KR20050024548A - 유기 전계 발광층 증착용 증착원 - Google Patents
유기 전계 발광층 증착용 증착원 Download PDFInfo
- Publication number
- KR20050024548A KR20050024548A KR1020030061350A KR20030061350A KR20050024548A KR 20050024548 A KR20050024548 A KR 20050024548A KR 1020030061350 A KR1020030061350 A KR 1020030061350A KR 20030061350 A KR20030061350 A KR 20030061350A KR 20050024548 A KR20050024548 A KR 20050024548A
- Authority
- KR
- South Korea
- Prior art keywords
- deposition
- upper member
- deposition source
- vapor
- opening
- Prior art date
Links
- 238000000151 deposition Methods 0.000 title description 48
- 230000008021 deposition Effects 0.000 claims abstract description 60
- 239000000463 material Substances 0.000 claims abstract description 42
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 238000007740 vapor deposition Methods 0.000 claims description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 239000007921 spray Substances 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- 238000009713 electroplating Methods 0.000 claims description 2
- 239000000446 fuel Substances 0.000 claims description 2
- 239000011364 vaporized material Substances 0.000 abstract description 3
- 239000010931 gold Substances 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 3
- 230000008023 solidification Effects 0.000 description 3
- 238000007711 solidification Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (5)
- 인가된 전원에 의하여 가열되어 그 내부에 수용된 증착 재료로 열을 전달, 가열하며, 발생된 재료 증기를 외부로 배출시켜 기판 표면에 증착 재료층을 형성하는 증착원에 있어서,가열 수단이 장착되어 증착 재료로 열을 공급하는 측벽 부재;바닥 부재;재료 증기 배출용 개구가 형성된 상부 부재; 및상기 상부 부재의 저면에 형성된 열전도도가 높은 금속층을 포함하는 증착원.
- 제 1 항에 있어서, 열전도도가 높은 금속층은 Au, Ag 또는 Al으로 이루어진 것을 특징으로 하는 증착원.
- 제 1 항에 있어서, 상기 상부 부재는 티타늄으로 이루어진 것을 특징으로 하는 증착원.
- 제 1 항 또는 제 2 항에 있어서, 열전도도가 높은 금속층의 저면에 Ta 또는 W로 이루어진 금속층을 추가로 형성된 증착원.
- 제 4 항에 있어서, 상기 금속층은 프레임 스프레이 방법, 플라즈마 스프레이 방법 또는 HVOF(high velocity oxygen-fuel)와 같은 열 스프레이 방법 또는 ECM(electro chemical metalizing) 또는 일렉트로 플레이팅 방법을 이용하여 상기 상부 부재의 저면에 코팅한 것을 특징으로 하는 증착원.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030061350A KR100656847B1 (ko) | 2003-09-03 | 2003-09-03 | 유기 전계 발광층 증착용 증착원 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030061350A KR100656847B1 (ko) | 2003-09-03 | 2003-09-03 | 유기 전계 발광층 증착용 증착원 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050024548A true KR20050024548A (ko) | 2005-03-10 |
KR100656847B1 KR100656847B1 (ko) | 2006-12-13 |
Family
ID=37231678
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020030061350A KR100656847B1 (ko) | 2003-09-03 | 2003-09-03 | 유기 전계 발광층 증착용 증착원 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100656847B1 (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20110066814A (ko) * | 2009-12-11 | 2011-06-17 | 엘지디스플레이 주식회사 | 유기전계발광소자 증착용 증착원 |
KR101238001B1 (ko) * | 2005-12-26 | 2013-03-04 | 엘지디스플레이 주식회사 | 증착원 및 그를 장착한 증착 장치 |
-
2003
- 2003-09-03 KR KR1020030061350A patent/KR100656847B1/ko active IP Right Grant
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101238001B1 (ko) * | 2005-12-26 | 2013-03-04 | 엘지디스플레이 주식회사 | 증착원 및 그를 장착한 증착 장치 |
KR20110066814A (ko) * | 2009-12-11 | 2011-06-17 | 엘지디스플레이 주식회사 | 유기전계발광소자 증착용 증착원 |
Also Published As
Publication number | Publication date |
---|---|
KR100656847B1 (ko) | 2006-12-13 |
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