KR20060051254A - Substrate plasticity apparatus - Google Patents

Abstract

The substrate small growth value of the present invention includes a firing furnace 20 in which a firing chamber V is formed, an upstream conveying path 12 for transporting the substrate B toward the firing furnace 20, and a firing furnace 20. It has a downstream conveyance path 14 which receives and conveys the board | substrate B with which baking process derived | derived from this is carried out. In the baking furnace 20, the board | substrate storage apparatus 30 provided with the board | substrate storage shelf stage 34 of several steps which receives and hold | maintains the board | substrate B conveyed by the upstream conveyance path 12 sequentially, and this board | substrate The lifting device 40 for raising and lowering the storage device 30 is incorporated. The lifting device 40 sequentially lifts and lowers the substrate storage device 30 so that the substrate storage shelf end 34 on which the substrate B, which has been subjected to the firing process, is stored, is directed to a position facing the downstream transport path 14. It is. Substrate small growth value of the present invention can contribute to reduction of equipment cost and running cost after achieving the efficiency of the firing process of the substrate.

Board firing device, multi-stage

Description

Substrate plasticity apparatus

1 is a partially cutaway perspective view showing a substrate firing apparatus according to a first embodiment of the present invention.

FIG. 2 is a cross-sectional view taken along line A-A of the substrate firing apparatus shown in FIG.

Fig. 3 is a perspective view showing one embodiment of a substrate storage shelf end applied to the substrate firing apparatus of the first embodiment.

Fig. 4 is an explanatory diagram for explaining the operation of the firing furnace in the substrate firing apparatus of the first embodiment, where (A) is a state where the first substrate is loaded into the uppermost substrate storage shelf end, (B) is The board | substrate was carried in all the board | substrate storage shelf stages, (C) the board | substrate which was initially carried out is carried out from the board | substrate storage shelf stage of the highest level, (D) the board | substrate is carried in the empty board | substrate storage shelf stage. In order to make it, the state which the board | substrate storage apparatus raises is respectively shown.

Fig. 5 is a partially cutaway perspective view showing the substrate firing apparatus according to the second embodiment of the present invention.

FIG. 6 is a cross-sectional view taken along line B-B of the substrate firing apparatus shown in FIG.

7 is a perspective view showing the details of the substrate loading / unloading device.

Fig. 8 is an explanatory diagram for explaining the operation of the substrate loading / unloading device in the substrate firing apparatus of the second embodiment, in which (A) is a state in which each arm is positioned in a home position, (B) is a state where the tip side arm is a substrate. Each state is shown.

Fig. 9 is an explanatory diagram for explaining the operation of the substrate loading / unloading device in the substrate firing apparatus according to the second embodiment, in which (A) is the state where the tip arm carries the substrate to the robot chamber, and (B) is the tip side arm. The state which inserted this board | substrate into the board | substrate storage apparatus in a baking furnace is shown, respectively.

Fig. 10 is an explanatory diagram for explaining the operation of the substrate loading / unloading device in the substrate firing apparatus according to the second embodiment, in which (A) is a state in which the substrate B supported by the tip side arm is moved to the substrate storage shelf end, (B ) Shows a state in which the tip arm is pulled out of the firing furnace.

The present invention relates to a substrate firing apparatus for firing a substrate.

Conventionally, as described in Japanese Patent Laid-Open No. 2003-317627, a heat treatment apparatus (substrate baking apparatus) of a substrate is known. The heat treatment apparatus includes a heating furnace which heat-treats the substrate (firing treatment), a conveying rack which is installed in the heating furnace in multiple stages, and can carry the substrate in and out of each stage with respect to the heating furnace, and raises and lowers the heating furnace. It is comprised with the lifting device. The upstream conveyance path and the downstream conveyance path are arrange | positioned at the predetermined height position of the upstream and downstream of a heating furnace.

Such a heat treatment apparatus lifts and lowers a heating furnace by the elevating apparatus, and repeats the operation | movement which accepts a board | substrate into a heating furnace by opposing an empty conveyance rack to an upstream conveyance path, and accommodates a board | substrate in every conveying rack. It is. Since the firing process is completed in order from the substrate first accepted into the heating furnace while the substrate is held in the transport racks of the stages while the heating furnace is lifted, the substrate that has been fired by the lifting device is removed. The conveying rack to hold | maintains is made to carry out in order, facing a downstream conveyance rack.

However, in the heat treatment apparatus of the board | substrate described in the said patent document, the heating furnace must be raised and lowered, Therefore, it is necessary to provide openings and shutters for the board | substrate carrying in and out of each stage in a heating furnace, and the lifting apparatus is large-scale. Inevitably, the installation cost is high, and enormous energy is consumed due to the lifting operation, and the running cost also has a problem that the volume becomes large.

SUMMARY OF THE INVENTION The present invention has been made in view of such a situation, and an object thereof is to provide a substrate firing apparatus capable of contributing to the reduction of equipment cost and running cost after achieving the efficiency of the substrate firing process.

The present invention provides a firing furnace having a space therein and having a substrate carrying in / out portion on a sidewall, an upstream conveying route connected to the substrate carrying in and carrying substrate to the firing furnace, and connected to the substrate carrying out portion. And a downstream conveying path for conveying the substrate after firing downstream, wherein the firing furnace includes a shelf having a plurality of stages for holding the substrate therein, and a lifting mechanism for elevating the shelf for each stage. It is to be done.

According to such a structure, the board | substrate which was hold | maintained sequentially by carrying in from the upstream conveying means to each shelf part provided in the baking furnace is subjected to a sequential baking process by immersing in the baking atmosphere in a baking furnace. The shelf part which holds the board | substrate with which the baking process was completed is moved up and down by the drive of a lifting device, and is opposed to the downstream conveyance means, and the board | substrate hold | maintained by this shelf part is moved to the downstream conveyance means in this state. By changing the height position of the vacant shelf portion and joining the upstream conveying means, it is possible to carry in the substrate conveyed from the upstream side. As a result of the lifting and lowering of the shelf part, it is possible to simultaneously carry out a plurality of firing treatments in the firing furnace while sending the substrate from the upstream conveying means through the firing furnace at the normal conveying speed to the downstream conveying means. Increasing the efficiency and shortening the tact time.

And since the lifting device lifts and lowers only the shelf part, it becomes a simple structure compared with elevating itself by a conventional plasticization furnace, and the cost is reduced by that and compared with the case of elevating itself by a firing furnace. Therefore, the energy cost can be reduced.

The said board | substrate carrying-in / out part has the board | substrate carrying-in part which carries in a board | substrate, and the board | substrate carrying out part which carries out a board | substrate, The said board | substrate carrying-in part and board | substrate carrying part are the opening which has a dimension which a board | substrate can pass, and the opening-closing part which opens and closes this opening. It is desirable to install it.

According to such a structure, since the inside of a baking furnace is sealed by closing an opening by an opening-and-closing part, baking processing can be performed to a board | substrate efficiently.

It is preferable that each end part of the said shelf part provides a some conveyance roller arranged in the board | substrate conveyance direction in the said upstream conveyance path and the said downstream conveyance path, and the drive source which rotates at least 1 of this conveyance roller.

According to such a structure, the board | substrate toward the shelf part from an upstream conveyance means is carried in on a shelf part by rotation of the conveyance roller by the drive of the drive source provided in the shelf part, and a board | substrate is conveyed downstream from a shelf part. Even when carrying out toward a means, the board | substrate on a shelf part is carried out toward the downstream conveying means by rotation of the conveyance roller by drive of a drive source.

Thus, by providing a plurality of conveying rollers for stacking the substrates arranged in the substrate conveying direction in the shelf portion and a drive source for driving the conveying rollers, the substrate is not necessarily provided with a substrate carrying-out apparatus such as a work robot. It is possible to carry in and out with respect to the equipment, and the equipment cost is reduced.

It is more preferable that the said board | substrate carrying part and the said board | substrate carrying part are formed in the upper and lower sides of the said one side wall, and the said upstream conveyance path and the downstream conveyance path are arrange | positioned up and down.

According to such a structure, by providing the upstream conveying means and the downstream conveying means so as to oppose each other up and down, the area for installing the substrate baking apparatus is reduced.

It is provided with the board | substrate receiving means which receives a board | substrate, The said board | substrate receiving means is arrange | positioned between the said upstream conveyance path and the said board | substrate carrying-out part, or between the said downstream conveyance path and the said board | substrate carrying-out part, It is preferable to carry out a board | substrate between the upstream conveyance path and the said shelf part, and between the downstream conveyance path and the said shelf part.

According to such a structure, the board | substrate sent from an upstream conveyance means is moved to a shelf part by the predetermined | prescribed operation | movement of a board | substrate delivery means, and the board | substrate stored in the shelf part is downstream by the predetermined | prescribed operation of a board | substrate delivery means. Since it is moved to the side conveying means, layout restrictions, such as arranging an upstream conveying means and a downstream conveying means on the same plane, can be made as minimum as needed, and the freedom in layout in an apparatus design improves.

As for the said upstream conveyance path and the downstream conveyance path, it is more preferable to arrange | position substantially linearly.

According to such a structure, since the upstream conveyance means and the downstream conveyance means are arrange | positioned substantially linearly, it becomes possible to narrow the operation range of a board | substrate handing means, and after baking the structure of a board | substrate handing means simple, The loading and unloading of the board | substrate to a furnace is performed reliably.

Best Mode for Carrying Out the Invention

Fig. 1 is a partially cutaway perspective view showing the substrate baking apparatus 10 of the first embodiment according to the present invention, and Fig. 2 is a cross-sectional view taken along the line A-A of the substrate baking apparatus 10 shown in Fig. 1. In these figures, the X-X direction is referred to as the width direction and the Y-Y direction as the front-rear direction. In particular, the -X direction is referred to as the left side, the + X direction as the right side, the -Y direction as the front side, and the + Y direction as the rear side.

As shown in Fig. 1 and Fig. 2, the substrate firing apparatus 10 of the first embodiment includes a firing furnace 20 having a long box shape in the vertical direction for performing a predetermined firing process on the substrate B; And a substrate storage device (shelf part) 30 mounted in the firing furnace 20 so as to be liftable, a lifting device 40 for raising and lowering the substrate storage device 30, and a high temperature in the firing furnace 20. A gas supply unit 50 for supplying a non-oxidizing gas (nitrogen gas in the present embodiment), a pretreatment device 60 for performing a predetermined pretreatment on the substrate B before firing in the firing furnace 20, and firing It has a basic structure provided with the post-processing apparatus 70 which performs predetermined | prescribed post-processing to the board | substrate B in which the baking process in the furnace 20 was completed.

The calcining furnace 20 has a bottom plate 21 having a rectangular shape when viewed in plan view, and a pair of side plates 22 arranged in each width portion of the bottom plate 21 in the width direction thereof. And a front plate 23 placed on the front edge of the bottom plate 21, a back plate 24 placed on the back edge of the bottom plate 21, these side plates 22, a front plate 23, and a back plate. A baking chamber (space) V is provided in the box shape which is provided in the shape of the elongate box in the up-down direction, with the ceiling board 25 hypothesized between the upper edge parts of (24). The high temperature non-oxidizing gas G in the gas supply part 50 is introduce | transduced into this baking chamber V, and the baking process is performed to the board | substrate B hold | maintained in the board | substrate storage apparatus 30. FIG.

The gas introduction hole 231 for introducing the non-oxidizing gas G is provided at the bottom of the front plate 23 of the firing furnace 20, and the non-oxidizing gas G is provided at the ceiling plate 25. A lead-out hole 251 for leading is provided, and the non-oxidizing gas G supplied from the gas supply unit 50 is circulated through these gas introduction holes 231 and the lead-out hole 251.

In addition, four corners of the firing chamber V are provided with guide rails 26 extending in an up and down direction made of an angle material, and the four corners of the substrate storage device 30 are moved up and down while the guide rails 26 are guided. It is supposed to be.

In addition, the substrate B from the pretreatment device 60 is placed in the baking chamber V at a position slightly above the central position in the back plate (first side wall) 24 of the firing furnace 20. The carrying-in port (opening, board | substrate carrying-in part) 27 for carrying in into () is provided, and the board | substrate B after the baking process by the board | substrate storage apparatus 30 is placed in the slightly lower position, and the post-processing apparatus 70 is carried out. The carrying out opening (opening, board | substrate carrying out part) 28 for carrying out toward this side is provided.

The substrate storage device 30 includes a rectangular bottom board 31 which is slightly smaller than the bottom plate 21, a top board 32 of the same size as the bottom board 31, these bottom boards 31 and Four struts 33 made of a lumber formed between each corner of the top board 32, and a plurality of stages of substrate storage shelf ends (ends) 34 formed in a state supported by the struts 33. ) Is configured. Each support 33 is abutted on the inside of each of the guide rails 26, whereby the substrate storage device 30 can move up and down while perturbing with the guide rails 26.

In such a substrate storage device 30, the upper and lower dimensions are set to be slightly shorter than half of the internal dimension method between the bottom plate 21 and the ceiling plate 25 of the firing furnace 20, whereby the lowest While the position is in the position, the uppermost substrate storage shelf end 34 faces the exit port 28, and the lowermost substrate storage shelf end 34 corresponds to the entrance port 27 in the state set at the highest value. It is supposed to be. Thereby, the height position of the board | substrate storage apparatus 30 is adjusted, and the board | substrate storage shelf end 34 of all the stages can oppose the carry-in port 27 and the carry-out port 28. As shown in FIG.

3 is a perspective view showing the first embodiment of the substrate storage shelf end 34. As shown in this figure, the board | substrate storage shelf end 34 is a pair of widthwise cross member 341 hypothesized between the support | pillars 33 which mutually opposed each other back and front, and the support | pillar 33 which opposes each other in the width direction ) A plurality of shelf sections (five in this embodiment) arranged on a pitch, such as a pair of longitudinal beams 342 in the front-rear direction at the same height level as the lateral beams 341 and the horizontal heights 341. It is comprised by the conveyance roller 35 and the drive motor (drive source) 36 which drives the said shelf conveyance roller 35 attached to the cross member 341 of one direction.

The shelf conveyance roller 35 is supported by an axis so as to be integrally rotatable concentrically around the roller shaft 351 provided between the pair of lateral complements 341. In addition, in this embodiment, the said drive motor 36 is being fixed to the left side horizontal member 341 in the state corresponding to the shelf conveyance roller 35 of the foremost row, and this drive motor 36 is not shown in figure. The drive shaft is connected to the roller shaft 351 of the shelf conveyance roller 35 of the foremost row concentrically and rotatably integrally. Therefore, the drive rotation of the drive motor 36 is transmitted to the shelf conveyance roller 35 of the foremost row via the drive shaft and the roller shaft 351, whereby the shelf conveyance roller 35 of the foremost row is The roller shaft 351 rotates together.

A gear mechanism 37 is provided between the cross member 341 in one direction (the left member 341 in the present embodiment) and the end surface of the shelf conveying roller 35 to form a drive motor ( The drive rotation of the 36 is transmitted to each shelf conveyance roller 35 other than the foremost heat by the gear mechanism 37. (The shelf conveyance roller 35 of the foremost heat is the gear mechanism 37.) The driving force of the shelf conveyance roller 35 is directly transmitted without passing through).

The gear mechanism 37 is rotatably integrally concentric with the drive gear 371 externally wound so as to be integrally rotatable with the roller shaft 351 of the foremost row, and the roller shaft 351 other than the foremost row, respectively. The idle gear 373 which is formed between the longitudinally driven gear 372, the drive gear 371 and the longitudinal gear 372 neighboring the drive gear 371, and between the various motion gears 372. It is equipped with. Therefore, the drive rotation of the drive motor 36 is transmitted to the various motion gears 372 through the drive gear 371 and the idle gear 373, whereby all the shelf conveyance rollers 35 are in the same direction. It is supposed to turn to all at once.

And when receiving board | substrate B to the board | substrate storage shelf end 34 through the delivery opening 27 (FIG. 2), the drive motor 36 will drive-rotate clockwise in FIG. B is guided to the clockwise rotation of each shelf conveyance roller 35 and carried on the substrate storage shelf end 34, while the substrate B deposited on the substrate storage shelf end 34 is unloaded 28. 2, the drive motor 36 is driven and rotated counterclockwise in FIG. 3, whereby the substrate B on the substrate storage shelf end 34 has its respective half-turn conveying rollers. Induced by the counterclockwise rotation of the 35, it is carried out to the post-processing device 70 through the discharging opening 28.

As shown in Figs. 1 and 2, the hoisting apparatus 40 includes a hoisting motor 41 disposed longitudinally at a lower position of the floor on which the firing furnace 20 is installed, and the drive shaft of the hoisting motor 41 is provided. A spline shaft 42 which is integrally rotatably connected to the 411, a spiral rod 43 which is integrally rotated concentrically with the spline shaft 42, and wound up and down, and the spiral rod 43 The nut member 44 fixed to the lower surface side of the bottom plate 21 of the firing furnace 20 and the lower surface of the bottom board 31 of the substrate storage device 30 so as to be able to attach and fix in the center position. And the cylindrical body 45 which penetrates in the state which the top part of the spiral rod 43 was rubbed in contact with is comprised.

The lifting motor 41 is installed at a position directly below the cylindrical body 45, and the spiral rod 43 passes through the bottom plate 21 in a state of being screwed onto the nut member 44, thereby firing the firing chamber V. It penetrate | invades in and in this state, the top part is penetrated to the cylindrical body 45 so that relative rotation is possible. The spiral rod 43 has a length set substantially in the same manner as the top and bottom external method of the substrate storage device 30, and the spline shaft 42 has a length set slightly longer than the spiral rod 43.

According to this elevating device 40, by rotating the spline shaft 42 around the axis center in the drive of the roller shaft 41, this rotation is transmitted to the spiral rod 43, so that the spiral rod 43 also Rotate around the axis center. Since the spiral rod 43 is attached to the nut member 44, the spiral rod 43 is moved up and down by the rotation, and the lift up and down is transmitted to the substrate storage device 30 through the cylindrical body 45, and the substrate The storage device 30 is moved up and down.

The gas supply unit 50 heats the non-oxidizing gas G such as a gas tank for storing the non-oxidizing gas G and the non-oxidizing gas G from the gas source 51 and heats the non-oxidizing gas in the firing chamber V. The pre-treatment apparatus which supplies the non-oxidizing gas G from the gas source 51 to the calcination gas supply part 52 which supplies G and performs the baking process to the board | substrate B, and the said pre-processing apparatus 60 and the post-processing apparatus 70. The atmosphere gas supply part 53 which makes the inside of the 60 and the after-treatment apparatus 70 into a non-oxidizing gas atmosphere is provided.

The firing gas supply unit 52 includes a first blower blower 522 installed in the heating gas supply pipe 521 piped from the gas source 51 toward the gas introduction hole 231 of the firing furnace 20, The temperature control device 523 provided downstream of the first blower blower 522, the first control valve 524 provided downstream of the temperature control device 523, and the ceiling plate of the firing furnace 20. The gas recovery pipe 525 connected to the heating gas supply pipe 521 between the 1st blower blower 522 and the thermostat 523 in the lead-out hole 251 of 25 is comprised.

The temperature control device 523 adjusts the temperature of the non-oxidizing gas G to a temperature suitable for the firing process of the substrate B. In the present embodiment, the gas source 51 is driven by driving the first air blower 522. The non-oxidizing gas G derived through the heating gas supply pipe 521 is heated to 250 ° C to 350 ° C, which is a temperature suitable for the firing process of the substrate B. The non-oxidizing gas G after the heat treatment is introduced into the firing chamber V of the firing furnace 20 through the first control valve 524, and the air flow thereof is at the substrate storage shelf end 34 at each end of the substrate storage device 30. The substrate B is subjected to a firing process by contacting the substrate B deposited on the substrate B.

In addition, in this embodiment, although the pressure in the baking chamber V is set to normal pressure by adjusting the introduction amount of the non-oxidizing gas G into the baking chamber V by controlling the opening degree of the 1st control valve 524, this invention The firing chamber V is not limited to the normal pressure, and may be set to a positive pressure higher than the normal pressure or to a negative pressure lower than the normal pressure depending on the situation.

The non-oxidizing gas G provided to the baking process of the board | substrate B in the baking chamber V returns to the heating gas supply pipe 521 between the 1st air blower 522 and the thermostat 523 through the gas recovery pipe 525. It is used for circulation.

The atmosphere gas supply unit 53 includes the gas source 51 (the gas source 51 is shared by the sintering gas supply unit 52 and the atmosphere gas supply unit 53), the gas source 51, and the pretreatment. The atmospheric gas supply pipe 531 piped between the apparatus 60 and the after-treatment apparatus 70, and the 2nd air blower 532 provided in place of this atmospheric gas supply pipe 531 are comprised. The non-oxidizing gas G supplied to the pretreatment apparatus 60 and the aftertreatment apparatus 70 is discharged | emitted after making the pretreatment apparatus 60 and the aftertreatment apparatus 70 into a non-oxidizing gas atmosphere.

The pretreatment device 60 has a long upper box 61 in the front and rear direction in which the downstream end (front end) is fixed to the back plate 24 such that the downstream end (front end) faces the entrance opening 27 of the firing furnace 20, The upstream substitution chamber 62, the 1st UV chamber 63, and the 2nd UV chamber 64 which were formed in the floating body 61 in the upstream (front) side sequentially are comprised. In each of the chambers 62, 63, and 64, an upper inner box conveying roller 65 is provided along the substrate conveyance direction. Each of the upper box inner conveyance rollers 65 is synchronously rotated by driving of a conveying motor (not shown). And the upstream conveyance path 12 which conveys board | substrate B toward the baking furnace 20 with the upstream conveyance roller 11 arranged in the back of these upper box inner conveyance roller 65 and the upper box 61 is carried out. Is formed.

The upstream side substitution chamber 62 is for replacing the gas containing oxygen penetrated from the outside with the non-oxidizing gas G from the gas source 51 to make the inside of the pretreatment device 60 a non-oxidizing gas atmosphere. . The upstream wall of the upstream side substitution chamber 62 is provided with an openable shutter (opening / closing portion) 66 axially supported by a rotational material around a predetermined axis for opening and closing the substrate inlet. At the same time, on the boundary wall between the upstream side replacement chamber 62 and the first UV chamber 63, a gate valve (opening and closing portion) 67 having a higher sealing degree than the shutter 66 that opens and closes the substrate passage opening in the up and down motion is provided. It is installed.

Then, the downstream end of the atmosphere gas supply pipe 531 in the state where the substrate valve B is carried in the upstream side replacement chamber 62 with the gate valve 67 at the downstream end closed and the shutter 66 at the upstream end opened. When the 2nd control valve 533 provided is opened, the gas in the upstream substitution chamber 62 is replaced with non-oxidizing gas G. As shown in FIG.

The said 1st UV chamber 63 and the 2nd UV chamber 64 perform the 1st and 2nd ultraviolet irradiation process to the board | substrate B, The ultraviolet lamp 68 is provided in each inside. A substrate passage opening and an inlet opening 27 are provided in the boundary wall between the first UV chamber 63 and the second UV chamber 64 and the back plate 24 at the downstream end of the second UV chamber 64, respectively. Is provided with a shutter 66 for opening and closing. The non-oxidizing gas G in the gas source 51 is also supplied to these 1st and 2nd UV chambers 63 and 64 through the branch pipe branched from the atmospheric gas supply pipe 531, and thereby the 1st and 2nd UV chambers 63 and 64 are supplied. The 2UV chambers 63 and 64 are always in a non-oxidizing gas environment.

Subsequently, the substrate B subjected to the second ultraviolet irradiation treatment in the second UV chamber 64 has a drive rotation and a shelf of the conveyance roller 65 in the upper box in a state where the shutter 66 at the downstream end is opened. It is guide | induced to the drive rotation of the sub conveyance roller 35, and is carried in to the board | substrate storage shelf end 34 of the board | substrate storage apparatus 30. As shown in FIG.

The post-treatment apparatus 70 performs predetermined post-treatment on the substrate B subjected to the sintering treatment in a state where it is placed on the substrate storage shelf end 34 in the firing chamber V of the sintering furnace 20. In the front and rear direction fixed to the back plate 24 so that an upstream end (front end) opposes the outlet 28 of the firing furnace 20 in the position slightly lower of itself 61, The lower case 71 is provided with the 1st cooling chamber 72, the 2nd cooling chamber 73, and the downstream substitution chamber 74 which were formed one by one at the upstream (front) side. In each of these chambers 72, 73, and 74, a lower inner conveying roller 75 is provided along the substrate conveyance direction. Each upper box conveyance roller 75 is made to rotate synchronously by the drive of the conveyance motor which is not shown in figure. And the downstream conveyance path 14 which carries out the board | substrate B toward the next process is formed in the downstream conveyance roller 13 provided in the back of these upper box inner conveyance rollers 75 and the lower box conveyance 71, have.

The said 1st cooling chamber 72 and the 2nd cooling chamber 73 are for performing cooling process with respect to the baking process completed board | substrate B derived from the board | substrate storage front end 34 of the board | substrate storage apparatus 30. Indeed. The cooling plates 76 are fixed to the ceiling surfaces of the cooling chambers 72 and 73, respectively, and the substrate B supported by the conveying roller 75 in the lower box is lifted to contact the cooling plates 76. A substrate lifting mechanism 77 is provided.

The substrate lifting mechanism 77 has a plurality of substrate support pins 771 for supporting the substrate B provided between the plurality of lower box conveyance rollers 75. Subsequently, by raising the substrate support pin 771 by driving the substrate lift mechanism 77, the substrate B is lifted up by the substrate support pin 771, and is in surface contact with the cool plate 76 to cool the substrate. On the other hand, the substrate B is supported by the lower box conveyance roller 75 by lowering the substrate support pin 771 by the reverse driving of the substrate lifting mechanism 77, so that the lower box conveyance roller 75 It can be conveyed by drive.

Each of the cool plates 76 is supplied with a coolant from a cold heat source (not shown), whereby a low temperature for cooling the substrate B can be maintained. The cool plate 76 on the side of the second cooling chamber 73 is lower than the cool plate 76 on the side of the first cooling chamber 72. Therefore, after the primary cooling process is performed in the 1st cooling chamber 72, the board | substrate B carried out in the baking furnace 20 is cooled by 2nd so that it may become lower than this in the 2nd cooling chamber 73. FIG. The treatment is carried out, and thermal breakage of the substrate B is prevented by a sudden temperature change caused by the two-step cooling treatment.

The substrate from the firing furnace 20 is provided on the boundary wall between the back plate 24 of the firing furnace 20 and the first and second cooling chambers 72 and 73 facing the upstream end of the first cooling chamber 72. A discharge outlet 28 for carrying out B and a shutter (opening and closing portion) 78 for opening and closing the passage opening for passing the substrate are respectively provided. This shutter 78 has the same structure as the shutter 66 provided in the preprocessing apparatus 60.

On the other hand, in the boundary wall partitioning between the 2nd cooling chamber 73 and the downstream substitution chamber 74, the gate valve (opening-and-closing part) 79 for opening and closing the board | substrate passing opening provided in the said boundary wall is provided, have. This gate valve 79 has the same structure as the gate valve 67 provided in the pretreatment apparatus 60, and has high airtightness. Therefore, each gate valve 67 and 79 is closed, and the 1st UV chamber 63, the 2nd UV chamber 64, the baking chamber V, the 1st cooling chamber 72, and the 2nd cooling chamber 73 are carried out. In the above, highly sealed spaces for substrate firing including pretreatment and posttreatment are formed.

The said downstream substitution chamber 74 is for replacing the atmosphere containing oxygen which penetrates from the outside when carrying out the board | substrate B out of the system with non-oxidizing gas G. As shown in FIG. On the downstream end wall of such a downstream substitution chamber 74, the shutter 78 for opening and closing the board | substrate export opening formed in this downstream end wall is provided. Then, after the substrate B is loaded into the downstream substitution chamber 74 by the opening of the gate valve 79, the gate valve 79 is closed. In this state, the shutter 78 is opened and the substrate B is taken out of the system. At this time, the outside air containing oxygen invades the downstream substitution chamber 74 and becomes the atmosphere environment in which the inside of the downstream substitution chamber 74 contains oxygen. The atmosphere in the downstream substitution chamber 74 is replaced by the non-oxidizing gas atmosphere by the substitution with the non-oxidizing gas G after the shutter 78 is closed.

FIG. 4 is an explanatory diagram for explaining the operation of the firing furnace 20 in the substrate firing apparatus 10 of the first embodiment, and (A) shows that the first substrate B has the highest substrate storage shelf end ( The state which is carried in 34, (B) is the state which board | substrate B was carried in to all the board | substrate storage shelf stages 34, (C), The board | substrate B initially carried in the board | substrate storage shelf stage 34 of the highest level is shown. The state which is carried out from (D) has shown the state which the board | substrate storage apparatus 30 raises, respectively, in order to carry in the board | substrate B to the board | substrate storage shelf end 34 which became empty.

First, the operation of the substrate firing apparatus 10 starts with the substrate so that the substrate storage shelf end 34 at the uppermost stage is opposed to the second UV chamber 64 of the pretreatment apparatus 60 by driving the lifting motor 41. The height level of the storage device 30 is set. In this state, the shutter 66 at the downstream end of the second UV chamber 64 is opened, and at the same time, the conveying roller 65 in the upper box is driven, and the drive motor of the uppermost substrate storage shelf end 34. 36 is driven and the shelf conveyance roller 35 is rotated. Thereby, the board | substrate B in the 2nd UV chamber 64 is carried in on the board | substrate storage shelf end 34 through the carrying in opening 27 as shown to FIG. 4 (A). When the carry-in of the board | substrate B to the board | substrate storage shelf end 34 is completed, the drive motor 36 will be stopped and thereby the board | substrate B will be hold | maintained in the board | substrate storage shelf end 34 of the uppermost. .

Then, the substrate storage device 30 is raised by only one pitch by the rotation about the axis center of the spiral rod 43 through the spline shaft 42 driven by the lifting motor 41, and then the second time. Subsequently, the next substrate B is loaded into the substrate storage shelf end 34 of the substrate, and the above operations are repeated. As shown in FIG. 4B, the substrate B is placed on all the substrate storage shelf ends 34. It is loaded.

In this embodiment, the lifting motor 41 completes the firing process of the substrate B first loaded at the time when the substrate B is loaded on all the substrate storage shelf stages 34 (that is, one cycle has elapsed). Since the drive is set in time so that the baking process of the board | substrate B of the uppermost stage is completed, when the board | substrate B is carried in to the board | substrate storage shelf end 34 of the lowest stage.

In this state, the substrate storage device 30 is lowered by the driving of the lifting motor 41, and as shown in FIG. 4C, the uppermost substrate storage shelf end 34 is connected to the outlet 28. In this state, the substrate B is carried out toward the first cooling chamber 72 through the released shutter 78. As a result, the uppermost substrate storage shelf end 34 becomes empty.

Subsequently, in order to carry in the board | substrate B to the uppermost board | substrate storage shelf end 34 which became empty, the board | substrate storage apparatus 30 is raised by the drive of the lifting motor 41, and, as a result, FIG. As shown in D), the board | substrate storage shelf end 34 of the uppermost stage opposes the delivery opening 27. As shown to FIG. In this state, the board | substrate B in the 2nd UV chamber 64 is carried in the board | substrate storage shelf end 34 of the uppermost stage, and the carrying in / out operation with respect to the board | substrate storage shelf end 34 of this board | substrate B is the 2nd board | substrate from the top. The board | substrate B which is repeated with the storage shelf end 34 and the 3rd board | substrate storage shelf end 34 sequentially, and is thereby supplied to the baking furnace 20 from the preprocessing apparatus 60 in the baking furnace 20 The sintering treatment is successively performed in order to be carried out to the post-treatment apparatus 70 sequentially from the finished one.

As described above, in the substrate firing apparatus 10 according to the first embodiment, the firing furnace 20 in which the firing chamber V is formed therein and the substrate B is conveyed toward the firing furnace 20. It has an upstream conveyance path 12 and the downstream conveyance path 14 which receives and conveys the baking process board | substrate B derived | emitted from the baking furnace 20, and the baking furnace 20 has an upstream conveyance path 12 A substrate storage device (30) having a plurality of stages of substrate storage shelf stages (34) which sequentially receive and hold the substrate B conveyed by the above), and an elevating device (40) for elevating the substrate storage device (30). And the lifting device 40 includes a substrate storage device 30 for directing the substrate storage shelf end 34 on which the substrate B, which has been fired, is stored, to face the downstream conveying path 14. It is supposed to elevate) sequentially.

Therefore, the board | substrate B which is hold | maintained sequentially by carrying in from the upstream conveyance path 12 to each board | substrate storage shelf end 34 of the board | substrate storage apparatus 30 installed in the baking furnace 20 is the baking furnace 20 The sequential firing treatment is performed by being soaked in the firing atmosphere in the tank). As for the board | substrate storage shelf end 34 which hold | maintains the board | substrate B which the baking process completed, the height position is raised by the elevating of the board | substrate storage apparatus 30 in the baking furnace 20 driven by the elevating apparatus 40. As shown in FIG. It matches with the downstream conveyance path 14, and the board | substrate B hold | maintained at the board | substrate storage shelf end 34 in this state is moved to the downstream conveyance path 14 sequentially. When the substrate B conveyed by the upstream transport path 12 to the empty substrate storage shelf end 34 is sequentially loaded based on the lifting operation of the substrate storage device 30 by the elevator 40, the substrate The baking process in the baking furnace 20 can be performed, sending B from the upstream conveying path 12 through the baking furnace 20 toward the downstream conveying path 14 at a normal conveyance speed, and a board | substrate The firing efficiency of B can be improved.

And since the lifting device 40 raises and lowers only the board | substrate storage apparatus 30 in the baking chamber V of the baking furnace 20, it has a simple structure compared with lifting up the conventional baking furnace 20 itself. This can contribute to the reduction of the equipment cost, and can also contribute to the reduction of the energy cost as compared with the case of raising and lowering the firing furnace 20 itself.

In addition, the board | substrate storage shelf end 34 has the several shelf conveyance roller 35 which accumulates the board | substrate B juxtaposed in the board | substrate conveyance direction, and the drive motor 36 which drives this shelf conveyance roller 35 is provided. Since it is provided, the board | substrate B toward the board | substrate storage shelf end 34 of the board | substrate storage apparatus 30 from the upstream conveyance path 12 is the drive motor 36 provided in the board | substrate storage shelf end 34. It is carried in on the board | substrate storage shelf end 34 by rotation of the shelf conveyance roller 35 by the drive of the board | substrate, and the board | substrate B can be carried out from the board | substrate storage shelf end 34 toward the downstream conveyance path 14. In this case, the substrate B on the substrate storage shelf end 34 is carried out toward the downstream transport path 14 by the rotation of the shelf conveyance roller 35 driven by the drive motor 36.

Thus, the several shelf conveyance roller 35 which accumulates the board | substrate B juxtaposed in the board | substrate conveyance direction to the board | substrate storage shelf end 34, and the drive motor 36 which drive this shelf conveyance roller 35 are provided. By doing so, it is possible to carry in and out the board | substrate B with respect to the board | substrate storage shelf end 34 even if it does not provide the board | substrate carrying out apparatus, such as a working robot especially, and it can contribute to reduction of equipment cost.

Furthermore, since the upstream transport path 12 and the downstream transport path 14 are provided so as to face each other up and down, the site area for installing the substrate firing device 10 is reduced so that the effective use of the site can be achieved. Can be.

FIG. 5 is a partially cutaway perspective view showing the substrate baking apparatus 10 'of the second embodiment according to the present invention, and FIG. 6 is a cross-sectional view taken along the line B-B of the substrate baking apparatus 10' shown in FIG. In these figures, the X-X direction is referred to as the width direction and the Y-Y direction as the front-rear direction. In particular, the -X direction is referred to as the left side, the + X direction as the right side, the -Y direction as the front side, and the + Y direction as the rear side.

As shown in Figs. 5 and 6, the substrate firing apparatus 10 'of the second embodiment is a firing furnace 20 that exhibits a long box shape in the vertical direction for performing a predetermined firing process on the substrate B. As shown in Figs. And a substrate storage device 30 '(FIG. 6) incorporated in the firing furnace 20 so as to be liftable, a lifting device 40 for raising and lowering the substrate storage device 30', and a firing furnace 20. The gas supply part 50 which supplies a high temperature non-oxidizing gas (nitrogen gas in this embodiment), and the preprocessing apparatus 60 which performs predetermined preprocessing to the board | substrate B before baking in the baking furnace 20. ), A post-treatment device 70 for performing a predetermined post-treatment to the substrate B on which the firing treatment in the firing furnace 20 is completed, and the substrate B from the pretreatment device 60 to the substrate storage device 30 '. The basic configuration is provided with a substrate loading / unloading device (substrate receiving means) 80 which is loaded into and out from the substrate storage device 30 'to the post-processing device 70. Have

In the inside of these components which comprise the board | substrate baking apparatus 10 ', the firing furnace 20, the elevating apparatus 40, the gas supply part 50, the pretreatment apparatus 60, and the after-treatment apparatus 70, 1st While the same thing as the embodiment is adopted, the substrate storage device 30 'is slightly different in configuration from that of the first embodiment. In addition, in the second embodiment, the pretreatment device 60 and the post-treatment device 70 are two-layered systems in which the pretreatment device 60 and the post-treatment device 70 face up and down. The apparatus 70 differs from the first embodiment in that the apparatus 70 is disposed in series in the front-rear direction on the same plane by sandwiching the substrate loading / unloading portion 15. Therefore, only the half-day outlet 29 which carries in / out of the board | substrate B is provided in the back plate 24 of the baking furnace 20 instead of the carry-in port 27 and the carry-out port 28 of 1st Embodiment.

As shown in Fig. 6, the substrate storage device 30 'includes four bottom boards 31, a top board 32, and four corners between the boards 31 and 32. It is common to the board | substrate storage apparatus 30 of 1st Embodiment in that it comprises the support | pillar 33 and the some board | substrate storage shelf end 34 supported by pitch such as an up-down direction in these support | pillars 33. Although the board | substrate support pin 38 is installed in each board | substrate storage shelf end 34 instead of the shelf conveyance roller 35, it differs from the board | substrate storage apparatus 30 of 1st Embodiment.

The substrate support pins 38 are placed on the substrate storage shelf end 34 so that the lines forming them form quadrilaterals. Such substrate support pins 38 are set to be considerably smaller than the gap size between the substrate storage shelf ends 34 provided with the length dimension adjacent to each other in the vertical direction, whereby the substrate B has its respective substrate storage shelf ends 34. ) Is supported on the substrate support pin 38 without any interference with the upper substrate storage shelf end 34.

The substrate loading / unloading unit 15 (FIG. 7) is for securing a space in which the substrate loading / unloading device 80 can operate. The downstream end (shear) of the pretreatment device 60 and the post-processing device ( It is established between the upstream end (rear end) of 70, and is speaking toward the firing furnace 20 provided in the right side. Such a board | substrate carrying-in / out part 15 is the bottom plate 151 of the same height level as the bottom part of the pretreatment apparatus 60 and the post-processing apparatus 70, and the left side of the pretreatment apparatus 60 and the post-processing apparatus 70. Between the surface and the left side plate 152 of the surface work, and the part which protrudes to the left side of each right side surface of the preheating apparatus 60 and the aftertreatment apparatus 70, and each side plate 22 of the baking furnace 20, The upper border of the part protruding to the left side of the side plate 22 from the temporary front-rear direction paired temporary plate 153 and the pair of temporary plate 153 upper frame part from the left side plate 152 between. The ceiling plate 154 is provided to the rear plate 24 through the unit.

The relay chamber V1 for relaying the substrate B is formed by a space surrounded by the bottom plate 151, the left side plate 152, the pair of temporary plates 153, and the ceiling plate 154. The relay chamber V1 includes a substrate lift chamber Vll in which a lift mechanism 81 described later for lifting the substrate B carried in from the pretreatment device 60 is incorporated, and the substrate B between the substrate lift chamber V1 and the firing furnace 20. It is distinguished from the robot chamber V12 which is equipped with a robot 85 which will be described later. The boundary plate 155 is provided between the board | substrate lift room V11 and the robot room V12. A gap for passing the substrate B is formed between the boundary plate 155 and the ceiling plate 154.

7 is a detailed perspective view of the substrate loading / unloading device 80. In addition, the direction indication by X and Y in FIG. 7 is the same as that of FIG. As shown in FIG. 7, the substrate loading / unloading device 80 is provided on the left side of the widthwise center portion of the bottom plate 151 of the substrate loading / unloading portion 15 to lift the substrate B ( 81 and the board | substrate B lifted by this lift mechanism 81 are accommodated in the board | substrate storage apparatus 30 'in the baking furnace 20, or the board | substrate B is picked up from the board | substrate storage apparatus 30', and lift mechanism ( The robot (substrate means) 85 which performs the operation to pass to 81 is comprised.

The lift mechanism 81 includes a lift plate 82 that lifts the substrate B carried in the relay chamber V1 from the pretreatment device 60, an eccentric cam mechanism 83 that lifts the lift plate 82, and the eccentricity. The drive mechanism 84 which drives the cam mechanism 83 is comprised. The lift plate 82 has a substantially square shape, and lift pins 821 are placed in four corners to lift the substrate B, respectively. On the other hand, a predetermined number of lift room conveyance rollers 16 are provided between the left side plate 152 and the boundary plate 155 of the substrate loading / unloading portion 15. These lift room conveyance rollers 16 are made to rotate by the drive of the drive motor which is not shown in figure.

And the board | substrate B carried in from the preprocessing apparatus 60 does not interfere with the lift pin 821 by the drive rotation of the lift room conveyance roller 16 in the state in which the lift plate 82 was located in the lower position. The four lift pins 821 lift the board | substrate B in the state which is carried in to the center part of the lift chamber V11, and the lift plate 82 is located in the upper position.

The eccentric cam mechanism 83 includes a pair of front and rear cam shafts 831 arranged between the left side plate 152 and the boundary plate 155 at the lower portion of the lift plate 82 and the cam shafts 831. It consists of two eccentric cams 832 per one camshaft 831 integrally wound. The eccentric cam 832 is formed in a circular shape, and the eccentric position is set so that they are in the same phase. The lift plate 82 is supported by the four eccentric cams 832 in such a manner as to allow vertical movement in the positioning state with respect to the front, rear, left and right directions. Accordingly, by rotating the cam shafts 831 around the center of the shaft, the four eccentric cams 832 rotate around the cam shaft 831 while the eccentric state is synchronized, whereby the lift plate 82 is moved. Ascend and fall between the lower position and the upper position.

The drive mechanism 84 is a lift motor 841 provided on a mount 17 protruding to the left from the front-rear direction center portion of the bottom plate 151 of the substrate loading / unloading portion 15, and this lift. A drive gear 843 concentrically and externally wound on the drive shaft 842 of the motor 841, longitudinal motion gears 844 and respectively longitudinally concentrically wound on the respective camshafts 831, and longitudinal motion gears ( 844 and idle gears 845 respectively opened between the drive gear 843. Therefore, when the lift motor 841 is driven, this driving force is transmitted to the camshaft 831 through the drive shaft 842, the drive gear 843, the idle gear 845, and the longitudinal motion gear 844, and the camshaft 831. The eccentric cam 832 is rotated around the cam shaft 831 by the rotation around the axis center of the shaft, whereby the lift plate 82 supported by the eccentric cam 832 has a lower position and an upper position. Ascend in between.

The robot 85 includes an actuator 851 which is fixedly penetrated from the bottom to the center position of the bottom plate 151 of the robot chamber V12, a rotary motion rod 852 protruding upward from the actuator 851, and A horizontally extending substrate side arm 853 attached to the top of the rotary motion rod 852 and a tip side arm connected to the distal end of the substrate side arm 853 so as to be rotatable around the connecting shaft 855. 854 is provided.

The actuator 851 has a function of rotating the rotary motion rod 852 around the axis center. In addition, the said board | substrate side arm 853 and the tip side arm 854 are mutually connected so that it may extend | stretch and cooperate by the link mechanism (not shown) formed in these inside. The rotational motion of the rotational motion rod 852 and the stretching motion of the arms 853 and 854 indicate the situation of the substrate B carried in the firing chamber V (is the substrate B in the substrate lift chamber V11 transferred to the firing furnace 20)? Or the substrate B in the firing furnace 20 is picked up in advance in the firing chamber V).

8-10 is explanatory drawing for demonstrating the action | movement of the board | substrate carrying-out apparatus 80 in the board | substrate baking apparatus 10 'of 2nd Embodiment, and FIG. 8A shows each arm ( 853 and 854 are in the home position, FIG. 8B shows the state where the tip side arm 854 delivers the substrate B. FIG. 9C shows that the tip side arm 854 moves the substrate B. FIG. 9D shows a state in which the robot chamber V12 is inserted, and a state where the tip arm 854 inserts the substrate B into the substrate storage device 30 'in the firing furnace 20, and FIG. The state in which the substrate B supported by the tip side arm 854 is moved to the substrate storage shelf end 34, and FIG. 10B shows the state in which the tip side arm 854 is pulled out of the firing furnace 20, respectively. It is shown. In addition, in these drawings, "a" shows a top view and "b" shows a side cross-sectional view.

First, in the state shown in FIG. 8A, the substrate B carried into the substrate lift chamber Vll from the pretreatment device 60 by the drive of the lift chamber conveyance roller 16 is lifted by the drive of the lift motor 841. The state of being lifted by the pin 821 is raised. In this state, the actuator 851 is driven so that the rotary motion rod 852 rotates clockwise around the center of the axis, whereby the arms 853 and 854 are as shown in Fig. 8B, Straight to the left, the tip arm 854 enters the substrate B below. Then, the lift motor 841 is driven back, and the board B is lifted (supported) by the tip arm 854 by the lowering of the lift pin 821.

Subsequently, the actuator 851 is driven back, and the substrate B supported by the tip-side arm 854 by the counterclockwise rotation of the rotary motion rod 852 is shown in Fig. 9A. As shown in FIG. 9, the substrate lift chamber Vll is once moved to the robot chamber V12, and the rotation of the rotary motion rod 852 is further continued. As shown in FIG. Is inserted in the upper position of the substrate storage shelf end 34 of the substrate storage device 30 '.

Subsequently, the substrate storage device 30 'is slightly raised upward by the driving of the elevating motor 41 (Fig. 6), whereby the substrate B is the substrate as shown in Fig. 10A. The support pin 38 is in a state of being supported. In this state, the arms 853 and 854 are pulled out of the firing furnace 20 as shown in FIG. 10 (B) by the regular driving of the actuator 851, whereby the substrate storage device of the substrate B. Import to 30 'is complete.

Then, when the corners 853 and 854 are pulled out of the firing furnace 20, the substrate storage shelf end 34 supporting the substrate B having completed the firing process is lifted by the substrate storage device 30 '. The board | substrate B which opposes the carry-in exit 29 of 20, and this baking process is completed is pulled up by the front-end arm 854, and is then driven by the rotational motion rod 852, and the board | substrate lift chamber V11. The board | substrate B pulled out to this board | substrate lift chamber V11 is received by the shelf conveyance roller 35, and is carried out toward the post-processing apparatus 70 by the drive rotation of the shelf conveyance roller 35. As shown in FIG. .

By repeating such a series of operations, the board | substrate B carried in from the pretreatment apparatus 60 to the relay room V1 sequentially is inserted into the sinter kiln 20 by the robot 85, and is baked by the kiln 20 The processed board | substrate B is carried out to robot post-processing apparatus 70 via the relay chamber V1 by the robot 85, and by this, the board | substrate B of 1 board | substrate B in the baking furnace 20 like a conventional complete batch process. After the firing treatment is completed, the firing time is significantly shortened compared with the method of loading the next substrate B into the firing furnace 20, and the workability of the firing process is improved at each stage.

As described above, according to the substrate baking apparatus 10 'of the second embodiment, the substrate B conveyed from the pretreatment apparatus 60 is fired between the pretreatment apparatus 60 and the post-treatment apparatus 70. While carrying in the board | substrate storage shelf end 34 of the board | substrate storage apparatus 30 'built in 20, the board | substrate B which completed the baking process is carried out from the board | substrate storage shelf end 34 to the post-processing apparatus 70. Since the substrate loading / unloading device 80 is provided, the substrate B sent from the pretreatment device 60 is subjected to the substrate storage shelf end 34 by the predetermined operation of the robot 85 of the substrate loading / exporting device 80. At the same time, the substrate B after the completion of the firing process housed in the substrate storage shelf end 34 is transferred to the post-processing device 70 by a predetermined operation of the robot 85. Therefore, layout constraints such as arranging the pretreatment device 60 and the post-treatment device 70 on the same plane can be minimized as necessary, and the degree of freedom in layout in the device design can be improved.

Further, the pretreatment device 60 and the post-treatment device 70 are arranged in a substantially straight line on the same plane and sandwich a predetermined space (substrate lift chamber Vll of the relay room V1) at opposite positions, and are disposed in a firing furnace ( 20 is provided at a position away from the relay chamber V1, and the substrate loading / unloading device 80 is installed in the robot chamber V12. Therefore, after the structure of the substrate loading / unloading device 80 is made simple, the firing furnace 20 It is possible to reliably carry in and out of the substrate B with respect to).

Further, the firing furnace 20 is provided with a carry-in and out port 29 for carrying in and out of the substrate B, and the carry-in and exit 29 has an opening and closing shutter 66 capable of sealing the inside of the firing furnace 20. ), The interior of the firing furnace 20 can be sealed by closing the shutter 66, whereby an efficient firing process can be realized.

This invention is not limited to said embodiment, It also includes the following content.

(1) In the above embodiment, the lifting device 40 includes a spline shaft 42 and a spiral rod 43, but the present invention includes a lifting device including the spiral rod 43. It is not limited to this, For example, you may make it raise and lower the board | substrate storage apparatuses 30 and 30 'by the drive of a cylinder apparatus by hydraulic pressure.

(2) In the above embodiment, the upstream substitution chamber 62, the first UV chamber 63, and the second UV chamber 64 are provided in the pretreatment device 60, and the post-treatment device ( Although the 1st cooling chamber 72, the 2nd cooling chamber 73, and the downstream substitution chamber 74 are provided in 70, in this invention, the pretreatment apparatus 60 and the aftertreatment apparatus 70 are such a thing. It is not limited to being a layout, You may increase or decrease the number of UV chambers and a cooling chamber according to a situation.

(3) In the above embodiment, the firing treatment of the substrate B is performed by introducing a heated non-oxidizing gas G into the firing furnace 20. Instead, the firing process of the firing furnace 20 is carried out, for example. A heating source such as a heating element may be disposed, and the substrate B may be calcined by the heating source, or the heating source and the heated non-oxidizing gas G may be used in combination.

(4) In the above embodiment, the first blower blower 522 and the second blower blower 532 are provided in the heating gas supply pipe 521 and the atmosphere gas supply pipe 531, respectively, from the gas source 51. Although the non-oxidizing gas G is pressurized, when the gas source 51 is a high-pressure gas cylinder, for example, it is derived from the gas source 51 at its own gas pressure, so that the blower blowers 522 and 523 are particularly You do not need to install it.

(5) In the above first embodiment, the substrate storage shelf end 34 has seven stages. In the second embodiment, the substrate storage shelf end 34 has seventeen stages. The number of stages of the storage shelf stage 34 is not limited to 7 or 17 stages, and various stages can be selected according to a situation.

As described above, in the present invention, since the elevating device is configured to elevate only the shelf portion in the substrate firing chamber of the firing furnace, the elevating device can have a simple structure as compared with elevating the firing furnace itself in the conventional firing furnace. In addition to being able to contribute to the reduction of energy consumption, it is also possible to contribute to the reduction of the energy cost as compared with the case of elevating the furnace itself.

Since the opening and closing part which can close the opening provided in the baking furnace in the closed state is provided, the inside of a baking furnace can be sealed by closing this opening part, and efficient baking treatment can be implement | achieved.

By providing a plurality of conveying rollers for stacking the substrates arranged in the substrate conveyance direction in the shelf portion and a drive source for driving the conveying rollers, the substrate is not attached to the shelf portion even without a substrate transporting device such as a work robot. It can carry in and out, and can contribute to reduction of equipment cost.

Since the upstream conveying means and the downstream conveying means can be laid so as to face each other up and down, the site area for installing the substrate firing apparatus can be reduced, thereby making effective use of the site.

Since carrying in and out of the board | substrate part of a board | substrate is performed by the predetermined | prescribed operation | movement of a board | substrate conveying means, layout restrictions, such as arrange | positioning the upstream conveyance means and the downstream conveyance means on the same plane, are minimum required, As a result, the degree of freedom in layout in the construction of the device is improved, and the substrate firing device can be properly disposed in accordance with the local conditions.

Since the upstream conveying means and the downstream conveying means are arranged almost linearly, the operating range of the substrate conveying means can be narrowed, and the structure of the substrate conveying means is simplified, and then the substrate Import and export can be performed reliably.

Claims (6)

A firing furnace having a space therein and having a substrate carrying in / out portion on the sidewall, an upstream conveying passage connected to the substrate carrying in / out portion and conveying a substrate to the firing furnace, and a substrate after firing connected to the substrate carrying in / out portion And a downstream conveying path for conveying the substrate downstream, wherein the firing furnace includes a shelf having a plurality of stages for holding the substrate therein and a lifting mechanism for elevating the shelf for each stage. Device. The method of claim 1, The said board | substrate carrying-in / out part has the board | substrate carrying-in part which carries in a board | substrate, and the board | substrate carrying out part which carries out a board | substrate, The said board | substrate carrying-in part and board | substrate carrying part are the opening which has a dimension which a board | substrate can pass, and the opening-closing part which opens and closes this opening. Substrate firing device, characterized in that to install. The method according to claim 1 or 2, Each end part of the said shelf part is equipped with the some conveyance roller arranged in the board | substrate conveyance direction in the said upstream conveyance path and the said downstream conveyance path, and the drive source which rotates at least 1 of this conveyance roller, It is characterized by the above-mentioned. Substrate firing device. The method of claim 3, wherein And the substrate carrying section and the substrate carrying section are formed above and below the one side wall, and the upstream conveying path and the downstream conveying path are disposed up and down. The method according to claim 1 or 2, The board | substrate receiving means is provided between the said upstream conveyance path and the said board | substrate carrying in / out part, and between the said downstream conveying path and the said board | substrate carrying in-out part, The said board | substrate receiving means is provided, and the said upstream side A substrate firing apparatus, wherein a substrate is passed between a conveying path and the shelf part and between the downstream conveying path and the shelf part. The method of claim 5, The said upstream conveyance path and the said downstream conveyance path are arrange | positioned substantially linearly, The board | substrate baking apparatus characterized by the above-mentioned.

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