel 130 and the color pixel 130, the black matrix 120 may not be formed by overlapping the color pixels.

The red (R) color pixel represents the first reflection region RA1 and the first transmission region TA1, and the green (G) color pixel represents the second reflection region RA2 and the second transmission region TA2, and the blue (B) The color pixel has a third reflection area RA3 and a third transmission area TA3, and a first hole H1 is formed in the first reflection area RA1, and a second reflection area RA2. A third hole H3 is formed in the second hole H2 and the third reflective region RA3.

The first hole H1 is composed of three sub-holes H11, H12, and H13, and the second hole H2 is six sub-holes H21, H22, H23, H24, H25, and H26. The third hole H3 has no sub-hole.

In addition, each of the three sub-holes H11, H12, and H13 of the first hole H1 has a first width L1, and each of the six sub-holes H21, H22, H23 of the second hole H2. , H24, H25, H26 have a second width L2, the third hole H3 has a third width L3, and the surface area of each of the holes H1, H2, H3 is The sum of the surface areas of the sub-holes H11 to H13 and H21 to H26 of H1, H2, and H3, or in the case of the third hole H3 having no sub-hole, defines the surface area of the third hole H3 itself. The surface area of each of the holes H1, H2, and H3 may be proportional to the widths L1, L2, and L3 of the sub-holes H11 to H13, H21 to H26, or the third hole H3 itself. do.

The paths of a part of external light (not shown) are changed by the holes H1, H2, and H3 formed in each of the reflection areas RA1, RA2, and RA3, so that the respective reflection areas RA1, RA2, and RA3 are different from each other. The difference in color reproducibility in the transmission areas TA1, TA2, TA3 is reduced.

 In this case, the area removed by the holes H1, H2, and H3 is different for each of the color pixels, because the color coordinates change in contrast to the area removed for each color pixel according to color, and thus, to maintain white balance. The surface area of each of the holes H1, H2, H3 must be adjusted.

In general, the green (G) pixel has a smaller change in color coordinates in comparison to the area change than the red (R) and blue (B) color pixels, so that the number of sub-holes in the second hole (H2) is increased. The white balance is maintained by increasing the surface area of the second hole H2, and the number of each sub-hole is determined in the order of the red (R) pixel and the blue (B) pixel.

The planarization layer 140 is formed on the base substrate 110 exposed by the color pixels 130 and the holes H1, H2, and H3, and the color generated by the holes H1, H2, and H3. It serves to reduce the step difference of the pixel 130.

As shown in FIG. 1, the step of the color pixel 130 is not completely extinguished by the planarization layer 140, and the second depth is the first depth D1 on the first hole H1. The step difference by the second depth D2 on the hole H2 and the third depth D3 still exist on the third hole H3.

However, the step is proportional to the surface area of each of the sub-holes H11 to H13 and H21 to H26 or to the surface area of the third hole H3 itself when there is no sub-hole as in the third hole H3. Increasing the number of sub-holes of each of the holes H1, H2, and H3 or newly forming the sub-holes maintains the same surface area of each of the holes H1, H2, and H3 while maintaining the same surface area. The step can be reduced by reducing the surface area of each of the sub holes.

In FIG. 1, the widths of the sub-holes H11 to H13 and H21 to H26 of the first and second holes H1 and H2 are constantly shown as the first width L1 and the second width L2, respectively. It is not necessary to make constant, and it is sufficient that each of the widths L1, L2, L3 of the sub-holes H11 to H13, H21 to H26 or the third hole H3 has a small value, and the shape of such a hole is slit. It may be called a type.

In addition, although the thickness (not shown) and the area (not shown) are the same for each color pixel in FIG. 1, since the color visibility and luminance are different for each color pixel, each color pixel is used to maintain white balance. To form different thickness (not shown), area (not shown), or both.

In general, since the color visibility and luminance are good in the order of the green (G), red (R), and blue (B) color pixels, when the thickness (not shown) differs for each of the color pixels, the sizes are changed in the above order. If only the area (not shown) is changed for each of the color pixels, the size is adjusted in the reverse order of the order.

Although not shown in FIG. 1, a second planarization film (not shown) may be formed to further reduce the step difference existing on the planarization film 140.

The common electrode layer 150 is formed on the planarization layer 140. However, a level difference also exists in the common electrode layer 150 due to the step in the planarization layer 140. In the substrate 100, the step is very small due to the holes H3 or the sub-holes H11 to H13 and H21 to H26 of the slit type as described above.

2 is a cross-sectional view of a color filter substrate according to a comparative example of the present invention.

Referring to FIG. 2, the color filter substrate 100 includes a base substrate 110, a black matrix 120, a color pixel 130, and a planarization layer 140. Although not shown, a common electrode layer is formed on the planarization layer 140.

A color pixel 130 including red (R), green (G), and blue (B) colors is formed on the base substrate 110, and the base substrate 110 is formed at a boundary between the color pixels. Although the black matrix 120 is formed between the color pixel 130 and the color pixel 130, the black matrix 120 may not be formed by overlapping the color pixels.

The red (R) color pixel represents the first reflection region RA1 and the first transmission region TA1, and the green (G) color pixel represents the second reflection region RA2 and the second transmission region TA2, and the blue (B) The color pixel has a third reflection area RA3 and a third transmission area TA3, and a first hole H1 is formed in the first reflection area RA1, and a second reflection area RA2. A third hole H3 is formed in the second hole H2 and the third reflective region RA3.

The first hole H1 has a fourth width L4, the second hole H2 has a fifth width L5, and the third hole H3 has a sixth width L6. The surface area of each of the holes H1, H2, and H3 is proportional to each of the widths L4, L5, and L6 of the holes H1, H2, and H3.

The paths of a part of external light (not shown) are changed by the holes H1, H2, and H3 formed in each of the reflection areas RA1, RA2, and RA3, so that the respective reflection areas RA1, RA2, and RA3 are different from each other. The difference in color reproducibility in the transmission areas TA1, TA2, TA3 is reduced.

Each of the widths L4, L5, and L6 of the holes H1, H2, and H3 may be different, because the changing color coordinates are different with respect to the area removed for each color according to each color, thus maintaining white balance. The surface area of each of the holes H1, H2, H3 must be adjusted.

The planarization layer 140 is formed on the base substrate 110 exposed by the color pixels 130 and the holes H1, H2, and H3, and the color generated by the holes H1, H2, and H3. It serves to reduce the step difference of the pixel 130.

The level difference of the color pixel 130 is not completely extinguished by the planarization layer 140, and each of the fourth depth D4, the fifth depth D5, and the respective holes H1, H2, and H3 are not eliminated. The level difference by the sixth depth D6 still exists. At this time, when the width L5 is large, such as the second hole H2 having the fifth width L5, and the surface area is large, the flattening film 140 has a large depth of depression D5. ) Is left in a large state, which still exists in the common electrode layer 150 formed on the planarization layer 140.

1 and 2, the structure of the color filter substrate 100 of FIG. 1 is the same as that of the color filter substrate 100 of FIG. 2, but the color pixels of the color filter substrate 100 are similar to those of the color filter substrate 100. Each of the sub-holes H11 to H13, H21 to H26 of the holes H1, H2, and H3 or the widths L1, L2, and L3 of the third hole H3 formed in the hole H1, H2, and H3 is formed in the holes (FIG. When compared with the respective widths (L4, L5, L6) of H1, H2, H3 may have a different value.                     

That is, in FIG. 2, the widths L4, L5, and L6 of the holes H1, H2, and H3 are not only different in size from each other, but particularly, in the case of the second hole H2, holes of different widths L5 are different from each other. It is very large compared to the respective widths L4 and L6 of the H1 and H3, and the depth D5 of the planarization film 140 formed thereon is greater than the depths D4 and D6 of the other holes H4 and H6. very big.

However, in FIG. 1, each of the sub-holes H11 to H13 and H21 to H26 of the first and second holes H1 and H2 not only have the same widths L1 and L2, but also has a length of FIG. 2. Is smaller than the respective widths L4, L5 of the corresponding holes H1, H2. Nevertheless, in order to maintain the effect of reducing the color reproducibility difference between each of the reflection areas RA1, RA2, RA3 and the transmission areas TA1, TA2, TA3, the first and second holes H1, H2 in FIG. 1. Is composed of a plurality of sub-holes H11 to H13 and H21 to H26 so that the sum of the surface areas of the holes for each pixel is formed to be the same as the surface area of the corresponding hole for each pixel in FIG. 2.

3 is a plan view of a part of a color filter substrate according to an exemplary embodiment of the present invention.

Referring to FIG. 3, the color pixels 130 are formed on the color filter substrate 100, and the red (R), green (G), and blue (B) color pixels are arranged in the vertical direction, respectively. The first, second, and third reflective regions RA1, RA2, and RA3 and the first, second, and third transmission regions TA1, TA2, and TA3 exist for each color pixel.

In this case, first, second, and third holes H1, H2, and H3 are formed in the reflective regions RA1, RA2, and RA3 for each pixel, and the first hole H1 includes three sub-holes ( H11, H12, and H13, and the second hole H2 includes six sub-holes H21, H22, H23, H24, H25, and H26.                     

Each of the sub holes H11 to H13, H21 to H26, and the third hole H3 has a slit type having a small width L4, L5, and L6. In particular, the sub holes H11 illustrated in FIG. 3 are illustrated. To H13, H21 to H26, and the third hole H3 have a stripe bar shape among the slit types. In this case, the slit type does not necessarily have to be the stripe bar shape, but any shape may be included in the slit type as long as the width is small and thus the surface area thereof is small.

4 is a cross-sectional view of a part of a liquid crystal panel according to an embodiment of the present invention.

Referring to FIG. 4, the liquid crystal panel includes a color filter substrate 100, an array substrate 200, and a liquid crystal layer 300.

The color filter substrate 100 includes a base substrate 110, a black matrix 120, a color pixel 130, a first planarization layer 142, a second planarization layer 144, and a common electrode layer 150. do.

A color pixel 130 including red (R), green (G), and blue (B) colors is formed on the base substrate 110, and the base substrate 110 is formed at a boundary between the color pixels. Although the black matrix 120 is formed between the color pixel 130 and the color pixel 130, the black matrix 120 may not be formed by overlapping the color pixels.

Reflecting areas RA1, RA2, RA3 and transmission areas TA1, TA2, TA3 are formed in the red, green, and blue color pixels, respectively, and the reflecting area RA1. , RA2 and RA3 have first, second, and third holes H1, H2, and H3 corresponding thereto, and the first hole H1 includes three sub-holes H11, H12, and H13. The second hole includes six sub-holes H21, H22, H23, H24, H25, and H26.                     

In this case, each of the sub holes H11 to H13, H21 to H26, and the third hole H3 has first, second, and third widths L1, L2, and L3, respectively. However, each of the sub holes H11 to H13 and H21 to H26 does not necessarily have the same width of each of the first width L1 or the second width L2.

Steps exist in the base substrate 110 exposed by the holes H1 to H3 and the first planarization layer 142 formed on the color pixel 130 according to the depths D1, D2, and D3. The step is proportional to the widths L1 to L3 of the respective sub holes H11 to H13 and H21 to H26 and the third hole H3. Accordingly, in order to sufficiently reduce the step, each of the holes H1, H2, and H3 may have a larger number of sub holes.

In addition, when the second planarization layer 144 is stacked on the first planarization layer 142, the step difference of the second planarization layer 144 may be smaller than that of the first planarization layer 142. It can be used as an auxiliary method to reduce the

The common electrode layer 150 made of indium tin oxide (ITO) or indium zinc oxide (IZO) is formed on the second planarization layer 144. There is a level similar to the level difference.

The array substrate 200 includes a passivation layer 220, an insulating layer 230, a transmission electrode 240, and a reflection electrode 250 on the second base substrate 210, and transmit regions TA1, TA2, and TA3. ) And reflection areas RA1, RA2, and RA3. The transmission areas TA1, TA2, TA3 and the reflection areas RA1, RA2, RA3 are disposed in the transmission areas TA1, TA2, TA3 and the reflection areas RA1, RA2, RA3 of the color filter substrate 100. Corresponds. A plurality of TFTs (not shown) is provided on the second base substrate 210. The insulating film 230 is formed of a photosensitive organic insulating film such as acrylic resin.

The insulating layer 230 covers the plurality of TFTs and is opened to expose the second base substrate 210 in correspondence with the transmission areas TA1, TA2, TA3. In addition, a plurality of irregularities are provided on the surface of the insulating layer 230 corresponding to the reflective regions RA1, RA2, and RA3. That is, the insulating film 230 has the plurality of concavities and convexities formed of a convex portion having a relatively thick thickness and a concave portion having a relatively thin thickness.

The transmissive electrode 240 made of ITO or IZO is formed on the insulating layer 230 and the opened first substrate 210 to have a uniform thickness. Thereafter, the reflective electrode 250 having a transmission window for exposing a portion of the transmission electrode 240 over the transmission electrode 240 is formed to have a uniform thickness. The transmission window is formed corresponding to the transmission areas TA1, TA2, TA3.

Accordingly, the liquid crystal panel 400 has different cell gaps in the reflection areas RA1, RA2, and RA3 and the transmission areas TA1, TA2, and TA3. That is, the cell gap in the transmission areas TA1, TA2 and TA3 is about twice as large as the cell gap in the reflection areas RA1, RA2 and RA3.

Here, the cell gap in the reflective regions RA1, RA2, and RA3 is a distance between the common electrode layer 150 of the color filter substrate 100 and the reflective electrode 250 of the array substrate 200, and the transmission region. The cell gaps in TA1, TA2, and TA3 are spaced apart from the common electrode layer 150 and the transparent electrode 240.

As described above, in the color pixels in the reflective regions RA1, RA2, and RA3, a step is formed in the first planarization layer 142 and the second planarization layer 144 by a plurality of holes H1 to H3. Since the step is maintained in the common electrode layer 150, the cell gap is not kept constant. As a result, white balance collapse and polarization efficiency of the liquid crystal panel are reduced.

However, according to the present invention, when the widths of the holes H1 to H3 are large, the step is reduced by using a method of forming the sub holes H11 to H13 and H21 to H26 to form a slit by dividing the holes into several pieces. The cell gap constant is maintained to some extent.

In this case, the reflective electrode 250 may have a single layer made of aluminum-neodymium (AlNd) or a double layer structure in which aluminum-neodymium (AlNd) and molybdenum tungsten (MoW) are sequentially stacked.

Although not shown in the drawings, a contact hole (not shown) for exposing the drain electrode of the TFT may be formed in the insulating film 230. When the contact hole is formed in the insulating layer 230, the transmission electrode 240 and the reflection electrode 250 are electrically connected to the drain electrode of the TFT through the contact hole.

In the reflective areas RA1, RA2, and RA3, the external light l1 incident through the color filter substrate 100 is reflected by the reflective electrode 250, and then is returned to the outside through the color filter substrate 100. The image is displayed by exiting. Meanwhile, in the transmission areas TA1, TA2, and TA3, an image is displayed by emitting internal light l2 incident from a light source unit (not shown) disposed on the rear surface of the array substrate 200 through the transmission window.

5 to 8 are cross-sectional views illustrating a manufacturing process of the color filter substrate illustrated in FIG. 2.

Referring to FIG. 5, a black matrix 120 is formed on a base substrate 110, and a color pixel 130 including red (R), green (G), and blue (B) color pixels is formed thereon. do.

Referring to FIG. 6, the first, second, and second portions for exposing the substrate 110 to the reflective regions RA1, RA2, and RA3 of the red, green, and blue B pixels. And third holes H1, H2, and H3, wherein the first hole H1 is three subholes H11, H12, and H13, and the second hole H2 has six subholes H21. , H22, H23, H24, H25, and H26, and the number of these sub holes H11 to H13, H21 to H26 may vary depending on the surface area of the holes H1 and H2.

In addition, the widths of the sub-holes H11 to H13 and H21 to H26 may be the same as the first width L1 and the second width L2 or may be different from each other, but the sub-holes ( It may be advantageous for the process to form H11 to H13, H21 to H26 uniformly. In addition, in the case of the third hole H3, the width L3 is small so that the sub hole is not formed. However, in some cases, a plurality of sub holes may be formed in order to obtain a smaller step.

Referring to FIG. 7, a first planarization layer 142 is formed on the base substrate 110 exposed by the color pixels 130 and the holes H1 to H3. The surface of the first planarization layer 142 has a step by the holes H1 to H3, but the widths L1 to L3 of the sub-holes H11 to H13, H21 to H26, and the third hole H. This step is small so that the step has a small value.

Referring to FIG. 8, a second planarization layer 144 is stacked on the first planarization layer 142, so that the step of the second planarization layer 144 is greater than the level of the first planarization layer 142. Becomes smaller.

The color filter substrate 100 is completed by forming a common electrode layer 150 made of ITO or IZO on the second planarization layer 144.

As described above, according to the present invention, in the planarization film or the common electrode layer of the color filter substrate, which is caused by a hole formed in the reflection area to alleviate the difference in color reproducibility between the reflection area and the transmission area of the color pixel. It can eliminate a large part of the step.

That is, by forming the holes into slit-type sub-holes having a small surface area, the step generated by the holes is reduced, and the sum of the surface areas of the sub-holes is equal to the surface area of the hole before dividing the color reproducibility. The effect of alleviating the difference can be maintained.

Therefore, the cell gap in the liquid crystal layer is guaranteed to some extent, thereby preventing a decrease in polarization efficiency and maintaining white balance.

In this case, a second planarization layer may be formed on the planarization layer to further reduce the step difference, and different thicknesses or areas of the respective color pixels may be formed to prevent white balance collapse due to the difference in visibility and luminance of each pixel. The present invention can also be used for color filter substrates.

Although described above with reference to the embodiments, those skilled in the art can be variously modified and changed within the scope of the invention without departing from the spirit and scope of the invention described in the claims below. I can understand.

Claims (12)

Board; A color pixel formed on the substrate and having a plurality of exposed portions for exposing the substrate in a slit type; And And a planarization layer covering the substrate and the color pixels exposed by the exposed portions. The color filter substrate of claim 1, further comprising a common electrode layer formed on the planarization layer. The color filter substrate of claim 1, wherein the slit shape has a stripe bar shape when viewed in a plan view. The color filter substrate of claim 1, wherein the color pixels include a plurality of color pixels having different thicknesses. The color filter substrate of claim 1, wherein the color pixels include color pixels having different sums of surface areas of exposed portions formed in the color pixels. The method of claim 1, wherein the color pixel has a reflective region for reflecting light and a transmission region for transmitting light, And the exposed portions are formed in the reflective region. Forming a color pixel on the substrate; Forming a plurality of exposed portions in the color pixel exposing the substrate in a slit type; And Forming a planarization film covering the substrate and the color pixels exposed by the exposed portions. The method of claim 7, further comprising forming a common electrode layer on the planarization layer. Array substrates; Liquid crystal layer; And And a color filter substrate formed on a substrate, the color pixel including a plurality of exposed portions for exposing the substrate in a slit type, and receiving the liquid crystal layer through coalescence with the array substrate. The liquid crystal panel of claim 9, wherein the color filter substrate further comprises a planarization layer covering the substrate and the color pixels exposed in the slit form by the exposed portions. The liquid crystal panel of claim 10, wherein the color filter substrate further comprises a common electrode layer formed on the planarization layer. 10. The liquid crystal panel of claim 9, wherein the liquid crystal panel has a reflective region for reflecting light and a transmissive region for transmitting light, and the exposed portions are formed in the reflective region.

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