KR20060057442A - Cleaning device of plasma dispaly panel - Google Patents

Abstract

The present invention relates to a cleaning apparatus for a plasma display panel.

An apparatus for cleaning a plasma display panel according to an embodiment of the present invention is a plate making of a plasma display panel including an electrode formed on a substrate, a dielectric formed to cover the electrode, and a partition wall formed by an etching process on the dielectric. An apparatus, comprising: at least one cleaning means for cleaning a substrate; At least one blocking device disposed between the cleaning means to inject high-pressure air between the cleaning means to block the cleaning means, and to prevent mixing of the cleaning liquid and separation of the cleaning liquid used for the cleaning means. Means; An import unit which performs an operation of injecting the substrate to clean the substrate; A transfer part for supporting and moving the substrate introduced through the loading part; A drying unit configured to dry the substrate transferred from the cleaning unit by the transfer unit; A carrying-out unit which performs an operation of carrying out the substrate transferred from the drying unit by the transfer unit; And a main control means for controlling the carry-in portion, the transfer portion, the plurality of cleaning means, the drying portion and the carry-out portion.

Description

Cleaning device for plasma display panel {CLEANING DEVICE OF PLASMA DISPALY PANEL}             

1 is a block diagram schematically illustrating an apparatus for cleaning a plasma display panel according to an exemplary embodiment of the present invention.

2 is a block diagram showing the cleaning means according to an embodiment of the present invention.

<Description of the symbols for the main parts of the drawings>

110: main control unit 111: sensing means

112: control means 120: carry-in part

130: transfer unit 140: cleaning unit

141: first unit cleaning means 142: second unit cleaning means

143: blocking means 150: drying unit

160: carrying out

The present invention relates to a plasma display panel, and more particularly to a cleaning apparatus for cleaning the plasma display panel.

In the initial stage of manufacturing the plasma display panel backplane, an initial substrate cleaning is performed to remove organic foreign matter, inorganic foreign matter, debris, and the like on the substrate.

However, the cleaning apparatus for cleaning the substrate for forming the conventional partition wall is not suitable for the plasma display panel backplane manufacturing method for forming the partition wall by the etching method in the degree of cleaning thereof.

Specifically, the pastes of the plasma display panel forming the partition walls by the etching method should have corrosion resistance as the electrode paste for the etching method and the dielectric paste for the etching method, and the chemical etching may be selectively performed as the partition paste for the etching method. .

Therefore, when printing with an etching method paste on a substrate cleaned with another cleaning device, there is a problem that the cleaning degree of the cleaned substrate is low, resulting in poor print quality and poor after the partition wall firing.

Therefore, the object of the present invention is irrespective of the manufacturing method of the plasma display panel

It is an object of the present invention to provide a plasma display cleaning apparatus which prevents a cleaning failure of a substrate from occurring.

In order to achieve the above object, a cleaning apparatus of a plasma display panel according to an embodiment of the present invention includes an electrode formed on a substrate, a dielectric formed to cover the electrode, and a partition wall formed by an etching process on the dielectric. An apparatus for manufacturing a plate of a plasma display panel, comprising: at least one cleaning means for cleaning a substrate; At least one blocking device disposed between the cleaning means to inject high-pressure air between the cleaning means to block the cleaning means, and to prevent mixing of the cleaning liquid and separation of the cleaning liquid used for the cleaning means. Means; An import unit which performs an operation of injecting the substrate to clean the substrate; A transfer part for supporting and moving the substrate introduced through the loading part; A drying unit configured to dry the substrate transferred from the cleaning unit by the transfer unit; A carrying-out unit which performs an operation of carrying out the substrate transferred from the drying unit by the transfer unit; And a main control means for controlling the carry-in portion, the transfer portion, the plurality of cleaning means, the drying portion, and the carry-out portion.

Hereinafter, a cleaning apparatus for a plasma display panel back plate according to the present invention will be described in detail with reference to FIGS. 1 and 2.

A plasma display panel according to an exemplary embodiment of the present invention is a device for displaying a screen by forming a discharge space between a front glass substrate and a rear glass substrate and causing plasma discharge between electrodes to emit light to excite phosphors present around the screen. . Here, a partition wall is formed to distinguish the discharge space and the discharge space for uniformly controlling the diffusion of the plasma discharge at the target position only in a predetermined region.

1 is a block diagram schematically showing a cleaning apparatus for a plasma display panel back plate according to the present invention.

Referring to FIG. 1, the plasma display panel cleaning apparatus 100 according to the present invention includes a main control unit 110, an import unit 120, a transfer unit 130, a cleaning unit 140, and a drying unit ( 150 and the carrying out portion 160.

First, the main control unit 110 is provided in each of the constituent means of the cleaning unit 140, the drying unit 150 and the carrying out unit 160, respectively, the sensing means 111 for recognizing whether or not the unit process processing in these And control means 112 for outputting a control signal to each component to perform the next operation using the information recognized by the sensing means 111 and operating them. Here, the main controller 110 loads the substrate to be cleaned in the carrying-in unit 120, and then recognizes the stacking information by the control unit 112 when it is recognized by the sensor unit 111. Is operated to transfer the substrate to the cleaning unit 140.

The loading unit 120 performs an operation of injecting the substrate into the cleaning unit 140 to remove foreign substances in the substrate.

The transfer unit 130 supports and moves the substrate loaded from the loading unit 120.

The cleaning unit 140 includes a first cleaning means 141 for removing foreign matter from the substrate, a second cleaning means 142 for removing residues left after the cleaning treatment in the first cleaning means 141, and a substrate. It is provided with a blocking means 143 to prevent the different cleaning liquids used to clean the mixture and to prevent the separation of the cleaning liquid.

As shown in FIG. 2, the first cleaning means 141 includes a cleaning liquid storage tank for combining the cleaning liquid to a concentration suitable for cleaning the substrate, a cleaning liquid supplying means for supplying the cleaning liquid to inject the cleaning liquid, and foreign substances on the substrate. In order to achieve this, there is provided a spraying means for spraying the washing liquid and a washing liquid draining means for collecting the sprayed washing liquid.

The draining means determines whether or not to reuse the drained washing liquid, and the washing liquid to be reused is circulated to the supply means through a pipe, and the washing liquid not reused is disposed of in the external waste water septic tank.

The first cleaning means 141 is a means for removing foreign matter on the substrate and has a physical form, a chemical means, and a mixture of physical means and chemical means.

Examples of the physical means of the first cleaning means 141 include nozzle spraying and brush pressing operation of the cleaning liquid, high pressure spraying of the cleaning liquid, ultrasonic wet and dry cleaning methods, and the like.

The nozzle spray and the brush press of the cleaning liquid perform a cleaning operation by rotating the at least one brush with the spray of the cleaning liquid through the at least one nozzle to the substrate. As the brush used in this manner, a cylindrical roll brush and a disc-shaped disk brush, and a mixture of a roll brush and a disk brush are used. At this time, the cleaning liquid used may be acid, neutral, alkaline.

The ultrasonic wet cleaning method includes an ultrasonic cleaning liquid tank for storing the cleaning liquid for ultrasonic cleaning, and an ultrasonic oscillator installed in the ultrasonic cleaning liquid tank for generating ultrasonic waves. Ultrasonic wet cleaning means using such a fluid as a vibration medium, in order to separate foreign matter from the substrate, the substrate is placed in an ultrasonic cleaning solution tank equipped with an ultrasonic oscillator, and the vibration generated by the ultrasonic oscillator is used as the cleaning liquid. The foreign material on the board is impacted and separated. Here, the cleaning liquid used for the ultrasonic cleaning may be any fluid capable of transmitting ultrasonic vibrations.

The ultrasonic dry cleaning method includes a cleaner head means having a slit shape at an upper portion and a lower portion of the substrate, a high pressure air injection means at the cleaner head means, a pressure means provided with an ultrasonic generator at an inlet of the air injection means, and the cleaner head means. It is provided with a vacuum head means installed in an adjacent part. Dry ultrasonic cleaning method having such a structure is to shock the vibration generated by the ultrasonic generator to the substrate by the medium of high pressure air to separate the foreign matter on the substrate, and the residue separated from the substrate by the above effect Suction by vacuum pressure to perform the function of removal. In addition, the dry ultrasonic cleaning means may impact the substrate with a high pressure air in place of the ultrasonic wave to separate foreign substances on the substrate.

Chemical means include an ultraviolet irradiation method and a substrate surface treatment method using chemicals. The ultraviolet irradiation method may remove the contamination on the substrate by using ultraviolet rays and make the substrate hydrophilic with water.

The second cleaning means 142 may include physical means including nozzle spraying of the cleaning liquid, high pressure spraying of the cleaning liquid, and the like, in order to remove residues remaining after the cleaning process in the first cleaning means 141, chemical means, physical Mixed forms of means and chemical means are used. Since the second cleaning means 142 is cleaned in the same components and in the same manner as the first cleaning means 141, the description thereof will be omitted.

The blocking means 143 prevents mixing of different cleaning liquids used to clean the substrate and prevents separation of the cleaning liquid used to clean the substrate. Here, in the blocking means 143, the first cleaning means 141 and the first cleaning means 141 are used to prevent the cleaning liquid used for the second cleaning means 142 from mixing with each other and to prevent the cleaning liquid from being separated. And, it may be performed by injecting a high-pressure air to each inlet and outlet of the second cleaning means 142 through the slit-shaped injection port. In addition, by forming an air space between the unit devices, a space between the first cleaning means 141 and the second cleaning means 142 may be prevented from mixing the cleaning liquid.

The drying unit 150 performs an operation of drying the substrate transferred from the cleaning unit 130 by the transfer unit 130. In the drying unit 150, in order to dry the substrate passed through the cleaning unit 140, a slit-type air knife is installed to spray a dry gas having a pressure of 0.1 ~ 20kgf / cm ² . In addition, the drying unit 150 may perform a hot air drying method through a heater, and may dry the cleaning liquid remaining on the substrate by performing a hot air drying method through an air knife and a heater.

The carrying out unit 160 performs an operation of carrying out the substrate transferred from the cleaning unit 130 by the transfer unit 130.

The structure of the plasma display panel cleaning apparatus according to the embodiment of the present invention is cleaned twice while passing through the first cleaning means and the second cleaning means 141 and 142. It is cleaned without residue. The substrate is dried in the drying unit 150 and the cleaning liquid is carried out through the carrying out unit 160 to complete the substrate cleaning. Therefore, various types of organic foreign matters, inorganic foreign matters, and debris on the substrate can be processed in one device, so that future equipment modifications and additional equipment investment can be saved, and product quality and yield are improved. have.

In addition, it can cope with all the various foreign objects of the substrate has the advantage that does not need the precise inspection required when importing the substrate.

As described above, the plasma display panel cleaning apparatus according to the exemplary embodiment of the present invention may remove foreign substances remaining on the substrate regardless of the method of manufacturing the substrate of the plasma display panel. Specifically, the substrates produced by various methods of manufacturing the substrate, for example, the etching method and the like, have different characteristics from the pastes used in the method. Accordingly, conventionally, another cleaning apparatus using a cleaning solution for each characteristic has been required. However, the plasma display panel cleaning apparatus according to the embodiment of the present invention can clean various substrates with the same cleaning apparatus regardless of the method.

Those skilled in the art will appreciate that various changes and modifications can be made without departing from the technical spirit of the present invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification but should be defined by the claims.

Claims (1)

An apparatus for manufacturing a plate of a plasma display panel comprising an electrode formed on a substrate, a dielectric formed to cover the electrode, and a partition wall formed on the dielectric by an etching process. At least one cleaning means for cleaning the substrate; At least one blocking device disposed between the cleaning means to inject high-pressure air between the cleaning means to block the cleaning means, and to prevent mixing of the cleaning liquid and separation of the cleaning liquid used for the cleaning means. Means; An import unit which performs an operation of injecting the substrate to clean the substrate; A transfer part for supporting and moving the substrate introduced through the loading part; A drying unit configured to dry the substrate transferred from the cleaning unit by the transfer unit; A carrying-out unit which performs an operation of carrying out the substrate transferred from the drying unit by the transfer unit; And a main control means for controlling the carry-in portion, the transfer portion, the plurality of cleaning means, and the drying portion and the carry-out portion.

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