KR20040110834A - Color filter substrate for transflective liquid crystal display device and fabrication method of the same - Google Patents

Abstract

PURPOSE: A color filter substrate for a reflection-transmission type LCD(Liquid Crystal Display) and a method for manufacturing the same are provided to prevent color mixture at the boundary between color filters during forming respective color filters, thereby dispensing with a black matrix at the boundary between color filters and then, enhancing an aperture ratio by forming transparent partition walls at the spaces between color filters. CONSTITUTION: A lower substrate is opposite to an upper substrate. A plurality of gate lines and a plurality of data lines cross each other to designate a plurality of pixel cell regions(SP). Each pixel cell region has a transistor(Tr), a transmission region(TA) and a reflection region(RA) surrounding the transmission region. The upper substrate has a plurality of transparent partition walls(174) corresponding to the data lines, wherein the transparent partition wall is wider than the data line. A plurality of red, green and blue color filters are formed between the transparent partition walls. The portions(TH) of the transparent partition wall not overlapping the data lines are used as transparent holes, thereby enhancing brightness of the reflection region.

Description

Color filter substrate for transflective liquid crystal display device and manufacturing method thereof {Color filter substrate for transflective liquid crystal display device and fabrication method of the same}

The present invention relates to a liquid crystal display device, and more particularly, to a method for manufacturing a color filter substrate for a reflective transmissive liquid crystal display device.

Recently, with the rapid development of the information society, the need for a flat panel display having excellent characteristics such as thinning, light weight, and low power consumption has emerged.

Such a flat panel display may be divided according to whether it emits light or not. A light emitting display is one that displays an image by emitting light by itself, and a display is performed by displaying an image using an external light source. It is called a display device. The light emitting display includes a plasma display panel, a field emission display, an electro luminescence display, and the light receiving display includes a liquid crystal display. There is).

Dual liquid crystal display devices are being actively applied to notebooks and desktop monitors because of their excellent resolution, color display, and image quality.

In general, a liquid crystal display device arranges two substrates on which electrodes are formed so that the surfaces on which the two electrodes are formed face each other, injects a liquid crystal between the two substrates, and applies a voltage to the two electrodes to generate an electric field. By moving the liquid crystal molecules to adjust the light transmittance of the device to represent the image.

However, the liquid crystal display device does not emit light as described above, so a separate light source is required.

Therefore, a backlight unit is formed on the rear side of the liquid crystal panel, and light emitted from the backlight unit is incident on the liquid crystal panel to display an image by adjusting the amount of light according to the arrangement of liquid crystals.

Such a liquid crystal display device is called a transmission type liquid crystal display device. Since the liquid crystal display device uses an artificial back light source such as a backlight, a bright image can be realized even in a dark external environment, but power consumption due to the backlight is consumed. There is a big disadvantage.

In order to compensate for the above disadvantages, a reflection type liquid crystal display device has been proposed. The reflection type liquid crystal display device uses less power than the transmission type liquid crystal display device in the form of controlling light transmittance according to the arrangement of liquid crystals by reflecting external natural light or artificial light. In the reflective liquid crystal display, the pixel electrode formed on the lower array substrate is formed of a conductive material that reflects well, and the common electrode formed on the upper color filter substrate is formed of a transparent conductive material to transmit external light. .

However, the above-described reflective liquid crystal display device has an advantage of lowering power consumption, but when the external light is not sufficient, the luminance is lowered and thus cannot be used as a display device.

Accordingly, a reflection transmissive liquid crystal display device has been developed to overcome the above problem.

The transmissive liquid crystal display device compensates for the disadvantage that the luminance is drastically lowered when the external liquid is insufficient in the reflective liquid crystal display device and thus cannot serve as a display device, and the disadvantage that the power consumption is high in the transmissive liquid crystal display device. It is a product that can be selected and used in transmission mode using light and reflection mode using external light.

1 is a cross-sectional view of a general reflective transmissive liquid crystal display device.

As shown, a gate wiring (not shown) including a gate electrode 6 is formed on the transparent substrate 2 in the lower substrate 1, and a gate insulating film 10 is formed thereon. Next, the active layer 13 and the ohmic contact layers 16a and 16b are sequentially formed on the gate insulating film 10 on the gate electrode 6. Source and drain electrodes 23 and 26 are formed on the ohmic contact layers 16a and 16b, and the source and drain electrodes 23 and 26 form a thin film transistor Tr together with the gate electrode 6.

Meanwhile, a data line 20 made of the same material as the source and drain electrodes 23 and 26 is formed on the gate insulating layer 10, and although not shown, the data line 20 is connected to the source electrode 23. have. In addition, the data line 20 crosses the gate line (not shown) to define the pixel SP.

Next, a first passivation layer 30 made of an organic material having a low dielectric constant is formed on the thin film transistor Tr. A reflective plate 40 made of a metal material having good reflectivity is formed on the reflective region RA. A second protective layer 45 made of an inorganic material is formed thereon, and the second protective layer 45 is formed thereon. The pixel electrode 50 which contacts the drain electrode 26 and the drain contact hole 55 of the thin film transistor Tr is formed for each pixel SP.

On the other hand, a black matrix 75 is formed on the inner surface of the transparent substrate 71 on the upper substrate 70, and the red (R), green (G), and blue (B) colors are sequentially below the lower substrate. Repeated color filters 80a, 80b, and 80c are formed, and an overcoat layer 85 and a common electrode 90 made of a transparent conductive material are sequentially formed below the color filters 80a, 80b and 80c. . Here, the color filters 80a, 80b, and 80c have one color corresponding to one pixel electrode 50, and the black matrix 75 partially overlaps the edge of the pixel electrode 50, so that the data wire 20 It is formed at the position corresponding to).

Next, the liquid crystal layer 60 is positioned between the pixel electrode 50 and the common electrode 90, and the voltage of the liquid crystal molecules of the liquid crystal layer 60 is applied to the pixel electrode 50 and the common electrode 90. The arrangement state is changed by the electric field generated between the two electrodes 50, 90.

In the above-described reflective transparent liquid crystal display device, the cell gap d ₁ of the reflecting part RA and the cell gap d ₂ of the transmitting part TA are formed to have almost the same thickness. As a result, the cell efficiency of the reflector RA or the transmissive part TA is not optimized, resulting in problems such as a decrease in transmittance and luminance, and at the same time, a problem of lowering color characteristics when driving in the transmissive mode. When driving in the reflection mode, the external light passes through the color filter layer twice before the incident of the reflection plate and after the reflection of the reflection plate, while in the transmission mode, the light from the lower backlight passes through the color filter layer only once. Therefore, there is a disadvantage that a difference occurs in the color characteristics of the reflection mode and the transmission mode.

In order to solve the above problems, a reflective liquid crystal display device having a double cell gap and a transmission hole has been developed.

2A and 2B are part of a plan view of a transflective liquid crystal display device having a transmissive hole and a double cell gap, and FIG. 3 is a cross-sectional view taken along the line A-A of FIG.

As shown in Figs. 2A and 2B, a plurality of gate wirings 3 are formed in the horizontal direction, and a plurality of data wirings 20 are formed in the vertical direction. The two wires 3 and 20 cross each other to define the pixel SP, and a thin film transistor Tr, which is a switching element, is formed at the intersection of the two wires 3 and 20. Red, green, and blue color filters are formed corresponding to the pixels SP, respectively. Also, a transmissive part TA is formed in the center of one pixel SP, and a reflecting part RA in which a reflector (not shown) is formed around the transmissive part TA is formed. Although not shown in the drawing, the protective layer (not shown) of the transmission part TA is removed from the reflection part RA and the transmission part TA to form a step, thereby forming a cell gap between the reflection part RA and the transmission part TA. Differently formed. In addition, a portion of the color filter is removed from the reflective part RA to form a circular through hole TH. In FIG. 2A, the transmission hole TH from which the color filter is removed is formed on the upper and lower sides of the transmission part TA. In FIG. 2B, the transmission hole TH surrounds the transmission part TA. The structure formed in the whole reflection part RA is shown.

The cross section will be described with reference to FIG. 3, which is a cross-sectional view of the above-mentioned reflection-transmissive liquid crystal display device having a transmissive hole and a double cell gap. In this case, the same reference numerals are given to the same parts as the liquid crystal display shown in FIG. 1, and the descriptions of the same parts are omitted.

First, in the transmissive part TA of the array substrate 1, which is a lower substrate, one protective layer 30 is removed, so that the cell gap d ₄ of the transmissive part TA is twice as large as the cell gap d ₃ of the reflective part RA. It is formed to be. As described above, the liquid crystal display having a structure in which the cell gaps of the transmissive part and the reflecting part are different is changed from the cell mode to the electrically controlled Birefringence mode (ECB mode), and the ECB mode is used. Due to the characteristic, since the transmittance curve is periodically repeated every two times, the cell efficiency of the transmission part TA can be equally obtained as the cell efficiency of the reflection part RA. Therefore, the cell efficiency of both the reflection part RA and the transmission part TA is reduced. It is possible to maximize.

In addition, the black matrix 75 is formed under the transparent substrate 71 in response to the data wiring 20 of the lower array substrate 1 in the color filter substrate 70 which is the upper substrate. 75, red, green, and blue color filters 80a, 80b 80c are formed in the lower portion corresponding to each pixel SP of the array substrate 1, respectively. A portion of the color filter layer corresponding to the reflector RA having the reflector 40 is removed to form a transmission hole TH, and the transmission hole TH is the red, green, and blue color filter layers 80a and 80b. 80c) It is filled with a transparent organic material forming the overcoat layer 85 formed on the lower portion, and the common electrode 90 is formed on the entire surface of the substrate 71 under the overcoat layer 85.

As described above, the circular purity hole TH is formed in the reflecting portion RA, and the color purity of the reflecting portion RA is adjusted to some extent by adjusting the area or adjusting the number of the circular transmitting holes TH. By reducing it to be similar to the transmission unit TH, it is possible to improve the luminance characteristics of the reflection unit (RA).

However, most of the reflection-transmissive structure has a problem of distribution of the reflection part and the transmission part, and has a high opening ratio structure to secure the area of the transmission part and the reflection part of a predetermined area or more.

The aperture ratio is a ratio of a region where light passes through the entire pixel region among the pixel regions defined by the intersection of the data lines and the gate lines. Therefore, the liquid crystal display device having a high aperture ratio refers to a liquid crystal display device having a pixel structure in which an area where light is transmitted is generally 80 or more when the entire pixel area is 100. The reason why the aperture ratio does not become 100 is that a black matrix is formed on the color filter substrate of the portion corresponding to the data wiring or the gate wiring to block an area where the lower or external light is reflected.

As shown in FIG. 4, the black matrix covers the mixed color area MA generated at the boundary of each color when the red, green, and blue color filter layers 80a, 80b, and 80c are formed on the transparent substrate 71. At the same time, the thin film transistor is formed to block abnormally generated light generated by the leakage current in the thin film transistor forming portion. At this time, the width WB of the black matrix should be wider than the mixed color area MA of red, green, and blue. Otherwise, the color characteristics of the black matrix may be reduced due to the mixed color layers 81a and 81b of the boundary of each color. Generate. On the other hand, when the width WB of the black matrix becomes large, the effective area of the pixel becomes small, which causes a problem of sacrificing a predetermined area of the reflecting part or the transmitting part.

The present invention has been made to solve the problems of the prior art as described above, the present invention provides a transparent hole red, green, blue color for improving the brightness of the reflection-transmitting liquid crystal display device and the color characteristics of the reflection portion and the transmission portion An object of the present invention is to prevent color mixing occurring at each color filter boundary by forming the filter at a predetermined interval.

In addition, it is another object to enlarge the opening of the pixel by reducing or not forming the width of the black matrix formed at each color filter boundary.

1 is a cross-sectional view of a conventional general reflective transmissive liquid crystal display device.

2A and 2B are partial plan views of a conventional transflective liquid crystal display device having a transmissive hole and a double cell gap;

3 is a cross-sectional view taken along the line A-A of FIG. 2B.

4 is a cross-sectional view of a color filter substrate for a transflective liquid crystal display device having a conventional transmissive hole.

5 is a plan view of a transflective liquid crystal display device according to an exemplary embodiment of the present invention.

6 is a cross-sectional view of a transflective liquid crystal display device according to an exemplary embodiment of the present invention taken along line B-B of FIG. 5.

7A to 7F are cross-sectional views illustrating a manufacturing process of a color filter substrate for a transflective liquid crystal display device according to an exemplary embodiment of the present invention.

<Description of Symbols for Main Parts of Drawings>

100: liquid crystal display 106: gate electrode

120: data wiring 174: transparent bulkhead

RA: Reflector SP: Pixel

TA: penetrating part TH: penetrating hole

Tr: Thin Film Transistor

In order to achieve the above object, a reflective transmissive liquid crystal display device includes an upper substrate and a lower substrate facing each other; A pixel having a gate line and a data line vertically intersecting on the lower substrate, the pixel having a transmissive portion and a reflecting portion formed to surround the transmissive portion; A plurality of thin film transistors formed at intersections of the two wires; A protective layer covering the thin film transistor and formed on an entire surface of the substrate; A reflection plate formed on the protective layer on the protective layer; A pixel electrode formed on the reflective plate and the protective layer and connected to the thin film transistor; A transparent partition wall having a wider width on a lower surface of the upper substrate facing the pixel electrode of the lower substrate at a predetermined interval to correspond to the data wiring of the lower substrate; A red, green, and blue color filter layer sequentially and repeatedly formed between the transparent partition walls; A common electrode formed under the red, green, and blue color filter layers; It includes a liquid crystal layer interposed between the pixel electrode and the common electrode of the upper and lower substrates.

In this case, the thin film transistor is a thin film transistor having a bottom gate structure having a semiconductor layer made of amorphous silicon or a thin film transistor having a top gate structure having a semiconductor layer made of polysilicon.

In addition, the protective layer is removed from the transmissive part formed at the center of the pixel to form a transmissive part hole having a step with the reflecting part. The transmissive part hole forming the step between the transmissive part and the reflecting part may be formed by the reflecting part pixel electrode of the lower substrate. It is preferable to have a depth equal to the cell gap which is the distance between the common electrodes of the upper substrate.

In addition, a second passivation layer may be further formed between the reflective plate and the pixel electrode.

It is preferable that the reflecting plate is an uneven reflecting plate having a concave or convex structure.

In addition, it is preferable that the transparent partition wall is formed of a negative type photo acryl-based material having a high transmittance in regions other than those corresponding to the data lines.

In addition, the height of the red, green, and blue color filter patterns is preferably formed to be the same as the height of the transparent partition wall.

According to an aspect of the present invention, there is provided a method of manufacturing a color filter substrate for a transflective liquid crystal display device, the method comprising: forming a plurality of transparent barrier ribs having a predetermined width and height on a transparent substrate at regular intervals; Applying a red color filter resist to the entire surface of the substrate on which the transparent partition wall is formed and exposing / developing to form a red color filter layer between any transparent partition wall and the partition wall; Forming a green and blue color filter layer between the partition wall and the partition wall so that red, green, and blue are sequentially repeated in the same manner as the method of forming the red color filter layer of the predetermined pattern; And sequentially forming a common electrode on the front surface of the red, green, and blue color filter layers.

In this case, the transparent partition wall is formed of a negative photo-acrylic material having a high transmittance, the transparent partition wall is formed at a position corresponding to the data wiring of the array substrate facing the width, the width of the data wiring of the array substrate facing It is preferably formed wider than the width.

In addition, the red, green, blue color filter pattern is preferably formed in the same height as the height of the transparent partition wall.

Hereinafter, with reference to the accompanying drawings will be described an embodiment of the present invention;

5 is a plan view of a part of a reflective transmissive liquid crystal display device according to an exemplary embodiment of the present invention.

As shown, the liquid crystal display device 100 according to the embodiment of the present invention is spaced apart at regular intervals and a plurality of gate lines 103 are formed in the horizontal direction, and intersect the gate lines 103 and cross the pixel SP. A plurality of data wires 120 defining a) are formed in the vertical direction. In addition, the thin film transistor Tr, which is a switching element, is formed at the intersection of the two wirings 103 and 120. Corresponding to the plurality of pixels SP formed by the crossing of the two wirings 103 and 120, the red, green, and blue color filters are sequentially repeated. The pixels SP corresponding to the red, green, and blue color filters each have a predetermined area in the center of the pixel SP, and form a transmissive part TA. The reflective part RA surrounds the transmissive part TA. Formed. The reflection part RA is formed with a transmission hole TH having a predetermined interval in parallel with the data line 120 and from which the color filter resin is removed. Since the transmission hole TH is formed in a rectangular shape at the edges of both sides of the pixel SP, the boundary between the data line 120 and the red and green is formed in the pixel of the reflective liquid crystal display having the same resolution. When the sizes of the blue color filter patterns are compared, they are narrower than in the related art.

In each pixel SP, transparent organic materials are formed in the left and right pixel SP regions on the left and right sides of the data lines 120 so that color is formed at predetermined intervals on the left and right sides of the data lines 120. The region where the filter is not formed becomes the through hole TH. In this case, the transmission holes TH on the left and right sides of the data line 103 correspond to the data line 120, and a portion of the transparent partition wall 174 except for the region corresponding to the data line 120 is overlapped with the pixel. It is comprised corresponding to the transmission hole TH.

A cross-sectional structure of a liquid crystal display according to an exemplary embodiment of the present invention will be described with reference to FIG. 6, which is a cross-sectional view taken along the line B-B of FIG. 5.

As illustrated, the array substrate 101 including the thin film transistor Tr, which is a switching element, and the pixel electrode 150 connected to the element, and the color filter layers 180a, 180b (not shown) of red, green, and blue, and the common electrode The liquid crystal layer 160 forms the reflective liquid crystal display device 100 between the color filter substrate 170 having the 190 and the two electrodes 150 and 190 of the two substrates 101 and 170.

First, the lower substrate has a gate wiring (not shown) formed on the transparent substrate 101 including a gate electrode 106 made of a metal material, and a silicon oxide (inorganic insulating material) is formed thereon. A gate insulating layer 110 made of one selected from SiO ₂ ) and silicon nitride (SiNx) is formed on the entire surface of the substrate 101. In addition, an active layer 113 of amorphous silicon is formed on the gate insulating layer 110 and the ohmic contact layers 116a and 116b doped with impurities are formed on the gate electrode 110. 106 and a spaced apart from each other, and source and drain electrodes 123 and 126 made of a metal material are formed on the ohmic contact layers 116a and 116b to form a thin film transistor Tr as a switching element. Doing.

In addition, the data line 120 is formed of the same material as the material forming the source and drain electrodes 123 and 126 spaced apart from the thin film transistor Tr by a predetermined distance on the gate insulating layer 110. Although not shown in the drawing, the source electrode 123 is branched from the data line 120 and connected to each other.

Next, the first passivation layer 130 made of an organic insulating material such as benzocyclobutene (BCB) or photo acryl is formed on the source and drain electrodes 123 and 126 and the data line 120. RA)) and the first protective layer 130 is etched in the transmissive part TA to expose the lower gate insulating layer 110 and form a transmissive part hole 156 having a step with the reflective part RA. Doing. A reflector plate 140 made of a metal material having excellent reflectance is formed on the first passivation layer 130 of the reflector RA, and the reflector plate 140 has a first side of a side of the transmission hole 156 forming a step. It extends to the protective layer 130. In addition, the reflector 140 is partially removed from the reflector RA above the drain electrode 126. Next, a second passivation layer 145 is formed on the reflective plate 140 of the reflective part RA by using one of silicon oxide (SiO ₂ ) or silicon nitride (SiNx), which is an inorganic insulating material, on the entire surface of the substrate 102. .

Next, the first passivation layer 130, the reflector plate 140, and the second passivation layer 145 are removed from the drain electrode 126 of the thin film transistor Tr as the switching element to form the drain contact hole 155. The pixel electrode 150 deposited for each pixel SP is formed on the second passivation layer 145 by using indium tin oxide (ITO) or indium zinc oxide (IZO), which are transparent conductive materials. Formed. The pixel electrode 150 is in contact with the drain electrode 126 through the drain contact hole 155.

Next, the color filter substrate 170, which is an upper substrate, has a transparent negative type overcoat material layer having a high transmittance under the transparent substrate 171 and corresponds to the data wiring 120 of the lower array substrate 101. It has a width wider than that of 120 and forms a transparent partition wall 174. In addition, red, green, and blue color filters 180a, 180b (not shown) between the transparent partitions 174 correspond to the pixels SP on the lower array substrate 101, respectively, and are the same as the transparent partitions 174. It has a height and is formed. A transparent conductive material, indium-tin-oxide (ITO), is deposited on the entire surface of the substrate below the transparent barrier rib 174 and the red, green, and blue color filter layers 180a, 180b, and not shown to form a common electrode 190. Doing.

In this case, the transparent partition wall 174 formed at the boundary of the color filter of each color distinguishes red, green, and blue colors corresponding to each pixel SP, and at the same time, the data line 120 includes a lower data line 120. A portion of the wire 120 overlaps with an end portion thereof, and a portion overlaps with the reflective plate 140 formed in the reflective portion RA. In this case, a portion of the transparent partition 174 formed in the area of the pixel SP on the left side except for the portion corresponding to the data line 120 forms the transmission hole TH. The width of the transmissive hole TH may be adjusted in consideration of color characteristics of the reflective part RA and the transmissive part TA and luminance of the reflective part.

As a modified example of the embodiment of the present invention, the structure of the array substrate as the lower substrate may be formed in various structures other than the structure according to the cross section of FIG. 6.

As an example, the above embodiment shows a thin film transistor having a bottom gate structure using amorphous silicon (a-Si), but a thin film transistor having a top gate structure using poly-Si. It may be formed of a reflective liquid crystal display device structure using an array substrate provided with jitter. In addition, it may have a reflection type liquid crystal display device structure using an array substrate on which a reflection plate of convex or concave and convex-concave structure is formed to increase reflection efficiency.

The reflective liquid crystal display device 100 having the structure as described above corresponds to the data line 120 of the array substrate 101 instead of the black matrix, and instead of the black matrix formed as a transparent high-transmittance overcoat material, the data By forming a transparent barrier rib 174 having a width wider than that of the wiring 120, color mixing between colors is prevented, and a portion of the transparent barrier rib 174 overlapping the pixel SP region is formed as a transmission hole TH. By using it, the brightness | luminance of the reflection part RA was improved and the fall of the color characteristic in the transmission part TA and the reflection part RA was prevented.

Next, a method of manufacturing a color filter substrate for a reflective transmissive liquid crystal display device according to the present invention will be described with reference to the drawings.

7A to 7F are cross-sectional views illustrating manufacturing processes of a color filter substrate for a transflective liquid crystal display device according to an exemplary embodiment of the present invention.

First, as shown in FIG. 7A, a photoacryl having a high transmittance on the transparent substrate 171 and a transparent overcoat material, for example, photosensitive properties, and a negative type photo acryl is coated on the entire surface of the substrate 171. An acrylic layer 173 is formed.

Next, as shown in FIG. 7B, a mask 197 having a transmissive area T and a blocking area B is positioned on the photoacrylic layer 173 coated on the front surface, and exposed and developed to expose a predetermined distance from each other. And a transparent partition 174 having a constant width.

Next, as shown in FIG. 7C, a red resist is applied to the entire surface of the substrate 171 on which the transparent barrier rib 174 is formed to be equal to the height of the transparent barrier rib 174 to apply the red color resist layer 179a. The mask 197 having the transmission region T and the blocking region B is positioned thereon, and then exposed to light such as ultraviolet (UV) light.

Next, as shown in FIG. 7D, the light-colored red color resist layer (179a in FIG. 7C) remains on the substrate 171 when developed after exposure to develop a chemical change, and the mask 197 is blocked. The light is blocked in the area T and the unexposed part is removed. Therefore, the red color filter pattern 180a is formed on the substrate 171.

Next, as shown in FIG. 7E, the green color resist is deposited on the substrate 171 on which the red color filter pattern 180a is formed in the same manner as the red color filter pattern 180a is formed on the substrate 171. Apply, and place a transparent portion (not shown) of the mask (not shown) on the portion where the green color filter pattern 180b is to be formed, and then expose and develop the green color filter pattern 180b to form a blue color filter. The pattern 180c is also formed in the same manner.

Next, as shown in FIG. 7F, indium tin oxide (ITO) or indium zinc is a transparent conductive material on the substrate 171 on which the red, green, and blue color filter patterns 180a, 180b, and 180c are formed. A common electrode 190 is formed by depositing oxide (IZO).

The color filter substrate 170 formed as described above forms a transparent partition 174 between each of the red, green, and blue color filter patterns 180a, 180b, and 180c, thereby forming each color filter pattern 180a, 180b, and 180c. When forming, it is possible to prevent mixed color occurring at the boundary of each pattern. In addition, the phenomenon that the thickness of the color filter pattern at both ends of the pattern becomes thin can be prevented.

In addition, in the transflective liquid crystal display device using the color filter substrate manufactured according to the above-mentioned method, a part of the transparent partition wall except for the portion corresponding to the data wiring on the array substrate, which is the lower substrate, acts as a transmission hole, thereby improving the luminance of the reflecting portion. The color characteristics of the reflection area and the transmission area are improved.

As described above, the reflective transmissive liquid crystal display device using the array substrate and the color filter substrate according to the preferred embodiment of the present invention has the following characteristics.

First, the transmission hole is formed along the data line on the lower array substrate at the boundary of each color in the reflecting portion on the color filter substrate, thereby removing the mixed region formed in the boundary between the colors by acting as the partition wall. There is.

Second, since the mixed color region between each color is removed, there is an effect of improving the aperture ratio of the pixel by not forming a black matrix to prevent light from passing through the mixed color region.

Third, when the color filter pattern is formed by forming the transparent partition wall forming the transmission hole, the thinning at both ends of the color filter pattern is prevented, thereby further improving the color characteristics in the pixel.

Claims (15)

An upper substrate and a lower substrate facing each other; A pixel having a gate line and a data line vertically intersecting on the lower substrate, the pixel having a transmissive portion and a reflecting portion formed to surround the transmissive portion; A plurality of thin film transistors formed at intersections of the two wires; A protective layer covering the thin film transistor and formed on an entire surface of the substrate; A reflection plate formed on the protective layer on the protective layer; A pixel electrode formed on the reflective plate and the protective layer and connected to the thin film transistor; A transparent partition wall having a wider width on a lower surface of the upper substrate facing the pixel electrode of the lower substrate at a predetermined interval to correspond to the data wiring of the lower substrate; A red, green, and blue color filter layer sequentially and repeatedly formed between the transparent partition walls; A common electrode formed under the red, green, and blue color filter layers; Liquid crystal layer interposed between the pixel electrode and the common electrode of the upper and lower substrates Reflective type liquid crystal display device comprising a. The method of claim 1, And the thin film transistor is a thin film transistor having a bottom gate structure having a semiconductor layer made of amorphous silicon. The method of claim 1, And the thin film transistor is a thin film transistor having a top gate structure having a semiconductor layer made of polysilicon. The method of claim 1, And a protective layer formed in the transmissive part formed at the center of the pixel to form a transmissive part hole having a step with the reflecting part. The method of claim 4, wherein The transmissive part hole forming a step between the transmissive part and the reflecting part is formed to have a depth equal to a cell gap, which is a distance between the reflecting part pixel electrode of the lower substrate and the common electrode of the upper substrate. The method of claim 1, And a second passivation layer further formed between the reflective plate and the pixel electrode. The method of claim 1, And the reflecting plate is a concave-convex reflecting plate having a concave or convex structure. The method of claim 1, And the transparent partition wall has a region other than that corresponding to the data line to form a transmission hole. The method of claim 1, And the transparent partition wall is formed of a negative photoelectric material having a high transmittance. The method of claim 1, And a height of the red, green, and blue color filter patterns is the same as that of the transparent partition wall. Forming a plurality of transparent partition walls having a constant width and height on the transparent substrate at regular intervals; Applying a red color filter resist to the entire surface of the substrate on which the transparent partition wall is formed and exposing / developing to form a red color filter layer between any transparent partition wall and the partition wall; Forming a green and blue color filter layer between the partition wall and the partition wall so that red, green, and blue are sequentially repeated in the same manner as the method of forming the red color filter layer of the predetermined pattern; Sequentially forming a common electrode on the front surface of the red, green, and blue color filter layers. Method of manufacturing a color filter substrate for a reflective transmissive liquid crystal display device comprising a. The method of claim 11, The transparent partition wall is a method of manufacturing a color filter substrate for a reflective transmissive liquid crystal display device formed of a negative photoelectric material having a high transmittance. The method of claim 11, And the transparent partition wall is formed at a position corresponding to the data line of the array substrate facing each other. The method of claim 13, And the transparent partition wall is formed to be wider than the width of the data line of the array substrate having opposite widths. The method of claim 11, And the red, green, and blue color filter patterns have a height equal to that of a transparent partition wall.