KR200476063Y1 - 고주파 전력 전달 시스템 - Google Patents

고주파 전력 전달 시스템 Download PDF

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Publication number
KR200476063Y1
KR200476063Y1 KR2020147000034U KR20147000034U KR200476063Y1 KR 200476063 Y1 KR200476063 Y1 KR 200476063Y1 KR 2020147000034 U KR2020147000034 U KR 2020147000034U KR 20147000034 U KR20147000034 U KR 20147000034U KR 200476063 Y1 KR200476063 Y1 KR 200476063Y1
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South Korea
Prior art keywords
power
load
matching system
power amplifier
dynamic load
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KR2020147000034U
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Korean (ko)
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KR20140005091U (ko
Inventor
시드하쓰 피. 나가카티
마이클 키시네브스키
알리 사지
티모시 이. 칼바이티스
윌리암 에스. 맥키니
다니엘 굳맨
윌리암 엠. 홀버
존 에이. 스미스
일리야 바이스트릭
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엠케이에스 인스트루먼츠, 인코포레이티드
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Publication of KR20140005091U publication Critical patent/KR20140005091U/ko
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H03H7/40—Automatic matching of load impedance to source impedance

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Measurement Of Resistance Or Impedance (AREA)
KR2020147000034U 2005-10-31 2006-10-31 고주파 전력 전달 시스템 Expired - Lifetime KR200476063Y1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US73179705P 2005-10-31 2005-10-31
US60/731,797 2005-10-31
PCT/US2006/042360 WO2007053569A1 (en) 2005-10-31 2006-10-31 Radio frequency power delivery system

Related Parent Applications (1)

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KR1020137031679A Division KR20130139377A (ko) 2005-10-31 2006-10-31 고주파 전력 전달 시스템

Publications (2)

Publication Number Publication Date
KR20140005091U KR20140005091U (ko) 2014-09-25
KR200476063Y1 true KR200476063Y1 (ko) 2015-01-23

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ID=37808345

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KR2020147000034U Expired - Lifetime KR200476063Y1 (ko) 2005-10-31 2006-10-31 고주파 전력 전달 시스템
KR1020087010467A Ceased KR20080072642A (ko) 2005-10-31 2006-10-31 고주파 전력 전달 시스템
KR1020137031679A Withdrawn KR20130139377A (ko) 2005-10-31 2006-10-31 고주파 전력 전달 시스템

Family Applications After (2)

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KR1020087010467A Ceased KR20080072642A (ko) 2005-10-31 2006-10-31 고주파 전력 전달 시스템
KR1020137031679A Withdrawn KR20130139377A (ko) 2005-10-31 2006-10-31 고주파 전력 전달 시스템

Country Status (5)

Country Link
EP (1) EP1952533A1 (https=)
JP (1) JP5512127B2 (https=)
KR (3) KR200476063Y1 (https=)
CN (1) CN101297480B (https=)
WO (1) WO2007053569A1 (https=)

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US7649363B2 (en) * 2007-06-28 2010-01-19 Lam Research Corporation Method and apparatus for a voltage/current probe test arrangements
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CN101754566B (zh) * 2008-12-10 2012-07-25 北京北方微电子基地设备工艺研究中心有限责任公司 一种阻抗匹配器、阻抗匹配方法和等离子体处理系统
CN102347745A (zh) * 2010-08-04 2012-02-08 国基电子（上海）有限公司 自适应阻抗匹配电路
CN102457090A (zh) * 2010-10-14 2012-05-16 朱斯忠 一种感应充电装置
TWI455172B (zh) * 2010-12-30 2014-10-01 Semes Co Ltd 基板處理設備、電漿阻抗匹配裝置及可變電容器
JP5946227B2 (ja) * 2011-01-04 2016-07-05 アドバンスト・エナジー・インダストリーズ・インコーポレイテッドＡｄｖａｎｃｅｄ Ｅｎｅｒｇｙ Ｉｎｄｕｓｔｒｉｅｓ， Ｉｎｃ． 電力送達システム、電力制御システム、および、電力を送達するまたは電力制御する方法
US8576013B2 (en) * 2011-12-29 2013-11-05 Mks Instruments, Inc. Power distortion-based servo control systems for frequency tuning RF power sources
KR20130086825A (ko) * 2012-01-26 2013-08-05 세메스 주식회사 가변커패시터, 임피던스매칭장치 및 기판처리장치
CN102801433A (zh) * 2012-04-19 2012-11-28 汤姆逊广播电视技术(北京)有限公司 中波广播发射天线自适应匹配网络的调谐方法
US9685297B2 (en) 2012-08-28 2017-06-20 Advanced Energy Industries, Inc. Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
JP6113450B2 (ja) * 2012-09-07 2017-04-12 株式会社ダイヘン インピーダンス調整装置
US9294100B2 (en) 2012-12-04 2016-03-22 Advanced Energy Industries, Inc. Frequency tuning system and method for finding a global optimum
US10821542B2 (en) * 2013-03-15 2020-11-03 Mks Instruments, Inc. Pulse synchronization by monitoring power in another frequency band
CN103454489B (zh) * 2013-09-12 2016-09-21 清华大学 匹配网络的损耗功率标定方法及系统
TWI668725B (zh) * 2013-10-01 2019-08-11 Lam Research Corporation 使用模型化、回授及阻抗匹配之蝕刻速率的控制
CN105097397B (zh) * 2014-05-22 2018-05-08 北京北方华创微电子装备有限公司 阻抗匹配装置及半导体加工设备
KR102744975B1 (ko) * 2014-12-19 2024-12-20 메사추세츠 인스티튜트 오브 테크놀로지 위상 스위치 소자를 갖는 튜너블 매칭 네트워크
US10790784B2 (en) 2014-12-19 2020-09-29 Massachusetts Institute Of Technology Generation and synchronization of pulse-width modulated (PWM) waveforms for radio-frequency (RF) applications
US9948265B2 (en) * 2015-05-14 2018-04-17 Mediatek Inc. Inductor capacitor tank for resonator
US10229816B2 (en) * 2016-05-24 2019-03-12 Mks Instruments, Inc. Solid-state impedance matching systems including a hybrid tuning network with a switchable coarse tuning network and a varactor fine tuning network
JP2017073770A (ja) * 2016-09-30 2017-04-13 株式会社ダイヘン 高周波整合システム
JP2017073772A (ja) * 2016-09-30 2017-04-13 株式会社ダイヘン 高周波整合システム
CN109150132A (zh) * 2017-06-19 2019-01-04 展讯通信（上海）有限公司 阻抗调谐方法、装置及移动终端
US11651939B2 (en) 2017-07-07 2023-05-16 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating same
US11615943B2 (en) 2017-07-07 2023-03-28 Advanced Energy Industries, Inc. Inter-period control for passive power distribution of multiple electrode inductive plasma source
CN115662868A (zh) 2017-07-07 2023-01-31 先进能源工业公司 等离子体功率输送系统的周期间控制系统及其操作方法
US11076477B2 (en) * 2017-10-03 2021-07-27 Mks Instruments, Inc. Cooling and compression clamp for short lead power devices
US12505986B2 (en) 2017-11-17 2025-12-23 Advanced Energy Industries, Inc. Synchronization of plasma processing components
US12230476B2 (en) 2017-11-17 2025-02-18 Advanced Energy Industries, Inc. Integrated control of a plasma processing system
US11437221B2 (en) 2017-11-17 2022-09-06 Advanced Energy Industries, Inc. Spatial monitoring and control of plasma processing environments
JP7289313B2 (ja) 2017-11-17 2023-06-09 エーイーエス グローバル ホールディングス， プライベート リミテッド プラズマ処理のためのイオンバイアス電圧の空間的および時間的制御
CN108152696A (zh) * 2017-12-27 2018-06-12 扬州市神州科技有限公司 匹配器动态测试方法
US10672590B2 (en) * 2018-03-14 2020-06-02 Lam Research Corporation Frequency tuning for a matchless plasma source
KR102348338B1 (ko) * 2019-02-07 2022-01-06 엠케이에스코리아 유한회사 펄스형 가변 주파수 rf 발생기의 구동 주파수 제어 방법
WO2021257374A1 (en) * 2020-06-17 2021-12-23 Lam Research Corporation Protection system for switches in direct drive circuits of substrate processing systems
KR102906437B1 (ko) * 2021-10-01 2026-01-02 삼성전자주식회사 Rf 유닛의 진단 시스템 및 이를 이용한 rf 유닛의 진단 방법
US12046448B2 (en) 2022-01-26 2024-07-23 Advanced Energy Industries, Inc. Active switch on time control for bias supply
US11942309B2 (en) 2022-01-26 2024-03-26 Advanced Energy Industries, Inc. Bias supply with resonant switching
US11670487B1 (en) 2022-01-26 2023-06-06 Advanced Energy Industries, Inc. Bias supply control and data processing
US11978613B2 (en) 2022-09-01 2024-05-07 Advanced Energy Industries, Inc. Transition control in a bias supply
KR102760483B1 (ko) * 2022-10-21 2025-02-03 전북대학교산학협력단 임피던스 조정 회로
US12567572B2 (en) 2023-07-11 2026-03-03 Advanced Energy Industries, Inc. Plasma behaviors predicted by current measurements during asymmetric bias waveform application

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Also Published As

Publication number Publication date
WO2007053569A1 (en) 2007-05-10
CN101297480B (zh) 2012-08-08
CN101297480A (zh) 2008-10-29
KR20140005091U (ko) 2014-09-25
KR20080072642A (ko) 2008-08-06
JP5512127B2 (ja) 2014-06-04
EP1952533A1 (en) 2008-08-06
KR20130139377A (ko) 2013-12-20
JP2009514176A (ja) 2009-04-02

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