KR20050013552A - Device and method for spectroscopically measuring a gas concentration by determining a single absorption line - Google Patents
Device and method for spectroscopically measuring a gas concentration by determining a single absorption lineInfo
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- KR20050013552A KR20050013552A KR10-2004-7018995A KR20047018995A KR20050013552A KR 20050013552 A KR20050013552 A KR 20050013552A KR 20047018995 A KR20047018995 A KR 20047018995A KR 20050013552 A KR20050013552 A KR 20050013552A
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- 238000000034 method Methods 0.000 title claims abstract description 73
- 238000010521 absorption reaction Methods 0.000 title claims abstract description 9
- 238000005259 measurement Methods 0.000 claims abstract description 30
- 239000007789 gas Substances 0.000 claims description 81
- 238000004140 cleaning Methods 0.000 claims description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- 230000000149 penetrating effect Effects 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 238000004611 spectroscopical analysis Methods 0.000 claims description 6
- 229910010293 ceramic material Inorganic materials 0.000 claims description 2
- 239000004063 acid-resistant material Substances 0.000 claims 1
- 239000003779 heat-resistant material Substances 0.000 claims 1
- 238000001307 laser spectroscopy Methods 0.000 abstract description 5
- 239000000203 mixture Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000012080 ambient air Substances 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000005555 metalworking Methods 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000009628 steelmaking Methods 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/59—Transmissivity
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
- G01N2021/151—Gas blown
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N2021/3129—Determining multicomponents by multiwavelength light
- G01N2021/3133—Determining multicomponents by multiwavelength light with selection of wavelengths before the sample
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- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers
- G01N2021/396—Type of laser source
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
- G01N21/09—Cuvette constructions adapted to resist hostile environments or corrosive or abrasive materials
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/02—Mechanical
- G01N2201/023—Controlling conditions in casing
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Abstract
본 발명은 레이저(2a)의 빔 경로가 공정가스를 함유한 용적(1)을 관통하는, 레이저(2a)를 이용하여 공정가스의 하나 이상의 성분의 농도를 측정하기 위한 장치 및 방법에 관한 것이다. 본 발명은 빔 경로의 일부는 자유롭게 공정가스를 관통하고 일부는 공정가스로부터 차폐되는 것을 특징으로 한다. 자유롭게 공정가스를 관통하는 빔 경로의 부분 만이 측정 구간(4)으로서 표시되어서 레이저 분광법에 따른 농도 측정을 위해서 사용되는데, 상기 측정을 위해서 정확하게 하나의 흡수선이 결정된다.The present invention relates to an apparatus and method for measuring the concentration of one or more components of a process gas using a laser (2a) through which the beam path of the laser (2a) penetrates the volume (1) containing the process gas. The invention is characterized in that part of the beam path is free to pass through the process gas and part is shielded from the process gas. Only the part of the beam path which freely passes through the process gas is marked as the measurement section 4 and used for the concentration measurement according to the laser spectroscopy, where exactly one absorption line is determined.
Description
본 발명은 레이저를 이용하여 공정가스의 하나 이상의 성분의 농도를 측정하기 위한 장치 및 방법에 관한 것으로서, 상기 레이저의 빔 경로는 공정가스를 함유한 용적을 관통한다.The present invention relates to an apparatus and method for measuring the concentration of one or more components of a process gas using a laser, the beam path of the laser penetrating a volume containing the process gas.
레이저 분광법에 따라 레이저를 이용하여 가스 혼합물의 개별 성분들의 농도를 측정하기 위한 방법 및 장치는 공지된 바 있다.Methods and apparatus for measuring the concentration of individual components of a gas mixture using lasers according to laser spectroscopy have been known.
그러나 먼지가 들어간 공정가스(가스 혼합물) 내 성분들의 농도 결정을 위해 레이저 분광법을 사용하는데 있어서 레이저 빔의 흡수 및 반사를 이용한 공지된 방식은 먼지 입자로 인해 한계를 갖게 된다. 예컨대 비교적 큰 관 단면적에 걸쳐서 먼지 부하가 높고 측정 구간이 넓게 주어질 때 측정 구간에서 나타나는 레이저 빔의 세기는 이용가능한 신호가 검파기에 도달하지 못할 정도로 크게 감소된다. 따라서 공지된 방법은 위에 기술한 적용예에는 적합하지 않다.However, the known method using absorption and reflection of the laser beam in the use of laser spectroscopy for the determination of the concentration of components in dusty process gases (gas mixtures) is limited by the dust particles. For example, when the dust load is high over a relatively large pipe cross-sectional area and a wide measuring section is given, the intensity of the laser beam appearing in the measuring section is greatly reduced so that the available signal cannot reach the detector. The known method is therefore not suitable for the applications described above.
위에 기술한 적용예는 먼지로 오염된 (공정) 가스가 대량 발생하는 금속 가공 분야 또는 에너지 획득 및 발전소 기술 분야에서 비교적 자주 나타나는데, 상기 오염된 가스의 조성은 설비 조작자에게 있어서 큰 관심 영역이다.The applications described above are relatively frequent in the field of metalworking or in energy acquisition and power plant technology where large quantities of dust-contaminated (process) gases occur, the composition of which is of great interest to plant operators.
따라서 본 발명의 목적은 레이저 분광법을 이용하여 공정가스의 성분들의 농도를 측정하기 위한 개선된 방법 및 개선된 장치를 제공하는데 있으며, 특히 먼지가 들어간 공정가스의 큰 용적에 대해서도 적합성을 가질 경우에 중요한 의의가 있다.It is therefore an object of the present invention to provide an improved method and improved apparatus for measuring the concentration of constituents of a process gas using laser spectroscopy, which is particularly important when suitable for large volumes of dusty process gases. It is meaningful.
장치에 관련하여 볼 때 상기 목적은 빔 경로가 일부는 공정가스를 자유롭게 관통하고 일부는 공정가스에 의해 차폐되며, 공정가스를 자유롭게 관통하는 빔 경로의 부분 만이 분광법에 따른 측정을 위한 측정 구간으로서 정확하게 하나의 흡수선에 제공됨으로써 달성된다. 이 경우에 상기 측정은 한 영역을 관통하는(스캐닝 방법) 분광법에 따른 측정에 비해서 훨씬 정확도가 높다는 장점을 갖는다. 본 발명에 따르면 소위 싱글 라인 분광법이 사용된다. 따라서 선택된 결정 값으로 고정되거나 고정될 수 있는 파장을 갖는 레이저가 바람직하게 사용되며, 상기 값은 정확하게 지켜지기도 한다. 예컨대 일산화탄소를 결정하기 위해서 정확하게 정해진 파장의 적외선 레이저가 사용된다. 이와는 달리 스캐닝되는 레이저, 즉 사전설정된 시퀀스에 따라 파장 영역을 관통하는(스캐닝되는) 레이저는 본 발명의 목적인 높은 정확도에 부합하지 않는다. 단일 주파수로 고정시킴으로 해서 그 외의 보조수단없이도 연속적인 자동 교정(calibration)이 달성된다. 이와는 달리 스캐닝되는 레이저는 이러한 가스를 이용하여 레이저를 연속 교정하기 위해서 하나 이상의 관련 가스 셀(gas cell)을 필요로 한다.With respect to the device, the above object is that the beam path is partially freely penetrated by the process gas and partly shielded by the process gas, and only a part of the beam path freely penetrating the process gas is accurately measured as a measurement section for spectroscopic measurement. This is accomplished by being provided to one absorption line. In this case, the measurement has the advantage of being much more accurate than the measurement according to spectroscopy that penetrates one area (scanning method). According to the invention so-called single line spectroscopy is used. Therefore, a laser having a wavelength that can be fixed or fixed to a selected crystalline value is preferably used, and the value may be kept correctly. For example, an infrared laser of a precisely defined wavelength is used to determine carbon monoxide. In contrast, lasers that are scanned, i.e. lasers penetrating (scanning) the wavelength region according to a predetermined sequence, do not meet the high accuracy which is the object of the present invention. By fixing at a single frequency, continuous automatic calibration is achieved without any auxiliary means. In contrast, the laser being scanned requires one or more associated gas cells to continuously calibrate the laser using this gas.
바람직하게는 빔 경로의 실드(shield)는 중공체로서 형성된다. 특히 바람직하게는 실드 영역 내에 세정가스를 공급하기 위한 수단이 제공되는데, 상기 수단은실드로부터, 특히 중공체 내부로부터 공정가스를 배출시키기 위해 사용된다. 그러므로 실드 내부에 레이저 빔의 세기가 거의 약화되지 않도록 하는 신선한 가스(그 조성에 관련하여 공지되어 있음)가 존재하며, 상기 신선한 가스는 농도 측정을 위해 중성 상태로 존재하거나 또는 그 조성이 공지되어 있기 때문에 추후에 측정시에 다시 제거될 수 있다. 세정가스로서 예컨대 질소가 매우 적합하다. 또한 불활성 가스도 통상적으로 적합하게 간주된다. 세정가스로서의 가스의 적합성은 특히 공정가스의 어떤 성분에 의해서 농도가 결정되어야만 하는지에 따라 좌우된다.Preferably the shield of the beam path is formed as a hollow body. Particularly preferably there is provided a means for supplying a cleaning gas into the shield area, which means is used to withdraw the process gas from the shield, in particular from inside the hollow body. Therefore, there is a fresh gas (known in relation to its composition) which causes the intensity of the laser beam to hardly decay inside the shield, and the fresh gas is present in a neutral state for concentration measurement or its composition is known. It can then be removed again at a later time. As a cleaning gas, for example, nitrogen is very suitable. Inert gases are also commonly considered suitable. The suitability of the gas as a cleaning gas depends, inter alia, on which component of the process gas the concentration should be determined.
본 발명의 한 바람직한 실시예에서는 실드가 관 형태로 형성된다. 특히 바람직하게는 실드는 수냉식 랜스(lance)로서 형성된다. 이러한 형성에 의해서 본 발명에 따른 농도 측정 장치가 매우 높은 온도를 갖는 공정가스 내에서도 문제없이 사용될 수 있다.In one preferred embodiment of the invention the shield is formed in the form of a tube. Particularly preferably the shield is formed as a water cooled lance. By this formation, the concentration measuring device according to the present invention can be used without problems even in a process gas having a very high temperature.
본 발명의 한 바람직한 실시예에서는 실드가 내열성(heat-resistant) 및/또는 내산성(acid-proof) 재료를 갖는다. 바람직하게는 실드가 세라믹 재료를 갖는다. 이러한 재료들에 의해서 어려운 조건하에서, 예컨대 공정가스 내에 산(acid) 성분이 존재할 경우에도 본 발명에 따른 장치가 쉽게 사용될 수 있다.In one preferred embodiment of the present invention the shield has a heat-resistant and / or acid-proof material. Preferably the shield has a ceramic material. With these materials the device according to the invention can be easily used under difficult conditions, for example even when an acid component is present in the process gas.
본 발명의 한 개선예에 따르면 실드는 레이저의 빔 경로의 시작부 및 레이저 빔이 조준되는 검파기 앞에 배치됨으로써, 측정 구간의 양 측이 실드에 의해 제한된다. 이와 같은 형성은 특히 경우에 따라서 존재하기도 하는 에지 효과(가스 용적의 에지 영역에서 나타나는 효과)가 측정시에 사라진다는 장점을 갖는다. 이와 같이 방해 작용을 하는 에지 효과는 예컨대 유입되는 공정가스에서 발생할 수 있다.According to one refinement of the invention, the shield is placed at the beginning of the beam path of the laser and in front of the detector to which the laser beam is aimed, whereby both sides of the measurement section are limited by the shield. This formation has the advantage that in particular the edge effects which sometimes exist (effects appearing in the edge region of the gas volume) disappear in the measurement. This disturbing edge effect can occur, for example, in the incoming process gas.
방법에 관련하여 볼 때 상기 목적은 빔 경로가 일부는 공정가스를 관통하고 일부는 공정가스에 의해 차폐되며, 단지 공정가스를 자유롭게 관통하는 빔 경로의 일부 만이 측정 구간으로서 표시되어서 레이저를 이용한 분광법에 따른 농도 측정을 위해 사용되며, 상기 측정을 위해서 정확하게 하나의 흡수선이 결정됨으로써 달성된다. 이러한 방법에 의해, 비교적 넓은 측정 구간에 걸쳐서 그리고 먼지가 들어간 또는 다른 방식으로 오염되거나 일반적으로는 입자와 혼합된 공정가스 내에서 높은 정확도의 확실한 측정이 달성된다. 이 경우에 공정가스는 쉽게 높은 온도를 가질 수 있다. 왜냐하면 본 발명에 따른 단일 흡수선의 측정(싱글 라인 분광법)시에 비교적 높은 온도에서 예상되는 수증기의 스펙트럼 띠로 인한 방해 작용이 나타나지 않기 때문이다.In relation to the method, the objective is that the beam path is partially penetrated by the process gas and partly shielded by the process gas, and only a part of the beam path freely penetrating the process gas is marked as the measurement section, so that the laser spectroscopy It is used for measuring the concentration accordingly, and is achieved by determining exactly one absorption line for said measurement. By this method, a high accuracy and reliable measurement is achieved over a relatively wide measurement interval and in process gases which are dusty or otherwise contaminated or generally mixed with particles. In this case the process gas can easily have a high temperature. This is because in the measurement of a single absorption line (single line spectroscopy) according to the present invention, there is no disturbing effect due to the spectral band of water vapor expected at a relatively high temperature.
바람직하게는 실드가 세정가스에 의해 세척된다. 특히 바람직하게는 세정가스로서 질소가 사용된다. 그러므로 바람직하게는 레이저 빔의 세기가 거의 약화되지 않도록 기여하는 신선한 가스(그 조성에 관련하여 공지되어 있음)가 실드 내부에 존재하며, 상기 신선한 가스는 농도 측정을 위해 중성 상태, 즉 질소 화합물의 농도를 측정하는 경우가 아닌 경우에는 아무런 영향도 미치지 않는 상태로 존재한다. 일반적으로 말하면, 세정가스로서의 가스의 적합성은 공정가스의 어떤 성분이 농도를 결정하는지에 따라 좌우된다. 통상적으로 농도 결정이 가스에 의해 좌우되어야 하는 세정가스는 바람직하게 분광법에 있어서 매우 상이하게 선택된다.Preferably the shield is washed with a cleaning gas. Especially preferably nitrogen is used as the cleaning gas. Therefore, preferably a fresh gas (known in relation to its composition) is present inside the shield, which contributes to the strength of the laser beam being almost not weakened, the fresh gas being in a neutral state, i.e. the concentration of the nitrogen compound, for the concentration measurement. If it is not measured, there is no effect. Generally speaking, the suitability of the gas as a cleaning gas depends on which component of the process gas determines the concentration. Typically the cleaning gas whose concentration determination is to be governed by the gas is preferably chosen very differently in spectroscopy.
불활성 가스가 바람직하게 세정가스로서 사용될 수도 있다. 불활성 가스의경우에는 세정가스와 공정가스간의 화학적 반응이 차단될 수 있다는데 특별한 장점이 있다.Inert gas may preferably be used as the cleaning gas. Inert gas has a particular advantage that the chemical reaction between the cleaning gas and the process gas can be blocked.
본 방법의 다른 한 바람직한 실시예에 따르면 주변 공기가 흡수되어서, 세정가스로서 사용된다. 이러한 실시예는 특히 저가의 처리 비용을 발생시킨다는 장점을 제공한다. 그러나 모든 적용예에서 주변 공기의 존재가 바람직한 것은 아니다. 예를 들면 배출 가스 내 이산화탄소 농도를 결정할 경우에는 주변공기가 세정가스로서 측정을 방해할 수도 있다.According to another preferred embodiment of the method, the ambient air is absorbed and used as the cleaning gas. This embodiment provides the advantage of particularly incurring low processing costs. However, in all applications the presence of ambient air is not desirable. For example, when determining the concentration of carbon dioxide in the exhaust gas, ambient air may interfere with the measurement as a cleaning gas.
이와 마찬가지로 예컨대 공정가스 내 산소 농도를 측정하기 위해서는 질소가 세정가스로서 바람직할 수 있다.Similarly, for example, nitrogen may be preferable as the cleaning gas for measuring the oxygen concentration in the process gas.
또한 본 발명은 저전력 레이저가 농도 측정을 위해 사용될 수 있다는 장점을 가지는데, 그 이유는 본 발명에 따른 실드의 측정 구간이 실드없는 측정에 비해 단축되기 때문이다. 또한 저전력 레이저의 사용으로 인해 바람직하게는 공정가스 내 원치않는 변동의 위험이 줄어드는데, 이러한 변동은 공정가스 내 레이저 빔의 에너지에 의해 발생될 수도 있다.In addition, the present invention has the advantage that a low power laser can be used for the concentration measurement, because the measurement interval of the shield according to the invention is shortened compared to the shieldless measurement. The use of low power lasers also preferably reduces the risk of unwanted fluctuations in the process gas, which may be caused by the energy of the laser beam in the process gas.
도면에 도시된 실시예를 참고로 본 발명 및 본 발명의 다른 세부사항들을 더 자세히 설명하면 하기와 같다. 즉Hereinafter, the present invention and other details of the present invention will be described in detail with reference to the embodiments shown in the drawings. In other words
도 1은 공정가스를 함유한 용적의 횡단면도이다.1 is a cross-sectional view of a volume containing a process gas.
도 1에는 공정가스를 함유하고 관형으로 제한된 용적(1)이 도시되며, 상기 용적의 한 측면에는 레이저(2a)가 제공되고 그 맞은편 측면에는 검파기(2b)가 제공되며, 상기 검파기는 용적(1)을 관통하면서 검파기(2b)에 조준되는 레이저 빔을 기록한다. 레이저(2a)의 빔 경로의 일부는 측정 구간(4)의 양측면을 제한하는 실드(shield)(3)에 의해서 레이저(2a) 및 검파기(2b) 방향으로 둘러싸인다. 실드(3)에는 바람직하게 예컨대 질소와 같은 세정가스를 공급하기 위한 수단이 제공된다. 이러한 수단은 도면에 도시되지 않는다.In Fig. 1 a volume 1 containing a process gas and restricted tubularly is shown, on one side of which the laser 2a is provided and on the opposite side a detector 2b, which is provided with a volume ( The laser beam aimed at the detector 2b while recording 1) is recorded. Part of the beam path of the laser 2a is surrounded in the direction of the laser 2a and the detector 2b by a shield 3 which limits both sides of the measurement section 4. The shield 3 is preferably provided with means for supplying a cleaning gas such as for example nitrogen. Such means are not shown in the figures.
용적(1)은 고온 공정가스(예컨대 제강로에서 나온 배출 가스)로 채워지며, 상기 고온 공정가스는 800℃ 이상의 온도를 가지며 일산화탄소 함량이 결정되어야만 한다. 이를 위해서 두 개의 수냉식(water-cooled) 세라믹 관(3)을 갖는 실드(3)가 사용된다. 세정가스로서 가스 형태의 질소가 사용되는데, 상기 질소는 예컨대 냉각수를 안내하는 코일관(coiled pipe)(도시되지 않음)에 의해 냉각된다.Volume 1 is filled with a hot process gas (e.g., exhaust gas from the steelmaking furnace), which has a temperature of 800 ° C or higher and a carbon monoxide content must be determined. For this purpose a shield 3 with two water-cooled ceramic tubes 3 is used. As the cleaning gas, nitrogen in gaseous form is used, which is cooled by, for example, a coiled pipe (not shown) that guides the cooling water.
바람직하게는 본 발명에 따른 실드(3)는 레이저(2a)와 검파기(2b)간의 거리에 따라 측정 구간(4)이 예컨대 10 내지 30cm의 길이를 갖게 되도록 치수를 갖는다. 특히 바람직하게는 측정 구간(4)이 약 20cm로 증명된다.Preferably the shield 3 according to the invention is dimensioned such that the measuring section 4 has a length of, for example, 10 to 30 cm, depending on the distance between the laser 2a and the detector 2b. Especially preferably, the measuring section 4 is proved to be about 20 cm.
여기서 사용된 레이저는 예컨대 측정전에 선택된 단일주파수에서 본 발명에 따라 동작하는 가변 레이저이다. 가변 레이저는 결정될 가스 성분에 의해 잘 흡수되는 주파수(관련 파장)가 최대 주파수 범위로부터 선택될 수 있다는 장점이 있다. 이 경우에 선택된 흡수선의 약화는 결정될 공정가스 내 가스 성분의 농도를 측정하기 위한 척도이다.The laser used here is, for example, a variable laser operating according to the invention at a single frequency selected before measurement. The variable laser has the advantage that the frequency (related wavelength) which is well absorbed by the gas component to be determined can be selected from the maximum frequency range. In this case, the weakening of the selected absorption line is a measure for measuring the concentration of the gas component in the process gas to be determined.
그러나 결정될 가스 성분에 매칭되는 주파수를 갖는 싱글 모드 레이저가 사용될 수도 있다.However, a single mode laser having a frequency matching the gas component to be determined may be used.
특히 바람직하게는 레이저 측정이 연속 측정으로 수행될 수 있다. 그러나본 발명의 또다른 실시예에서는 비연속 측정법도 성공적으로 사용될 수 있다.Particularly preferably the laser measurement can be carried out as a continuous measurement. However, in another embodiment of the present invention, discontinuous measurement can also be used successfully.
Claims (11)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10223239A DE10223239A1 (en) | 2002-05-24 | 2002-05-24 | Device and method for spectroscopic measurement of a gas concentration by determining a single absorption line |
| DE10223239.3 | 2002-05-24 | ||
| PCT/EP2003/005296 WO2003100392A1 (en) | 2002-05-24 | 2003-05-20 | Device and method for spectroscopically measuring a gas concentration by determining a single absorption line |
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| KR20050013552A true KR20050013552A (en) | 2005-02-04 |
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| EP (1) | EP1508030A1 (en) |
| JP (1) | JP2005526978A (en) |
| KR (1) | KR20050013552A (en) |
| AU (1) | AU2003238366A1 (en) |
| BR (1) | BR0311244A (en) |
| DE (1) | DE10223239A1 (en) |
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| JP5972760B2 (en) * | 2012-11-09 | 2016-08-17 | 三菱重工業株式会社 | Exhaust gas denitration system, exhaust gas denitration device regeneration method, and exhaust gas denitration device catalyst replacement method |
| JP6000083B2 (en) * | 2012-11-16 | 2016-09-28 | 三菱重工業株式会社 | Exhaust gas denitration system |
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| DE2340747A1 (en) * | 1972-10-26 | 1974-05-09 | Bailey Meter Co | GAS ANALYZER |
| US3838925A (en) * | 1972-12-07 | 1974-10-01 | Baldwin Electronics Inc | Photoelectric opacity measuring system |
| US4076425A (en) * | 1976-02-17 | 1978-02-28 | Julian Saltz | Opacity measuring apparatus |
| US4225243A (en) * | 1978-06-26 | 1980-09-30 | Measurex Corporation | Gas measuring apparatus with standardization means, and method therefor |
| US4247205A (en) * | 1979-02-02 | 1981-01-27 | Measurex Corporation | Gas measuring apparatus with standardization means, and method therefor |
| GB2066947B (en) * | 1980-01-09 | 1984-06-20 | Measurex Corp | Gas measuring apparatus with adjustable path length and method for operation and standardization therefor |
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2002
- 2002-05-24 DE DE10223239A patent/DE10223239A1/en not_active Withdrawn
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2003
- 2003-05-20 KR KR10-2004-7018995A patent/KR20050013552A/en not_active Application Discontinuation
- 2003-05-20 EP EP03732429A patent/EP1508030A1/en not_active Withdrawn
- 2003-05-20 WO PCT/EP2003/005296 patent/WO2003100392A1/en active Application Filing
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| ZA200410367B (en) | 2006-06-28 |
| AU2003238366A1 (en) | 2003-12-12 |
| JP2005526978A (en) | 2005-09-08 |
| RU2004138074A (en) | 2005-09-10 |
| WO2003100392A1 (en) | 2003-12-04 |
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