KR100995581B1 - Color filter substrate, liquid crystal display apparatus having the same and method for manufacturing the same - Google Patents

Abstract

In the color filter substrate, the color filter is formed on the substrate by the color pixels colored in different colors. A hole for exposing the substrate is formed in the color filter, and a planarization film for reducing the step difference between the substrate exposed by the hole and the color filter is formed on the substrate exposed by the hole. The transparent electrode is provided on the color filter and the planarization film. Therefore, the display characteristics of the liquid crystal display device employing such a color filter substrate can be improved.

Description

COLOR FILTER SUBSTRATE, LIQUID CRYSTAL DISPLAY APPARATUS HAVING THE SAME AND METHOD FOR MANUFACTURING THE SAME}

1 is a cross-sectional view showing in detail a color filter substrate according to an embodiment of the present invention.

FIG. 2 is a plan view of the color filter shown in FIG. 1.

3A to 3C are views illustrating a manufacturing process of the color filter substrate illustrated in FIG. 1.

4 is a cross-sectional view illustrating a color filter substrate according to another exemplary embodiment of the present invention.

FIG. 5 is a cross-sectional view of a transflective liquid crystal display device employing the color filter substrate shown in FIG. 1.

<Explanation of symbols for main parts of the drawings>

100: color filter substrate 110: substrate

120: color filter 130, 170: planarization film

140: common electrode 200: array substrate

230: transmission electrode 250: reflection electrode

300: liquid crystal 400: transflective liquid crystal display device

The present invention relates to a color filter substrate, a liquid crystal display device having the same, and a manufacturing method thereof, and more particularly, to a color filter substrate capable of improving display characteristics, a liquid crystal display device having the same, and a manufacturing method thereof.

The transflective liquid crystal display displays an image in a reflection mode using external light where the amount of external light is abundant. Display.

The transflective liquid crystal display device includes a liquid crystal display panel including an array substrate, a color filter substrate facing the array substrate, and a liquid crystal interposed between the array substrate and the color filter substrate.

The array substrate has a transparent electrode and a reflective electrode. Here, the region where the reflective electrode is formed on the transparent electrode is a reflective region, and the region where the reflective electrode is not formed on the transparent electrode is a transmission region. The color filter substrate includes a color filter made of R, G, and B color pixels and a common electrode, and is coupled to face the array substrate.

In the reflective mode of the transflective liquid crystal display, external light passes through a first path, for example, a path sequentially passing through a color filter, a common electrode, a liquid crystal, a reflective electrode, a liquid crystal, a common electrode, and a color filter. On the other hand, in the transmission mode, the internal light passes through a second path, for example, a path sequentially passing through the pixel electrode-liquid crystal-common electrode-color filter.

As described above, since the external light passes through the color filter twice in the reflection mode and the internal light passes through the color filter once in the transmission mode, a difference in color reproducibility occurs in the reflection mode and the transmission mode. The difference in color reproducibility generated between the transmission mode and the reflection mode is a factor that lowers the display characteristics of the liquid crystal display.

Accordingly, it is an object of the present invention to provide a color filter substrate for improving display characteristics.

It is also an object of the present invention to provide a liquid crystal display device having the color filter substrate described above.

In addition, another object of the present invention is to provide a method of manufacturing the color filter substrate.

A color filter substrate according to an aspect of the present invention includes a substrate including a first region and a second region adjacent to the first region, and a plurality of color pixels, each of which is colored in different colors and has holes for exposing the substrate. A color filter, a flattening film provided on the substrate exposed by the hole to reduce a step between the substrate and the color filter exposed by the hole, and a transparent electrode provided on the color filter and the flattening film It includes.                     

According to another aspect of the present invention, an LCD device includes an array substrate including a pixel electrode on a first substrate, a color filter substrate coupled to the array substrate, and a liquid crystal layer interposed between the array substrate and the color filter substrate. Is done.

The color filter substrate is provided on a second substrate, a color filter having a plurality of color pixels formed in different colors and having holes for exposing the second substrate, and provided on the second substrate exposed by the holes. And a flattening film to reduce a step between the second substrate and the color filter exposed by the hole, and a common electrode provided on the color filter and the flattening film.

According to another aspect of the present invention, a method of manufacturing a color filter substrate that combines an array substrate and a liquid crystal layer defined between a reflective region and a transmissive region, includes a color filter comprising a plurality of color pixels colored in different colors. Forming a hole on the color filter by patterning the color filter to expose a portion of the substrate in correspondence with the reflective area; and insulating layers on the substrate and the color filter exposed by the hole. And forming a planarization film on the substrate exposed by the hole by patterning the insulating film, and forming a transparent electrode provided on the color filter and the planarization film.

According to the color filter substrate, the liquid crystal display device having the same, and a manufacturing method thereof, display characteristics of the liquid crystal display device employing the color filter substrate are reduced by reducing the difference in color reproducibility generated between the first region and the second region. Can be improved. In addition, the flattening film can maintain the cell gap of the liquid crystal display device uniformly by removing the step difference generated between the substrate exposed by the hole and the color filter.

Hereinafter, with reference to the accompanying drawings, it will be described in detail a preferred embodiment of the present invention.

1 is a cross-sectional view showing in detail a color filter substrate according to an embodiment of the present invention, Figure 2 is a plan view of the color filter shown in FIG.

1 and 2, a color filter substrate 100 according to an embodiment of the present invention includes a color filter 120, a planarization layer 130, and a common electrode 140 on a substrate 110. . The color filter substrate 100 is divided into a first area A1 and a second area A2 adjacent to the first area A1.

First light passing through the common electrode 140, the color filter 120, and the substrate 110 is sequentially supplied to the first region A1, and the substrate 110 is supplied to the second region A2. The second light passing sequentially through the color filter 120, the common electrode 140, the color filter 120, and the substrate 110 is supplied. Accordingly, the first light passes through the color filter 120 once in the first area A1, and the second light passes through the color filter 120 twice in the second area A2. .

The color filter 120 is composed of an R (Red) pixel colored in red, a G (Green) pixel colored in green, and a B (Blue) pixel colored in blue. Each of the R, G, and B color pixels has a hole 121 exposing the substrate 110 in the second area A2. 1 and 2 illustrate a structure in which one hole 121 is provided in each of the R, G, and B pixels, but a plurality of holes may be provided in each of the R, G, and B pixels.

The planarization layer 130 is formed on the substrate 110 exposed by the hole 121. The planarization layer 130 is formed of a photosensitive organic insulating layer such as acrylic resin (acrylic resin) and is stacked to substantially the same height as the color filter 120. Accordingly, the planarization layer 130 removes a step between the substrate 110 exposed by the hole 121 and the color filter 120 adjacent to the hole 121.

Thereafter, the common electrode 140 is formed on the color filter 120 and the planarization layer 130. The common electrode 140 is made of indium tin oxide (ITO) or indium zinc oxide (IZO), which is a transparent conductive material.

3A to 3C are views illustrating a manufacturing process of the color filter substrate illustrated in FIG. 1.

Referring to FIG. 3A, a color filter 120 including R (red), G (Green), and B (Blue) color pixels is formed on the substrate 110. Holes 121 are formed in the R, G, and B color pixels to expose the substrate 110. Therefore, a part of the R, G, and B color pixels formed in the second area A2 is removed by the hole 121.

As shown in FIG. 3B, an organic insulating layer 150 is formed on the substrate 110 exposed by the color filter 120 and the hole 121 at a predetermined thickness. The surface of the organic insulating layer 150 has a non-uniform surface structure due to the step between the color filter 120 and the substrate 110.                     

3C, a mask 160 having a pattern corresponding to the planarization layer 130 is disposed on the organic insulating layer 150. After performing the exposure process of exposing the organic insulating layer 150 with the mask 160 disposed, and then developing the exposed organic insulating layer 150, the hole 121 is formed on the substrate 110. Correspondingly, the planarization layer 130 is formed.

1, the common electrode 140 is formed on the color filter 120 and the planarization layer 130.

4 is a cross-sectional view illustrating a color filter substrate according to another exemplary embodiment of the present invention. In FIG. 4, the same reference numerals are used for the same components as those illustrated in FIG. 1, and detailed description thereof will be omitted.

Referring to FIG. 4, in the color filter substrate 100 according to another exemplary embodiment of the present invention, the color filter 120 is formed of R, G, and B color pixels, and the substrate 110 is exposed to each color pixel. The hole 121 to be formed.

The planarization layer 170 is stacked on the substrate 110 exposed by the hole 171. The planarization layer 170 is made of an inorganic insulating layer such as silicon nitride layer (SiNx) or silicon oxide layer (SiOx). The thickness of the planarization film 170 made of the inorganic insulating film is smaller than the thickness of the color filter 120, so that a step occurs between the planarization film 170 and the color filter 120. However, the step between the planarization film 170 and the color filter 120 is smaller than the step between the color filter 120 and the substrate 110. Therefore, the color filter substrate 100 has a step that is relaxed by the planarization film 170.

1 to 4, one or more holes are formed in the R, G, and B color pixels to adjust the difference in color reproducibility between the first and second regions A1 and A2 and the difference in color visibility of each color pixel. The structure is shown. Although not shown in the drawings, the difference in color reproducibility and color visibility may be overcome by a method of adjusting the thicknesses of the R, G, and B color pixels.

That is, the difference in color reproducibility between the first and second regions A1 and A2 may be overcome by increasing the thickness of each color pixel in the first region A1 rather than the second region A2. . In this case, it is preferable that the planarization film is formed on the second region A2 of each color pixel having a relatively thin thickness. Accordingly, the leveling of the color filter generated between the first and second regions A1 and A2 may be eliminated.

FIG. 5 is a cross-sectional view of a transflective liquid crystal display device employing the color filter substrate shown in FIG. 1.

Referring to FIG. 5, the transflective liquid crystal display device 400 includes an array substrate 200, a color filter substrate 100 provided to face the array substrate 200, and the array substrate 200 and the color filter substrate. It consists of the liquid crystal 300 interposed between 100 and.

The array substrate 200 includes an organic insulating layer 230, a transmission electrode 240, and a reflection electrode 250 on the first substrate 210, and is divided into a reflection area RA and a transmission area TA. . A plurality of TFTs (not shown) is provided on the first substrate 210. The organic insulating layer 230 is made of a photosensitive material such as acrylic resin.                     

The organic insulating layer 230 covers the plurality of TFTs and is opened to expose the first substrate 210 in correspondence with the transmission area TA. In addition, a plurality of irregularities 233 are provided on the surface of the organic insulating layer 230 corresponding to the reflective region RA. That is, the organic insulating layer 230 has a plurality of concave-convex portions 233 formed of a relatively thick convex portion 233a and a relatively thin concave portion 233b.

The transmissive electrode 240 made of ITO or IZO is formed on the first substrate 210 opened with the organic insulating layer 230 to have a uniform thickness. Thereafter, the reflective electrode 250 having a transmission window 251 for exposing a portion of the transmission electrode 240 over the transmission electrode 240 is formed to have a uniform thickness. The transmission window 251 is formed corresponding to the transmission area TA.

Therefore, the transflective liquid crystal display 400 has a different cell gap in the reflective area RA and the transparent area TA. That is, the cell gap in the transmission area TA is about twice as large as the cell gap in the reflection area RA.

Here, the sal gap in the reflective area RA is a distance between the common electrode 140 of the color filter substrate 100 and the reflective electrode 250 of the array substrate 200, and the transmission area TA. The cell gap at is a distance between the common electrode 140 and the transparent electrode 240.

In this case, the reflective electrode 250 may have a single layer made of aluminum-neodymium (AlNd) or a double layer structure in which aluminum-neodymium (AlNd) and molybdenum tungsten (MoW) are sequentially stacked.                     

Although not shown, a contact hole (not shown) for exposing the drain electrode of the TFT may be formed in the organic insulating layer 230. When the contact hole is formed in the organic insulating layer 230, the transmission electrode 240 and the reflection electrode 250 are electrically connected to the drain electrode of the TFT through the contact hole.

In the reflective area RA, the external light L1 incident through the upper substrate 100 is reflected by the reflective electrode 250 and then emitted to the outside through the color filter substrate 100 to display an image. do. Meanwhile, in the transmission area TA, an image is displayed by emitting internal light L2 incident from a light source unit (not shown) disposed on the rear surface of the array substrate 200 through the transmission window 251.

The color filter substrate 100 includes a color filter 120, a planarization layer 130, and a common electrode 140 on the second substrate 110.

The color filter 120 is formed of R, G, and B color pixels, and each of the color filters 120 includes a hole 121 exposing the substrate 110 corresponding to the reflection area RA.

The planarization layer 130 is disposed on the substrate 110 exposed by the hole 121 to remove a step between the color filter 120 and the second substrate 110 generated in the reflective region RA. Are stacked. Thus, the liquid crystal display device 400 may have a uniform cell gap.

According to such a color filter substrate, a liquid crystal display device having the same, and a manufacturing method thereof, the color filter includes a plurality of color pixels which are colored with different colors and have holes for exposing the substrate in the reflection area, and the flattening film is formed in the holes. It is formed on the substrate exposed by.

Therefore, the display characteristics of the liquid crystal display device can be improved by reducing the difference in color reproducibility generated between the transmission area and the reflection area. In addition, the flattening film can maintain the cell gap of the liquid crystal display device uniformly by removing the step difference generated between the substrate exposed by the hole and the color filter.

Although described with reference to the embodiments above, those skilled in the art will understand that the present invention can be variously modified and changed without departing from the spirit and scope of the invention as set forth in the claims below. Could be.

Claims (8)

A substrate comprising a transmission region and a reflection region adjacent to the transmission region; A color filter including a plurality of color pixels which are colored in different colors and have holes for exposing the substrate; A planarization film provided on the substrate exposed by the hole to reduce a step between the substrate exposed by the hole and the color filter; And A transparent electrode provided on the color filter and the planarization layer; And the planarization layer is formed in the reflective region except for the transmissive region. The display apparatus of claim 1, wherein first light passing through the transparent electrode and the color filter is sequentially supplied to the transmission area, and second light passing through the color filter, the transparent electrode, and the color filter is sequentially supplied to the reflection area. Color filter substrate, characterized in that supplied. The color filter substrate of claim 2, wherein the hole is formed in a portion of the substrate corresponding to the reflective region. An array substrate including a pixel electrode on a first substrate having a transmission region and a reflection region; A second filter, a color filter having a plurality of color pixels in which colors are colored in different colors and having holes for exposing the second substrate, provided on the second substrate exposed by the holes and exposed by the holes A color filter substrate including a planarization film for reducing a step between the second substrate and the color filter, and a common electrode provided on the color filter and the planarization film; And A liquid crystal layer interposed between the array substrate and the color filter substrate, And the planarization layer is formed in the reflective region except for the transmissive region. The pixel electrode of claim 4, wherein the pixel electrode includes a transmission electrode and a reflection electrode to define the reflection area and the transmission area. And the hole exposes a portion of the second substrate corresponding to the reflective region. In the method for manufacturing a color filter substrate that is bonded to the array substrate and the liquid crystal layer defined between the reflection region and the transmission region, Forming a color filter on the substrate, the color filter comprising a plurality of color pixels colored in different colors; Patterning the color filter to form a hole in the color filter to expose a portion of the substrate corresponding to the reflective area; Forming an insulating film on the substrate and the color filter exposed by the hole; Patterning the insulating film to form a planarization film on the substrate exposed by the hole; And Forming a transparent electrode provided on the color filter and the planarization layer; And the planarization film is formed in the reflective region except for the transmissive region. The method of claim 6, wherein the insulating film is an organic insulating film. The method of claim 6, wherein the insulating film is an inorganic insulating film.

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